US20040164089A1 - Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites - Google Patents

Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites Download PDF

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Publication number
US20040164089A1
US20040164089A1 US10/786,698 US78669804A US2004164089A1 US 20040164089 A1 US20040164089 A1 US 20040164089A1 US 78669804 A US78669804 A US 78669804A US 2004164089 A1 US2004164089 A1 US 2004164089A1
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bubbler
carrier gas
gaseous mixture
organometallic compound
pick
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US10/786,698
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Megan Ravetz
Graham Williams
Andrew Nelson
Roy Blunt
Howard Williams
Rajesh Odedra
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Epichem Ltd
IQE PLC
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Epichem Ltd
IQE PLC
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Priority to US10/786,698 priority Critical patent/US20040164089A1/en
Assigned to EPICHEM LIMITED reassignment EPICHEM LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ODEDRA, RAJESH, RAVETZ, MEGAN, WILLIAMS, GRAHAM
Assigned to IQE PLC reassignment IQE PLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: NELSON, ANDREW, WILLIAMS, HOWARD, BLUNT, ROY TREVOR
Publication of US20040164089A1 publication Critical patent/US20040164089A1/en
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases

Definitions

  • the present invention relates to an improved method of, and apparatus for the delivery of precursors in the vapour phase to a plurality of expitaxial reactor sites, particularly in relation to the delivery of organometallic compounds.
  • the production of the equipment for transportation of the precursor from the bubbler to the reaction site has to be specially designed to make it suitable for carrying the many potentially hazardous chemicals that are used in semiconductor production, such as Trimethylgallium, Trimethylindium, Trimethylaluminium, Dimethylzinc and Triethylgallium.
  • One of the potential hazards of all these chemicals is their pyrophoricity (i.e. they ignite spontaneously on contact with air).
  • a first aspect of the present invention provides a method for delivering an organometallic compound to a plurality of reactor sites, the method comprising the steps of introducing a carrier gas into a container of the organometallic compound, picking up the compound in the gas to form a gaseous mixture, transporting the gaseous mixture to a reservoir and selectively distributing the gaseous mixture to one or more of a plurality of reactor sites, the method excluding the step of condensing the gaseous mixture.
  • a second aspect of the present invention provides an apparatus for delivering an organometallic compound to a plurality of reactor sites, the apparatus comprising an inlet for introducing a carrier gas into a container of the organometallic compound, a reservoir for storage of the gaseous mixture of the compound and the carrier gas and an outlet for selectively distributing the gaseous mixture to one or more of a plurality of reactor sites, the apparatus excluding a condenser for condensation of the gaseous mixture.
  • the rate of flow of the carrier gas and the carrier gas/precursor mixture through the apparatus is controlled by means of a system of mass flow controllers.
  • a first mass flow controller is preferably positioned to control the rate of flow of the carrier gas into the container.
  • a second source of carrier gas is introduced into the gaseous mixture after pick up of the precursor.
  • the addition of a second source of carrier gas is preferably monitored by a second mass flow controller after pick up of precursor to maintain the vapour concentration below saturation to ensure that the precursor remains in the vapour phase.
  • the system may be heated. This assists in maintaining the vapour concentration below saturation to ensure that the precursor remains in the vapour phase.
  • the second mass flow controller is linked to the first mass flow controller such that the two flows of carrier gas are always in the same ratio to each other.
  • the gaseous mixture is preferably transported to a reservoir for storage thereof, the reservoir having means for selectively distributing the mixture to a plurality of reactor sites.
  • the reservoir is preferably provided with a pressure controller that is connected to the first mass flow controller to determine the rate of flow of carrier gas into the container.
  • the pressure in the storage reservoir is controlled such as to enable a uniform supply of the gaseous mixture to the different reactors.
  • the storage of bulk material in the gaseous phase has not previously been utilized in relation to the delivery of precursors to a reactor site. Prior hereto, storage has always been in the liquid or solid phase.
  • the gaseous mixture is preferably drawn under vacuum or by means of a pressure differential from the reservoir to each of the reactor sites.
  • each reactor is provided with its own mass flow controller to determine the rate of entry of the gaseous mixture into the reactor.
  • constant pick up of the precursor in the carrier gas it is preferable for constant pick up of the precursor in the carrier gas to be achieved by the method and apparatus of the present invention More preferably still, constant pick up is achieved over a wide range of flow rates, such as 0 to 10 litres per minute.
  • the container of precursor is preferably in the form of a bubbler, the carrier gas being introduced into the bubbler by means of a dip pipe.
  • the bubbler is surrounded by a temperature controlled oil bath. It is preferable to provide a means of monitoring the level of precursor in the bubbler (this may be achieved, for example, by a level alarm, a weighscale or a gas concentration monitor/totaliser).
  • a third aspect of the present invention provides a bubbler comprising a container for precursor and a dip pipe for passage of a carrier gas therethrough to pick up the precursor in the gas, wherein the bubbler includes one or more of the following features:
  • the base of the bubbler may be provided with a narrowing or may have a smaller vessel placed therein relative to the bubbler, for example being in the form of a well at the bottom of the bubbler.
  • the end of the dip pipe is placed within the narrowing or smaller vessel to ensure that constant pick up of the precursor is achieved until almost complete utilisation of the precursor contained within the bubbler.
  • the dip pipe is preferably designed to provide an increased rate of pick up of the precursor.
  • the dip pipe is provided with one or more hollow members extending substantially perpendicularly from the main body of the dip pipe, preferably situated at the base thereof The members are preferably provided with a plurality of holes in one or more sides thereof. More preferably, the dip pipe is provided with a hollow cross at the base thereof.
  • each leg of the cross has a plurality of holes. More preferably, the holes are provided in the same side of each leg. This design ensures a small bubble size together with a swirling motion to give highly efficient pick up.
  • the carrier gas that picks up the precursor may be any suitable permanent gas, such as hydrogen.
  • the apparatus and method of the present invention are particularly suitable for delivering organometallic compounds to epitaxial reactors, such as Trimethylgallium, Trimethylindium, Trimethylaluminium, Dimethylzinc and Triethylgallium.
  • FIG. 1 is a schematic diagram of the components of an apparatus according to one embodiment of the present invention.
  • FIG. 2 is an isometric diagram of a bubbler for an apparatus according to the present invention, having a front part removed to show the dip pipe of the bubbler.
  • FIG. 1 of the accompanying drawings a bulk distribution apparatus for delivering a precursor in the vapour phase from a bulk container L to a plurality of reactor vessels 12 , 14 , 16 , 18 , 20 according to one embodiment of the present invention is illustrated.
  • a flow 2 of carrier gas typically hydrogen (but possibly any permanent gas) is passed at a rate set by a mass flow controller 4 into a bulk bubbler 1 , via a dip pipe 3 , containing the precursor to be delivered to the plurality of epitaxial reactors.
  • the bulk bubbler 1 is held in a temperate controlled oil bath 5 and is fitted with a level alarm 6 to provide an indication of the fill state.
  • the bulk bubbler's internal design (see FIG. 2) is such as to ensure constant pick up over a wide range of flow rates (0 to 10 litres/min) and to achieve almost complete utilisation of the contained chemical (down to the last 2%).
  • the hydrogen 2 picks up the precursor from the bubbler 1 and the resulting gas stream is diluted by a further injection of hydrogen, this flow being set by a mass flow controller 7 , positioned in ratio to the mass flow controller 4 .
  • This secondary dilution is mainly required to reduce vapour concentration to below saturation thereby ensuing that the precursor remains in the vapour phase as it passes through the system. Alternatively, this may be achieved by heating the system downstream of the bubbler, or by a combination of these two measures.
  • the gas mixture is then passed into a central reservoir 9 , fitted with a pressure controller 10 , the output from which is used to position the principal hydrogen mass flow controller 4 .
  • Concentration of the gaseous mixture in the reservoir is measured using a concentration monitor 8 .
  • Vapour may be drawn from the central reservoir, by pressure differential, to any number of epitaxial reactors 12 , 14 , 16 , 18 , 20 at flow rates set by individual mass flow controllers 12 a, 14 a, 16 a, 18 a, 20 a for each reactor.
  • the method and apparatus of the present invention may be used to deliver any precursor in the vapour phase to a plurality of reactor sites but the invention is particularly suitable for the bulk distribution of organometallc compounds, such as those used in the production of semiconductors.
  • organometallc compounds such as those used in the production of semiconductors.
  • such compounds include Trimethylgallium, Trimethylindium, Trimethylaluminium, Dimethylzinc and Triethylgallium.
  • the method and apparatus of the present invention are able to provide a vapour of constant composition over a wide range of flow rates and that constant pick-up can be achieved when only 2% of residual precursor remains in the container. Additionally, it is preferable that the composition of the precursor/carrier gas mixture being delivered to a plurality of reactor sites can be monitored by a single gas concentration monitor.
  • the apparatus of the present invention enables a precursor chemical to be transported in the vapour phase from a central reservoir to a plurality of reactor sites.
  • One of the main advantages provided by this system is the reduced downtime associated with the changeout of the bubblers for the individual reactors.
  • a further advantage is the reduction in the quantity, complexity and cost of the local pick-up and control equipment required for each chemical at each reactor.
  • the ability to deliver the pyrophoric precursors as a vapour increases the safety of the system due to the vapour containing only a low concentration of the precursor (less than 5%) in contrast to the high concentration (100%) required for bulk liquid distribution.
  • An important feature of the present apparatus is the internal design of the bulk bubbler 1 . Normally, it would be very difficult to achieve constant pick-up and flow rates from the bubbler when there is only a small amount of residual precursor remaining in the bubbler container.
  • the present invention overcomes this problem to provide a constant pick up (for carrier gas flowrates up to 10 litres/min) by providing a well or narrowing within the bulk vessel bubbler. For example, a 20 litre volume bubbler may be provided with a 1 litre volume well into which the dip pipe projects.
  • FIG. 2 of the accompanying drawings illustrates a bubbler 100 fitted with a dip pipe that has the main hollow body 102 extending substantially vertically down through the centre of the bubbler and is provided with a hollow cross 104 , each leg 104 a, 104 b, 104 c of which extends substantially perpendicularly from the main body and has four holes 106 all drilled on the same side of each leg.
  • a design ensures a small bubble size together with a swirling motion to give highly efficient pick up.
  • This design of bubbler enables a far greater rate of pick up (around 10 litres/min) than can be obtained from a small volume bubbler.

Abstract

PURPOSE: To improve the evaporation efficiency of a raw material by mounting an element of a porous sintered metal having the pore size smaller than the size of the solid raw material to a port for introducing a carrier gas into a bubbler vessel.
CONSTITUTION: The solid raw material 2 is housed in the bubbler vessel 1 and is heated by a mantle heater, etc. The carrier gas is introduced from the introducing port 9 into the vessel 1 to generate the saturation pressure of the raw material 2. This material is sent into a film forming chamber 10 of the CVD device from a leading out pipe 8. The element 11 of the porous sintered metal is mounted to this introducing port 9. The carrier gas is ejected to a wide range from the many fine pores of the element 11 to the circumferences thereof and is uniformly dispersed. The wider contact area of the raw material 2 with the carrier gas is taken and the sufficient saturated steam pressure is obtd. The back flow of the raw material 2 to the mass flow controller is obviated even if the pressure on the film forming chamber 10 side increases. The damaging of the controller 4 is thus prevented.

Description

  • The present invention relates to an improved method of, and apparatus for the delivery of precursors in the vapour phase to a plurality of expitaxial reactor sites, particularly in relation to the delivery of organometallic compounds. [0001]
  • It is common practice in the semiconductor industry for electronic devices to be produced by means of a Chemical Vapour Deposition (CVD) process. Precursors (liquid or solid) are supplied in bubblers wherein, in use, a carrier gas is bubbled through and becomes saturated with the precursor via a dip pipe. The carrier gas/vapour mixture is then passed at a controlled rate into an epitaxial reactor. Such systems are used in the production of both silicon and compound semiconductors, with early versions being specific to individual reactors. [0002]
  • With growth in demand for semiconductors, initially in the silicon area, it was necessary to introduce bulk distribution systems wherein a central reservoir fed a number of bubblers, local to each reactor. These systems, typically used for the delivery of Tetraethoxysilane (TEOS), have been actively marketed by the suppliers of TEOS but have only been applied to the distribution of liquids. [0003]
  • However, a number of precursors for semiconductor production are transported from the bubbler to their reactor in the gaseous phase and up until now such transportation has been achieved on an individual basis. This has obvious drawbacks, such as the downtime required for the changeout of the bubblers at the individual reactors and the cost in relation to the increased quantity and complexity of the local pick up and control equipment required for each chemical at each reactor. [0004]
  • The production of the equipment for transportation of the precursor from the bubbler to the reaction site has to be specially designed to make it suitable for carrying the many potentially hazardous chemicals that are used in semiconductor production, such as Trimethylgallium, Trimethylindium, Trimethylaluminium, Dimethylzinc and Triethylgallium. One of the potential hazards of all these chemicals is their pyrophoricity (i.e. they ignite spontaneously on contact with air). [0005]
  • It is an object of the present invention to provide an improved method of, and apparatus for, delivery of precursors to a reactor site, particularly in relation to organometallic compounds, that aims to overcome the abovementioned drawbacks. [0006]
  • Accordingly, a first aspect of the present invention provides a method for delivering an organometallic compound to a plurality of reactor sites, the method comprising the steps of introducing a carrier gas into a container of the organometallic compound, picking up the compound in the gas to form a gaseous mixture, transporting the gaseous mixture to a reservoir and selectively distributing the gaseous mixture to one or more of a plurality of reactor sites, the method excluding the step of condensing the gaseous mixture. [0007]
  • A second aspect of the present invention provides an apparatus for delivering an organometallic compound to a plurality of reactor sites, the apparatus comprising an inlet for introducing a carrier gas into a container of the organometallic compound, a reservoir for storage of the gaseous mixture of the compound and the carrier gas and an outlet for selectively distributing the gaseous mixture to one or more of a plurality of reactor sites, the apparatus excluding a condenser for condensation of the gaseous mixture. [0008]
  • Preferably, the rate of flow of the carrier gas and the carrier gas/precursor mixture through the apparatus is controlled by means of a system of mass flow controllers. A first mass flow controller is preferably positioned to control the rate of flow of the carrier gas into the container. [0009]
  • Preferably, a second source of carrier gas is introduced into the gaseous mixture after pick up of the precursor. The addition of a second source of carrier gas is preferably monitored by a second mass flow controller after pick up of precursor to maintain the vapour concentration below saturation to ensure that the precursor remains in the vapour phase. Additionally or alternatively, the system may be heated. This assists in maintaining the vapour concentration below saturation to ensure that the precursor remains in the vapour phase. Preferably, the second mass flow controller is linked to the first mass flow controller such that the two flows of carrier gas are always in the same ratio to each other. [0010]
  • The gaseous mixture is preferably transported to a reservoir for storage thereof, the reservoir having means for selectively distributing the mixture to a plurality of reactor sites. The reservoir is preferably provided with a pressure controller that is connected to the first mass flow controller to determine the rate of flow of carrier gas into the container. The pressure in the storage reservoir is controlled such as to enable a uniform supply of the gaseous mixture to the different reactors. The storage of bulk material in the gaseous phase has not previously been utilized in relation to the delivery of precursors to a reactor site. Prior hereto, storage has always been in the liquid or solid phase. [0011]
  • The gaseous mixture is preferably drawn under vacuum or by means of a pressure differential from the reservoir to each of the reactor sites. Preferably, each reactor is provided with its own mass flow controller to determine the rate of entry of the gaseous mixture into the reactor. [0012]
  • It is preferable for constant pick up of the precursor in the carrier gas to be achieved by the method and apparatus of the present invention More preferably still, constant pick up is achieved over a wide range of flow rates, such as 0 to 10 litres per minute. [0013]
  • The container of precursor is preferably in the form of a bubbler, the carrier gas being introduced into the bubbler by means of a dip pipe. Preferably, the bubbler is surrounded by a temperature controlled oil bath. It is preferable to provide a means of monitoring the level of precursor in the bubbler (this may be achieved, for example, by a level alarm, a weighscale or a gas concentration monitor/totaliser). [0014]
  • A third aspect of the present invention provides a bubbler comprising a container for precursor and a dip pipe for passage of a carrier gas therethrough to pick up the precursor in the gas, wherein the bubbler includes one or more of the following features: [0015]
  • (a) a narrowing of the container at or near the base thereof to aid complete utilisation of the precursor therein; and [0016]
  • (b) one or more hollow members extending substantially perpendicularly to the dip pipe and being in fluid communication therewith, each member having an opening therein to aid pick up of the precursor. [0017]
  • The base of the bubbler may be provided with a narrowing or may have a smaller vessel placed therein relative to the bubbler, for example being in the form of a well at the bottom of the bubbler. The end of the dip pipe is placed within the narrowing or smaller vessel to ensure that constant pick up of the precursor is achieved until almost complete utilisation of the precursor contained within the bubbler. [0018]
  • The dip pipe is preferably designed to provide an increased rate of pick up of the precursor. Preferably, the dip pipe is provided with one or more hollow members extending substantially perpendicularly from the main body of the dip pipe, preferably situated at the base thereof The members are preferably provided with a plurality of holes in one or more sides thereof. More preferably, the dip pipe is provided with a hollow cross at the base thereof. Preferably, each leg of the cross has a plurality of holes. More preferably, the holes are provided in the same side of each leg. This design ensures a small bubble size together with a swirling motion to give highly efficient pick up. [0019]
  • The carrier gas that picks up the precursor may be any suitable permanent gas, such as hydrogen. The apparatus and method of the present invention are particularly suitable for delivering organometallic compounds to epitaxial reactors, such as Trimethylgallium, Trimethylindium, Trimethylaluminium, Dimethylzinc and Triethylgallium.[0020]
  • For a better understanding of the present invention and to show more clearly how it may be carried into effect, reference will now be made by way of example only to the accompanying drawings in which:—[0021]
  • FIG. 1 is a schematic diagram of the components of an apparatus according to one embodiment of the present invention; and [0022]
  • FIG. 2 is an isometric diagram of a bubbler for an apparatus according to the present invention, having a front part removed to show the dip pipe of the bubbler.[0023]
  • Referring to FIG. 1 of the accompanying drawings, a bulk distribution apparatus for delivering a precursor in the vapour phase from a bulk container L to a plurality of [0024] reactor vessels 12, 14, 16, 18, 20 according to one embodiment of the present invention is illustrated. A flow 2 of carrier gas, typically hydrogen (but possibly any permanent gas) is passed at a rate set by a mass flow controller 4 into a bulk bubbler 1, via a dip pipe 3, containing the precursor to be delivered to the plurality of epitaxial reactors. The bulk bubbler 1 is held in a temperate controlled oil bath 5 and is fitted with a level alarm 6 to provide an indication of the fill state. The bulk bubbler's internal design (see FIG. 2) is such as to ensure constant pick up over a wide range of flow rates (0 to 10 litres/min) and to achieve almost complete utilisation of the contained chemical (down to the last 2%).
  • The hydrogen [0025] 2 picks up the precursor from the bubbler 1 and the resulting gas stream is diluted by a further injection of hydrogen, this flow being set by a mass flow controller 7, positioned in ratio to the mass flow controller 4. This secondary dilution is mainly required to reduce vapour concentration to below saturation thereby ensuing that the precursor remains in the vapour phase as it passes through the system. Alternatively, this may be achieved by heating the system downstream of the bubbler, or by a combination of these two measures.
  • The gas mixture is then passed into a [0026] central reservoir 9, fitted with a pressure controller 10, the output from which is used to position the principal hydrogen mass flow controller 4. Concentration of the gaseous mixture in the reservoir is measured using a concentration monitor 8. Vapour may be drawn from the central reservoir, by pressure differential, to any number of epitaxial reactors 12, 14, 16, 18, 20 at flow rates set by individual mass flow controllers 12 a, 14 a, 16 a, 18 a, 20 a for each reactor.
  • It is to be appreciated that the method and apparatus of the present invention may be used to deliver any precursor in the vapour phase to a plurality of reactor sites but the invention is particularly suitable for the bulk distribution of organometallc compounds, such as those used in the production of semiconductors. For example, such compounds include Trimethylgallium, Trimethylindium, Trimethylaluminium, Dimethylzinc and Triethylgallium. [0027]
  • It is important that the method and apparatus of the present invention are able to provide a vapour of constant composition over a wide range of flow rates and that constant pick-up can be achieved when only 2% of residual precursor remains in the container. Additionally, it is preferable that the composition of the precursor/carrier gas mixture being delivered to a plurality of reactor sites can be monitored by a single gas concentration monitor. [0028]
  • The apparatus of the present invention enables a precursor chemical to be transported in the vapour phase from a central reservoir to a plurality of reactor sites. One of the main advantages provided by this system is the reduced downtime associated with the changeout of the bubblers for the individual reactors. A further advantage is the reduction in the quantity, complexity and cost of the local pick-up and control equipment required for each chemical at each reactor. Furthermore, the ability to deliver the pyrophoric precursors as a vapour increases the safety of the system due to the vapour containing only a low concentration of the precursor (less than 5%) in contrast to the high concentration (100%) required for bulk liquid distribution. [0029]
  • An important feature of the present apparatus is the internal design of the bulk bubbler [0030] 1. Normally, it would be very difficult to achieve constant pick-up and flow rates from the bubbler when there is only a small amount of residual precursor remaining in the bubbler container. The present invention overcomes this problem to provide a constant pick up (for carrier gas flowrates up to 10 litres/min) by providing a well or narrowing within the bulk vessel bubbler. For example, a 20 litre volume bubbler may be provided with a 1 litre volume well into which the dip pipe projects.
  • Additionally, the bubbler for use in the present invention may be provided with a novel construction of dip pipe which aids pick up of the precursor. For example, FIG. 2 of the accompanying drawings illustrates a [0031] bubbler 100 fitted with a dip pipe that has the main hollow body 102 extending substantially vertically down through the centre of the bubbler and is provided with a hollow cross 104, each leg 104 a, 104 b, 104 c of which extends substantially perpendicularly from the main body and has four holes 106 all drilled on the same side of each leg. Such a design ensures a small bubble size together with a swirling motion to give highly efficient pick up. This design of bubbler enables a far greater rate of pick up (around 10 litres/min) than can be obtained from a small volume bubbler.

Claims (31)

1. A method for delivering an organometallic compound to a plurality of reactor sites, the method comprising the step of introducing a carrier gas into a container of the organometallic compound, picking up the compound in the gas to form a gaseous mixture, transporting the gaseous mixture to a reservoir and selectively distributing the gaseous mixture to one or more of a plurality of reactor sites, the method excluding the step of condensing the gaseous mixture.
2. A method as claimed in claim 1, wherein the rate of flow of the carrier gas and the carrier gas/organometallic mixture is controllable.
3. A method as claimed in claim 1 or claim 2 further comprising introducing a second source of carrier gas into the gaseous mixture after pick up of the organometallic compound.
4. A method as claimed in claim 3, wherein the addition of the second source of carrier gas is monitored to maintain the vapour concentration below saturation.
5. A method as claimed in any one of claims 1 to 4 further comprising the step of heating the gaseous mixture.
6. A method as claimed in any one of claims 1 to 5 wherein the gaseous mixture is drawn under vacuum or by means of pressure differential from the reservoir to each of the reactor sites.
7. A method as claimed in any one of the preceding claims wherein the pick up of organometallic compound in the carrier gas is kept constant.
8. A method as claimed in claim 7 wherein a constant pick up is achieved over flow rates ranging from 0 to 10 litres per minute.
9. A method as claimed in any one of the preceding claims wherein the carrier gas is hydrogen.
10. An apparatus for delivering an organometallic compound to a plurality of reactor sites, the apparatus comprising an inlet for introducing a carrier gas (2) into a container (1) of the organometallic compound, a reservoir for storage of the gaseous mixture of the compound and the carrier gas and an outlet for selectively distributing the gaseous mixture to one or more of a plurality of reactor sites (12, 14, 16, 18, 20), the apparatus excluding a condensor for condensation of the gaseous mixture.
11. An apparatus as claimed in claim 10, wherein one or more mass flow controllers (4) are provided to control the rate of flow of the carrier gas and the carrier gaseous mixture through the apparatus.
12. An apparatus as claimed in claim 11 wherein a first mass controller (4) is positioned to control the rate of flow of carrier gas into the container (1).
13. An apparatus as claimed in claim 10, 11 or 12, further comprising means for introduction of a second source of carrier gas into the gaseous mixture after pick up of the organometallic compound.
14. An apparatus as claimed in claim 13, wherein a second mass flow controller (7) is provided to monitor the addition of the second source of carrier gas.
15. An apparatus as claimed in claim 14, wherein the second mass flow controller (7) is linked to the first mass flow controller (4).
16. An apparatus as claimed in any one of claims 10 to 15 wherein the reservoir (9) is provided with a pressure controller (8).
17. An apparatus as claimed in any one of claims 10 to 16 wherein means is provided to allow the gaseous mixture to be drawn under vacuum or by means of a pressure differential from the reservoir (9) to each of the reactor sites (12, 14, 16, 18, 20).
18. An apparatus as claimed in any one of claims 10 to 17 wherein each reactor site (12, 14, 16, 18, 20) is provided with its own mass flow controller (12 a, 14 a, 16 a, 18 a, 20 a) to determine the rate of entry of the gaseous mixture into the reactor.
19. An apparatus as claimed in claim any one of the preceding claims wherein the container (1) of organometallic compound is a bubbler, the carrier gas being introduced into the bubbler by means of a dip pipe (3).
20. An apparatus as claimed in claim 19 wherein the bubbler is surrounded by a temperature controlled oil bath (5).
21. An apparatus as claimed in claim 19 or claim 20 wherein the bubbler is provided with means (6) for monitoring the level of organometallic compound therein.
22. A bubbler (100) comprising a container for precursor and a dip pipe (102) for passage of a carrier gas therethrough to pick up the precursor in the gas, wherein the bubbler includes one or more of the following features:
(a) a narrowing of the container at or near the base thereof to aid complete utilisation of the precursor therein; and
(b) one or more hollow members (104 a, 104b, 104 c) extending substantially perpendicularly to the dip pipe (102) and being in fluid communication therewith, each member having an opening (106) therein to aid pick up of the precursor.
23. A bubbler as claimed in claim 22, wherein the base of the bubbler is provided with a narrowing.
24. A bubbler as claimed in claim 23, wherein the base of the bubbler has a smaller vessel placed therein relative to the bubbler.
25. A bubbler as claimed in claim 23 or claim 24 wherein the end of the dip pipe is positioned within the narrowing or smaller vessel.
26. A bubbler as claimed in any one claims 22 to 25 wherein the dip-pipe (102) is provided with one or more hollow members (104 a, 104 b, 104 c) extending substantially perpendicularly therefrom.
27. A bubbler as claimed in claim 26, wherein each hollow member (104 a, 104 b, 104 c) is situated at the base of the dip pipe.
28. A bubbler as claimed in claim 26 or claim 27, wherein each member is provided with a plurality of holes (106) in one or more sides thereof.
29. A bubbler as claimed in claims 26, 27 or 28 wherein the dip pipe is provided with a hollow cross at the base thereof.
30. A bubbler as claimed in claim 29 wherein each leg of the cross has a plurality of holes.
31. A bubbler as claimed in claim 30 wherein the holes are provided in the same side of each leg.
US10/786,698 1999-12-11 2004-02-25 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites Abandoned US20040164089A1 (en)

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US10/149,092 US6698728B1 (en) 1999-12-11 2000-07-03 Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites
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WO2001042539A1 (en) 2001-06-14
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TW580521B (en) 2004-03-21
JP2011137235A (en) 2011-07-14
JP5449221B2 (en) 2014-03-19
DE1242656T1 (en) 2003-02-06
US6698728B1 (en) 2004-03-02
DE60005712D1 (en) 2003-11-06
GB9929279D0 (en) 2000-02-02
EP1242656A1 (en) 2002-09-25
ATE251237T1 (en) 2003-10-15
JP5091380B2 (en) 2012-12-05
AU5696300A (en) 2001-06-18
TW580522B (en) 2004-03-21

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