US20100020390A1

US20100020390A1 - Catadioptric projection objective with pupil correction

Info

Publication number: US20100020390A1
Application number: US12/511,515
Authority: US
Inventors: Aurelian Dodoc
Original assignee: Carl Zeiss SMT GmbH
Current assignee: Carl Zeiss SMT GmbH
Priority date: 2007-02-28
Filing date: 2009-07-29
Publication date: 2010-01-28
Also published as: US20140300957A1; WO2008104192A1; US20120002273A1; JP2010519600A; US8780441B2; JP5165700B2

Abstract

A catadioptric projection objective includes a plurality of optical elements arranged to image an off-axis object field arranged in an object surface onto an off-axis image field arranged in an image surface of the projection objective. The optical elements form: a first, refractive objective part that can generate a first intermediate image from radiation coming from the object surface and including a first pupil surface; a second objective part including at least one concave mirror that can image the first intermediate image into a second intermediate image and including a second pupil surface optically conjugated to the first pupil surface; and a third objective part that can image the second intermediate image onto the image surface and including a third pupil surface optically conjugated to the first and second pupil surface. The optical elements are arranged between the object surface and the first pupil surface form a Fourier lens group which includes a negative lens group arranged optically close to the first pupil surface.

Description

This application is a continuation of, and claims benefit under 35 USC 120 to, international application PCT/EP2007/001708, filed Feb. 28, 2007, which is hereby incorporated by reference in its entirety.

FIELD

The disclosure relates to a catadioptric projection objective including a plurality of optical elements arranged to image an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective.

BACKGROUND

Catadioptric projection objectives are employed, for example, in projection exposure systems, in particular wafer scanners or wafer steppers, used for fabricating semiconductor devices and other types of microdevices and serve to project patterns on photomasks or reticles, hereinafter referred to generically as “masks” or “reticles,” onto an object having a photosensitive coating with ultrahigh resolution on a reduced scale.

SUMMARY

In some embodiments, the disclosure provides a catadioptric projection objective for microlithography suitable for use in the vacuum ultraviolet (VUV) range, where correction of imaging aberrations for different field points is facilitated. In certain embodiments, field dependent variations are largely avoided upon correction of imaging aberrations.
In some embodiments, the disclosure provides a catadioptric projection objective that includes a plurality of optical elements arranged to image an off-axis object field arranged in an object surface onto an off-axis image field arranged in an image surface of the projection objective. The optical elements form: a first, refractive objective part that can generate a first intermediate image from radiation coming from the object surface and including a first pupil surface; a second objective part including at least one concave mirror that can image the first intermediate image into a second intermediate image and including a second pupil surface optically conjugated to the first pupil surface; and a third objective part that can image the second intermediate image onto the image surface and including a third pupil surface optically conjugated to the first and second pupil surface. Optical elements arranged between the object surface and the first pupil surface form a Fourier lens group that includes a negative lens group arranged optically close to the first pupil surface.
The correction status of the first pupil surface can be influenced in a targeted manner to provide a first pupil surface having a surface curvature substantially weaker (radius of curvature substantially larger) than in certain known systems. A corrected pupil image is desirable to avoid field variations of correction effects induced by correcting elements positioned at the pupil position. Field curvature is generally the main aberration of the image of the entrance pupil to the first pupil surface. In order to correct the pupil image, a mechanism for correcting field curvature is desirably positioned in the objective part upstream the pupil surface.
A specific distribution of refractive power within the Fourier lens group can be provided to influence the pupil imaging which images the entrance pupil of the projection objective into the first pupil surface. Overall positive refractive power is involved for the Fourier lens group to collect radiation having a relatively large object-side numerical aperture into a beam passing through the first pupil surface. An undercorrection of the first pupil surface with regard to image curvature is thereby produced. Providing a negative lens group optically close to the first pupil surface may at least partly counteract the overall effect of the Fourier lens group on the curvature of the first pupil surface and provides a “flattening effect” on the curvature of the first pupil surface.
If it is often desired to effect a correction of aberrations essentially constant for all field points one or more correction elements may be placed in or optically close to a pupil surface. A variation of correcting effects across the field is also dependent on the path of ray bundles from different field points near the pupil surface. In case of large differences a correction element placed at or close to the pupil surface may have a field-dependent correcting effect. Even where a correction status of a pupil surface is relatively good, there is still a dependency from the angles of incidence of different rays at the pupil surface for different field points. It may be desirable to improve the correction status of the pupil surface. In particular, this can provide a mechanism to reduce the curvature of the first pupil surface.
Although it may be possible to provide at least one (weak) positive lens between the negative lens group and the pupil surface, the flattening effect may be improved where the negative lens group is arranged immediately upstream of the first pupil surface such that no positive lens is arranged between the negative lens group and the pupil surface.
Optionally, at least one negative lens of the negative lens group is arranged very close to or at the first pupil surface. Where negative refractive power is provided very close to or at the first pupil surface, the overall influence of this negative refractive power on the refractive power of the Fourier lens group is relatively small (due to a small value for the chief ray height, CRH), whereas at the same time the influence on correction of image field curvature of the pupil imaging may be relatively strong to provide the flattening effect on the curvature of the first pupil surface. In some embodiments, the negative lens group includes at least one negative lens arranged in a region where a marginal ray height MRH is substantially greater than a chief ray height CRH such that the condition |RHR|<0.2 is fulfilled for the ray height ratio RHR=CRH/MRH. Optionally, the condition |RHRÅ<0.1 holds.
In some embodiments, the negative lens group is formed by a single negative lens, whereby negative refractive power can be provided in an axially narrow space close to the first pupil surface. In certain embodiments, the negative lens group may be formed by two or more lenses including at least one negative lens, where the lenses in combination have negative refractive power.
In some embodiments, the negative lens group includes a biconcave negative lens immediately upstream of the first pupil surface, where the biconcave negative lens can be preceded by a positive lens upstream thereof such that the biconcave negative lens is the only lens of the negative lens group. A targeted concentration of negative refractive power close to the first pupil surface is thereby obtained.
In some embodiments, the Fourier lens group is configured such that a Petzval radius R_Pat the first pupil surface obeys the condition |R_P|>150 mm, which is relatively large compared to certain known systems having comparable object-side numerical aperture. The Petzval radius as used here corresponds to the radius of curvature of the first pupil surface. The Petzval radius is proportional to the reciprocal of the Petzval sum 1/R_Pof the Fourier lens group. The Petzval radius may be significantly larger than that, such as larger than 200 mm or larger than 250 mm.
In some embodiments, an aperture stop is positioned at the first pupil surface. The aperture stop may have a variable diameter allowing to adjust the utilized image-side numerical aperture NA. The variable aperture stop may be designed as a planar aperture stop, because little or no significant influence on telecentricity will generally occur when the diameter of the aperture stop is changed at a relatively flat first pupil surface.
In some embodiments the Fourier lens group has a first positive lens group (“P”) immediately following the object surface, a first negative lens group (“N”) immediately following the first positive lens group, a second positive lens group immediately following the first negative lens group, and a second negative lens group immediately following the second positive lens group and arranged optically close to the first pupil surface. Such Fourier lens group therefore includes two subsequent lens combinations of type P-N. A beneficial distribution of correcting effect for different aberrations, such as spherical aberration of the first pupil surface, astigmatism and field curvature may be obtained in this structure.
In some embodiments, the Fourier lens group has been improved with respect to lens material consumption and correcting effect by providing that the Fourier lens group includes at least one aspheric surface optically close to the object surface where RHR>|0.5| and at least one aspheric surface optically close to the first pupil surface where |RHR|<0.2. Optionally, at least one aspheric surface is provided in an intermediate region between the object surface and the first pupil surface in a region where the condition 0.2<|RHR|<|0.5| applies. The aspheric surface in the intermediate region may be provided in addition to the aspheric surfaces close to the field surface (object surface) and the first pupil surface.
In some embodiments, the third objective part is largely responsible for providing the high image-side numerical aperture provides significant contribution to correction of spherical aberration and coma of the imaging process. The third objective part, which can be purely refractive, may include between the third pupil surface and the image surface in his order: a front positive lens group; a zone lens having negative refractive power at least in a peripheral zone around an optical axis; and a rear positive lens group including a last optical element of the projection objective immediately upstream of the image surface.
The zone lens may have positive refractive power in a central zone around the optical axis. The zone lens may be designed as an aspheric lens configured to provide a negative refractive effect which increases from a central zone to a peripheral zone of the negative zone lens. In some embodiments, the zone lens is a meniscus lens having a concave surface facing the object surface. The zone lens may be arranged immediately upstream of the last optical element.
These features of the third lens group may be beneficial independent of the type of optical design and of the design of the first lens group in different projection objectives having a final imaging subsystem to image a final intermediate image onto the image surface.
Different types of projection objectives may be used. In some embodiments, the catadioptric projection objective is designed as an “in-line-system” i.e. as a catadioptric projection objective having one straight (unfolded) optical axis common to all optical elements of the projection objective. From an optical point of view, in-line systems may be favorable since optical problems caused by utilizing planer folding mirrors, such as polarization effects, can largely be avoided. Also from a manufacturing point of view, in-line systems may be designed such that conventional mounting techniques for optical elements can be utilized, thereby improving mechanical stability, of the projection objective.
In some embodiments, the second objective part has a mirror group having an object-side mirror group entry for receiving radiation coming from the object surface and an image-side mirror group exit for exiting radiation emerging from the mirror group exit towards the image surface, where the mirror group includes an even number of concave mirrors. In some embodiments, the second objective part has exactly two concave mirrors. The second objective part may be catadioptric (including at least one transparent lens in addition to at least one concave mirror) or catoptric (having only mirrors). In some embodiments capable of providing an obscuration free imaging without vignetting at very high image-side numerical apertures NA>1 all concave mirrors of the mirror group are optically remote from a pupil surface.
In certain embodiments, the second objective part has exactly one concave mirror positioned at or optically close to the pupil surface of the second objective part, and one or more negative lenses arranged ahead of the concave mirror in a region of relatively large marginal ray heights in order to correct axial chromatic aberration (CHL) and contribute to Petzval sum correction (“Schupmann principle”). The projection objective may include a first planar folding mirror (deflecting mirror) tilted relative to the optical axis to deflect radiation coming from the optical surface towards the concave mirror or to deflect radiation coming from the concave mirror towards the image surface. A second planar folding mirror optically downstream of the first planar folding mirror may be provided and oriented at right angles to the first folding mirror to allow parallel orientation of object surface and image surface. Representative examples of folded catadioptric projection objective using planar folding mirrors in combination with a single concave mirror are disclosed, for example, in US 2003/0234912 A1 or US 2004/0233405 A1 or WO 2005/111689 A2 or U.S. Pat. No. 6,995,833 B2. The disclosure of these documents related to the general layout of these systems is incorporated herein by reference.
The previous and other properties can be seen not only in the claims but also in the description and the drawings, wherein individual characteristics may be used either alone or in sub-combinations as embodiments of the disclosure and in other areas and may individually represent advantageous and patentable embodiments.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a meridional section of a projection objective;

FIG. 2 is a meridional section of a reference projection objective;

FIGS. 3A-3C show diagrams indicating the correction status of the first pupil surface of the reference system of FIG. 2;

FIGS. 4A-4C show diagrams indicating the correction status of the third pupil surface of the reference system shown in FIG. 2;

FIGS. 5A-5C show diagrams indicating the correction status of the first pupil surface in FIG. 1;

FIG. 6 shows a meridional section of a projection objective;

FIG. 7 shows an enlarged detail of the Fourier lens group LG1 of the projection objective in FIG. 6;

FIG. 8 shows a diagram representing the field variation of the RMS spot size of the projection objective in FIG. 6;

FIG. 9 shows a diagram indicating the field variation of tangential shell and sagittal shell in the embodiment of FIG. 6;

FIG. 10 shows a diagram of the dependency of the ray deflection angle RDA from the normalized pupil height PH for a zone lens L3-11 in FIG. 6;

FIG. 11 shows a meridional section of another embodiment of a catadioptric projection objective;

FIG. 12 shows an enlarged detail of the Fourier lens group LG1 of FIG. 11;

FIG. 13 shows a diagram representing the field variation of the RMS spot size of the projection objective in FIG. 11;

FIG. 14 shows a diagram indicating the field variation of tangential shell and sagittal shell in the embodiment of FIG. 11;

FIG. 15 shows a meridional section of another projection objective having a single concave mirror at a pupil surface;

FIG. 16 shows an enlarged detail of the Fourier lens group of FIG. 15;

FIG. 17 shows a diagram representing the field variation of the RMS spot size of the projection objective in FIG. 15;

FIG. 18 shows a diagram indicating the field variation of tangential shell and sagittal shell in the embodiment of FIG. 15.

DETAILED DESCRIPTION

In the following description, the term “optical axis” refers to a straight line or a sequence of straight-line segments passing through the centers of curvature of the optical elements. The optical axis can be folded by folding mirrors (deflecting mirrors). In the case of the examples presented here, the object is a mask (reticle) bearing the pattern of a layer of an integrated circuit or some other pattern, for example, a grating pattern. The image of the object is projected onto a wafer serving as a substrate that is coated with a layer of photoresist, although other types of substrates, such as components of liquid-crystal displays or substrates for optical gratings, are also feasible.
Where tables are provided to disclose the specification of a design shown in a figure, the table or tables are designated by the same numbers as the respective figures. Corresponding features in the figures are designated with like or identical reference identifications to facilitate understanding. Where lenses are designated, an identification L3-2 denotes the second lens in the third objective part (when viewed in the light propagation direction).
FIG. 1 shows a catadioptric projection objective 100 designed for ca. λ≈193 nm UV operating wavelength. It is designed to project an image of a pattern on a reticle arranged in the planar object surface OS (object plane) into the planar image surface IS (image plane) on a reduced scale, for example, 4:1, while creating exactly two real intermediate images IMI1, IMI2. The effective object field OF and image field IF are off-axis, i.e. entirely outside the optical axis AX. A first refractive objective part OP1 is designed for imaging the pattern in the object surface into the first intermediate image IMI1 at an enlarged scale. A second, catoptric (purely reflective) objective part OP2 images the first intermediate image IMI1 into the second intermediate image IMI2 at a magnification close to 1:1. A third, refractive objective part OP3 images the second intermediate image IMI2 onto the image surface IS with a strong reduction ratio.
The path of the chief ray CR of an outer field point of the off-axis object field OF is drawn bold in FIG. 1 in order to facilitate following the beam path of the projection beam. For the purpose of this application, the term “chief ray” (also known as principal ray) denotes a ray running from an outermost field point (farthest away from the optical axis) of the effectively used object field OF to the center of the entrance pupil. Due to the rotational symmetry of the system the chief ray may be chosen from an equivalent field point in the meridional plane as shown in the figures for demonstration purposes. In projection objectives being essentially telecentric on the object side, the chief ray emanates from the object surface parallel or at a very small angle with respect to the optical axis. The imaging process is further characterized by the trajectory of marginal rays. A “marginal ray” as used herein is a ray running from an axial object field point (field point on the optical axis) to the edge of an aperture stop. That marginal ray may not contribute to image formation due to vignetting when an off-axis effective object field is used. The chief ray and marginal ray are chosen to characterize optical properties of the projection objectives. The radial distances between such selected rays and the optical axis at a given axial position are denoted as “chief ray height” (CRH) and “marginal ray height” (MRH), respectively.
Three mutually conjugated pupil surfaces P1, P2 and P3 are formed at positions where the chief ray CR intersects the optical axis. A first pupil surface P1 is formed in the first objective part between object surface and first intermediate image, a second pupil surface P2 is formed in the second objective part between first and second intermediate image, and a third pupil surface P3 is formed in the third objective part between second intermediate image and the image surface IS.
The second objective part OP2 includes a first concave mirror CM1 having the concave mirror surface facing the object side, and a second concave mirror CM2 having the concave mirror surface facing the image side. The mirror surfaces are both continuous or unbroken, i.e. they do not have a hole or bore in the area used for reflection. The mirror surfaces facing each other define a catadioptric cavity, which is also denoted intermirror space, enclosed by the curved surfaces defined by the concave mirrors. The intermediate images IMI1, IMI2 are both situated inside the catadioptric cavity well apart from the mirror surfaces.
Objective 100 is rotational symmetric and has one straight optical axis AX common to all refractive and reflective optical components (“In-line system”). There are no folding mirrors. An even number of reflections occurs. Object surface and image surface are parallel. There is no image flip. The concave mirrors have small diameters allowing to bring them close together and rather close to the intermediate images lying in between. The concave mirrors are both constructed and illuminated as off-axis sections of axial symmetric surfaces. The light beam passes by the edges of the concave mirrors facing the optical axis without vignetting. Both concave mirrors are positioned optically remote from a pupil surface rather close to the next intermediate image. The objective has an unobscured circular pupil centered around the optical axis thus allowing use as projection objectives for microlithography.
The projection objective 100 is designed as an immersion objective for λ=193 nm having an image side numerical aperture NA=1.55 when used in conjunction with a high index immersion fluid between the exit surface of the objective and the image surface. The projection objective is designed for a rectangular 26 mm * 5.5 mm image field and is corrected for a design object field having object field radius (object height) 63.7 mm.
The specification for this design is summarized in Table 1. The leftmost column lists the number of the refractive, reflective, or otherwise designated surface, the second column lists the radius, r, of curvature of that surface [mm], the third column indicates aspheric surfaces “AS”. The fourth column lists the distance, d [mm], between a surface and the next surface, a parameter that is referred to as the “thickness” of the optical element, the fifth column lists the material employed for fabricating that optical element, and the sixth column lists the refractive index of the material employed for its fabrication. The seventh column lists the optically utilizable, clear, semi diameter [mm] (optically free radius) of the optical component. A radius of curvature r=0 in a table designates a planar surface (having infinite radius).
A number of surfaces (indicated AS) are aspherical surfaces. Table 1A lists the associated data for those aspherical surfaces, from which the sagitta or rising height p(h) of their surface figures as a function of the height h may be computed employing the following equation:
p(h)=[((1/r)h ²)/(1+SQRT(1−(1+K)(1/r)² h ²))]+C1·h ⁴ +C2·h ⁶+ . . . ,
where the reciprocal value (1/r) of the radius is the curvature of the surface in question at the surface vertex and h is the distance of a point thereon from the optical axis. The sagitta or rising height p(h) thus represents the distance of that point from the vertex of the surface in question, measured along the z-direction, i.e., along the optical axis. The constants K, C1, C2, etc., are listed in Table 1A.
First objective part OP1 imaging the (rectangular) effective object field OF into the first intermediate image IMI1 may be subdivided into a first lens group LG1 with overall positive refractive power between object surface and first pupil surface P1, and a second lens group LG2 with overall positive refractive power between first pupil surface P1 and the first intermediate image IMI1. First lens group LG1 is designed to image the telecentric entrance pupil of the projection objective into first pupil surface P1, thereby acting in the manner of a Fourier lens group performing a single Fourier transformation.
The first lens group includes, in this order from the object surface, an positive meniscus lens L1-1 with object-side convex aspheric surface, a positive meniscus lens L1-2 with object-side concave aspheric surface, a thick positive meniscus lens L1-3 with image-side concave aspheric surface and a biconcave negative lens L1-4 aspheric on the exit surface immediately upstream of the first pupil surface.
Negative lens L1-4 forms a negative lens group positioned optically close to the first pupil surface P1 at a position where the condition RHR<0.2 applies for the ray height ratio RHR=CRH/MRH.
A transparent plane parallel plate PP may optionally be positioned close to the first pupil surface P1. The plane parallel plate PP may be provided with one or two aspheric surfaces to act as a correcting element. Due to the position close to the pupil surface, any correcting effect of the parallel plate PP has essentially the same influence on all ray bundles originating from different field points such that little or no field variation of the correcting effect is obtained (essentially field-constant correcting effect).
The correcting element can be mounted in such a way it can be exchanged without removing the objective from the projection exposure system, and can be replaced by another correcting element, having another shape adapted to correct aberrations. Alternatively, or in addition, the correcting element may be configured to be moved or tilted relative to the nearest pupil position or other lenses in the optical system, enhancing the correction capabilities.
The second lens group LG2 includes a positive meniscus lens L1-5 with aspheric convex exit surface immediately downstream of the first pupil surface, a thin positive meniscus lens L1-6 with image-side concave surface, and a thin positive meniscus lens L1-7 having an object-side concave surface and an aspheric exit surface lens immediately upstream of the first intermediate image.
The negative lens group, which is formed by a single biconcave negative lens L1-4 in this embodiment, is effective to counteract the effect on image field curvature provided by the positive lenses L1-1 to L1-3 upstream thereof, thereby flattening the first pupil surface P1 while, at the same time, contributing only little to the overall refractive power of the Fourier lens group LG1. Therefore, the pupil surface can be flattened without necessitating additional positive refractive power in the Fourier lens group to counteract the negative power of the negative lens. This may be understood by considering a system of thin lenses (representing the Fourier lens group LG1). The overall refractive power of this system may be described by:
φ=Σω_iφ_i
where φ is the overall refractive power, φ_iis the refractive power of single lens with index i, and ω_iis the ratio MRH_i/MRH₁, where MRH_iis the marginal ray height at lens i and MRH₁is the marginal ray height at the first pupil surface.
The image field curvature may be described by the Petzval sum:
PTZ=Σφ _i /n _i=0
where a value PTZ=0 represents an entirely flat (planar) surface.
According to these conditions the negative refractive power in a system desirably compensates the positive refractive power in order to correct for image field curvature. Obtaining a positive overall refractive power of the system involves a marginal ray height MRH_iat the position of a negative lens or negative lenses that is smaller than the respective values at positive lenses. According to these conditions negative lenses at small marginal ray heights will typically compensate for image curvature effected by positive refractive power at larger marginal ray heights. The typical “belly-waist” structure of refractive projection objectives is a typical consequence following from these conditions. A negative lens group arranged close to an object surface or an image surface of an imaging system may be used to reduce image field curvature. Now consider the pupil imaging e.g. imaging the entrance pupil of the projection objective into the first pupil surface. In this pupil imaging the object (entrance pupil) is typically not accessible in telecentric systems since it is located almost at infinity. However, the image of the entrance pupil in the pupil imaging is the first pupil surface arranged in the optical system where the chief ray intersects the optical axis. Providing a negative lens group upstream of and close to that first pupil surface may be used to reduce the field curvature of the pupil imaging, i.e. may be used to flatten the first pupil surface.
Some beneficial effects of a negative lens group provided within the Fourier lens group optically close to the first pupil surface are now explained by comparing some relevant properties of the first embodiment shown in FIG. 1 with corresponding properties of a reference system REF shown in FIG. 2, where the reference system does not have the negative lens group. In the reference system REF, features and feature groups corresponding to respective features and feature groups of the embodiment of FIG. 1 are designated with the same reference identifications. Specifications of reference system REF are given in tables 2, 2A.
In order to illustrate the correction status of the projection objectives at various positions within the projection objective, use will be made of “field curve diagrams” and “spot diagrams”. A field curve diagram is a diagram displaying the distance between the paraxial tangential image position or the paraxial sagittal image position and the image plane for each field height. A spot diagram is a diagram displaying the intersection points with the image plane of a bundle of rays emerging from a field point. In the spot diagrams, the geometrical RMS R size is given by the following equation:
RMS R=SQRT(ΣR ² _i)/k=SQRT(Σ(X _i-X ₀)²+(Y _i-Y ₀)²)/k
where Xi, Yi are the x and y coordinates of ray i at the image plane, k is the number of rays and X0, Y0 is the average position of the ray coordinates in the image surface.
The correction status of the first pupil surface P1 of the reference system REF in FIG. 2 is shown using spot diagrams in FIG. 3A and FIG. 3B and field curves in FIG. 3C. A significant image-field curvature is evident. The correction status of the third pupil surface P3 (within the third objective part OP3) is shown using spot diagrams (FIGS. 4A, 4B) and a field curve diagram (FIG. 4C). The diagrams of FIGS. 4A-4C indicate a significant degree of astigmatism. A large difference between the correction status of the first pupil P1 and the third pupil P3 is also evident from a comparison of these figures.
The Petzval radius R_Pof the first lens group LG1 (Fourier lens group) performing the imaging of the entrance pupil onto the first pupil surface P1 is R_P=−139 mm. The image field curvature of the imaging of the third pupil is substantially overcorrected having a Petzval radius R_P=+110 mm. The last positive lens group between the third pupil P3 and the image surface IS is mainly responsible to provide the required image-side numerical aperture NA. Therefore, this lens group has strong positive refractive power. In the reference system, the image field curvature contribution provided by this lens group is difficult to compensate. A correction compromise is obtained by flattening the tangential shell, as evident from FIG. 4C.
In the following, third order aberrations refer to aberrations of the pupil image. The object of pupil imagery is the entrance pupil, which is assumed to be at infinity in object space.
The third order aberrations, represented by the Seidel aberration error sums SA3 (third order spherical aberration), CMA3 (third order coma), AST3 (third order astigmatism), PTZ3 (third order Petzval sum) and DIS3 (third order distortion) are as follows:
SA3=−3.279689 mm, CMA3=−0.693865 mm, AST3=−0.811623 mm, PTZ3=−5.011397 mm and DIS3=−6.331224 mm.
Significant improvements are obtained in the embodiment of FIG. 1, which includes negative lens group L1-4 immediately upstream of the first pupil surface. The correction status of the first pupil surface P1 is given in the spot diagrams in FIG. 5A and FIG. 5B and the field curves in FIG. 5C. The Seidel aberration sums are as follows:
SA3=1.087472, CMA3=0.083425, AST3=1.342253, PTZ3=−2.642283 and DIS3=−2.242963.
It is evident that the spot size is significantly smaller than in the reference system (Note that scales differ by factor 10 between FIGS. 3A, 3B and FIGS. 5A, 5B). Further, the correction of tangential and sagittal shell is substantially improved (scales differ by factor 20 between FIGS. 3C and 5C). These data indicate a significantly improved correction status. The Petzval radius R_Pof the first pupil surface is R_P=−290 mm, which is a significant improvement when compared to the reference system (R_P=−139 mm).
FIG. 6 shows a catadioptric projection objective 600 designed as an immersion objective for λ=248 nm having an image-side numerical aperture NA=1.47 when used in conjunction with a high index immersion fluid between the exit surface of the objective and the image surface. The projection objective is designed for a rectangular 26 mm×5.5 mm image field. At NA=1.47 a maximum ray angle in the immersion liquid is 72.65°, the ray angle being measured between the propagation direction of the ray having maximum inclination towards the optical axis, and the optical axis.
The sequence of objective parts and lens groups is the same as in FIG. 1, indicated by using the same reference identifications. The first lens group LG1 performing the Fourier transformation between the object surface OS and the first pupil surface P1 is shown in detail in FIG. 7. The specifications are given in Tables 6, 6A.
The first lens group LG1 includes, in this sequence from the object surface OS to the first pupil surface P1, a biconvex positive lens L1-1 having a strongly curved entry surface and an almost flat exit surface, a negative meniscus lens L1-2 having a concave entry surface facing the object surface, a biconvex positive lens L1-3, a thin positive lens L1-4 having a strongly aspheric exit surface providing positive refractive power around the optical axis and negative refractive power in a zone near the outer edge of the lens, and a negative group formed by a single biconcave negative lens L1-5 immediately upstream and very close to the first pupil surface P1. The structure of this lens group includes two lens combinations of type P-N, where P represents positive refractive power and N represents negative refractive power. The first lens combination P-N formed by lenses L1-1 and L1-2 provides a strong contribution to correction of spherical aberration of the pupil (PSA). Negative lens L1-5 contributes to correction of third order spherical aberration of the pupil (PSA3) and coma (CMA3). The second P-N combination formed by positive lenses L1-3 and L1-4 and negative lens L1-5 secures correction of astigmatism (AST3) and image field curvature (PTZ3). The contributions of the single lenses to third order Seidel aberrations are summarized in Table A.

TABLE A

Lens	SA3	CMA3	AST3	PTZ3

L1-1	0.525336	−0.325503	−2.799435	−1.937709
L1-2	1.798902	−0.285417	0.416959	0.062927
L1-3	−1.755569	0.247167	1.457322	−2.126689
L1-4	−1.05019	−1.015048	0.872844	−1.165997
L1-5	0.907359	1.122079	0.492766	2.768379

It is evident that the imaging of the entrance pupil onto the first pupil surface P1 has a good correction status. This is also evident from FIG. 8 showing a diagram of the variation of the RMS spot size (in mm) as a function of the fractional object height FBY in the first pupil surface. The best focal plane is at −0.346 mm from the specified pupil position. This plane provides a preferred position for a correcting element, such as an aspheric plane parallel plate PP as discussed in connection with FIG. 1. The diagram of FIG. 9 shows that the field variation of tangential shell and sagittal shell is significantly improved (i.e. reduced) when compared to the reference system REF. The first pupil surface has only slight curvature, represented by a Petzval radius R_P=−291 mm.
In the embodiment of FIG. 6, the third objective part provides a significant contribution to correction of spherical aberration and coma of the object imaging (the imaging between the object surface OS and the image surface IS optically conjugated thereto). The third objective part includes, between the third pupil surface P3 and the image surface IS, in this order a biconvex positive lens L3-10 serving as a positive front lens, a zone lens L3-11 having negative refractive power in a peripheral zone apart the optical axis and positive refractive power in a center region including the optical axis, and a plano-convex lens L3-12 forming a rear positive lens group immediately upstream of the image surface. The zone lens L3-11 has a rotationally symmetric aspheric exit surface. In order to demonstrate the optical effect of zone lens L3-11 the diagram in FIG. 10 shows a ray deflection angle RDA (in degree) on the abscissa and the normalized pupil height PH on the ordinate. The ray deflection is demonstrated for a ray bundle originating from the optical axis. It is evident that the sense of deflection changes sign between the middle region around the optical axis (PH=0) and the edge of the pupil (PH=1) at about PH=0.95. This lens has a strong correcting effect on spherical aberration and coma of the object imaging.
A further embodiment having the general layout as shown in FIGS. 1 or 6 is shown in FIG. 11. The specifications are given in Table 11, 11A. The immersion-type projection objective 1100 is designed for operation wavelength λ=193 nm and has an image-side NA=1.43 in a rectangular field of size 26 mm×4 mm. All lenses are made from the same material, fused silica (SiO₂). The structure of the first lens group LG1 (Fourier lens group) is shown in detail in FIG. 12. The first group includes only four lenses, namely a biconvex positive lens L1-1, a biconvex positive lens L1-2, a positive meniscus lens L1-3 having an image-side concave surface, and a biconcave negative lens L1-4 forming the negative lens group immediately up-stream of the first pupil surface P1. Aspheric surfaces, marked by “X” are used to support correction of field-dependent and aperture-dependent aberrations. The aspheric surface on the entry-side of first lens L1-1 immediately following the object surface contributes particularly to correction of the field-dependent aberrations, such as distortion. The aspheric surface on the exit-side of negative lens L1-4 immediately upstream of the pupil surface is predominantly effective to correct pupil aberrations essentially without influencing field-dependent aberrations. An intermediate asphere on the exit-side of biconvex lens L1-2 influences both field-dependent and aperture-dependent aberrations.
The correction status of first pupil surface P1 is represented by the diagrams in FIG. 13, showing the variation of the spot RMS across the field, and the tangential and sagittal shells are given in FIG. 14.
A further embodiment of a catadioptric projection objective 1500 designed for λ=193 nm UV operating wavelength is shown in FIG. 15. An image-side numerical aperture NA=1.5 is obtained in a rectangular 26 mm×5 mm image field when used in immersion-operation with an immersion fluid between the exit surface of the projection objective and the image surface. The specification is given in Tables 15, 15A.
Folded projection objective 1500 is designed to project an image of a pattern on a reticle arranged in the planar object surface OS (object plane) into the planar image surface IS (image plane) on a reduced scale, for example, 4:1, while creating exactly two real intermediate images IMI1, IMI2. The rectangular effective object field OF and image field IF are off-axis, i.e. entirely outside the optical axis AX. A first refractive objective part OP1 is designed for imaging the pattern in the object surface into the first intermediate image IMI1. A second, catadioptric (refractive/reflective) objective part OP2 images the first intermediate image IMI1 into the second intermediate image IMI2 at a magnification close to 1:(−1). A third, refractive objective part OP3 images the second intermediate image IMI2 onto the image surface IS with a strong reduction ratio.
Three mutually conjugated pupil surfaces P1, P2 and P3 are formed at positions where the chief ray CR intersects the optical axis. A first pupil surface P1 is formed in the first objective part between object surface and first intermediate image, a second pupil surface P2 is formed in the second objective part between first and second intermediate image, and a third pupil surface P3 is formed in the third objective part between second intermediate image and the image surface IS.
The second objective part OP2 includes a single concave mirror CM. A first planar folding mirror FM1 is arranged optically close to the first intermediate image IMI1 at an angle of 45° to the optical axis AX such that it reflects the radiation coming from the object surface in the direction of the concave mirror CM. A second folding mirror FM2, having a planar mirror surface aligned at right angles to the planar mirror surface of the first folding mirror, reflects the radiation coming from the concave mirror CM in the direction of the image surface, which is parallel to the object surface.
The folding mirrors FM1, FM2 are each located in the optical vicinity of an intermediate image, so that the etendue (geometrical flux) is kept small. The intermediate images are optionally not located on the planar mirror surfaces, which results in a finite minimum distance between the intermediate image and the optically closest mirror surface. This is to ensure that any faults in the mirror surface, such as scratches or impurities, are not imaged sharply onto the image surface.
The first objective part OP1 includes two lens groups LG1, LG2 each with positive refractive power on either side of the first pupil surface P1. First lens group LG1 is designed to image the telecentric entrance pupil of the projection objective into the first pupil surface P1, thereby acting in the manner of a Fourier lens group performing a single Fourier transformation.
FIG. 16 shows an enlarged detail of the first lens group LG1 (Fourier lens group) imaging the object surface onto the first pupil surface P1. The first lens group includes a plane parallel plate PP adjacent to the object surface, a thin positive meniscus lens L1-1, a thick positive meniscus lens L1-2, a thin, strongly aspheric meniscus lens L1-3 having an aspheric image-side concave surface, a thick, positive meniscus lens L1-4 and a negative group formed by a single biconcave negative lens L1-5 immediately upstream of the first pupil surface P1 and optically close thereto. The positive meniscus lenses concave towards the pupil surface have strong positive power providing a strongly converging effect on the ray bundles, but there is only little contribution to image-field curvature due to the similar radii of the entrance and exit surfaces.
The correction status of first pupil surface P1 is represented by the diagrams in FIG. 17, showing the variation of the spot RMS across the field, and the tangential and sagittal shells are given in FIG. 18.
The above description of embodiments has been given by way of example. From the disclosure given, those skilled in the art will not only understand the present disclosure and its attendant advantages, but will also find apparent various changes and modifications to the structures and methods disclosed. It is sought, therefore, to cover all changes and modifications as fall within the spirit and scope of the disclosure, as defined by the appended claims, and equivalents thereof.

TABLE 1

NA = 1.55; field size 26 mm * 5.5 mm; λ = 193 nm

Surface	Radius		Thickness	Material	Index (193 nm)	½ Diameter

0	0.000000		29.999023	AIR	1.00000000	63.700
1	0.000000		−0.293904	AIR	1.00000000	76.311
2	116.967388	AS	33.971623	SIO2V	1.56078570	93.710
3	268.858710		45.405733	AIR	1.00000000	92.342
4	−252.724978	AS	58.607153	SIO2V	1.56078570	92.157
5	−152.905212		0.986967	AIR	1.00000000	102.264
6	100.588881		94.936165	SIO2V	1.56078570	89.748
7	480.541211	AS	22.683526	AIR	1.00000000	61.038
8	−151.461922		9.967307	SIO2V	1.56078570	58.676
9	−1104.178549	AS	2.998283	AIR	1.00000000	54.598
10	0.000000		0.000000	AIR	1.00000000	53.972
11	0.000000		26.000000	AIR	1.00000000	53.972
12	−4615.634680		9.983258	SIO2V	1.56078570	77.043
13	−7648.187834		9.234701	AIR	1.00000000	82.010
14	−625.750713		48.866298	SIO2V	1.56078570	85.509
15	−110.073136	AS	47.938753	AIR	1.00000000	90.434
16	693.459276		15.566986	SIO2V	1.56078570	114.997
17	2225.036283		111.995402	AIR	1.00000000	115.765
18	−209.012550		24.611839	SIO2V	1.56078570	126.681
19	−181.333947	AS	37.469604	AIR	1.00000000	129.924
20	0.000000		238.315935	AIR	1.00000000	129.948
21	−214.798316	AS	—	REFL	1.00000000	151.231
22	186.831531	AS	238.315935	REFL	1.00000000	153.712
23	0.000000		37.462671	AIR	1.00000000	111.274
24	297.174670		29.574318	SIO2V	1.56078570	123.808
25	1191.420870		35.484494	AIR	1.00000000	123.384
26	4081.914442		22.323161	SIO2V	1.56078570	122.901
27	273.503277	AS	0.998916	AIR	1.00000000	122.715
28	231.074591	AS	9.994721	SIO2V	1.56078570	108.656
29	162.434674		7.329878	AIR	1.00000000	100.728
30	173.924185		9.996236	SIO2V	1.56078570	100.278
31	147.324038		39.865421	AIR	1.00000000	96.038
32	517.833939	AS	9.994259	SIO2V	1.56078570	95.918
33	418.975568		18.691694	AIR	1.00000000	97.853
34	402.609022		9.991838	SIO2V	1.56078570	103.816
35	225.169608	AS	18.474719	AIR	1.00000000	105.756
36	350.705440	AS	25.452147	SIO2V	1.56078570	107.818
37	−3388.791523		12.488356	AIR	1.00000000	110.250
38	1008.270218	AS	41.022442	SIO2V	1.56078570	119.521
39	−314.632041		3.943706	AIR	1.00000000	121.832
40	1442.963243	AS	12.476333	SIO2V	1.56078570	126.022
41	−1002.829857		14.096377	AIR	1.00000000	126.891
42	194.591039		81.128704	SIO2V	1.56078570	132.890
43	−264.895277	AS	−22.880987	AIR	1.00000000	131.108
44	0.000000		−0.362185	AIR	1.00000000	132.343
45	0.000000		24.001275	AIR	1.00000000	132.533
46	159.644367		50.327970	SIO2V	1.56078570	109.736
47	494.742901	AS	0.961215	AIR	1.00000000	105.155
48	328.066727		14.868291	SIO2V	1.56078570	92.427
49	−3072.231603	AS	0.927658	AIR	1.00000000	86.384
50	84.317525		69.022697	LuAG	2.15000000	64.842
51	0.000000		3.100000	HINDLIQ	1.65002317	24.540
52	0.000000		0.000000			15.928

TABLE 1A

Aspheric constants

SRF

	2	4	7	9	15

K	0	0	0	0	0
C1	−4.353148e−08	−9.800573e−08	2.666231e−07	1.295769e−07	1.774606e−08
C2	−1.948518e−13	5.499401e−13	−1.471516e−11	1.032347e−11	1.042043e−13
C3	−3.477204e−16	−1.499103e−16	−1.385474e−15	5.718200e−15	2.794961e−17
C4	2.346643e−20	−1.967686e−20	2.138176e−18	−4.988183e−18	−3.892158e−21
C5	−2.078112e−24	4.517642e−24	−1.482225e−22	1.949505e−21	4.464755e−25
C6	−8.347999e−31	−2.738209e−28	−8.304062e−27	−2.335999e−25	4.773462e−30
C7	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C8	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	19	21	22	27	28

K	0	−2.01691	−1.35588	0	0
C1	−1.294881e−08	−1.791441e−08	1.799581e−08	−2.305522e−07	−5.364751e−08
C2	2.960445e−14	1.393731e−13	6.604119e−14	−2.977863e−12	2.985313e−12
C3	−3.744673e−18	−1.959652e−18	1.091967e−18	1.067601e−15	1.185542e−16
C4	3.872183e−22	3.972150e−23	3.177716e−23	−7.036742e−20	−5.029250e−20
C5	−1.724706e−26	−6.577183e−28	−5.281159e−28	2.314154e−24	3.896020e−24
C6	4.346424e−31	6.141114e−33	1.575655e−32	−3.151486e−29	−1.479810e−28
C7	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C8	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	32	35	36	38	40

K	0	0	0	0	0
C1	2.753990e−08	1.438723e−07	4.030346e−08	4.491651e−08	−9.637167e−08
C2	−2.426854e−11	−2.226044e−11	−6.610222e−12	−5.791619e−12	3.256893e−12
C3	1.360579e−15	1.482620e−15	2.501723e−16	5.024169e−16	−9.241857e−17
C4	−1.150640e−19	−5.040252e−20	−2.574681e−21	−3.768862e−20	9.112235e−21
C5	7.525459e−24	1.831772e−24	−7.619628e−25	1.711080e−24	9.519978e−26
C6	−2.203312e−30	−8.726413e−29	1.815817e−29	−3.990765e−29	−1.423818e−29
C7	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C8	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	43	47	49

K	0	0	0
C1	5.213696e−08	−1.687244e−07	1.276858e−07
C2	−2.852489e−13	1.277072e−11	1.143276e−12
C3	6.349974e−17	−5.376139e−16	−2.525252e−16
C4	−4.223029e−21	1.564911e−20	9.197266e−20
C5	1.155960e−25	−3.759137e−25	−8.401499e−24
C6	−1.415349e−30	1.266337e−29	6.171793e−28
C7	0.000000e+00	0.000000e+00	0.000000e+00
C8	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00

TABLE 2

(REF) NA = 1.55; field size 26 mm * 5.5 mm; λ = 193 nm

Surface	Radius		Thickness	Material	Index (193 nm)	½ Diameter

0	0.000000		29.999023	AIR	1.00000000	63.700
1	0.000000		−0.017795	AIR	1.00000000	76.344
2	171.343027	AS	42.631678	SIO2V	1.56078570	85.956
3	−4741.853546		61.874338	AIR	1.00000000	86.356
4	105.977997		65.572103	SIO2V	1.56078570	88.863
5	−861.150434	AS	6.951388	AIR	1.00000000	82.403
6	258.046433		33.648405	SIO2V	1.56078570	67.159
7	1920.848867	AS	8.790277	AIR	1.00000000	50.974
8	0.000000		0.000000	AIR	1.00000000	47.230
9	0.000000		26.000000	AIR	1.00000000	47.230
10	0.000000		10.337048	SIO2V	1.56078570	61.729
11	0.000000		48.824997	AIR	1.00000000	65.126
12	−409.968959		9.999996	SIO2V	1.56078570	87.149
13	−1728.574510	AS	0.999396	AIR	1.00000000	92.240
14	−1262.850901		37.699713	SIO2V	1.56078570	94.725
15	−164.338442		35.734593	AIR	1.00000000	97.786
16	−892.837978		27.787355	SIO2V	1.56078570	106.595
17	−216.768119	AS	37.495802	AIR	1.00000000	107.808
18	0.000000		231.516797	AIR	1.00000000	107.221
19	−184.700839	AS	−231.516797	REFL	1.00000000	157.546
20	202.731693	AS	231.516797	REFL	1.00000000	156.228
21	0.000000		37.496341	AIR	1.00000000	114.709
22	162.462380		39.081598	SIO2V	1.56078570	112.418
23	264.446518	AS	63.339427	AIR	1.00000000	109.444
24	−571.769195	AS	9.999663	SIO2V	1.56078570	91.313
25	708.749519		17.121515	AIR	1.00000000	87.569
26	−507.008359		9.999717	SIO2V	1.56078570	86.854
27	140.591845		19.187442	AIR	1.00000000	84.837
28	184.194102	AS	15.968244	SIO2V	1.56078570	86.582
29	283.845514		31.748225	AIR	1.00000000	90.637
30	4904.309359		10.047458	SIO2V	1.56078570	103.627
31	274.252599	AS	13.944029	AIR	1.00000000	113.490
32	309.375419	AS	28.215577	SIO2V	1.56078570	120.624
33	−920.430769		1.767414	AIR	1.00000000	124.772
34	18975.064444	AS	70.355114	SIO2V	1.56078570	127.703
35	−162.879880		12.292563	AIR	1.00000000	132.134
36	−2025.460472	AS	9.999587	SIO2V	1.56078570	141.670
37	−722.326749		0.998787	AIR	1.00000000	143.067
38	276.303253		73.567109	SIO2V	1.56078570	150.848
39	−523.286381	AS	−10.418710	AIR	1.00000000	149.454
40	0.000000		−0.362185	AIR	1.00000000	145.848
41	0.000000		11.777558	AIR	1.00000000	145.992
42	203.342152		65.192017	SIO2V	1.56078570	131.067
43	−779.130399	AS	0.997958	AIR	1.00000000	126.720
44	305.958782		21.191217	SIO2V	1.56078570	103.169
45	−48623.319668	AS	0.987133	AIR	1.00000000	97.187
46	95.078716		76.560136	LuAG	2.15000000	71.117
47	0.000000		3.100000	HINDLIQ	1.65002317	24.554
48	0.000000		0.000000			15.926

TABLE 2A

Aspheric constants

SRF

	2	5	7	13	17

K	0	0	0	0	0
C1	5.535754e−09	−2.163453e−08	2.131940e−07	−6.511619e−08	1.346551e−08
C2	−2.217501e−12	3.505228e−13	2.096996e−11	2.291139e−13	7.406450e−13
C3	1.496293e−16	3.144204e−15	2.247871e−15	−8.522321e−17	2.478135e−17
C4	−8.752146e−21	−5.148203e−19	2.662065e−18	3.174503e−21	4.410963e−22
C5	2.789483e−25	3.453724e−23	−1.491642e−21	−1.364637e−25	1.313895e−26
C6	−2.329972e−30	−9.033416e−28	6.227531e−25	4.124720e−30	−8.547823e−31
C7	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C8	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	19	20	23	24	28

K	−1.52592	−1.42277	0	0	0
C1	−1.765080e−08	1.613577e−08	−4.798352e−08	4.255285e−08	−1.477745e−07
C2	4.917900e−14	4.357122e−14	−1.311955e−12	−1.146206e−11	1.210948e−12
C3	−9.914290e−19	9.093916e−19	3.514210e−18	6.521380e−16	−5.978764e−16
C4	5.089307e−24	8.683689e−24	1.024784e−21	−6.959952e−20	5.086484e−20
C5	−1.439617e−28	−2.826288e−29	1.466905e−25	8.075085e−24	−2.048151e−24
C6	−2.489761e−34	3.718326e−33	−6.750818e−30	−3.306910e−28	1.559775e−28
C7	0.000000e+00
C8	0.000000e+00
C9	0.000000e+00

SRF

	31	32	34	36	39

K	0	0	0	0	0
C1	−5.803167e−08	−8.321353e−08	−3.416619e−08	−3.711339e−08	4.221371e−09
C2	5.110289e−12	3.106108e−12	1.834441e−12	3.509157e−13	−1.476275e−13
C3	−7.215213e−16	−1.869923e−16	−1.168356e−16	1.204985e−17	3.254133e−18
C4	4.298822e−20	7.706750e−21	−1.174247e−22	6.896527e−22	9.967170e−22
C5	−1.225430e−24	−4.141276e−25	4.114824e−25	3.435906e−26	−5.090064e−26
C6	7.229558e−30	1.166645e−29	−1.539536e−29	−2.039666e−30	6.695129e−31
C7	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C8	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	43	45

K	0	0
C1	6.584837e−09	4.103097e−08
C2	1.476709e−12	1.320693e−12
C3	−2.128509e−16	2.055670e−16
C4	1.488828e−20	−1.513267e−20
C5	−5.015220e−25	8.328043e−25
C6	7.209855e−30	−7.654058e−30
C7	0.000000e+00	0.000000e+00
C8	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00

TABLE 6

NA = 1.47; field size 26 mm * 5.5 mm; λ = 248 nm

Surface	Radius		Thickness	Material	Index (248 nm)	½ Diameter

0	0.000000		29.999023	AIR	1.00000000	63.700
1	0.000000		−0.016587	AIR	1.00000000	75.565
2	128.928301	AS	42.026693	SIO2V	1.50885281	87.914
3	−2130.241282		44.327573	AIR	1.00000000	87.576
4	−117.301124	AS	37.980898	SIO2V	1.50885281	87.249
5	−121.095557		0.999318	AIR	1.00000000	97.646
6	124.335144		49.904800	SIO2V	1.50885281	88.572
7	−1015.089235		0.999887	AIR	1.00000000	85.114
8	841.474542		19.999813	SIO2V	1.50885281	79.220
9	−265.863207	AS	24.244189	AIR	1.00000000	74.122
10	−130.163272		19.998818	SIO2V	1.50885281	61.644
11	245.744624	AS	8.799263	AIR	1.00000000	54.069
12	0.000000		0.000000	AIR	1.00000000	53.816
13	0.000000		0.998863	AIR	1.00000000	53.816
14	262.324322		24.657808	SIO2V	1.50885281	60.964
15	−241.892483		1.204928	AIR	1.00000000	64.095
16	−388.893369		20.002393	SIO2V	1.50885281	65.782
17	−134.956755	AS	95.737496	AIR	1.00000000	68.599
18	270.042558		21.031793	SIO2V	1.50885281	102.358
19	651.399601		64.989823	AIR	1.00000000	102.511
20	−126.975206		19.999827	SIO2V	1.50885281	102.966
21	−145.489260	AS	37.494736	AIR	1.00000000	110.060
22	0.000000		275.711491	AIR	1.00000000	116.538
23	−253.239170	AS	—	REFL	1.00000000	195.865
24	186.748589	AS	275.711491	REFL	1.00000000	140.517
25	0.000000		37.497070	AIR	1.00000000	114.897
26	−4183.753618		43.458815	SIO2V	1.50885281	118.592
27	−202.559737	AS	13.648419	AIR	1.00000000	119.292
28	−175.419986	AS	19.999522	SIO2V	1.50885281	116.494
29	−154.929816		0.999549	AIR	1.00000000	118.150
30	−229.271599		19.999486	SIO2V	1.50885281	105.369
31	122.750670	AS	49.793521	AIR	1.00000000	100.243
32	190.556325	AS	46.859904	SIO2V	1.50885281	121.109
33	−943.347591		7.041362	AIR	1.00000000	121.790
34	−845.190598		19.999826	SIO2V	1.50885281	122.081
35	147.937513	AS	29.168833	AIR	1.00000000	128.004
36	1388.526462	AS	45.306600	SIO2V	1.50885281	131.120
37	−523.436578		4.347825	AIR	1.00000000	133.458
38	5449.999826	AS	19.999851	SIO2V	1.50885281	134.608
39	−348.816325		0.999597	AIR	1.00000000	137.891
40	340.272237	AS	67.587519	SIO2V	1.50885281	153.819
41	−323.687667		58.231540	AIR	1.00000000	155.356
42	0.000000		0.000000	AIR	1.00000000	154.131
43	0.000000		−57.242893	AIR	1.00000000	154.131
44	225.119659		90.762438	SIO2V	1.50885281	154.660
45	−354.115170	AS	0.997569	AIR	1.00000000	152.747
46	332.230008		48.061330	SIO2V	1.50885281	131.162
47	−1361.523117	AS	1.268990	AIR	1.00000000	127.295
48	−810.795253		19.998161	SIO2V	1.50885281	122.580
49	−451.036733	AS	0.994751	AIR	1.00000000	113.480
50	93.456855		76.027617	LUAG	2.02093434	71.508
51	0.000000		3.100000	HIL001	1.54048002	26.023
52	0.000000		0.000000			15.926

TABLE 6A

Aspheric constants

SRF

	2	4	9	11	17

K	0	0	0	0	0
C1	−4.384112e−08	−4.412855e−08	2.029683e−07	3.217532e−08	6.242700e−08
C2	6.119422e−13	−1.990073e−12	7.567548e−13	2.824684e−12	2.636674e−12
C3	−2.550937e−17	8.072280e−16	−8.040857e−16	−3.870631e−15	7.268545e−16
C4	−2.008613e−19	−1.589989e−19	−2.373612e−20	−2.969833e−19	−1.576215e−19
C5	6.058069e−23	3.137776e−23	1.268368e−23	6.242046e−22	1.095770e−22
C6	−9.717788e−27	−5.193051e−27	−3.735037e−27	−7.218140e−26	−3.106810e−26
C7	8.441816e−31	3.741282e−31	2.516910e−31	−5.174396e−29	4.585559e−30
C8	−3.120207e−35	−1.034688e−35	−8.393442e−36	1.110006e−32	−3.071967e−34
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	21	23	24	27	28

K	0	−3.141	−1.33118	0	0
C1	−2.862443e−08	−2.174149e−08	1.549149e−08	8.131862e−08	7.955643e−08
C2	−8.771349e−13	2.517297e−13	3.397419e−14	−1.707739e−12	2.867120e−12
C3	−1.596517e−17	−5.825790e−18	1.032630e−19	−3.301596e−17	−1.099153e−15
C4	−4.646004e−21	1.362810e−22	1.136332e−22	−5.761262e−20	3.424317e−20
C5	8.126190e−25	−3.290251e−27	−8.250734e−27	4.724568e−24	3.332299e−25
C6	−1.135755e−28	6.790431e−32	3.149468e−31	−1.202012e−28	−4.827974e−29
C7	7.299024e−33	−9.159117e−37	−5.928263e−36	4.082908e−34	2.861844e−33
C8	−2.111452e−37	6.183391e−42	4.153068e−41	1.760434e−38	−6.298301e−38
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	31	32	35	36	38

K	0	0	0	0	0
C1	−8.939854e−08	−1.036340e−07	−9.696640e−08	8.511140e−08	−6.457556e−08
C2	4.348686e−12	1.316189e−12	1.108503e−13	−2.457731e−12	8.723554e−13
C3	−8.114178e−16	6.095759e−17	−1.060162e−16	3.903750e−17	−3.888178e−17
C4	6.060580e−20	2.984406e−21	8.228345e−21	−6.588883e−21	6.708466e−22
C5	−3.926918e−24	5.719431e−26	−4.559678e−25	5.019357e−25	−3.249478e−26
C6	7.618517e−29	2.198926e−29	1.569417e−29	−1.721031e−29	3.981782e−30
C7	8.937963e−33	−2.899121e−33	−4.855487e−34	2.943619e−34	−1.652000e−34
C8	−7.773344e−37	7.179029e−38	4.866053e−39	−4.420955e−39	1.394293e−39
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	40	45	47	49

K	0	0	0	0
C1	−3.047152e−08	2.876681e−08	−7.237631e−08	3.127564e−08
C2	−2.503917e−13	−4.981655e−13	7.328144e−12	−1.483849e−12
C3	−2.036991e−17	2.984706e−17	−5.046596e−16	2.815259e−17
C4	2.564810e−21	−7.422489e−22	1.891226e−20	2.747470e−20
C5	−1.078825e−25	1.333563e−26	−2.625122e−25	−3.683041e−24
C6	2.525531e−30	−4.886557e−31	5.993731e−30	2.331163e−28
C7	6.070121e−36	5.284852e−36	−6.235738e−34	−8.136306e−33
C8	−9.848310e−40	3.056734e−41	1.667827e−38	1.346431e−37
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

TABLE 11

NA = 1.43; field size 26 mm * 4 mm; λ = 193 nm

Surface	Radius		Thickness	Material	Index (193 nm)	½ Diameter

0	0.000000		33.332248	AIR	1.00000000	60.000
1	0.000000		−0.004263	AIR	1.00000000	72.779
2	357357.144810	AS	46.089360	SIO2V	1.56078570	76.013
3	−417.562806		74.837927	AIR	1.00000000	81.763
4	280.404005		60.022974	SIO2V	1.56078570	101.278
5	−166.627712	AS	0.999622	AIR	1.00000000	101.071
6	116.529317		38.169032	SIO2V	1.56078570	71.306
7	405.500190		15.365869	AIR	1.00000000	60.252
8	−238.458946		9.999795	SIO2V	1.56078570	56.004
9	211.906189	AS	10.592661	AIR	1.00000000	47.114
10	0.000000		0.000000	AIR	1.00000000	46.365
11	0.000000		2.965376	AIR	1.00000000	46.365
12	0.000000		9.999570	SIO2V	1.56078570	48.729
13	0.000000		0.999095	AIR	1.00000000	53.095
14	251.808655		75.306859	SIO2V	1.56078570	59.619
15	−209.119448	AS	19.949752	AIR	1.00000000	76.307
16	297.229724		41.623543	SIO2V	1.56078570	91.301
17	−368.032393	AS	17.309640	AIR	1.00000000	91.926
18	−304.574570		9.998928	SIO2V	1.56078570	86.542
19	−1835.490188	AS	37.493067	AIR	1.00000000	85.640
20	0.000000		269.847723	AIR	1.00000000	88.712
21	−193.435450	AS	—	REFL	1.00000000	156.793
22	230.296849	AS	269.847723	REFL	1.00000000	162.808
23	0.000000		37.496545	AIR	1.00000000	115.972
24	222.765081		32.374348	SIO2V	1.56078570	118.274
25	139.308788	AS	20.243523	AIR	1.00000000	111.594
26	504.166848	AS	50.121407	SIO2V	1.56078570	111.843
27	−296.072806		9.056420	AIR	1.00000000	110.445
28	−602.578656		9.999975	SIO2V	1.56078570	97.132
29	93.726568	AS	13.818669	AIR	1.00000000	83.497
30	110.971133	AS	9.999545	SIO2V	1.56078570	83.171
31	124.632154		62.097682	AIR	1.00000000	80.656
32	−132.174351		11.899629	SIO2V	1.56078570	81.715
33	−40607.350265	AS	24.348045	AIR	1.00000000	102.447
34	1799.174156	AS	51.395108	SIO2V	1.56078570	115.369
35	−187.360985		0.997962	AIR	1.00000000	123.742
36	−700.986626	AS	65.447368	SIO2V	1.56078570	144.945
37	−188.074155		1.059137	AIR	1.00000000	150.242
38	−5408.105536	AS	29.786331	SIO2V	1.56078570	175.144
39	−1608.220868		35.803900	AIR	1.00000000	175.488
40	202.569243		79.929030	SIO2V	1.56078570	175.217
41	−580676.026640	AS	28.659957	AIR	1.00000000	170.624
42	0.000000		0.000000	AIR	1.00000000	171.264
43	0.000000		−25.369612	AIR	1.00000000	171.264
44	192.367691		75.692630	SIO2V	1.56078570	153.859
45	784.958025	AS	0.995706	AIR	1.00000000	148.467
46	127.716618		51.629289	SIO2V	1.56078570	104.469
47	697.612041	AS	0.960830	AIR	1.00000000	94.717
48	50.984791		43.213390	SIO2V	1.56078570	47.246
49	0.000000		3.444444	HINDLIQ	1.65002317	21.011
50	0.000000		0.000000			15.000

TABLE 11A

Aspheric constants

SRF

	2	5	9	15	17

K	0	0	0	0	0
C1	−6.886423e−08	−5.399934e−09	7.670365e−07	−1.468962e−08	2.941498e−08
C2	5.485090e−13	−1.665701e−13	−1.648448e−11	1.288281e−11	−2.652838e−11
C3	−1.310182e−15	1.141289e−15	−7.138563e−14	1.151797e−16	8.340750e−16
C4	4.553614e−19	−2.207616e−19	2.971898e−17	−1.481358e−19	8.678296e−20
C5	−1.343018e−22	2.537949e−23	−1.082266e−20	2.848823e−23	1.861559e−23
C6	1.960673e−26	−1.868665e−27	5.685298e−24	−7.123479e−27	−4.697518e−27
C7	−1.250480e−30	8.263513e−32	−2.060132e−27	9.661060e−31	3.445831e−31
C8	1.179973e−35	−1.667241e−36	2.897054e−31	−4.638795e−35	−8.934923e−36
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	19	21	22	25	26

K	0	−1.49741	−1.62646	0	0
C1	2.476984e−08	−1.522752e−08	1.471219e−08	−2.496187e−07	−1.110036e−07
C2	1.500487e−11	−1.396376e−15	3.623941e−14	9.991017e−12	2.261667e−11
C3	−4.386995e−16	−1.165187e−18	−1.591633e−18	6.981563e−16	1.059597e−16
C4	4.006150e−20	5.254699e−23	2.344572e−22	−5.968529e−20	−2.875234e−19
C5	−2.400161e−23	−2.875966e−27	−1.338490e−26	4.601373e−24	4.467403e−23
C6	2.853406e−27	8.782897e−32	4.654398e−31	−1.413493e−27	−4.303454e−27
C7	−1.087783e−31	−1.455581e−36	−8.796362e−36	1.323528e−31	2.330243e−31
C8	4.311181e−37	9.964499e−42	7.028833e−41	−3.872736e−36	−5.208998e−36
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	29	30	33	34	36

K	0	0	0	0	0
C1	−2.267301e−07	−8.519491e−08	2.440652e−07	1.018655e−07	−3.263771e−08
C2	−1.583065e−11	−3.972995e−11	−2.702153e−11	−2.093056e−11	4.414943e−12
C3	6.128819e−15	4.407665e−15	3.482308e−16	1.840200e−15	−3.226771e−16
C4	−1.569530e−18	−6.334167e−19	2.746742e−19	−1.201814e−19	1.696874e−20
C5	1.407627e−22	−1.585820e−23	−4.143028e−23	5.796403e−24	−7.791980e−25
C6	−7.921382e−27	1.683303e−26	3.274508e−27	−1.854295e−28	2.511951e−29
C7	−3.596221e−31	−2.727972e−30	−1.458485e−31	3.605510e−33	−4.563870e−34
C8	5.039527e−35	1.787510e−34	3.028396e−36	−4.430267e−38	3.025968e−39
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	38	41	45	47

K	0	0	0	0
C1	9.235685e−09	2.984374e−08	−5.662983e−08	4.426415e−08
C2	−4.548242e−13	3.795044e−13	5.304155e−12	−1.939003e−13
C3	4.711657e−17	2.322935e−17	−2.666811e−16	4.722428e−16
C4	−6.285778e−22	−2.741671e−21	7.087400e−21	−3.883053e−20
C5	−3.584554e−26	1.065528e−25	−2.346928e−26	−4.947922e−25
C6	1.500601e−30	−1.995489e−30	−3.324754e−30	4.961940e−28
C7	−2.277407e−35	1.285834e−35	7.276997e−35	−4.556416e−32
C8	1.311951e−40	2.890527e−41	−3.730749e−40	1.483979e−36
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

TABLE 15

NA = 1.50; field size 26 mm * 5 mm; λ = 193 nm

Surface	Radius		Thickness	Material	Index (193 nm)	½ Diameter

0	0.000000		56.505360	AIR	1.00000000	61.600
1	0.000000		0.628593	AIR	1.00000000	84.411
2	0.000000		9.999465	SIO2V	1.56078570	84.665
3	0.000000		1.018383	AIR	1.00000000	87.136
4	267.687560		23.051668	SIO2V	1.56078570	94.506
5	2076.339784		3.011269	AIR	1.00000000	95.214
6	195.468828		118.243767	SIO2V	1.56078570	99.907
7	213.465552		65.301393	AIR	1.00000000	87.739
8	233.154018		24.923341	SIO2V	1.56078570	92.865
9	−1992.179958	AS	1.169743	AIR	1.00000000	91.232
10	397.921478		69.915906	SIO2V	1.56078570	91.709
11	505.661172		17.194249	AIR	1.00000000	95.812
12	−735.689494		9.999732	SIO2V	1.56078570	96.173
13	887.983169		8.242783	AIR	1.00000000	100.163
14	0.000000		0.000000	AIR	1.00000000	101.571
15	0.000000		42.782393	AIR	1.00000000	101.571
16	−410.552179	AS	78.848881	SIO2V	1.56078570	128.012
17	−163.270786		336.654237	AIR	1.00000000	134.938
18	237.665945		66.291266	SIO2V	1.56078570	153.690
19	−1317.124240	AS	86.415659	AIR	1.00000000	152.243
20	222.206724		27.565105	SIO2V	1.56078570	112.997
21	921.104852	AS	68.984477	AIR	1.00000000	110.393
22	0.000000		0.000000	AIR	1.00000000	82.262
23	0.000000		−223.984401	REFL	1.00000000	82.262
24	112.393927	AS	−9.995120	SIO2V	1.56078570	93.383
25	618.177768		−30.194887	AIR	1.00000000	110.198
26	180.843143		−9.993434	SIO2V	1.56078570	111.320
27	459.728303		−49.418013	AIR	1.00000000	131.268
28	166.364160		49.418013	REFL	1.00000000	133.173
29	459.728303		9.993434	SIO2V	1.56078570	130.248
30	180.843143		30.194887	AIR	1.00000000	106.184
31	618.177768		9.995120	SIO2V	1.56078570	102.211
32	112.393927	AS	223.984401	AIR	1.00000000	87.128
33	0.000000		0.000000	AIR	1.00000000	69.972
34	0.000000		−63.976352	REFL	1.00000000	69.972
35	412.103957		−20.679211	SIO2V	1.56078570	92.437
36	203.153828		−0.998595	AIR	1.00000000	95.263
37	−1996.505583		−25.026685	SIO2V	1.56078570	104.114
38	387.517974		−0.999117	AIR	1.00000000	105.544
39	−217.409028		−35.834400	SIO2V	1.56078570	112.665
40	−1732.046627		−89.753105	AIR	1.00000000	111.738
41	−432.227186		−24.454670	SIO2V	1.56078570	100.002
42	−429.393785	AS	−61.820584	AIR	1.00000000	96.269
43	127.267221	AS	−9.998963	SIO2V	1.56078570	96.639
44	−354.132669		−7.868044	AIR	1.00000000	110.880
45	−523.720649		−14.975470	SIO2V	1.56078570	112.701
46	−341.520890	AS	−0.997791	AIR	1.00000000	118.281
47	−411.353502		−48.777625	SIO2V	1.56078570	120.957
48	342.083102		−8.810353	AIR	1.00000000	122.794
49	514.961229	AS	−14.987375	SIO2V	1.56078570	123.090
50	291.403757		−79.216652	AIR	1.00000000	128.222
51	826.480933	AS	−24.931069	SIO2V	1.56078570	151.976
52	388.289534		−1.073107	AIR	1.00000000	155.772
53	1460.275628		−24.262791	SIO2V	1.56078570	162.233
54	543.277065		−0.999651	AIR	1.00000000	163.887
55	−4320.460965		−27.112870	SIO2V	1.56078570	168.245
56	901.554468		−0.999423	AIR	1.00000000	168.871
57	−227.624376		−78.149238	SIO2V	1.56078570	170.522
58	−2243.544699		−9.897025	AIR	1.00000000	167.855
59	0.000000		0.000000	AIR	1.00000000	165.919
60	0.000000		−43.822974	AIR	1.00000000	165.919
61	−193.437748		−56.826827	SIO2V	1.56078570	128.975
62	4852.914186	AS	−1.258966	AIR	1.00000000	124.642
63	−126.542916		−25.022273	SIO2V	1.56078570	89.797
64	−202.284936	AS	−0.996510	AIR	1.00000000	78.587
65	−95.520347		−72.724717	LUAG	2.10000000	70.909
66	0.000000		−6.000000	HIINDLIQ	1.64000000	28.915
67	0.000000		0.000000			15.401

TABLE 15A

Aspheric constants

SRF

	9	16	19	21	24

K	0	0	0	0	0
C1	1.993155e−07	7.648792e−08	1.310449e−08	1.499407e−08	−1.140413e−07
C2	−2.965837e−11	−1.147476e−12	−1.473288e−13	4.898569e−13	−1.405657e−12
C3	7.084938e−15	−1.620016e−16	1.789597e−18	−4.831673e−18	−6.422308e−16
C4	−1.108567e−18	1.291519e−20	−3.347563e−23	5.603761e−22	9.595133e−20
C5	1.294384e−22	−4.536509e−25	7.855804e−28	1.107164e−28	−1.651690e−23
C6	−8.666805e−27	8.063130e−30	−1.561895e−32	−1.720748e−31	1.285598e−27
C7	2.821071e−31	−5.992411e−35	1.565488e−37	3.402783e−35	−5.054656e−32
C8	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	32	42	43	46	49

K	0	0	0	0	0
C1	−1.140413e−07	−4.189168e−08	−1.685701e−07	6.336319e−09	5.280703e−08
C2	−1.405657e−12	−3.147936e−13	9.635698e−12	4.071242e−12	1.157060e−12
C3	−6.422308e−16	−1.294082e−18	−1.217963e−15	−3.577670e−16	−7.824880e−17
C4	9.595133e−20	−2.828644e−22	1.012583e−19	2.732048e−20	7.171704e−21
C5	−1.651690e−23	4.489648e−26	−8.858422e−24	−1.655966e−24	−3.888551e−26
C6	1.285598e−27	−1.468171e−29	4.866371e−28	6.535740e−29	−2.007284e−29
C7	−5.054656e−32	1.147294e−33	−1.337836e−32	−1.353076e−33	4.237726e−34
C8	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00
C9	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00	0.000000e+00

SRF

	51	62	64

K	0	0	0
C1	−6.339317e−09	4.857833e−08	−2.139384e−07
C2	9.839286e−13	−8.830803e−12	1.525695e−11
C3	−3.557535e−17	7.521403e−16	−4.799207e−15
C4	2.050828e−21	−4.932093e−20	1.286852e−18
C5	−7.703006e−26	2.223792e−24	−3.670356e−22
C6	2.045013e−30	−5.700404e−29	7.133596e−26
C7	−2.770838e−35	−3.566708e−35	−9.239454e−30
C8	0.000000e+00	4.807714e−38	6.969720e−34
C9	0.000000e+00	−1.056980e−42	−2.499170e−38

Claims

1. A projection objective having an optical axis, the projection objective comprising:

a plurality of optical elements arranged to image an object field arranged in an object surface of the projection objective onto an image field arranged in an image surface of the projection objective, the object field being entirely outside the optical axis of the projection objective, the image field being entirely outside the optical axis of the projection objective, and the optical elements forming:

a first, refractive objective part configured to generate a first intermediate image from radiation coming from the object surface, the first, refractive objective part including a first pupil surface;

a second objective part comprising at least one concave mirror configured to image the first intermediate image into a second intermediate image, the second objective part including a second pupil surface optically conjugated to the first pupil surface; and

a third objective part configured to image the second intermediate image onto the image surface, the third object part including a third pupil surface optically conjugated to the first and second pupil surfaces; and

a correcting element,

wherein:

optical elements arranged between the object surface and the first pupil surface form a Fourier lens group that comprises a negative lens group arranged optically close to the first pupil surface;

the correcting element is in a space at or optically close to the first pupil surface, or the correcting element can be inserted into the space at or optically close to the first pupil surface; and

the projection objective is a catadioptric projection objective.

2. The projection objective according to claim 1, wherein the projection objective is configured to be used in a microlithography projection-exposure system.

3. The projection objective according to claim 1, wherein the correcting element is a plane plate having at least one aspheric surface.

4. The projection objective according to claim 1, wherein:

the projection objective is configured to be used in a microlithography projection-exposure system; and

when the projection objective is in the microlithography projection-exposure system, the correcting element can be exchanged with another correcting element having a different shape without removing the projection objective from the microlithography projection-exposure system.

5. The projection objective according to claim 1, wherein the correcting element is configured to be moved or tilted relative to a nearest pupil position.

6. The projection objective according to claim 1, wherein the negative lens group comprises a biconcave negative lens immediately upstream of the first pupil surface along a direction that the radiation propagates through the projection objective.

7. The projection objective according to claim 1, wherein the negative lens group is a single biconcave negative lens arranged immediately upstream of the first pupil surface along a direction that the radiation propagates through the projection objective so that no positive lens is arranged between the biconcave negative lens and the first pupil surface.

8. The projection objective according to claim 1, wherein the Fourier lens group consists of:

a first positive lens group immediately down-stream of the object surface along a direction that the radiation propagates through the projection objective;

a first negative lens group immediately following the first positive lens group along the direction that the radiation propagates through the projection objective;

a second positive lens group immediately following the first negative lens group along a direction that the radiation propagates through the projection objective; and

a second negative lens group immediately following the second positive lens group along the direction that the radiation propagates through the projection objective, the second negative lens group being arranged optically close to the first pupil surface.

9. The projection objective according to claim 8, wherein the first negative lens group is arranged optically close to the object surface in a region where the condition |RHR|>0.5 holds, and RHR is a ray height ratio.

10. The projection objective according to claim 8, wherein the first negative lens group comprises a negative meniscus lens having a concave surface facing the object surface.

11. The projection objective according to claim 1, further comprising an aperture stop positioned at the first pupil surface.

12. The projection objective according to claim 1, wherein the third objective part comprises between the third pupil surface and the image surface in this order along a direction that the radiation propagates through the projection objective:

a front positive lens group;

a zone lens having negative refractive power at least in a peripheral zone around the optical axis of the projection objective; and

a rear positive lens group comprising a last optical element of the projection objective immediately upstream of the image surface along the light propagation direction of the projection objective.

13. A projection objective having an optical axis, the projection objective comprising:

a third objective part configured to image the second intermediate image onto the image surface, the third object part including a third pupil surface optically conjugated to the first and second pupil surfaces,

wherein:

the Fourier lens group is configured such that a Petzval radius R_Pat the first pupil surface satisfies the condition: |R_P|>150 mm; and

the projection objective is a catadioptric projection objective.

14. The projection objective according to claim 13, wherein the projection objective is configured to be used in a microlithography projection-exposure system.

15. The projection objective according to claim 13, wherein the negative lens group comprises a biconcave negative lens immediately upstream of the first pupil surface along a direction that the radiation propagates through the projection objective.

16. The projection objective according to claim 13, wherein the negative lens group is a single biconcave negative lens arranged immediately upstream of the first pupil surface along a direction that the radiation propagates through the projection objective so that no positive lens is arranged between the biconcave negative lens and the first pupil surface.

17. The projection objective according to claim 13, wherein the Fourier lens group consists of:

18. The projection objective according to claim 13, further comprising an aperture stop positioned at the first pupil surface.

19. The projection objective according to claim 13, wherein the third objective part comprises between the third pupil surface and the image surface in this order along a direction that the radiation propagates through the projection objective:

a front positive lens group;

20. A system, comprising:

an illumination system; and

a projection objective according to claim 1,

wherein the system is a microlithography projection-exposure system.