US20120034794A1 - Enhancing the width of polycrystalline grains with mask - Google Patents

Enhancing the width of polycrystalline grains with mask Download PDF

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US20120034794A1
US20120034794A1 US13/273,687 US201113273687A US2012034794A1 US 20120034794 A1 US20120034794 A1 US 20120034794A1 US 201113273687 A US201113273687 A US 201113273687A US 2012034794 A1 US2012034794 A1 US 2012034794A1
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James S. Im
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Columbia University of New York
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
    • H01L21/02678—Beam shaping, e.g. using a mask
    • H01L21/0268—Shape of mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
    • H01L21/02686—Pulsed laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02656—Special treatments
    • H01L21/02664—Aftertreatments
    • H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
    • H01L21/02691—Scanning of a beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods
    • H01L27/127—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement
    • H01L27/1274—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor
    • H01L27/1285—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor using control of the annealing or irradiation parameters, e.g. using different scanning direction or intensity for different transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods
    • H01L27/1296—Multistep manufacturing methods adapted to increase the uniformity of device parameters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/903—Dendrite or web or cage technique
    • Y10S117/904—Laser beam

Definitions

  • the present invention relates to semiconductor processing techniques, and more particularly, techniques for fabricating semiconductors suitable for use as thin-film transistor (“TFT”) devices.
  • TFT thin-film transistor
  • SLS sequential lateral solidification
  • such system preferably includes an excimer laser 110 , an energy density modulator 120 to rapidly change the energy density of a laser beam 111 , a beam attenuator and shutter 130 , optics 140 , 141 , 142 and 143 , a beam homogenizer 144 , a lens and beam steering system 145 , 148 , a masking system 150 , another lens and beam steering system 161 , 162 , 163 , an incident laser pulse 164 , a thin film sample on a substrate 170 (e.g., a silicon thin film) a sample translation stage 180 , a granite block 190 , a support system 191 , 192 , 193 , 194 , 195 , 196 , and a computer 100 which manages X and Y direction translations and microtranslations of the film sample and substrate 170 .
  • a substrate 170 e.g., a silicon thin film
  • a sample translation stage 180 e.g., a silicon
  • the computer 100 directs such translations and/or microtranslations by either a movement of a mask within masking system 150 or by a movement of the sample translation stage 180 .
  • the sample 170 may be translated with respect to the laser beam 149 , either by moving the masking system 150 or the sample translation stage 180 , in order to grow crystal regions in the sample 170 .
  • FIG. 2 depicts the mask used in the continuous motion SLS process as described in International Publication No. 02/086954 (the “'954 Publication”), the entire disclosure of which is incorporated herein by reference.
  • This mask is divided into a first mask section 20 and a second mask section 22 .
  • the first mask section 20 can be used for the first pass under the laser.
  • the second mask section 22 is used on the second pass.
  • the first mask section 20 may have corresponding opaque areas 24 and clear areas 25 .
  • opaque areas are referred to as areas of the mask that prevent associated regions of a thin film sample irradiated by beams passed through the mask from being completely melted throughout its thickness
  • clear areas are areas of the mask that permit associated regions of a thin film sample irradiated by beams passed through the mask to be completely melted throughout its thickness.
  • the clear areas can be actual holes in the mask or may be sections of the mask that allow the sample behind it to be completely melted throughout its thickness.
  • the second mask section 22 also has corresponding opaque areas 26 and clear areas 27 .
  • the opaque areas 24 , 26 of both sections 20 , 22 are areas that prevent radiation from a laser source from passing through to the sample.
  • the shape of these clear areas, both in the second mask section 22 and in the first mask section 20 generally have a shape of “straight slits.”
  • the array of the clear areas 24 in the first mask section 20 are generally staggered from the array of clear areas 26 in the second mask section 22 .
  • the clear areas 25 , 27 of both sections allows radiation to pass through to melt the sample below the surface of the mask.
  • FIG. 3 depicts the radiation pattern passing through the mask of FIG. 2 during processing of the film.
  • the first pattern section 30 shows the pattern that results after the first pass of the irradiation by the pulses shaped using the mask.
  • the pulse passing through the mask may have a first portion 34 that corresponds to the pattern of the first mask section 20 .
  • the clear areas of the first mask section 20 in FIG. 2 allow the radiation to pass therethrough, and melt the thin film throughout its thickness, thus resulting in a first melted region and an unmelted region 44 (see FIG. 4 ) after the first pass of the sample processing.
  • the second pattern section 32 of FIG. 3 with the radiation pattern results after the second pass of processing the sample.
  • the pulse passing through the mask may have a second portion 36 that corresponds to the pattern of the second mask section 22 .
  • the clear areas of the second mask section 22 of the mask in FIG. 2 allow the radiation to pass therethrough, and again melt the thin film throughout its thickness. This results in a second melted region and an tunnelled region over the grain boundary 45 (see FIG. 4 ).
  • FIG. 4 depicts the resulting crystalline structure that is produced using the mask of FIG. 2 .
  • the first structure section 40 includes the structure 41 that results after the first pass of the sample processing.
  • the opaque areas of the first mask section 20 of the mask of FIG. 2 prevent the associated regions 44 from completely melting.
  • a grain boundary 45 in the direction of the crystalline structure forms approximately halfway between the associated regions 44 .
  • the second structure section 42 includes the crystalline structure 48 that results after the second pass of the sample processing.
  • the grain boundary 45 from the first pass is not removed, while the individual grains expand in length until they meet one another, because all areas are exposed to the laser during the second pass except the area that corresponds to the grain boundary 45 .
  • the grain length 46 (parallel to the direction of the crystalline structure) may be controlled by the properties and slit patterns of the mask of FIG. 2 .
  • the width 47 of the grain (perpendicular to the direction of the crystalline structure), however, is not very easily controlled. Indeed, it may be primarily dependent on the characteristics of the film.
  • the aforementioned SLS techniques typically employ a straight slit mask pattern. This allows for the ease of control of the grain length (in the direction of the primary crystallization). In such case, the perpendicular grain spacing may be dependent on the properties of the film, and thus is not very easily manipulated. While the tailoring of the shaped areas to manipulate the microstructure has been employed in other SLS methods and systems, such as with the use of chevron-shaped openings in a mask, the techniques associated therewith may produce narrow grain areas. Accordingly, there is a need to control grain length in the thin film, as well as increase the area in which a smaller number of grains are present.
  • the present invention overcomes the above-mentioned problems by providing a mask having a row of point-type areas (e.g., diamond and/or dot patterned opaque regions) provided thereon.
  • a mask having a row of point-type areas (e.g., diamond and/or dot patterned opaque regions) provided thereon.
  • Such mask pattern that uses closely spaced circular or diamond-shaped areas is utilized in lieu of the straight slits in at least a portion of the mask in order to produce a microstructure with wider grain areas.
  • Using the mask of this configuration according to the present invention advantageously affects a melt interface curvature on the evolution of grain boundaries to favorably increase the perpendicular grain boundary spacing.
  • a masking arrangement, system and process are provided for processing a thin film sample, e.g., an amorphous silicon thin film, into a polycrystalline thin film.
  • a mask can be utilized which includes a first section having at least one opaque areas arranged in a first pattern, e.g., diamond areas, oval areas, and/or round areas.
  • the first section may be configured to receive a beam pulse thereon, and produce a first modified pulse when the beam pulse is passed therethrough.
  • the first modified pulse may include at least one first portion having a pattern that corresponds to the first pattern of the first section. When the first portion is irradiated on the sample, at least one first region of the sample is prevented from being completely melted throughout its thickness.
  • the mask may also includes a second section associated with the first section, with the second section including a further area arranged in a second pattern.
  • the second section may be configured to receive a further beam pulse thereon, and produce a second modified pulse when the further beam pulse is passed therethrough.
  • the second modified pulse can include at least one second portion having a pattern that corresponds to the second pattern of the second section. When the second portion is irradiated on the sample, at least one second region of the sample irradiated by the second portion is completely melted throughout its thickness. In addition, when the first region is irradiated by the second modified pulse, the second portion of the second modified pulse completely melts the first region throughout its thickness.
  • FIG. 1 is a functional diagram of a conventional system for performing semiconductor processing including sequential lateral solidification of a thin film
  • FIG. 2 is a top view of a conventional mask
  • FIG. 3 is a schematic top view showing the radiation pattern associated with the mask of FIG. 2 ;
  • FIG. 4 is a schematic top view showing grain spacing in the processed thin film that results from use of the mask of FIG. 2 ;
  • FIG. 5 is a top view of a mask according to an exemplary embodiment according to the present invention.
  • FIG. 6 is a top view of an irradiation pattern generated by the mask of FIG. 5 ;
  • FIG. 7 is a top view of a grain spacing produced by the mask of FIG. 5 ;
  • FIG. 8 is a top view of a mask according to an exemplary embodiment according to the present invention.
  • FIG. 9 is a top view of a grain spacing produced by the mask of FIG. 8 ;
  • FIG. 10 is a flow diagram illustrating the steps according to the present invention implemented by the system of FIG. 1 .
  • This embodiment utilizes an exemplary mask pattern according to the present invention which uses preferably closely spaced circular or diamond-shaped areas in order to produce a microstructure with wider areas of limited number of grains provided therein.
  • exemplary mask pattern according to the present invention which uses preferably closely spaced circular or diamond-shaped areas in order to produce a microstructure with wider areas of limited number of grains provided therein.
  • the mask which may be used in an exemplary embodiment of the present invention may be divided into a first mask section 50 and a second mask section 52 .
  • the first mask section 50 may be used to process a selected area of the thin film as an initial shot.
  • the second mask section 52 may be used as a second shot which immediately follows the first shot.
  • the first mask section 50 may have corresponding opaque areas 54 and clear areas 55 .
  • the second mask section 52 may also have corresponding opaque areas 56 and clear areas 57 . While the shape of these opaque areas in the second mask section 52 may be in the shape of traditional “straight slits” as described herein above in FIGS.
  • the opaque areas in the first mask section 50 are preferably provided in rows of diamonds, circular shaped, and/or oval shaped areas.
  • the array of opaque areas 54 in the first mask section may be staggered from the array of opaque areas 56 in the second mask section.
  • FIG. 6 depicts the radiation pattern that may be shaped by the mask of FIG. 5 upon passing a beam pulse therethrough.
  • the first pattern section 60 includes the pattern that may result upon the first shaped pulse impacting the corresponding portions on the sample.
  • a pulse shaped by the mask may have a first portion 64 that corresponds to the pattern of the first mask section 50 .
  • the opaque mask areas 54 of the first mask section 50 in FIG. 5 may block the radiation from passing through to the thin film sample, and thus result in a first unmelted region 74 in the first pass (see FIG. 7 ).
  • the grains grow outwardly from the unirradiated areas because they seed the melted regions upon the resolidification of the melted areas.
  • the width of the resolidified regions is based on the grain growth into two opposite directions. This is because the grains grow outward from the unmelted regions, e.g., in the opposite directions thereof.
  • Parallel grain boundaries 75 are formed when the grain growth from neighboring regions produced by the pattern of the first mask section 50 impact one another. In this manner, approximately horizontal borders between resolidified regions may be formed.
  • the second pattern section 62 of FIG. 6 shows the radiation pattern that may result after the second shot irradiates the corresponding portions of the thin film.
  • a pulse passing through the mask may have a second portion 66 that corresponds to the pattern of the second mask section 52 .
  • the opaque areas 56 of the second mask section 52 of the mask in FIG. 5 may prevent the sample irradiated by pulses that are shaped by the mask from being completely melted throughout its thickness. This may result in a generation of second melted region, and an unmelted region which is provided over the unmelted grain boundary 75 (see FIG. 7 ).
  • FIG. 7 depicts the resulting crystalline structure that may develop using the mask of FIG. 5 .
  • the first structure section 70 includes a structure 71 that may be produced after irradiation thereof by the first beam pulse.
  • the opaque areas of the first section of the mask of FIG. 5 prevent the associated regions 74 from completely melting.
  • a parallel grain boundary 75 as well as a perpendicular grain boundary 73 may be formed approximately halfway between the associated regions 74 .
  • the second structure section 72 includes a crystalline structure that may be formed after the irradiation by the second beam pulse.
  • the crystal grained structures in this section 72 may grow radially outward from the associated regions 74 .
  • the parallel grain boundary 75 as well as the perpendicular grain boundary 73 produced by the irradiation with the first pulse may remain in tact while the sample is exposed to the second beam pulse shaped by the second section 52 of the mask.
  • the grain length 76 parallel to the direction of the crystalline structure
  • the grain width 77 perpendicular to the direction of the crystalline structure
  • the grain width 77 formed using the embodiment of the mask according to the present invention may be wider than the grain width 47 formed with a straight slit mask pattern, and can be controlled using the mask pattern.
  • a mask that may be used in an exemplary embodiment of the present invention may be divided into a first mask section 80 and a second mask section 82 .
  • the first mask section 80 may be used to process a selected area of the thin film as an initial shot.
  • the second mask section 82 may be used as a second shot which immediately follows the first shot.
  • the first mask section 80 may have corresponding opaque areas 84 and clear areas 85 .
  • the second mask section 82 may also have corresponding opaque areas 86 and clear areas 87 . While the shape of the opaque areas may be in both the first and second mask section may be any shape as described herein above in FIGS. 2-4 .
  • the opaque areas in the first mask section 85 are preferably provided in rows of diamonds, circular shaped, dot shaped and/or oval shaped areas.
  • the opaque areas of both the first and second mask sections are dots.
  • the array of opaque areas 84 in the first mask section maybe staggered from the array of opaque areas 86 in the second mask section.
  • FIG. 9 depicts the resulting crystalline structure that may develop using the mask of FIG. 8 .
  • the first structure section 90 includes a structure 91 that may be produced after irradiation thereof by the first beam pulse.
  • the opaque areas of the first section of the mask of FIG. 8 prevent the associated regions 94 from completely melting.
  • a parallel grain boundary 95 as well as a perpendicular grain boundary 93 may be formed approximately halfway between the associated regions 94 .
  • crostructures In one exemplary embodiment, the opaque areas of the second section 86 may be located on the edge of two islands grown from regions produced by the first pulse. In another exemplary embodiment, the opaque areas of the second section 86 may be located on the corner of four islands grown from opaque areas of the first region 84 .
  • FIG. 8 is a flow diagram illustrating the basic steps implemented in the system of FIG. 1 .
  • the various electronics of the system shown in FIG. 1 may be initialized 1000 by the computer to initiate the process.
  • a thin film sample e.g., a silicon thin film
  • the sample translation stage may be moved into an initial position 1015 , which may include an alignment with respect to reference features on the sample.
  • the various optical components of the system may be focused 1020 if necessary.
  • the laser may then be stabilized 1025 to a desired energy level and repetition rate, as needed to fully melt the sample in accordance with the particular processing to be carried out. If necessary, the attenuation of the laser pulses may be finely adjusted 1030 .
  • the shutter maybe opened 1035 to expose the sample to a single pulse of irradiation through a masking arrangement including at least one of diamond shaped areas, oval shaped areas, and round shaped areas, and accordingly, to commence the sequential lateral solidification process.
  • the sample may be translated in the horizontal direction 1040 .
  • the shutter is again opened 1045 exposing previously unmelted regions to a single pulse of irradiation.
  • the process of sample translation and irradiation 1040 , 1045 may be repeated 1060 to grow the polycrystalline region.
  • the sample is repositioned 1065 , 1066 and the crystallization process is repeated on the new region. If no further regions have been designated for crystallization, the laser is shut off 1070 , the hardware is shut down 1075 , and the process is completed 1080 .
  • steps 1005 , 1010 , and 1035 - 1065 can be repeated on each sample.

Abstract

A system, method and masking arrangement are provided of enhancing the width of polycrystalline grains produced using sequential lateral solidification using a modified mask pattern is disclosed. One exemplary mask pattern employs rows of diamond or circular shaped areas in order to control the width of the grain perpendicular to the direction of primary crystallization.

Description

    CROSS REFERENCE TO RELATED APPLICATIONS
  • This application is a divisional of 12/644,273, filed Dec. 22, 2009 which is a continuation of Ser. No. 11/373,773, filed Mar. 10, 2006, and granted under U.S. Pat. No. 7,638,728, issued Dec. 29, 2009 which is a continuation of International Application Serial No. PCT/US04/030326, filed Sep. 16, 2004, published Mar. 31, 2005, and which claims priority to U.S. Provisional Application No. 60/503,437, filed on Sep. 16, 2003, each of which are incorporated by reference in their entireties herein and from which priority is claimed.
    • FIELD OF THE INVENTION
  • The present invention relates to semiconductor processing techniques, and more particularly, techniques for fabricating semiconductors suitable for use as thin-film transistor (“TFT”) devices.
    • BACKGROUND INFORMATION
  • During the past several years, sequential lateral solidification (“SLS”) techniques have been developed to generate quality large grained polycrystalline thin films, e.g., silicon films, having a substantially uniform grain structure. For example, in U.S. Pat. No. 6,322,625, issued to Im and U.S. patent application Ser. No. 09/390,537 (the “537 application”), the entire disclosures of which are incorporated herein by reference, particularly advantageous apparatus and methods for growing large grained polycrystalline or single crystal silicon structures using energy-controllable laser pulses and small-scale translation of a silicon sample to implement sequential lateral solidification have been described. As described in these patent documents, at least portions of the semiconductor film on a substrate are irradiated with a suitable radiation pulse to completely melt such portions of the film throughout their thickness.
  • In order to increase throughput, continuous motion SLS processes have been proposed. Referring to FIG. 1., such system preferably includes an excimer laser 110, an energy density modulator 120 to rapidly change the energy density of a laser beam 111, a beam attenuator and shutter 130, optics 140, 141, 142 and 143, a beam homogenizer 144, a lens and beam steering system 145, 148, a masking system 150, another lens and beam steering system 161, 162, 163, an incident laser pulse 164, a thin film sample on a substrate 170 (e.g., a silicon thin film) a sample translation stage 180, a granite block 190, a support system 191, 192, 193, 194, 195, 196, and a computer 100 which manages X and Y direction translations and microtranslations of the film sample and substrate 170. The computer 100 directs such translations and/or microtranslations by either a movement of a mask within masking system 150 or by a movement of the sample translation stage 180. As described in U.S. Pat. No. 6,555,449 issued to Im, the entire disclosure of which is incorporated herein by reference, the sample 170 may be translated with respect to the laser beam 149, either by moving the masking system 150 or the sample translation stage 180, in order to grow crystal regions in the sample 170.
  • FIG. 2 depicts the mask used in the continuous motion SLS process as described in International Publication No. 02/086954 (the “'954 Publication”), the entire disclosure of which is incorporated herein by reference. This mask is divided into a first mask section 20 and a second mask section 22. The first mask section 20 can be used for the first pass under the laser. The second mask section 22 is used on the second pass. The first mask section 20 may have corresponding opaque areas 24 and clear areas 25. Throughout the specification of the '954 Publication and the present application, “opaque areas” are referred to as areas of the mask that prevent associated regions of a thin film sample irradiated by beams passed through the mask from being completely melted throughout its thickness, while “clear areas” are areas of the mask that permit associated regions of a thin film sample irradiated by beams passed through the mask to be completely melted throughout its thickness. The clear areas can be actual holes in the mask or may be sections of the mask that allow the sample behind it to be completely melted throughout its thickness. The second mask section 22 also has corresponding opaque areas 26 and clear areas 27. The opaque areas 24, 26 of both sections 20, 22 are areas that prevent radiation from a laser source from passing through to the sample. The shape of these clear areas, both in the second mask section 22 and in the first mask section 20, generally have a shape of “straight slits.” The array of the clear areas 24 in the first mask section 20 are generally staggered from the array of clear areas 26 in the second mask section 22. As indicated above, the clear areas 25, 27 of both sections allows radiation to pass through to melt the sample below the surface of the mask.
  • FIG. 3 depicts the radiation pattern passing through the mask of FIG. 2 during processing of the film. The first pattern section 30 shows the pattern that results after the first pass of the irradiation by the pulses shaped using the mask. The pulse passing through the mask may have a first portion 34 that corresponds to the pattern of the first mask section 20. The clear areas of the first mask section 20 in FIG. 2 allow the radiation to pass therethrough, and melt the thin film throughout its thickness, thus resulting in a first melted region and an unmelted region 44 (see FIG. 4) after the first pass of the sample processing. When the mask is translated in the direction of the arrow 33, the second pattern section 32 of FIG. 3 with the radiation pattern results after the second pass of processing the sample. The pulse passing through the mask may have a second portion 36 that corresponds to the pattern of the second mask section 22. The clear areas of the second mask section 22 of the mask in FIG. 2 allow the radiation to pass therethrough, and again melt the thin film throughout its thickness. This results in a second melted region and an tunnelled region over the grain boundary 45 (see FIG. 4).
  • FIG. 4 depicts the resulting crystalline structure that is produced using the mask of FIG. 2. The first structure section 40 includes the structure 41 that results after the first pass of the sample processing. The opaque areas of the first mask section 20 of the mask of FIG. 2 prevent the associated regions 44 from completely melting. A grain boundary 45 in the direction of the crystalline structure forms approximately halfway between the associated regions 44. The second structure section 42 includes the crystalline structure 48 that results after the second pass of the sample processing. The grain boundary 45 from the first pass is not removed, while the individual grains expand in length until they meet one another, because all areas are exposed to the laser during the second pass except the area that corresponds to the grain boundary 45. Thus, the grain length 46 (parallel to the direction of the crystalline structure) may be controlled by the properties and slit patterns of the mask of FIG. 2. The width 47 of the grain (perpendicular to the direction of the crystalline structure), however, is not very easily controlled. Indeed, it may be primarily dependent on the characteristics of the film.
  • As noted above, the aforementioned SLS techniques typically employ a straight slit mask pattern. This allows for the ease of control of the grain length (in the direction of the primary crystallization). In such case, the perpendicular grain spacing may be dependent on the properties of the film, and thus is not very easily manipulated. While the tailoring of the shaped areas to manipulate the microstructure has been employed in other SLS methods and systems, such as with the use of chevron-shaped openings in a mask, the techniques associated therewith may produce narrow grain areas. Accordingly, there is a need to control grain length in the thin film, as well as increase the area in which a smaller number of grains are present.
    • SUMMARY OF THE INVENTION
  • The present invention overcomes the above-mentioned problems by providing a mask having a row of point-type areas (e.g., diamond and/or dot patterned opaque regions) provided thereon. Such mask pattern that uses closely spaced circular or diamond-shaped areas is utilized in lieu of the straight slits in at least a portion of the mask in order to produce a microstructure with wider grain areas. Using the mask of this configuration according to the present invention advantageously affects a melt interface curvature on the evolution of grain boundaries to favorably increase the perpendicular grain boundary spacing.
  • According to one exemplary embodiment of the present invention, a masking arrangement, system and process are provided for processing a thin film sample, e.g., an amorphous silicon thin film, into a polycrystalline thin film. In particular, a mask can be utilized which includes a first section having at least one opaque areas arranged in a first pattern, e.g., diamond areas, oval areas, and/or round areas. The first section may be configured to receive a beam pulse thereon, and produce a first modified pulse when the beam pulse is passed therethrough. The first modified pulse may include at least one first portion having a pattern that corresponds to the first pattern of the first section. When the first portion is irradiated on the sample, at least one first region of the sample is prevented from being completely melted throughout its thickness. The mask may also includes a second section associated with the first section, with the second section including a further area arranged in a second pattern. The second section may be configured to receive a further beam pulse thereon, and produce a second modified pulse when the further beam pulse is passed therethrough. The second modified pulse can include at least one second portion having a pattern that corresponds to the second pattern of the second section. When the second portion is irradiated on the sample, at least one second region of the sample irradiated by the second portion is completely melted throughout its thickness. In addition, when the first region is irradiated by the second modified pulse, the second portion of the second modified pulse completely melts the first region throughout its thickness.
  • The accompanying drawings, which are incorporated and constitute part of this disclosure, illustrate preferred embodiments of the invention and serve to explain the principles of the invention.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a functional diagram of a conventional system for performing semiconductor processing including sequential lateral solidification of a thin film;
  • FIG. 2 is a top view of a conventional mask;
  • FIG. 3 is a schematic top view showing the radiation pattern associated with the mask of FIG. 2;
  • FIG. 4 is a schematic top view showing grain spacing in the processed thin film that results from use of the mask of FIG. 2;
  • FIG. 5 is a top view of a mask according to an exemplary embodiment according to the present invention;
  • FIG. 6 is a top view of an irradiation pattern generated by the mask of FIG. 5;
  • FIG. 7 is a top view of a grain spacing produced by the mask of FIG. 5;
  • FIG. 8 is a top view of a mask according to an exemplary embodiment according to the present invention;
  • FIG. 9 is a top view of a grain spacing produced by the mask of FIG. 8; and
  • FIG. 10 is a flow diagram illustrating the steps according to the present invention implemented by the system of FIG. 1.
    •
  • Throughout the Figs., the same reference numerals and characters, unless otherwise stated, are used to denote like features, elements, components or portions of the illustrated embodiments. Moreover, while the present invention will now be described in detail with reference to the Figs., it is done so in connection with the illustrative embodiments.
    • DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
  • Referring to FIGS. 5-7, a presently preferred embodiment of the present invention will be described. This embodiment utilizes an exemplary mask pattern according to the present invention which uses preferably closely spaced circular or diamond-shaped areas in order to produce a microstructure with wider areas of limited number of grains provided therein. Those skilled in the art should understand that the systems, methods, and masks according to the present invention are applicable not only to single-shot motion SLS processes and systems, but also to thin films that have been processed with n-shot and 2n-shot SLS techniques.
  • Referring to FIG. 5, the mask which may be used in an exemplary embodiment of the present invention may be divided into a first mask section 50 and a second mask section 52. Alternatively, two separate masks may be used instead of separate sections in one mask. The first mask section 50 may be used to process a selected area of the thin film as an initial shot. The second mask section 52 may be used as a second shot which immediately follows the first shot. The first mask section 50 may have corresponding opaque areas 54 and clear areas 55. The second mask section 52 may also have corresponding opaque areas 56 and clear areas 57. While the shape of these opaque areas in the second mask section 52 may be in the shape of traditional “straight slits” as described herein above in FIGS. 2-4, the opaque areas in the first mask section 50 are preferably provided in rows of diamonds, circular shaped, and/or oval shaped areas. The array of opaque areas 54 in the first mask section may be staggered from the array of opaque areas 56 in the second mask section.
  • FIG. 6 depicts the radiation pattern that may be shaped by the mask of FIG. 5 upon passing a beam pulse therethrough. In particular, the first pattern section 60 includes the pattern that may result upon the first shaped pulse impacting the corresponding portions on the sample. A pulse shaped by the mask may have a first portion 64 that corresponds to the pattern of the first mask section 50. The opaque mask areas 54 of the first mask section 50 in FIG. 5 may block the radiation from passing through to the thin film sample, and thus result in a first unmelted region 74 in the first pass (see FIG. 7). As shown in FIG. 7, the grains grow outwardly from the unirradiated areas because they seed the melted regions upon the resolidification of the melted areas. Thus, the width of the resolidified regions is based on the grain growth into two opposite directions. This is because the grains grow outward from the unmelted regions, e.g., in the opposite directions thereof. Parallel grain boundaries 75, as shown in FIG. 7, are formed when the grain growth from neighboring regions produced by the pattern of the first mask section 50 impact one another. In this manner, approximately horizontal borders between resolidified regions may be formed. When the mask is shifted in the direction of the arrow 63, the beam is translated and/or the sample may be translated in the opposite direction of the arrow 63 by the translation stage, the second pattern section 62 of FIG. 6 shows the radiation pattern that may result after the second shot irradiates the corresponding portions of the thin film. In particular, a pulse passing through the mask may have a second portion 66 that corresponds to the pattern of the second mask section 52. The opaque areas 56 of the second mask section 52 of the mask in FIG. 5 may prevent the sample irradiated by pulses that are shaped by the mask from being completely melted throughout its thickness. This may result in a generation of second melted region, and an unmelted region which is provided over the unmelted grain boundary 75 (see FIG. 7).
  • FIG. 7 depicts the resulting crystalline structure that may develop using the mask of FIG. 5. The first structure section 70 includes a structure 71 that may be produced after irradiation thereof by the first beam pulse. The opaque areas of the first section of the mask of FIG. 5 prevent the associated regions 74 from completely melting. A parallel grain boundary 75 as well as a perpendicular grain boundary 73 may be formed approximately halfway between the associated regions 74. The second structure section 72 includes a crystalline structure that may be formed after the irradiation by the second beam pulse. The crystal grained structures in this section 72 may grow radially outward from the associated regions 74. The parallel grain boundary 75 as well as the perpendicular grain boundary 73 produced by the irradiation with the first pulse may remain in tact while the sample is exposed to the second beam pulse shaped by the second section 52 of the mask. Thus, the grain length 76 (parallel to the direction of the crystalline structure) as well as the grain width 77 (perpendicular to the direction of the crystalline structure) may be controllable by the properties of the mask (e.g. pattern), rather than merely being dependent on the characteristics of the film. The grain width 77 formed using the embodiment of the mask according to the present invention may be wider than the grain width 47 formed with a straight slit mask pattern, and can be controlled using the mask pattern.
  • Referring to FIG. 8, a mask that may be used in an exemplary embodiment of the present invention may be divided into a first mask section 80 and a second mask section 82. Alternatively, two separate masks may be used instead of separate sections in one mask. The first mask section 80 may be used to process a selected area of the thin film as an initial shot. The second mask section 82 may be used as a second shot which immediately follows the first shot. The first mask section 80 may have corresponding opaque areas 84 and clear areas 85. The second mask section 82 may also have corresponding opaque areas 86 and clear areas 87. While the shape of the opaque areas may be in both the first and second mask section may be any shape as described herein above in FIGS. 2-4. The opaque areas in the first mask section 85 are preferably provided in rows of diamonds, circular shaped, dot shaped and/or oval shaped areas. In one exemplary embodiment, as shown in FIG. 8, the opaque areas of both the first and second mask sections are dots. Optionally, the array of opaque areas 84 in the first mask section maybe staggered from the array of opaque areas 86 in the second mask section.
  • FIG. 9 depicts the resulting crystalline structure that may develop using the mask of FIG. 8. The first structure section 90 includes a structure 91 that may be produced after irradiation thereof by the first beam pulse. The opaque areas of the first section of the mask of FIG. 8 prevent the associated regions 94 from completely melting. A parallel grain boundary 95 as well as a perpendicular grain boundary 93 may be formed approximately halfway between the associated regions 94. crostructures. In one exemplary embodiment, the opaque areas of the second section 86 may be located on the edge of two islands grown from regions produced by the first pulse. In another exemplary embodiment, the opaque areas of the second section 86 may be located on the corner of four islands grown from opaque areas of the first region 84.
  • Referring next to FIG. 10, the steps executed by a computer to control the crystal growth process implemented with respect to FIG. 7 will be described. FIG. 8 is a flow diagram illustrating the basic steps implemented in the system of FIG. 1. The various electronics of the system shown in FIG. 1 may be initialized 1000 by the computer to initiate the process. A thin film sample, e.g., a silicon thin film, may then be loaded onto the sample translation stage 1005. It should be noted that such loading may be either manual or robotically implemented under the control of computer 100. Next, the sample translation stage may be moved into an initial position 1015, which may include an alignment with respect to reference features on the sample. The various optical components of the system may be focused 1020 if necessary. The laser may then be stabilized 1025 to a desired energy level and repetition rate, as needed to fully melt the sample in accordance with the particular processing to be carried out. If necessary, the attenuation of the laser pulses may be finely adjusted 1030.
  • Next, the shutter maybe opened 1035 to expose the sample to a single pulse of irradiation through a masking arrangement including at least one of diamond shaped areas, oval shaped areas, and round shaped areas, and accordingly, to commence the sequential lateral solidification process. The sample may be translated in the horizontal direction 1040. The shutter is again opened 1045 exposing previously unmelted regions to a single pulse of irradiation. The process of sample translation and irradiation 1040, 1045 may be repeated 1060 to grow the polycrystalline region.
  • Next, if other regions on the sample have been designated for crystallization, the sample is repositioned 1065, 1066 and the crystallization process is repeated on the new region. If no further regions have been designated for crystallization, the laser is shut off 1070, the hardware is shut down 1075, and the process is completed 1080. Of course, if processing of additional samples is desired or if the present invention is utilized for batch processing, steps 1005, 1010, and 1035-1065 can be repeated on each sample.
  • The foregoing merely illustrates the principles of the invention. Various modifications and alterations to the described embodiments will be apparent to those skilled in the art in view of the teachings herein. It will thus be appreciated that those skilled in the art will be able to devise numerous systems and methods which, although not explicitly shown or described herein, embody the principles of the invention and are thus within the spirit and scope of the invention.

Claims (24)

1. A masking arrangement for processing a thin film sample comprising:
a first section which includes at least one opaque area arranged in a first pattern, the first section is configured to receive at least one beam pulse thereon, and produce at least one first modified pulse when the at least one beam pulse is passed therethrough, the at least one first modified pulse including at least one first portion having a pattern that corresponds to the first pattern of the first section, wherein, when the first portion is irradiated on the sample, at least one first region of the sample is prevented from being completely melted throughout its thickness; and
a second section associated with the first section, the second section including a further area arranged in a second pattern, the second section being configured to receive at least one further beam pulse thereon, and produce at least one second modified pulse when the at least one further beam pulse is passed therethrough, the at least one second modified pulse including at least one second portion having a pattern that corresponds to the second pattern of the second section, wherein, when the second portion is irradiated on the sample, at least one second region of the sample irradiated by the second portion is completely melted throughout its thickness, wherein when the first region is irradiated by the at least one second modified pulse, the second portion of the at least one second modified pulse completely melts the at least one first region throughout its thickness.
2. The masking arrangement as in claim 1, wherein at least one of the first pattern and the second pattern comprises at least one of diamond areas, oval areas, dot areas and round areas.
3. The masking arrangement as in claim 1, wherein,
the first pattern extends approximately along a first horizontal axis, the first pattern having a width measured along the vertical axis,
a second area of the second section extends approximately along the first horizontal axis, the second section being configured to permit the at least one first region to be completely melted throughout its thickness by the second modified pulse, the second area being offset horizontally from the first pattern, the second area having a width measured in the vertical axis that is at least equal to the width of the first pattern, and
the second pattern extends approximately along a second horizontal axis and vertically offset from the first horizontal axis, wherein the second pattern is configured to prevent at least one third region of the sample from being completely melted throughout its thickness.
4. A masking arrangement as in claim 3, wherein the first section includes
at least one further opaque area arranged in a third pattern extending approximately along a third horizontal axis,
wherein the third horizontal axis is vertically offset from the first horizontal axis,
wherein the third pattern is substantially aligned vertically with the first pattern,
wherein the third pattern is configured to prevent at least one fourth region of the sample from being completely melted throughout its thickness,
wherein a position of the third horizontal axis is such that the second horizontal axis is between the first horizontal axis and the third horizontal axis.
5. The masking arrangement as in claim 4, wherein the third pattern comprises at least one of diamond areas, oval areas, dot areas and round areas.
6. The masking arrangement of claim 3, wherein the second horizontal axis extends approximately along a centerline in between the first and third horizontal axes.
7. The masking arrangement of claim 4, wherein,
elements of the first pattern are approximately equidistant from other elements of the first pattern, and
elements of the third pattern are approximately equidistant from other elements of the third pattern.
8. The mask arrangement of claim 1, wherein the second pattern comprises one or more substantially parallel lines.
9. A method for processing a thin film sample, comprising the steps of:
providing at least one beam on a first section of a masking arrangement to produce at least one first modified pulse when the at least one beam is passed therethrough, the first section which includes at least one opaque area arranged in a first pattern, the at least one first modified pulse including at least one first portion having a pattern that corresponds to the first pattern, wherein, when the first portion is irradiated on the sample, at least one first region of the sample is prevented from being completely melted throughout its thickness;
based on the dimensions of the masking arrangement, translating at least one of the thin film sample and the beam relative to the other one of the thin film sample and the beam; and
providing at least one further beam on a second section of a masking arrangement to produce at least one second modified pulse when the at least one further beam is passed therethrough, the second section associated with the first section, the second section including a further area arranged in a second pattern, the at least one second modified pulse including at least one second portion having a pattern that corresponds to the second pattern, wherein, when the second portion is irradiated on the sample, at least one second region of the sample irradiated by the second portion is completely melted throughout its thickness; wherein, when the first region is irradiated by the at least one second modified pulse, the second portion of the at least one second modified pulse completely melts the at least one first region throughout its thickness.
10. The method of claim 9, wherein at least one of the first pattern and the second pattern comprises at least one of diamond areas, oval areas, dot areas and round areas.
11. The method of claim 9, wherein,
the first pattern extends approximately along a first horizontal axis, the first pattern having a width measured along the vertical axis,
a second area of the second section extends approximately along the first horizontal axis, the second section being configured to permit the at least one first region to be completely melted throughout its thickness by the at least one second modified pulse, the second area being offset horizontally from the first pattern, the second area having a width measured in the vertical axis that is at least equal to the width of the first pattern, and
the second pattern extends approximately along a second horizontal axis and vertically offset from the first horizontal axis, wherein the second pattern is configured to prevent at least one third region of the sample from being completely melted throughout its thickness.
12. The method of claim 11, wherein the first section includes
at least one further opaque area in a third pattern extending approximately along a third horizontal axis,
wherein the third horizontal axis is vertically offset from the first horizontal axis,
wherein the third pattern is substantially aligned vertically with the first pattern,
wherein the third pattern is configured to prevent at least one fourth region of the sample from being completely melted throughout its thickness,
wherein a position of the third horizontal axis is such that the second horizontal axis is between the first horizontal axis and the third horizontal axis.
13. The method of claim 12, wherein the third pattern comprises at least one of diamond areas, oval areas, dot areas and round areas.
14. The method of claim 11, wherein the second horizontal axis is approximately along a centerline in between the first and third horizontal axes.
15. The method of claim 12, wherein,
elements of the first pattern are approximately equidistant from other elements of the first pattern, and
elements of the third pattern are approximately equidistant from other elements of the third pattern.
16. The method of claim 9, wherein the second pattern comprises one or more substantially parallel lines.
17. A system for processing a thin film sample, comprising:
a mask,
a processor to activate a device to irradiate through the mask, the processor being configured to perform the steps of:
providing at least one beam on a first section of a masking arrangement to produce at least one first modified pulse when the at least one beam is passed therethrough, the first section which includes at least one opaque area arranged in a first pattern, the at least one first modified pulse including at least one first portion having a pattern that corresponds to the first pattern, wherein, when the first portion is irradiated on the sample, at least one first region of the sample is prevented from being completely melted throughout its thickness, based on the dimensions of the masking arrangement, translating at least one of the thin film sample and the beam relative to the other one of the thin film sample and the beam, and
providing at least one further beam on a second section of a masking arrangement to produce at least one second modified pulse when the at least one further beam is passed therethrough, the second section associated with the first section, the second section including a further area arranged in a second pattern, the at least one second modified pulse including at least one second portion having a pattern that corresponds to the second pattern, wherein, when the second portion is irradiated on the sample, at least one second region of the sample irradiated by the second portion is completely melted throughout its thickness; wherein, when the first region is irradiated by the at least one second modified pulse, the second portion of the at least one second modified pulse completely melts the at least one first region throughout its thickness.
18. The system of claim 17, wherein at least one of the first pattern and the second pattern comprises at least one of diamond areas, oval areas, dot areas and round areas.
19. The system of claim 17, wherein,
the first pattern extends approximately along a first horizontal axis, the first pattern having a width measured along the vertical axis,
a second area of the second section extends approximately along the first horizontal axis, the second section being configured to permit the at least one first region to be completely melted throughout its thickness by the at least one second modified pulse, the second area being offset horizontally from the first pattern, the second area having a width measured in the vertical axis that is at least equal to the width of the first pattern, and
the second pattern extends approximately along a second horizontal axis and vertically offset from the first horizontal axis, wherein the second pattern is configured to prevent at least one third region of the sample from being completely melted throughout its thickness.
20. The system of claim 19, wherein the first section includes
at least one further opaque area extending in a third pattern approximately along a third horizontal axis,
wherein the third horizontal axis is vertically offset from the first horizontal axis,
wherein the third pattern is substantially aligned vertically with the first pattern,
wherein the third pattern is configured to prevent at least one fourth region of the sample from being completely melted throughout its thickness,
wherein a position of the third horizontal axis is such that the second horizontal axis is between the first horizontal axis and the third horizontal axis.
21. The system of claim 20, wherein the third pattern comprises at least one of diamond areas, oval areas, dot areas and round areas.
22. The system of claim 20, wherein the second horizontal axis is approximately along a centerline in between the first and third horizontal axes.
23. The system of claim 22, wherein,
elements of the first pattern are approximately equidistant from other elements of the first pattern, and
elements of the third pattern are approximately equidistant from other elements of the third pattern.
24. The system of claim 19, wherein the second pattern comprises one or more substantially parallel lines.
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US8063338B2 (en) 2011-11-22

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