US20080144393A1 - Bit line pre-settlement circuit and method for flash memory sensing scheme - Google Patents

Bit line pre-settlement circuit and method for flash memory sensing scheme Download PDF

Info

Publication number
US20080144393A1
US20080144393A1 US12/037,839 US3783908A US2008144393A1 US 20080144393 A1 US20080144393 A1 US 20080144393A1 US 3783908 A US3783908 A US 3783908A US 2008144393 A1 US2008144393 A1 US 2008144393A1
Authority
US
United States
Prior art keywords
current
bit line
cell
voltage
flash memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US12/037,839
Inventor
Poongyeub Lee
MingChi Mitch Liu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Microsemi SoC Corp
Original Assignee
Actel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Actel Corp filed Critical Actel Corp
Priority to US12/037,839 priority Critical patent/US20080144393A1/en
Publication of US20080144393A1 publication Critical patent/US20080144393A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/26Sensing or reading circuits; Data output circuits
    • G11C16/28Sensing or reading circuits; Data output circuits using differential sensing or reference cells, e.g. dummy cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/24Bit-line control circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/06Sense amplifiers; Associated circuits, e.g. timing or triggering circuits
    • G11C7/062Differential amplifiers of non-latching type, e.g. comparators, long-tailed pairs
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/06Sense amplifiers; Associated circuits, e.g. timing or triggering circuits
    • G11C7/067Single-ended amplifiers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/12Bit line control circuits, e.g. drivers, boosters, pull-up circuits, pull-down circuits, precharging circuits, equalising circuits, for bit lines
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/14Dummy cell management; Sense reference voltage generators
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2207/00Indexing scheme relating to arrangements for writing information into, or reading information out from, a digital store
    • G11C2207/12Equalization of bit lines

Definitions

  • the present invention relates to flash memory arrays. More particularly, the present invention relates to methods and apparatus for reducing the pre-settlement time needed before a flash cell output can be sensed on a bit line in a memory array.
  • bit line precharge methods that have been adopted in the industry involve creation of a short pulse and charge up the bit line to V CC ⁇ V t , or to V CC .
  • Some known schemes pre-charge the target bit line to V cc ⁇
  • U.S. Pat. No. 6,240,020 shows a NAND type Flash memory scheme in which the bit line is precharged to V CC ⁇ V tn .
  • U.S. Pat. No. 5,105,354 discloses a scheme in which an extra “plateline” is used on the source side of the EEPROM memory cell. The plateline is coupled up by a substrate capacitance during precharge. When the wordline goes high, the voltage level on the source and drain sides of the memory cells are being equalized.
  • a flash memory array includes a reference bit line on which a reference current is imposed.
  • bit lines selected for reading are connected to current-to-voltage converters, each of which generates an output voltage based upon the input current flowing in the bit line.
  • the output voltage of the current-to-voltage converter is compared to a reference voltage derived from the output of a reference current-to-voltage converter whose input is driven by a reference current on a reference bit line. Any cell that conducts more current than the reference current will be regarded as an erased cell. Conversely, any cell that conducts less current than the reference current will be regarded as a programmed cell.
  • FIG. 1 is a schematic diagram of a bit line pre-settlement circuit for a flash memory sensing scheme according to the present invention.
  • flash often refers to memories that are bulk erased on a page-by-page, sector-by-sector, or entire array basis, the term is generally used in the art to refer to any electrically erasable (and re-programmable) non-volatile memory technology, regardless of the particular erase scheme.
  • the most common flash memory devices are comprised of floating-gate transistors, though other flash technologies such as SONOS, non-crystal, and other nonvolatile transistors are also known.
  • the solution posed by the present invention is to equalize the voltage level of a target bit line with that of a reference bit line and therefore reduce the worst-case read access time by about 5 ns.
  • bit lines selected for reading are connected to current-to-voltage converters, each of which generates an output voltage based upon the input current flowing in the bit line.
  • the output voltage of the current-to-voltage converter is compared to a reference voltage derived from the output of a reference current-to-voltage converter whose input is driven by a reference current on a reference bit line. Any cell that conducts more current than the reference current will be regarded as an erased cell. Conversely, any cell that conducts less current than the reference current will be regarded as a programmed cell.
  • one current-to-voltage converter 10 is connected to a reference cell via reference bit line 12 and a cell current-to-voltage converter 14 is connected to a cell being sensed via bit line 16 .
  • the cell being sensed is represented by the current I cell .
  • the reference voltage-to-current converter includes diode connected p-channel MOS transistor 18 r in series with n-channel MOS transistor 20 r coupled to the reference bit line 12 .
  • An inverter is formed from p-channel MOS transistor 22 r in series with n-channel MOS transistor 24 r having an input coupled to the reference bit line 12 and an output coupled to the gate of the n-channel MOS transistor 20 r .
  • the output voltage appears at the common drain connection of MOS transistors 18 r and 20 r.
  • a current-to-voltage converter associated with each bit line in the memory array includes diode connected p-channel MOS transistor 18 in series with n-channel MOS transistor 20 coupled to the bit line 16 .
  • An inverter is formed from p-channel MOS transistor 22 in series with n-channel MOS transistor 24 having an input coupled to the reference bit line 16 and an output coupled to the gate of the n-channel MOS transistor 20 .
  • the reference cell bit line is also connected to a unity gain buffer 26 .
  • Unity-gain buffer 26 drives the reference bit line voltage to all the current-to-voltage converters next to the sense amplifiers to precharge them to a reference voltage.
  • a full pass gate formed from n-channel MOS transistor 28 , p-channel MOS transistor 30 , and inverter 32 controlled by a control signal isolates each sensing bit line from the output of the driver during a non-equalization phase.
  • a reference current flows through reference bit line 12 .
  • the reference current is selected to be approximately midway between the erased cell current and the programmed cell current. As an example, in a memory array where the erased-cell current is 15 ⁇ A and the programmed-cell current is 0, the reference current in reference bit line 12 is elected to be 7.5 ⁇ A.
  • the control signal is asserted for a brief pre-charge period (e.g., 10 ns at the beginning of accessing a new address. During this time, the sensing bit line 16 is forced to the voltage level close to the voltage level of the reference bit line 12 by unity-gain buffer 26 . This is equivalent to sensing a mid-level (e.g., 7.5 uA) cell current regardless of the V t of the array cell and voltage level of the selected word lines.
  • a brief pre-charge period e.g. 10 ns at the beginning of accessing a new address.
  • the sensing bit line 16 is forced to the voltage level close to the voltage level of the reference bit line 12 by unity-gain buffer 26 . This is equivalent to sensing a mid-level (e.g., 7.5 uA) cell current regardless of the V t of the array cell and voltage level of the selected word lines.
  • the current sensed in the cell bit lines 16 causes a sense voltage to be generated in cell current-to-voltage converter 14 . If the cell current sensed is more than the reference current, the voltage will be greater than the pre-settlement voltage placed on the bit line during the precharge period. Conversely, if the cell current sensed is less than the reference current, the voltage will be less than the pre-settlement voltage placed on the bit line during the precharge period.
  • a voltage at the drain of diode-connected p-channel MOS transistor 18 related to the current drawn by the selected flash cell is compared with a voltage at the drain of diode-connected p-channel MOS transistor 18 r related to the current drawn by the reference bit line 12 , in comparator 34 .
  • the output of comparator 34 represents the data bit stored in the selected flash memory cell and is latched into a data latch comprising inverters 36 and 38 .
  • the data is strobed through a full pass gate formed from n-channel MOS transistor 40 , p-channel MOS transistor 42 , and inverter 44 controlled by a data strobe signal.
  • V tp is threshold voltage of the PMOS device, inside the current-to-voltage converter. It will take more than 10 ns for an erased cell to discharge the sensing bit line 16 below the voltage level of the reference cell bit line 12 .
  • the equalization scheme of the present invention performs a read without over-shoot or under-shoot of the sensing bit line voltage.
  • the sensing bit line voltage is settled before the word line is up and read. Once the word line is ready, the control signal will turn low and let the sensing work by itself.
  • One advantage of the design of the present invention is that it pre-sets the voltage level of sensing bit line between two possible target levels. This scheme relieves the worst-case condition.

Abstract

A flash memory array includes a reference bit line on which a reference current is imposed. During read operation, bit lines selected for reading are connected to current-to-voltage converters, each of which generates an output voltage based upon the input current flowing in the bit line. The output voltage of the current-to-voltage converter is compared to a reference voltage derived from the output of a reference current-to-voltage converter whose input is driven by a reference current on a reference bit line. Any cell that conducts more current than the reference current will be regarded as an erased cell. Conversely, any cell that conducts less current than the reference current will be regarded as a programmed cell.

Description

    CROSS-REFERENCE TO RELATED APPLICATIONS
  • This application is a continuation of co-pending U.S. patent application Ser. No. 11/281,253, filed Nov. 16, 2005, the entirety of which is incorporated by reference herein.
  • BACKGROUND OF THE INVENTION
  • 1. Field of the Invention
  • The present invention relates to flash memory arrays. More particularly, the present invention relates to methods and apparatus for reducing the pre-settlement time needed before a flash cell output can be sensed on a bit line in a memory array.
  • 2. The Prior Art
  • Most of the prior precharging schemes known in the prior art are designed for CAM, DRAM, SRAM and ROM memory cells. These types of memories mentioned above never use a reference bit line like non-volatile memory. The sensing scheme of the above memories amplifies the difference between of one pair of differential bit lines coupled to each selected cell.
  • The majority of bit line precharge methods that have been adopted in the industry involve creation of a short pulse and charge up the bit line to VCC−Vt, or to VCC. Some known schemes pre-charge the target bit line to Vcc−|Vt|, or Vcc−2|Vt|. U.S. Pat. No. 6,240,020 shows a NAND type Flash memory scheme in which the bit line is precharged to VCC−Vtn. U.S. Pat. No. 5,105,354 discloses a scheme in which an extra “plateline” is used on the source side of the EEPROM memory cell. The plateline is coupled up by a substrate capacitance during precharge. When the wordline goes high, the voltage level on the source and drain sides of the memory cells are being equalized.
  • BRIEF DESCRIPTION OF THE INVENTION
  • A flash memory array according to the present invention includes a reference bit line on which a reference current is imposed. During a read operation, bit lines selected for reading are connected to current-to-voltage converters, each of which generates an output voltage based upon the input current flowing in the bit line. The output voltage of the current-to-voltage converter is compared to a reference voltage derived from the output of a reference current-to-voltage converter whose input is driven by a reference current on a reference bit line. Any cell that conducts more current than the reference current will be regarded as an erased cell. Conversely, any cell that conducts less current than the reference current will be regarded as a programmed cell.
  • BRIEF DESCRIPTION OF THE DRAWING FIGURES
  • FIG. 1 is a schematic diagram of a bit line pre-settlement circuit for a flash memory sensing scheme according to the present invention.
  • DETAILED DESCRIPTION OF THE INVENTION
  • Persons of ordinary skill in the art will realize that the following description of the present invention is illustrative only and not in any way limiting. Other embodiments of the invention will readily suggest themselves to such skilled persons.
  • Although the term “flash” often refers to memories that are bulk erased on a page-by-page, sector-by-sector, or entire array basis, the term is generally used in the art to refer to any electrically erasable (and re-programmable) non-volatile memory technology, regardless of the particular erase scheme. The most common flash memory devices are comprised of floating-gate transistors, though other flash technologies such as SONOS, non-crystal, and other nonvolatile transistors are also known.
  • To meet the read speed requirements in the fast flash devices, it is desirable to reduce the read access time. The solution posed by the present invention is to equalize the voltage level of a target bit line with that of a reference bit line and therefore reduce the worst-case read access time by about 5 ns.
  • During a read operation, bit lines selected for reading are connected to current-to-voltage converters, each of which generates an output voltage based upon the input current flowing in the bit line. The output voltage of the current-to-voltage converter is compared to a reference voltage derived from the output of a reference current-to-voltage converter whose input is driven by a reference current on a reference bit line. Any cell that conducts more current than the reference current will be regarded as an erased cell. Conversely, any cell that conducts less current than the reference current will be regarded as a programmed cell.
  • Referring to FIG. 1, one current-to-voltage converter 10 is connected to a reference cell via reference bit line 12 and a cell current-to-voltage converter 14 is connected to a cell being sensed via bit line 16. In FIG. 1, the cell being sensed is represented by the current Icell. The reference voltage-to-current converter includes diode connected p-channel MOS transistor 18 r in series with n-channel MOS transistor 20 r coupled to the reference bit line 12. An inverter is formed from p-channel MOS transistor 22 r in series with n-channel MOS transistor 24 r having an input coupled to the reference bit line 12 and an output coupled to the gate of the n-channel MOS transistor 20 r. The output voltage appears at the common drain connection of MOS transistors 18 r and 20 r.
  • Like the reference voltage-to-current converter, a current-to-voltage converter associated with each bit line in the memory array includes diode connected p-channel MOS transistor 18 in series with n-channel MOS transistor 20 coupled to the bit line 16. An inverter is formed from p-channel MOS transistor 22 in series with n-channel MOS transistor 24 having an input coupled to the reference bit line 16 and an output coupled to the gate of the n-channel MOS transistor 20.
  • The reference cell bit line is also connected to a unity gain buffer 26. Unity-gain buffer 26 drives the reference bit line voltage to all the current-to-voltage converters next to the sense amplifiers to precharge them to a reference voltage. A full pass gate formed from n-channel MOS transistor 28, p-channel MOS transistor 30, and inverter 32 controlled by a control signal isolates each sensing bit line from the output of the driver during a non-equalization phase. A reference current flows through reference bit line 12. The reference current is selected to be approximately midway between the erased cell current and the programmed cell current. As an example, in a memory array where the erased-cell current is 15 μA and the programmed-cell current is 0, the reference current in reference bit line 12 is elected to be 7.5 μA.
  • The control signal is asserted for a brief pre-charge period (e.g., 10 ns at the beginning of accessing a new address. During this time, the sensing bit line 16 is forced to the voltage level close to the voltage level of the reference bit line 12 by unity-gain buffer 26. This is equivalent to sensing a mid-level (e.g., 7.5 uA) cell current regardless of the Vt of the array cell and voltage level of the selected word lines.
  • After the control signal has been deasserted, the current sensed in the cell bit lines 16 causes a sense voltage to be generated in cell current-to-voltage converter 14. If the cell current sensed is more than the reference current, the voltage will be greater than the pre-settlement voltage placed on the bit line during the precharge period. Conversely, if the cell current sensed is less than the reference current, the voltage will be less than the pre-settlement voltage placed on the bit line during the precharge period.
  • After the precharge period has ended, a voltage at the drain of diode-connected p-channel MOS transistor 18 related to the current drawn by the selected flash cell is compared with a voltage at the drain of diode-connected p-channel MOS transistor 18 r related to the current drawn by the reference bit line 12, in comparator 34. The output of comparator 34 represents the data bit stored in the selected flash memory cell and is latched into a data latch comprising inverters 36 and 38. The data is strobed through a full pass gate formed from n-channel MOS transistor 40, p-channel MOS transistor 42, and inverter 44 controlled by a data strobe signal.
  • Without the scheme implemented by the present invention, in the worst case, in order to sense bit line 16, the bit line will be pulled up to a voltage of Vcc−|Vtp| by the current-to-voltage converter. Vtp is threshold voltage of the PMOS device, inside the current-to-voltage converter. It will take more than 10 ns for an erased cell to discharge the sensing bit line 16 below the voltage level of the reference cell bit line 12.
  • The equalization scheme of the present invention performs a read without over-shoot or under-shoot of the sensing bit line voltage. The sensing bit line voltage is settled before the word line is up and read. Once the word line is ready, the control signal will turn low and let the sensing work by itself.
  • One advantage of the design of the present invention is that it pre-sets the voltage level of sensing bit line between two possible target levels. This scheme relieves the worst-case condition.
  • While embodiments and applications of this invention have been shown and described, it would be apparent to those skilled in the art that many more modifications than mentioned above are possible without departing from the inventive concepts herein. The invention, therefore, is not to be restricted except in the spirit of the appended claims.

Claims (1)

1. A flash memory bit line pre-settlement circuit, including:
at least one flash memory cell that draws an erased current when in an erased state and a programmed current when in a programmed state;
a cell bit line coupled to the at least one flash cell;
a reference bit line drawing a reference current selected to be about midway between the erased current and the programmed current of the at least one flash memory cell;
a cell current-to-voltage converter coupled to the cell bit line;
a reference current-to-voltage converter coupled to the reference bit line; and
a cell bit line precharge circuit selectively coupling a reference output voltage from the reference current-to-voltage converter to the cell bit line during a bit line precharge period.
US12/037,839 2005-11-16 2008-02-26 Bit line pre-settlement circuit and method for flash memory sensing scheme Abandoned US20080144393A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/037,839 US20080144393A1 (en) 2005-11-16 2008-02-26 Bit line pre-settlement circuit and method for flash memory sensing scheme

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/281,253 US7342832B2 (en) 2005-11-16 2005-11-16 Bit line pre-settlement circuit and method for flash memory sensing scheme
US12/037,839 US20080144393A1 (en) 2005-11-16 2008-02-26 Bit line pre-settlement circuit and method for flash memory sensing scheme

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US11/281,253 Continuation US7342832B2 (en) 2005-11-16 2005-11-16 Bit line pre-settlement circuit and method for flash memory sensing scheme

Publications (1)

Publication Number Publication Date
US20080144393A1 true US20080144393A1 (en) 2008-06-19

Family

ID=38040225

Family Applications (2)

Application Number Title Priority Date Filing Date
US11/281,253 Active 2026-03-07 US7342832B2 (en) 2005-11-16 2005-11-16 Bit line pre-settlement circuit and method for flash memory sensing scheme
US12/037,839 Abandoned US20080144393A1 (en) 2005-11-16 2008-02-26 Bit line pre-settlement circuit and method for flash memory sensing scheme

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US11/281,253 Active 2026-03-07 US7342832B2 (en) 2005-11-16 2005-11-16 Bit line pre-settlement circuit and method for flash memory sensing scheme

Country Status (4)

Country Link
US (2) US7342832B2 (en)
EP (1) EP1949542A4 (en)
JP (1) JP2009516324A (en)
WO (1) WO2007059402A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9554912B2 (en) 2010-03-11 2017-01-31 Biomet Ltd Tibial prosthetic component for a partial or unicondylar bearing knee replacement, method of selecting such a tibial prosthetic component, method of implanting such a tibial prosthetic component and a kit for a surgeon
CN110491434A (en) * 2019-08-23 2019-11-22 上海华虹宏力半导体制造有限公司 A kind of flash memory devices and its programmed method

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7342832B2 (en) * 2005-11-16 2008-03-11 Actel Corporation Bit line pre-settlement circuit and method for flash memory sensing scheme
US7570514B2 (en) * 2007-01-22 2009-08-04 Macronix International Co. Ltd. Method of operating multi-level cell and integrate circuit for using multi-level cell to store data
US8018773B2 (en) * 2009-03-04 2011-09-13 Silicon Storage Technology, Inc. Array of non-volatile memory cells including embedded local and global reference cells and system
JP5530268B2 (en) * 2010-06-23 2014-06-25 ラピスセミコンダクタ株式会社 Nonvolatile memory device
US9218879B2 (en) * 2010-12-01 2015-12-22 Crocus Technology Inc. Apparatus, system, and method for matching patterns with an ultra fast check engine based on flash cells
CN103794252B (en) * 2012-10-29 2018-01-09 硅存储技术公司 Low-voltage current for sense amplifier refers to generator
US9208847B2 (en) 2013-10-30 2015-12-08 Taiwan Semiconductor Manufacturing Co., Ltd. Memory devices with improved refreshing operations
US10032509B2 (en) * 2015-03-30 2018-07-24 Toshiba Memory Corporation Semiconductor memory device including variable resistance element
EP3284093B1 (en) 2015-04-14 2021-08-04 Cambou, Bertrand, F. Memory circuits using a blocking state
WO2016182596A1 (en) 2015-05-11 2016-11-17 Cambou Bertrand F Memory circuit using dynamic random access memory arrays
US9588908B2 (en) 2015-06-02 2017-03-07 Bertrand F. Cambou Memory circuit using resistive random access memory arrays in a secure element
CN112259144B (en) * 2020-10-29 2021-04-30 海光信息技术股份有限公司 Static random access memory circuit, memory and electronic equipment

Citations (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4816706A (en) * 1987-09-10 1989-03-28 International Business Machines Corporation Sense amplifier with improved bitline precharging for dynamic random access memory
US5007023A (en) * 1988-07-21 1991-04-09 Samsung Electronics Co., Ltd. Bitline precharge circuit of multi-sectional memory array
US5305273A (en) * 1991-09-10 1994-04-19 Nec Corporation Semiconductor memory device
US5339274A (en) * 1992-10-30 1994-08-16 International Business Machines Corporation Variable bitline precharge voltage sensing technique for DRAM structures
US5361229A (en) * 1993-04-08 1994-11-01 Xilinx, Inc. Precharging bitlines for robust reading of latch data
US5396467A (en) * 1994-03-30 1995-03-07 United Microelectronics Corp. Sense amplifier
US5434822A (en) * 1994-07-07 1995-07-18 Intel Corporation Apparatus and method for adjusting and maintaining a bitline precharge level
US5440518A (en) * 1991-06-12 1995-08-08 Hazani; Emanuel Non-volatile memory circuits, architecture and methods
US5528543A (en) * 1994-09-16 1996-06-18 Texas Instruments Incorporated Sense amplifier circuitry
US5530671A (en) * 1993-10-13 1996-06-25 Nec Corporation Semiconductor memory device having presetting function of sense amplifier
US5559737A (en) * 1991-07-25 1996-09-24 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory capable of simultaneously equalizing bit lines and sense lines
US5563831A (en) * 1995-08-30 1996-10-08 Etron Technology Inc. Timing reference circuit for bitline precharge in memory arrays
US5594691A (en) * 1995-02-15 1997-01-14 Intel Corporation Address transition detection sensing interface for flash memory having multi-bit cells
US5781469A (en) * 1997-01-24 1998-07-14 Atmel Corporation Bitline load and precharge structure for an SRAM memory
US5841310A (en) * 1997-04-08 1998-11-24 Burr-Brown Corporation Current-to-voltage integrator for analog-to-digital converter, and method
US5848015A (en) * 1996-08-08 1998-12-08 Sony Corporation Bitline precharge halt access mode for low power operation of a memory device
US5864503A (en) * 1997-05-30 1999-01-26 Sgs-Thomson Microelectronics S.R.L. Method for verifying electrically programmable non-volatile memory cells of an electrically programmable non-volatile memory device after programming
US5875139A (en) * 1996-10-03 1999-02-23 Sharp Kabushiki Kaisha Bitline precharge circuit for semiconductor memory device
US5883845A (en) * 1997-10-30 1999-03-16 Lg Semicon Co., Ltd. Semiconductor memory having bitline precharge circuit
US5963494A (en) * 1998-07-31 1999-10-05 Lg Semicon Co., Ltd. Semiconductor memory having bitline precharge circuit
US6021072A (en) * 1998-07-27 2000-02-01 Motorola, Inc. Method and apparatus for precharging bitlines in a nonvolatile memory
US6023435A (en) * 1997-12-22 2000-02-08 Cypress Semiconductor Corp. Staggered bitline precharge scheme
US6098145A (en) * 1998-02-18 2000-08-01 Winbond Electronics Corporation Pulsed Y-decoders for improving bitline precharging in memories
US6240020B1 (en) * 1999-10-25 2001-05-29 Advanced Micro Devices Method of bitline shielding in conjunction with a precharging scheme for nand-based flash memory devices
US6307797B1 (en) * 1999-11-30 2001-10-23 Stmicroelectronics S.A. Reading device for integrated circuit memory
US6426914B1 (en) * 2001-04-20 2002-07-30 International Business Machines Corporation Floating wordline using a dynamic row decoder and bitline VDD precharge
US6490212B1 (en) * 2001-07-11 2002-12-03 Silicon Storage Technology, Inc. Bitline precharge matching
US6504775B1 (en) * 2001-04-30 2003-01-07 Mosaid Technologies Incorporated Kanata Bitline precharge
US6567327B2 (en) * 2000-08-10 2003-05-20 Nec Corporation Driving circuit, charge/discharge circuit and the like
US20030123311A1 (en) * 2001-12-31 2003-07-03 San-Ha Park Bitline precharge circuit and method in semiconductor memory device
US6621904B1 (en) * 1999-09-29 2003-09-16 Agere Systems Inc. Pre-charging line modem capacitors to reduce DC setup time
US6643804B1 (en) * 2000-04-19 2003-11-04 International Business Machines Corporation Stability test for silicon on insulator SRAM memory cells utilizing bitline precharge stress operations to stress memory cells under test
US20040004868A1 (en) * 2002-07-08 2004-01-08 Jeong Jong Bae Sense amplifier
US6717856B2 (en) * 2001-06-30 2004-04-06 Intel Corporation Method and apparatus for sen-ref equalization
US20040076070A1 (en) * 2002-10-21 2004-04-22 Hyung-Dong Kim Semiconductor memory device for enhancing bitline precharge time
US20040151044A1 (en) * 2003-01-30 2004-08-05 Sun Microsystems, Inc. Methods and circuits for balancing bitline precharge
US6813187B2 (en) * 2001-02-22 2004-11-02 Samsung Electronics Co., Ltd. Bit line setup and discharge circuit for programming non-volatile memory
US20050105354A1 (en) * 2003-11-18 2005-05-19 Madan Sudhir K. Bitline precharge timing scheme to improve signal margin
US20050116747A1 (en) * 2003-12-01 2005-06-02 Nec Corporation Driving circuit of current-driven device current-driven apparatus, and method of driving the same
US7342832B2 (en) * 2005-11-16 2008-03-11 Actel Corporation Bit line pre-settlement circuit and method for flash memory sensing scheme

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3651767B2 (en) * 2000-04-24 2005-05-25 シャープ株式会社 Semiconductor memory device
US6744674B1 (en) * 2003-03-13 2004-06-01 Advanced Micro Devices, Inc. Circuit for fast and accurate memory read operations

Patent Citations (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4816706A (en) * 1987-09-10 1989-03-28 International Business Machines Corporation Sense amplifier with improved bitline precharging for dynamic random access memory
US5007023A (en) * 1988-07-21 1991-04-09 Samsung Electronics Co., Ltd. Bitline precharge circuit of multi-sectional memory array
US5440518A (en) * 1991-06-12 1995-08-08 Hazani; Emanuel Non-volatile memory circuits, architecture and methods
US5559737A (en) * 1991-07-25 1996-09-24 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory capable of simultaneously equalizing bit lines and sense lines
US5305273A (en) * 1991-09-10 1994-04-19 Nec Corporation Semiconductor memory device
US5339274A (en) * 1992-10-30 1994-08-16 International Business Machines Corporation Variable bitline precharge voltage sensing technique for DRAM structures
US5361229A (en) * 1993-04-08 1994-11-01 Xilinx, Inc. Precharging bitlines for robust reading of latch data
US5530671A (en) * 1993-10-13 1996-06-25 Nec Corporation Semiconductor memory device having presetting function of sense amplifier
US5396467A (en) * 1994-03-30 1995-03-07 United Microelectronics Corp. Sense amplifier
US5434822A (en) * 1994-07-07 1995-07-18 Intel Corporation Apparatus and method for adjusting and maintaining a bitline precharge level
US5528543A (en) * 1994-09-16 1996-06-18 Texas Instruments Incorporated Sense amplifier circuitry
US5594691A (en) * 1995-02-15 1997-01-14 Intel Corporation Address transition detection sensing interface for flash memory having multi-bit cells
US5563831A (en) * 1995-08-30 1996-10-08 Etron Technology Inc. Timing reference circuit for bitline precharge in memory arrays
US5848015A (en) * 1996-08-08 1998-12-08 Sony Corporation Bitline precharge halt access mode for low power operation of a memory device
US5875139A (en) * 1996-10-03 1999-02-23 Sharp Kabushiki Kaisha Bitline precharge circuit for semiconductor memory device
US5781469A (en) * 1997-01-24 1998-07-14 Atmel Corporation Bitline load and precharge structure for an SRAM memory
US5841310A (en) * 1997-04-08 1998-11-24 Burr-Brown Corporation Current-to-voltage integrator for analog-to-digital converter, and method
US5864503A (en) * 1997-05-30 1999-01-26 Sgs-Thomson Microelectronics S.R.L. Method for verifying electrically programmable non-volatile memory cells of an electrically programmable non-volatile memory device after programming
US5883845A (en) * 1997-10-30 1999-03-16 Lg Semicon Co., Ltd. Semiconductor memory having bitline precharge circuit
US6023435A (en) * 1997-12-22 2000-02-08 Cypress Semiconductor Corp. Staggered bitline precharge scheme
US6098145A (en) * 1998-02-18 2000-08-01 Winbond Electronics Corporation Pulsed Y-decoders for improving bitline precharging in memories
US6021072A (en) * 1998-07-27 2000-02-01 Motorola, Inc. Method and apparatus for precharging bitlines in a nonvolatile memory
US5963494A (en) * 1998-07-31 1999-10-05 Lg Semicon Co., Ltd. Semiconductor memory having bitline precharge circuit
US6621904B1 (en) * 1999-09-29 2003-09-16 Agere Systems Inc. Pre-charging line modem capacitors to reduce DC setup time
US6240020B1 (en) * 1999-10-25 2001-05-29 Advanced Micro Devices Method of bitline shielding in conjunction with a precharging scheme for nand-based flash memory devices
US6307797B1 (en) * 1999-11-30 2001-10-23 Stmicroelectronics S.A. Reading device for integrated circuit memory
US6643804B1 (en) * 2000-04-19 2003-11-04 International Business Machines Corporation Stability test for silicon on insulator SRAM memory cells utilizing bitline precharge stress operations to stress memory cells under test
US6567327B2 (en) * 2000-08-10 2003-05-20 Nec Corporation Driving circuit, charge/discharge circuit and the like
US6813187B2 (en) * 2001-02-22 2004-11-02 Samsung Electronics Co., Ltd. Bit line setup and discharge circuit for programming non-volatile memory
US6426914B1 (en) * 2001-04-20 2002-07-30 International Business Machines Corporation Floating wordline using a dynamic row decoder and bitline VDD precharge
US6504775B1 (en) * 2001-04-30 2003-01-07 Mosaid Technologies Incorporated Kanata Bitline precharge
US20030016580A1 (en) * 2001-04-30 2003-01-23 Ma Peter P. Bitline precharge
US6608788B2 (en) * 2001-04-30 2003-08-19 Mosaid Technologies Incorporated Bitline precharge
US20030072205A1 (en) * 2001-04-30 2003-04-17 Ma Peter P. Bitline precharge
US6717856B2 (en) * 2001-06-30 2004-04-06 Intel Corporation Method and apparatus for sen-ref equalization
US6490212B1 (en) * 2001-07-11 2002-12-03 Silicon Storage Technology, Inc. Bitline precharge matching
US6667921B2 (en) * 2001-12-31 2003-12-23 Hynix Semiconductor Inc. Bitline precharge circuit and method in semiconductor memory device
US20030123311A1 (en) * 2001-12-31 2003-07-03 San-Ha Park Bitline precharge circuit and method in semiconductor memory device
US20040004868A1 (en) * 2002-07-08 2004-01-08 Jeong Jong Bae Sense amplifier
US20040076070A1 (en) * 2002-10-21 2004-04-22 Hyung-Dong Kim Semiconductor memory device for enhancing bitline precharge time
US6856563B2 (en) * 2002-10-21 2005-02-15 Samsung Electronics Co., Ltd. Semiconductor memory device for enhancing bitline precharge time
US20040151044A1 (en) * 2003-01-30 2004-08-05 Sun Microsystems, Inc. Methods and circuits for balancing bitline precharge
US20050105354A1 (en) * 2003-11-18 2005-05-19 Madan Sudhir K. Bitline precharge timing scheme to improve signal margin
US20050116747A1 (en) * 2003-12-01 2005-06-02 Nec Corporation Driving circuit of current-driven device current-driven apparatus, and method of driving the same
US7342832B2 (en) * 2005-11-16 2008-03-11 Actel Corporation Bit line pre-settlement circuit and method for flash memory sensing scheme

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9554912B2 (en) 2010-03-11 2017-01-31 Biomet Ltd Tibial prosthetic component for a partial or unicondylar bearing knee replacement, method of selecting such a tibial prosthetic component, method of implanting such a tibial prosthetic component and a kit for a surgeon
US10350077B2 (en) 2010-03-11 2019-07-16 Biomet Limited Tibial prosthetic component for a partial or unicondylar bearing knee replacement, method of selecting such a tibial prosthetic component, method of implanting such a tibial prosthetic component and a kit for a surgeon
CN110491434A (en) * 2019-08-23 2019-11-22 上海华虹宏力半导体制造有限公司 A kind of flash memory devices and its programmed method

Also Published As

Publication number Publication date
WO2007059402A2 (en) 2007-05-24
WO2007059402A3 (en) 2008-08-21
EP1949542A2 (en) 2008-07-30
US20070109157A1 (en) 2007-05-17
US7342832B2 (en) 2008-03-11
EP1949542A4 (en) 2008-11-12
JP2009516324A (en) 2009-04-16

Similar Documents

Publication Publication Date Title
US7342832B2 (en) Bit line pre-settlement circuit and method for flash memory sensing scheme
US7336541B2 (en) NAND flash memory cell programming
US7203092B2 (en) Flash memory array using adjacent bit line as source
US7362616B2 (en) NAND flash memory with erase verify based on shorter evaluation time
US7539059B2 (en) Selective bit line precharging in non volatile memory
US6285587B1 (en) Memory cell string structure of a flash memory device
US5654920A (en) Nonvolatile semiconductor storage system
US20050036369A1 (en) Temperature compensated bit-line precharge
KR101099835B1 (en) Semiconductor memory apparatus and method of operating thereof
US9171635B2 (en) Semiconductor memory device having page buffer and method of operating the same
US6801463B2 (en) Method and apparatus for leakage compensation with full Vcc pre-charge
US7391648B2 (en) Low voltage sense amplifier for operation under a reduced bit line bias voltage
JPH0334198A (en) Rewritable nonvolatile memory
US7394699B2 (en) Sense amplifier for a non-volatile memory device
US7551490B2 (en) Flash memory device and method of reading data from flash memory device
US5617350A (en) Flash memory system having reduced disturb and method
US7173856B2 (en) Sense amplifier for a non-volatile memory device
US7782676B2 (en) Method of operating a nonvolatile memory device
US20070147120A1 (en) Page buffer and related reading method
JPH09306191A (en) Non-volatile semiconductor memory
US5708609A (en) Semiconductor memory device with dataline undershoot detection and reduced read access time
KR101093625B1 (en) Non-volatile memory and virtual negative read operatin method of the same
KR20120069116A (en) Semiconductor memory device

Legal Events

Date Code Title Description
STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION