US20080042376A1 - Probe station - Google Patents
Probe station Download PDFInfo
- Publication number
- US20080042376A1 US20080042376A1 US11/975,243 US97524307A US2008042376A1 US 20080042376 A1 US20080042376 A1 US 20080042376A1 US 97524307 A US97524307 A US 97524307A US 2008042376 A1 US2008042376 A1 US 2008042376A1
- Authority
- US
- United States
- Prior art keywords
- chuck
- rotational member
- chuck assembly
- rotational
- assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2887—Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T279/00—Chucks or sockets
- Y10T279/29—More than one set of gripping means
Definitions
- the present application relates to a probe station.
- a probe station comprises a base 10 (shown partially) which supports a platen 12 through a number of jacks 14 a, 14 b, 14 c, 14 d which selectively raise and lower the platen vertically relative to the base by a small increment (approximately one-tenth of an inch) for purposes to be described hereafter. Also supported by the base 10 of the probe station is a motorized positioner 16 having a rectangular plunger 18 which supports a movable chuck-assembly 20 for supporting a wafer or other test device.
- the chuck assembly 20 passes freely through a large aperture 22 in the platen 12 which permits the chuck assembly to be moved independently of the platen by the positioner 16 along X, Y and Z axes, i.e., horizontally along two mutually-perpendicular axes X and Y, and vertically along the Z axis.
- the platen 12 when moved vertically by the jacks 14 , moves independently of the chuck assembly 20 and the positioner 16 .
- the probe positioner 24 has micrometer adjustments 34 , 36 and 38 for adjusting the position of the probe holder 28 , and thus the probe 30 , along the X, Y and Z axes, respectively, relative to the chuck assembly 20 .
- the Z axis is exemplary of what is referred to herein loosely as the “axis of approach” between the probe holder 28 and the chuck assembly 20 , although directions of approach which are neither vertical nor linear, along which the probe tip and wafer or other test device are brought into contact with each other, are also intended to be included within the meaning of the term “axis of approach.”
- a further micrometer adjustment 40 adjustably tilts the probe holder 28 to adjust planarity of the probe with respect to the wafer or other test device supported by the chuck assembly 20 .
- As many as twelve individual probe positioners 24 each supporting a respective probe, may be arranged on the platen 12 around the chuck assembly 20 so as to converge radially toward the chuck assembly similarly to the spokes of a wheel.
- each individual positioner 24 can independently adjust its respective probe in the X, Y and Z directions, while the jacks 14 can be actuated to raise or lower the platen 12 and thus all of the positioners 24 and their respective probes in unison.
- An environment control enclosure is composed of an upper box portion 42 rigidly attached to the platen 12 , and a lower box portion 44 rigidly attached to the base 10 . Both portions are made of steel or other suitable electrically conductive material to provide EMI shielding.
- an electrically conductive resilient foam gasket 46 preferably composed of silver or carbon-impregnated silicone, is interposed peripherally at their mating juncture at the front of the enclosure and between the lower portion 44 and the platen 12 so that an EMI, substantially hermetic, and light seal are all maintained despite relative vertical movement between the two box portions 42 and 44 .
- a similar gasket 47 is preferably interposed between the portion 42 and the top of the platen to maximize sealing.
- the top of the upper box portion 42 comprises an octagonal steel box 48 having eight side panels such as 49 a and 49 b through which the extending members 26 of the respective probe positioners 24 can penetrate movably.
- Each panel comprises a hollow housing in which a respective sheet 50 of resilient foam, which may be similar to the above-identified gasket material, is placed. Slits such as 52 are partially cut vertically in the foam in alignment with slots 54 formed in the inner and outer surfaces of each panel housing, through which a respective extending member 26 of a respective probe positioner 24 can pass movably.
- the slitted foam permits X, Y and Z movement of the extending members 26 of each probe positioner, while maintaining the EMI, substantially hermetic, and light seal provided by the enclosure.
- the foam sheet 50 is sandwiched between a pair of steel plates 55 having slots 54 therein, such plates being slidable transversely within the panel housing through a range of movement encompassed by larger slots 56 in the inner and outer surfaces of the panel housing.
- a circular viewing aperture 58 is provided, having a recessed circular transparent sealing window 60 therein.
- a bracket 62 holds an apertured sliding shutter 64 to selectively permit or prevent the passage of light through the window.
- a stereoscope (not shown) connected to a CRT monitor can be placed above the window to provide a magnified display of the wafer or other test device and the probe tip for proper probe placement during set-up or operation.
- the window 60 can be removed and a microscope lens (not shown) surrounded by a foam gasket can be inserted through the viewing aperture 58 with the foam providing EMI, hermetic and light sealing.
- the upper box portion 42 of the environment control enclosure also includes a hinged steel door 68 which pivots outwardly about the pivot axis of a hinge 70 as shown in FIG. 2A .
- the hinge biases the door downwardly toward the top of the upper box portion 42 so that it forms a tight, overlapping, sliding peripheral seal 68 a with the top of the upper box portion.
- the sealing integrity of the enclosure is likewise maintained throughout positioning movements by the motorized positioner 16 due to the provision of a series of four sealing plates 72 , 74 , 76 and 78 stacked slidably atop one another.
- the sizes of the plates progress increasingly from the top to the bottom one, as do the respective sizes of the central apertures 72 a, 74 a, 76 a and 78 a formed in the respective plates 72 , 74 , 76 and 78 , and the aperture 79 a formed in the bottom 44 a of the lower box portion 44 .
- the central aperture 72 a in the top plate 72 mates closely around the bearing housing 18 a of the vertically-movable plunger 18 .
- the next plate in the downward progression, plate 74 has an upwardly-projecting peripheral margin 74 b which limits the extent to which the plate 72 can slide across the top of the plate 74 .
- the central aperture 74 a in the plate 74 is of a size to permit the positioner 16 to move the plunger 18 and its bearing housing 18 a transversely along the X and Y axes until the edge of the top plate 72 abuts against the margin 74 b of the plate 74 .
- the size of the aperture 74 a is, however, too small to be uncovered by the top plate 72 when such abutment occurs, and therefore a seal is maintained between the plates 72 and 74 regardless of the movement of the plunger 18 and its bearing housing along the X and Y axes.
- the chuck assembly 20 is a modular construction usable either with or without an environment control enclosure.
- the plunger 18 supports an adjustment plate 79 which in turn supports first, second and third chuck assembly elements 80 , 81 and 83 , respectively, positioned at progressively greater distances from the probe(s) along the axis of approach.
- Element 83 is a conductive rectangular stage or shield 83 which detachably mounts conductive elements 80 and 81 of circular shape.
- the element 80 has a planar upwardly-facing wafer-supporting surface 82 having an array of vertical apertures 84 therein.
- These apertures communicate with respective chambers separated by O-rings 88 , the chambers in turn being connected separately to different vacuum lines 90 a, 90 b, 90 c ( FIG. 6 ) communicating through separately-controlled vacuum valves (not shown) with a source of vacuum.
- the respective vacuum lines selectively connect the respective chambers and their apertures to the source of vacuum to hold the wafer, or alternatively isolate the apertures from the source of vacuum to release the wafer, in a conventional manner.
- the separate operability of the respective chambers and their corresponding apertures enables the chuck to hold wafers of different diameters.
- auxiliary chucks such as 92 and 94 are detachably mounted on the corners of the element 83 by screws (not shown) independently of the elements 80 and 81 for the purpose of supporting contact substrates and calibration substrates while a wafer or other test device is simultaneously supported by the element 80 .
- Each auxiliary chuck 92 , 94 has its own separate upwardly-facing planar surface 100 , 102 respectively, in parallel relationship to the surface 82 of the element 80 .
- Vacuum apertures 104 protrude through the surfaces 100 and 102 from communication with respective chambers within the body of each auxiliary chuck.
- Each of these chambers in turn communicates through a separate vacuum line and a separate independently-actuated vacuum valve (not shown) with a source of vacuum, each such valve selectively connecting or isolating the respective sets of apertures 104 with respect to the source of vacuum independently of the operation of the apertures 84 of the element 80 , so as to selectively hold or release a contact substrate or calibration substrate located on the respective surfaces 100 and 102 independently of the wafer or other test device.
- An optional metal shield 106 may protrude upwardly from the edges of the element 83 to surround the other elements 80 , 81 and the auxiliary chucks 92 , 94 .
- the electrical insulation results from the fact that, in addition to the resilient dielectric O-rings 88 , dielectric spacers 85 and dielectric washers 86 are provided. These, coupled with the fact that the screws 96 pass through oversized apertures in the lower one of the two elements which each screw joins together thereby preventing electrical contact between the shank of the screw and the lower element, provide the desired insulation. As is apparent in FIG.
- the dielectric spacers 85 extend over only minor portions of the opposing surface areas of the interconnected chuck assembly elements, thereby leaving air gaps between the opposing surfaces over major portions of their respective areas. Such air gaps minimize the dielectric constant in the spaces between the respective chuck assembly elements, thereby correspondingly minimizing the capacitance between them and the ability for electrical current to leak from one element to another.
- the spacers and washers 85 and 86 are constructed of a material having the lowest possible dielectric constant consistent with high dimensional stability and high volume resistivity.
- a suitable material for the spacers and washers is glass epoxy, or acetyl homopolymer marketed under the trademark Delrin by E. I. DuPont.
- the chuck assembly 20 also includes a pair of detachable electrical connector assemblies designated generally as 108 and 110 , each having at least two conductive connector elements 108 a, 108 b and 110 a, 110 b, respectively, electrically insulated from each other, with the connector elements 108 b and 110 b preferably coaxially surrounding the connector elements 108 a and 110 a as guards therefor.
- the connector assemblies 108 and 110 can be triaxial in configuration so as to include respective outer shields 108 c, 110 c surrounding the respective connector elements 108 b and 110 b, as shown in FIG. 7 .
- the outer shields 108 c and 110 c may, if desired, be connected electrically through a shielding box 112 and a connector supporting bracket 113 to the chuck assembly element 83 , although such electrical connection is optional particularly in view of the surrounding EMI shielding enclosure 42 , 44 .
- the respective connector elements 108 a and 110 a are electrically connected in parallel to a connector plate 114 matingly and detachably connected along a curved contact surface 114 a by screws 114 b and 114 c to the curved edge of the chuck assembly element 80 .
- the connector elements 108 b and 110 b are connected in parallel to a connector plate 116 similarly matingly connected detachably to element 81 .
- the connector elements pass freely through a rectangular opening 112 a in the box 112 , being electrically insulated from the box 112 and therefore from the element 83 , as well as being electrically insulated from each other.
- Set screws such as 118 detachably fasten the connector elements to the respective connector plates 114 and 116 .
- triaxial cables 118 and 120 form portions of the respective detachable electrical connector assemblies 108 and 110 , as do their respective triaxial detachable connectors 122 and 124 which penetrate a wall of the lower portion 44 of the environment control enclosure so that the outer shields of the triaxial connectors 122 , 124 are electrically connected to the enclosure.
- Further triaxial cables 122 a, 124 a are detachably connectable to the connectors 122 and 124 from suitable test equipment such as a Hewlett-Packard 4142B modular DC source/monitor or a Hewlett-Packard 4284A precision LCR meter, depending upon the test application.
- the cables 118 and 120 are merely coaxial cables or other types of cables having only two conductors, one conductor interconnects the inner (signal) connector element of a respective connector 122 or 124 with a respective connector element 108 a or 110 a, while the other conductor connects the intermediate (guard) connector element of a respective connector 122 or 124 with a respective connector element 108 b, 110 b.
- U.S. Pat. No. 5,532,609 discloses a probe station and chuck and is hereby incorporated by reference.
- FIG. 1 is a partial front view of an exemplary embodiment of a wafer probe station constructed in accordance with the present invention.
- FIG. 2 is a top view of the wafer probe station of FIG. 1 .
- FIG. 2A is a partial top view of the wafer probe station of FIG. 1 with the enclosure door shown partially open.
- FIG. 3 is a partially sectional and partially schematic front view of the probe station of FIG. 1 .
- FIG. 3A is an enlarged sectional view taken along line 3 A- 3 A of FIG. 3 .
- FIG. 4 is a top view of the sealing assembly where the motorized positioning mechanism extends through the bottom of the enclosure.
- FIG. 5A is an enlarged top detail view taken along line 5 A- 5 A of FIG. 1 .
- FIG. 5B is an enlarged top sectional view taken along line 5 B- 5 B of FIG. 1 .
- FIG. 6 is a partially schematic top detail view of the chuck assembly, taken along line 6 - 6 of FIG. 3 .
- FIG. 7 is a partially sectional front view of the chuck assembly of FIG. 6 .
- FIG. 8 illustrates an adjustment plate and a surrounding positional stage.
- FIG. 9 illustrates an extended positional stage.
- FIG. 10 illustrates a locking mechanism for the positional stage.
- FIG. 11 illustrates a locking mechanism for the adjustment plate and a tab for rotational engagement of the adjustment plate.
- FIG. 12 illustrates traditional adjustment of the orientation of the chuck.
- FIG. 13 illustrates a modified adjustment of the orientation of the chuck.
- FIG. 14 illustrates a probe station supported by an isolation stage, both of which are surrounded by a frame.
- FIG. 15 illustrates the engagement of the sides of the environmental control enclosure.
- FIG. 16 illustrates the engagement of a door to the environmental control enclosure.
- the probes may be calibrated by using test structures on the calibration substrates supported by the auxiliary chucks 92 and 94 .
- the chuck assembly 20 is normally aligned with the probes.
- a wafer placed on the chuck assembly 20 is not normally accurately aligned with the auxiliary chucks 92 and 94 , and hence the probes.
- the entire chuck assembly 20 including the auxiliary chucks 92 and 94 , is rotated to align the wafer with the positioners 24 and their respective probes.
- the chuck assembly 20 is rotated to realign the test structures on the calibration substrates supported by the auxiliary chucks 92 and 94 with the probes.
- the entire chuck assembly 20 is again rotated to align the wafer with the positioners 24 and their respective probes.
- the theta adjustment of the chuck assembly 20 may not be sufficiently accurate for increasingly small device structures. Multiple theta adjustments of the chuck assembly 20 may result in a slight misalignment of the chuck assembly 20 . As a result of such misalignment it may become necessary for the operator to painstakingly manually adjust the theta orientation of the chuck assembly 20 .
- the environmental control enclosure is sufficiently large to permit the chuck assembly to move the entire wafer under the probes for testing. However, if the chuck assembly 20 is rotatable with respect to the environmental control enclosure then the environmental control enclosure needs additional width to prevent the corners of the chuck assembly 20 from impacting the sides of the environmental control enclosure.
- the encoders within the stage supporting the chuck assembly include software based compensation for non-proportional movement to achieve accurate movement in the X and Y directions over the entire range of movement.
- the software compensation of the encoders also depends on the X and Y position of the chuck relative to the probes. In other words, at different X and Y positions over the entire range of movement of the chuck the amount of compensation provided to the encoders may vary. This variable compensation depending on the X and Y position of the chuck results in complicated spatial calculations for appropriate encoder control. The spatial calculations are further complicated when the chuck is rotated to accommodate the auxiliary chuck calibration.
- FIG. 8 illustrates the adjustment plate 182 and a surrounding positional stage 184 .
- auxiliary chucks 180 preferably maintain a fixed X and Y orientation with respect to the probe positioners and their respective probes. In this manner, the auxiliary chucks are always properly orientated with the probes positioners and the probes.
- the chuck (supported by the adjustment plate 182 ) with a wafer thereon is rotated to the proper theta position with respect to the probes for probing the wafer. Thereafter, the theta adjustment of the chuck may remain stationary during subsequent probing of the wafer and recalibration using the auxiliary chucks. In this manner, typically the chuck assembly needs to only be moved in X, Y, and potentially Z directions to achieve complete probing of an entire wafer. Accordingly, the environmental control enclosure does not necessarily need to be sufficiently wide to accommodate rotation of the positional stage. Also, the encoder compensation may be simplified.
- some existing probe assemblies include the chuck assembly elements supported by a set of linear bearings that permit the upper chuck assembly elements together with the bearing to be slid out of the environment enclosure for loading the wafer onto the chuck assembly.
- the resulting structure is heavy, and positioned on top of and supported by a plunger affixed to the top of the Z-axis movement of the chuck assembly 20 .
- a modified arrangement includes a central plunger 200 providing rotational movement to the adjustment plate 182 and hence a chuck supported thereon.
- the central plunger 200 may include a receptacle 201 that moves within a tab 203 .
- the positional stage 184 and auxiliary chucks 180 are supported by the stage 204 surrounding the central plunger 200 which provides the X, Y, and Z movement.
- the stage includes the central plunger 200 .
- the positional stage 184 includes an internal bearing (not shown) upon which the adjustment plate 182 rotates.
- the positional stage 184 is the primary load bearing member for the adjustment plate 182 and chuck thereon.
- Spaced apart linear bearings 206 provide a vertical and lateral load bearing support to the rotational chuck while the central plunger 200 provides the rotational movement to the chuck without (free from) being the primary load bearing member.
- the plunger 200 preferably maintains substantially constant vertical position with respect to the adjustment plate 182 when the stage 204 provides vertical “Z” movement of the positional stage.
- Unlocking a lock permits the positional stage 184 , including the rotational chuck, to slide out of the probe station for easier placement of wafers thereon. Normally when the positional stage 184 is extended, the wafer thereon is adjusted or otherwise replaced with a different wafer for subsequent testing. After repeated movement of the stage in and out of the probe station, together with rotational movement of the chuck (theta adjustment), the present inventors determined that the resulting theta movement of the chuck may be significantly different than the initial “zero” theta. In other words, after repeated use the adjustment plate 182 may be offset by a significant theta offset.
- the adjustment plate 182 may include a rotational theta limit about “zero” to minimize potential damage.
- a suitable rotational limit may be . ⁇ .7.5 degrees.
- a further limitation exists in the case that the adjustment plate 182 is rotated to a position near its rotational limit because the user may not be permitted further rotational movement in that direction when aligning another wafer thereby resulting in frustration to the user. To overcome these limitations the rotational orientation of the adjustment plate 182 (chuck) is returned to “zero” prior to sliding the positional stage 184 out of the probe station.
- the chuck is always at a constant rotational position, such as 0 degrees, when a wafer is positioned thereon so that the likelihood of damaging the probe station by unintended tension on the wires and other interconnections to the chuck assembly is reduced.
- the range where the chuck is orientated prior to sliding out the positional stage 184 may be any predefined range of values. Also, the user maintains the ability to rotate the adjustment plate 182 as necessary during further alignment.
- the “zero” theta lockout may be provided by a mechanical arrangement together with a locking mechanism.
- a rotational handle 210 is secured to the upper plate 212 of the positional stage 184 .
- a block 216 as secured to the lower plate 214 of the positional stage 184 , which is rigidly attached to the housing 204 .
- a finger 218 is inserted within a slot 220 defined by the block 216 to rigidly lock the upper plate 212 in position.
- the handle 210 is rotated to remove the finger 218 from the slot 220 to permit relative movement of the upper plate 212 with respect to the lower plate 214 .
- the handle 210 includes a shaft 230 with a slot 232 in the end thereof. With the handle 210 in the closed position, the slot 232 is aligned with an alignment plate 234 attached to the rear of the adjustment plate 182 . The adjustment plate 182 may be rotated to properly align the wafer thereon, with the alignment plate 234 traveling within the slot 232 . To unlock the handle 210 the adjustment plate 182 is realigned to “zero” thus permitting rotational movement of the handle 210 , while simultaneously preventing rotational movement (substantially all) of the adjustment plate 182 . It is to be understood that any suitable lock out mechanism may likewise be used.
- the upper surface of the chuck assembly should have a suitable orientation with respect to the probes, such as co-planar.
- the positional stage 184 is extended to provide convenient access to loosen threaded screws 240 .
- the threaded screws 240 interconnect the chuck to the adjustment plate 182 .
- an adjusting screw 242 such as a jack screw, is rotated to adjust the spacing between the adjustment plate and the chuck.
- the threaded screw 240 is tightened to rigidly secure the adjustment plate to the chuck.
- the positional stage is then slid back into the probe station and locked in place.
- the actual orientation of the upper surface of the chuck assembly may be determined.
- the positional stage is adjusted several times to achieve accurate orientation.
- this trial and error process of extending the positioning stage from the probe station, adjusting the orientation of the upper surface of the chuck assembly by adjusting one or more adjusting screws 242 , and repositioning the positioning stage in the probe station may take considerable time.
- the present inventors came to the realization that loosening the threaded screw 240 relaxes the chuck from the adjustment plate 182 .
- the amount of relaxation is hard to determine because the weight of the chuck assembly would make it appear that the chuck, jack screw, and adjustment plate are held together. Also, by adjusting the jack screw 242 and measuring the resulting movement of the chuck assembly provides an inaccurate result.
- the present inventors determined that the threaded screw 240 should be tensioned so that the chuck does not significantly relax with respect to the adjustment plate. Referring to FIG.
- one technique to tension the threaded screw is to provide a set of springs 250 under the head of the screw to provide an outwardly pressing force thereon when the threaded screw 240 is loosened.
- the relaxation between the chuck and the adjustment plate is reduced, resulting in a more accurate estimate of the adjustment of the orientation of the upper chuck assembly element.
- the chuck assembly may be more easily oriented by adjusting the jack screws while the probe station is in its locked position within the probe station. Thereafter, the positioning stage is extended and the threaded screws are tightened.
- any structure may likewise be used to provide tension between the chuck assembly element and the adjustment plate while allowing adjustment of the spacing between the adjustment plate and the chuck assembly element, or otherwise adjusting the orientation of the chuck.
- the probe station may provide more accurate measurements.
- the probe station is placed on a flat table having a surface somewhat larger than the probe station itself to provide a stable surface and reduce the likelihood of inadvertently sliding the probe station off the table.
- the table includes isolation, such as pneumatic cylinders, between the floor and the table surface. Also, it is difficult to lift the probe station onto the table in a controlled manner that does not damage the table and/or probe station. Further, the probe station is prone to being damaged by being bumped.
- an integrated isolation stage, probe station, and frame provides the desired benefits, as illustrated in FIG. 14 .
- the integrated isolation stage and probe station eliminates the likelihood of the probe station falling off the isolation stage.
- the top of the isolation stage may likewise form the base for the probe station, which reduces the overall height of the probe station, while simultaneously providing a stable support for the probe station.
- a frame at least partially surrounds the isolation stage and the probe station.
Abstract
A probe station for testing a wafer.
Description
- This application is a division of U.S. patent application Ser. No. 11/083,677, filed Mar. 16, 2005, which is a continuation of U.S. patent application Ser. No. 09/881,312, filed Jun. 12, 2001, now U.S. Pat. No. 6,914,423, which claims the benefit of U.S. Provisional App. No. 60/230,552, filed Sep. 5, 2000.
- The present application relates to a probe station.
- With reference to
FIGS. 1, 2 and 3, a probe station comprises a base 10 (shown partially) which supports aplaten 12 through a number ofjacks base 10 of the probe station is amotorized positioner 16 having arectangular plunger 18 which supports a movable chuck-assembly 20 for supporting a wafer or other test device. Thechuck assembly 20 passes freely through alarge aperture 22 in theplaten 12 which permits the chuck assembly to be moved independently of the platen by thepositioner 16 along X, Y and Z axes, i.e., horizontally along two mutually-perpendicular axes X and Y, and vertically along the Z axis. Likewise, theplaten 12, when moved vertically by the jacks 14, moves independently of thechuck assembly 20 and thepositioner 16. - Mounted atop the
platen 12 are multiple individual probe positioners such as 24 (only one of which is shown), each having an extendingmember 26 to which is mounted aprobe holder 28 which in turn supports arespective probe 30 for contacting wafers and other test devices mounted atop thechuck assembly 20. Theprobe positioner 24 hasmicrometer adjustments probe holder 28, and thus theprobe 30, along the X, Y and Z axes, respectively, relative to thechuck assembly 20. The Z axis is exemplary of what is referred to herein loosely as the “axis of approach” between theprobe holder 28 and thechuck assembly 20, although directions of approach which are neither vertical nor linear, along which the probe tip and wafer or other test device are brought into contact with each other, are also intended to be included within the meaning of the term “axis of approach.” Afurther micrometer adjustment 40 adjustably tilts theprobe holder 28 to adjust planarity of the probe with respect to the wafer or other test device supported by thechuck assembly 20. As many as twelveindividual probe positioners 24, each supporting a respective probe, may be arranged on theplaten 12 around thechuck assembly 20 so as to converge radially toward the chuck assembly similarly to the spokes of a wheel. With such an arrangement, eachindividual positioner 24 can independently adjust its respective probe in the X, Y and Z directions, while the jacks 14 can be actuated to raise or lower theplaten 12 and thus all of thepositioners 24 and their respective probes in unison. - An environment control enclosure is composed of an
upper box portion 42 rigidly attached to theplaten 12, and alower box portion 44 rigidly attached to thebase 10. Both portions are made of steel or other suitable electrically conductive material to provide EMI shielding. To accommodate the small vertical movement between the twobox portions platen 12, an electrically conductiveresilient foam gasket 46, preferably composed of silver or carbon-impregnated silicone, is interposed peripherally at their mating juncture at the front of the enclosure and between thelower portion 44 and theplaten 12 so that an EMI, substantially hermetic, and light seal are all maintained despite relative vertical movement between the twobox portions upper box portion 42 is rigidly attached to theplaten 12, asimilar gasket 47 is preferably interposed between theportion 42 and the top of the platen to maximize sealing. - With reference to
FIGS. 5A and 5B , the top of theupper box portion 42 comprises anoctagonal steel box 48 having eight side panels such as 49 a and 49b through which the extendingmembers 26 of therespective probe positioners 24 can penetrate movably. Each panel comprises a hollow housing in which arespective sheet 50 of resilient foam, which may be similar to the above-identified gasket material, is placed. Slits such as 52 are partially cut vertically in the foam in alignment withslots 54 formed in the inner and outer surfaces of each panel housing, through which a respective extendingmember 26 of arespective probe positioner 24 can pass movably. The slitted foam permits X, Y and Z movement of the extendingmembers 26 of each probe positioner, while maintaining the EMI, substantially hermetic, and light seal provided by the enclosure. In four of the panels, to enable a greater range of X and Y movement, thefoam sheet 50 is sandwiched between a pair ofsteel plates 55 havingslots 54 therein, such plates being slidable transversely within the panel housing through a range of movement encompassed bylarger slots 56 in the inner and outer surfaces of the panel housing. - Atop the
octagonal box 48, acircular viewing aperture 58 is provided, having a recessed circulartransparent sealing window 60 therein. Abracket 62 holds an apertured slidingshutter 64 to selectively permit or prevent the passage of light through the window. A stereoscope (not shown) connected to a CRT monitor can be placed above the window to provide a magnified display of the wafer or other test device and the probe tip for proper probe placement during set-up or operation. Alternatively, thewindow 60 can be removed and a microscope lens (not shown) surrounded by a foam gasket can be inserted through theviewing aperture 58 with the foam providing EMI, hermetic and light sealing. Theupper box portion 42 of the environment control enclosure also includes a hingedsteel door 68 which pivots outwardly about the pivot axis of ahinge 70 as shown inFIG. 2A . The hinge biases the door downwardly toward the top of theupper box portion 42 so that it forms a tight, overlapping, sliding peripheral seal 68a with the top of the upper box portion. When the door is open, and thechuck assembly 20 is moved by thepositioner 16 beneath the door opening as shown inFIG. 2A , the chuck assembly is accessible for loading and unloading. - With reference to
FIGS. 3 and 4 , the sealing integrity of the enclosure is likewise maintained throughout positioning movements by themotorized positioner 16 due to the provision of a series of foursealing plates central apertures respective plates aperture 79 a formed in thebottom 44 a of thelower box portion 44. Thecentral aperture 72 a in thetop plate 72 mates closely around thebearing housing 18 a of the vertically-movable plunger 18. The next plate in the downward progression,plate 74, has an upwardly-projectingperipheral margin 74 b which limits the extent to which theplate 72 can slide across the top of theplate 74. Thecentral aperture 74 a in theplate 74 is of a size to permit thepositioner 16 to move theplunger 18 and its bearing housing 18 a transversely along the X and Y axes until the edge of thetop plate 72 abuts against themargin 74 b of theplate 74. The size of theaperture 74 a is, however, too small to be uncovered by thetop plate 72 when such abutment occurs, and therefore a seal is maintained between theplates plunger 18 and its bearing housing along the X and Y axes. Further movement of theplunger 18 and bearing housing in the direction of abutment of theplate 72 with themargin 74 b results in the sliding of theplate 74 toward theperipheral margin 76 b of the nextunderlying plate 76. Again, thecentral aperture 76 a in theplate 76 is large enough to permit abutment of theplate 74 with themargin 76 b, but small enough to prevent theplate 74 from uncovering theaperture 76 a, thereby likewise maintaining the seal between theplates plunger 18 and bearing-housing in the same direction causes similar sliding of theplates margin 78 b and the side of thebox portion 44, respectively, without theapertures plunger 18 along the X and Y axes by thepositioner 16, while maintaining the enclosure in a sealed condition despite such positioning movement. The EMI sealing provided by this structure is effective even with respect to the electric motors of thepositioner 16, since they are located below the sliding plates. - With particular reference to
FIGS. 3, 6 and 7, thechuck assembly 20 is a modular construction usable either with or without an environment control enclosure. Theplunger 18 supports anadjustment plate 79 which in turn supports first, second and thirdchuck assembly elements Element 83 is a conductive rectangular stage orshield 83 which detachably mountsconductive elements element 80 has a planar upwardly-facing wafer-supportingsurface 82 having an array ofvertical apertures 84 therein. These apertures communicate with respective chambers separated by O-rings 88, the chambers in turn being connected separately todifferent vacuum lines FIG. 6 ) communicating through separately-controlled vacuum valves (not shown) with a source of vacuum. The respective vacuum lines selectively connect the respective chambers and their apertures to the source of vacuum to hold the wafer, or alternatively isolate the apertures from the source of vacuum to release the wafer, in a conventional manner. The separate operability of the respective chambers and their corresponding apertures enables the chuck to hold wafers of different diameters. - In addition to the
circular elements element 83 by screws (not shown) independently of theelements element 80. Eachauxiliary chuck planar surface surface 82 of theelement 80.Vacuum apertures 104 protrude through thesurfaces apertures 104 with respect to the source of vacuum independently of the operation of theapertures 84 of theelement 80, so as to selectively hold or release a contact substrate or calibration substrate located on therespective surfaces optional metal shield 106 may protrude upwardly from the edges of theelement 83 to surround theother elements auxiliary chucks - All of the
chuck assembly elements chuck assembly element 79, are electrically insulated from one another even though they are constructed of electrically conductive metal and interconnected detachably by metallic screws such as 96. With reference toFIGS. 3 and 3 A, the electrical insulation results from the fact that, in addition to the resilient dielectric O-rings 88,dielectric spacers 85 anddielectric washers 86 are provided. These, coupled with the fact that thescrews 96 pass through oversized apertures in the lower one of the two elements which each screw joins together thereby preventing electrical contact between the shank of the screw and the lower element, provide the desired insulation. As is apparent inFIG. 3 , thedielectric spacers 85 extend over only minor portions of the opposing surface areas of the interconnected chuck assembly elements, thereby leaving air gaps between the opposing surfaces over major portions of their respective areas. Such air gaps minimize the dielectric constant in the spaces between the respective chuck assembly elements, thereby correspondingly minimizing the capacitance between them and the ability for electrical current to leak from one element to another. Preferably, the spacers andwashers - With reference to
FIGS. 6 and 7 , thechuck assembly 20 also includes a pair of detachable electrical connector assemblies designated generally as 108 and 110, each having at least twoconductive connector elements connector elements connector elements connector assemblies outer shields respective connector elements FIG. 7 . Theouter shields shielding box 112 and aconnector supporting bracket 113 to thechuck assembly element 83, although such electrical connection is optional particularly in view of the surroundingEMI shielding enclosure respective connector elements connector plate 114 matingly and detachably connected along acurved contact surface 114 a byscrews chuck assembly element 80. Conversely, theconnector elements connector plate 116 similarly matingly connected detachably toelement 81. The connector elements pass freely through arectangular opening 112 a in thebox 112, being electrically insulated from thebox 112 and therefore from theelement 83, as well as being electrically insulated from each other. Set screws such as 118 detachably fasten the connector elements to therespective connector plates - Either coaxial or, as shown,
triaxial cables electrical connector assemblies detachable connectors lower portion 44 of the environment control enclosure so that the outer shields of thetriaxial connectors triaxial cables connectors cables respective connector respective connector element respective connector respective connector element - The foregoing and other objectives, features, and advantages of the invention will be more readily understood upon consideration of the following detailed description of the invention, taken in conjunction with the accompanying drawings.
-
FIG. 1 is a partial front view of an exemplary embodiment of a wafer probe station constructed in accordance with the present invention. -
FIG. 2 is a top view of the wafer probe station ofFIG. 1 . -
FIG. 2A is a partial top view of the wafer probe station ofFIG. 1 with the enclosure door shown partially open. -
FIG. 3 is a partially sectional and partially schematic front view of the probe station ofFIG. 1 . -
FIG. 3A is an enlarged sectional view taken alongline 3A-3A ofFIG. 3 . -
FIG. 4 is a top view of the sealing assembly where the motorized positioning mechanism extends through the bottom of the enclosure. -
FIG. 5A is an enlarged top detail view taken alongline 5A-5A ofFIG. 1 . -
FIG. 5B is an enlarged top sectional view taken alongline 5B-5B ofFIG. 1 . -
FIG. 6 is a partially schematic top detail view of the chuck assembly, taken along line 6-6 ofFIG. 3 . -
FIG. 7 is a partially sectional front view of the chuck assembly ofFIG. 6 . -
FIG. 8 illustrates an adjustment plate and a surrounding positional stage. -
FIG. 9 illustrates an extended positional stage. -
FIG. 10 illustrates a locking mechanism for the positional stage. -
FIG. 11 illustrates a locking mechanism for the adjustment plate and a tab for rotational engagement of the adjustment plate. -
FIG. 12 illustrates traditional adjustment of the orientation of the chuck. -
FIG. 13 illustrates a modified adjustment of the orientation of the chuck. -
FIG. 14 illustrates a probe station supported by an isolation stage, both of which are surrounded by a frame. -
FIG. 15 illustrates the engagement of the sides of the environmental control enclosure. -
FIG. 16 illustrates the engagement of a door to the environmental control enclosure. - The probes may be calibrated by using test structures on the calibration substrates supported by the auxiliary chucks 92 and 94. During calibration the
chuck assembly 20, as previously described in the background, is normally aligned with the probes. A wafer placed on thechuck assembly 20 is not normally accurately aligned with the auxiliary chucks 92 and 94, and hence the probes. In order to test the wafer theentire chuck assembly 20, including the auxiliary chucks 92 and 94, is rotated to align the wafer with thepositioners 24 and their respective probes. Typically, during testing thechuck assembly 20 is rotated to realign the test structures on the calibration substrates supported by the auxiliary chucks 92 and 94 with the probes. After further calibration, theentire chuck assembly 20, including the auxiliary chucks 92 and 94, is again rotated to align the wafer with thepositioners 24 and their respective probes. Unfortunately, the theta adjustment of thechuck assembly 20 may not be sufficiently accurate for increasingly small device structures. Multiple theta adjustments of thechuck assembly 20 may result in a slight misalignment of thechuck assembly 20. As a result of such misalignment it may become necessary for the operator to painstakingly manually adjust the theta orientation of thechuck assembly 20. - Smaller environmental control enclosures require less time to create suitable environmental conditions within the environmental control enclosure for accurate measurements. The environmental control enclosure is sufficiently large to permit the chuck assembly to move the entire wafer under the probes for testing. However, if the
chuck assembly 20 is rotatable with respect to the environmental control enclosure then the environmental control enclosure needs additional width to prevent the corners of thechuck assembly 20 from impacting the sides of the environmental control enclosure. - Normally the encoders within the stage supporting the chuck assembly include software based compensation for non-proportional movement to achieve accurate movement in the X and Y directions over the entire range of movement. The software compensation of the encoders also depends on the X and Y position of the chuck relative to the probes. In other words, at different X and Y positions over the entire range of movement of the chuck the amount of compensation provided to the encoders may vary. This variable compensation depending on the X and Y position of the chuck results in complicated spatial calculations for appropriate encoder control. The spatial calculations are further complicated when the chuck is rotated to accommodate the auxiliary chuck calibration.
- To overcome the limitations associated with misalignment of the theta orientation of the wafer, to reduce the size of the environmental control enclosure, and/or to simplify the compensation for the encoders over the X and Y movement, the present inventors came to the realization that the chuck supporting the wafer should rotate with respect to the auxiliary chuck, as illustrated by
FIG. 8 .FIG. 8 illustrates theadjustment plate 182 and a surroundingpositional stage 184. Accordingly,auxiliary chucks 180 preferably maintain a fixed X and Y orientation with respect to the probe positioners and their respective probes. In this manner, the auxiliary chucks are always properly orientated with the probes positioners and the probes. During use, the chuck (supported by the adjustment plate 182) with a wafer thereon is rotated to the proper theta position with respect to the probes for probing the wafer. Thereafter, the theta adjustment of the chuck may remain stationary during subsequent probing of the wafer and recalibration using the auxiliary chucks. In this manner, typically the chuck assembly needs to only be moved in X, Y, and potentially Z directions to achieve complete probing of an entire wafer. Accordingly, the environmental control enclosure does not necessarily need to be sufficiently wide to accommodate rotation of the positional stage. Also, the encoder compensation may be simplified. - During probing with the
chuck assembly 20, as described in the background, it became apparent that probing toward the edges of the wafer tended to result in “wobble” of the wafer and chuckassembly 20. In addition, some existing probe assemblies include the chuck assembly elements supported by a set of linear bearings that permit the upper chuck assembly elements together with the bearing to be slid out of the environment enclosure for loading the wafer onto the chuck assembly. The resulting structure is heavy, and positioned on top of and supported by a plunger affixed to the top of the Z-axis movement of thechuck assembly 20. - To reduce the wobble occurring during probing and reduce the stress applied to the plunger, the present inventors developed a modified arrangement to nearly eliminate the vertical loads on the plunger. Referring to
FIG. 9 , a modified arrangement includes acentral plunger 200 providing rotational movement to theadjustment plate 182 and hence a chuck supported thereon. Thecentral plunger 200 may include areceptacle 201 that moves within atab 203. Thepositional stage 184 andauxiliary chucks 180 are supported by thestage 204 surrounding thecentral plunger 200 which provides the X, Y, and Z movement. Preferably, the stage includes thecentral plunger 200. Thepositional stage 184 includes an internal bearing (not shown) upon which theadjustment plate 182 rotates. Accordingly, thepositional stage 184 is the primary load bearing member for theadjustment plate 182 and chuck thereon. Spaced apartlinear bearings 206 provide a vertical and lateral load bearing support to the rotational chuck while thecentral plunger 200 provides the rotational movement to the chuck without (free from) being the primary load bearing member. Theplunger 200 preferably maintains substantially constant vertical position with respect to theadjustment plate 182 when thestage 204 provides vertical “Z” movement of the positional stage. - Unlocking a lock permits the
positional stage 184, including the rotational chuck, to slide out of the probe station for easier placement of wafers thereon. Normally when thepositional stage 184 is extended, the wafer thereon is adjusted or otherwise replaced with a different wafer for subsequent testing. After repeated movement of the stage in and out of the probe station, together with rotational movement of the chuck (theta adjustment), the present inventors determined that the resulting theta movement of the chuck may be significantly different than the initial “zero” theta. In other words, after repeated use theadjustment plate 182 may be offset by a significant theta offset. Such significant potential theta offset may result in the cabling to the chuck, normally provided by a rollout service loop, being wound about the chuck assembly creating a significantly greater tension thereon or otherwise damaging the cabling or chuck. Theadjustment plate 182 may include a rotational theta limit about “zero” to minimize potential damage. A suitable rotational limit may be .±.7.5 degrees. A further limitation exists in the case that theadjustment plate 182 is rotated to a position near its rotational limit because the user may not be permitted further rotational movement in that direction when aligning another wafer thereby resulting in frustration to the user. To overcome these limitations the rotational orientation of the adjustment plate 182 (chuck) is returned to “zero” prior to sliding thepositional stage 184 out of the probe station. In this manner, the chuck is always at a constant rotational position, such as 0 degrees, when a wafer is positioned thereon so that the likelihood of damaging the probe station by unintended tension on the wires and other interconnections to the chuck assembly is reduced. In addition, the range where the chuck is orientated prior to sliding out thepositional stage 184 may be any predefined range of values. Also, the user maintains the ability to rotate theadjustment plate 182 as necessary during further alignment. - While the
positional stage 184 is extended the user may attempt to rotate theadjustment plate 182. Unfortunately, this may result in difficulty engaging thetab 203 with thereceptacle 201 when thepositional stage 184 is retracted. This difficulty is the result of the rotation of the lunger 200 not likewise rotating the positional stage as in existing designs. - Referring to
FIG. 10 , the “zero” theta lockout may be provided by a mechanical arrangement together with a locking mechanism. Arotational handle 210 is secured to theupper plate 212 of thepositional stage 184. Ablock 216 as secured to thelower plate 214 of thepositional stage 184, which is rigidly attached to thehousing 204. Afinger 218 is inserted within aslot 220 defined by theblock 216 to rigidly lock theupper plate 212 in position. Thehandle 210 is rotated to remove thefinger 218 from theslot 220 to permit relative movement of theupper plate 212 with respect to thelower plate 214. - Referring to
FIG. 11 , thehandle 210 includes ashaft 230 with aslot 232 in the end thereof. With thehandle 210 in the closed position, theslot 232 is aligned with analignment plate 234 attached to the rear of theadjustment plate 182. Theadjustment plate 182 may be rotated to properly align the wafer thereon, with thealignment plate 234 traveling within theslot 232. To unlock thehandle 210 theadjustment plate 182 is realigned to “zero” thus permitting rotational movement of thehandle 210, while simultaneously preventing rotational movement (substantially all) of theadjustment plate 182. It is to be understood that any suitable lock out mechanism may likewise be used. - When one or more chuck assembly elements are supported by the
adjustment plate 182, the upper surface of the chuck assembly should have a suitable orientation with respect to the probes, such as co-planar. Referring toFIG. 12 , to adjust the orientation of the chuck assembly, thepositional stage 184 is extended to provide convenient access to loosen threadedscrews 240. The threaded screws 240 interconnect the chuck to theadjustment plate 182. Next an adjustingscrew 242, such as a jack screw, is rotated to adjust the spacing between the adjustment plate and the chuck. Then the threadedscrew 240 is tightened to rigidly secure the adjustment plate to the chuck. The positional stage is then slid back into the probe station and locked in place. At this point the actual orientation of the upper surface of the chuck assembly may be determined. Normally, the positional stage is adjusted several times to achieve accurate orientation. Unfortunately, this trial and error process of extending the positioning stage from the probe station, adjusting the orientation of the upper surface of the chuck assembly by adjusting one or more adjusting screws 242, and repositioning the positioning stage in the probe station, may take considerable time. - After consideration of this prolonged process of adjusting the orientation of the upper surface of the probe assembly, the present inventors came to the realization that loosening the threaded
screw 240 relaxes the chuck from theadjustment plate 182. The amount of relaxation is hard to determine because the weight of the chuck assembly would make it appear that the chuck, jack screw, and adjustment plate are held together. Also, by adjusting thejack screw 242 and measuring the resulting movement of the chuck assembly provides an inaccurate result. In order to reduce the relaxation of the chuck and the adjustment plate, the present inventors determined that the threadedscrew 240 should be tensioned so that the chuck does not significantly relax with respect to the adjustment plate. Referring toFIG. 13 , one technique to tension the threaded screw is to provide a set ofsprings 250 under the head of the screw to provide an outwardly pressing force thereon when the threadedscrew 240 is loosened. In this manner the relaxation between the chuck and the adjustment plate is reduced, resulting in a more accurate estimate of the adjustment of the orientation of the upper chuck assembly element. This reduces the frustration experienced by the operator of the probe station in properly orientating the chuck assembly. In addition, by loosening the threaded screws slightly, the chuck assembly may be more easily oriented by adjusting the jack screws while the probe station is in its locked position within the probe station. Thereafter, the positioning stage is extended and the threaded screws are tightened. It is to be understood that any structure may likewise be used to provide tension between the chuck assembly element and the adjustment plate while allowing adjustment of the spacing between the adjustment plate and the chuck assembly element, or otherwise adjusting the orientation of the chuck. - Normally it is important during testing to isolate the probe station from the earth and other nearby devices that may impose vibrations or other movement to the probe station, and hence the device under test. With proper isolation, the probe station may provide more accurate measurements. Typically the probe station is placed on a flat table having a surface somewhat larger than the probe station itself to provide a stable surface and reduce the likelihood of inadvertently sliding the probe station off the table. The table includes isolation, such as pneumatic cylinders, between the floor and the table surface. Also, it is difficult to lift the probe station onto the table in a controlled manner that does not damage the table and/or probe station. Further, the probe station is prone to being damaged by being bumped.
- To overcome the aforementioned limitations regarding the size of the probe station, the present inventors came to the realization that an integrated isolation stage, probe station, and frame provides the desired benefits, as illustrated in
FIG. 14 . The integrated isolation stage and probe station eliminates the likelihood of the probe station falling off the isolation stage. The top of the isolation stage may likewise form the base for the probe station, which reduces the overall height of the probe station, while simultaneously providing a stable support for the probe station. To protect against inadvertently damaging the probe station a frame at least partially surrounds the isolation stage and the probe station. - Even with extensive shielding and guarding existing environmental enclosures still seem to be inherently prone to low levels of noise. After consideration of the potential sources of noise, the present inventors determined that the construction of the environmental control enclosure itself permits small leakage currents to exist. Existing environmental control enclosures include one plate screwed or otherwise attached to an adjoining plate. In this manner, there exists a straight line path from the interior of the environmental control enclosure to outside of the environmental control enclosure. These joints are also prone to misalignment and small gaps there between. The gaps, or otherwise straight paths, provide a convenient path for leakage currents. Referring to
FIGS. 15 and 16 , to overcome the limitation of this source of leakage currents the present inventors redesigned the environmental control enclosure to include all (or substantial portion) joints having an overlapping characteristic. In this manner, the number of joints that include a straight path from the interior to the exterior of the environmental control enclosure is substantially reduced, or otherwise eliminated. - The terms and expressions which have been employed in the foregoing specification are used therein as terms of description and not of limitation, and there is no intention, in the use of such terms and expressions, of excluding equivalents of the features shown and described or portions thereof, it being recognized that the scope of the invention is defined and limited only by the claims which follow.
Claims (24)
1. A chuck assembly including a rotational member and an auxiliary chuck comprising:
(a) rotational-member suitable for supporting a chuck thereon wherein said rotational member is rotatable with respect to said chuck assembly;
(b) said auxiliary chuck being free from rotating with respect to said chuck assembly;
(c) wherein said auxiliary chuck is free from supporting said rotational member.
2. The chuck assembly of claim 1 wherein said auxiliary chuck having an upper surface thereon having an elevation that is above an upper surface of said rotational member.
3. The chuck assembly of claim 1 wherein said rotational member has a planar upper surface.
4. The chuck assembly of claim 2 wherein said chuck assembly has a planar upper surface.
5. The chuck assembly of claim 4 wherein said rotational member planar upper surface and said chuck assembly planar upper surface are substantially coplanar.
6. The chuck assembly of claim 1 wherein chuck assembly includes a movement assembly for moving said rotational member in a lateral direction.
7. The chuck assembly of claim 1 wherein said auxiliary chuck is suitable to support at least one test substrate thereon.
8. The chuck assembly of claim 1 wherein said auxiliary chuck supports said test substrate at a location above said rotational member.
9. The chuck assembly of claim 5 wherein said auxiliary chuck moves together with said rotational member in a lateral direction.
10. A chuck assembly including a rotational member and a movement member comprising:
(a) said rotational member suitable for supporting a chuck thereon wherein said rotational member is rotatable with respect to said chuck assembly;
(b) said movement member mechanically interconnected with said rotational member so as to selectively rotate said rotational member;
(c) said rotational member being substantially free from exerting a downwardly directed force on said movement member while testing a device under test.
11. The chuck assembly of claim 10 wherein rotational member includes a tab, said movement member includes a slot that engages said tab.
12. The chuck assembly of claim 11 wherein rotational movement of said slot causes rotational movement of said rotational member.
13. The chuck assembly of claim 10 wherein said rotational member is supported by a positioning stage.
14. The chuck assembly of claim 13 wherein said positioning stage includes a pair of spaced apart linear bearings.
15. The chuck assembly of claim 14 wherein said positioning stage is the primarily support for said rotational member.
16. The chuck assembly of claim 10 wherein a substantially constant vertical spacing is maintained between said movement member and said rotational member while said rotational member is being rotated.
17. The chuck assembly of claim 16 wherein said chuck assembly provides z-axis movement of said rotational member while maintaining said substantially constant vertical spacing.
18. A chuck assembly including a rotational member and a base assembly comprising:
(a) said rotational member suitable for supporting a chuck thereon wherein said rotational member is rotatable with respect to said chuck assembly;
(b) said rotational member laterally movable with respect to said base assembly when said rotational member is in a predefined rotational orientation;
(c) said rotational member free from being laterally movable with respect to said base assembly selectively based upon the orientation of said rotational member.
19. The chuck assembly of claim 18 wherein said predefined rotational orientation is zero degrees.
20. The chuck assembly of claim 18 wherein said predefined rotational orientation is a predefined range of values.
21. The chuck assembly of claim 18 wherein said rotational member is maintained free from substantially all rotational movement while said rotational member is in an extended position with respect to said base.
22. A chuck assembly including a rotational member comprising:
(a) said rotational member supporting a chuck thereon;
(b) a plurality of adjustment members suitable to adjust the orientation of said chuck in a plane generally co-planar with an upper surface of said chuck with respect to said rotational member while maintaining said rotational member and said chuck in a tensioned state while adjusting said orientation.
23. The chuck assembly of claim 22 wherein said tensioned state is provided by said adjustment members maintaining the spacing between said rotational member and said chuck.
24. The chuck assembly of claim 23 wherein said adjustment members are threaded screws.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/975,243 US20080042376A1 (en) | 2000-09-05 | 2007-10-18 | Probe station |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23055200P | 2000-09-05 | 2000-09-05 | |
US09/881,312 US6914423B2 (en) | 2000-09-05 | 2001-06-12 | Probe station |
US11/083,677 US7554322B2 (en) | 2000-09-05 | 2005-03-16 | Probe station |
US11/975,243 US20080042376A1 (en) | 2000-09-05 | 2007-10-18 | Probe station |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/083,677 Division US7554322B2 (en) | 2000-09-05 | 2005-03-16 | Probe station |
Publications (1)
Publication Number | Publication Date |
---|---|
US20080042376A1 true US20080042376A1 (en) | 2008-02-21 |
Family
ID=26924344
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/881,312 Expired - Lifetime US6914423B2 (en) | 2000-09-05 | 2001-06-12 | Probe station |
US11/083,677 Expired - Fee Related US7554322B2 (en) | 2000-09-05 | 2005-03-16 | Probe station |
US11/975,173 Abandoned US20080042669A1 (en) | 2000-09-05 | 2007-10-18 | Probe station |
US11/975,243 Abandoned US20080042376A1 (en) | 2000-09-05 | 2007-10-18 | Probe station |
US11/975,174 Expired - Fee Related US7688062B2 (en) | 2000-09-05 | 2007-10-18 | Probe station |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/881,312 Expired - Lifetime US6914423B2 (en) | 2000-09-05 | 2001-06-12 | Probe station |
US11/083,677 Expired - Fee Related US7554322B2 (en) | 2000-09-05 | 2005-03-16 | Probe station |
US11/975,173 Abandoned US20080042669A1 (en) | 2000-09-05 | 2007-10-18 | Probe station |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/975,174 Expired - Fee Related US7688062B2 (en) | 2000-09-05 | 2007-10-18 | Probe station |
Country Status (4)
Country | Link |
---|---|
US (5) | US6914423B2 (en) |
JP (1) | JP4505160B2 (en) |
KR (1) | KR100770174B1 (en) |
DE (2) | DE20114542U1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080224426A1 (en) * | 2007-03-16 | 2008-09-18 | Suss Microtec Test Systems Gmbh | Chuck with triaxial construction |
US7969173B2 (en) | 2000-09-05 | 2011-06-28 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
US9506973B2 (en) | 2010-06-07 | 2016-11-29 | Cascade Microtech, Inc. | High voltage chuck for a probe station |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6445202B1 (en) | 1999-06-30 | 2002-09-03 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US7250626B2 (en) * | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
US7187188B2 (en) * | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7724004B2 (en) * | 2005-12-21 | 2010-05-25 | Formfactor, Inc. | Probing apparatus with guarded signal traces |
US8528804B2 (en) * | 2006-04-10 | 2013-09-10 | Blackberry Limited | Method and apparatus for testing solderability of electrical components |
CN101788620B (en) * | 2009-12-31 | 2013-07-03 | 西安开容电子技术有限责任公司 | Line impedance stabilization network for medium-frequency power supply and design method thereof |
EP2539724B1 (en) | 2010-02-22 | 2015-01-28 | Cascade Microtech, Inc. | Probe station with improved interconnection |
EP2390906A1 (en) * | 2010-05-26 | 2011-11-30 | Applied Materials, Inc. | Apparatus and method for electrostatic discharge (ESD) reduction |
CN102384990A (en) * | 2010-08-27 | 2012-03-21 | 向熙科技股份有限公司 | Packing mechanism capable of single-side rapidly adjusting probe height and method thereof, and resistance measurement equipment |
US20130014983A1 (en) * | 2011-07-14 | 2013-01-17 | Texas Instruments Incorporated | Device contactor with integrated rf shield |
US9364925B2 (en) * | 2012-04-30 | 2016-06-14 | Globalfoundries Inc. | Assembly of electronic and optical devices |
US10281487B2 (en) | 2013-09-17 | 2019-05-07 | The Micromanipulator Company, Llc | Probe system designed for probing of electronic parts mounted into application or test boards |
CN108020745B (en) * | 2018-01-22 | 2023-11-28 | 深圳市恒宝通光电子股份有限公司 | Light module aging test loading and unloading device |
KR102172933B1 (en) * | 2018-12-26 | 2020-11-03 | 주식회사 쎄믹스 | Wafer prober being capable of sliding a head plate |
JP7371885B2 (en) * | 2019-07-08 | 2023-10-31 | ヤマハファインテック株式会社 | Electrical inspection equipment and holding unit |
US11346883B2 (en) * | 2019-11-05 | 2022-05-31 | Formfactor, Inc. | Probe systems and methods for testing a device under test |
CN116157692A (en) * | 2020-08-14 | 2023-05-23 | 杰诺皮克光学系统有限公司 | Contact module for contacting photoelectric chip |
Citations (97)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2142625A (en) * | 1932-07-06 | 1939-01-03 | Hollandsche Draad En Kabelfab | High tension cable |
US3230299A (en) * | 1962-07-18 | 1966-01-18 | Gen Cable Corp | Electrical cable with chemically bonded rubber layers |
US3642415A (en) * | 1970-08-10 | 1972-02-15 | Shell Oil Co | Plunger-and-diaphragm plastic sheet forming apparatus |
US3710251A (en) * | 1971-04-07 | 1973-01-09 | Collins Radio Co | Microelectric heat exchanger pedestal |
US3714572A (en) * | 1970-08-21 | 1973-01-30 | Rca Corp | Alignment and test fixture apparatus |
US3863181A (en) * | 1973-12-03 | 1975-01-28 | Bell Telephone Labor Inc | Mode suppressor for strip transmission lines |
US3868093A (en) * | 1973-07-31 | 1975-02-25 | Beloit Corp | Mixing screw and use thereof |
US3930809A (en) * | 1973-08-21 | 1976-01-06 | Wentworth Laboratories, Inc. | Assembly fixture for fixed point probe card |
US3936743A (en) * | 1974-03-05 | 1976-02-03 | Electroglas, Inc. | High speed precision chuck assembly |
US4001685A (en) * | 1974-03-04 | 1977-01-04 | Electroglas, Inc. | Micro-circuit test probe |
US4009456A (en) * | 1970-10-07 | 1977-02-22 | General Microwave Corporation | Variable microwave attenuator |
US4008900A (en) * | 1976-03-15 | 1977-02-22 | John Freedom | Indexing chuck |
US4072576A (en) * | 1975-10-06 | 1978-02-07 | Ab Kabi | Method for studying enzymatic and other biochemical reactions |
US4135131A (en) * | 1977-10-14 | 1979-01-16 | The United States Of America As Represented By The Secretary Of The Army | Microwave time delay spectroscopic methods and apparatus for remote interrogation of biological targets |
US4186338A (en) * | 1976-12-16 | 1980-01-29 | Genrad, Inc. | Phase change detection method of and apparatus for current-tracing the location of faults on printed circuit boards and similar systems |
US4371742A (en) * | 1977-12-20 | 1983-02-01 | Graham Magnetics, Inc. | EMI-Suppression from transmission lines |
US4425395A (en) * | 1981-04-30 | 1984-01-10 | Fujikura Rubber Works, Ltd. | Base fabrics for polyurethane-coated fabrics, polyurethane-coated fabrics and processes for their production |
US4426619A (en) * | 1981-06-03 | 1984-01-17 | Temptronic Corporation | Electrical testing system including plastic window test chamber and method of using same |
US4431967A (en) * | 1979-08-28 | 1984-02-14 | Mitsubishi Denki Kabushiki Kaisha | Method of mounting a semiconductor element for analyzing failures thereon |
US4491173A (en) * | 1982-05-28 | 1985-01-01 | Temptronic Corporation | Rotatable inspection table |
US4567321A (en) * | 1984-02-20 | 1986-01-28 | Junkosha Co., Ltd. | Flexible flat cable |
US4566184A (en) * | 1981-08-24 | 1986-01-28 | Rockwell International Corporation | Process for making a probe for high speed integrated circuits |
US4567908A (en) * | 1983-05-31 | 1986-02-04 | Contraves Ag | Discharge system and method of operating same |
US4641659A (en) * | 1979-06-01 | 1987-02-10 | Sepponen Raimo E | Medical diagnostic microwave scanning apparatus |
US4642417A (en) * | 1984-07-30 | 1987-02-10 | Kraftwerk Union Aktiengesellschaft | Concentric three-conductor cable |
US4646005A (en) * | 1984-03-16 | 1987-02-24 | Motorola, Inc. | Signal probe |
US4722846A (en) * | 1984-04-18 | 1988-02-02 | Kikkoman Corporation | Novel variant and process for producing light colored soy sauce using such variant |
US4725793A (en) * | 1985-09-30 | 1988-02-16 | Alps Electric Co., Ltd. | Waveguide-microstrip line converter |
US4795962A (en) * | 1986-09-04 | 1989-01-03 | Hewlett-Packard Company | Floating driver circuit and a device for measuring impedances of electrical components |
US4805627A (en) * | 1985-09-06 | 1989-02-21 | Siemens Aktiengesellschaft | Method and apparatus for identifying the distribution of the dielectric constants in an object |
US4891584A (en) * | 1988-03-21 | 1990-01-02 | Semitest, Inc. | Apparatus for making surface photovoltage measurements of a semiconductor |
US4893914A (en) * | 1988-10-12 | 1990-01-16 | The Micromanipulator Company, Inc. | Test station |
US4894612A (en) * | 1987-08-13 | 1990-01-16 | Hypres, Incorporated | Soft probe for providing high speed on-wafer connections to a circuit |
US4896109A (en) * | 1987-12-07 | 1990-01-23 | The United States Of America As Represented By The Department Of Energy | Photoconductive circuit element reflectometer |
US4899998A (en) * | 1987-11-10 | 1990-02-13 | Hiroshi Teramachi | Rotational positioning device |
US4904935A (en) * | 1988-11-14 | 1990-02-27 | Eaton Corporation | Electrical circuit board text fixture having movable platens |
US4904933A (en) * | 1986-09-08 | 1990-02-27 | Tektronix, Inc. | Integrated circuit probe station |
US4982153A (en) * | 1989-02-06 | 1991-01-01 | Cray Research, Inc. | Method and apparatus for cooling an integrated circuit chip during testing |
US4994737A (en) * | 1990-03-09 | 1991-02-19 | Cascade Microtech, Inc. | System for facilitating planar probe measurements of high-speed interconnect structures |
US5082627A (en) * | 1987-05-01 | 1992-01-21 | Biotronic Systems Corporation | Three dimensional binding site array for interfering with an electrical field |
US5084671A (en) * | 1987-09-02 | 1992-01-28 | Tokyo Electron Limited | Electric probing-test machine having a cooling system |
US5089774A (en) * | 1989-12-26 | 1992-02-18 | Sharp Kabushiki Kaisha | Apparatus and a method for checking a semiconductor |
US5091691A (en) * | 1988-03-21 | 1992-02-25 | Semitest, Inc. | Apparatus for making surface photovoltage measurements of a semiconductor |
US5091732A (en) * | 1990-09-07 | 1992-02-25 | The United States Of America As Represented By The Secretary Of The Navy | Lightweight deployable antenna system |
US5091692A (en) * | 1990-01-11 | 1992-02-25 | Tokyo Electron Limited | Probing test device |
US5187443A (en) * | 1990-07-24 | 1993-02-16 | Bereskin Alexander B | Microwave test fixtures for determining the dielectric properties of a material |
US5278494A (en) * | 1991-02-19 | 1994-01-11 | Tokyo Electron Yamanashi Limited | Wafer probing test machine |
US5280156A (en) * | 1990-12-25 | 1994-01-18 | Ngk Insulators, Ltd. | Wafer heating apparatus and with ceramic substrate and dielectric layer having electrostatic chucking means |
US5382898A (en) * | 1992-09-21 | 1995-01-17 | Cerprobe Corporation | High density probe card for testing electrical circuits |
US5481196A (en) * | 1994-11-08 | 1996-01-02 | Nebraska Electronics, Inc. | Process and apparatus for microwave diagnostics and therapy |
US5481936A (en) * | 1993-06-29 | 1996-01-09 | Yugen Kaisha Sozoan | Rotary drive positioning system for an indexing table |
US5486975A (en) * | 1994-01-31 | 1996-01-23 | Applied Materials, Inc. | Corrosion resistant electrostatic chuck |
US5488954A (en) * | 1994-09-09 | 1996-02-06 | Georgia Tech Research Corp. | Ultrasonic transducer and method for using same |
US5491426A (en) * | 1994-06-30 | 1996-02-13 | Vlsi Technology, Inc. | Adaptable wafer probe assembly for testing ICs with different power/ground bond pad configurations |
US5493236A (en) * | 1993-06-23 | 1996-02-20 | Mitsubishi Denki Kabushiki Kaisha | Test analysis apparatus and analysis method for semiconductor wafer using OBIC analysis |
US5493070A (en) * | 1993-07-28 | 1996-02-20 | Hewlett-Packard Company | Measuring cable and measuring system |
US5594358A (en) * | 1993-09-02 | 1997-01-14 | Matsushita Electric Industrial Co., Ltd. | Radio frequency probe and probe card including a signal needle and grounding needle coupled to a microstrip transmission line |
US5600256A (en) * | 1993-07-01 | 1997-02-04 | Hughes Electronics | Cast elastomer/membrane test probe assembly |
US5604444A (en) * | 1992-06-11 | 1997-02-18 | Cascade Microtech, Inc. | Wafer probe station having environment control enclosure |
US5704355A (en) * | 1994-07-01 | 1998-01-06 | Bridges; Jack E. | Non-invasive system for breast cancer detection |
US5712571A (en) * | 1995-11-03 | 1998-01-27 | Analog Devices, Inc. | Apparatus and method for detecting defects arising as a result of integrated circuit processing |
US5715819A (en) * | 1994-05-26 | 1998-02-10 | The Carolinas Heart Institute | Microwave tomographic spectroscopy system and method |
US5857667A (en) * | 1995-10-27 | 1999-01-12 | Samsung Aerospace Industries, Ltd. | Vacuum chuck |
US5861743A (en) * | 1995-12-21 | 1999-01-19 | Genrad, Inc. | Hybrid scanner for use in an improved MDA tester |
US5867073A (en) * | 1992-05-01 | 1999-02-02 | Martin Marietta Corporation | Waveguide to transmission line transition |
US5869975A (en) * | 1995-04-14 | 1999-02-09 | Cascade Microtech, Inc. | System for evaluating probing networks that have multiple probing ends |
US5874381A (en) * | 1994-08-02 | 1999-02-23 | Crosfield Limited | Cobalt on alumina catalysts |
US6013586A (en) * | 1997-10-09 | 2000-01-11 | Dimension Polyant Sailcloth, Inc. | Tent material product and method of making tent material product |
US6019612A (en) * | 1997-02-10 | 2000-02-01 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus for electrically connecting a device to be tested |
US6023209A (en) * | 1996-07-05 | 2000-02-08 | Endgate Corporation | Coplanar microwave circuit having suppression of undesired modes |
US6028435A (en) * | 1996-03-22 | 2000-02-22 | Nec Corporation | Semiconductor device evaluation system using optical fiber |
US6169410B1 (en) * | 1998-11-09 | 2001-01-02 | Anritsu Company | Wafer probe with built in RF frequency conversion module |
US6172337B1 (en) * | 1995-07-10 | 2001-01-09 | Mattson Technology, Inc. | System and method for thermal processing of a semiconductor substrate |
US6175228B1 (en) * | 1998-10-30 | 2001-01-16 | Agilent Technologies | Electronic probe for measuring high impedance tri-state logic circuits |
US6176091B1 (en) * | 1998-10-01 | 2001-01-23 | Nkk Corporation | Method and apparatus for preventing snow from melting and for packing snow in artificial ski facility |
US6181297B1 (en) * | 1994-08-25 | 2001-01-30 | Symmetricom, Inc. | Antenna |
US6181149B1 (en) * | 1996-09-26 | 2001-01-30 | Delaware Capital Formation, Inc. | Grid array package test contactor |
US6181416B1 (en) * | 1998-04-14 | 2001-01-30 | Optometrix, Inc. | Schlieren method for imaging semiconductor device properties |
US6181144B1 (en) * | 1998-02-25 | 2001-01-30 | Micron Technology, Inc. | Semiconductor probe card having resistance measuring circuitry and method fabrication |
US6335625B1 (en) * | 1999-02-22 | 2002-01-01 | Paul Bryant | Programmable active microwave ultrafine resonance spectrometer (PAMURS) method and systems |
US20020005728A1 (en) * | 1999-04-15 | 2002-01-17 | Gordon M. Babson | Micro probe and method of fabricating same |
US6340568B2 (en) * | 1998-02-02 | 2002-01-22 | Signature Bioscience, Inc. | Method for detecting and classifying nucleic acid hybridization |
US6340895B1 (en) * | 1999-07-14 | 2002-01-22 | Aehr Test Systems, Inc. | Wafer-level burn-in and test cartridge |
US20020009377A1 (en) * | 2000-06-09 | 2002-01-24 | Shafer Ronny A. | Motor cover retention |
US20020009378A1 (en) * | 2000-07-21 | 2002-01-24 | Rikuro Obara | Blower |
US20020008533A1 (en) * | 2000-07-05 | 2002-01-24 | Ando Electric Co., Ltd | Electro-optic probe and magneto-optic probe |
US20020011863A1 (en) * | 1998-06-09 | 2002-01-31 | Advantest Corporation | IC chip tester with heating element for preventing condensation |
US20020011859A1 (en) * | 1993-12-23 | 2002-01-31 | Kenneth R. Smith | Method for forming conductive bumps for the purpose of contrructing a fine pitch test device |
US20030010877A1 (en) * | 2001-07-12 | 2003-01-16 | Jean-Luc Landreville | Anti-vibration and anti-tilt structure |
US6512482B1 (en) * | 2001-03-20 | 2003-01-28 | Xilinx, Inc. | Method and apparatus using a semiconductor die integrated antenna structure |
US6512391B2 (en) * | 1999-06-30 | 2003-01-28 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
US20040015060A1 (en) * | 2002-06-21 | 2004-01-22 | James Samsoondar | Measurement of body compounds |
US6838885B2 (en) * | 2003-03-05 | 2005-01-04 | Murata Manufacturing Co., Ltd. | Method of correcting measurement error and electronic component characteristic measurement apparatus |
US6842024B2 (en) * | 1997-06-06 | 2005-01-11 | Cascade Microtech, Inc. | Probe station having multiple enclosures |
US6843024B2 (en) * | 2001-05-31 | 2005-01-18 | Toyoda Gosei Co., Ltd. | Weather strip including core-removal slot |
US6847219B1 (en) * | 2002-11-08 | 2005-01-25 | Cascade Microtech, Inc. | Probe station with low noise characteristics |
US6987483B2 (en) * | 2003-02-21 | 2006-01-17 | Kyocera Wireless Corp. | Effectively balanced dipole microstrip antenna |
Family Cites Families (746)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1191486A (en) | 1914-03-20 | 1916-07-18 | Edward B Tyler | Expansion-joint. |
US1337866A (en) | 1917-09-27 | 1920-04-20 | Griffiths Ethel Grace | System for protecting electric cables |
US2106003A (en) * | 1936-03-14 | 1938-01-18 | Metropolitan Device Corp | Terminal box |
US2197081A (en) | 1937-06-14 | 1940-04-16 | Transit Res Corp | Motor support |
US2264685A (en) | 1940-06-28 | 1941-12-02 | Westinghouse Electric & Mfg Co | Insulating structure |
US2376101A (en) | 1942-04-01 | 1945-05-15 | Ferris Instr Corp | Electrical energy transmission |
US2389668A (en) | 1943-03-04 | 1945-11-27 | Barnes Drill Co | Indexing mechanism for machine tables |
US2471897A (en) | 1945-01-13 | 1949-05-31 | Trico Products Corp | Fluid motor packing |
US2812502A (en) | 1953-07-07 | 1957-11-05 | Bell Telephone Labor Inc | Transposed coaxial conductor system |
CH364040A (en) | 1960-04-19 | 1962-08-31 | Ipa Anstalt | Detection device to check if an element of an electrical installation is live |
US3185927A (en) | 1961-01-31 | 1965-05-25 | Kulicke & Soffa Mfg Co | Probe instrument for inspecting semiconductor wafers including means for marking defective zones |
US3193712A (en) | 1962-03-21 | 1965-07-06 | Clarence A Harris | High voltage cable |
US3256484A (en) | 1962-09-10 | 1966-06-14 | Tektronix Inc | High voltage test probe containing a part gas, part liquid dielectric fluid under pressure and having a transparent housing section for viewing the presence of the liquid therein |
US3176091A (en) | 1962-11-07 | 1965-03-30 | Helmer C Hanson | Controlled multiple switching unit |
US3192844A (en) | 1963-03-05 | 1965-07-06 | Kulicke And Soffa Mfg Company | Mask alignment fixture |
US3201721A (en) | 1963-12-30 | 1965-08-17 | Western Electric Co | Coaxial line to strip line connector |
US3405361A (en) | 1964-01-08 | 1968-10-08 | Signetics Corp | Fluid actuable multi-point microprobe for semiconductors |
US3258484A (en) | 1964-02-12 | 1966-06-28 | Dow Chemical Co | Cyclic phosphorus compounds |
US3289046A (en) | 1964-05-19 | 1966-11-29 | Gen Electric | Component chip mounted on substrate with heater pads therebetween |
GB1069184A (en) | 1965-04-15 | 1967-05-17 | Andre Rubber Co | Improvements in or relating to pipe couplings |
US3333274A (en) | 1965-04-21 | 1967-07-25 | Micro Tech Mfg Inc | Testing device |
US3435185A (en) | 1966-01-11 | 1969-03-25 | Rohr Corp | Sliding vacuum seal for electron beam welder |
US3408565A (en) | 1966-03-02 | 1968-10-29 | Philco Ford Corp | Apparatus for sequentially testing electrical components under controlled environmental conditions including a component support mating test head |
US3484679A (en) | 1966-10-03 | 1969-12-16 | North American Rockwell | Electrical apparatus for changing the effective capacitance of a cable |
US3609539A (en) | 1968-09-28 | 1971-09-28 | Ibm | Self-aligning kelvin probe |
NL6917791A (en) | 1969-03-13 | 1970-09-15 | ||
US3648169A (en) | 1969-05-26 | 1972-03-07 | Teledyne Inc | Probe and head assembly |
US3596228A (en) | 1969-05-29 | 1971-07-27 | Ibm | Fluid actuated contactor |
US3602845A (en) | 1970-01-27 | 1971-08-31 | Us Army | Slot line nonreciprocal phase shifter |
US3654573A (en) | 1970-06-29 | 1972-04-04 | Bell Telephone Labor Inc | Microwave transmission line termination |
US3740900A (en) | 1970-07-01 | 1973-06-26 | Signetics Corp | Vacuum chuck assembly for semiconductor manufacture |
US3700998A (en) | 1970-08-20 | 1972-10-24 | Computer Test Corp | Sample and hold circuit with switching isolation |
US3662318A (en) | 1970-12-23 | 1972-05-09 | Comp Generale Electricite | Transition device between coaxial and microstrip lines |
US3814888A (en) | 1971-11-19 | 1974-06-04 | Gen Electric | Solid state induction cooking appliance |
US3810017A (en) | 1972-05-15 | 1974-05-07 | Teledyne Inc | Precision probe for testing micro-electronic units |
US3829076A (en) | 1972-06-08 | 1974-08-13 | H Sofy | Dial index machine |
US3858212A (en) | 1972-08-29 | 1974-12-31 | L Tompkins | Multi-purpose information gathering and distribution system |
US3952156A (en) | 1972-09-07 | 1976-04-20 | Xerox Corporation | Signal processing system |
CA970849A (en) * | 1972-09-18 | 1975-07-08 | Malcolm P. Macmartin | Low leakage isolating transformer for electromedical apparatus |
US3775644A (en) | 1972-09-20 | 1973-11-27 | Communications Satellite Corp | Adjustable microstrip substrate holder |
US3777260A (en) | 1972-12-14 | 1973-12-04 | Ibm | Grid for making electrical contact |
FR2298196A1 (en) | 1973-05-18 | 1976-08-13 | Lignes Telegraph Telephon | NON-RECIPROCAL COMPONENT WITH WIDE-BAND SLOT LINE |
US3814838A (en) | 1973-06-01 | 1974-06-04 | Continental Electronics Mfg | Insulator assembly having load distribution support |
US3836751A (en) | 1973-07-26 | 1974-09-17 | Applied Materials Inc | Temperature controlled profiling heater |
US3976959A (en) | 1974-07-22 | 1976-08-24 | Gaspari Russell A | Planar balun |
US3970934A (en) | 1974-08-12 | 1976-07-20 | Akin Aksu | Printed circuit board testing means |
US4042119A (en) | 1975-06-30 | 1977-08-16 | International Business Machines Corporation | Workpiece positioning apparatus |
US4038894A (en) | 1975-07-18 | 1977-08-02 | Springfield Tool And Die, Inc. | Piercing apparatus |
US4035723A (en) | 1975-10-16 | 1977-07-12 | Xynetics, Inc. | Probe arm |
US3992073A (en) | 1975-11-24 | 1976-11-16 | Technical Wire Products, Inc. | Multi-conductor probe |
US3996517A (en) | 1975-12-29 | 1976-12-07 | Monsanto Company | Apparatus for wafer probing having surface level sensing |
US4116523A (en) | 1976-01-23 | 1978-09-26 | James M. Foster | High frequency probe |
US4049252A (en) | 1976-02-04 | 1977-09-20 | Bell Theodore F | Index table |
US4099120A (en) | 1976-04-19 | 1978-07-04 | Akin Aksu | Probe head for testing printed circuit boards |
US4115735A (en) | 1976-10-14 | 1978-09-19 | Faultfinders, Inc. | Test fixture employing plural platens for advancing some or all of the probes of the test fixture |
US4093988A (en) | 1976-11-08 | 1978-06-06 | General Electric Company | High speed frequency response measurement |
US4115736A (en) | 1977-03-09 | 1978-09-19 | The United States Of America As Represented By The Secretary Of The Air Force | Probe station |
US4151465A (en) | 1977-05-16 | 1979-04-24 | Lenz Seymour S | Variable flexure test probe for microelectronic circuits |
US4161692A (en) | 1977-07-18 | 1979-07-17 | Cerprobe Corporation | Probe device for integrated circuit wafers |
US4172993A (en) | 1978-09-13 | 1979-10-30 | The Singer Company | Environmental hood for testing printed circuit cards |
DE2849119A1 (en) | 1978-11-13 | 1980-05-14 | Siemens Ag | METHOD AND CIRCUIT FOR DAMPING MEASUREMENT, ESPECIALLY FOR DETERMINING THE DAMPING AND / OR GROUP DISTANCE DISTORTION OF A MEASURED OBJECT |
US4383217A (en) | 1979-01-02 | 1983-05-10 | Shiell Thomas J | Collinear four-point probe head and mount for resistivity measurements |
US4280112A (en) | 1979-02-21 | 1981-07-21 | Eisenhart Robert L | Electrical coupler |
US4181692A (en) * | 1979-03-23 | 1980-01-01 | Ecodyne Corporation | Cooling tower fill assembly |
DE2912826A1 (en) | 1979-03-30 | 1980-10-16 | Heinz Laass | Compact pair of electrical probes packaged for portability - are used for voltage or short circuit testing and clamped together, when not in use, by magnets |
US4352061A (en) | 1979-05-24 | 1982-09-28 | Fairchild Camera & Instrument Corp. | Universal test fixture employing interchangeable wired personalizers |
US4287473A (en) | 1979-05-25 | 1981-09-01 | The United States Of America As Represented By The United States Department Of Energy | Nondestructive method for detecting defects in photodetector and solar cell devices |
US4277741A (en) | 1979-06-25 | 1981-07-07 | General Motors Corporation | Microwave acoustic spectrometer |
SU843040A1 (en) | 1979-08-06 | 1981-06-30 | Физико-Технический Институт Низкихтемператур Ah Украинской Ccp | Straightway rejection filter |
US4327180A (en) | 1979-09-14 | 1982-04-27 | Board Of Governors, Wayne State Univ. | Method and apparatus for electromagnetic radiation of biological material |
US4284033A (en) | 1979-10-31 | 1981-08-18 | Rca Corporation | Means to orbit and rotate target wafers supported on planet member |
US4330783A (en) | 1979-11-23 | 1982-05-18 | Toia Michael J | Coaxially fed dipole antenna |
US4365195A (en) | 1979-12-27 | 1982-12-21 | Communications Satellite Corporation | Coplanar waveguide mounting structure and test fixture for microwave integrated circuits |
US4365109A (en) | 1980-01-25 | 1982-12-21 | The United States Of America As Represented By The Secretary Of The Air Force | Coaxial cable design |
US4342958A (en) | 1980-03-28 | 1982-08-03 | Honeywell Information Systems Inc. | Automatic test equipment test probe contact isolation detection method |
JPS5953659B2 (en) | 1980-04-11 | 1984-12-26 | 株式会社日立製作所 | Reciprocating mechanism of rotating body in vacuum chamber |
US4284682A (en) | 1980-04-30 | 1981-08-18 | Nasa | Heat sealable, flame and abrasion resistant coated fabric |
US4357575A (en) | 1980-06-17 | 1982-11-02 | Dit-Mco International Corporation | Apparatus for use in testing printed circuit process boards having means for positioning such boards in proper juxtaposition with electrical contacting assemblies |
US4552033A (en) | 1980-07-08 | 1985-11-12 | Gebr. Marzhauser Wetzlar oHG | Drive system for a microscope stage or the like |
US4346355A (en) | 1980-11-17 | 1982-08-24 | Raytheon Company | Radio frequency energy launcher |
US4376920A (en) * | 1981-04-01 | 1983-03-15 | Smith Kenneth L | Shielded radio frequency transmission cable |
JPS57169244A (en) | 1981-04-13 | 1982-10-18 | Canon Inc | Temperature controller for mask and wafer |
US4401945A (en) | 1981-04-30 | 1983-08-30 | The Valeron Corporation | Apparatus for detecting the position of a probe relative to a workpiece |
US4414638A (en) | 1981-04-30 | 1983-11-08 | Dranetz Engineering Laboratories, Inc. | Sampling network analyzer with stored correction of gain errors |
DE3125552C1 (en) | 1981-06-29 | 1982-11-11 | Siemens AG, 1000 Berlin und 8000 München | Tester indicating voltage magnitude, polarity and testing continuity - has mains section and switchable reservoir enabling self-testing |
US4419626A (en) | 1981-08-25 | 1983-12-06 | Daymarc Corporation | Broad band contactor assembly for testing integrated circuit devices |
US4888550A (en) | 1981-09-14 | 1989-12-19 | Texas Instruments Incorporated | Intelligent multiprobe tip |
US4453142A (en) | 1981-11-02 | 1984-06-05 | Motorola Inc. | Microstrip to waveguide transition |
US4480223A (en) | 1981-11-25 | 1984-10-30 | Seiichiro Aigo | Unitary probe assembly |
DE3202461C1 (en) | 1982-01-27 | 1983-06-09 | Fa. Carl Zeiss, 7920 Heidenheim | Attachment of microscope objectives |
JPS58149580A (en) | 1982-02-27 | 1983-09-05 | Fanuc Ltd | System for shape correction |
US4528504A (en) | 1982-05-27 | 1985-07-09 | Harris Corporation | Pulsed linear integrated circuit tester |
US4468629A (en) | 1982-05-27 | 1984-08-28 | Trw Inc. | NPN Operational amplifier |
JPS58210631A (en) | 1982-05-31 | 1983-12-07 | Toshiba Corp | Ic tester utilizing electron beam |
US4507602A (en) | 1982-08-13 | 1985-03-26 | The United States Of America As Represented By The Secretary Of The Air Force | Measurement of permittivity and permeability of microwave materials |
US4705447A (en) | 1983-08-11 | 1987-11-10 | Intest Corporation | Electronic test head positioner for test systems |
US4479690A (en) | 1982-09-13 | 1984-10-30 | The United States Of America As Represented By The Secretary Of The Navy | Underwater splice for submarine coaxial cable |
SU1392603A1 (en) | 1982-11-19 | 1988-04-30 | Физико-технический институт низких температур АН УССР | Band-rejection filter |
US4487996A (en) | 1982-12-02 | 1984-12-11 | Electric Power Research Institute, Inc. | Shielded electrical cable |
US4575676A (en) | 1983-04-04 | 1986-03-11 | Advanced Research And Applications Corporation | Method and apparatus for radiation testing of electron devices |
JPS59226167A (en) | 1983-06-04 | 1984-12-19 | Dainippon Screen Mfg Co Ltd | Surface treating device for circuit board |
FR2547945B1 (en) | 1983-06-21 | 1986-05-02 | Raffinage Cie Francaise | NEW STRUCTURE OF ELECTRIC CABLE AND ITS APPLICATIONS |
US4588950A (en) | 1983-11-15 | 1986-05-13 | Data Probe Corporation | Test system for VLSI digital circuit and method of testing |
US4588970A (en) | 1984-01-09 | 1986-05-13 | Hewlett-Packard Company | Three section termination for an R.F. triaxial directional bridge |
US4816767A (en) | 1984-01-09 | 1989-03-28 | Hewlett-Packard Company | Vector network analyzer with integral processor |
US4703433A (en) | 1984-01-09 | 1987-10-27 | Hewlett-Packard Company | Vector network analyzer with integral processor |
US4557599A (en) | 1984-03-06 | 1985-12-10 | General Signal Corporation | Calibration and alignment target plate |
US4697143A (en) | 1984-04-30 | 1987-09-29 | Cascade Microtech, Inc. | Wafer probe |
JPS60235304A (en) | 1984-05-08 | 1985-11-22 | 株式会社フジクラ | Dc power cable |
US4675600A (en) | 1984-05-17 | 1987-06-23 | Geo International Corporation | Testing apparatus for plated through-holes on printed circuit boards, and probe therefor |
DE3419762A1 (en) | 1984-05-26 | 1985-11-28 | Heidelberger Druckmaschinen Ag, 6900 Heidelberg | BOW ROTATION PRINTING MACHINE IN SERIES DESIGN OF PRINTING UNITS |
US4515133A (en) | 1984-05-31 | 1985-05-07 | Frank Roman | Fuel economizing device |
US4755747A (en) | 1984-06-15 | 1988-07-05 | Canon Kabushiki Kaisha | Wafer prober and a probe card to be used therewith |
US4568950A (en) * | 1984-06-19 | 1986-02-04 | Pitney Bowes Inc. | Postage meter-thermal tape pressure and drive control printer |
US4691831A (en) | 1984-06-25 | 1987-09-08 | Takeda Riken Co., Ltd. | IC test equipment |
US4694245A (en) | 1984-09-07 | 1987-09-15 | Precision Drilling, Inc. | Vacuum-actuated top access test probe fixture |
FR2575308B1 (en) | 1984-12-21 | 1989-03-31 | Bendix Electronics Sa | METHOD AND CHAIN OF PROCESSING THE ANALOG SIGNAL OF A SENSOR |
US4713347A (en) | 1985-01-14 | 1987-12-15 | Sensor Diagnostics, Inc. | Measurement of ligand/anti-ligand interactions using bulk conductance |
US4680538A (en) | 1985-01-15 | 1987-07-14 | Cornell Research Foundation, Inc. | Millimeter wave vector network analyzer |
US4856904A (en) | 1985-01-21 | 1989-08-15 | Nikon Corporation | Wafer inspecting apparatus |
US4651115A (en) * | 1985-01-31 | 1987-03-17 | Rca Corporation | Waveguide-to-microstrip transition |
US4744041A (en) | 1985-03-04 | 1988-05-10 | International Business Machines Corporation | Method for testing DC motors |
US4780670A (en) | 1985-03-04 | 1988-10-25 | Xerox Corporation | Active probe card for high resolution/low noise wafer level testing |
US4665360A (en) | 1985-03-11 | 1987-05-12 | Eaton Corporation | Docking apparatus |
US4691163A (en) | 1985-03-19 | 1987-09-01 | Elscint Ltd. | Dual frequency surface probes |
US4755746A (en) | 1985-04-24 | 1988-07-05 | Prometrix Corporation | Apparatus and methods for semiconductor wafer testing |
US4734872A (en) | 1985-04-30 | 1988-03-29 | Temptronic Corporation | Temperature control for device under test |
US4684883A (en) | 1985-05-13 | 1987-08-04 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method of manufacturing high-quality semiconductor light-emitting devices |
US4818169A (en) | 1985-05-17 | 1989-04-04 | Schram Richard R | Automated wafer inspection system |
US4695794A (en) | 1985-05-31 | 1987-09-22 | Santa Barbara Research Center | Voltage calibration in E-beam probe using optical flooding |
FR2585513B1 (en) | 1985-07-23 | 1987-10-09 | Thomson Csf | COUPLING DEVICE BETWEEN A METAL WAVEGUIDE, A DIELECTRIC WAVEGUIDE AND A SEMICONDUCTOR COMPONENT, AND MIXER USING THE SAME |
EP0213825A3 (en) | 1985-08-22 | 1989-04-26 | Molecular Devices Corporation | Multiple chemically modulated capacitance |
US4746857A (en) | 1985-09-13 | 1988-05-24 | Danippon Screen Mfg. Co. Ltd. | Probing apparatus for measuring electrical characteristics of semiconductor device formed on wafer |
US4777434A (en) | 1985-10-03 | 1988-10-11 | Amp Incorporated | Microelectronic burn-in system |
US4684783A (en) | 1985-11-06 | 1987-08-04 | Sawtek, Inc. | Environmental control apparatus for electrical circuit elements |
US4853627A (en) | 1985-12-23 | 1989-08-01 | Triquint Semiconductor, Inc. | Wafer probes |
US4709141A (en) | 1986-01-09 | 1987-11-24 | Rockwell International Corporation | Non-destructive testing of cooled detector arrays |
US4757255A (en) | 1986-03-03 | 1988-07-12 | National Semiconductor Corporation | Environmental box for automated wafer probing |
US4784213A (en) | 1986-04-08 | 1988-11-15 | Temptronic Corporation | Mixing valve air source |
US4712370A (en) | 1986-04-24 | 1987-12-15 | The United States Of America As Represented By The Secretary Of The Air Force | Sliding duct seal |
US4730158A (en) | 1986-06-06 | 1988-03-08 | Santa Barbara Research Center | Electron-beam probing of photodiodes |
US4766384A (en) | 1986-06-20 | 1988-08-23 | Schlumberger Technology Corp. | Well logging apparatus for determining dip, azimuth, and invaded zone conductivity |
US5095891A (en) * | 1986-07-10 | 1992-03-17 | Siemens Aktiengesellschaft | Connecting cable for use with a pulse generator and a shock wave generator |
DE3625631A1 (en) | 1986-07-29 | 1988-02-04 | Gore W L & Co Gmbh | ELECTROMAGNETIC SHIELDING |
US4739259A (en) | 1986-08-01 | 1988-04-19 | Tektronix, Inc. | Telescoping pin probe |
US4783625A (en) | 1986-08-21 | 1988-11-08 | Tektronix, Inc. | Wideband high impedance card mountable probe |
JPS6362245A (en) * | 1986-09-02 | 1988-03-18 | Canon Inc | Wafer prober |
US4758785A (en) | 1986-09-03 | 1988-07-19 | Tektronix, Inc. | Pressure control apparatus for use in an integrated circuit testing station |
US4673839A (en) | 1986-09-08 | 1987-06-16 | Tektronix, Inc. | Piezoelectric pressure sensing apparatus for integrated circuit testing stations |
US4759712A (en) | 1986-10-17 | 1988-07-26 | Temptronic Corporation | Device for applying controlled temperature stimuli to nerve sensitive tissue |
US4787752A (en) | 1986-10-24 | 1988-11-29 | Fts Systems, Inc. | Live component temperature conditioning device providing fast temperature variations |
DE3637549A1 (en) | 1986-11-04 | 1988-05-11 | Hans Dr Med Rosenberger | Measuring device for testing the dielectric properties of biological tissues |
GB2197081A (en) | 1986-11-07 | 1988-05-11 | Plessey Co Plc | Coplanar waveguide probe |
US4771234A (en) | 1986-11-20 | 1988-09-13 | Hewlett-Packard Company | Vacuum actuated test fixture |
US4754239A (en) | 1986-12-19 | 1988-06-28 | The United States Of America As Represented By The Secretary Of The Air Force | Waveguide to stripline transition assembly |
US4772846A (en) | 1986-12-29 | 1988-09-20 | Hughes Aircraft Company | Wafer alignment and positioning apparatus for chip testing by voltage contrast electron microscopy |
US4812754A (en) * | 1987-01-07 | 1989-03-14 | Tracy Theodore A | Circuit board interfacing apparatus |
US4918383A (en) | 1987-01-20 | 1990-04-17 | Huff Richard E | Membrane probe with automatic contact scrub action |
US4727637A (en) * | 1987-01-20 | 1988-03-01 | The Boeing Company | Computer aided connector assembly method and apparatus |
US4827211A (en) | 1987-01-30 | 1989-05-02 | Cascade Microtech, Inc. | Wafer probe |
US4711563A (en) | 1987-02-11 | 1987-12-08 | Lass Bennett D | Portable collapsible darkroom |
US4864227A (en) | 1987-02-27 | 1989-09-05 | Canon Kabushiki Kaisha | Wafer prober |
US4731577A (en) | 1987-03-05 | 1988-03-15 | Logan John K | Coaxial probe card |
US4871965A (en) | 1987-03-16 | 1989-10-03 | Apex Microtechnology Corporation | Environmental testing facility for electronic components |
US4845426A (en) | 1987-05-20 | 1989-07-04 | Signatone Corporation | Temperature conditioner for tests of unpackaged semiconductors |
US4810981A (en) | 1987-06-04 | 1989-03-07 | General Microwave Corporation | Assembly of microwave components |
US4884026A (en) | 1987-06-24 | 1989-11-28 | Tokyo Electron Limited | Electrical characteristic measuring apparatus |
US4838802A (en) | 1987-07-08 | 1989-06-13 | Tektronix, Inc. | Low inductance ground lead |
CH673248A5 (en) | 1987-08-28 | 1990-02-28 | Charmilles Technologies | |
US4755874A (en) | 1987-08-31 | 1988-07-05 | Kla Instruments Corporation | Emission microscopy system |
US5198752A (en) | 1987-09-02 | 1993-03-30 | Tokyo Electron Limited | Electric probing-test machine having a cooling system |
JPH0660912B2 (en) | 1987-09-07 | 1994-08-10 | 浜松ホトニクス株式会社 | Voltage detector |
US4791363A (en) | 1987-09-28 | 1988-12-13 | Logan John K | Ceramic microstrip probe blade |
US4929893A (en) | 1987-10-06 | 1990-05-29 | Canon Kabushiki Kaisha | Wafer prober |
US4853613A (en) | 1987-10-27 | 1989-08-01 | Martin Marietta Corporation | Calibration method for apparatus evaluating microwave/millimeter wave circuits |
BE1000697A6 (en) | 1987-10-28 | 1989-03-14 | Irish Transformers Ltd | Device for testing integrated electrical circuits. |
US4859989A (en) | 1987-12-01 | 1989-08-22 | W. L. Gore & Associates, Inc. | Security system and signal carrying member thereof |
FR2626376B1 (en) | 1988-01-22 | 1990-07-13 | Commissariat Energie Atomique | DEVICE AND METHOD FOR MEASURING A SHORT RADIATION PULSE OR A BRIEF ELECTRIC PULSE |
US4926118A (en) | 1988-02-22 | 1990-05-15 | Sym-Tek Systems, Inc. | Test station |
MY103847A (en) | 1988-03-15 | 1993-09-30 | Yamaichi Electric Mfg | Laminated board for testing electronic components |
US4858160A (en) | 1988-03-18 | 1989-08-15 | Cascade Microtech, Inc. | System for setting reference reactance for vector corrected measurements |
US4839587A (en) | 1988-03-29 | 1989-06-13 | Digital Equipment Corporation | Test fixture for tab circuits and devices |
FR2631165B1 (en) | 1988-05-05 | 1992-02-21 | Moulene Daniel | TEMPERATURE CONDITIONING MEDIUM FOR SMALL OBJECTS SUCH AS SEMICONDUCTOR COMPONENTS AND THERMAL REGULATION METHOD USING THE SAME |
US5354695A (en) | 1992-04-08 | 1994-10-11 | Leedy Glenn J | Membrane dielectric isolation IC fabrication |
US4831494A (en) | 1988-06-27 | 1989-05-16 | International Business Machines Corporation | Multilayer capacitor |
US4918374A (en) | 1988-10-05 | 1990-04-17 | Applied Precision, Inc. | Method and apparatus for inspecting integrated circuit probe cards |
US4906920A (en) | 1988-10-11 | 1990-03-06 | Hewlett-Packard Company | Self-leveling membrane probe |
CA1278106C (en) | 1988-11-02 | 1990-12-18 | Gordon Glen Rabjohn | Tunable microwave wafer probe |
US4849689A (en) | 1988-11-04 | 1989-07-18 | Cascade Microtech, Inc. | Microwave wafer probe having replaceable probe tip |
US5142224A (en) | 1988-12-13 | 1992-08-25 | Comsat | Non-destructive semiconductor wafer probing system using laser pulses to generate and detect millimeter wave signals |
US4916398A (en) | 1988-12-21 | 1990-04-10 | Spectroscopy Imaging Systems Corp. | Efficient remote transmission line probe tuning for NMR apparatus |
US4922128A (en) | 1989-01-13 | 1990-05-01 | Ibm Corporation | Boost clock circuit for driving redundant wordlines and sample wordlines |
US5232789A (en) | 1989-03-09 | 1993-08-03 | Mtu Motoren- Und Turbinen-Union Muenchen Gmbh | Structural component with a protective coating having a nickel or cobalt basis and method for making such a coating |
US5159752A (en) | 1989-03-22 | 1992-11-03 | Texas Instruments Incorporated | Scanning electron microscope based parametric testing method and apparatus |
US5304924A (en) | 1989-03-29 | 1994-04-19 | Canon Kabushiki Kaisha | Edge detector |
US4978907A (en) | 1989-05-10 | 1990-12-18 | At&T Bell Laboratories | Apparatus and method for expanding the frequency range over which electrical signal amplitudes can be accurately measured |
US5030907A (en) | 1989-05-19 | 1991-07-09 | Knights Technology, Inc. | CAD driven microprobe integrated circuit tester |
US5045781A (en) | 1989-06-08 | 1991-09-03 | Cascade Microtech, Inc. | High-frequency active probe having replaceable contact needles |
US5101149A (en) | 1989-07-18 | 1992-03-31 | National Semiconductor Corporation | Modifiable IC board |
US5218185A (en) | 1989-08-15 | 1993-06-08 | Trustees Of The Thomas A. D. Gross 1988 Revocable Trust | Elimination of potentially harmful electrical and magnetic fields from electric blankets and other electrical appliances |
US5041782A (en) | 1989-09-20 | 1991-08-20 | Design Technique International, Inc. | Microstrip probe |
US4923407A (en) | 1989-10-02 | 1990-05-08 | Tektronix, Inc. | Adjustable low inductance probe |
US5077523A (en) | 1989-11-03 | 1991-12-31 | John H. Blanz Company, Inc. | Cryogenic probe station having movable chuck accomodating variable thickness probe cards |
US5166606A (en) | 1989-11-03 | 1992-11-24 | John H. Blanz Company, Inc. | High efficiency cryogenic test station |
US5160883A (en) | 1989-11-03 | 1992-11-03 | John H. Blanz Company, Inc. | Test station having vibrationally stabilized X, Y and Z movable integrated circuit receiving support |
US4968931A (en) | 1989-11-03 | 1990-11-06 | Motorola, Inc. | Apparatus and method for burning in integrated circuit wafers |
US5097207A (en) * | 1989-11-03 | 1992-03-17 | John H. Blanz Company, Inc. | Temperature stable cryogenic probe station |
US5267088A (en) | 1989-11-10 | 1993-11-30 | Asahi Kogaku Kogyo Kabushiki Kaisha | Code plate mounting device |
US5103169A (en) | 1989-11-15 | 1992-04-07 | Texas Instruments Incorporated | Relayless interconnections in high performance signal paths |
JPH03184355A (en) | 1989-12-13 | 1991-08-12 | Mitsubishi Electric Corp | Wafer prober |
US5066357A (en) | 1990-01-11 | 1991-11-19 | Hewlett-Packard Company | Method for making flexible circuit card with laser-contoured vias and machined capacitors |
US5298972A (en) | 1990-01-22 | 1994-03-29 | Hewlett-Packard Company | Method and apparatus for measuring polarization sensitivity of optical devices |
US5001423A (en) * | 1990-01-24 | 1991-03-19 | International Business Machines Corporation | Dry interface thermal chuck temperature control system for semiconductor wafer testing |
US5065092A (en) | 1990-05-14 | 1991-11-12 | Triple S Engineering, Inc. | System for locating probe tips on an integrated circuit probe card and method therefor |
US5408189A (en) | 1990-05-25 | 1995-04-18 | Everett Charles Technologies, Inc. | Test fixture alignment system for printed circuit boards |
US5065089A (en) | 1990-06-01 | 1991-11-12 | Tovex Tech, Inc. | Circuit handler with sectioned rail |
US5070297A (en) | 1990-06-04 | 1991-12-03 | Texas Instruments Incorporated | Full wafer integrated circuit testing device |
US5012186A (en) | 1990-06-08 | 1991-04-30 | Cascade Microtech, Inc. | Electrical probe with contact force protection |
US5245292A (en) | 1990-06-12 | 1993-09-14 | Iniziative Marittime 1991, S.R.L. | Method and apparatus for sensing a fluid handling |
DE4018993A1 (en) | 1990-06-13 | 1991-12-19 | Max Planck Inst Eisenforschung | METHOD AND DEVICE FOR EXAMINING COATED METAL SURFACES |
US5198753A (en) | 1990-06-29 | 1993-03-30 | Digital Equipment Corporation | Integrated circuit test fixture and method |
US5061823A (en) | 1990-07-13 | 1991-10-29 | W. L. Gore & Associates, Inc. | Crush-resistant coaxial transmission line |
US5569591A (en) | 1990-08-03 | 1996-10-29 | University College Of Wales Aberystwyth | Analytical or monitoring apparatus and method |
KR0138754B1 (en) | 1990-08-06 | 1998-06-15 | 이노우에 아키라 | Touch sensor unit of probe for testing electric circuit and electric circuit testing apparatus using the touch sensor unit |
US5105181A (en) | 1990-08-17 | 1992-04-14 | Hydro-Quebec | Method and electrical measuring apparatus for analyzing the impedance of the source of an actual alternating voltage |
US5363050A (en) | 1990-08-31 | 1994-11-08 | Guo Wendy W | Quantitative dielectric imaging system |
US6037785A (en) | 1990-09-20 | 2000-03-14 | Higgins; H. Dan | Probe card apparatus |
JP2802825B2 (en) | 1990-09-22 | 1998-09-24 | 大日本スクリーン製造 株式会社 | Semiconductor wafer electrical measurement device |
JP3196206B2 (en) | 1990-09-25 | 2001-08-06 | 東芝ライテック株式会社 | Discharge lamp lighting device |
US5159267A (en) | 1990-09-28 | 1992-10-27 | Sematech, Inc. | Pneumatic energy fluxmeter |
GB9021448D0 (en) | 1990-10-03 | 1990-11-14 | Renishaw Plc | Capacitance sensing probe |
JP2544015Y2 (en) | 1990-10-15 | 1997-08-13 | 株式会社アドバンテスト | IC test equipment |
US5094536A (en) | 1990-11-05 | 1992-03-10 | Litel Instruments | Deformable wafer chuck |
US5325052A (en) | 1990-11-30 | 1994-06-28 | Tokyo Electron Yamanashi Limited | Probe apparatus |
JP3699349B2 (en) | 1990-12-25 | 2005-09-28 | 日本碍子株式会社 | Wafer adsorption heating device |
US5107076A (en) | 1991-01-08 | 1992-04-21 | W. L. Gore & Associates, Inc. | Easy strip composite dielectric coaxial signal cable |
US5105148A (en) | 1991-01-24 | 1992-04-14 | Itt Corporation | Replaceable tip test probe |
US5136237A (en) | 1991-01-29 | 1992-08-04 | Tektronix, Inc. | Double insulated floating high voltage test probe |
US5371457A (en) | 1991-02-12 | 1994-12-06 | Lipp; Robert J. | Method and apparatus to test for current in an integrated circuit |
US5233306A (en) | 1991-02-13 | 1993-08-03 | The Board Of Regents Of The University Of Wisconsin System | Method and apparatus for measuring the permittivity of materials |
DE4109908C2 (en) | 1991-03-26 | 1994-05-05 | Erich Reitinger | Arrangement for testing semiconductor wafers |
US5144228A (en) | 1991-04-23 | 1992-09-01 | International Business Machines Corporation | Probe interface assembly |
US5172051A (en) | 1991-04-24 | 1992-12-15 | Hewlett-Packard Company | Wide bandwidth passive probe |
US5164661A (en) | 1991-05-31 | 1992-11-17 | Ej Systems, Inc. | Thermal control system for a semi-conductor burn-in |
US5225037A (en) | 1991-06-04 | 1993-07-06 | Texas Instruments Incorporated | Method for fabrication of probe card for testing of semiconductor devices |
US5101453A (en) | 1991-07-05 | 1992-03-31 | Cascade Microtech, Inc. | Fiber optic wafer probe |
US5233197A (en) | 1991-07-15 | 1993-08-03 | University Of Massachusetts Medical Center | High speed digital imaging microscope |
US5210485A (en) | 1991-07-26 | 1993-05-11 | International Business Machines Corporation | Probe for wafer burn-in test system |
US5198756A (en) | 1991-07-29 | 1993-03-30 | Atg-Electronics Inc. | Test fixture wiring integrity verification device |
US5321352A (en) | 1991-08-01 | 1994-06-14 | Tokyo Electron Yamanashi Limited | Probe apparatus and method of alignment for the same |
US5321453A (en) | 1991-08-03 | 1994-06-14 | Tokyo Electron Limited | Probe apparatus for probing an object held above the probe card |
US5404111A (en) | 1991-08-03 | 1995-04-04 | Tokyo Electron Limited | Probe apparatus with a swinging holder for an object of examination |
US5209088A (en) | 1991-08-08 | 1993-05-11 | Rimma Vaks | Changeable code lock |
US5336989A (en) | 1991-09-19 | 1994-08-09 | Audio Presicion | AC mains test apparatus and method |
US5420516A (en) | 1991-09-20 | 1995-05-30 | Audio Precision, Inc. | Method and apparatus for fast response and distortion measurement |
US5198758A (en) | 1991-09-23 | 1993-03-30 | Digital Equipment Corp. | Method and apparatus for complete functional testing of a complex signal path of a semiconductor chip |
US5159264A (en) | 1991-10-02 | 1992-10-27 | Sematech, Inc. | Pneumatic energy fluxmeter |
US5214243A (en) | 1991-10-11 | 1993-05-25 | Endevco Corporation | High-temperature, low-noise coaxial cable assembly with high strength reinforcement braid |
US5334931A (en) | 1991-11-12 | 1994-08-02 | International Business Machines Corporation | Molded test probe assembly |
US5846708A (en) | 1991-11-19 | 1998-12-08 | Massachusetts Institiute Of Technology | Optical and electrical methods and apparatus for molecule detection |
IL103674A0 (en) | 1991-11-19 | 1993-04-04 | Houston Advanced Res Center | Method and apparatus for molecule detection |
US5414565A (en) | 1991-11-27 | 1995-05-09 | Sullivan; Mark T. | Tilting kinematic mount |
US5214374A (en) | 1991-12-12 | 1993-05-25 | Everett/Charles Contact Products, Inc. | Dual level test fixture |
US5274336A (en) | 1992-01-14 | 1993-12-28 | Hewlett-Packard Company | Capacitively-coupled test probe |
US5374938A (en) | 1992-01-21 | 1994-12-20 | Sharp Kabushiki Kaisha | Waveguide to microstrip conversion means in a satellite broadcasting adaptor |
US5225796A (en) | 1992-01-27 | 1993-07-06 | Tektronix, Inc. | Coplanar transmission structure having spurious mode suppression |
US5210377A (en) | 1992-01-29 | 1993-05-11 | W. L. Gore & Associates, Inc. | Coaxial electric signal cable having a composite porous insulation |
US5279975A (en) | 1992-02-07 | 1994-01-18 | Micron Technology, Inc. | Method of testing individual dies on semiconductor wafers prior to singulation |
US5221905A (en) | 1992-02-28 | 1993-06-22 | International Business Machines Corporation | Test system with reduced test contact interface resistance |
US5202558A (en) | 1992-03-04 | 1993-04-13 | Barker Lynn M | Flexible fiber optic probe for high-pressure shock experiments |
US5376790A (en) | 1992-03-13 | 1994-12-27 | Park Scientific Instruments | Scanning probe microscope |
US5672816A (en) | 1992-03-13 | 1997-09-30 | Park Scientific Instruments | Large stage system for scanning probe microscopes and other instruments |
US5254939A (en) | 1992-03-20 | 1993-10-19 | Xandex, Inc. | Probe card system |
US5478748A (en) | 1992-04-01 | 1995-12-26 | Thomas Jefferson University | Protein assay using microwave energy |
DE4211362C2 (en) | 1992-04-04 | 1995-04-20 | Berthold Lab Prof Dr | Device for determining material parameters by microwave measurements |
US5237267A (en) * | 1992-05-29 | 1993-08-17 | Cascade Microtech, Inc. | Wafer probe station having auxiliary chucks |
US5266889A (en) | 1992-05-29 | 1993-11-30 | Cascade Microtech, Inc. | Wafer probe station with integrated environment control enclosure |
JP3219844B2 (en) | 1992-06-01 | 2001-10-15 | 東京エレクトロン株式会社 | Probe device |
US5479109A (en) | 1992-06-03 | 1995-12-26 | Trw Inc. | Testing device for integrated circuits on wafer |
US6313649B2 (en) | 1992-06-11 | 2001-11-06 | Cascade Microtech, Inc. | Wafer probe station having environment control enclosure |
US6380751B2 (en) | 1992-06-11 | 2002-04-30 | Cascade Microtech, Inc. | Wafer probe station having environment control enclosure |
JP3228348B2 (en) | 1992-07-03 | 2001-11-12 | キヤノン株式会社 | Polymer liquid crystal compound, liquid crystal composition and liquid crystal element |
JPH0634715A (en) | 1992-07-17 | 1994-02-10 | Mitsubishi Electric Corp | High-frequency band probe head |
FR2695508B1 (en) | 1992-09-08 | 1994-10-21 | Filotex Sa | Low noise cable. |
US5227730A (en) | 1992-09-14 | 1993-07-13 | Kdc Technology Corp. | Microwave needle dielectric sensors |
US5479108A (en) | 1992-11-25 | 1995-12-26 | David Cheng | Method and apparatus for handling wafers |
JPH06151532A (en) * | 1992-11-13 | 1994-05-31 | Tokyo Electron Yamanashi Kk | Prober |
US5684669A (en) * | 1995-06-07 | 1997-11-04 | Applied Materials, Inc. | Method for dechucking a workpiece from an electrostatic chuck |
US5512835A (en) | 1992-12-22 | 1996-04-30 | Hughes Aircraft Company | Electrical probe and method for measuring gaps and other discontinuities in enclosures using electrical inductance for RF shielding assessment |
JP3175367B2 (en) | 1992-12-24 | 2001-06-11 | 東レ株式会社 | Liquid crystalline polyester with improved homogeneity |
US5422574A (en) | 1993-01-14 | 1995-06-06 | Probe Technology Corporation | Large scale protrusion membrane for semiconductor devices under test with very high pin counts |
JP3323572B2 (en) | 1993-03-15 | 2002-09-09 | 浜松ホトニクス株式会社 | EO probe positioning method for voltage measurement device |
US5303938A (en) | 1993-03-25 | 1994-04-19 | Miller Donald C | Kelvin chuck apparatus and method of manufacture |
US5539676A (en) | 1993-04-15 | 1996-07-23 | Tokyo Electron Limited | Method of identifying probe position and probing method in prober |
US5357211A (en) | 1993-05-03 | 1994-10-18 | Raytheon Company | Pin driver amplifier |
US5448172A (en) | 1993-05-05 | 1995-09-05 | Auburn International, Inc. | Triboelectric instrument with DC drift compensation |
US5539323A (en) | 1993-05-07 | 1996-07-23 | Brooks Automation, Inc. | Sensor for articles such as wafers on end effector |
DE4316111A1 (en) | 1993-05-13 | 1994-11-17 | Ehlermann Eckhard | Integrated circuit test board suitable for high-temperature measurements |
US5467021A (en) | 1993-05-24 | 1995-11-14 | Atn Microwave, Inc. | Calibration method and apparatus |
US5657394A (en) | 1993-06-04 | 1997-08-12 | Integrated Technology Corporation | Integrated circuit probe card inspection system |
US5373231A (en) | 1993-06-10 | 1994-12-13 | G. G. B. Industries, Inc. | Integrated circuit probing apparatus including a capacitor bypass structure |
US5412330A (en) | 1993-06-16 | 1995-05-02 | Tektronix, Inc. | Optical module for an optically based measurement system |
US5550482A (en) | 1993-07-20 | 1996-08-27 | Tokyo Electron Kabushiki Kaisha | Probe device |
JP3395264B2 (en) | 1993-07-26 | 2003-04-07 | 東京応化工業株式会社 | Rotating cup type coating device |
US5451884A (en) | 1993-08-04 | 1995-09-19 | Transat Corp. | Electronic component temperature test system with flat ring revolving carriage |
US5792668A (en) | 1993-08-06 | 1998-08-11 | Solid State Farms, Inc. | Radio frequency spectral analysis for in-vitro or in-vivo environments |
US5494030A (en) | 1993-08-12 | 1996-02-27 | Trustees Of Dartmouth College | Apparatus and methodology for determining oxygen in biological systems |
US5326428A (en) | 1993-09-03 | 1994-07-05 | Micron Semiconductor, Inc. | Method for testing semiconductor circuitry for operability and method of forming apparatus for testing semiconductor circuitry for operability |
US5600258A (en) | 1993-09-15 | 1997-02-04 | Intest Corporation | Method and apparatus for automated docking of a test head to a device handler |
US5500606A (en) | 1993-09-16 | 1996-03-19 | Compaq Computer Corporation | Completely wireless dual-access test fixture |
JP3089150B2 (en) | 1993-10-19 | 2000-09-18 | キヤノン株式会社 | Positioning stage device |
US5467024A (en) | 1993-11-01 | 1995-11-14 | Motorola, Inc. | Integrated circuit test with programmable source for both AC and DC modes of operation |
US5974662A (en) | 1993-11-16 | 1999-11-02 | Formfactor, Inc. | Method of planarizing tips of probe elements of a probe card assembly |
US6064213A (en) | 1993-11-16 | 2000-05-16 | Formfactor, Inc. | Wafer-level burn-in and test |
US5798652A (en) | 1993-11-23 | 1998-08-25 | Semicoa Semiconductors | Method of batch testing surface mount devices using a substrate edge connector |
US5669316A (en) | 1993-12-10 | 1997-09-23 | Sony Corporation | Turntable for rotating a wafer carrier |
US5467249A (en) | 1993-12-20 | 1995-11-14 | International Business Machines Corporation | Electrostatic chuck with reference electrode |
US5642056A (en) | 1993-12-22 | 1997-06-24 | Tokyo Electron Limited | Probe apparatus for correcting the probe card posture before testing |
US6064217A (en) | 1993-12-23 | 2000-05-16 | Epi Technologies, Inc. | Fine pitch contact device employing a compliant conductive polymer bump |
US5475316A (en) | 1993-12-27 | 1995-12-12 | Hypervision, Inc. | Transportable image emission microscope |
US5510792A (en) | 1993-12-27 | 1996-04-23 | Tdk Corporation | Anechoic chamber and wave absorber |
JP3565893B2 (en) | 1994-02-04 | 2004-09-15 | アジレント・テクノロジーズ・インク | Probe device and electric circuit element measuring device |
US5583445A (en) | 1994-02-04 | 1996-12-10 | Hughes Aircraft Company | Opto-electronic membrane probe |
US5642298A (en) | 1994-02-16 | 1997-06-24 | Ade Corporation | Wafer testing and self-calibration system |
US5611946A (en) | 1994-02-18 | 1997-03-18 | New Wave Research | Multi-wavelength laser system, probe station and laser cutter system using the same |
US5477011A (en) | 1994-03-03 | 1995-12-19 | W. L. Gore & Associates, Inc. | Low noise signal transmission cable |
US5565881A (en) | 1994-03-11 | 1996-10-15 | Motorola, Inc. | Balun apparatus including impedance transformer having transformation length |
KR100296646B1 (en) | 1994-03-31 | 2001-10-24 | 히가시 데쓰로 | Probe system and probe method |
US5523694A (en) | 1994-04-08 | 1996-06-04 | Cole, Jr.; Edward I. | Integrated circuit failure analysis by low-energy charge-induced voltage alteration |
US5528158A (en) | 1994-04-11 | 1996-06-18 | Xandex, Inc. | Probe card changer system and method |
DE9406227U1 (en) | 1994-04-14 | 1995-08-31 | Meyer Fa Rud Otto | Temperature change test device |
US5604983A (en) * | 1994-04-14 | 1997-02-25 | The Gillette Company | Razor system |
US5530372A (en) | 1994-04-15 | 1996-06-25 | Schlumberger Technologies, Inc. | Method of probing a net of an IC at an optimal probe-point |
US5546012A (en) | 1994-04-15 | 1996-08-13 | International Business Machines Corporation | Probe card assembly having a ceramic probe card |
IL109492A (en) | 1994-05-01 | 1999-06-20 | Sirotech Ltd | Method and apparatus for evaluating bacterial populations |
US5511010A (en) | 1994-06-10 | 1996-04-23 | Texas Instruments Incorporated | Method and apparatus of eliminating interference in an undersettled electrical signal |
US5505150A (en) | 1994-06-14 | 1996-04-09 | L&P Property Management Company | Method and apparatus for facilitating loop take time adjustment in multi-needle quilting machine |
DE69532367T2 (en) | 1994-07-01 | 2004-10-21 | Interstitial Llc | Detection and representation of breast cancer by electromagnetic millimeter waves |
US5829437A (en) | 1994-07-01 | 1998-11-03 | Interstitial, Inc. | Microwave method and system to detect and locate cancers in heterogenous tissues |
US5550480A (en) | 1994-07-05 | 1996-08-27 | Motorola, Inc. | Method and means for controlling movement of a chuck in a test apparatus |
US5584608A (en) | 1994-07-05 | 1996-12-17 | Gillespie; Harvey D. | Anchored cable sling system |
US5506515A (en) | 1994-07-20 | 1996-04-09 | Cascade Microtech, Inc. | High-frequency probe tip assembly |
US5565788A (en) | 1994-07-20 | 1996-10-15 | Cascade Microtech, Inc. | Coaxial wafer probe with tip shielding |
GB9418183D0 (en) | 1994-09-09 | 1994-10-26 | Chan Tsing Y A | Non-destructive method for determination of polar molecules on rigid and semi-rigid substrates |
US5515167A (en) | 1994-09-13 | 1996-05-07 | Hughes Aircraft Company | Transparent optical chuck incorporating optical monitoring |
AU3890095A (en) | 1994-09-19 | 1996-04-09 | Terry Lee Mauney | Plant growing system |
US5469324A (en) | 1994-10-07 | 1995-11-21 | Storage Technology Corporation | Integrated decoupling capacitive core for a printed circuit board and method of making same |
US5508631A (en) | 1994-10-27 | 1996-04-16 | Mitel Corporation | Semiconductor test chip with on wafer switching matrix |
US5572398A (en) | 1994-11-14 | 1996-11-05 | Hewlett-Packard Co. | Tri-polar electrostatic chuck |
US5583733A (en) | 1994-12-21 | 1996-12-10 | Polaroid Corporation | Electrostatic discharge protection device |
JPH08179008A (en) | 1994-12-22 | 1996-07-12 | Advantest Corp | Test head cooling device |
US5731920A (en) | 1994-12-22 | 1998-03-24 | Canon Kabushiki Kaisha | Converting adapter for interchangeable lens assembly |
US5792562A (en) | 1995-01-12 | 1998-08-11 | Applied Materials, Inc. | Electrostatic chuck with polymeric impregnation and method of making |
DE19605214A1 (en) | 1995-02-23 | 1996-08-29 | Bosch Gmbh Robert | Ultrasonic drive element |
US5517111A (en) | 1995-03-16 | 1996-05-14 | Phase Metrics | Automatic testing system for magnetoresistive heads |
JP3368451B2 (en) | 1995-03-17 | 2003-01-20 | 富士通株式会社 | Circuit board manufacturing method and circuit inspection device |
US5777485A (en) | 1995-03-20 | 1998-07-07 | Tokyo Electron Limited | Probe method and apparatus with improved probe contact |
US5835997A (en) | 1995-03-28 | 1998-11-10 | University Of South Florida | Wafer shielding chamber for probe station |
AU5540596A (en) | 1995-04-03 | 1996-10-23 | Gary H. Baker | A flexible darkness adapting viewer |
US5682337A (en) | 1995-04-13 | 1997-10-28 | Synopsys, Inc. | High speed three-state sampling |
US6232789B1 (en) | 1997-05-28 | 2001-05-15 | Cascade Microtech, Inc. | Probe holder for low current measurements |
US5610529A (en) | 1995-04-28 | 1997-03-11 | Cascade Microtech, Inc. | Probe station having conductive coating added to thermal chuck insulator |
DE19517330C2 (en) | 1995-05-11 | 2002-06-13 | Helmuth Heigl | handling device |
US6104203A (en) | 1995-05-16 | 2000-08-15 | Trio-Tech International | Test apparatus for electronic components |
US5804982A (en) | 1995-05-26 | 1998-09-08 | International Business Machines Corporation | Miniature probe positioning actuator |
US5646538A (en) | 1995-06-13 | 1997-07-08 | Measurement Systems, Inc. | Method and apparatus for fastener hole inspection with a capacitive probe |
EP0776530A4 (en) | 1995-06-21 | 1998-06-10 | Motorola Inc | Method and antenna for providing an omnidirectional pattern |
DE19522774A1 (en) | 1995-06-27 | 1997-01-02 | Ifu Gmbh | Appliance for spectroscopic examination of specimens taken from human body |
US5828225A (en) | 1995-07-05 | 1998-10-27 | Tokyo Electron Limited | Semiconductor wafer probing apparatus |
US5659421A (en) | 1995-07-05 | 1997-08-19 | Neuromedical Systems, Inc. | Slide positioning and holding device |
US5676360A (en) | 1995-07-11 | 1997-10-14 | Boucher; John N. | Machine tool rotary table locking apparatus |
US5656942A (en) | 1995-07-21 | 1997-08-12 | Electroglas, Inc. | Prober and tester with contact interface for integrated circuits-containing wafer held docked in a vertical plane |
JP3458586B2 (en) | 1995-08-21 | 2003-10-20 | 松下電器産業株式会社 | Microwave mixer circuit and down converter |
US5762512A (en) | 1995-10-12 | 1998-06-09 | Symbol Technologies, Inc. | Latchable battery pack for battery-operated electronic device having controlled power shutdown and turn on |
US5807107A (en) | 1995-10-20 | 1998-09-15 | Barrier Supply | Dental infection control system |
US5731708A (en) | 1995-10-31 | 1998-03-24 | Hughes Aircraft Company | Unpackaged semiconductor testing using an improved probe and precision X-Y table |
US5892539A (en) | 1995-11-08 | 1999-04-06 | Alpha Innotech Corporation | Portable emission microscope workstation for failure analysis |
US5953477A (en) | 1995-11-20 | 1999-09-14 | Visionex, Inc. | Method and apparatus for improved fiber optic light management |
JP2970505B2 (en) | 1995-11-21 | 1999-11-02 | 日本電気株式会社 | Semiconductor device wiring current observation method, inspection method and apparatus |
US5910727A (en) | 1995-11-30 | 1999-06-08 | Tokyo Electron Limited | Electrical inspecting apparatus with ventilation system |
US5729150A (en) | 1995-12-01 | 1998-03-17 | Cascade Microtech, Inc. | Low-current probe card with reduced triboelectric current generating cables |
EP0882239B1 (en) | 1996-02-06 | 2009-06-03 | Telefonaktiebolaget LM Ericsson (publ) | Assembly and method for testing integrated circuit devices |
US5841288A (en) | 1996-02-12 | 1998-11-24 | Microwave Imaging System Technologies, Inc. | Two-dimensional microwave imaging apparatus and methods |
US6327034B1 (en) | 1999-09-20 | 2001-12-04 | Rex Hoover | Apparatus for aligning two objects |
US5628057A (en) | 1996-03-05 | 1997-05-06 | Motorola, Inc. | Multi-port radio frequency signal transformation network |
US5773951A (en) | 1996-03-25 | 1998-06-30 | Digital Test Corporation | Wafer prober having sub-micron alignment accuracy |
JP3457495B2 (en) | 1996-03-29 | 2003-10-20 | 日本碍子株式会社 | Aluminum nitride sintered body, metal buried product, electronic functional material and electrostatic chuck |
US5631571A (en) | 1996-04-03 | 1997-05-20 | The United States Of America As Represented By The Secretary Of The Air Force | Infrared receiver wafer level probe testing |
US6628980B2 (en) | 2000-03-24 | 2003-09-30 | Surgi-Vision, Inc. | Apparatus, systems, and methods for in vivo magnetic resonance imaging |
US5838161A (en) | 1996-05-01 | 1998-11-17 | Micron Technology, Inc. | Semiconductor interconnect having test structures for evaluating electrical characteristics of the interconnect |
DE19618717C1 (en) | 1996-05-09 | 1998-01-15 | Multitest Elektronische Syst | Electrical connection device |
US5818084A (en) | 1996-05-15 | 1998-10-06 | Siliconix Incorporated | Pseudo-Schottky diode |
JP3388307B2 (en) * | 1996-05-17 | 2003-03-17 | 東京エレクトロン株式会社 | Probe card and method for assembling the same |
KR100471341B1 (en) | 1996-05-23 | 2005-07-21 | 제네시스 테크놀로지 가부시키가이샤 | Contact Probe and Probe Device with It |
US5748506A (en) | 1996-05-28 | 1998-05-05 | Motorola, Inc. | Calibration technique for a network analyzer |
US5879289A (en) | 1996-07-15 | 1999-03-09 | Universal Technologies International, Inc. | Hand-held portable endoscopic camera |
US5802856A (en) | 1996-07-31 | 1998-09-08 | Stanford University | Multizone bake/chill thermal cycling module |
US5793213A (en) | 1996-08-01 | 1998-08-11 | Motorola, Inc. | Method and apparatus for calibrating a network analyzer |
JP2962234B2 (en) | 1996-08-07 | 1999-10-12 | 日本電気株式会社 | Parasitic MIM structure location analysis method for semiconductor device and parasitic MIM structure location analysis method for Si semiconductor device |
US5847569A (en) | 1996-08-08 | 1998-12-08 | The Board Of Trustees Of The Leland Stanford Junior University | Electrical contact probe for sampling high frequency electrical signals |
US5872816A (en) * | 1996-08-20 | 1999-02-16 | Hughes Electronics Corporation | Coherent blind demodulation |
US5869326A (en) | 1996-09-09 | 1999-02-09 | Genetronics, Inc. | Electroporation employing user-configured pulsing scheme |
DE19636890C1 (en) | 1996-09-11 | 1998-02-12 | Bosch Gmbh Robert | Transition from a waveguide to a strip line |
US5999268A (en) | 1996-10-18 | 1999-12-07 | Tokyo Electron Limited | Apparatus for aligning a semiconductor wafer with an inspection contactor |
US5666063A (en) | 1996-10-23 | 1997-09-09 | Motorola, Inc. | Method and apparatus for testing an integrated circuit |
US5945836A (en) | 1996-10-29 | 1999-08-31 | Hewlett-Packard Company | Loaded-board, guided-probe test fixture |
US5883522A (en) | 1996-11-07 | 1999-03-16 | National Semiconductor Corporation | Apparatus and method for retaining a semiconductor wafer during testing |
US6216704B1 (en) | 1997-08-13 | 2001-04-17 | Surx, Inc. | Noninvasive devices, methods, and systems for shrinking of tissues |
US6184845B1 (en) * | 1996-11-27 | 2001-02-06 | Symmetricom, Inc. | Dielectric-loaded antenna |
US6603322B1 (en) | 1996-12-12 | 2003-08-05 | Ggb Industries, Inc. | Probe card for high speed testing |
JP3364401B2 (en) | 1996-12-27 | 2003-01-08 | 東京エレクトロン株式会社 | Probe card clamp mechanism and probe device |
US6307672B1 (en) | 1996-12-31 | 2001-10-23 | The United States Of America As Represented By The Department Of Energy | Microscope collision protection apparatus |
US5852232A (en) | 1997-01-02 | 1998-12-22 | Kla-Tencor Corporation | Acoustic sensor as proximity detector |
US5848500A (en) | 1997-01-07 | 1998-12-15 | Eastman Kodak Company | Light-tight enclosure and joint connectors for enclosure framework |
US6826422B1 (en) | 1997-01-13 | 2004-11-30 | Medispectra, Inc. | Spectral volume microprobe arrays |
JPH10204102A (en) | 1997-01-27 | 1998-08-04 | Mitsubishi Gas Chem Co Inc | Production of water-soluble tricarboxy polysaccharide |
US5982166A (en) * | 1997-01-27 | 1999-11-09 | Motorola, Inc. | Method for measuring a characteristic of a semiconductor wafer using cylindrical control |
JP3639887B2 (en) | 1997-01-30 | 2005-04-20 | 東京エレクトロン株式会社 | Inspection method and inspection apparatus |
US5888075A (en) | 1997-02-10 | 1999-03-30 | Kabushiki Kaisha Nihon Micronics | Auxiliary apparatus for testing device |
US6060891A (en) | 1997-02-11 | 2000-05-09 | Micron Technology, Inc. | Probe card for semiconductor wafers and method and system for testing wafers |
US6798224B1 (en) | 1997-02-11 | 2004-09-28 | Micron Technology, Inc. | Method for testing semiconductor wafers |
US5905421A (en) | 1997-02-18 | 1999-05-18 | Wiltron Company | Apparatus for measuring and/or injecting high frequency signals in integrated systems |
KR200163026Y1 (en) * | 1997-02-26 | 1999-12-15 | 김영환 | Probe station for testing the electrical properties of wafers |
US6064218A (en) | 1997-03-11 | 2000-05-16 | Primeyield Systems, Inc. | Peripherally leaded package test contactor |
US5923177A (en) | 1997-03-27 | 1999-07-13 | Hewlett-Packard Company | Portable wedge probe for perusing signals on the pins of an IC |
US6043667A (en) | 1997-04-17 | 2000-03-28 | International Business Machines Corporation | Substrate tester location clamping, sensing, and contacting method and apparatus |
US6127831A (en) | 1997-04-21 | 2000-10-03 | Motorola, Inc. | Method of testing a semiconductor device by automatically measuring probe tip parameters |
US6121783A (en) | 1997-04-22 | 2000-09-19 | Horner; Gregory S. | Method and apparatus for establishing electrical contact between a wafer and a chuck |
US6091236A (en) | 1997-04-28 | 2000-07-18 | Csi Technology, Inc. | System and method for measuring and analyzing electrical signals on the shaft of a machine |
US5883523A (en) | 1997-04-29 | 1999-03-16 | Credence Systems Corporation | Coherent switching power for an analog circuit tester |
US5942907A (en) | 1997-05-07 | 1999-08-24 | Industrial Technology Research Institute | Method and apparatus for testing dies |
WO1998052464A1 (en) | 1997-05-23 | 1998-11-26 | The Carolinas Heart Institute | Electromagnetical imaging and therapeutic (emit) systems |
JPH10335395A (en) * | 1997-05-28 | 1998-12-18 | Advantest Corp | Contact position detecting method for probe card |
US6229327B1 (en) | 1997-05-30 | 2001-05-08 | Gregory G. Boll | Broadband impedance matching probe |
US5981268A (en) | 1997-05-30 | 1999-11-09 | Board Of Trustees, Leland Stanford, Jr. University | Hybrid biosensors |
US5963027A (en) | 1997-06-06 | 1999-10-05 | Cascade Microtech, Inc. | Probe station having environment control chambers with orthogonally flexible lateral wall assembly |
US6034533A (en) | 1997-06-10 | 2000-03-07 | Tervo; Paul A. | Low-current pogo probe card |
SE507577C2 (en) | 1997-06-11 | 1998-06-22 | Saab Marine Electronics | Horn Antenna |
US6029141A (en) | 1997-06-27 | 2000-02-22 | Amazon.Com, Inc. | Internet-based customer referral system |
US6002426A (en) | 1997-07-02 | 1999-12-14 | Cerprobe Corporation | Inverted alignment station and method for calibrating needles of probe card for probe testing of integrated circuits |
US6052653A (en) | 1997-07-11 | 2000-04-18 | Solid State Measurements, Inc. | Spreading resistance profiling system |
US5959461A (en) | 1997-07-14 | 1999-09-28 | Wentworth Laboratories, Inc. | Probe station adapter for backside emission inspection |
WO1999004273A1 (en) * | 1997-07-15 | 1999-01-28 | Wentworth Laboratories, Inc. | Probe station with multiple adjustable probe supports |
US6828566B2 (en) | 1997-07-22 | 2004-12-07 | Hitachi Ltd | Method and apparatus for specimen fabrication |
US6215295B1 (en) | 1997-07-25 | 2001-04-10 | Smith, Iii Richard S. | Photonic field probe and calibration means thereof |
US6104206A (en) | 1997-08-05 | 2000-08-15 | Verkuil; Roger L. | Product wafer junction leakage measurement using corona and a kelvin probe |
US5998768A (en) | 1997-08-07 | 1999-12-07 | Massachusetts Institute Of Technology | Active thermal control of surfaces by steering heating beam in response to sensed thermal radiation |
US5970429A (en) | 1997-08-08 | 1999-10-19 | Lucent Technologies, Inc. | Method and apparatus for measuring electrical noise in devices |
US6292760B1 (en) | 1997-08-11 | 2001-09-18 | Texas Instruments Incorporated | Method and apparatus to measure non-coherent signals |
US6233613B1 (en) | 1997-08-18 | 2001-05-15 | 3Com Corporation | High impedance probe for monitoring fast ethernet LAN links |
US6573702B2 (en) | 1997-09-12 | 2003-06-03 | New Wave Research | Method and apparatus for cleaning electronic test contacts |
US5960411A (en) | 1997-09-12 | 1999-09-28 | Amazon.Com, Inc. | Method and system for placing a purchase order via a communications network |
US5993611A (en) | 1997-09-24 | 1999-11-30 | Sarnoff Corporation | Capacitive denaturation of nucleic acid |
US6278051B1 (en) | 1997-10-09 | 2001-08-21 | Vatell Corporation | Differential thermopile heat flux transducer |
US5949383A (en) | 1997-10-20 | 1999-09-07 | Ericsson Inc. | Compact antenna structures including baluns |
JPH11125646A (en) | 1997-10-21 | 1999-05-11 | Mitsubishi Electric Corp | Vertical needle type probe card, and its manufacture and exchange method for defective probe of the same |
US6049216A (en) | 1997-10-27 | 2000-04-11 | Industrial Technology Research Institute | Contact type prober automatic alignment |
JP3112873B2 (en) | 1997-10-31 | 2000-11-27 | 日本電気株式会社 | High frequency probe |
JPH11142433A (en) | 1997-11-10 | 1999-05-28 | Mitsubishi Electric Corp | Probe for vertical needle type probe card and manufacture thereof |
DE19822123C2 (en) | 1997-11-21 | 2003-02-06 | Meinhard Knoll | Method and device for the detection of analytes |
US6048750A (en) | 1997-11-24 | 2000-04-11 | Micron Technology, Inc. | Method for aligning and connecting semiconductor components to substrates |
JPH11163066A (en) | 1997-11-29 | 1999-06-18 | Tokyo Electron Ltd | Wafer tester |
US6096567A (en) | 1997-12-01 | 2000-08-01 | Electroglas, Inc. | Method and apparatus for direct probe sensing |
US6118287A (en) | 1997-12-09 | 2000-09-12 | Boll; Gregory George | Probe tip structure |
US6043668A (en) | 1997-12-12 | 2000-03-28 | Sony Corporation | Planarity verification system for integrated circuit test probes |
US6100815A (en) | 1997-12-24 | 2000-08-08 | Electro Scientific Industries, Inc. | Compound switching matrix for probing and interconnecting devices under test to measurement equipment |
US5944093A (en) | 1997-12-30 | 1999-08-31 | Intel Corporation | Pickup chuck with an integral heat pipe |
US6415858B1 (en) | 1997-12-31 | 2002-07-09 | Temptronic Corporation | Temperature control system for a workpiece chuck |
US6328096B1 (en) | 1997-12-31 | 2001-12-11 | Temptronic Corporation | Workpiece chuck |
US6395480B1 (en) | 1999-02-01 | 2002-05-28 | Signature Bioscience, Inc. | Computer program and database structure for detecting molecular binding events |
US6338968B1 (en) | 1998-02-02 | 2002-01-15 | Signature Bioscience, Inc. | Method and apparatus for detecting molecular binding events |
US7083985B2 (en) * | 1998-02-02 | 2006-08-01 | Hefti John J | Coplanar waveguide biosensor for detecting molecular or cellular events |
US6287874B1 (en) | 1998-02-02 | 2001-09-11 | Signature Bioscience, Inc. | Methods for analyzing protein binding events |
JP3862845B2 (en) | 1998-02-05 | 2006-12-27 | セイコーインスツル株式会社 | Near-field optical probe |
US6078183A (en) | 1998-03-03 | 2000-06-20 | Sandia Corporation | Thermally-induced voltage alteration for integrated circuit analysis |
US6244121B1 (en) | 1998-03-06 | 2001-06-12 | Applied Materials, Inc. | Sensor device for non-intrusive diagnosis of a semiconductor processing system |
US6054869A (en) | 1998-03-19 | 2000-04-25 | H+W Test Products, Inc. | Bi-level test fixture for testing printed circuit boards |
US6161294A (en) | 1998-03-23 | 2000-12-19 | Sloan Technologies, Incorporated | Overhead scanning profiler |
DE29805631U1 (en) | 1998-03-27 | 1998-06-25 | Ebinger Klaus | Magnetometer |
JPH11281675A (en) | 1998-03-31 | 1999-10-15 | Hewlett Packard Japan Ltd | Signal measuring probe |
JP3553791B2 (en) | 1998-04-03 | 2004-08-11 | 株式会社ルネサステクノロジ | CONNECTION DEVICE AND ITS MANUFACTURING METHOD, INSPECTION DEVICE, AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD |
US6147502A (en) | 1998-04-10 | 2000-11-14 | Bechtel Bwxt Idaho, Llc | Method and apparatus for measuring butterfat and protein content using microwave absorption techniques |
US6060888A (en) | 1998-04-24 | 2000-05-09 | Hewlett-Packard Company | Error correction method for reflection measurements of reciprocal devices in vector network analyzers |
DE69903935T2 (en) | 1998-05-01 | 2003-07-31 | Gore & Ass | REPEATED POSITIONABLE NOZZLE DEVICE |
US6091255A (en) | 1998-05-08 | 2000-07-18 | Advanced Micro Devices, Inc. | System and method for tasking processing modules based upon temperature |
US6257564B1 (en) | 1998-05-15 | 2001-07-10 | Applied Materials, Inc | Vacuum chuck having vacuum-nipples wafer support |
US6111419A (en) | 1998-05-19 | 2000-08-29 | Motorola Inc. | Method of processing a substrate including measuring for planarity and probing the substrate |
US6281691B1 (en) | 1998-06-09 | 2001-08-28 | Nec Corporation | Tip portion structure of high-frequency probe and method for fabrication probe tip portion composed by coaxial cable |
US6251595B1 (en) | 1998-06-18 | 2001-06-26 | Agilent Technologies, Inc. | Methods and devices for carrying out chemical reactions |
US6194720B1 (en) * | 1998-06-24 | 2001-02-27 | Micron Technology, Inc. | Preparation of transmission electron microscope samples |
US6166553A (en) | 1998-06-29 | 2000-12-26 | Xandex, Inc. | Prober-tester electrical interface for semiconductor test |
US7304486B2 (en) | 1998-07-08 | 2007-12-04 | Capres A/S | Nano-drive for high resolution positioning and for positioning of a multi-point probe |
US6256882B1 (en) | 1998-07-14 | 2001-07-10 | Cascade Microtech, Inc. | Membrane probing system |
DE19983376T1 (en) | 1998-07-14 | 2001-06-28 | Schlumberger Technologies Inc | Device, method and system for a liquid-based temperature change stress control of electronic components with a wide range and quick response |
TW436634B (en) | 1998-07-24 | 2001-05-28 | Advantest Corp | IC test apparatus |
US6229322B1 (en) | 1998-08-21 | 2001-05-08 | Micron Technology, Inc. | Electronic device workpiece processing apparatus and method of communicating signals within an electronic device workpiece processing apparatus |
US6744268B2 (en) | 1998-08-27 | 2004-06-01 | The Micromanipulator Company, Inc. | High resolution analytical probe station |
US6198299B1 (en) | 1998-08-27 | 2001-03-06 | The Micromanipulator Company, Inc. | High Resolution analytical probe station |
US6124723A (en) | 1998-08-31 | 2000-09-26 | Wentworth Laboratories, Inc. | Probe holder for low voltage, low current measurements in a water probe station |
US6529844B1 (en) | 1998-09-02 | 2003-03-04 | Anritsu Company | Vector network measurement system |
US6937341B1 (en) | 1998-09-29 | 2005-08-30 | J. A. Woollam Co. Inc. | System and method enabling simultaneous investigation of sample with two beams of electromagnetic radiation |
US6236975B1 (en) | 1998-09-29 | 2001-05-22 | Ignite Sales, Inc. | System and method for profiling customers for targeted marketing |
JP2000131506A (en) * | 1998-10-26 | 2000-05-12 | Toshiba Corp | Microlens array sheet |
US6236223B1 (en) | 1998-11-09 | 2001-05-22 | Intermec Ip Corp. | Method and apparatus for wireless radio frequency testing of RFID integrated circuits |
US6284971B1 (en) | 1998-11-25 | 2001-09-04 | Johns Hopkins University School Of Medicine | Enhanced safety coaxial cables |
US6608494B1 (en) | 1998-12-04 | 2003-08-19 | Advanced Micro Devices, Inc. | Single point high resolution time resolved photoemission microscopy system and method |
US6137303A (en) | 1998-12-14 | 2000-10-24 | Sony Corporation | Integrated testing method and apparatus for semiconductor test operations processing |
JP2000183120A (en) | 1998-12-17 | 2000-06-30 | Mitsubishi Electric Corp | Prober device and electrical evaluation method for semiconductor device |
JP2000180469A (en) | 1998-12-18 | 2000-06-30 | Fujitsu Ltd | Contactor for semiconductor device, tester using contactor for semiconductor device, testing method using contactor for semiconductor device and method for cleaning contactor for semiconductor device |
US6236977B1 (en) | 1999-01-04 | 2001-05-22 | Realty One, Inc. | Computer implemented marketing system |
US6232787B1 (en) | 1999-01-08 | 2001-05-15 | Schlumberger Technologies, Inc. | Microstructure defect detection |
JP2000206146A (en) | 1999-01-19 | 2000-07-28 | Mitsubishi Electric Corp | Probe needle |
US6583638B2 (en) | 1999-01-26 | 2003-06-24 | Trio-Tech International | Temperature-controlled semiconductor wafer chuck system |
US6300775B1 (en) | 1999-02-02 | 2001-10-09 | Com Dev Limited | Scattering parameter calibration system and method |
US6147851A (en) | 1999-02-05 | 2000-11-14 | Anderson; Karl F. | Method for guarding electrical regions having potential gradients |
GB9902765D0 (en) | 1999-02-08 | 1999-03-31 | Symmetricom Inc | An antenna |
FR2790097B1 (en) | 1999-02-18 | 2001-04-27 | St Microelectronics Sa | METHOD FOR CALIBRATING AN INTEGRATED RF CIRCUIT PROBE |
US6232790B1 (en) | 1999-03-08 | 2001-05-15 | Honeywell Inc. | Method and apparatus for amplifying electrical test signals from a micromechanical device |
US20010043073A1 (en) | 1999-03-09 | 2001-11-22 | Thomas T. Montoya | Prober interface plate |
US6710798B1 (en) | 1999-03-09 | 2004-03-23 | Applied Precision Llc | Methods and apparatus for determining the relative positions of probe tips on a printed circuit board probe card |
US6211837B1 (en) | 1999-03-10 | 2001-04-03 | Raytheon Company | Dual-window high-power conical horn antenna |
JP2000260852A (en) | 1999-03-11 | 2000-09-22 | Tokyo Electron Ltd | Inspection stage and device |
US6225816B1 (en) | 1999-04-08 | 2001-05-01 | Agilent Technologies, Inc. | Split resistor probe and method |
US6259261B1 (en) * | 1999-04-16 | 2001-07-10 | Sony Corporation | Method and apparatus for electrically testing semiconductor devices fabricated on a wafer |
US6114865A (en) | 1999-04-21 | 2000-09-05 | Semiconductor Diagnostics, Inc. | Device for electrically contacting a floating semiconductor wafer having an insulating film |
US6310755B1 (en) | 1999-05-07 | 2001-10-30 | Applied Materials, Inc. | Electrostatic chuck having gas cavity and method |
US6456152B1 (en) | 1999-05-17 | 2002-09-24 | Hitachi, Ltd. | Charge pump with improved reliability |
JP2000329664A (en) | 1999-05-18 | 2000-11-30 | Nkk Corp | Observation method of transmission electron microscope and holding jig |
US6448788B1 (en) | 1999-05-26 | 2002-09-10 | Microwave Imaging System Technologies, Inc. | Fixed array microwave imaging apparatus and method |
US6812718B1 (en) | 1999-05-27 | 2004-11-02 | Nanonexus, Inc. | Massively parallel interface for electronic circuits |
US6211663B1 (en) | 1999-05-28 | 2001-04-03 | The Aerospace Corporation | Baseband time-domain waveform measurement method |
US6409724B1 (en) | 1999-05-28 | 2002-06-25 | Gyrus Medical Limited | Electrosurgical instrument |
US6578264B1 (en) | 1999-06-04 | 2003-06-17 | Cascade Microtech, Inc. | Method for constructing a membrane probe using a depression |
US6320372B1 (en) | 1999-07-09 | 2001-11-20 | Electroglas, Inc. | Apparatus and method for testing a substrate having a plurality of terminals |
JP4104099B2 (en) | 1999-07-09 | 2008-06-18 | 東京エレクトロン株式会社 | Probe card transport mechanism |
US6580283B1 (en) | 1999-07-14 | 2003-06-17 | Aehr Test Systems | Wafer level burn-in and test methods |
US7013221B1 (en) | 1999-07-16 | 2006-03-14 | Rosetta Inpharmatics Llc | Iterative probe design and detailed expression profiling with flexible in-situ synthesis arrays |
US6407562B1 (en) | 1999-07-29 | 2002-06-18 | Agilent Technologies, Inc. | Probe tip terminating device providing an easily changeable feed-through termination |
JP2001053517A (en) | 1999-08-06 | 2001-02-23 | Sony Corp | Antenna system and portable radio device |
KR20010021204A (en) | 1999-08-06 | 2001-03-15 | 이데이 노부유끼 | Antenna apparatus and portable radio communication apparatus |
US6275738B1 (en) | 1999-08-19 | 2001-08-14 | Kai Technologies, Inc. | Microwave devices for medical hyperthermia, thermotherapy and diagnosis |
CN1083975C (en) | 1999-09-10 | 2002-05-01 | 北京航空工艺研究所 | Method and apparatus for arc-light sensing the working of plasma arc welding small hole |
US6809533B1 (en) | 1999-09-10 | 2004-10-26 | University Of Maryland, College Park | Quantitative imaging of dielectric permittivity and tunability |
JP3388462B2 (en) | 1999-09-13 | 2003-03-24 | 日本電気株式会社 | Semiconductor chip analysis prober and semiconductor chip analysis device |
US6545492B1 (en) | 1999-09-20 | 2003-04-08 | Europaisches Laboratorium Fur Molekularbiologie (Embl) | Multiple local probe measuring device and method |
US6483327B1 (en) | 1999-09-30 | 2002-11-19 | Advanced Micro Devices, Inc. | Quadrant avalanche photodiode time-resolved detection |
US7009415B2 (en) | 1999-10-06 | 2006-03-07 | Tokyo Electron Limited | Probing method and probing apparatus |
JP2001124676A (en) | 1999-10-25 | 2001-05-11 | Hitachi Ltd | Sample support member for electron microscopic observation |
US6245692B1 (en) | 1999-11-23 | 2001-06-12 | Agere Systems Guardian Corp. | Method to selectively heat semiconductor wafers |
US6528993B1 (en) | 1999-11-29 | 2003-03-04 | Korea Advanced Institute Of Science & Technology | Magneto-optical microscope magnetometer |
US6724928B1 (en) | 1999-12-02 | 2004-04-20 | Advanced Micro Devices, Inc. | Real-time photoemission detection system |
US6633174B1 (en) | 1999-12-14 | 2003-10-14 | Kla-Tencor | Stepper type test structures and methods for inspection of semiconductor integrated circuits |
US6771806B1 (en) | 1999-12-14 | 2004-08-03 | Kla-Tencor | Multi-pixel methods and apparatus for analysis of defect information from test structures on semiconductor devices |
JP2001174482A (en) | 1999-12-21 | 2001-06-29 | Toshiba Corp | Contact needle for evaluating electric characteristic, probe structure, probe card and manufacturing method of contact needle for evaluating electric characteristic |
US6459739B1 (en) | 1999-12-30 | 2002-10-01 | Tioga Technologies Inc. | Method and apparatus for RF common-mode noise rejection in a DSL receiver |
DE10000324A1 (en) | 2000-01-07 | 2001-07-19 | Roesler Hans Joachim | Analysis apparatus for use in clinical-chemical analysis and laboratory diagnosis methods comprises equipment for simultaneous FIR- and microwave spectroscopy of vaporized liquid sample |
US6384614B1 (en) | 2000-02-05 | 2002-05-07 | Fluke Corporation | Single tip Kelvin probe |
EP1193233A1 (en) | 2000-02-07 | 2002-04-03 | Ibiden Co., Ltd. | Ceramic substrate for semiconductor production/inspection device |
NZ521229A (en) | 2000-02-25 | 2004-02-27 | Personal Chemistry I Uppsala | Microwave heating apparatus |
US6734687B1 (en) | 2000-02-25 | 2004-05-11 | Hitachi, Ltd. | Apparatus for detecting defect in device and method of detecting defect |
JP3389914B2 (en) | 2000-03-03 | 2003-03-24 | 日本電気株式会社 | Sampling method and device for power supply current value of integrated circuit, and storage medium storing control program therefor |
US6888236B2 (en) | 2000-03-07 | 2005-05-03 | Ibiden Co., Ltd. | Ceramic substrate for manufacture/inspection of semiconductor |
US6488405B1 (en) | 2000-03-08 | 2002-12-03 | Advanced Micro Devices, Inc. | Flip chip defect analysis using liquid crystal |
US6650135B1 (en) | 2000-06-29 | 2003-11-18 | Motorola, Inc. | Measurement chuck having piezoelectric elements and method |
US6313567B1 (en) | 2000-04-10 | 2001-11-06 | Motorola, Inc. | Lithography chuck having piezoelectric elements, and method |
US6396298B1 (en) | 2000-04-14 | 2002-05-28 | The Aerospace Corporation | Active feedback pulsed measurement method |
US20020050828A1 (en) | 2000-04-14 | 2002-05-02 | General Dielectric, Inc. | Multi-feed microwave reflective resonant sensors |
US20020070745A1 (en) | 2000-04-27 | 2002-06-13 | Johnson James E. | Cooling system for burn-in unit |
US6483336B1 (en) | 2000-05-03 | 2002-11-19 | Cascade Microtech, Inc. | Indexing rotatable chuck for a probe station |
US6396296B1 (en) | 2000-05-15 | 2002-05-28 | Advanced Micro Devices, Inc. | Method and apparatus for electrical characterization of an integrated circuit package using a vertical probe station |
US20010044152A1 (en) | 2000-05-18 | 2001-11-22 | Gale Burnett | Dual beam, pulse propagation analyzer, medical profiler interferometer |
US6420722B2 (en) | 2000-05-22 | 2002-07-16 | Omniprobe, Inc. | Method for sample separation and lift-out with one cut |
EP1296360A1 (en) | 2000-05-26 | 2003-03-26 | Ibiden Co., Ltd. | Semiconductor manufacturing and inspecting device |
US6549022B1 (en) | 2000-06-02 | 2003-04-15 | Sandia Corporation | Apparatus and method for analyzing functional failures in integrated circuits |
JP2001358184A (en) * | 2000-06-13 | 2001-12-26 | Mitsubishi Electric Corp | Wafer prober, and method of measuring circuits using the same |
US6657214B1 (en) * | 2000-06-16 | 2003-12-02 | Emc Test Systems, L.P. | Shielded enclosure for testing wireless communication devices |
US6768110B2 (en) | 2000-06-21 | 2004-07-27 | Gatan, Inc. | Ion beam milling system and method for electron microscopy specimen preparation |
JP2002005960A (en) | 2000-06-21 | 2002-01-09 | Ando Electric Co Ltd | Probe card and its manufacturing method |
US6700397B2 (en) | 2000-07-13 | 2004-03-02 | The Micromanipulator Company, Inc. | Triaxial probe assembly |
US6731128B2 (en) | 2000-07-13 | 2004-05-04 | International Business Machines Corporation | TFI probe I/O wrap test method |
US6424141B1 (en) | 2000-07-13 | 2002-07-23 | The Micromanipulator Company, Inc. | Wafer probe station |
US6515494B1 (en) * | 2000-07-17 | 2003-02-04 | Infrared Laboratories, Inc. | Silicon wafer probe station using back-side imaging |
JP4408538B2 (en) | 2000-07-24 | 2010-02-03 | 株式会社日立製作所 | Probe device |
DE10036127B4 (en) | 2000-07-25 | 2007-03-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for supply voltage decoupling for RF amplifier circuits |
IT1318734B1 (en) | 2000-08-04 | 2003-09-10 | Technoprobe S R L | VERTICAL PROBE MEASUREMENT HEAD. |
DE10040988A1 (en) | 2000-08-22 | 2002-03-21 | Evotec Biosystems Ag | Measurement of chemical and/or biological samples, useful for screening interactions between two bio-molecules, comprises excitement of a marker with electromagnetic radiation of one wavelength or polarization from a pulsed transmitter |
JP2002064132A (en) | 2000-08-22 | 2002-02-28 | Tokyo Electron Ltd | Delivery method of member to be treated, placement mechanism for the member and probing device |
US6970005B2 (en) | 2000-08-24 | 2005-11-29 | Texas Instruments Incorporated | Multiple-chip probe and universal tester contact assemblage |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
GB0021975D0 (en) * | 2000-09-07 | 2000-10-25 | Optomed As | Filter optic probes |
US6920407B2 (en) | 2000-09-18 | 2005-07-19 | Agilent Technologies, Inc. | Method and apparatus for calibrating a multiport test system for measurement of a DUT |
US6418009B1 (en) | 2000-09-28 | 2002-07-09 | Nortel Networks Limited | Broadband multi-layer capacitor |
US6731804B1 (en) | 2000-09-28 | 2004-05-04 | The United States Of America As Represented By The Secretary Of The Army | Thermal luminescence liquid monitoring system and method |
US20030072549A1 (en) | 2000-10-26 | 2003-04-17 | The Trustees Of Princeton University | Method and apparatus for dielectric spectroscopy of biological solutions |
DE10151288B4 (en) | 2000-11-02 | 2004-10-07 | Eads Deutschland Gmbh | Structure antenna for aircraft or aircraft |
US6753699B2 (en) | 2000-11-13 | 2004-06-22 | Standard Microsystems Corporation | Integrated circuit and method of controlling output impedance |
US6586946B2 (en) | 2000-11-13 | 2003-07-01 | Signature Bioscience, Inc. | System and method for detecting and identifying molecular events in a test sample using a resonant test structure |
US6582979B2 (en) | 2000-11-15 | 2003-06-24 | Skyworks Solutions, Inc. | Structure and method for fabrication of a leadless chip carrier with embedded antenna |
WO2002045283A2 (en) | 2000-11-29 | 2002-06-06 | Broadcom Corporation | Integrated direct conversion satellite tuner |
US6927079B1 (en) | 2000-12-06 | 2005-08-09 | Lsi Logic Corporation | Method for probing a semiconductor wafer |
US6605951B1 (en) | 2000-12-11 | 2003-08-12 | Lsi Logic Corporation | Interconnector and method of connecting probes to a die for functional analysis |
DE20021685U1 (en) | 2000-12-21 | 2001-03-15 | Rosenberger Hochfrequenztech | High frequency probe tip |
US6794950B2 (en) | 2000-12-21 | 2004-09-21 | Paratek Microwave, Inc. | Waveguide to microstrip transition |
JP4071629B2 (en) * | 2000-12-22 | 2008-04-02 | 東京エレクトロン株式会社 | Probe cartridge assembly and multi-probe assembly |
US6541993B2 (en) | 2000-12-26 | 2003-04-01 | Ericsson, Inc. | Transistor device testing employing virtual device fixturing |
US6791344B2 (en) | 2000-12-28 | 2004-09-14 | International Business Machines Corporation | System for and method of testing a microelectronic device using a dual probe technique |
JP3543765B2 (en) | 2000-12-28 | 2004-07-21 | Jsr株式会社 | Probe device for wafer inspection |
US6707548B2 (en) | 2001-02-08 | 2004-03-16 | Array Bioscience Corporation | Systems and methods for filter based spectrographic analysis |
JP2002243502A (en) | 2001-02-09 | 2002-08-28 | Olympus Optical Co Ltd | Encoder device |
WO2002065127A2 (en) | 2001-02-12 | 2002-08-22 | Signature Bioscience, Inc. | A system and method for characterizing the permittivity of molecular events |
US7006046B2 (en) * | 2001-02-15 | 2006-02-28 | Integral Technologies, Inc. | Low cost electronic probe devices manufactured from conductive loaded resin-based materials |
US6628503B2 (en) | 2001-03-13 | 2003-09-30 | Nikon Corporation | Gas cooled electrostatic pin chuck for vacuum applications |
US6611417B2 (en) | 2001-03-22 | 2003-08-26 | Winbond Electronics Corporation | Wafer chuck system |
JP2002311052A (en) | 2001-04-13 | 2002-10-23 | Agilent Technologies Japan Ltd | Blade-like connecting needle |
US6627461B2 (en) | 2001-04-18 | 2003-09-30 | Signature Bioscience, Inc. | Method and apparatus for detection of molecular events using temperature control of detection environment |
US6549396B2 (en) | 2001-04-19 | 2003-04-15 | Gennum Corporation | Multiple terminal capacitor structure |
JP3979793B2 (en) | 2001-05-29 | 2007-09-19 | 日立ソフトウエアエンジニアリング株式会社 | Probe design apparatus and probe design method |
EP1407254B1 (en) | 2001-05-31 | 2005-12-28 | IntelScan örbylgjutaekni ehf. | Apparatus and method for microwave determination of at least one physical parameter of a substance |
WO2002101816A1 (en) * | 2001-06-06 | 2002-12-19 | Ibiden Co., Ltd. | Wafer prober |
JP4610798B2 (en) | 2001-06-19 | 2011-01-12 | エスアイアイ・ナノテクノロジー株式会社 | Scanning electron microscope with laser defect detection function and its autofocus method |
US6649402B2 (en) | 2001-06-22 | 2003-11-18 | Wisconsin Alumni Research Foundation | Microfabricated microbial growth assay method and apparatus |
CA2451404C (en) | 2001-07-06 | 2011-04-19 | Wisconsin Alumni Research Foundation | Space-time microwave imaging for cancer detection |
GB0117715D0 (en) | 2001-07-19 | 2001-09-12 | Mrbp Res Ltd | Microwave biochemical analysis |
IL144806A (en) * | 2001-08-08 | 2005-11-20 | Nova Measuring Instr Ltd | Method and apparatus for process control in semiconductor manufacturing |
US20030032000A1 (en) * | 2001-08-13 | 2003-02-13 | Signature Bioscience Inc. | Method for analyzing cellular events |
US20040147034A1 (en) | 2001-08-14 | 2004-07-29 | Gore Jay Prabhakar | Method and apparatus for measuring a substance in a biological sample |
US6851096B2 (en) | 2001-08-22 | 2005-02-01 | Solid State Measurements, Inc. | Method and apparatus for testing semiconductor wafers |
US6643597B1 (en) | 2001-08-24 | 2003-11-04 | Agilent Technologies, Inc. | Calibrating a test system using unknown standards |
US6481939B1 (en) | 2001-08-24 | 2002-11-19 | Robb S. Gillespie | Tool tip conductivity contact sensor and method |
US6639461B1 (en) | 2001-08-30 | 2003-10-28 | Sierra Monolithics, Inc. | Ultra-wideband power amplifier module apparatus and method for optical and electronic communications |
EP1432546A4 (en) | 2001-08-31 | 2006-06-07 | Cascade Microtech Inc | Optical testing device |
US6549106B2 (en) | 2001-09-06 | 2003-04-15 | Cascade Microtech, Inc. | Waveguide with adjustable backshort |
DE50213222D1 (en) | 2001-09-24 | 2009-03-05 | Jpk Instruments Ag | Apparatus and method for a scanning probe microscope |
US6636063B2 (en) | 2001-10-02 | 2003-10-21 | Texas Instruments Incorporated | Probe card with contact apparatus and method of manufacture |
US6624891B2 (en) | 2001-10-12 | 2003-09-23 | Eastman Kodak Company | Interferometric-based external measurement system and method |
US20030139662A1 (en) | 2001-10-16 | 2003-07-24 | Seidman Abraham Neil | Method and apparatus for detecting, identifying and performing operations on microstructures including, anthrax spores, brain cells, cancer cells, living tissue cells, and macro-objects including stereotactic neurosurgery instruments, weapons and explosives |
KR100442822B1 (en) | 2001-10-23 | 2004-08-02 | 삼성전자주식회사 | Methods for detecting binding of biomolecules using shear stress measurements |
JP2003130919A (en) | 2001-10-25 | 2003-05-08 | Agilent Technologies Japan Ltd | Connection box, and dut board evaluation system and method |
US7071714B2 (en) * | 2001-11-02 | 2006-07-04 | Formfactor, Inc. | Method and system for compensating for thermally induced motion of probe cards |
JP3976733B2 (en) | 2001-11-13 | 2007-09-19 | 株式会社アドバンテスト | Chromatic dispersion measurement system and method |
WO2003047684A2 (en) | 2001-12-04 | 2003-06-12 | University Of Southern California | Method for intracellular modifications within living cells using pulsed electric fields |
US6447339B1 (en) | 2001-12-12 | 2002-09-10 | Tektronix, Inc. | Adapter for a multi-channel signal probe |
JP4123408B2 (en) | 2001-12-13 | 2008-07-23 | 東京エレクトロン株式会社 | Probe card changer |
US6770955B1 (en) | 2001-12-15 | 2004-08-03 | Skyworks Solutions, Inc. | Shielded antenna in a semiconductor package |
JP4148677B2 (en) | 2001-12-19 | 2008-09-10 | 富士通株式会社 | Dynamic burn-in equipment |
US20030119057A1 (en) | 2001-12-20 | 2003-06-26 | Board Of Regents | Forming and modifying dielectrically-engineered microparticles |
US6657601B2 (en) | 2001-12-21 | 2003-12-02 | Tdk Rf Solutions | Metrology antenna system utilizing two-port, sleeve dipole and non-radiating balancing network |
US6822463B1 (en) | 2001-12-21 | 2004-11-23 | Lecroy Corporation | Active differential test probe with a transmission line input structure |
US7020363B2 (en) | 2001-12-28 | 2006-03-28 | Intel Corporation | Optical probe for wafer testing |
US7186990B2 (en) | 2002-01-22 | 2007-03-06 | Microbiosystems, Limited Partnership | Method and apparatus for detecting and imaging the presence of biological materials |
US6777964B2 (en) | 2002-01-25 | 2004-08-17 | Cascade Microtech, Inc. | Probe station |
US6756751B2 (en) | 2002-02-15 | 2004-06-29 | Active Precision, Inc. | Multiple degree of freedom substrate manipulator |
US6771086B2 (en) | 2002-02-19 | 2004-08-03 | Lucas/Signatone Corporation | Semiconductor wafer electrical testing with a mobile chiller plate for rapid and precise test temperature control |
KR100608521B1 (en) | 2002-02-22 | 2006-08-03 | 마츠시타 덴끼 산교 가부시키가이샤 | Helical antenna apparatus provided with two helical antenna elements, and radio communication apparatus provided with same helical antenna apparatus |
US6617862B1 (en) | 2002-02-27 | 2003-09-09 | Advanced Micro Devices, Inc. | Laser intrusive technique for locating specific integrated circuit current paths |
US6701265B2 (en) | 2002-03-05 | 2004-03-02 | Tektronix, Inc. | Calibration for vector network analyzer |
US6828767B2 (en) | 2002-03-20 | 2004-12-07 | Santronics, Inc. | Hand-held voltage detection probe |
US7015707B2 (en) | 2002-03-20 | 2006-03-21 | Gabe Cherian | Micro probe |
DE10213692B4 (en) | 2002-03-27 | 2013-05-23 | Weinmann Diagnostics Gmbh & Co. Kg | Method for controlling a device and device for measuring ingredients in the blood |
US6806697B2 (en) * | 2002-04-05 | 2004-10-19 | Agilent Technologies, Inc. | Apparatus and method for canceling DC errors and noise generated by ground shield current in a probe |
DE10216786C5 (en) | 2002-04-15 | 2009-10-15 | Ers Electronic Gmbh | Method and apparatus for conditioning semiconductor wafers and / or hybrids |
US6737920B2 (en) | 2002-05-03 | 2004-05-18 | Atheros Communications, Inc. | Variable gain amplifier |
DE10220343B4 (en) | 2002-05-07 | 2007-04-05 | Atg Test Systems Gmbh & Co. Kg Reicholzheim | Apparatus and method for testing printed circuit boards and probes |
WO2003098168A1 (en) | 2002-05-16 | 2003-11-27 | Vega Grieshaber Kg | Planar antenna and antenna system |
US6587327B1 (en) | 2002-05-17 | 2003-07-01 | Daniel Devoe | Integrated broadband ceramic capacitor array |
KR100470970B1 (en) | 2002-07-05 | 2005-03-10 | 삼성전자주식회사 | Probe needle fixing apparatus and method for semiconductor device test equipment |
US6856129B2 (en) * | 2002-07-09 | 2005-02-15 | Intel Corporation | Current probe device having an integrated amplifier |
JP4335497B2 (en) | 2002-07-12 | 2009-09-30 | エスアイアイ・ナノテクノロジー株式会社 | Ion beam apparatus and ion beam processing method |
US6788093B2 (en) | 2002-08-07 | 2004-09-07 | International Business Machines Corporation | Methodology and apparatus using real-time optical signal for wafer-level device dielectrical reliability studies |
JP2004090534A (en) | 2002-09-02 | 2004-03-25 | Tokyo Electron Ltd | Processing apparatus and processing method for substrate |
BR0215864A (en) | 2002-09-10 | 2005-07-05 | Fractus Sa | Antenna device and handheld antenna |
US6784679B2 (en) | 2002-09-30 | 2004-08-31 | Teradyne, Inc. | Differential coaxial contact array for high-density, high-speed signals |
US6881072B2 (en) | 2002-10-01 | 2005-04-19 | International Business Machines Corporation | Membrane probe with anchored elements |
US7046025B2 (en) | 2002-10-02 | 2006-05-16 | Suss Microtec Testsystems Gmbh | Test apparatus for testing substrates at low temperatures |
US6768328B2 (en) | 2002-10-09 | 2004-07-27 | Agilent Technologies, Inc. | Single point probe structure and method |
JP4043339B2 (en) | 2002-10-22 | 2008-02-06 | 川崎マイクロエレクトロニクス株式会社 | Test method and test apparatus |
US7026832B2 (en) | 2002-10-28 | 2006-04-11 | Dainippon Screen Mfg. Co., Ltd. | Probe mark reading device and probe mark reading method |
JP2004152916A (en) | 2002-10-29 | 2004-05-27 | Nec Corp | Inspecting device and inspecting method of semiconductor device |
US6864694B2 (en) | 2002-10-31 | 2005-03-08 | Agilent Technologies, Inc. | Voltage probe |
JP2004205487A (en) | 2002-11-01 | 2004-07-22 | Tokyo Electron Ltd | Probe card fixing mechanism |
US6724205B1 (en) | 2002-11-13 | 2004-04-20 | Cascade Microtech, Inc. | Probe for combined signals |
US6853198B2 (en) | 2002-11-14 | 2005-02-08 | Agilent Technologies, Inc. | Method and apparatus for performing multiport through-reflect-line calibration and measurement |
US7019895B2 (en) | 2002-11-15 | 2006-03-28 | Dmetrix, Inc. | Microscope stage providing improved optical performance |
US7250779B2 (en) | 2002-11-25 | 2007-07-31 | Cascade Microtech, Inc. | Probe station with low inductance path |
US20040100276A1 (en) | 2002-11-25 | 2004-05-27 | Myron Fanton | Method and apparatus for calibration of a vector network analyzer |
EP1726268B1 (en) | 2002-11-27 | 2008-06-25 | Medical Device Innovations Limited | Coaxial tissue ablation probe and method of making a balun therefor |
US6861856B2 (en) | 2002-12-13 | 2005-03-01 | Cascade Microtech, Inc. | Guarded tub enclosure |
US7084650B2 (en) | 2002-12-16 | 2006-08-01 | Formfactor, Inc. | Apparatus and method for limiting over travel in a probe card assembly |
US6727716B1 (en) | 2002-12-16 | 2004-04-27 | Newport Fab, Llc | Probe card and probe needle for high frequency testing |
JP2004199796A (en) | 2002-12-19 | 2004-07-15 | Shinka Jitsugyo Kk | Method for connecting probe pin for measuring characteristics of thin-film magnetic head and method for measuring characteristics of thin-film magnetic head |
AU2003283175A1 (en) | 2002-12-19 | 2004-07-14 | Unaxis Balzers Ag | Method for generating electromagnetic field distributions |
US6753679B1 (en) | 2002-12-23 | 2004-06-22 | Nortel Networks Limited | Test point monitor using embedded passive resistance |
JP3827159B2 (en) | 2003-01-23 | 2006-09-27 | 株式会社ヨコオ | In-vehicle antenna device |
US7107170B2 (en) | 2003-02-18 | 2006-09-12 | Agilent Technologies, Inc. | Multiport network analyzer calibration employing reciprocity of a device |
JP2004265942A (en) | 2003-02-20 | 2004-09-24 | Okutekku:Kk | Method for detecting zero point of probe pin and probe |
US6970001B2 (en) | 2003-02-20 | 2005-11-29 | Hewlett-Packard Development Company, L.P. | Variable impedance test probe |
US6778140B1 (en) | 2003-03-06 | 2004-08-17 | D-Link Corporation | Atch horn antenna of dual frequency |
US6902941B2 (en) | 2003-03-11 | 2005-06-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Probing of device elements |
GB2399948B (en) | 2003-03-28 | 2006-06-21 | Sarantel Ltd | A dielectrically-loaded antenna |
US7130756B2 (en) | 2003-03-28 | 2006-10-31 | Suss Microtec Test System Gmbh | Calibration method for carrying out multiport measurements on semiconductor wafers |
US7022976B1 (en) | 2003-04-02 | 2006-04-04 | Advanced Micro Devices, Inc. | Dynamically adjustable probe tips |
US6823276B2 (en) | 2003-04-04 | 2004-11-23 | Agilent Technologies, Inc. | System and method for determining measurement errors of a testing device |
US7002133B2 (en) * | 2003-04-11 | 2006-02-21 | Hewlett-Packard Development Company, L.P. | Detecting one or more photons from their interactions with probe photons in a matter system |
US7023225B2 (en) | 2003-04-16 | 2006-04-04 | Lsi Logic Corporation | Wafer-mounted micro-probing platform |
TWI220163B (en) | 2003-04-24 | 2004-08-11 | Ind Tech Res Inst | Manufacturing method of high-conductivity nanometer thin-film probe card |
US7221172B2 (en) | 2003-05-06 | 2007-05-22 | Cascade Microtech, Inc. | Switched suspended conductor and connection |
US6882160B2 (en) | 2003-06-12 | 2005-04-19 | Anritsu Company | Methods and computer program products for full N-port vector network analyzer calibrations |
US6900652B2 (en) | 2003-06-13 | 2005-05-31 | Solid State Measurements, Inc. | Flexible membrane probe and method of use thereof |
KR100523139B1 (en) * | 2003-06-23 | 2005-10-20 | 주식회사 하이닉스반도체 | Semiconductor device for reducing the number of probing pad used during wafer testing and method for testing the same |
US6956388B2 (en) | 2003-06-24 | 2005-10-18 | Agilent Technologies, Inc. | Multiple two axis floating probe assembly using split probe block |
US7568025B2 (en) | 2003-06-27 | 2009-07-28 | Bank Of America Corporation | System and method to monitor performance of different domains associated with a computer system or network |
US7015708B2 (en) | 2003-07-11 | 2006-03-21 | Gore Enterprise Holdings, Inc. | Method and apparatus for a high frequency, impedance controlled probing device with flexible ground contacts |
JP4159043B2 (en) | 2003-07-29 | 2008-10-01 | ソニー・エリクソン・モバイルコミュニケーションズ株式会社 | Television broadcasting system |
US20050026276A1 (en) * | 2003-07-29 | 2005-02-03 | Northrop Grumman Corporation | Remote detection and analysis of chemical and biological aerosols |
US7068049B2 (en) * | 2003-08-05 | 2006-06-27 | Agilent Technologies, Inc. | Method and apparatus for measuring a device under test using an improved through-reflect-line measurement calibration |
US7015703B2 (en) | 2003-08-12 | 2006-03-21 | Scientific Systems Research Limited | Radio frequency Langmuir probe |
US7025628B2 (en) | 2003-08-13 | 2006-04-11 | Agilent Technologies, Inc. | Electronic probe extender |
US7088189B2 (en) | 2003-09-09 | 2006-08-08 | Synergy Microwave Corporation | Integrated low noise microwave wideband push-push VCO |
JP3812559B2 (en) | 2003-09-18 | 2006-08-23 | Tdk株式会社 | Eddy current probe |
US7286013B2 (en) | 2003-09-18 | 2007-10-23 | Avago Technologies Wireless Ip (Singapore) Pte Ltd | Coupled-inductance differential amplifier |
JP2007506981A (en) | 2003-09-23 | 2007-03-22 | ザイベックス コーポレーション | Method, system, and apparatus for microscopy using an element that grips a sample prepared with FIB |
US7009452B2 (en) | 2003-10-16 | 2006-03-07 | Solarflare Communications, Inc. | Method and apparatus for increasing the linearity and bandwidth of an amplifier |
US7020506B2 (en) | 2003-11-06 | 2006-03-28 | Orsense Ltd. | Method and system for non-invasive determination of blood-related parameters |
US7034553B2 (en) | 2003-12-05 | 2006-04-25 | Prodont, Inc. | Direct resistance measurement corrosion probe |
US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
KR100751600B1 (en) | 2003-12-24 | 2007-08-22 | 몰렉스 인코포레이티드 | Transmission line having a transforming impedance |
JP4206930B2 (en) | 2004-01-21 | 2009-01-14 | 株式会社デンソー | Digital filter test apparatus and digital filter test method |
US7254425B2 (en) | 2004-01-23 | 2007-08-07 | Abbott Laboratories | Method for detecting artifacts in data |
JP4130639B2 (en) | 2004-03-16 | 2008-08-06 | 三洋化成工業株式会社 | Method for producing resin dispersion and resin particles |
US7009188B2 (en) | 2004-05-04 | 2006-03-07 | Micron Technology, Inc. | Lift-out probe having an extension tip, methods of making and using, and analytical instruments employing same |
US7015709B2 (en) | 2004-05-12 | 2006-03-21 | Delphi Technologies, Inc. | Ultra-broadband differential voltage probes |
US7019541B2 (en) | 2004-05-14 | 2006-03-28 | Crown Products, Inc. | Electric conductivity water probe |
US7023231B2 (en) | 2004-05-14 | 2006-04-04 | Solid State Measurements, Inc. | Work function controlled probe for measuring properties of a semiconductor wafer and method of use thereof |
US7015690B2 (en) | 2004-05-27 | 2006-03-21 | General Electric Company | Omnidirectional eddy current probe and inspection system |
TWI252925B (en) | 2004-07-05 | 2006-04-11 | Yulim Hitech Inc | Probe card for testing a semiconductor device |
US7188037B2 (en) | 2004-08-20 | 2007-03-06 | Microcraft | Method and apparatus for testing circuit boards |
US20060052075A1 (en) | 2004-09-07 | 2006-03-09 | Rajeshwar Galivanche | Testing integrated circuits using high bandwidth wireless technology |
DE102004057215B4 (en) | 2004-11-26 | 2008-12-18 | Erich Reitinger | Method and apparatus for testing semiconductor wafers using a probe card using a tempered fluid jet |
US7001785B1 (en) * | 2004-12-06 | 2006-02-21 | Veeco Instruments, Inc. | Capacitance probe for thin dielectric film characterization |
DE102005001163B3 (en) | 2005-01-10 | 2006-05-18 | Erich Reitinger | Semiconductor wafers` testing method, involves testing wafer by probes, and reducing heating energy with constant cooling efficiency, under consideration of detected increase of temperature of fluids flowing via tempered chuck device |
US7005879B1 (en) * | 2005-03-01 | 2006-02-28 | International Business Machines Corporation | Device for probe card power bus noise reduction |
JP4340248B2 (en) | 2005-03-17 | 2009-10-07 | 富士通マイクロエレクトロニクス株式会社 | Method for manufacturing a semiconductor imaging device |
US7279920B2 (en) | 2005-04-06 | 2007-10-09 | Texas Instruments Incoporated | Expeditious and low cost testing of RFID ICs |
US7096133B1 (en) | 2005-05-17 | 2006-08-22 | National Semiconductor Corporation | Method of establishing benchmark for figure of merit indicative of amplifier flicker noise |
US7733287B2 (en) * | 2005-07-29 | 2010-06-08 | Sony Corporation | Systems and methods for high frequency parallel transmissions |
-
2001
- 2001-06-12 US US09/881,312 patent/US6914423B2/en not_active Expired - Lifetime
- 2001-09-04 KR KR1020010054115A patent/KR100770174B1/en not_active IP Right Cessation
- 2001-09-04 DE DE20114542U patent/DE20114542U1/en not_active Expired - Lifetime
- 2001-09-04 DE DE10143174A patent/DE10143174A1/en not_active Withdrawn
- 2001-09-05 JP JP2001269047A patent/JP4505160B2/en not_active Expired - Fee Related
-
2005
- 2005-03-16 US US11/083,677 patent/US7554322B2/en not_active Expired - Fee Related
-
2007
- 2007-10-18 US US11/975,173 patent/US20080042669A1/en not_active Abandoned
- 2007-10-18 US US11/975,243 patent/US20080042376A1/en not_active Abandoned
- 2007-10-18 US US11/975,174 patent/US7688062B2/en not_active Expired - Fee Related
Patent Citations (99)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2142625A (en) * | 1932-07-06 | 1939-01-03 | Hollandsche Draad En Kabelfab | High tension cable |
US3230299A (en) * | 1962-07-18 | 1966-01-18 | Gen Cable Corp | Electrical cable with chemically bonded rubber layers |
US3642415A (en) * | 1970-08-10 | 1972-02-15 | Shell Oil Co | Plunger-and-diaphragm plastic sheet forming apparatus |
US3714572A (en) * | 1970-08-21 | 1973-01-30 | Rca Corp | Alignment and test fixture apparatus |
US4009456A (en) * | 1970-10-07 | 1977-02-22 | General Microwave Corporation | Variable microwave attenuator |
US3710251A (en) * | 1971-04-07 | 1973-01-09 | Collins Radio Co | Microelectric heat exchanger pedestal |
US3868093A (en) * | 1973-07-31 | 1975-02-25 | Beloit Corp | Mixing screw and use thereof |
US3930809A (en) * | 1973-08-21 | 1976-01-06 | Wentworth Laboratories, Inc. | Assembly fixture for fixed point probe card |
US3863181A (en) * | 1973-12-03 | 1975-01-28 | Bell Telephone Labor Inc | Mode suppressor for strip transmission lines |
US4001685A (en) * | 1974-03-04 | 1977-01-04 | Electroglas, Inc. | Micro-circuit test probe |
US3936743A (en) * | 1974-03-05 | 1976-02-03 | Electroglas, Inc. | High speed precision chuck assembly |
US4066943A (en) * | 1974-03-05 | 1978-01-03 | Electroglas, Inc. | High speed precision chuck assembly |
US4072576A (en) * | 1975-10-06 | 1978-02-07 | Ab Kabi | Method for studying enzymatic and other biochemical reactions |
US4008900A (en) * | 1976-03-15 | 1977-02-22 | John Freedom | Indexing chuck |
US4186338A (en) * | 1976-12-16 | 1980-01-29 | Genrad, Inc. | Phase change detection method of and apparatus for current-tracing the location of faults on printed circuit boards and similar systems |
US4135131A (en) * | 1977-10-14 | 1979-01-16 | The United States Of America As Represented By The Secretary Of The Army | Microwave time delay spectroscopic methods and apparatus for remote interrogation of biological targets |
US4371742A (en) * | 1977-12-20 | 1983-02-01 | Graham Magnetics, Inc. | EMI-Suppression from transmission lines |
US4641659A (en) * | 1979-06-01 | 1987-02-10 | Sepponen Raimo E | Medical diagnostic microwave scanning apparatus |
US4431967A (en) * | 1979-08-28 | 1984-02-14 | Mitsubishi Denki Kabushiki Kaisha | Method of mounting a semiconductor element for analyzing failures thereon |
US4425395A (en) * | 1981-04-30 | 1984-01-10 | Fujikura Rubber Works, Ltd. | Base fabrics for polyurethane-coated fabrics, polyurethane-coated fabrics and processes for their production |
US4426619A (en) * | 1981-06-03 | 1984-01-17 | Temptronic Corporation | Electrical testing system including plastic window test chamber and method of using same |
US4566184A (en) * | 1981-08-24 | 1986-01-28 | Rockwell International Corporation | Process for making a probe for high speed integrated circuits |
US4491173A (en) * | 1982-05-28 | 1985-01-01 | Temptronic Corporation | Rotatable inspection table |
US4567908A (en) * | 1983-05-31 | 1986-02-04 | Contraves Ag | Discharge system and method of operating same |
US4567321A (en) * | 1984-02-20 | 1986-01-28 | Junkosha Co., Ltd. | Flexible flat cable |
US4646005A (en) * | 1984-03-16 | 1987-02-24 | Motorola, Inc. | Signal probe |
US4722846A (en) * | 1984-04-18 | 1988-02-02 | Kikkoman Corporation | Novel variant and process for producing light colored soy sauce using such variant |
US4642417A (en) * | 1984-07-30 | 1987-02-10 | Kraftwerk Union Aktiengesellschaft | Concentric three-conductor cable |
US4805627A (en) * | 1985-09-06 | 1989-02-21 | Siemens Aktiengesellschaft | Method and apparatus for identifying the distribution of the dielectric constants in an object |
US4725793A (en) * | 1985-09-30 | 1988-02-16 | Alps Electric Co., Ltd. | Waveguide-microstrip line converter |
US4795962A (en) * | 1986-09-04 | 1989-01-03 | Hewlett-Packard Company | Floating driver circuit and a device for measuring impedances of electrical components |
US4904933A (en) * | 1986-09-08 | 1990-02-27 | Tektronix, Inc. | Integrated circuit probe station |
US5082627A (en) * | 1987-05-01 | 1992-01-21 | Biotronic Systems Corporation | Three dimensional binding site array for interfering with an electrical field |
US4894612A (en) * | 1987-08-13 | 1990-01-16 | Hypres, Incorporated | Soft probe for providing high speed on-wafer connections to a circuit |
US5084671A (en) * | 1987-09-02 | 1992-01-28 | Tokyo Electron Limited | Electric probing-test machine having a cooling system |
US4899998A (en) * | 1987-11-10 | 1990-02-13 | Hiroshi Teramachi | Rotational positioning device |
US4896109A (en) * | 1987-12-07 | 1990-01-23 | The United States Of America As Represented By The Department Of Energy | Photoconductive circuit element reflectometer |
US4891584A (en) * | 1988-03-21 | 1990-01-02 | Semitest, Inc. | Apparatus for making surface photovoltage measurements of a semiconductor |
US5091691A (en) * | 1988-03-21 | 1992-02-25 | Semitest, Inc. | Apparatus for making surface photovoltage measurements of a semiconductor |
US4893914A (en) * | 1988-10-12 | 1990-01-16 | The Micromanipulator Company, Inc. | Test station |
US4904935A (en) * | 1988-11-14 | 1990-02-27 | Eaton Corporation | Electrical circuit board text fixture having movable platens |
US4982153A (en) * | 1989-02-06 | 1991-01-01 | Cray Research, Inc. | Method and apparatus for cooling an integrated circuit chip during testing |
US5089774A (en) * | 1989-12-26 | 1992-02-18 | Sharp Kabushiki Kaisha | Apparatus and a method for checking a semiconductor |
US5091692A (en) * | 1990-01-11 | 1992-02-25 | Tokyo Electron Limited | Probing test device |
US4994737A (en) * | 1990-03-09 | 1991-02-19 | Cascade Microtech, Inc. | System for facilitating planar probe measurements of high-speed interconnect structures |
US5187443A (en) * | 1990-07-24 | 1993-02-16 | Bereskin Alexander B | Microwave test fixtures for determining the dielectric properties of a material |
US5091732A (en) * | 1990-09-07 | 1992-02-25 | The United States Of America As Represented By The Secretary Of The Navy | Lightweight deployable antenna system |
US5280156A (en) * | 1990-12-25 | 1994-01-18 | Ngk Insulators, Ltd. | Wafer heating apparatus and with ceramic substrate and dielectric layer having electrostatic chucking means |
US5278494A (en) * | 1991-02-19 | 1994-01-11 | Tokyo Electron Yamanashi Limited | Wafer probing test machine |
US5867073A (en) * | 1992-05-01 | 1999-02-02 | Martin Marietta Corporation | Waveguide to transmission line transition |
US6335628B2 (en) * | 1992-06-11 | 2002-01-01 | Cascade Microtech, Inc. | Wafer probe station for low-current measurements |
US5604444A (en) * | 1992-06-11 | 1997-02-18 | Cascade Microtech, Inc. | Wafer probe station having environment control enclosure |
US5382898A (en) * | 1992-09-21 | 1995-01-17 | Cerprobe Corporation | High density probe card for testing electrical circuits |
US5493236A (en) * | 1993-06-23 | 1996-02-20 | Mitsubishi Denki Kabushiki Kaisha | Test analysis apparatus and analysis method for semiconductor wafer using OBIC analysis |
US5481936A (en) * | 1993-06-29 | 1996-01-09 | Yugen Kaisha Sozoan | Rotary drive positioning system for an indexing table |
US5600256A (en) * | 1993-07-01 | 1997-02-04 | Hughes Electronics | Cast elastomer/membrane test probe assembly |
US5493070A (en) * | 1993-07-28 | 1996-02-20 | Hewlett-Packard Company | Measuring cable and measuring system |
US5594358A (en) * | 1993-09-02 | 1997-01-14 | Matsushita Electric Industrial Co., Ltd. | Radio frequency probe and probe card including a signal needle and grounding needle coupled to a microstrip transmission line |
US20020011859A1 (en) * | 1993-12-23 | 2002-01-31 | Kenneth R. Smith | Method for forming conductive bumps for the purpose of contrructing a fine pitch test device |
US5486975A (en) * | 1994-01-31 | 1996-01-23 | Applied Materials, Inc. | Corrosion resistant electrostatic chuck |
US5715819A (en) * | 1994-05-26 | 1998-02-10 | The Carolinas Heart Institute | Microwave tomographic spectroscopy system and method |
US5491426A (en) * | 1994-06-30 | 1996-02-13 | Vlsi Technology, Inc. | Adaptable wafer probe assembly for testing ICs with different power/ground bond pad configurations |
US5704355A (en) * | 1994-07-01 | 1998-01-06 | Bridges; Jack E. | Non-invasive system for breast cancer detection |
US5874381A (en) * | 1994-08-02 | 1999-02-23 | Crosfield Limited | Cobalt on alumina catalysts |
US6181297B1 (en) * | 1994-08-25 | 2001-01-30 | Symmetricom, Inc. | Antenna |
US5488954A (en) * | 1994-09-09 | 1996-02-06 | Georgia Tech Research Corp. | Ultrasonic transducer and method for using same |
US5481196A (en) * | 1994-11-08 | 1996-01-02 | Nebraska Electronics, Inc. | Process and apparatus for microwave diagnostics and therapy |
US5869975A (en) * | 1995-04-14 | 1999-02-09 | Cascade Microtech, Inc. | System for evaluating probing networks that have multiple probing ends |
US6172337B1 (en) * | 1995-07-10 | 2001-01-09 | Mattson Technology, Inc. | System and method for thermal processing of a semiconductor substrate |
US5857667A (en) * | 1995-10-27 | 1999-01-12 | Samsung Aerospace Industries, Ltd. | Vacuum chuck |
US5712571A (en) * | 1995-11-03 | 1998-01-27 | Analog Devices, Inc. | Apparatus and method for detecting defects arising as a result of integrated circuit processing |
US5861743A (en) * | 1995-12-21 | 1999-01-19 | Genrad, Inc. | Hybrid scanner for use in an improved MDA tester |
US6028435A (en) * | 1996-03-22 | 2000-02-22 | Nec Corporation | Semiconductor device evaluation system using optical fiber |
US6023209A (en) * | 1996-07-05 | 2000-02-08 | Endgate Corporation | Coplanar microwave circuit having suppression of undesired modes |
US6181149B1 (en) * | 1996-09-26 | 2001-01-30 | Delaware Capital Formation, Inc. | Grid array package test contactor |
US6019612A (en) * | 1997-02-10 | 2000-02-01 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus for electrically connecting a device to be tested |
US6842024B2 (en) * | 1997-06-06 | 2005-01-11 | Cascade Microtech, Inc. | Probe station having multiple enclosures |
US6013586A (en) * | 1997-10-09 | 2000-01-11 | Dimension Polyant Sailcloth, Inc. | Tent material product and method of making tent material product |
US6340568B2 (en) * | 1998-02-02 | 2002-01-22 | Signature Bioscience, Inc. | Method for detecting and classifying nucleic acid hybridization |
US6181144B1 (en) * | 1998-02-25 | 2001-01-30 | Micron Technology, Inc. | Semiconductor probe card having resistance measuring circuitry and method fabrication |
US6181416B1 (en) * | 1998-04-14 | 2001-01-30 | Optometrix, Inc. | Schlieren method for imaging semiconductor device properties |
US20020011863A1 (en) * | 1998-06-09 | 2002-01-31 | Advantest Corporation | IC chip tester with heating element for preventing condensation |
US6176091B1 (en) * | 1998-10-01 | 2001-01-23 | Nkk Corporation | Method and apparatus for preventing snow from melting and for packing snow in artificial ski facility |
US6175228B1 (en) * | 1998-10-30 | 2001-01-16 | Agilent Technologies | Electronic probe for measuring high impedance tri-state logic circuits |
US6169410B1 (en) * | 1998-11-09 | 2001-01-02 | Anritsu Company | Wafer probe with built in RF frequency conversion module |
US6335625B1 (en) * | 1999-02-22 | 2002-01-01 | Paul Bryant | Programmable active microwave ultrafine resonance spectrometer (PAMURS) method and systems |
US20020005728A1 (en) * | 1999-04-15 | 2002-01-17 | Gordon M. Babson | Micro probe and method of fabricating same |
US6512391B2 (en) * | 1999-06-30 | 2003-01-28 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
US6340895B1 (en) * | 1999-07-14 | 2002-01-22 | Aehr Test Systems, Inc. | Wafer-level burn-in and test cartridge |
US20020009377A1 (en) * | 2000-06-09 | 2002-01-24 | Shafer Ronny A. | Motor cover retention |
US20020008533A1 (en) * | 2000-07-05 | 2002-01-24 | Ando Electric Co., Ltd | Electro-optic probe and magneto-optic probe |
US20020009378A1 (en) * | 2000-07-21 | 2002-01-24 | Rikuro Obara | Blower |
US6512482B1 (en) * | 2001-03-20 | 2003-01-28 | Xilinx, Inc. | Method and apparatus using a semiconductor die integrated antenna structure |
US6843024B2 (en) * | 2001-05-31 | 2005-01-18 | Toyoda Gosei Co., Ltd. | Weather strip including core-removal slot |
US20030010877A1 (en) * | 2001-07-12 | 2003-01-16 | Jean-Luc Landreville | Anti-vibration and anti-tilt structure |
US20040015060A1 (en) * | 2002-06-21 | 2004-01-22 | James Samsoondar | Measurement of body compounds |
US6847219B1 (en) * | 2002-11-08 | 2005-01-25 | Cascade Microtech, Inc. | Probe station with low noise characteristics |
US6987483B2 (en) * | 2003-02-21 | 2006-01-17 | Kyocera Wireless Corp. | Effectively balanced dipole microstrip antenna |
US6838885B2 (en) * | 2003-03-05 | 2005-01-04 | Murata Manufacturing Co., Ltd. | Method of correcting measurement error and electronic component characteristic measurement apparatus |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7969173B2 (en) | 2000-09-05 | 2011-06-28 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US20080224426A1 (en) * | 2007-03-16 | 2008-09-18 | Suss Microtec Test Systems Gmbh | Chuck with triaxial construction |
US8240650B2 (en) * | 2007-03-16 | 2012-08-14 | Cascade Microtech, Inc. | Chuck with triaxial construction |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
US9506973B2 (en) | 2010-06-07 | 2016-11-29 | Cascade Microtech, Inc. | High voltage chuck for a probe station |
US9741599B2 (en) | 2010-06-07 | 2017-08-22 | Cascade Microtech, Inc. | High voltage chuck for a probe station |
US10062597B2 (en) | 2010-06-07 | 2018-08-28 | Formfactor Beaverton, Inc. | High voltage chuck for a probe station |
Also Published As
Publication number | Publication date |
---|---|
DE10143174A1 (en) | 2002-04-18 |
US7688062B2 (en) | 2010-03-30 |
US20080042669A1 (en) | 2008-02-21 |
US20050179427A1 (en) | 2005-08-18 |
US20080042670A1 (en) | 2008-02-21 |
JP4505160B2 (en) | 2010-07-21 |
US7554322B2 (en) | 2009-06-30 |
JP2002164396A (en) | 2002-06-07 |
US6914423B2 (en) | 2005-07-05 |
US20020027434A1 (en) | 2002-03-07 |
KR100770174B1 (en) | 2007-10-26 |
KR20020019408A (en) | 2002-03-12 |
DE20114542U1 (en) | 2002-02-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7688062B2 (en) | Probe station | |
US6486687B2 (en) | Wafer probe station having environment control enclosure | |
US7352168B2 (en) | Chuck for holding a device under test | |
US7688091B2 (en) | Chuck with integrated wafer support | |
EP0572180B1 (en) | Wafer probe station having auxiliary chucks | |
US6313649B2 (en) | Wafer probe station having environment control enclosure |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: CASCADE MICROTECH, INC., OREGON Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:NORDGREN, GREG;DUNKLEE, JOHN;REEL/FRAME:020042/0472;SIGNING DATES FROM 20010521 TO 20010608 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |