US20090116145A1 - Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer - Google Patents
Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer Download PDFInfo
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- US20090116145A1 US20090116145A1 US11/982,597 US98259707A US2009116145A1 US 20090116145 A1 US20090116145 A1 US 20090116145A1 US 98259707 A US98259707 A US 98259707A US 2009116145 A1 US2009116145 A1 US 2009116145A1
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Images
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/23—Gap features
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
Definitions
- the invention relates to a PMR writer having a tapered main pole layer and a tapered non-magnetic shaping layer between the main pole layer and an overlying write gap layer to control the effective throat height (TH), and a method for making the same.
- PMR Shield pole perpendicular magnetic recording
- LMR longitudinal magnetic recording
- a PMR head combines the features of a single pole writer and a soft magnetic underlayer to offer a great advantage over LMR in providing higher write field, better read back signal, and potentially much higher areal density.
- a shielded pole head can provide a large head field gradient at the trailing side due to the presence of a trailing shield and substantially improve the write performance.
- FIG. 1 a a prior art shield pole PMR writer 1 is depicted from a side-track view.
- One end of the main pole layer is formed along an air bearing surface 6 that is positioned above a magnetic recording medium 2 .
- the height of the trailing shield also known as throat height (TH) is the distance from the side of the trailing shield along the ABS to the side opposite the ABS and is typically about 0.1 to 0.3 microns.
- the PMR writer moves along the ABS in a negative z direction during a write operation. From a down-track perspective in FIG.
- the main pole layer 3 is comprised of a write pole 3 a that terminates in a pole tip 3 t at the ABS 6 - 6 , and a yoke 3 b that flares outward at an angle ⁇ from the end of the write pole opposite the ABS.
- the end of the write pole 3 a lies along the plane 7 - 7 that is a neck height (NH) distance from the ABS.
- the intersection of the yoke 3 b and write pole 3 a is at the neck 8 .
- TH FIG. 1 a
- a short TH can be very challenging to control during the fabrication process.
- an improved PMR writer design is desired that is more tolerant of short TH dimensions and enables improved writability while minimizing trailing shield saturation and avoiding loss of process control during fabrication.
- the main pole is tapered at the leading side to maintain high trailing field gradients and is shielded on four sides to minimize adjacent track erasure.
- U.S. Patent Application Publication No. 2006/0203395 discloses a perpendicular recording head with a tapered magnetic shield to minimize stray fields at the recording surface.
- the ABS is post-lapped using an ion milling process to produce a recess in the shield away from the ABS at a shallow angle.
- first and second magnetic layers in a magnetic head are progressively widened (tapered) between a zero throat point and a flare point so that the length of the magnetic yoke layers between the aforementioned points is saturated nearly simultaneously to provide a constant write field about a saturation value.
- U.S. Pat. No. 5,173,821 discloses a write/read head wherein a stepped pole tip effectively forms a wide gap when the head operates as a recording head and forms a narrow gap when the head functions as a read head.
- One objective of the present invention is to provide a shield pole PMR writer with a configuration that reduces the amount of trailing shield saturation.
- a second objective of the present invention is to provide a process for fabricating a shield pole PMR writer according to the first objective that includes a means for controlling the effective TH of a trailing shield.
- a tapered main pole layer that has at least one non-magnetic top shaping layer to separate the main pole layer from the write gap layer.
- the main pole layer has a lower rectangular portion disposed on a substrate and a tapered upper portion adjoining the lower portion in which the taper begins at the ABS and extends away from the ABS and the substrate at an angle of about 10 to 80 degrees for a certain distance to form a sloped section of the top surface.
- the top surface of the upper portion also has a flat section that is parallel to the plane of the bottom portion and extends from the end of the sloped section opposite the ABS to the back end of the main pole layer in a direction perpendicular to the ABS.
- the tapered non-magnetic shaping layer has a sloped surface that extends from the end of the tapered section of main pole layer and is coplanar with the tapered section of main pole layer.
- the plane formed by the sloped surface of the top shaping layer and sloped surface of the upper portion of main pole layer extends from the ABS at an angle between 10 and 80 degrees in a direction away from the substrate, and terminates at an end which is a throat height (TH) distance from the ABS.
- the top shaping layer has a top surface that is parallel to the top surface of the flat section of the main pole layer.
- a conformal write gap layer having a constant thickness is formed on the top shaping layer and on the sloped portion of the upper section of main pole layer.
- the write gap layer has a sloped section from the ABS to a TH distance from the ABS and a section parallel to the plane of the substrate that covers the top surface of the top shaping layer.
- the present invention takes advantage of a design where tapering a section of the main pole layer adjacent to the ABS serves to concentrate the magnetic flux and generate a larger write field.
- the top shaping layer is tapered to allow the effective TH of the trailing shield to remain small and to be in good process control.
- the distance (and magnetic reluctance) between the main pole layer and trailing shield is increased to reduce the magnetic flux leakage from the main pole layer to the trailing shield and thereby minimizes saturation of the trailing shield.
- the second embodiment has a tapered main pole layer formed on a substrate as in the first embodiment and there is a first non-magnetic top shaping layer formed on the flat top surface of the main pole layer.
- a second top shaping layer with a rectangular shape that is formed on the top flat surface of the first top shaping layer.
- a conformal write gap layer with an essentially constant thickness is formed on the sloped sections of the main pole layer and first top shaping layer, on the top surface of the second top shaping layer, and along a side of the second top shaping layer that faces the ABS.
- the trailing shield is formed on the write gap layer and along the ABS, and extends over a portion of the write gap layer disposed on the top surface of the second top shaping layer.
- the trailing shield has a length along the ABS that is greater than the combined thicknesses of the first top shaping layer, second top shaping layer, and write gap layer.
- the effective throat height distance is defined as the thickness of the trailing shield between the ABS and the portion of the write gap layer along the side of the second top shaping layer that faces the ABS.
- FIG. 1 a is a cross-track view of a prior art shield pole PMR writer with a flat write gap layer that has a constant thickness on the main pole layer and
- FIG. 1 b is a down-track view of a prior art PMR writer.
- FIG. 2 is cross-track view of a shield pole PMR writer previously designed by the inventors that has a tapered main pole layer and tapered write gap layer.
- FIG. 3 is a cross-track view of a shield pole PMR writer previously designed by the inventors that has a tapered main pole layer and a rectangular top shaping layer on the main pole layer.
- FIG. 4 a is a cross-track view of a PMR writer having a tapered top shaping layer on a tapered main pole layer according to one embodiment of the present invention.
- FIG. 4 b is a cross-track view of a PMR writer having a second top shaping layer formed on a tapered first top shaping layer on a tapered main pole layer according to a second embodiment of the present invention.
- FIGS. 5 a - 5 d are cross-sectional views that depict a sequence of steps for forming a PMR writer according to the first embodiment of the present invention.
- FIGS. 6 a - 6 c are cross-sectional views that depict a sequence of steps for forming a PMR writer according to a second embodiment of the present invention.
- the present invention is shield pole PMR writer having a tapered main pole layer and a tapered top shaping layer for minimizing trailing shield saturation and a method for making the same.
- the exemplary embodiment shows only a portion of the main pole layer proximate to an ABS.
- the present invention anticipates that the PMR writer may be part of a merged read/write head.
- the main pole layer may be comprised of a single piece or have a stitched pole configuration. From a down-track perspective, the main pole layer may have various shapes such as the conventional shape shown in FIG. 1 b or one with curved sides in the yoke as appreciated by those skilled in the art.
- the inventors have previously designed a PMR writer 10 with a tapered main pole layer II and a tapered write gap layer that is conformally laid on an upper portion 11 b of the main pole layer.
- the write gap layer is comprised of a sloped section 12 a adjacent to the ABS 14 - 14 and a flat section 12 b formed parallel to the bottom surface 11 d of the main pole layer, and has a constant thickness e also known as the WG thickness.
- a bottom portion 11 a of the main pole layer 11 is disposed on a substrate (not shown) which may be an insulating layer, for example, and terminates at a pole tip 11 t at the ABS 14 - 14 .
- the trailing shield 13 having a thickness TH (perpendicular to the ABS) on the sloped section 12 a and over a portion of the flat section 12 b of the write gap layer.
- the sloped section 12 a is tapered at an angle ⁇ of about 10 to 80 degrees with respect to the ABS 14 - 14 and extends from the ABS in a direction away from the bottom surface 11 d .
- One end of the sloped section 12 a terminates at a distance s of about 0.05 to 0.30 microns from the ABS.
- the trailing shield 13 has a length m along the ABS that is greater than the combined thicknesses of the write gap layer 12 b and upper portion 11 b of the main pole layer.
- FIG. 3 another PMR writer design previously designed but not published by the inventors is shown and combines the features of the structure in FIG. 2 with a non-magnetic top shaping layer 15 having a thickness f formed between the upper portion 11 b of the tapered main pole layer and a section 12 c of the write gap layer to further improve writability.
- the top shaping layer 15 is essentially rectangular in shape and is formed only on a flat surface 11 c of the main pole layer that is parallel to the bottom surface 11 d .
- the write gap layer is comprised of a section 12 a formed on the tapered surface 11 s of the main pole layer 11 , a section 12 b formed on an end of the top shaping layer 15 that faces the ABS, and a section 12 c formed on the upper surface of the top shaping layer which is parallel to the plane of the substrate and bottom surface 11 d .
- the effective TH of the trailing edge 13 e is shown as the distance s and is defined as the thickness of the trailing shield 13 between write gap section 12 b and the ABS 14 - 14 .
- the effective TH thickness of the trailing shield can remain small as desired in advanced PMR writers while the thickness k of the trailing shield above the write gap layer 12 c can be thicker than s and thereby allows a wider process window for processing steps including back end steps.
- this design may have issues with saturation of the trailing shield 15 due to the trailing shield's close proximity to the main pole layer 11 .
- additional modification of the tapered main pole layer design shown in FIGS. 2 and 3 is desirable.
- the inventors have discovered that the performance of a shield pole PMR writer may be further improved by addition of a tapered top shaping layer to the designs originally proposed in FIGS. 2 and 3 .
- a main pole layer 21 with a bottom surface 21 d formed on a substrate is comprised of a lower rectangular portion 21 a having a pole tip 21 t at an ABS 25 - 25 , and a tapered upper portion 21 b which adjoins the lower rectangular portion and has a flat upper surface 21 c that is parallel to the bottom surface 21 d .
- the tapered upper portion 21 b has a sloped surface 21 s that begins at the ABS and extends away from the lower rectangular portion 21 a at an angle ⁇ of about 10 to 80 degrees with respect to the ABS 25 - 25 .
- the sloped surface 21 s has one end at the ABS and a second end at a position where the sloped surface 21 s intersects the flat upper surface 21 c .
- a non-magnetic tapered top shaping layer 22 made of Al 2 O 3 , Ru, or the like having a thickness from 0 to 0.3 microns that is formed on the flat upper surface 21 c of the tapered upper portion 21 b of the main pole layer 21 . It should be understood that the main pole layer 21 and tapered top shaping layer 22 extend in the “x” direction perpendicular to the ABS for up to 5 to 20 microns before terminating at the back end (not shown) of the main pole layer.
- the tapered top shaping layer 22 has a sloped surface 22 s which is an extension of the sloped surface 21 s .
- the sloped surface 22 s begins at the end of the sloped surface 21 s opposite the ABS and continues to a second end that is a distance of 0.1 to 0.3 microns from the ABS 25 - 25 .
- the sloped surface 21 s and sloped surface 22 s form a plane that faces the ABS at an angle between 10 and 80 degrees.
- the point where the sloped surface 22 s adjoins the sloped surface 21 s is recessed about 0.05 to 0.20 microns from the ABS 25 - 25 and this recess represents the effective throat height distance.
- the tapered top shaping layer 22 also has a flat upper surface 22 c that is parallel to the flat upper surface 21 c of the main pole layer 21 .
- a conformal write gap layer comprised of a sloped section 23 a with a surface 23 s formed on the sloped surfaces 21 s , 22 s , and a section 23 d on the flat upper surface 22 c .
- the sloped section 23 a has an end along the ABS and adjoins section 23 d at a distance of 0.1 to 0.3 microns from the ABS 25 - 25 .
- the write gap layer may be a non-magnetic material such as Al 2 O 3 or the like and has a thickness from 0.02 to 0.08 microns.
- a trailing shield 24 that may be comprised of a high Bs magnetic material such as Fe, Co, Ni, FeNi, CoFe, or alloys thereof.
- the main pole layer 21 may also be comprised of the same high Bs magnetic material.
- the trailing shield has a first side along the ABS 25 - 25 with a length n and a second side opposite and parallel to the ABS with a length w that is less than n. The distance between the first and second sides is the TH distance.
- the second side opposite the ABS has one end at the intersection of the sloped section 23 a and section 23 d of the write gap layer.
- a sloped side of the trailing shield 24 disposed on the sloped surface 23 s of the write gap layer which is formed at an angle ⁇ with respect to the ABS.
- a fourth side 24 a of the trailing shield opposite the sloped surface 23 s is preferably aligned perpendicular to the ABS 25 - 25 .
- the PMR writer 20 has an advantage over the structure shown in FIG. 2 in that the flat upper surface 21 c of the main pole layer 21 is a greater distance from the trailing shield 24 than the upper surface 11 c is from trailing shield 14 . As a result, there is less magnetic flux leakage from the main pole layer 21 to the trailing shield 24 in PMR writer 20 which means saturation of the trailing shield 24 will be reduced.
- a second embodiment of the present invention is depicted as a PMR writer 30 that represents a modification of the PMR writer structure in FIG. 3 .
- a tapered top shaping layer 22 is inserted between a rectangular top shaping layer 26 and the top surface 21 c of the main pole layer 21 .
- the main pole layer 21 has the same configuration as described previously with respect to FIG. 4 a .
- the plane formed by sloped surface 21 s and sloped surface 22 s is formed at an angle ⁇ with respect to the ABS similar to FIG. 4 a , but terminates at an end which is less than the length of side 24 a from the ABS 25 - 25 .
- the sloped surface 22 s may terminate at an end that intersects top surface 22 c which is from about 0.5 to 0.30 microns from the ABS.
- a second non-magnetic top shaping layer 26 that has a thickness from 0 to 0.5 microns.
- the second non-magnetic top shaping layer 26 may be comprised of the same material as in the tapered first non-magnetic top shaping layer 22 .
- the second non-magnetic top shaping layer 26 has a bottom surface that is coincident with top surface 22 c and has a flat top surface 26 c which terminates at a first end which is parallel to the ABS and is recessed the same distance from the ABS 25 - 25 as the intersection of sloped surface 22 s and top surface 22 c .
- a second end of the second non-magnetic top shaping layer 26 is at the back end (not shown) of the main pole layer 21 .
- a conformal write gap layer having a thickness from 0.02 to 0.08 comprised of a sloped section 23 a on the sloped surfaces 21 s , 22 s , a section 23 b formed on the first end of the second non-magnetic top shaping layer 26 that faces the ABS 25 - 25 , and a section 23 d which covers the flat upper surface 26 c .
- the sloped section 23 a has an end along the ABS and a second end that adjoins one end of section 23 b .
- the section 23 b has a surface 23 p facing the ABS which is a distance v from the ABS 25 - 25 .
- the distance v represents the effective TH distance and is preferably about 0.05 to 0.3 microns.
- a trailing shield 24 has a first side that is coincident with the surface 23 s of the sloped section 23 a , and a second side 24 b formed along the ABS 25 - 25 .
- the trailing shield 24 has a third side 24 a opposite the surface 23 s and preferably aligned perpendicular to the ABS.
- Fourth side 24 c is parallel to the ABS and has a length g which is less than the length of side 24 b .
- Fourth side 24 c intersects write gap layer section 23 d at a distance r of about 0.1 to 0.5 microns from the ABS 25 - 25 .
- a fifth side 24 d of the trailing shield extends from an end of fourth side 24 c at section 23 d and terminates at surface 23 p of section 23 b .
- a sixth side of the trailing shield 24 is coincident with surface 23 p of section 23 b.
- the PMR writer 30 has an advantage over the structure shown in FIG. 3 in that the main pole layer 21 is a greater distance from the trailing shield 24 than the main pole layer 11 is from trailing shield 14 . As a result, there is less magnetic flux leakage from: the main pole layer 21 to the trailing shield 24 in PMR writer 30 which means saturation of the trailing shield 24 will be reduced. Similar to the structure in FIG. 3 , the rectangular top shaping layer is advantageously used to control the effective TH distance. Therefore, the effective TH distance or “v” can be small and be in good process control while the thickness of the trailing shield or “r” may be thick and thereby offers a better process window for back end fabrication schemes. Referring to FIGS.
- the main pole layer 21 is deposited on a substrate (not shown) that may be an insulation layer in a merged read/write head as appreciated by those skilled in the art. Note that the bottom surface 21 d is coincident with the top surface of the substrate.
- the main pole layer 21 may be formed by an electroplating or sputter deposition method. In one embodiment, a mold or opening having the shape of the intended main pole layer is formed within a second insulation layer (not shown) disposed on the substrate.
- the main pole layer is then deposited to fill the opening and is subsequently planarized such that the top surface has a uniform thickness and is coplanar with the top surface of the second insulation layer.
- the main pole layer material may be electroplated or sputter deposited on a substrate and then patterned in the shape of a main pole layer by a well known photoresist patterning and etching sequence. Thereafter, the photoresist is removed and the second insulation layer is deposited on the main pole layer and on exposed portions of the substrate. Then a chemical mechanical polish (CMP) step may be performed to planarize the second insulation layer to become coplanar with the main pole layer 21 .
- CMP chemical mechanical polish
- the next step is to deposit the non-magnetic top shaping layer 22 having a thickness from 0 to about 0.3 microns on the main pole layer 21 by a sputter deposition process, for example.
- All sputter deposition steps during the fabrication of PMR writer 20 may be performed in a single mainframe such as an Anelva C-7100 sputter deposition system which includes ultra high vacuum DC magnetron sputter chambers with multiple targets and at least one oxidation chamber.
- the sputter deposition process involves an argon sputter gas and a base pressure between 5 ⁇ 10 ⁇ 8 and 5 ⁇ 10 ⁇ 9 torr. A lower pressure enables more uniform films to be deposited.
- a photoresist layer 50 is coated on the non-magnetic top shaping layer 22 and is patterned to cover a region that will become the top surface 22 c in the PMR writer 20 .
- the photoresist layer 50 is shown recessed the same distance a from a plane 28 - 28 as the intended end of sloped surface 22 s , the photoresist layer 50 may optionally be recessed a greater distance than a.
- an ion beam etch (IBE) step is performed that is directed an angle toward the photoresist layer 50 and non-magnetic top shaping layer 22 .
- the etch process continues until the sloped surface 22 s and sloped surface 21 s are generated to produce a tapered top shaping layer 22 and a tapered main pole layer 21 , respectively.
- the sloped surfaces 21 s , 22 s form a plane that is oriented away from the bottom surface 21 d and at an angle ⁇ of about 10 to 80 degrees with respect to a plane 28 - 28 that is oriented perpendicular to the bottom surface.
- the distance a between the patterned photoresist layer 50 and the plane 28 - 28 should be greater than the intended TH distance since a lapping process later in the fabrication sequence will remove a portion of the main pole layer 21 adjacent to plane 28 - 28 and thereby form an ABS 25 - 25 as depicted in FIG. 4 a.
- the photoresist layer 50 is stripped by a conventional method such as oxygen ashing and then the write gap layer comprised of a sloped section 23 a and section 23 d is deposited by a physical vapor deposition (PVD) method or chemical vapor deposition (CVD) process, for example.
- the write gap layer may be made of Al 2 O 3 or another non-magnetic material such as Ru and is deposited by a process that yields a conformal write gap layer having an essentially constant thickness in sections 23 a , 23 d .
- section 23 a is formed at an angle ⁇ with respect to the plane 28 - 28 that is perpendicular to the bottom surface 21 d and has an end adjoining section 23 d which is a distance a from the plane 28 - 28 .
- a photoresist layer 51 is coated on the write gap layer and patterned to cover section 23 d of the write gap layer. Section 23 a is uncovered by the photoresist patterning step.
- the shield layer 24 is deposited on section 23 a by a electroplating or sputter deposition process. Typically, a seed layer (not shown) is deposited on section 23 a before the shield layer 24 is formed in order to assist the electroplating process.
- a CMP step may be employed to planarize the shield layer 24 and form the end 24 a of the trailing shield shown in FIG. 4 a .
- the photoresist layer 51 is then removed by a conventional method.
- ABS 25 - 25 depicted in FIG. 4 a is formed between the plane 28 - 28 and the non-magnetic top shaping layer 22 and is substantially perpendicular to the substrate. It should be understood that a plurality of PMR writers 20 may be formed simultaneously in rows and columns on a substrate and later separated from each other by a process that dices the wafer into chips.
- FIGS. 6 a - 6 c a sequence of steps is depicted for fabricating the PMR writer 30 of the second embodiment.
- a main pole layer 21 and a first top shaping layer 22 are sequentially deposited on a substrate as described with respect to FIG. 5 a in the first embodiment.
- a second non-magnetic top shaping layer 26 is deposited on the first top shaping layer 22 and may be a single non-magnetic layer or a composite having a plurality of non-magnetic layers.
- a photoresist layer 52 is patterned on the second non-magnetic top shaping layer 26 to generate an opening 29 having a width b between a plane 28 - 28 and the photoresist layer 52 .
- An etching step that may be a reactive ion etch (RIE) process is used to transfer the opening 29 through the second non-magnetic top shaping layer 26 and thereby form an end 26 e parallel to the plane 28 - 28 .
- the opening 29 in the second non-magnetic top shaping layer 26 preferably has a width b.
- the patterned photoresist layer 52 defines the top surface 26 c ( FIG. 6 b ) of the second non-magnetic top shaping layer 26 in the PMR writer 30 and is removed after the RIE step is complete. Note that the location of the ABS will be determined by a lapping process in a later step and the ABS 25 - 25 ( FIG. 4 b ) will be positioned between the plane 28 - 28 and the non-magnetic top shaping layer 26 .
- a second etch step that may be an IBE process is performed at an oblique angle with respect to the plane 28 - 28 to form a tapered upper portion 21 b of the main pole layer 21 and a tapered first non-magnetic top shaping layer 22 .
- the second etch is preferably performed after a photoresist layer (not shown) is coated on the non-magnetic top shaping layer 26 and then patterned as understood by those skilled in the art.
- the taper angle is 10 to 80 degrees similar to angle ⁇ in the first embodiment.
- a sloped surface 21 s is formed on the upper portion 21 b of the main pole layer and a sloped surface 22 s is formed on the first non-magnetic top shaping layer 22 below opening 29 .
- the patterned photoresist layer used for the IBE process may then be removed.
- the write gap layer comprised of sloped section 23 a , section 23 b , and section 23 d is conformally laid down on the sloped surfaces 21 s , 22 s , and on the top surface 26 c of the second non-magnetic top shaping layer 26 with a thickness that is essentially constant in sections 23 a , 23 b , and 23 d .
- Sloped section 23 a is formed on the sloped surfaces 21 s , 22 s while section 23 b adjoins the end 26 e , and section 23 d is disposed on top surface 26 c .
- the write gap layer may be made of Al 2 O 3 or Ru as mentioned previously and may be deposited by a PVD or CVD method, for example.
- the opening 29 now has a width v 1 that is less than the width b ( FIG. 6 a ) because of the additional write gap layer.
- the section 23 b facing the plane 28 - 28 reduces the width of the opening 29 .
- the width v 1 is greater than the effective TH distance v that separates ABS 25 - 25 and write gap layer section 23 b in the completed PMR writer 30 .
- a photoresist layer 53 is coated and patterned on the write gap layer to form an opening 31 above opening 29 .
- Opening 31 has a width r 1 (greater than r in FIG. 4 b ) and uncovers a portion of the write gap layer section 23 d adjacent to section 23 b .
- the openings 29 and 31 define the shape of the trailing shield which is preferably deposited by an electroplating process in the openings in the following step.
- the photoresist layer 53 is removed and an insulation layer (not shown) may be deposited on the trailing shield and on section 23 d of the write gap layer. Thereafter, a CMP process may be used to planarize the trailing shield 24 to form the end 24 a ( FIG.
- both embodiments provide an advantage over existing PMR writers in that saturation of the trailing shield is minimized by the designs described herein that include a tapered main pole layer and a tapered top shaping layer. Furthermore, the tapered main pole layer and tapered top shaping layer enable the effective TH to be small while the bulk of the trailing shield is larger and thereby allows a larger process window during back end fabrication steps such as the CMP step that planarizes the trailing shield and adjacent insulation layer.
Abstract
Description
- This application is related to the following: Docket # HT07-008, Ser. No. 11/812,757, filing date Jun. 21, 2007, assigned to a common assignee, and which is herein incorporated by reference in its entirety.
- The invention relates to a PMR writer having a tapered main pole layer and a tapered non-magnetic shaping layer between the main pole layer and an overlying write gap layer to control the effective throat height (TH), and a method for making the same.
- Shield pole perpendicular magnetic recording (PMR) writers are commonly used in current PMR (hard disk drive) HDD products. PMR writers have become the mainstream technology for disk drive applications beyond 200 Gbit/in2, replacing longitudinal magnetic recording (LMR) devices. Due to the continuing reduction of transducer size, high moment soft magnetic thin films with a Bs above 22 kG are required for write head applications. A PMR head combines the features of a single pole writer and a soft magnetic underlayer to offer a great advantage over LMR in providing higher write field, better read back signal, and potentially much higher areal density. In particular, a shielded pole head can provide a large head field gradient at the trailing side due to the presence of a trailing shield and substantially improve the write performance.
- Referring to
FIG. 1 a, a prior art shieldpole PMR writer 1 is depicted from a side-track view. There is an essentially flatwrite gap layer 4 which separates a main pole layer 3 and atrailing shield 5 by a constant (WG) thickness. One end of the main pole layer is formed along an air bearingsurface 6 that is positioned above amagnetic recording medium 2. The height of the trailing shield also known as throat height (TH) is the distance from the side of the trailing shield along the ABS to the side opposite the ABS and is typically about 0.1 to 0.3 microns. The PMR writer moves along the ABS in a negative z direction during a write operation. From a down-track perspective inFIG. 1 b, the main pole layer 3 is comprised of awrite pole 3 a that terminates in apole tip 3 t at the ABS 6-6, and a yoke 3 b that flares outward at an angle θ from the end of the write pole opposite the ABS. The end of thewrite pole 3 a lies along the plane 7-7 that is a neck height (NH) distance from the ABS. The intersection of the yoke 3 b and writepole 3 a is at theneck 8. In order to optimize both write field gradient and write field magnitude, TH (FIG. 1 a) is preferably short. However, in prior art PMR writer structures, a short TH can be very challenging to control during the fabrication process. Furthermore, if the TH becomes too small, saturation of the trailing shield and degradation of the signal-to-noise ratio (SNR) may occur. Therefore, an improved PMR writer design is desired that is more tolerant of short TH dimensions and enables improved writability while minimizing trailing shield saturation and avoiding loss of process control during fabrication. - A routine search of the prior art revealed the following references. In U.S. Patent Application Publication No. 2005/0219743, a single pole vertical write head is described having a trailing shield tapered to the same angle as the main pole with a constant write gap thickness between the trailing shield and main pole.
- In U.S. Patent Application Publication No. 2005/0237665, the main pole is tapered at the leading side to maintain high trailing field gradients and is shielded on four sides to minimize adjacent track erasure.
- U.S. Patent Application Publication No. 2006/0203395 discloses a perpendicular recording head with a tapered magnetic shield to minimize stray fields at the recording surface. The ABS is post-lapped using an ion milling process to produce a recess in the shield away from the ABS at a shallow angle.
- In U.S. Pat. No. 5,600,519, first and second magnetic layers in a magnetic head are progressively widened (tapered) between a zero throat point and a flare point so that the length of the magnetic yoke layers between the aforementioned points is saturated nearly simultaneously to provide a constant write field about a saturation value.
- U.S. Pat. No. 5,173,821 discloses a write/read head wherein a stepped pole tip effectively forms a wide gap when the head operates as a recording head and forms a narrow gap when the head functions as a read head.
- One objective of the present invention is to provide a shield pole PMR writer with a configuration that reduces the amount of trailing shield saturation.
- A second objective of the present invention is to provide a process for fabricating a shield pole PMR writer according to the first objective that includes a means for controlling the effective TH of a trailing shield.
- According to the present invention, these objectives are achieved by a tapered main pole layer that has at least one non-magnetic top shaping layer to separate the main pole layer from the write gap layer. In one embodiment, from a cross-track view, the main pole layer has a lower rectangular portion disposed on a substrate and a tapered upper portion adjoining the lower portion in which the taper begins at the ABS and extends away from the ABS and the substrate at an angle of about 10 to 80 degrees for a certain distance to form a sloped section of the top surface. The top surface of the upper portion also has a flat section that is parallel to the plane of the bottom portion and extends from the end of the sloped section opposite the ABS to the back end of the main pole layer in a direction perpendicular to the ABS. Above the tapered main pole layer is a tapered non-magnetic top shaping layer having a bottom surface that coincides with the flat section of top surface in the upper portion of the main pole layer. The tapered non-magnetic shaping layer has a sloped surface that extends from the end of the tapered section of main pole layer and is coplanar with the tapered section of main pole layer. Thus, the plane formed by the sloped surface of the top shaping layer and sloped surface of the upper portion of main pole layer extends from the ABS at an angle between 10 and 80 degrees in a direction away from the substrate, and terminates at an end which is a throat height (TH) distance from the ABS. The top shaping layer has a top surface that is parallel to the top surface of the flat section of the main pole layer. A conformal write gap layer having a constant thickness is formed on the top shaping layer and on the sloped portion of the upper section of main pole layer. In other words, the write gap layer has a sloped section from the ABS to a TH distance from the ABS and a section parallel to the plane of the substrate that covers the top surface of the top shaping layer. There is a trailing shield formed on the sloped section of the write gap layer that has a TH thickness and a length along the ABS which is greater than the combined thicknesses of the top shaping layer and write gap layer.
- The present invention takes advantage of a design where tapering a section of the main pole layer adjacent to the ABS serves to concentrate the magnetic flux and generate a larger write field. The top shaping layer is tapered to allow the effective TH of the trailing shield to remain small and to be in good process control. In a second embodiment, the distance (and magnetic reluctance) between the main pole layer and trailing shield is increased to reduce the magnetic flux leakage from the main pole layer to the trailing shield and thereby minimizes saturation of the trailing shield.
- The second embodiment has a tapered main pole layer formed on a substrate as in the first embodiment and there is a first non-magnetic top shaping layer formed on the flat top surface of the main pole layer. In addition, there is a second top shaping layer with a rectangular shape that is formed on the top flat surface of the first top shaping layer. A conformal write gap layer with an essentially constant thickness is formed on the sloped sections of the main pole layer and first top shaping layer, on the top surface of the second top shaping layer, and along a side of the second top shaping layer that faces the ABS. The trailing shield is formed on the write gap layer and along the ABS, and extends over a portion of the write gap layer disposed on the top surface of the second top shaping layer. The trailing shield has a length along the ABS that is greater than the combined thicknesses of the first top shaping layer, second top shaping layer, and write gap layer. The effective throat height distance is defined as the thickness of the trailing shield between the ABS and the portion of the write gap layer along the side of the second top shaping layer that faces the ABS.
-
FIG. 1 a is a cross-track view of a prior art shield pole PMR writer with a flat write gap layer that has a constant thickness on the main pole layer andFIG. 1 b is a down-track view of a prior art PMR writer. -
FIG. 2 is cross-track view of a shield pole PMR writer previously designed by the inventors that has a tapered main pole layer and tapered write gap layer. -
FIG. 3 is a cross-track view of a shield pole PMR writer previously designed by the inventors that has a tapered main pole layer and a rectangular top shaping layer on the main pole layer. -
FIG. 4 a is a cross-track view of a PMR writer having a tapered top shaping layer on a tapered main pole layer according to one embodiment of the present invention. -
FIG. 4 b is a cross-track view of a PMR writer having a second top shaping layer formed on a tapered first top shaping layer on a tapered main pole layer according to a second embodiment of the present invention. -
FIGS. 5 a-5 d are cross-sectional views that depict a sequence of steps for forming a PMR writer according to the first embodiment of the present invention. -
FIGS. 6 a-6 c are cross-sectional views that depict a sequence of steps for forming a PMR writer according to a second embodiment of the present invention. - The present invention is shield pole PMR writer having a tapered main pole layer and a tapered top shaping layer for minimizing trailing shield saturation and a method for making the same. The exemplary embodiment shows only a portion of the main pole layer proximate to an ABS. The present invention anticipates that the PMR writer may be part of a merged read/write head. Furthermore, the main pole layer may be comprised of a single piece or have a stitched pole configuration. From a down-track perspective, the main pole layer may have various shapes such as the conventional shape shown in
FIG. 1 b or one with curved sides in the yoke as appreciated by those skilled in the art. - Referring to
FIG. 2 , the inventors have previously designed aPMR writer 10 with a tapered main pole layer II and a tapered write gap layer that is conformally laid on an upper portion 11 b of the main pole layer. The write gap layer is comprised of a slopedsection 12 a adjacent to the ABS 14-14 and a flat section 12 b formed parallel to thebottom surface 11 d of the main pole layer, and has a constant thickness e also known as the WG thickness. Abottom portion 11 a of themain pole layer 11 is disposed on a substrate (not shown) which may be an insulating layer, for example, and terminates at apole tip 11 t at the ABS 14-14. There is a trailingshield 13 having a thickness TH (perpendicular to the ABS) on the slopedsection 12 a and over a portion of the flat section 12 b of the write gap layer. The slopedsection 12 a is tapered at an angle α of about 10 to 80 degrees with respect to the ABS 14-14 and extends from the ABS in a direction away from thebottom surface 11 d. One end of the slopedsection 12 a terminates at a distance s of about 0.05 to 0.30 microns from the ABS. The trailingshield 13 has a length m along the ABS that is greater than the combined thicknesses of the write gap layer 12 b and upper portion 11 b of the main pole layer. By forming a taperedmain pole layer 11, magnetic flux will be concentrated at the ABS and a larger write field can be expected. - Referring to
FIG. 3 , another PMR writer design previously designed but not published by the inventors is shown and combines the features of the structure inFIG. 2 with a non-magnetictop shaping layer 15 having a thickness f formed between the upper portion 11 b of the tapered main pole layer and asection 12 c of the write gap layer to further improve writability. In this example, thetop shaping layer 15 is essentially rectangular in shape and is formed only on aflat surface 11 c of the main pole layer that is parallel to thebottom surface 11 d. The write gap layer is comprised of asection 12 a formed on the taperedsurface 11 s of themain pole layer 11, a section 12 b formed on an end of thetop shaping layer 15 that faces the ABS, and asection 12 c formed on the upper surface of the top shaping layer which is parallel to the plane of the substrate andbottom surface 11 d. The effective TH of the trailingedge 13 e is shown as the distance s and is defined as the thickness of the trailingshield 13 between write gap section 12 b and the ABS 14-14. Thus, the effective TH thickness of the trailing shield can remain small as desired in advanced PMR writers while the thickness k of the trailing shield above thewrite gap layer 12 c can be thicker than s and thereby allows a wider process window for processing steps including back end steps. However, when the effective TH or “s” dimension becomes too thin, this design may have issues with saturation of the trailingshield 15 due to the trailing shield's close proximity to themain pole layer 11. As a result, additional modification of the tapered main pole layer design shown inFIGS. 2 and 3 is desirable. - The inventors have discovered that the performance of a shield pole PMR writer may be further improved by addition of a tapered top shaping layer to the designs originally proposed in
FIGS. 2 and 3 . - Referring to
FIG. 4 a, a first embodiment of the present invention is depicted as aPMR writer 20 that represents a modification of the PMR writer structure inFIG. 2 . Amain pole layer 21 with abottom surface 21 d formed on a substrate (not shown) is comprised of a lowerrectangular portion 21 a having apole tip 21 t at an ABS 25-25, and a taperedupper portion 21 b which adjoins the lower rectangular portion and has a flatupper surface 21 c that is parallel to thebottom surface 21 d. The taperedupper portion 21 b has a slopedsurface 21 s that begins at the ABS and extends away from the lowerrectangular portion 21 a at an angle θ of about 10 to 80 degrees with respect to the ABS 25-25. In other words, the slopedsurface 21 s has one end at the ABS and a second end at a position where the slopedsurface 21 s intersects the flatupper surface 21 c. There is a non-magnetic taperedtop shaping layer 22 made of Al2O3, Ru, or the like having a thickness from 0 to 0.3 microns that is formed on the flatupper surface 21 c of the taperedupper portion 21 b of themain pole layer 21. It should be understood that themain pole layer 21 and taperedtop shaping layer 22 extend in the “x” direction perpendicular to the ABS for up to 5 to 20 microns before terminating at the back end (not shown) of the main pole layer. The taperedtop shaping layer 22 has a slopedsurface 22 s which is an extension of the slopedsurface 21 s. The slopedsurface 22 s begins at the end of the slopedsurface 21 s opposite the ABS and continues to a second end that is a distance of 0.1 to 0.3 microns from the ABS 25-25. Thus, the slopedsurface 21 s and slopedsurface 22 s form a plane that faces the ABS at an angle between 10 and 80 degrees. The point where the slopedsurface 22 s adjoins the slopedsurface 21 s is recessed about 0.05 to 0.20 microns from the ABS 25-25 and this recess represents the effective throat height distance. The taperedtop shaping layer 22 also has a flatupper surface 22 c that is parallel to the flatupper surface 21 c of themain pole layer 21. - Another feature of the first embodiment is a conformal write gap layer comprised of a sloped
section 23 a with asurface 23 s formed on thesloped surfaces section 23 d on the flatupper surface 22 c. The slopedsection 23 a has an end along the ABS and adjoinssection 23 d at a distance of 0.1 to 0.3 microns from the ABS 25-25. The write gap layer may be a non-magnetic material such as Al2O3 or the like and has a thickness from 0.02 to 0.08 microns. Above the slopedsection 23 a of the write gap layer is a trailingshield 24 that may be comprised of a high Bs magnetic material such as Fe, Co, Ni, FeNi, CoFe, or alloys thereof. Themain pole layer 21 may also be comprised of the same high Bs magnetic material. The trailing shield has a first side along the ABS 25-25 with a length n and a second side opposite and parallel to the ABS with a length w that is less than n. The distance between the first and second sides is the TH distance. The second side opposite the ABS has one end at the intersection of the slopedsection 23 a andsection 23 d of the write gap layer. There is a sloped side of the trailingshield 24 disposed on the slopedsurface 23 s of the write gap layer which is formed at an angle θ with respect to the ABS. Afourth side 24 a of the trailing shield opposite the slopedsurface 23 s is preferably aligned perpendicular to the ABS 25-25. - The
PMR writer 20 has an advantage over the structure shown inFIG. 2 in that the flatupper surface 21 c of themain pole layer 21 is a greater distance from the trailingshield 24 than theupper surface 11 c is from trailingshield 14. As a result, there is less magnetic flux leakage from themain pole layer 21 to the trailingshield 24 inPMR writer 20 which means saturation of the trailingshield 24 will be reduced. - Referring to
FIG. 4 b, a second embodiment of the present invention is depicted as aPMR writer 30 that represents a modification of the PMR writer structure inFIG. 3 . In particular, a taperedtop shaping layer 22 is inserted between a rectangulartop shaping layer 26 and thetop surface 21 c of themain pole layer 21. Themain pole layer 21 has the same configuration as described previously with respect toFIG. 4 a. Furthermore, the plane formed by slopedsurface 21 s and slopedsurface 22 s is formed at an angle β with respect to the ABS similar toFIG. 4 a, but terminates at an end which is less than the length ofside 24 a from the ABS 25-25. As in the first embodiment, the slopedsurface 22 s may terminate at an end that intersectstop surface 22 c which is from about 0.5 to 0.30 microns from the ABS. - Above the flat
upper surface 22 c of the tapered first non-magnetic top shaping layer is a second non-magnetictop shaping layer 26 that has a thickness from 0 to 0.5 microns. The second non-magnetictop shaping layer 26 may be comprised of the same material as in the tapered first non-magnetictop shaping layer 22. The second non-magnetictop shaping layer 26 has a bottom surface that is coincident withtop surface 22 c and has a flattop surface 26 c which terminates at a first end which is parallel to the ABS and is recessed the same distance from the ABS 25-25 as the intersection of slopedsurface 22 s andtop surface 22 c. A second end of the second non-magnetictop shaping layer 26 is at the back end (not shown) of themain pole layer 21. - There is a conformal write gap layer having a thickness from 0.02 to 0.08 comprised of a sloped
section 23 a on thesloped surfaces top shaping layer 26 that faces the ABS 25-25, and asection 23 d which covers the flatupper surface 26 c. The slopedsection 23 a has an end along the ABS and a second end that adjoins one end of section 23 b. Note that the section 23 b has asurface 23 p facing the ABS which is a distance v from the ABS 25-25. The distance v represents the effective TH distance and is preferably about 0.05 to 0.3 microns. - A trailing
shield 24 has a first side that is coincident with thesurface 23 s of the slopedsection 23 a, and a second side 24 b formed along the ABS 25-25. The trailingshield 24 has athird side 24 a opposite thesurface 23 s and preferably aligned perpendicular to the ABS. There is afourth side 24 c of the trailing shield that connects an end of theside 24 a opposite the ABS to the writegap layer section 23 d.Fourth side 24 c is parallel to the ABS and has a length g which is less than the length of side 24 b.Fourth side 24 c intersects writegap layer section 23 d at a distance r of about 0.1 to 0.5 microns from the ABS 25-25. Afifth side 24 d of the trailing shield extends from an end offourth side 24 c atsection 23 d and terminates atsurface 23 p of section 23 b. A sixth side of the trailingshield 24 is coincident withsurface 23 p of section 23 b. - The
PMR writer 30 has an advantage over the structure shown inFIG. 3 in that themain pole layer 21 is a greater distance from the trailingshield 24 than themain pole layer 11 is from trailingshield 14. As a result, there is less magnetic flux leakage from: themain pole layer 21 to the trailingshield 24 inPMR writer 30 which means saturation of the trailingshield 24 will be reduced. Similar to the structure inFIG. 3 , the rectangular top shaping layer is advantageously used to control the effective TH distance. Therefore, the effective TH distance or “v” can be small and be in good process control while the thickness of the trailing shield or “r” may be thick and thereby offers a better process window for back end fabrication schemes. Referring toFIGS. 5 a-5 d, a sequence of steps is depicted for fabricating thePMR writer 20 of the first embodiment. InFIG. 5 a, themain pole layer 21 is deposited on a substrate (not shown) that may be an insulation layer in a merged read/write head as appreciated by those skilled in the art. Note that thebottom surface 21 d is coincident with the top surface of the substrate. Themain pole layer 21 may be formed by an electroplating or sputter deposition method. In one embodiment, a mold or opening having the shape of the intended main pole layer is formed within a second insulation layer (not shown) disposed on the substrate. The main pole layer is then deposited to fill the opening and is subsequently planarized such that the top surface has a uniform thickness and is coplanar with the top surface of the second insulation layer. Optionally, the main pole layer material may be electroplated or sputter deposited on a substrate and then patterned in the shape of a main pole layer by a well known photoresist patterning and etching sequence. Thereafter, the photoresist is removed and the second insulation layer is deposited on the main pole layer and on exposed portions of the substrate. Then a chemical mechanical polish (CMP) step may be performed to planarize the second insulation layer to become coplanar with themain pole layer 21. The ABS plane 25-25 is not shown because it is not formed until later in the fabrication sequence after the entire stack of layers in thePMR writer 20 is built. - The next step is to deposit the non-magnetic
top shaping layer 22 having a thickness from 0 to about 0.3 microns on themain pole layer 21 by a sputter deposition process, for example. All sputter deposition steps during the fabrication ofPMR writer 20 may be performed in a single mainframe such as an Anelva C-7100 sputter deposition system which includes ultra high vacuum DC magnetron sputter chambers with multiple targets and at least one oxidation chamber. Typically, the sputter deposition process involves an argon sputter gas and a base pressure between 5×10−8 and 5×10−9 torr. A lower pressure enables more uniform films to be deposited. - Referring to
FIG. 5 b, aphotoresist layer 50 is coated on the non-magnetictop shaping layer 22 and is patterned to cover a region that will become thetop surface 22 c in thePMR writer 20. Although thephotoresist layer 50 is shown recessed the same distance a from a plane 28-28 as the intended end of slopedsurface 22 s, thephotoresist layer 50 may optionally be recessed a greater distance than a. Thereafter, an ion beam etch (IBE) step is performed that is directed an angle toward thephotoresist layer 50 and non-magnetictop shaping layer 22. The etch process continues until the slopedsurface 22 s and slopedsurface 21 s are generated to produce a taperedtop shaping layer 22 and a taperedmain pole layer 21, respectively. The sloped surfaces 21 s, 22 s form a plane that is oriented away from thebottom surface 21 d and at an angle β of about 10 to 80 degrees with respect to a plane 28-28 that is oriented perpendicular to the bottom surface. The distance a between thepatterned photoresist layer 50 and the plane 28-28 should be greater than the intended TH distance since a lapping process later in the fabrication sequence will remove a portion of themain pole layer 21 adjacent to plane 28-28 and thereby form an ABS 25-25 as depicted inFIG. 4 a. - Referring to
FIG. 5 c, thephotoresist layer 50 is stripped by a conventional method such as oxygen ashing and then the write gap layer comprised of a slopedsection 23 a andsection 23 d is deposited by a physical vapor deposition (PVD) method or chemical vapor deposition (CVD) process, for example. The write gap layer may be made of Al2O3 or another non-magnetic material such as Ru and is deposited by a process that yields a conformal write gap layer having an essentially constant thickness insections section 23 a is formed at an angle β with respect to the plane 28-28 that is perpendicular to thebottom surface 21 d and has anend adjoining section 23 d which is a distance a from the plane 28-28. - Referring to
FIG. 5 d, aphotoresist layer 51 is coated on the write gap layer and patterned to coversection 23 d of the write gap layer.Section 23 a is uncovered by the photoresist patterning step. Next, theshield layer 24 is deposited onsection 23 a by a electroplating or sputter deposition process. Typically, a seed layer (not shown) is deposited onsection 23 a before theshield layer 24 is formed in order to assist the electroplating process. A CMP step may be employed to planarize theshield layer 24 and form theend 24 a of the trailing shield shown inFIG. 4 a. Thephotoresist layer 51 is then removed by a conventional method. Finally, a lapping process is performed to form the ABS 25-25 depicted inFIG. 4 a. The ABS is formed between the plane 28-28 and the non-magnetictop shaping layer 22 and is substantially perpendicular to the substrate. It should be understood that a plurality ofPMR writers 20 may be formed simultaneously in rows and columns on a substrate and later separated from each other by a process that dices the wafer into chips. - In
FIGS. 6 a-6 c, a sequence of steps is depicted for fabricating thePMR writer 30 of the second embodiment. Referring toFIG. 6 a which is a cross-track view of the partially formedPMR writer 30, amain pole layer 21 and a firsttop shaping layer 22 are sequentially deposited on a substrate as described with respect toFIG. 5 a in the first embodiment. A second non-magnetictop shaping layer 26 is deposited on the firsttop shaping layer 22 and may be a single non-magnetic layer or a composite having a plurality of non-magnetic layers. Next, aphotoresist layer 52 is patterned on the second non-magnetictop shaping layer 26 to generate anopening 29 having a width b between a plane 28-28 and thephotoresist layer 52. An etching step that may be a reactive ion etch (RIE) process is used to transfer theopening 29 through the second non-magnetictop shaping layer 26 and thereby form an end 26 e parallel to the plane 28-28. Theopening 29 in the second non-magnetictop shaping layer 26 preferably has a width b. The patternedphotoresist layer 52 defines thetop surface 26 c (FIG. 6 b) of the second non-magnetictop shaping layer 26 in thePMR writer 30 and is removed after the RIE step is complete. Note that the location of the ABS will be determined by a lapping process in a later step and the ABS 25-25 (FIG. 4 b) will be positioned between the plane 28-28 and the non-magnetictop shaping layer 26. - Referring to
FIG. 6 b, a second etch step that may be an IBE process is performed at an oblique angle with respect to the plane 28-28 to form a taperedupper portion 21 b of themain pole layer 21 and a tapered first non-magnetictop shaping layer 22. The second etch is preferably performed after a photoresist layer (not shown) is coated on the non-magnetictop shaping layer 26 and then patterned as understood by those skilled in the art. The taper angle is 10 to 80 degrees similar to angle θ in the first embodiment. As a result, asloped surface 21 s is formed on theupper portion 21 b of the main pole layer and asloped surface 22 s is formed on the first non-magnetictop shaping layer 22 belowopening 29. The patterned photoresist layer used for the IBE process may then be removed. Thereafter, the write gap layer comprised of slopedsection 23 a, section 23 b, andsection 23 d is conformally laid down on thesloped surfaces top surface 26 c of the second non-magnetictop shaping layer 26 with a thickness that is essentially constant insections Sloped section 23 a is formed on thesloped surfaces section 23 d is disposed ontop surface 26 c. The write gap layer may be made of Al2O3 or Ru as mentioned previously and may be deposited by a PVD or CVD method, for example. Theopening 29 now has a width v1 that is less than the width b (FIG. 6 a) because of the additional write gap layer. In particular, the section 23 b facing the plane 28-28 reduces the width of theopening 29. The width v1 is greater than the effective TH distance v that separates ABS 25-25 and write gap layer section 23 b in the completedPMR writer 30. - Referring to
FIG. 6 c, aphotoresist layer 53 is coated and patterned on the write gap layer to form anopening 31 aboveopening 29.Opening 31 has a width r1 (greater than r inFIG. 4 b) and uncovers a portion of the writegap layer section 23 d adjacent to section 23 b. Theopenings photoresist layer 53 is removed and an insulation layer (not shown) may be deposited on the trailing shield and onsection 23 d of the write gap layer. Thereafter, a CMP process may be used to planarize the trailingshield 24 to form theend 24 a (FIG. 4 b) which is parallel tobottom surface 21 d in themain pole layer 21 and is coplanar with the adjacent insulation layer. Subsequently, a lapping process is employed to remove a portion of the trailingshield 24, slopedsection 23 a, and thebottom portion 21 a of the main pole layer adjacent to plane 28-28 and thereby form the ABS 25-25 and thePMR writer 30 shown inFIG. 4 b. - Both embodiments provide an advantage over existing PMR writers in that saturation of the trailing shield is minimized by the designs described herein that include a tapered main pole layer and a tapered top shaping layer. Furthermore, the tapered main pole layer and tapered top shaping layer enable the effective TH to be small while the bulk of the trailing shield is larger and thereby allows a larger process window during back end fabrication steps such as the CMP step that planarizes the trailing shield and adjacent insulation layer.
- While this invention has been particularly shown and described with reference to, the preferred embodiment thereof, it will be understood by those skilled in the art that various changes in form and details may be made without departing from the spirit and scope of this invention.
Claims (22)
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US11/982,597 US8238056B2 (en) | 2007-11-02 | 2007-11-02 | Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer |
JP2008283461A JP2009117027A (en) | 2007-11-02 | 2008-11-04 | Perpendicular magnetic recording head and manufacturing method thereof |
US13/554,275 US8379347B2 (en) | 2007-11-02 | 2012-07-20 | Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer |
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US13/554,275 Active US8379347B2 (en) | 2007-11-02 | 2012-07-20 | Perpendicular shield pole writer with tapered main pole and tapered non-magnetic top shaping layer |
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US (2) | US8238056B2 (en) |
JP (1) | JP2009117027A (en) |
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US20090128953A1 (en) * | 2007-11-21 | 2009-05-21 | Ming Jiang | Perpendicular magnetic write head with stitched notched trailing shield |
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US8277669B1 (en) | 2009-12-21 | 2012-10-02 | Western Digital (Fremont), Llc | Method and system for providing a perpendicular magnetic recording pole having a leading edge bevel |
US8416649B2 (en) | 2010-05-11 | 2013-04-09 | Headway Technologies, Inc. | Main pole design for thermally assisted magnetic recording |
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US8628672B1 (en) | 2012-06-27 | 2014-01-14 | Western Digital (Fremont), Llc | Process for manufacturing a perpendicular magnetic recording writer pole with nonmagnetic bevel |
US8980109B1 (en) | 2012-12-11 | 2015-03-17 | Western Digital (Fremont), Llc | Method for providing a magnetic recording transducer using a combined main pole and side shield CMP for a wraparound shield scheme |
US8914969B1 (en) | 2012-12-17 | 2014-12-23 | Western Digital (Fremont), Llc | Method for providing a monolithic shield for a magnetic recording transducer |
US20140272471A1 (en) * | 2013-03-12 | 2014-09-18 | Seagate Technology Llc | Non-magnetic seed layer method and apparatus |
US9147407B2 (en) * | 2013-03-12 | 2015-09-29 | Seagate Technology Llc | Write head having non-magnetic write gap seed layer, and method |
US9214167B2 (en) | 2013-03-12 | 2015-12-15 | Seagate Technology Llc | Main pole layer with at least tow sacrificial layers and a gap layer |
US20160078887A1 (en) * | 2013-03-12 | 2016-03-17 | Seagate Technology Llc | Main pole layer with at least two sacrificial layers and a gap layer |
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US9042051B2 (en) | 2013-08-15 | 2015-05-26 | Western Digital (Fremont), Llc | Gradient write gap for perpendicular magnetic recording writer |
US9047889B1 (en) | 2013-12-10 | 2015-06-02 | HGST Netherlands B.V. | Perpendicular magnetic recording head having a trailing side taper angle which is less than a leading side taper angle |
US9082423B1 (en) | 2013-12-18 | 2015-07-14 | Western Digital (Fremont), Llc | Magnetic recording write transducer having an improved trailing surface profile |
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US8379347B2 (en) | 2013-02-19 |
US20120281313A1 (en) | 2012-11-08 |
US8238056B2 (en) | 2012-08-07 |
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