US20080196752A1 - Apparatus and method for cleaning a glass substrate before photoresist coating - Google Patents

Apparatus and method for cleaning a glass substrate before photoresist coating Download PDF

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Publication number
US20080196752A1
US20080196752A1 US12/081,883 US8188308A US2008196752A1 US 20080196752 A1 US20080196752 A1 US 20080196752A1 US 8188308 A US8188308 A US 8188308A US 2008196752 A1 US2008196752 A1 US 2008196752A1
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Prior art keywords
glass substrate
clean water
metal film
cleaning
developer
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Abandoned
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US12/081,883
Inventor
Wei-Ting Chen
Man-Hung Wu
Hung-Yi Cheng
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AU Optronics Corp
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AU Optronics Corp
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Priority to US12/081,883 priority Critical patent/US20080196752A1/en
Publication of US20080196752A1 publication Critical patent/US20080196752A1/en
Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32139—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer using masks
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/22—Light metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78603—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C11D2111/22—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742—Thin film unipolar transistors
    • H01L29/6675—Amorphous silicon or polysilicon transistors

Definitions

  • the present invention relates to a method and an apparatus for cleaning a glass substrate, and more particularly, to a method and an apparatus for rinsing oxide compounds and organic residues on the surface of a metal film before a glass substrate is coated with a photoresist.
  • the LCD is largely applied in various electronic products such as a Personal Digital Assistant (PDA) device, a notebook computer, a digital camera, a video camera, and a mobile phone due to the fact it has advantages of smaller size, lighter weight, lower power consumption and low radiation.
  • PDA Personal Digital Assistant
  • the quality of the LCD is unceasingly improved and the price thereof is continuously decreased. That promptly broadens the applied fields of the LCD.
  • FIG. 1 it shows a sectional view of a thin film transistor formed on a glass substrate in the prior art.
  • the manufacturing process for the thin film transistor includes firstly forming a gate metal film on the glass substrate 10 , wherein the gate metal film is made of aluminum or aluminum alloy material and is formed by sputtering deposition; then performing a first photo engraving process (PEP) for the gate metal film to define a gate structure 12 and metal line structures (not shown); subsequently covering the surface of the above-mentioned structures with an insulating layer 14 by a CVD process; sequentially forming a semiconductor layer 16 and a doped semiconductor layer 18 above the gate structure 12 ; afterwards, performing a second PEP for the semiconductor layer 16 and the doped semiconductor layer 18 ; subsequently forming a source/drain metal film on the doped semiconductor layer 18 and the insulating layer 14 , wherein the source/drain metal film is a composite metal film made of a tri-layer metal molybdenum/aluminum/molybden
  • a cleaning procedure is further included in the steps of the above-mentioned process, especially the cleaning procedure performed before a photoresist is coated on the metal film of the glass substrate during the first and third PEPs.
  • the cleaning procedure is used to remove particles of oxides and organics remained on the surface of the metal film so that coated photoresist patterns will not result in defects or disconnections. Furthermore, the organic residuals also reduce the adhesion of the photoresist to result in peeling.
  • the cleaning process is one of the most important factors for process yield.
  • FIG. 2 which is a schematic diagram of a conventional scrubber before the glass substrate is coated with the photoresist
  • a scrubber 21 of the fifth generation TFT-LCD is exemplified.
  • a delivering band 23 is used to transport the glass substrate 22 to a rinse unit 24 .
  • Three clean water nozzles 25 mounted on the top of the delivering band 23 at the rinse unit 24 are used to rinse out the glass substrate 22 .
  • the glass substrate 22 is transported out by the delivering band 23 .
  • the rinsed glass substrate 22 is under a dry treatment with an air scraper 26 .
  • the clean water nozzles 25 are respectively connected to a deionized water supply source 27 with pipelines and rinse the glass substrate 22 in a manner of high pressure spraying in combination with a mega sonic wave. Moreover, a recycling pipeline 28 further disposed below the rinse unit 24 can recycle excess deionized water from the clean water nozzles 25 during the glass substrate 22 is rinsed.
  • the conventional scrubber and the cleaning method thereof cannot remove the organics and oxides on the surface of the metal film of the glass substrate and the formed photoresist patterns still have defects, disconnections and peelings. Therefore, those skilled in the art of photoelectric related industries endeavor to research and develop processes as well as to improve equipment so as to provide a method which can remove the organic and oxide residuals from the surface of the metal film of the glass substrate and solve the problems of the prior art.
  • the primary objective of the present invention is to provide a method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate so as to prevent the coated photoresist patterns from resulting in defects, disconnections and peelings.
  • the second objective of the present invention is to provide an apparatus for cleaning a glass substrate before photoresist coating, which apparatus can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate so as to prevent the coated photoresist patterns from resulting in defects, disconnections and peelings.
  • the cleaning method disclosed in this invention includes the steps of firstly providing an alkaline developer which has tetramethylammonium hydroxide (TMAH) as the main component, in a concentration of between 0.35% and 0.45%; later immersing a metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water in a manner of high pressure spraying in combination with a mega sonic wave; and lastly having the surface of the metal film of the glass substrate in a dry treatment with an air scraper.
  • TMAH tetramethylammonium hydroxide
  • a preferred immersing time is between 30 and 50 seconds considering material and time costs, an appropriate cleaning effect and the other related factors, so as to have a complete reaction of the alkaline developer with the oxides and organics on the surface of the metal film.
  • the cleaning apparatus of this invention comprises a developer nozzle, a set of clean water nozzles, a delivering band, a recycling pipeline and an air scraper, wherein the developer nozzle is connected to a developer supply source through pipelines and provides a developer desired for cleaning the glass substrate; the set of clean water nozzles is connected to a clean water supply source and rinses the glass substrate in a manner of high pressure spraying in combination with a mega sonic wave; the delivering band can carry the glass substrate to first pass the developer nozzle for developer immersing and then to pass the set of clean water nozzles for clean water rinsing; the recycling pipeline can recycle excess liquids during the glass substrate is cleaned; and the air scraper is used to dry the surface of the metal film after completion of rinsing the glass substrate.
  • FIG. 1 is a sectional view of a thin film transistor formed on a glass substrate in the prior art
  • FIG. 2 is a schematic diagram of a conventional scrubber before a glass substrate is coated with a photoresist
  • FIG. 3 is a flow chart of a method for cleaning a glass substrate before photoresist coating in accordance with this invention.
  • FIG. 4 is a schematic diagram of an apparatus for cleaning the glass substrate before photoresist coating in accordance with this invention.
  • the present invention relates to a method and an apparatus for cleaning a glass substrate before photoresist coating, which can remove oxide compounds and organic residues on the surface of a metal layer of the glass substrate.
  • the best mode and the practicing thereof are described below in detail.
  • FIG. 3 it is a flow chart of the method for cleaning a glass substrate before photoresist coating in accordance with this invention.
  • the steps of the method includes firstly providing an alkaline developer which has tetramethylammonium hydroxide (TMAH) as the main component, in a concentration of between 0.35% and 0.45% (S 31 ); later immersing a metal film of the glass substrate in the alkaline developer for a time of preferably between 30 and 50 seconds so as to have a complete reaction of the alkaline developer with the oxides and organics on the surface of the metal film (S 32 ); then rinsing the metal film of the glass substrate after immersed with clean water in a manner of high pressure spraying in combination with a mega sonic wave (S 33 ); and lastly having the surface of the metal film of the glass substrate in a dry treatment with an air scraper (S 34 ).
  • TMAH tetramethylammonium hydroxide
  • the cleaning apparatus of this invention comprises one developer nozzle 41 , two clean water nozzles 42 , a delivering band 43 , a recycling pipeline 44 and an air scraper 45 , wherein the developer nozzle 41 and the two clean water nozzles 42 constitute a rinse unit 46 , and the delivering band 43 can transport a glass substrate 47 to the rinse unit 46 for rinsing and then transport the glass substrate 47 to the air scraper 45 for drying.
  • the developer nozzle 41 is connected to a developer supply source 27 through pipelines and the developer supply source 27 can provide the alkaline developer desired for cleaning the glass substrate 47 .
  • the main component of the alkaline developer is a tetramethylammonium hydroxide (TMAH) solution in a concentration of between 0.35% and 0.45%, most preferably 0.4%.
  • TMAH tetramethylammonium hydroxide
  • the two clean water nozzles 42 are respectively connected to a clean water supply source 49 (which provides such as deionized water) with pipelines and rinse the glass substrate 47 in a manner of high pressure spraying in combination with a mega sonic wave.
  • the delivering band 43 carries the glass substrate 47 to first pass the developer nozzle 41 for developer immersing about 30 to 50 seconds and then to pass the clean water nozzles 42 for clean water rinsing.
  • the recycling pipeline 44 disposed below the rinse unit 46 can recycle excess liquids during the glass substrate 47 is cleaned and separate the recycled liquids so as to reduce environment pollution and resource waste. After the glass substrate 47 is rinsed, it is transported by the delivering band 43 to the air scraper 45 for a dry treatment.
  • the cleaning apparatus of this invention has one of the clean water nozzles (most preferably the first one) in the prior art connected to a developer supply source with pipelines and provide the desired alkaline developer. Therefore, the improved cleaning apparatus of this invention can achieve the desired cleaning effects and reduce manufacturing costs and resource waste.

Abstract

A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.

Description

    FIELD OF THE INVENTION
  • The present invention relates to a method and an apparatus for cleaning a glass substrate, and more particularly, to a method and an apparatus for rinsing oxide compounds and organic residues on the surface of a metal film before a glass substrate is coated with a photoresist.
    • BACKGROUND OF THE INVENTION
  • With rapid advancement of the fabrication technology of thin film transistor liquid crystal displays (TFT-LCDs), the LCD is largely applied in various electronic products such as a Personal Digital Assistant (PDA) device, a notebook computer, a digital camera, a video camera, and a mobile phone due to the fact it has advantages of smaller size, lighter weight, lower power consumption and low radiation. Moreover, since manufacturers aggressively invest in research & development and employ large-scale fabricating equipment, the quality of the LCD is unceasingly improved and the price thereof is continuously decreased. That promptly broadens the applied fields of the LCD.
  • Referring to FIG. 1, it shows a sectional view of a thin film transistor formed on a glass substrate in the prior art. The manufacturing process for the thin film transistor includes firstly forming a gate metal film on the glass substrate 10, wherein the gate metal film is made of aluminum or aluminum alloy material and is formed by sputtering deposition; then performing a first photo engraving process (PEP) for the gate metal film to define a gate structure 12 and metal line structures (not shown); subsequently covering the surface of the above-mentioned structures with an insulating layer 14 by a CVD process; sequentially forming a semiconductor layer 16 and a doped semiconductor layer 18 above the gate structure 12; afterwards, performing a second PEP for the semiconductor layer 16 and the doped semiconductor layer 18; subsequently forming a source/drain metal film on the doped semiconductor layer 18 and the insulating layer 14, wherein the source/drain metal film is a composite metal film made of a tri-layer metal molybdenum/aluminum/molybdenum and is formed by a CVD process; then performing a third PEP to respectively define a source structure and a drain structure 20 on the metal film and thus to define the thin film transistor on the surface of the glass substrate.
  • A cleaning procedure is further included in the steps of the above-mentioned process, especially the cleaning procedure performed before a photoresist is coated on the metal film of the glass substrate during the first and third PEPs. The cleaning procedure is used to remove particles of oxides and organics remained on the surface of the metal film so that coated photoresist patterns will not result in defects or disconnections. Furthermore, the organic residuals also reduce the adhesion of the photoresist to result in peeling. Hence, to the fabrication process of the THT-LCD, the cleaning process is one of the most important factors for process yield.
  • Referring to FIG. 2, which is a schematic diagram of a conventional scrubber before the glass substrate is coated with the photoresist, a scrubber 21 of the fifth generation TFT-LCD is exemplified. During cleaning the glass substrate 22, a delivering band 23 is used to transport the glass substrate 22 to a rinse unit 24. Three clean water nozzles 25 mounted on the top of the delivering band 23 at the rinse unit 24 are used to rinse out the glass substrate 22. After completion of rinsing, the glass substrate 22 is transported out by the delivering band 23. The rinsed glass substrate 22 is under a dry treatment with an air scraper 26. The clean water nozzles 25 are respectively connected to a deionized water supply source 27 with pipelines and rinse the glass substrate 22 in a manner of high pressure spraying in combination with a mega sonic wave. Moreover, a recycling pipeline 28 further disposed below the rinse unit 24 can recycle excess deionized water from the clean water nozzles 25 during the glass substrate 22 is rinsed.
  • However, the conventional scrubber and the cleaning method thereof cannot remove the organics and oxides on the surface of the metal film of the glass substrate and the formed photoresist patterns still have defects, disconnections and peelings. Therefore, those skilled in the art of photoelectric related industries endeavor to research and develop processes as well as to improve equipment so as to provide a method which can remove the organic and oxide residuals from the surface of the metal film of the glass substrate and solve the problems of the prior art.
    • SUMMARY OF THE INVENTION
  • The primary objective of the present invention is to provide a method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate so as to prevent the coated photoresist patterns from resulting in defects, disconnections and peelings.
  • The second objective of the present invention is to provide an apparatus for cleaning a glass substrate before photoresist coating, which apparatus can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate so as to prevent the coated photoresist patterns from resulting in defects, disconnections and peelings.
  • The cleaning method disclosed in this invention includes the steps of firstly providing an alkaline developer which has tetramethylammonium hydroxide (TMAH) as the main component, in a concentration of between 0.35% and 0.45%; later immersing a metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water in a manner of high pressure spraying in combination with a mega sonic wave; and lastly having the surface of the metal film of the glass substrate in a dry treatment with an air scraper. In the step of immersing, a preferred immersing time is between 30 and 50 seconds considering material and time costs, an appropriate cleaning effect and the other related factors, so as to have a complete reaction of the alkaline developer with the oxides and organics on the surface of the metal film.
  • Furthermore, the cleaning apparatus of this invention comprises a developer nozzle, a set of clean water nozzles, a delivering band, a recycling pipeline and an air scraper, wherein the developer nozzle is connected to a developer supply source through pipelines and provides a developer desired for cleaning the glass substrate; the set of clean water nozzles is connected to a clean water supply source and rinses the glass substrate in a manner of high pressure spraying in combination with a mega sonic wave; the delivering band can carry the glass substrate to first pass the developer nozzle for developer immersing and then to pass the set of clean water nozzles for clean water rinsing; the recycling pipeline can recycle excess liquids during the glass substrate is cleaned; and the air scraper is used to dry the surface of the metal film after completion of rinsing the glass substrate.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • The foregoing aspects and many of the attendant advantages of this invention will become more readily appreciated as the same becomes better understood by reference to the following detailed description, when taken in conjunction with the accompanying drawings, wherein:
  • FIG. 1 is a sectional view of a thin film transistor formed on a glass substrate in the prior art;
  • FIG. 2 is a schematic diagram of a conventional scrubber before a glass substrate is coated with a photoresist;
  • FIG. 3 is a flow chart of a method for cleaning a glass substrate before photoresist coating in accordance with this invention; and
  • FIG. 4 is a schematic diagram of an apparatus for cleaning the glass substrate before photoresist coating in accordance with this invention.
    •  DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
  • The present invention relates to a method and an apparatus for cleaning a glass substrate before photoresist coating, which can remove oxide compounds and organic residues on the surface of a metal layer of the glass substrate. The best mode and the practicing thereof are described below in detail.
  • Referring to FIG. 3, it is a flow chart of the method for cleaning a glass substrate before photoresist coating in accordance with this invention. The steps of the method includes firstly providing an alkaline developer which has tetramethylammonium hydroxide (TMAH) as the main component, in a concentration of between 0.35% and 0.45% (S31); later immersing a metal film of the glass substrate in the alkaline developer for a time of preferably between 30 and 50 seconds so as to have a complete reaction of the alkaline developer with the oxides and organics on the surface of the metal film (S32); then rinsing the metal film of the glass substrate after immersed with clean water in a manner of high pressure spraying in combination with a mega sonic wave (S33); and lastly having the surface of the metal film of the glass substrate in a dry treatment with an air scraper (S34).
  • Further, referring to FIG. 4, it shows a schematic diagram of the apparatus for cleaning the glass substrate before photoresist coating in accordance with this invention. In order to complete the above-mentioned cleaning process and remove the oxide and organic residuals from the glass substrate, the cleaning apparatus of this invention comprises one developer nozzle 41, two clean water nozzles 42, a delivering band 43, a recycling pipeline 44 and an air scraper 45, wherein the developer nozzle 41 and the two clean water nozzles 42 constitute a rinse unit 46, and the delivering band 43 can transport a glass substrate 47 to the rinse unit 46 for rinsing and then transport the glass substrate 47 to the air scraper 45 for drying.
  • In FIG. 4, the developer nozzle 41 is connected to a developer supply source 27 through pipelines and the developer supply source 27 can provide the alkaline developer desired for cleaning the glass substrate 47. The main component of the alkaline developer is a tetramethylammonium hydroxide (TMAH) solution in a concentration of between 0.35% and 0.45%, most preferably 0.4%. The two clean water nozzles 42 are respectively connected to a clean water supply source 49 (which provides such as deionized water) with pipelines and rinse the glass substrate 47 in a manner of high pressure spraying in combination with a mega sonic wave. During transporting the glass substrate 47, the delivering band 43 carries the glass substrate 47 to first pass the developer nozzle 41 for developer immersing about 30 to 50 seconds and then to pass the clean water nozzles 42 for clean water rinsing. Moreover, the recycling pipeline 44 disposed below the rinse unit 46 can recycle excess liquids during the glass substrate 47 is cleaned and separate the recycled liquids so as to reduce environment pollution and resource waste. After the glass substrate 47 is rinsed, it is transported by the delivering band 43 to the air scraper 45 for a dry treatment.
  • As compared with FIG. 2 of the prior art, it is noted that the cleaning apparatus of this invention has one of the clean water nozzles (most preferably the first one) in the prior art connected to a developer supply source with pipelines and provide the desired alkaline developer. Therefore, the improved cleaning apparatus of this invention can achieve the desired cleaning effects and reduce manufacturing costs and resource waste.
  • As is understood by a person skilled in the art, the foregoing preferred embodiment of the present invention is illustrated of the present invention rather than limiting of the present invention. It is intended to cover various modifications and similar arrangements included within the spirit and scope of the appended claims, the scope of which should be accorded the broadest interpretation so as to encompass all such modifications and similar structure.

Claims (10)

1-11. (canceled)
12. An apparatus for cleaning a glass substrate before photoresist coating, wherein a metal film is formed on the surface of said glass substrate, said apparatus comprising:
a developer nozzle, connected with a developer supply source and providing a developer desired for cleaning said glass substrate;
a set of clean water nozzles, connected to a clean water supply source and providing the clean water desired for cleaning said glass substrate; and
a delivering band carrying said glass substrate to first pass said developer nozzle for developer immersing and then to pass said set of clean water nozzles for clean water rinsing.
13. The apparatus of claim 12, further comprising a recycling pipeline for recycling excess liquids during said glass substrate is cleaned.
14. The apparatus of claim 12, wherein said developer is a tetramethylammonium hydroxide (TMAH) solution in a concentration of between 0.35% and 0.45%.
15. The apparatus of claim 14, wherein said developer nozzle sprays said tetramethylammonium hydroxide (TMAH) solution onto the surface of said metal film of said glass substrate.
16. The apparatus of claim 12, wherein said clean water from said clean water supply source is deionized water.
17. The apparatus of claim 12, wherein said clean water nozzles rinse the surface of said metal film of said glass substrate in manner of high pressure spraying.
18. The apparatus of claim 12, wherein said clean water nozzles rinse the surface of said metal film of said glass substrate in combination with a mega sonic wave.
19. The apparatus of claim 12, further comprising an air scraper which is used to dry the surface of said metal film after completion of rinsing said glass substrate.
20. The apparatus of claim 12, wherein said set of clean water nozzles includes at least one clean water nozzle.
US12/081,883 2002-12-20 2008-04-23 Apparatus and method for cleaning a glass substrate before photoresist coating Abandoned US20080196752A1 (en)

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TW91136860 2002-12-20
TW091136860A TW200410912A (en) 2002-12-20 2002-12-20 Method and device for cleaning glass substrate prior to coating of photoresist
US10/414,110 US7402212B2 (en) 2002-12-20 2003-04-16 Apparatus and method for cleaning a glass substrate before photoresist coating
US12/081,883 US20080196752A1 (en) 2002-12-20 2008-04-23 Apparatus and method for cleaning a glass substrate before photoresist coating

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