US20050101232A1 - Machine for polishing the surface of a work piece - Google Patents
Machine for polishing the surface of a work piece Download PDFInfo
- Publication number
- US20050101232A1 US20050101232A1 US10/318,789 US31878902A US2005101232A1 US 20050101232 A1 US20050101232 A1 US 20050101232A1 US 31878902 A US31878902 A US 31878902A US 2005101232 A1 US2005101232 A1 US 2005101232A1
- Authority
- US
- United States
- Prior art keywords
- polishing
- toroidal
- compliant
- work piece
- machine recited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
Abstract
A machine for polishing a surface of a work piece has a precision sub-aperture polishing element. The polishing element has a compliant, toroidal polishing member mountable to a support member. A circumferential portion of the polishing member extends uniformly beyond the peripheral surface of the support member and forms a clearance with the work piece surface during polishing operations.
Description
- The present application is related to U.S. application Ser. No. ______, filed ______, by Stephen C. Meissner, and entitled, “Sub-Aperture Compliant Toroidal Polishing Element,” and U.S. application Ser. No. 10/241,144, filed Sep. 11, 2002, by Stephen C. Meissner, and entitled, “Dual Motion Polishing Tool.”
- The invention relates generally to the field of optical manufacturing processes, and in particular to polishing of optical surfaces. More specifically, the invention relates to a high-precision polishing tool for polishing an optical quality surface onto a substrate.
- In manufacturing of optical components, lenses, molds and the like, preliminary operations, such as grinding or diamond turning, are performed to generate an optical surface on a raw blank of material. These preliminary operations provide the general form of the component, but leave surface defects that include turning grooves, cutter marks, and sub surface damage. A final polishing step is required to remove these surface and sub-surface defects. Polishing is typically accomplished in a variety of ways depending upon the material and the form of the surface, i.e., plano form, spherical form, or aspherical form.
- Skilled artisans will appreciate that work piece surfaces having either a piano and spherical form are typically polished using “full-aperture” or “full-surface” tools. Full aperture tools tend to cover over 80% of the work piece surface during polishing. These tools are constructed in a variety of ways, including traditional “pitch” and more recent pad-type. “Pitch” polishing tools are comprised of a soft flow-able material, such as pitch or bees wax, which is used to create a mold of the optical surface.
- Referring to
FIG. 1 , a typical prior art full aperture “pitch”polishing tool 10 has a plurality ofgrooves 12 to aid in the movement of polishing fluid at the interface of work piece surface (not shown).Polishing tool 10 has asupport surface 14 attachable to ashank 16. Shank 16 defines an arbor for holding thepolishing tool 10 for operation in a working unit. In operation,polishing tool 10 is held against the work piece (not shown) with an applied force and the two components, i.e., work piece andpolishing tool 10, are moved relative to one another in the presence of a free abrasive polishing compound, such as cerium oxide, to achieve polishing. - Referring to
FIG. 2 , a typical full-aperturepad polishing tool 20 has of apad mounting surface 22 for receiving apolishing pad 24 thereon. Thepolishing pad 24 is typically attached to thepad mounting surface 22 via an adhesive or via friction grip as disclosed in U.S. Pat. No. 4,274,232 issued to Wylde on Jun. 23, 1981, titled “Friction Grip Pad.” - Those skilled in the art will appreciate that polishing aspheric surfaces using full-aperture tools involves much iteration to rebuild or reshape the polishing tool slowing the polishing process considerably. Therefore polishing of aspheric surfaces is commonly restricted to sub-aperture methods using existing ring-tools or small-area tools. Sub-aperture methods using ring-tools or small-area tools rely on a polishing tool that contacts less than 50% of the work piece surface at one time. Ring tools, as disclosed in U.S. Pat. No. 4,768,308 issued to Leland G. Atkinson, III, et al. on Sep. 6, 1998, titled “Universal Lens Polishing Tool, Polishing Apparatus And Method Of Polishing,” have a diameter that is comparable to or larger than the radius of the work piece and contact the work piece surface over an area that is much larger than that for a small-area tool. Small-area tools contact only a small area of the work surface at a time and create an interfacial contact area that is on the order of 99% smaller than the area of the work piece surface.
- Moreover, it is well known that sub-aperture small-area tools may be outfitted with a variety of polishing head shapes, including spherical (as shown in
FIG. 3 ), but may also include conical, cylindrical, and flat along with a polishing pad. InFIG. 3 , asub-aperture tool 30 includes anarbor 32 fixedly attached to aspherical polishing head 34. It should be noted that thespherical polishing head 34 may be substituted with one of the aforementioned polishing heads of a different geometrical shape. Sub-aperture ring-tools may be considered a variation on the small-area tool with the polishing head being of ring-shaped configuration with surface contact during polishing being from 3% to 50% of the work piece surface. - It is further known that sub-aperture tools are commonly made from materials, such as felt, wood, cast iron, lead, and woven polymers, that allow free-abrasive particles to become imbedded within the material so that relative motion is generated between the abrasive particles and the part. Such materials allow free abrasive particles to imbed themselves within this carrier, allowing the tools to wear which is a detriment when trying to control material removal precisely. The concept of a compliant tool that does not allow free abrasive particles to imbed themselves and therefore is resistant to wear, provides advantage in precision polishing.
- One precision polishing method, Elastic Emission Machining (EEM) uses this concept where a polishing tool (with a spherical or flat configuration) is made from an elastic solid. This tool is precisely controlled to maintain a minute gap between itself and the part surface within a temperature-controlled bath of free-abrasive slurry. The tool is rotated at high speed and is driven to traverse the part surface creating a hydrodynamic bearing at the tool-part interface gap. This situation allows abrasive particles to be projected against the surface being conditioned with sufficient energy to cause elastic penetration and subsequent precision material removal.
- As with any method that uses a rotating tool, the area at the tool's center of rotation remains stationary—creating a “dead zone.” As the radial distance from the center of rotation increases, the tangential velocity also increases. Therefore, when polishing with sub-aperture tools, the greatest removal and subsequent benefit comes from a contact point radially distant from the tools center of rotation. For spherical or conical polishing tools, the tool must be tipped at an angle to provide needed tangential velocity. In order to generate productive velocities for polishing, spherical and conical polishing tools either need to be rotated at very high speeds or tipped at a large angle or a combination of the two. When very small tools are used, a combination of the two is required to gain maximum benefit.
- Referring to
FIGS. 4-7 , limitations exist when attempting to polish deep concave surfaces, where a large angle would restrict the polishing capability of the tool. For example, using a tool with a spherical tip, an impractical angle of nearly 60 degrees would be required to achieve the same surface speed as a toroidal tip of the same overall diameter.FIG. 4 illustrates this example, where thearbor 32 of the spherical tipped tool interferes with thecurved surface 40 of thepart 42. Similar limitations exist for cylindrical and “flat” sub-aperture tools. As depicted inFIGS. 5, 6 , and 7, cylindrical and “flat”sub-aperture tools 46 havingarbor 32 andpolishing surface 48 do not conform tocurved surfaces 40 of the work piece orpart 42 well and therefore restrict their application for polishing these surfaces. Thecylindrical sub-aperture tool 46 allows minimum tilt while allowing maximum tangential velocity to be achieved, however, the contact area is crescent-like and tends to be non-uniform in this configuration, which is detrimental to precision polishing. If used without any tilt, benefits are realized from the maximized diameter, but fluid flow is restricted and the ability to polish severe or steep aspheres is limited. - Therefore, the need persists in the art for a precision polishing element for polishing optical surfaces without adversely affecting the quality of the surface.
- It is, therefore, an object of the invention to provide a precision polishing tool capable of uniformly polishing optical surfaces.
- Another object of the invention is to provide a sub-aperture tool that minimizes tilt limitations and conforms to the surface of the work piece to be polished.
- The present invention is directed to overcoming one or more of the problems set forth above. Briefly summarized, according to one aspect of the present invention, a precision polishing element for polishing a work piece surface has a compliant, toroidal polishing member mountable to a support member. The compliant, toroidal polishing member has an active polishing surface extended uniformly beyond a peripheral surface of the support member for engaging the work piece surface.
- The tool disclosed provides greater advantage for free-abrasive type polishing operations, like EEM, due to the toroidal geometry. The toroidal shape allows shallow contact angles to be used, providing significant practical advantage for polishing steep concave surfaces. The toroidal shape is also advantageous due to the low axial profile, while providing radial distance to maximize tangential speed for material removal. The shape of the toroid also provides a uniform geometry that allows for polishing fluid to be transported along the circumference, providing the necessary flow required for polishing. In addition, the contact area generated at the tool-part interface tends to be very uniform and consistent, appearing oval in shape, which is essential for deterministic polishing.
- The above and other objects, features, and advantages of the present invention will become more apparent when taken in conjunction with the following description and drawings wherein identical reference numerals have been used, where possible, to designate identical features that are common to the figures, and wherein:
-
FIG. 1 is an isometric view of a prior art polishing tool; -
FIG. 2 is an isometric view of a prior art polishing tool with a polishing pad; -
FIG. 3 is an isometric view of a prior art sub-aperture polishing tool with a spherical polishing head; -
FIG. 4 shows the interference condition when a spherical sub-aperture polishing tool used in prior art, angled at nearly 60 degrees from vertical to achieve satisfactory surface speed for productive material removal, engages a concave surface; -
FIG. 5 shows a sub-aperture pitch/pad polishing tool used in prior art, engaged with a concave surface; -
FIG. 6 shows a sub-aperture pitch/pad polishing tool used in prior art, engaged with a convex surface; -
FIG. 7 shows a sub-aperture cylindrical polishing tool used in prior art, engaged with a convex surface; -
FIG. 8 illustrates the first example of the embodiment of the compliant toroidal polishing tool according to the invention; -
FIG. 9 is a close up view of the toroidal polishing tip of the compliant toroidal polishing tool according to the invention; -
FIG. 10 illustrates the second example of the embodiment of the polishing tool according to the invention; -
FIG. 11 is an exploded view of the third example of the embodiment of the polishing tool according to the invention; -
FIG. 12 is an exploded view of the fourth example of the embodiment of the polishing tool according to the invention; -
FIG. 13 is a close up view of the compliant toroidal tip; -
FIG. 14 is a cross-sectional view of the polishing tip showing a circular cross section of the compliant toroidal tip; -
FIG. 15 is a cross-sectional view of the polishing tip showing an oval cross-section of the compliant toroidal tip with the long side of the oval aligned perpendicular to the arbor axis; -
FIG. 16 is a cross-sectional view of the polishing tip showing an oval cross-section of the compliant toroidal tip with the long side of the oval aligned parallel to the arbor axis; -
FIG. 17 is a cross-sectional view of the polishing tip showing a square cross-section with rounded corners of the compliant toroidal tip; -
FIG. 18A illustrates a typical clearance condition when a compliant toroidal polishing tool is used in service; and -
FIG. 18B illustrates the polishing tool of the invention in contact with the work piece. - Turning now to the drawings, and in particular to
FIGS. 8-13 , the complianttoroidal polishing element 50 of the invention is illustrated. Broadly defined, complianttoroidal polishing element 50 includes a support member, or mountingarbor 52, and a complianttoroidal polishing tip 54 mounted to the mountingarbor 52. Complianttoroidal polishing tip 54 preferably has a circumferential active polishingsurface 57 extending substantially symmetrically beyond the peripheral surface of the mountingarbor 52 for engaging thecurved surface 40 ofwork piece 42.Work piece 42 may comprise a variety of materials including metallic materials, ceramic materials, and vitreous materials. According toFIGS. 9-12 , the mountingarbor 52 may be constructed simply as a solid (as shown) or hollow cylinder. Referring toFIG. 11 , the mountingarbor 52 is preferably constructed with additional features, such as a locatingshoulder 51 for advantage in tool holding and repetitive placement. Mountingarbor 52 has adistal end 56 withsupport surface 58 for supporting complianttoroidal polishing tip 54. Uponsupport surface 58, a centeringboss 60 may be mounted which aids in providing concentric alignment oftoroidal polishing tip 54 during attachment. If provided, centeringboss 60 projects normally fromsupport surface 58 ofdistal end 56.Toroidal polishing tip 54 of toroidal geometry is then attached centrally to thesupport surface 58, whereby thetoroidal polishing tip 54 is concentric with the diameter of the mountingarbor 52. According toFIG. 13 , thetoroidal polishing tip 54 may have analignment port 70 concentric with its outside diameter intended to mate with centering boss 60 (FIG. 12 ) if provided on mountingarbor 52 to provide concentric alignment and to aid in attachment. - Attachment of the
toroidal polishing tip 54 to thearbor 52 may be accomplished in a variety of ways including adhesive, chemical, thermal, or mechanical bonding. Once joined, the complianttoroidal polishing tool 50 of the invention is ready for use. - Referring again to
FIGS. 9 and 10 , an important feature of complianttoroidal polishing element 50 is the complianttoroidal tip 54. The complianttoroidal tip 54 may be manufactured from a variety of compliant polymers such as, but not limited to, polyurethane, chloroprene, fluorocarbon, fluorosilicone, ethylene propylene, and nitrile. We prefer using nitrile because of its compliant properties. For advantageous sub-aperture deterministic polishing in the presence of free-abrasive lapping compound, the hardness of the complianttoroidal polishing tip 54 needs to be in the range of 40-95 on the Shore A scale. - Referring to
FIGS. 14-17 , the shape oftoroidal polishing tip 54 may deviate from a pure toroid and still provide advantage in polishing. According toFIG. 14 ,toroidal tip 54 has a substantially circular shape. According toFIG. 15 ,toroidal tip 54 has a substantially horizontally oriented oval shape. According toFIG. 16 ,toroidal tip 54 has a substantially vertically oval shape. According toFIG. 17 ,toroidal tip 54 has a substantially square shape withrounded corners 59. If used, centeringboss 60 should be made so arbor material does not extend beyond the boundary of thetoroidal polishing tip 54 to avoid risk of damage to part surface when polishing. - According to
FIG. 18A , in operations, complianttoroidal polishing element 50 is mounted in arotary polishing machine 80 for polishing a work piece. As shown inFIG. 18B , the polishingsurface 57 engagescurved surface 40 ofwork piece 42 for polishing. An important advantage of complianttoroidal polishing element 50 is that aclearance 64 is formed between the mountingarbor 52 and thecurved surface 40 of thework piece 42. Experience suggests that complianttoroidal polishing element 50 should be angled at about 30 degrees from a centerline extending normally through thecurved surface 40 for most efficient operation. According to our experience, this arrangement produces satisfactory surface speed for productive material removal during polishing. - The invention has been described with reference to a preferred embodiment. However, it will be appreciated that variations and modifications can be effected by a person of ordinary skill in the art without departing from the scope of the invention.
-
- 10 full-aperture pitch polishing tool
- 12 grooves
- 14 support surface
- 16 shank
- 20 full-aperture pad polishing tool
- 22 pad mounting surface
- 24 polishing pad
- 30 sub-aperture tool
- 32 arbor
- 34 spherical polishing head
- 40 curved surface
- 42 work piece
- 46 sub-aperture tool
- 48 polishing surface
- 50 compliant toroidal polishing element
- 51 locating shoulder
- 52 mounting arbor
- 54 polishing tip
- 56 distal end
- 57 polishing surface
- 58 support surface
- 59 rounded corners
- 60 centering boss
- 64 clearance
- 70 alignment port
- 80 rotary polishing machine
Claims (17)
1. A machine for polishing a work piece surface, comprising a polishing element for polishing the work piece surface, said polishing element having a compliant, toroidal polishing member mountable to a support member, said compliant, toroidal polishing member having a circumferential active polishing surface extending beyond a peripheral surface of said support member for engaging said work piece surface; and,
a drive means operably associated with said polishing element for rotating said polishing element in contact with said work piece surface.
2. The machine recited in claim 1 wherein said compliant, toroidal polishing member comprises a material selected from the group consisting of an elastic solid material, a polymeric material, and a mixture thereof.
3. The machine recited in claim 2 wherein said polymeric material is selected from the group consisting of: polyurethane, chloroprene, fluorocarbon, fluorosilicone, ethylene propylene, and nitrile.
4. The machine recited in claim 2 wherein said polymeric material is nitrile.
5. The machine recited in claim 2 wherein said active polishing surface of said toroidal, polishing member is at least partially conformable with a surface of said work piece surface being polished.
6. The machine recited in claim 1 , wherein said support member is mounted to said compliant, toroidal polishing member with an adhesive bonding material.
7. The machine recited in claim 1 wherein said support member is mounted to said compliant, toroidal polishing member by chemical bonding.
8. The machine recited in claim 1 wherein said support member is mounted to said compliant, toroidal polishing member by thermal bonding.
9. The machine recited in claim 1 wherein said support member is mounted to said compliant, toroidal polishing member by mechanical bonding.
10. The machine recited in claim 1 said active polishing surface has a Shore A hardness in the range of about 40-95.
11. The machine recited in claim 1 wherein said compliant, toroidal polishing member has a substantially elongated shape along a radial axis.
12. The machine recited in claim 1 wherein said compliant, toroidal polishing member has a substantially elongated shape along an axial axis.
13. The machine recited in claim 1 wherein said compliant, toroidal polishing member has a substantially square shape with rounded end edge portions.
14. The machine recited in claim 1 wherein said work piece surface is an optical surface.
15. The machine recited in claim 1 wherein said work piece surface is ceramic.
16. The machine recited in claim 1 wherein said work piece surface is a metal.
17. The machine recited in claim 1 wherein said work piece surface is a vitreous material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/318,789 US20050101232A1 (en) | 2002-12-13 | 2002-12-13 | Machine for polishing the surface of a work piece |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/318,789 US20050101232A1 (en) | 2002-12-13 | 2002-12-13 | Machine for polishing the surface of a work piece |
Publications (1)
Publication Number | Publication Date |
---|---|
US20050101232A1 true US20050101232A1 (en) | 2005-05-12 |
Family
ID=34549075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/318,789 Abandoned US20050101232A1 (en) | 2002-12-13 | 2002-12-13 | Machine for polishing the surface of a work piece |
Country Status (1)
Country | Link |
---|---|
US (1) | US20050101232A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050054276A1 (en) * | 2003-09-05 | 2005-03-10 | Boris Shamshidov | Method for reducing wear of mechanically interacting surfaces |
US20080166955A1 (en) * | 2007-01-10 | 2008-07-10 | Fricso Ltd. | Tribological surface and lapping method and system therefor |
US20160276203A1 (en) * | 2014-11-23 | 2016-09-22 | M Cubed Technologies, Inc. | Wafer pin chuck fabrication and repair |
US20170080542A1 (en) * | 2014-06-10 | 2017-03-23 | Olympus Corporation | Polishing tool, polishing method and polishing apparatus |
US20180099371A1 (en) * | 2015-08-14 | 2018-04-12 | M Cubed Technologies, Inc. | Method for removing contamination from a chuck surface |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4274232A (en) * | 1977-09-14 | 1981-06-23 | Minnesota Mining And Manufacturing Company | Friction grip pad |
US4291507A (en) * | 1979-11-28 | 1981-09-29 | Littlehorn Jr John J | High speed grinding wheel for glass |
US4768308A (en) * | 1986-12-17 | 1988-09-06 | University Of Rochester | Universal lens polishing tool, polishing apparatus and method of polishing |
US5681209A (en) * | 1996-01-29 | 1997-10-28 | Constant Velocity Systems, Inc. | Housing grinding machine |
US6033449A (en) * | 1997-11-17 | 2000-03-07 | Cooper; Alex | Polishing tool |
US6371837B1 (en) * | 1997-11-10 | 2002-04-16 | 3M Innovative Properties Company | Method of refining a surface |
-
2002
- 2002-12-13 US US10/318,789 patent/US20050101232A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4274232A (en) * | 1977-09-14 | 1981-06-23 | Minnesota Mining And Manufacturing Company | Friction grip pad |
US4291507A (en) * | 1979-11-28 | 1981-09-29 | Littlehorn Jr John J | High speed grinding wheel for glass |
US4768308A (en) * | 1986-12-17 | 1988-09-06 | University Of Rochester | Universal lens polishing tool, polishing apparatus and method of polishing |
US5681209A (en) * | 1996-01-29 | 1997-10-28 | Constant Velocity Systems, Inc. | Housing grinding machine |
US6371837B1 (en) * | 1997-11-10 | 2002-04-16 | 3M Innovative Properties Company | Method of refining a surface |
US6033449A (en) * | 1997-11-17 | 2000-03-07 | Cooper; Alex | Polishing tool |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050054276A1 (en) * | 2003-09-05 | 2005-03-10 | Boris Shamshidov | Method for reducing wear of mechanically interacting surfaces |
US7134939B2 (en) * | 2003-09-05 | 2006-11-14 | Fricso Ltd. | Method for reducing wear of mechanically interacting surfaces |
US20080166955A1 (en) * | 2007-01-10 | 2008-07-10 | Fricso Ltd. | Tribological surface and lapping method and system therefor |
US20170080542A1 (en) * | 2014-06-10 | 2017-03-23 | Olympus Corporation | Polishing tool, polishing method and polishing apparatus |
US20160276203A1 (en) * | 2014-11-23 | 2016-09-22 | M Cubed Technologies, Inc. | Wafer pin chuck fabrication and repair |
US9941148B2 (en) * | 2014-11-23 | 2018-04-10 | M Cubed Technologies, Inc. | Wafer pin chuck fabrication and repair |
US20180182657A1 (en) * | 2014-11-23 | 2018-06-28 | M Cubed Technologies, Inc. | Wafer pin chuck fabrication and repair |
US10242905B2 (en) * | 2014-11-23 | 2019-03-26 | M Cubed Technologies, Inc. | Wafer pin chuck fabrication and repair |
US20180099371A1 (en) * | 2015-08-14 | 2018-04-12 | M Cubed Technologies, Inc. | Method for removing contamination from a chuck surface |
US10792778B2 (en) * | 2015-08-14 | 2020-10-06 | M Cubed Technologies, Inc. | Method for removing contamination from a chuck surface |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5020283A (en) | Polishing pad with uniform abrasion | |
US5398459A (en) | Method and apparatus for polishing a workpiece | |
JP6421291B2 (en) | Abrasive brush | |
KR19990083128A (en) | Method for chamfering a wafer | |
US7722439B2 (en) | Semiconductor device manufacturing apparatus and method | |
US20240123567A1 (en) | Double-sided polishing method for optical lens | |
US20050101232A1 (en) | Machine for polishing the surface of a work piece | |
US20040116058A1 (en) | Sub-aperture compliant toroidal polishing element | |
CN1072089C (en) | Grinding/polishing method, grinding/polishing tool and manufacturing method of the same | |
US9409274B2 (en) | Tool for the polishing of optical surfaces | |
JPH10118940A (en) | Grinding wheel and grinding liquid supply method | |
JP2005028542A (en) | Visco-elastic polisher and polishing method using this polisher | |
JPH09290361A (en) | Ceramics-made multigroove roller for wire saw | |
JPH1133918A (en) | Grinding wheel for working inside and outside diameter of substrate for magnetic recording medium, and method for working inside and outside diameter | |
JP2001025948A (en) | Spherical grinding wheel | |
JPH09201761A (en) | Polishing process method of compound material | |
US7150676B2 (en) | Dual motion polishing tool | |
JP2006281320A (en) | General purpose machining system | |
JPS61265264A (en) | Working tool using free abrasive grains | |
JPH0642054U (en) | Work transfer carrier | |
JPH05269671A (en) | Diamond wheel | |
JPH07266211A (en) | Grinding and polishing wheel | |
KR940004677B1 (en) | Holding device for polishing optical element | |
JPH075983Y2 (en) | Deformed cup type grinding wheel | |
JPH04217458A (en) | Work face grinding wheel shaft for grinder |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: EASTMAN KODAK COMPANY, NEW YORK Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MEISSNER, STEPHEN C.;REEL/FRAME:013593/0463 Effective date: 20021212 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |