US20140026658A1 - Mems device and a method of using the same - Google Patents

Mems device and a method of using the same Download PDF

Info

Publication number
US20140026658A1
US20140026658A1 US13/935,557 US201313935557A US2014026658A1 US 20140026658 A1 US20140026658 A1 US 20140026658A1 US 201313935557 A US201313935557 A US 201313935557A US 2014026658 A1 US2014026658 A1 US 2014026658A1
Authority
US
United States
Prior art keywords
magnetic
magnetic field
sensor
layer
angular velocity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US13/935,557
Inventor
Biao Zhang
Tao Ju
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/854,972 external-priority patent/US20140290365A1/en
Application filed by Individual filed Critical Individual
Priority to US13/935,557 priority Critical patent/US20140026658A1/en
Publication of US20140026658A1 publication Critical patent/US20140026658A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/105Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by magnetically sensitive devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B5/00Devices comprising elements which are movable in relation to each other, e.g. comprising slidable or rotatable elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00349Creating layers of material on a substrate
    • B81C1/00357Creating layers of material on a substrate involving bonding one or several substrates on a non-temporary support, e.g. another substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C3/00Assembling of devices or systems from individually processed components
    • B81C3/001Bonding of two components
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5705Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
    • G01C19/5712Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis the devices involving a micromechanical structure
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01CMEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5776Signal processing not specific to any of the devices covered by groups G01C19/5607 - G01C19/5719
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/091Constructional adaptation of the sensor to specific applications
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/093Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/098Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0174Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
    • B81C2201/0197Processes for making multi-layered devices not provided for in groups B81C2201/0176 - B81C2201/0192
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/03Bonding two components
    • B81C2203/038Bonding techniques not provided for in B81C2203/031 - B81C2203/037

Definitions

  • the technical field of the examples to be disclosed in the following sections is related generally to the art of operation of microstructures, and, more particularly, to operation of MEMS devices comprising MEMS magnetic sensing structures.
  • Microstructures such as microelectromechanical (hereafter MEMS) devices (e.g. accelerometers, DC relay and RF switches, optical cross connects and optical switches, microlenses, reflectors and beam splitters, filters, oscillators and antenna system components, variable capacitors and inductors, switched banks of filters, resonant comb-drives and resonant beams, and micromirror arrays for direct view and projection displays) have many applications in basic signal transduction. For example, a MEMS gyroscope measures angular rate.
  • MEMS microelectromechanical
  • a gyroscope (hereafter “gyro” or “gyroscope”) is based on the Coriolis effect as diagrammatically illustrated in FIG. 1 .
  • Proof-mass 100 is moving with velocity V d .
  • the Coriolis effect causes movement of the poof-mass ( 100 ) with velocity V s .
  • V d With fixed V d , the external angular velocity can be measured from V d .
  • a typical example based on the theory shown in FIG. 1 is capacitive MEMS gyroscope, as diagrammatically illustrated in FIG. 2 .
  • the MEMS gyro is a typical capacitive MEMS gyro, which has been widely studied. Regardless of various structural variations, the capacitive MEMS gyro in FIG. 2 includes the very basic theory based on which all other variations are built.
  • capacitive MEMS gyro 102 is comprised of proof-mass 100 , driving mode 104 , and sensing mode 102 .
  • the driving mode ( 104 ) causes the proof-mass ( 100 ) to move in a predefined direction, and such movement is often in a form of resonance vibration. Under external angular rotation, the proof-mass ( 100 ) also moves along the V s direction with velocity V s .
  • Such movement of V s is detected by the capacitor structure of the sensing mode ( 102 ).
  • Both of the driving and sensing modes use capacitive structures, whereas the capacitive structure of the driving mode changes the overlaps of the capacitors, and the capacitive structure of the sensing mode changes the gaps of the capacitors.
  • a method of measuring an angular velocity by using a MEMS gyroscope comprising: generating a magnetic field that is associated with a movement of a proof-mass of the MEMS gyroscope, wherein the magnetic field varies at a location of a magnetic sensor; detecting the variation of the magnetic field by the magnetic sensor; and extracting the angular velocity from the variation of the magnetic field.
  • a method of detecting a target angular velocity comprising: providing a MEMS gyroscope that comprises a movable proof-mass, a magnetic source, and a magnetic sensor, wherein the proof-mass is capable of moving in response to the target angular velocity under the Coriolis effect, and wherein the magnetic source is capable of generating a magnetic field that varies with the movement of the proof-mass, and wherein the magnetic sensor is capable of detecting the magnetic field from the magnetic source; generating the magnetic field by the magnetic source; detecting a variation of the magnetic field by the magnetic sensor; and extracting the angular velocity from the variation of the magnetic field.
  • a method of measuring an angular velocity by using a MEMS gyroscope comprising: detecting a background magnetic signal by a reference magnetic sensor of the MEMS gyroscope; locking the state of the reference sensor after the detection of the background magnetic signal; generating a magnetic field by a magnetic source whose movement is associated with a proof-mass of the MEMS gyroscope; detecting the magnetic field from the magnetic source by a signal sensor; and calculating the angular velocity from the detected magnetic field.
  • FIG. 1 diagrammatically illustrates the Coriolis effect in a MEMS structure
  • FIG. 2 is a top view of a typical existing capacitive MEMS gyroscope having a driving mode and a sensing mode, wherein both of the driving and sensing mode utilize capacitance structures;
  • FIG. 3 illustrates an exemplary MEMS gyroscope having a magnetic sensing mechanism
  • FIG. 4 illustrates a top view of a portion of an exemplary implementation of the MEMS gyroscope illustrated in FIG. 3 , wherein the MEMS gyroscope illustrated in FIG. 4 having a capacitive driving mode and a magnetic sensing mechanism;
  • FIG. 5 illustrates a perspective view of a portion of another exemplary implementation of the MEMS gyroscope illustrated in FIG. 3 , wherein the MEMS gyroscope illustrated in FIG. 5 having a magnetic driving mechanism for the driving mode and a magnetic sensing mechanism for the sensing mode
  • FIG. 6 illustrates an exemplary magnetic driving mechanism of the MEMS gyroscope in FIG. 5 ;
  • FIG. 7 illustrates an exemplary magnetic source of the MEMS gyroscope illustrated in FIG. 3 ;
  • FIG. 8 illustrates an exemplary magnetic sensing mechanism that can be used in the MEMS gyroscope illustrated in FIG. 3 ;
  • FIG. 9 shows an exemplary thin-film stack that can be configured into a CIP or CPP structure for use in the magnetic sensing mechanism illustrated in FIG. 8 ;
  • FIG. 10 illustrates an exemplary MEMS gyroscope that comprises multiple magnetic sensing structures
  • FIG. 11 illustrates an exemplary operation for detecting and measuring an angular velocity using a MEMS gyroscope illustrated in FIG. 3 ;
  • FIG. 12 illustrates temperature dependence of the coercivity of a ferromagnetic thin film, wherein the ferromagnetic thin film can be used in the signal sensor illustrated in FIG. 3 ;
  • FIG. 13 illustrates temperature dependence of the coercivity of a ferromagnetic thin film, wherein the ferromagnetic thin film can be used in the signal sensor illustrated in FIG. 3 ;
  • FIG. 14 illustrates the temperature dependence of the magnetic exchange field between a pining layer and a free layer, wherein the pinning layer and the free layer can be used in the signal sensor illustrated in FIG. 3 .
  • MEMS gyroscope Disclosed herein is a MEMS gyroscope and method of using the same for sensing an angular velocity, wherein the MEMS gyroscope utilizes a magnetic sensing mechanism.
  • MEMS gyroscope utilizes a magnetic sensing mechanism.
  • MEMS gyroscope 106 comprises magnetic sensing mechanism 114 for sensing the target angular velocity through the measurement of proof-mass 112 .
  • MEMS gyroscope 106 comprises mass-substrate 108 and sensor substrate 110 .
  • Mass-substrate 108 comprises proof-mass 112 that is capable of responding to an angular velocity.
  • the two substrates ( 108 and 110 ) are spaced apart, for example, by a pillar (not shown herein for simplicity) such that at least the proof-mass ( 112 ) is movable in response to an angular velocity under the Coriolis effect.
  • the movement of the proof-mass ( 112 ) and thus the target angular velocity can be measured by magnetic sensing mechanism 114 .
  • the magnetic sensing mechanism ( 114 ) in this example comprises a magnetic source 116 and magnetic sensor 118 .
  • the magnetic source ( 116 ) generates a magnetic field
  • the magnetic sensor ( 118 ) detects the magnetic field and/or the magnetic field variations that is generated by the magnetic source ( 116 ).
  • the magnetic source is placed on/in the proof-mass ( 112 ) and moves with the proof-mass ( 112 ).
  • the magnetic sensor ( 118 ) is placed on/in the sensor substrate ( 120 ) and non-movable relative to the moving proof-mass ( 112 ) and the magnetic source ( 116 ). With this configuration, the movement of the proof-mass ( 112 ) can be measured from the measurement of the magnetic field from the magnetic source ( 116 ).
  • the magnetic source ( 116 ) can be placed on/in the sensor substrate ( 120 ); and the magnetic sensor ( 118 ) can be placed on/in the proof-mass ( 112 ).
  • MEMS gyroscope illustrated in FIG. 3 can also be used as an accelerometer.
  • the MEMS gyroscope as discussed above with reference to FIG. 3 can be implemented in many ways, one of which is illustrated in FIG. 4 .
  • the proof-mass ( 120 ) is driven by capacitive, such as capacitive comb.
  • the sensing mode is performed using the magnetic sensing mechanism illustrated in FIG. 3 . For this reason, capacitive combs can be absent from the proof-mass ( 120 ).
  • the proof-mass can be driven by magnetic force, an example of which is illustrated in FIG. 5 .
  • the mass substrate ( 108 ) comprises a movable proof-mass ( 126 ) that is supported by flexible structures such as flexures 128 , 129 , and 130 .
  • the layout of the flexures enables the proof-mass to move in a plane substantially parallel to the major planes of mass substrate 108 .
  • the flexures enables the proof-mass to move along the length and the width directions, wherein the length direction can be the driving mode direction and the width direction can be the sensing mode direction of the MEMS gyro device.
  • the proof-mass ( 126 ) is connected to frame 132 through flexures ( 128 , 129 , and 130 ).
  • the frame ( 132 ) is anchored by non-movable structures such as pillar 134 .
  • the mass-substrate ( 108 ) and sensing substrate 110 are spaced apart by the pillar ( 134 ).
  • the proof-mass ( 112 ) in this example is driving by a magnetic driving mechanism ( 136 ).
  • the proof-mass ( 126 ) can move (e.g. vibrate) in the driving mode under magnetic force applied by magnetic driving mechanism 136 , which is better illustrated in FIG. 6 .
  • the magnetic driving mechanism 136 comprise a magnet core 138 surrounded by coil 140 .
  • an alternating magnetic field can be generated from the coil 140 .
  • the alternating magnetic field applies magnetic force to the magnet core 140 so as to move the magnet core.
  • the magnet core thus moves the proof-mass.
  • the magnetic source ( 114 ) of the MEMS gyroscope ( 106 ) illustrated in FIG. 3 can be implemented in many ways, one of which is illustrated in FIG. 7 .
  • conductive wire 142 is displaced on/in proof-mass 112 .
  • conductive wire 142 can be placed on the lower surface of the proof-mass ( 112 ), wherein the lower surface is facing the magnetic sensors ( 118 in FIG. 3 ) on the sensor substrate ( 110 , in FIG. 3 ).
  • the conductive wire ( 142 ) can be placed on the top surface of the proof-mass ( 112 ), i.e.
  • the conductive wire ( 142 ) can be placed inside the proof-mass, e.g. laminated or embedded inside the proof-mass ( 112 ), which will not be detailed herein as those examples are obvious to those skilled in the art of the related technical field.
  • the conductive wire ( 142 ) can be implemented in many suitable ways, one of which is illustrated in FIG. 7 .
  • the conductive wire ( 142 ) comprises a center conductive segment 146 and tapered contacts 144 and 148 that extend the central conductive segment to terminals, through the terminals of which current can be driven through the central segment.
  • the conductive wire ( 142 ) may have other configurations.
  • the contact tapered contacts ( 144 and 148 ) and the central segment ( 146 ) maybe U-shaped such that the tapered contacts may be substantially parallel but are substantially perpendicular to the central segment, which is not shown for its obviousness.
  • the magnetic sensor ( 118 ) illustrated in FIG. 3 can be implemented to comprise a reference sensor ( 150 ) and a signal sensor ( 152 ) as illustrated in FIG. 8 .
  • magnetic senor 118 on/in sensor substrate 120 comprises reference sensor 150 and signal sensor 152 .
  • the reference sensor ( 150 ) can be designated for dynamically measuring the magnetic signal background in which the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7 ) co-exists.
  • the signal sensor ( 152 ) can be designated for dynamically measuring the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7 ).
  • the signal sensor ( 152 ) can be designated for dynamically measuring the magnetic signal background in which the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7 ) co-exists, while the signal sensor ( 150 ) can be designated for dynamically measuring the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7 ).
  • the reference sensor ( 150 ) and the signal sensor ( 152 ) preferably comprise magneto-resistors, such as AMRs, giant-magneto-resistors (such as spin-valves, hereafter SV), or tunneling-magneto-resistors (TMR).
  • AMRs magneto-resistors
  • giant-magneto-resistors such as spin-valves, hereafter SV
  • tunneling-magneto-resistors TMR
  • FIG. 9 illustrates a magneto-resistor structure, which can be configured into CIP (current-in-plane, such as a spin-valve) or a CPP (current-perpendicular-to-plane, such as TMR structure).
  • CIP current-in-plane
  • CPP current-perpendicular-to-plane, such as TMR structure
  • the magneto-resistor stack comprises top pin-layer 154 , free-layer 156 , spacer 158 , reference layer 160 , bottom pin layer 162 , and substrate 120 .
  • Top pin layer 154 is provided for magnetically pinning free layer 156 .
  • the top pin layer can be comprised of IrMn, PtMn or other suitable magnetic materials.
  • the free layer ( 156 ) can be comprised of a ferromagnetic material, such as NiFe, CoFe, CoFeB, or other suitbale materials or the combinations thereof.
  • the spacer ( 158 ) can be comprised of a non-magnetic conductive material, such as Cu, or an oxide material, such as Al 2 O 3 or MgO or other suitable materials.
  • the reference layer ( 160 ) can be comprised of a ferromagnetic magnetic material, such as NiFe, CoFe, CoFeB, or other materials or the combinations thereof.
  • the bottom pin layer ( 162 ) is provided for magnetic pinning the reference layer ( 160 ), which can be comprised of a IrMn, PtMn or other suitable materials or the combinations thereof.
  • the substrate ( 120 ) can be comprised of any suitable materials, such as glass, silicon, or other materials or the combinations thereof.
  • the magneto-resistor ( 118 ) stack can be configured into a CIP structure (i.e. spin-valve, SV), wherein the current is driven in the plane of the stack layers.
  • the spacer ( 158 ) is comprised of an oxide such as Al 2 O 3 , MgO or the like
  • the magneto-resistor stack ( 118 ) can be configured into a CPP structure (i.e. TMR), wherein the current is driven perpendicularly to the stack layers.
  • the free layer ( 156 ) is magnetically pinned by the top pin layer ( 154 ), and the reference layer ( 160 ) is also magnetically pinned by bottom pin layer 162 .
  • the top pin layer ( 154 ) and the bottom pin layer ( 162 ) preferably having different blocking temperatures.
  • a blocking temperature is referred to as the temperature, above which the magnetic pin layer is magnetically decoupled with the associated pinned magnetic layer.
  • the top pin layer ( 154 ) is magnetically decoupled with the free layer ( 156 ) above the blocking temperature T B of the top pin layer ( 154 ) such that the free layer ( 156 ) is “freed” from the magnetic pinning of top pin layer ( 154 ).
  • the free layer ( 156 ) is magnetically pinned by the top pin layer ( 154 ) such that the magnetic orientation of the free layer ( 156 ) is substantially not affected by the external magnetic field.
  • the bottom pin layer ( 162 ) is magnetically decoupled with the reference layer ( 160 ) above the blocking temperature T B of the bottom pin layer ( 162 ) such that the reference layer ( 160 ) is “freed” from the magnetic pinning of bottom pin layer ( 162 ).
  • the reference layer ( 160 ) is magnetically pinned by the bottom pin layer ( 162 ) such that the magnetic orientation of the reference layer ( 162 ) is substantially not affected by the external magnetic field.
  • the top and bottom pin layers ( 154 and 162 , respectively) preferably have different blocking temperatures.
  • the reference layer ( 160 ) preferably remains being pinned by the bottom pin layer ( 162 ).
  • the reference layer ( 160 ) can be “freed” from being pinned by the bottom pin layer ( 162 ).
  • the reference layer ( 160 ) can be used as a “sensing layer” for responding to the external magnetic field such as the target magnetic field, while the free layer ( 156 ) is used as a reference layer to provide a reference magnetic orientation.
  • the different blocking temperatures can be accomplished by using different magnetic materials for the top pin layer ( 154 ) and bottom pin layer ( 162 ).
  • the top pin layer ( 154 ) can be comprised of IrMn, while the bottom pin layer ( 162 ) can be comprised of PtMn, vice versa.
  • both of the top and bottom pin layers ( 154 and 162 ) may be comprised of the same material, such as IrMn or PtMn, but with different thicknesses such that they have different blocking temperatures.
  • the magneto-resistor stack ( 118 ) is configured into sensors for sensing magnetic signals. As such, the magnetic orientations of the free layer ( 156 ) and the reference layer ( 160 ) are substantially perpendicular at the initial state. Other layers, such as protective layer Ta, seed layers for growing the stack layers on substrate 120 can be provided. It is further noted that the magnetic stack layers ( 118 ) illustrated in FIG. 9 are what is often referred to as “bottom pin” configuration in the field of art. In other examples, the stack can be configured into what is often referred as “top pinned” configuration in the field of art, which will not be detailed herein.
  • multiple magnetic sensing mechanisms can be provided, an example of which is illustrated in FIG. 10 .
  • magnetic sensing mechanisms 116 and 164 are provided for detecting the movements of proof-mass 112 .
  • the multiple magnetic sensing mechanisms can be used for detecting the movements of proof-mass 112 in driving mode and sensing mode respectively.
  • the multiple magnetic sensing mechanisms 116 and 164 can be provided for detecting the same modes (e.g. the driving mode and/or the sensing mode).
  • FIG. 11 shows an exemplary operation method of measuring a target magnetic field (e.g. from the wire 146 as illustrated in FIG. 7 ) by using the magnetic sensor ( 118 as illustrated in FIG. 8 ).
  • the wire can be set to the OFF state by not driving a current through the wire at the initial time T 0 .
  • the reference sensor can be set to the ON state.
  • the ON state of the reference sensor can be achieved through “freeing” the free layer of the reference sensor by raising the temperature of the pin layer that pins the free layer of the reference sensor above its blocking temperature (e.g. by applying a series of heating pulses or current pulses) and driving a current through the reference sensor so as to measure its magneto-resistance.
  • the signal sensor at this time can be set to the ON or any other suitable state, even though it is preferred that the signal sensor can be set to the OFF state to avoid the magnetic field generated by the current driven through the signal sensor for setting the signal sensor to the ON state.
  • the reference sensor measures the instant magnetic signal background at time T 0 . After the reference sensor finished the measurement, it locks its instant state at time T 1 by for example, lowering the temperature of its top pin layer (used for pinning the free layer) below its blocking temperature such that the free layer is magnetically coupled to (thus pinned by) the top pin layer.
  • the reference sensor at this state is referred to as the “Lock” state.
  • the wire remains OFF and the signal sensor can be at any state.
  • the wire is set to the ON state at time T 2 , by driving current with pre-defined amplitude through the wire so as to generate magnetic field.
  • the current can be DC or AC.
  • the signal sensor can be set to the ON state. Setting the signal sensor to the ON state can be accomplished by raising the temperature of the pin layer used for pinning the free layer of the signal sensor above its blocking temperature so as to free the free layer. A current is driven through the signal sensor so as to measure its magneto-resistance.
  • the signal sensor After the signal sensor finished the measurement, it locks its instant state at time T 3 by for example, lowering the temperature of its top pin layer (used for pinning the free layer) below its blocking temperature such that the free layer is magnetically coupled to (thus pinned by) the top pin layer.
  • the signal sensor at this state is referred to as the “Lock” state.
  • the reference sensor and the signal sensor can output their measurements to so to obtain the magnetic field from the magnetic source attached to the proof-mass, thus extract the information of the movement of the proof-mass.
  • the reference sensor and the signal sensor can be connected by a Wheatstone bridge, or can be connected directly to an amplifier or other electrical circuits to obtain the target magnetic field, which not be detailed herein.
  • the reference sensor and/or the signal sensor can be configured to “lock” the status (e.g. the detected magnetic signal).
  • This locking capability can be accomplished in many ways. In the following, such locking capability will be discussed with reference to signal sensor, and the reference sensor can be implemented in substantially the same ways.
  • the signal sensor can be configured to be comprised of a storage layer that comprises a ferromagnetic layer.
  • the storage layer is connected to electrical leads such that electrical current can be applied through the storage layer. When current is applied, the storage layer is heated, and its temperature can be elevated.
  • the material, as well as the geometry (e.g. the thickness) of the storage layer can be configured such that at the elevated temperature above a threshold temperature, such as the Currie temperature, the storage layer is capable of being magnetized by the target magnetic signal so as to accomplish the detection of the target magnetic signal.
  • a threshold temperature such as the Currie temperature
  • the storage layer When the temperature of the storage layer is dropped to a temperature below the threshold temperature, the storage layer “freezes” its magnetization states so as to accomplish its “locking” operation.
  • FIG. 12 illustrates such operation.
  • the vertical axis plots the coercivity of the storage layer (e.g. the ferromagnetic layer of the storage layer); and the horizontal axis plots the temperature.
  • the coercivity of the storage layer decreases with increased temperature.
  • the storage layer has a coercivity that is higher than the target magnetic signal H target , therefore, the storage layer is unable to detect the target magnetic signal.
  • the coercivity of the storage layer decreases.
  • the coercivity of the storage layer is equal to or less than the target magnetic signal H signal such that the storage layer is capable of being magnetized and thus detecting the target magnetic signal.
  • the temperature of the storage layer can be decreased, by for example, removing the current applied through the storage layer (e.g. the ferromagnetic layer of the storage layer).
  • the magnetization state of the ferromagnetic layer is “locked” because the coercivity of the storage layer is higher than the target magnetic field. With this mechanism, the storage layer accomplishes the “locking process.”
  • the coercivity of a magnetic thin-film also varies with its thickness, as diagrammatically illustrated in FIG. 13 .
  • the storage layer can have a thickness such that the coercivity of the signal-storage layer is in the vicinity of the target magnetic field H target , such as within a range of ⁇ 0.5%, ⁇ 1%, ⁇ 1.5%, ⁇ 2%, ⁇ 2.5%, ⁇ 3%, ⁇ 4%, ⁇ 5%, ⁇ 8%, ⁇ 10% of H target .
  • a thermal layer can be provided to adjust the coercivity of the storage layer.
  • the signal sensor comprises free layer 172 and pinning layer 170 .
  • the free layer ( 172 ) is a ferromagnetic layer, and is provide for responding to the target magnetic field to be detected.
  • the pinning layer ( 170 ) is an antiferromagnetic layer, and is provided for magnetically pining the free layer ( 172 ) through the exchange magnetic field H exch . It is known in the art that the magnetic exchange field H exch changes with temperature.
  • the magnetic exchange field between the free layer ( 172 ) and pining layer ( 172 ) is broken, e.g. reduced to a level such that the free layer ( 172 ) and pinning layer ( 172 ) are magnetically decoupled.
  • the free layer ( 172 ) is not pinned by the pinning layer ( 172 ) at this temperature.
  • the signal sensor may elevate its temperature above the blocking temperature T B by for example, applying current through the free layer ( 172 ) and/or the pining layer ( 170 ).
  • the free layer ( 172 ) is thus “freed” and can be used for picking up the target magnetic field signal.
  • the signal sensor can decrease its temperature below the blocking temperature T B .
  • the free layer ( 172 ) is magnetically pinned by the pinning layer ( 172 ).
  • the magnetic states of the free layer ( 172 ), which corresponds to the target magnetic field signal, is thus “frozen” in the free layer ( 172 ).

Abstract

A method of using a MEMS gyroscope is disclosed herein, wherein the MEMS gyroscope comprised a magnetic sensing mechanism. A magnetic field is generated by a magnetic source, and is detected by a magnetic sensor. The magnetic field varies at the location of the magnetic sensor; and the variation of the magnetic field is associated with the movement of the proof-mass of the MEMS gyroscope. By detecting the variation of the magnetic field, the movement and thus the target angular velocity can be measured.

Description

    CROSS-REFERENCE
  • This U.S. utility patent application claims priority from co-pending U.S. utility patent application “A HYBRID MEMS DEVICE,” Ser. No. 13/559,625 filed Jul. 27, 2012, which claims priority from US provisional patent application “A HYBRID MEMS DEVICE,” filed May 31, 2012, Ser. No. 61/653,408 to Biao Zhang and Tao Ju. This U.S. utility patent application also claims priority from co-pending U.S. utility patent application “A MEMS DEVICE,” Ser. No. 13/854,972 filed Apr. 2, 2013 to the same inventor of this U.S. utility patent application, the subject matter of each of which is incorporated herein by reference in its entirety.
  • TECHNICAL FIELD OF THE DISCLOSURE
  • The technical field of the examples to be disclosed in the following sections is related generally to the art of operation of microstructures, and, more particularly, to operation of MEMS devices comprising MEMS magnetic sensing structures.
  • BACKGROUND OF THE DISCLOSURE
  • Microstructures, such as microelectromechanical (hereafter MEMS) devices (e.g. accelerometers, DC relay and RF switches, optical cross connects and optical switches, microlenses, reflectors and beam splitters, filters, oscillators and antenna system components, variable capacitors and inductors, switched banks of filters, resonant comb-drives and resonant beams, and micromirror arrays for direct view and projection displays) have many applications in basic signal transduction. For example, a MEMS gyroscope measures angular rate.
  • A gyroscope (hereafter “gyro” or “gyroscope”) is based on the Coriolis effect as diagrammatically illustrated in FIG. 1. Proof-mass 100 is moving with velocity Vd. Under external angular velocity Ω, the Coriolis effect causes movement of the poof-mass (100) with velocity Vs. With fixed Vd, the external angular velocity can be measured from Vd. A typical example based on the theory shown in FIG. 1 is capacitive MEMS gyroscope, as diagrammatically illustrated in FIG. 2.
  • The MEMS gyro is a typical capacitive MEMS gyro, which has been widely studied. Regardless of various structural variations, the capacitive MEMS gyro in FIG. 2 includes the very basic theory based on which all other variations are built. In this typical structure, capacitive MEMS gyro 102 is comprised of proof-mass 100, driving mode 104, and sensing mode 102. The driving mode (104) causes the proof-mass (100) to move in a predefined direction, and such movement is often in a form of resonance vibration. Under external angular rotation, the proof-mass (100) also moves along the Vs direction with velocity Vs. Such movement of Vs is detected by the capacitor structure of the sensing mode (102). Both of the driving and sensing modes use capacitive structures, whereas the capacitive structure of the driving mode changes the overlaps of the capacitors, and the capacitive structure of the sensing mode changes the gaps of the capacitors.
  • Current capacitive MEMS gyros, however, are hard to achieve submicro-g/rtHz because the capacitance between sensing electrodes decreases with the miniaturization of the movable structure of the sensing element and the impact of the stray and parasitic capacitance increase at the same time, even with large and high aspect ratio proof-masses.
  • Therefore, what is desired is a MEMS device capable of sensing angular velocities and methods of operating the same.
  • SUMMARY OF THE DISCLOSURE
  • In view of the foregoing, a method of measuring an angular velocity by using a MEMS gyroscope is disclosed herein, the method comprising: generating a magnetic field that is associated with a movement of a proof-mass of the MEMS gyroscope, wherein the magnetic field varies at a location of a magnetic sensor; detecting the variation of the magnetic field by the magnetic sensor; and extracting the angular velocity from the variation of the magnetic field.
  • In another example, a method of detecting a target angular velocity is disclosed herein, the method comprising: providing a MEMS gyroscope that comprises a movable proof-mass, a magnetic source, and a magnetic sensor, wherein the proof-mass is capable of moving in response to the target angular velocity under the Coriolis effect, and wherein the magnetic source is capable of generating a magnetic field that varies with the movement of the proof-mass, and wherein the magnetic sensor is capable of detecting the magnetic field from the magnetic source; generating the magnetic field by the magnetic source; detecting a variation of the magnetic field by the magnetic sensor; and extracting the angular velocity from the variation of the magnetic field.
  • In yet another example, a method of measuring an angular velocity by using a MEMS gyroscope is disclosed herein, the method comprising: detecting a background magnetic signal by a reference magnetic sensor of the MEMS gyroscope; locking the state of the reference sensor after the detection of the background magnetic signal; generating a magnetic field by a magnetic source whose movement is associated with a proof-mass of the MEMS gyroscope; detecting the magnetic field from the magnetic source by a signal sensor; and calculating the angular velocity from the detected magnetic field.
  • BRIEF DESCRIPTION OF DRAWINGS
  • FIG. 1 diagrammatically illustrates the Coriolis effect in a MEMS structure;
  • FIG. 2 is a top view of a typical existing capacitive MEMS gyroscope having a driving mode and a sensing mode, wherein both of the driving and sensing mode utilize capacitance structures;
  • FIG. 3 illustrates an exemplary MEMS gyroscope having a magnetic sensing mechanism;
  • FIG. 4 illustrates a top view of a portion of an exemplary implementation of the MEMS gyroscope illustrated in FIG. 3, wherein the MEMS gyroscope illustrated in FIG. 4 having a capacitive driving mode and a magnetic sensing mechanism;
  • FIG. 5 illustrates a perspective view of a portion of another exemplary implementation of the MEMS gyroscope illustrated in FIG. 3, wherein the MEMS gyroscope illustrated in FIG. 5 having a magnetic driving mechanism for the driving mode and a magnetic sensing mechanism for the sensing mode
  • FIG. 6 illustrates an exemplary magnetic driving mechanism of the MEMS gyroscope in FIG. 5;
  • FIG. 7 illustrates an exemplary magnetic source of the MEMS gyroscope illustrated in FIG. 3;
  • FIG. 8 illustrates an exemplary magnetic sensing mechanism that can be used in the MEMS gyroscope illustrated in FIG. 3;
  • FIG. 9 shows an exemplary thin-film stack that can be configured into a CIP or CPP structure for use in the magnetic sensing mechanism illustrated in FIG. 8;
  • FIG. 10 illustrates an exemplary MEMS gyroscope that comprises multiple magnetic sensing structures;
  • FIG. 11 illustrates an exemplary operation for detecting and measuring an angular velocity using a MEMS gyroscope illustrated in FIG. 3;
  • FIG. 12 illustrates temperature dependence of the coercivity of a ferromagnetic thin film, wherein the ferromagnetic thin film can be used in the signal sensor illustrated in FIG. 3;
  • FIG. 13 illustrates temperature dependence of the coercivity of a ferromagnetic thin film, wherein the ferromagnetic thin film can be used in the signal sensor illustrated in FIG. 3; and
  • FIG. 14 illustrates the temperature dependence of the magnetic exchange field between a pining layer and a free layer, wherein the pinning layer and the free layer can be used in the signal sensor illustrated in FIG. 3.
  • DETAILED DESCRIPTION OF SELECTED EXAMPLES
  • Disclosed herein is a MEMS gyroscope and method of using the same for sensing an angular velocity, wherein the MEMS gyroscope utilizes a magnetic sensing mechanism. It will be appreciated by those skilled in the art that the following discussion is for demonstration purposes, and should not be interpreted as a limitation. Many other variations within the scope of the following disclosure are also applicable. For example, the MEMS gyroscope and the method disclosed in the following are applicable for use in accelerometers.
  • Referring to FIG. 3, an exemplary MEMS gyroscope is illustrated herein. In this example, MEMS gyroscope 106 comprises magnetic sensing mechanism 114 for sensing the target angular velocity through the measurement of proof-mass 112. Specifically, MEMS gyroscope 106 comprises mass-substrate 108 and sensor substrate 110. Mass-substrate 108 comprises proof-mass 112 that is capable of responding to an angular velocity. The two substrates (108 and 110) are spaced apart, for example, by a pillar (not shown herein for simplicity) such that at least the proof-mass (112) is movable in response to an angular velocity under the Coriolis effect. The movement of the proof-mass (112) and thus the target angular velocity can be measured by magnetic sensing mechanism 114.
  • The magnetic sensing mechanism (114) in this example comprises a magnetic source 116 and magnetic sensor 118. The magnetic source (116) generates a magnetic field, and the magnetic sensor (118) detects the magnetic field and/or the magnetic field variations that is generated by the magnetic source (116). In the example illustrated herein in FIUG. 3, the magnetic source is placed on/in the proof-mass (112) and moves with the proof-mass (112). The magnetic sensor (118) is placed on/in the sensor substrate (120) and non-movable relative to the moving proof-mass (112) and the magnetic source (116). With this configuration, the movement of the proof-mass (112) can be measured from the measurement of the magnetic field from the magnetic source (116).
  • Other than placing the magnetic source on/in the movable proof-mass (1112), the magnetic source (116) can be placed on/in the sensor substrate (120); and the magnetic sensor (118) can be placed on/in the proof-mass (112).
  • It is also noted that the MEMS gyroscope illustrated in FIG. 3 can also be used as an accelerometer.
  • The MEMS gyroscope as discussed above with reference to FIG. 3 can be implemented in many ways, one of which is illustrated in FIG. 4. Referring to FIG. 4, the proof-mass (120) is driven by capacitive, such as capacitive comb. The sensing mode, however, is performed using the magnetic sensing mechanism illustrated in FIG. 3. For this reason, capacitive combs can be absent from the proof-mass (120).
  • Alternatively, the proof-mass can be driven by magnetic force, an example of which is illustrated in FIG. 5. Referring to FIG. 5, the mass substrate (108) comprises a movable proof-mass (126) that is supported by flexible structures such as flexures 128, 129, and 130. The layout of the flexures enables the proof-mass to move in a plane substantially parallel to the major planes of mass substrate 108. In particular, the flexures enables the proof-mass to move along the length and the width directions, wherein the length direction can be the driving mode direction and the width direction can be the sensing mode direction of the MEMS gyro device. The proof-mass (126) is connected to frame 132 through flexures (128, 129, and 130). The frame (132) is anchored by non-movable structures such as pillar 134. The mass-substrate (108) and sensing substrate 110 are spaced apart by the pillar (134). The proof-mass (112) in this example is driving by a magnetic driving mechanism (136). Specifically, the proof-mass (126) can move (e.g. vibrate) in the driving mode under magnetic force applied by magnetic driving mechanism 136, which is better illustrated in FIG. 6.
  • Referring to FIG. 6, the magnetic driving mechanism 136 comprise a magnet core 138 surrounded by coil 140. By applying an alternating current through coil 140, an alternating magnetic field can be generated from the coil 140. The alternating magnetic field applies magnetic force to the magnet core 140 so as to move the magnet core. The magnet core thus moves the proof-mass.
  • The magnetic source (114) of the MEMS gyroscope (106) illustrated in FIG. 3 can be implemented in many ways, one of which is illustrated in FIG. 7. Referring to FIG. 7, conductive wire 142 is displaced on/in proof-mass 112. In one example, conductive wire 142 can be placed on the lower surface of the proof-mass (112), wherein the lower surface is facing the magnetic sensors (118 in FIG. 3) on the sensor substrate (110, in FIG. 3). Alternatively, the conductive wire (142) can be placed on the top surface of the proof-mass (112), i.e. on the opposite side of the proof-mass (112) in view of the magnetic sensor (118). In another example, the conductive wire (142) can be placed inside the proof-mass, e.g. laminated or embedded inside the proof-mass (112), which will not be detailed herein as those examples are obvious to those skilled in the art of the related technical field.
  • The conductive wire (142) can be implemented in many suitable ways, one of which is illustrated in FIG. 7. In this example, the conductive wire (142) comprises a center conductive segment 146 and tapered contacts 144 and 148 that extend the central conductive segment to terminals, through the terminals of which current can be driven through the central segment. The conductive wire (142) may have other configurations. For example, the contact tapered contacts (144 and 148) and the central segment (146) maybe U-shaped such that the tapered contacts may be substantially parallel but are substantially perpendicular to the central segment, which is not shown for its obviousness.
  • The magnetic sensor (118) illustrated in FIG. 3 can be implemented to comprise a reference sensor (150) and a signal sensor (152) as illustrated in FIG. 8. Referring to FIG. 8, magnetic senor 118 on/in sensor substrate 120 comprises reference sensor 150 and signal sensor 152. The reference sensor (150) can be designated for dynamically measuring the magnetic signal background in which the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7) co-exists. The signal sensor (152) can be designated for dynamically measuring the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7). In other examples, the signal sensor (152) can be designated for dynamically measuring the magnetic signal background in which the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7) co-exists, while the signal sensor (150) can be designated for dynamically measuring the target magnetic signal (e.g. the magnetic field from the conductive wire 146 as illustrated in FIG. 7).
  • The reference sensor (150) and the signal sensor (152) preferably comprise magneto-resistors, such as AMRs, giant-magneto-resistors (such as spin-valves, hereafter SV), or tunneling-magneto-resistors (TMR). For demonstration purpose, FIG. 9 illustrates a magneto-resistor structure, which can be configured into CIP (current-in-plane, such as a spin-valve) or a CPP (current-perpendicular-to-plane, such as TMR structure). As illustrated in FIG. 9, the magneto-resistor stack comprises top pin-layer 154, free-layer 156, spacer 158, reference layer 160, bottom pin layer 162, and substrate 120. Top pin layer 154 is provided for magnetically pinning free layer 156. The top pin layer can be comprised of IrMn, PtMn or other suitable magnetic materials. The free layer (156) can be comprised of a ferromagnetic material, such as NiFe, CoFe, CoFeB, or other suitbale materials or the combinations thereof. The spacer (158) can be comprised of a non-magnetic conductive material, such as Cu, or an oxide material, such as Al2O3 or MgO or other suitable materials. The reference layer (160) can be comprised of a ferromagnetic magnetic material, such as NiFe, CoFe, CoFeB, or other materials or the combinations thereof. The bottom pin layer (162) is provided for magnetic pinning the reference layer (160), which can be comprised of a IrMn, PtMn or other suitable materials or the combinations thereof. The substrate (120) can be comprised of any suitable materials, such as glass, silicon, or other materials or the combinations thereof.
  • In examples wherein the spacer (158) is comprised of a non-magnetic conductive layer, such as Cu, the magneto-resistor (118) stack can be configured into a CIP structure (i.e. spin-valve, SV), wherein the current is driven in the plane of the stack layers. When the spacer (158) is comprised of an oxide such as Al2O3, MgO or the like, the magneto-resistor stack (118) can be configured into a CPP structure (i.e. TMR), wherein the current is driven perpendicularly to the stack layers.
  • In the example as illustrated in FIG. 9, the free layer (156) is magnetically pinned by the top pin layer (154), and the reference layer (160) is also magnetically pinned by bottom pin layer 162. The top pin layer (154) and the bottom pin layer (162) preferably having different blocking temperatures. In this specification, a blocking temperature is referred to as the temperature, above which the magnetic pin layer is magnetically decoupled with the associated pinned magnetic layer. For example, the top pin layer (154) is magnetically decoupled with the free layer (156) above the blocking temperature TB of the top pin layer (154) such that the free layer (156) is “freed” from the magnetic pinning of top pin layer (154). Equal to or below the blocking temperature TB of the top pin layer (154), the free layer (156) is magnetically pinned by the top pin layer (154) such that the magnetic orientation of the free layer (156) is substantially not affected by the external magnetic field. Similarly, the bottom pin layer (162) is magnetically decoupled with the reference layer (160) above the blocking temperature TB of the bottom pin layer (162) such that the reference layer (160) is “freed” from the magnetic pinning of bottom pin layer (162). Equal to or below the blocking temperature TB of the bottom pin layer (162), the reference layer (160) is magnetically pinned by the bottom pin layer (162) such that the magnetic orientation of the reference layer (162) is substantially not affected by the external magnetic field.
  • The top and bottom pin layers (154 and 162, respectively) preferably have different blocking temperatures. When the free layer (156) is “freed” from being pinned by the top pin layer (154), the reference layer (160) preferably remains being pinned by the bottom pin layer (162). Alternatively, when the free layer (156) is still pinned by the top pin layer (154), the reference layer (160) can be “freed” from being pinned by the bottom pin layer (162). In the later example, the reference layer (160) can be used as a “sensing layer” for responding to the external magnetic field such as the target magnetic field, while the free layer (156) is used as a reference layer to provide a reference magnetic orientation.
  • The different blocking temperatures can be accomplished by using different magnetic materials for the top pin layer (154) and bottom pin layer (162). In one example, the top pin layer (154) can be comprised of IrMn, while the bottom pin layer (162) can be comprised of PtMn, vice versa. In another example, both of the top and bottom pin layers (154 and 162) may be comprised of the same material, such as IrMn or PtMn, but with different thicknesses such that they have different blocking temperatures.
  • It is noted by those skilled in the art that the magneto-resistor stack (118) is configured into sensors for sensing magnetic signals. As such, the magnetic orientations of the free layer (156) and the reference layer (160) are substantially perpendicular at the initial state. Other layers, such as protective layer Ta, seed layers for growing the stack layers on substrate 120 can be provided. It is further noted that the magnetic stack layers (118) illustrated in FIG. 9 are what is often referred to as “bottom pin” configuration in the field of art. In other examples, the stack can be configured into what is often referred as “top pinned” configuration in the field of art, which will not be detailed herein.
  • In some applications, multiple magnetic sensing mechanisms can be provided, an example of which is illustrated in FIG. 10. Referring to FIG. 10, magnetic sensing mechanisms 116 and 164 are provided for detecting the movements of proof-mass 112. The multiple magnetic sensing mechanisms can be used for detecting the movements of proof-mass 112 in driving mode and sensing mode respectively. Alternatively, the multiple magnetic sensing mechanisms 116 and 164 can be provided for detecting the same modes (e.g. the driving mode and/or the sensing mode).
  • By using the different blocking temperatures of the sensors as discussed above with reference to FIG. 9, the reference sensor (150) and signal sensor (152) can be dynamically activated or deactivated for sensing the target magnetic field. For demonstration purpose, FIG. 11 shows an exemplary operation method of measuring a target magnetic field (e.g. from the wire 146 as illustrated in FIG. 7) by using the magnetic sensor (118 as illustrated in FIG. 8).
  • With reference to FIG. 7, FIG. 8, and FIG. 11, the wire can be set to the OFF state by not driving a current through the wire at the initial time T0. The reference sensor can be set to the ON state. The ON state of the reference sensor can be achieved through “freeing” the free layer of the reference sensor by raising the temperature of the pin layer that pins the free layer of the reference sensor above its blocking temperature (e.g. by applying a series of heating pulses or current pulses) and driving a current through the reference sensor so as to measure its magneto-resistance. The signal sensor at this time can be set to the ON or any other suitable state, even though it is preferred that the signal sensor can be set to the OFF state to avoid the magnetic field generated by the current driven through the signal sensor for setting the signal sensor to the ON state. Because the wire is set to the OFF state and no current is driven through the wire, the reference sensor measures the instant magnetic signal background at time T0. After the reference sensor finished the measurement, it locks its instant state at time T1 by for example, lowering the temperature of its top pin layer (used for pinning the free layer) below its blocking temperature such that the free layer is magnetically coupled to (thus pinned by) the top pin layer. The reference sensor at this state is referred to as the “Lock” state.
  • At time T1, the wire remains OFF and the signal sensor can be at any state. When the reference sensor is stabled at the “Lock” state (e.g. finishes “locking” the state of its free layer), the wire is set to the ON state at time T2, by driving current with pre-defined amplitude through the wire so as to generate magnetic field. The current can be DC or AC. After the magnetic field generated by the wire is stabilized, the signal sensor can be set to the ON state. Setting the signal sensor to the ON state can be accomplished by raising the temperature of the pin layer used for pinning the free layer of the signal sensor above its blocking temperature so as to free the free layer. A current is driven through the signal sensor so as to measure its magneto-resistance.
  • After the signal sensor finished the measurement, it locks its instant state at time T3 by for example, lowering the temperature of its top pin layer (used for pinning the free layer) below its blocking temperature such that the free layer is magnetically coupled to (thus pinned by) the top pin layer. The signal sensor at this state is referred to as the “Lock” state.
  • When the signal sensor finishes its locking at time T3, the reference sensor and the signal sensor can output their measurements to so to obtain the magnetic field from the magnetic source attached to the proof-mass, thus extract the information of the movement of the proof-mass.
  • The reference sensor and the signal sensor can be connected by a Wheatstone bridge, or can be connected directly to an amplifier or other electrical circuits to obtain the target magnetic field, which not be detailed herein.
  • In the example discussed above, the reference sensor and/or the signal sensor can be configured to “lock” the status (e.g. the detected magnetic signal). This locking capability can be accomplished in many ways. In the following, such locking capability will be discussed with reference to signal sensor, and the reference sensor can be implemented in substantially the same ways.
  • In one example, the signal sensor can be configured to be comprised of a storage layer that comprises a ferromagnetic layer. The storage layer is connected to electrical leads such that electrical current can be applied through the storage layer. When current is applied, the storage layer is heated, and its temperature can be elevated.
  • The material, as well as the geometry (e.g. the thickness) of the storage layer can be configured such that at the elevated temperature above a threshold temperature, such as the Currie temperature, the storage layer is capable of being magnetized by the target magnetic signal so as to accomplish the detection of the target magnetic signal. When the temperature of the storage layer is dropped to a temperature below the threshold temperature, the storage layer “freezes” its magnetization states so as to accomplish its “locking” operation. FIG. 12 illustrates such operation.
  • Referring to FIG. 12, the vertical axis plots the coercivity of the storage layer (e.g. the ferromagnetic layer of the storage layer); and the horizontal axis plots the temperature. The coercivity of the storage layer (ferromagnetic layer) decreases with increased temperature. At room temperature RT, the storage layer has a coercivity that is higher than the target magnetic signal Htarget, therefore, the storage layer is unable to detect the target magnetic signal. As the temperature of the storage layer increases, the coercivity of the storage layer decreases. At the storing temperature (or the blocking temperature wherein the signal storage layer transits from ferromagnetic to paramagnetic or super-paramagnetic), the coercivity of the storage layer is equal to or less than the target magnetic signal Hsignal such that the storage layer is capable of being magnetized and thus detecting the target magnetic signal. After the detection, the temperature of the storage layer can be decreased, by for example, removing the current applied through the storage layer (e.g. the ferromagnetic layer of the storage layer). When the temperature of the storage layer is decreased to a temperature below the storing temperature, the magnetization state of the ferromagnetic layer (storage layer) is “locked” because the coercivity of the storage layer is higher than the target magnetic field. With this mechanism, the storage layer accomplishes the “locking process.”
  • The coercivity of a magnetic thin-film (layer) also varies with its thickness, as diagrammatically illustrated in FIG. 13. The storage layer can have a thickness such that the coercivity of the signal-storage layer is in the vicinity of the target magnetic field Htarget, such as within a range of ±0.5%, ±1%, ±1.5%, ±2%, ±2.5%, ±3%, ±4%, ±5%, ±8%, ±10% of Htarget. Especially when the storage layer has a thickness such that its coercivity is higher than Htarget, a thermal layer can be provided to adjust the coercivity of the storage layer.
  • In addition to utilizing the temperature dependence of coercivity of a ferromagnetic layer, a magnetic coupling structure can be utilized to accomplish the “locking” process, as illustrated in FIG. 14. Referring to FIG. 4, the signal sensor comprises free layer 172 and pinning layer 170. The free layer (172) is a ferromagnetic layer, and is provide for responding to the target magnetic field to be detected. The pinning layer (170) is an antiferromagnetic layer, and is provided for magnetically pining the free layer (172) through the exchange magnetic field Hexch. It is known in the art that the magnetic exchange field Hexch changes with temperature. When the temperature is higher than the blocking temperature TB that characterizes the magnetic exchange field between the free layer (172) and pining layer (170), the magnetic exchange field between the free layer (172) and pining layer (172) is broken, e.g. reduced to a level such that the free layer (172) and pinning layer (172) are magnetically decoupled. The free layer (172) is not pinned by the pinning layer (172) at this temperature. By utilizing such magnetic-couple (pinning) and magnetic-decouple (unpinning), the signal sensor comprising the free layer (172) and pining layer (170) can accomplish the state “locking” process.
  • For example, when it is desired to detect the target magnetic field signal, the signal sensor may elevate its temperature above the blocking temperature TB by for example, applying current through the free layer (172) and/or the pining layer (170). The free layer (172) is thus “freed” and can be used for picking up the target magnetic field signal. When it is desired for the signal sensor to lock its detection, for example, after the detecting the target magnetic signal, the signal sensor can decrease its temperature below the blocking temperature TB. At a temperature below TB, the free layer (172) is magnetically pinned by the pinning layer (172). The magnetic states of the free layer (172), which corresponds to the target magnetic field signal, is thus “frozen” in the free layer (172).
  • It will be appreciated by those of skilled in the art that a new and useful MEMS gyroscope has been described herein. In view of the many possible embodiments, however, it should be recognized that the embodiments described herein with respect to the drawing figures are meant to be illustrative only and should not be taken as limiting the scope of what is claimed. Those of skill in the art will recognize that the illustrated embodiments can be modified in arrangement and detail. Therefore, the devices and methods as described herein contemplate all such embodiments as may come within the scope of the following claims and equivalents thereof. In the claims, only elements denoted by the words “means for” are intended to be interpreted as means plus function claims under 35 U.S.C. §112, the sixth paragraph.

Claims (15)

We claim:
1. A method of measuring an angular velocity by using a MEMS gyroscope, the method comprising:
generating a magnetic field that is associated with a movement of a proof-mass of the MEMS gyroscope, wherein the magnetic field varies at a location of a magnetic sensor;
detecting the variation of the magnetic field by the magnetic sensor; and
extracting the angular velocity from the variation of the magnetic field.
2. The method of claim 1, wherein the step of generating the magnetic field comprises:
driving a current through a conductive wire so as to generating the magnetic field.
3. The method of claim 2, wherein the magnetic sensor comprises a spin-valve structure.
4. The method of claim 2, wherein the magnetic sensor comprises a tunneling-magneto-resistor structure.
5. The method of claim 2, further comprising:
before generating the magnetic field, detecting a magnetic signal from a background in which the magnetic field to be generated co-exists; and
wherein the step of extracting the angular velocity further comprises:
extracting the angular velocity from said detected magnetic signal from the background and the variation of the magnetic field.
6. A method of detecting a target angular velocity, comprising:
providing a MEMS gyroscope that comprises a movable proof-mass, a magnetic source, and a magnetic sensor, wherein the proof-mass is capable of moving in response to the target angular velocity under the Coriolis effect, and wherein the magnetic source is capable of generating a magnetic field that varies with the movement of the proof-mass, and wherein the magnetic sensor is capable of detecting the magnetic field from the magnetic source;
generating the magnetic field by the magnetic source;
detecting a variation of the magnetic field by the magnetic sensor; and
extracting the angular velocity from the variation of the magnetic field.
7. The method of claim 6, wherein the step of generating the magnetic field comprises:
driving a current through a conductive wire so as to generating the magnetic field.
8. The method of claim 7, wherein the magnetic sensor comprises a spin-valve structure.
9. The method of claim 7, wherein the magnetic sensor comprises a tunneling-magneto-resistor structure.
10. The method of claim 7, further comprising:
before generating the magnetic field, detecting a magnetic signal from a background in which the magnetic field to be generated co-exists; and
wherein the step of extracting the angular velocity further comprises:
extracting the angular velocity from said detected magnetic signal from the background and the variation of the magnetic field.
11. A method of measuring an angular velocity by using a MEMS gyroscope, the method comprising:
detecting a background magnetic signal by a reference magnetic sensor of the MEMS gyroscope;
locking the state of the reference sensor after the detection of the background magnetic signal;
generating a magnetic field by a magnetic source whose movement is associated with a proof-mass of the MEMS gyroscope;
detecting the magnetic field from the magnetic source by a signal sensor; and
calculating the angular velocity from the detected magnetic field.
12. The method of claim 11, further comprising:
locking the signal sensor after the step of detecting the magnetic field by the signal sensor and before the step of calculating the angular velocity.
13. The method of claim 12, wherein the step of generating the magnetic field comprises:
driving a current through a conductive wire so as to generating the magnetic field.
14. The method of claim 13, wherein the magnetic sensor comprises a spin-valve structure.
15. The method of claim 13, wherein the magnetic sensor comprises a tunneling-magneto-resistor structure.
US13/935,557 2012-07-27 2013-07-05 Mems device and a method of using the same Abandoned US20140026658A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/935,557 US20140026658A1 (en) 2012-07-27 2013-07-05 Mems device and a method of using the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201213559625A 2012-07-27 2012-07-27
US13/854,972 US20140290365A1 (en) 2013-04-02 2013-04-02 Mems device
US13/935,557 US20140026658A1 (en) 2012-07-27 2013-07-05 Mems device and a method of using the same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US201213559625A Continuation 2012-05-31 2012-07-27

Publications (1)

Publication Number Publication Date
US20140026658A1 true US20140026658A1 (en) 2014-01-30

Family

ID=49993560

Family Applications (14)

Application Number Title Priority Date Filing Date
US13/935,557 Abandoned US20140026658A1 (en) 2012-07-27 2013-07-05 Mems device and a method of using the same
US13/935,558 Abandoned US20140026659A1 (en) 2012-07-27 2013-07-05 Mems device and a method of using the same
US13/936,143 Abandoned US20140190257A1 (en) 2012-07-27 2013-07-06 Mems device and a method of using the same
US13/936,145 Abandoned US20140026661A1 (en) 2012-07-27 2013-07-06 Mems device
US13/936,144 Abandoned US20140026660A1 (en) 2012-07-27 2013-07-06 Mems device
US14/178,229 Abandoned US20150226555A1 (en) 2012-07-27 2014-02-11 Mems gyroscope
US14/512,469 Abandoned US20160154070A1 (en) 2012-07-27 2014-10-13 Wafer bonding method for use in making a mems gyroscope
US14/518,621 Abandoned US20160154019A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,607 Abandoned US20160153780A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,688 Expired - Fee Related US10012670B2 (en) 2012-07-27 2014-10-20 Wafer bonding method for use in making a MEMS gyroscope
US14/518,665 Abandoned US20150033856A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,355 Abandoned US20150033854A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,712 Abandoned US20160154020A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,651 Abandoned US20150033855A1 (en) 2012-07-27 2014-10-20 Mems device

Family Applications After (13)

Application Number Title Priority Date Filing Date
US13/935,558 Abandoned US20140026659A1 (en) 2012-07-27 2013-07-05 Mems device and a method of using the same
US13/936,143 Abandoned US20140190257A1 (en) 2012-07-27 2013-07-06 Mems device and a method of using the same
US13/936,145 Abandoned US20140026661A1 (en) 2012-07-27 2013-07-06 Mems device
US13/936,144 Abandoned US20140026660A1 (en) 2012-07-27 2013-07-06 Mems device
US14/178,229 Abandoned US20150226555A1 (en) 2012-07-27 2014-02-11 Mems gyroscope
US14/512,469 Abandoned US20160154070A1 (en) 2012-07-27 2014-10-13 Wafer bonding method for use in making a mems gyroscope
US14/518,621 Abandoned US20160154019A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,607 Abandoned US20160153780A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,688 Expired - Fee Related US10012670B2 (en) 2012-07-27 2014-10-20 Wafer bonding method for use in making a MEMS gyroscope
US14/518,665 Abandoned US20150033856A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,355 Abandoned US20150033854A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,712 Abandoned US20160154020A1 (en) 2012-07-27 2014-10-20 Mems gyroscope
US14/518,651 Abandoned US20150033855A1 (en) 2012-07-27 2014-10-20 Mems device

Country Status (1)

Country Link
US (14) US20140026658A1 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140308757A1 (en) * 2012-07-27 2014-10-16 Tao Ju Mems device and a method of making the same
US20150115952A1 (en) * 2013-10-31 2015-04-30 Invensense, Inc. Device with magnetic sensors with permanent magnets
US20150192646A1 (en) * 2014-01-07 2015-07-09 Nvensense, Inc. Magnetic sensors with permanent magnets magnetized in different directions
US20150233965A1 (en) * 2012-10-16 2015-08-20 Csmc Technologies Fab1 Co., Ltd. Parallel plate capacitor and acceleration sensor comprising same
WO2016046778A2 (en) 2014-09-25 2016-03-31 Amgen Inc Protease-activatable bispecific proteins
DE102015117094A1 (en) * 2015-10-07 2017-04-13 Epcos Ag MEMS rate sensor
US20170184687A1 (en) * 2014-07-10 2017-06-29 Epcos Ag Sensor
US20170256107A1 (en) * 2014-08-19 2017-09-07 Sensormatic Electronics, LLC Method and system for access control proximity location
CN109883456A (en) * 2019-04-02 2019-06-14 江苏多维科技有限公司 A kind of magneto-resistor inertial sensor chip

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9296606B2 (en) * 2014-02-04 2016-03-29 Invensense, Inc. MEMS device with a stress-isolation structure
US20170303646A1 (en) * 2014-12-29 2017-10-26 Loop Devices, Inc. Functional, socially-enabled jewelry and systems for multi-device interaction
US10373523B1 (en) 2015-04-29 2019-08-06 State Farm Mutual Automobile Insurance Company Driver organization and management for driver's education
US9586591B1 (en) 2015-05-04 2017-03-07 State Farm Mutual Automobile Insurance Company Real-time driver observation and progress monitoring
US10364140B2 (en) * 2015-09-22 2019-07-30 Nxp Usa, Inc. Integrating diverse sensors in a single semiconductor device
WO2017105472A1 (en) * 2015-12-17 2017-06-22 Intel Corporation Microelectronic devices for isolating drive and sense signals of sensing devices
US10982530B2 (en) * 2016-04-03 2021-04-20 Schlumberger Technology Corporation Apparatus, system and method of a magnetically shielded wellbore gyroscope
WO2018023033A1 (en) * 2016-07-29 2018-02-01 Western Michigan University Research Foundation Magnetic nanoparticle-based gyroscopic sensor
US10591645B2 (en) * 2016-09-19 2020-03-17 Apple Inc. Electronic devices having scratch-resistant antireflection coatings
US10996125B2 (en) * 2017-05-17 2021-05-04 Infineon Technologies Ag Pressure sensors and method for forming a MEMS pressure sensor
US20220178692A1 (en) * 2017-12-21 2022-06-09 Mindmaze Holding Sa System, method and apparatus of a motion sensing stack with a camera system
CN109142785B (en) * 2018-09-10 2021-03-23 东南大学 Horizontal axis sensitive tunnel magnetic resistance accelerometer device based on 3D prints
US10871529B2 (en) 2018-09-11 2020-12-22 Honeywell International Inc. Spintronic mechanical shock and vibration sensor device
US10802087B2 (en) 2018-09-11 2020-10-13 Honeywell International Inc. Spintronic accelerometer
US10876839B2 (en) 2018-09-11 2020-12-29 Honeywell International Inc. Spintronic gyroscopic sensor device
CN111413653A (en) * 2019-01-07 2020-07-14 中国科学院上海微系统与信息技术研究所 Magnetic field sensor structure and preparation method thereof
CN109737944A (en) * 2019-03-01 2019-05-10 成都因赛泰科技有限责任公司 A kind of MEMS gyroscope with embedded magnetic source
US11054438B2 (en) 2019-03-29 2021-07-06 Honeywell International Inc. Magnetic spin hall effect spintronic accelerometer
CN111579818B (en) * 2020-07-06 2021-09-28 吉林大学 High-sensitivity low-noise acceleration detection device and method
US11844284B2 (en) * 2021-06-29 2023-12-12 International Business Machines Corporation On-chip integration of a high-efficiency and a high-retention inverted wide-base double magnetic tunnel junction device
CN115165005B (en) * 2022-08-26 2024-03-08 南京高华科技股份有限公司 MEMS flow sensor and preparation method thereof
CN116165576B (en) * 2022-12-23 2023-12-12 南方电网数字电网研究院有限公司 TMRz axis magnetic field sensor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6820896B1 (en) * 1998-05-19 2004-11-23 Peter Norton Seat occupant weight sensing system
US20070209437A1 (en) * 2005-10-18 2007-09-13 Seagate Technology Llc Magnetic MEMS device
US20100039106A1 (en) * 2008-08-14 2010-02-18 U.S. Government As Represented By The Secretary Of The Army Mems device with tandem flux concentrators and method of modulating flux
US20100170341A1 (en) * 2009-01-07 2010-07-08 Honeywell International Inc. Mems accelerometer having a flux concentrator between parallel magnets

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3800213A (en) * 1972-10-24 1974-03-26 Develco Three axis toroidal fluxgate type magnetic sensor
US5991085A (en) * 1995-04-21 1999-11-23 I-O Display Systems Llc Head-mounted personal visual display apparatus with image generator and holder
JP3000891B2 (en) * 1995-06-27 2000-01-17 株式会社村田製作所 Vibrating gyro
GB2322196B (en) * 1997-02-18 2000-10-18 British Aerospace A vibrating structure gyroscope
US5911156A (en) * 1997-02-24 1999-06-08 The Charles Stark Draper Laboratory, Inc. Split electrode to minimize charge transients, motor amplitude mismatch errors, and sensitivity to vertical translation in tuning fork gyros and other devices
US6133670A (en) 1999-06-24 2000-10-17 Sandia Corporation Compact electrostatic comb actuator
US6211599B1 (en) 1999-08-03 2001-04-03 Sandia Corporation Microelectromechanical ratcheting apparatus
US7541214B2 (en) * 1999-12-15 2009-06-02 Chang-Feng Wan Micro-electro mechanical device made from mono-crystalline silicon and method of manufacture therefore
US20040102880A1 (en) * 2001-10-17 2004-05-27 Brown James K System for monitoring vehicle wheel vibration
US7040163B2 (en) * 2002-08-12 2006-05-09 The Boeing Company Isolated planar gyroscope with internal radial sensing and actuation
US6944931B2 (en) * 2002-08-12 2005-09-20 The Boeing Company Method of producing an integral resonator sensor and case
US7168318B2 (en) * 2002-08-12 2007-01-30 California Institute Of Technology Isolated planar mesogyroscope
US7071594B1 (en) * 2002-11-04 2006-07-04 Microvision, Inc. MEMS scanner with dual magnetic and capacitive drive
US7054114B2 (en) * 2002-11-15 2006-05-30 Nve Corporation Two-axis magnetic field sensor
US7197928B2 (en) * 2003-11-04 2007-04-03 Chung-Shan Institute Of Science And Technology Solid-state gyroscopes and planar three-axis inertial measurement unit
DE102004011591A1 (en) * 2004-03-10 2005-09-29 Robert Bosch Gmbh connecting element
US7464590B1 (en) * 2004-03-12 2008-12-16 Thomson Licensing Digitally programmable bandwidth for vibratory rate gyroscope
US7200032B2 (en) * 2004-08-20 2007-04-03 Infineon Technologies Ag MRAM with vertical storage element and field sensor
KR101211576B1 (en) * 2004-11-04 2012-12-12 마이크로칩스 인코포레이티드 Compression and cold weld sealing methods and devices
EP1705665B1 (en) * 2005-03-24 2008-04-02 Hitachi Ltd. Conduction control device
US20070064351A1 (en) * 2005-09-13 2007-03-22 Wang Shan X Spin filter junction and method of fabricating the same
SG135077A1 (en) * 2006-02-27 2007-09-28 Nanyang Polytechnic Apparatus and method for non-invasively sensing pulse rate and blood flow anomalies
US8397568B2 (en) * 2006-04-24 2013-03-19 Milli Sensor Systems+Actuators Bias measurement for MEMS gyroscopes and accelerometers
AT503995B1 (en) * 2006-08-07 2009-03-15 Arc Seibersdorf Res Gmbh MINIATURE SENSOR ACCELERATION
US7793541B2 (en) * 2007-06-04 2010-09-14 The Boeing Company Planar resonator gyroscope central die attachment
US7987714B2 (en) * 2007-10-12 2011-08-02 The Boeing Company Disc resonator gyroscope with improved frequency coincidence and method of manufacture
WO2009050672A2 (en) * 2007-10-18 2009-04-23 Nxp B.V. Magnetic detection of back-side layer
WO2009109969A2 (en) * 2008-03-03 2009-09-11 Ramot At Tel-Aviv University Ltd. Micro scale mechanical rate sensors
US8322028B2 (en) * 2009-04-01 2012-12-04 The Boeing Company Method of producing an isolator for a microelectromechanical system (MEMS) die
US8393212B2 (en) * 2009-04-01 2013-03-12 The Boeing Company Environmentally robust disc resonator gyroscope
ITTO20091042A1 (en) * 2009-12-24 2011-06-25 St Microelectronics Srl MICROELETTROMECHANICAL INTEGRATED GYROSCOPE WITH IMPROVED DRIVE STRUCTURE
JP5558122B2 (en) * 2010-01-15 2014-07-23 株式会社リブ技術研究所 Communication circuit, relay connection circuit, and communication network
US8453504B1 (en) * 2010-01-23 2013-06-04 Minyao Mao Angular rate sensor with suppressed linear acceleration response
IT1403434B1 (en) * 2010-12-27 2013-10-17 St Microelectronics Srl MAGNETIC FIELD SENSOR WITH ANISOTROPIC MAGNETORESISTIVE ELEMENTS, WITH PERFECT ARRANGEMENT OF RELATIVE MAGNETIZATION ELEMENTS
US9588190B2 (en) * 2012-07-25 2017-03-07 Silicon Laboratories Inc. Resonant MEMS lorentz-force magnetometer using force-feedback and frequency-locked coil excitation
US9429427B2 (en) * 2012-12-19 2016-08-30 Intel Corporation Inductive inertial sensor architecture and fabrication in packaging build-up layers

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6820896B1 (en) * 1998-05-19 2004-11-23 Peter Norton Seat occupant weight sensing system
US20070209437A1 (en) * 2005-10-18 2007-09-13 Seagate Technology Llc Magnetic MEMS device
US20100039106A1 (en) * 2008-08-14 2010-02-18 U.S. Government As Represented By The Secretary Of The Army Mems device with tandem flux concentrators and method of modulating flux
US20100170341A1 (en) * 2009-01-07 2010-07-08 Honeywell International Inc. Mems accelerometer having a flux concentrator between parallel magnets

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9254992B2 (en) * 2012-07-27 2016-02-09 Tao Ju Method of making a MEMS gyroscope having a magnetic source and a magnetic sensing mechanism
US20140308757A1 (en) * 2012-07-27 2014-10-16 Tao Ju Mems device and a method of making the same
US9903884B2 (en) * 2012-10-16 2018-02-27 Csmc Technologies Fab1 Co. Ltd. Parallel plate capacitor and acceleration sensor comprising same
US20150233965A1 (en) * 2012-10-16 2015-08-20 Csmc Technologies Fab1 Co., Ltd. Parallel plate capacitor and acceleration sensor comprising same
US20150115952A1 (en) * 2013-10-31 2015-04-30 Invensense, Inc. Device with magnetic sensors with permanent magnets
US9513347B2 (en) * 2013-10-31 2016-12-06 Invensense, Inc. Device with magnetic sensors with permanent magnets
US20150192646A1 (en) * 2014-01-07 2015-07-09 Nvensense, Inc. Magnetic sensors with permanent magnets magnetized in different directions
US9513346B2 (en) * 2014-01-07 2016-12-06 Invensense, Inc. Magnetic sensors with permanent magnets magnetized in different directions
US20170184687A1 (en) * 2014-07-10 2017-06-29 Epcos Ag Sensor
US20170256107A1 (en) * 2014-08-19 2017-09-07 Sensormatic Electronics, LLC Method and system for access control proximity location
WO2016046778A2 (en) 2014-09-25 2016-03-31 Amgen Inc Protease-activatable bispecific proteins
DE102015117094A1 (en) * 2015-10-07 2017-04-13 Epcos Ag MEMS rate sensor
DE102015117094B4 (en) 2015-10-07 2020-04-23 Tdk Electronics Ag MEMS rotation rate sensor
CN109883456A (en) * 2019-04-02 2019-06-14 江苏多维科技有限公司 A kind of magneto-resistor inertial sensor chip
EP3954972A4 (en) * 2019-04-02 2022-12-14 MultiDimension Technology Co., Ltd. Magnetoresistive inertial sensor chip
US11940299B2 (en) 2019-04-02 2024-03-26 MultiDimension Technology Co., Ltd. Magnetoresistive inertial sensor chip

Also Published As

Publication number Publication date
US20140190257A1 (en) 2014-07-10
US20160154019A1 (en) 2016-06-02
US20150034620A1 (en) 2015-02-05
US10012670B2 (en) 2018-07-03
US20140026661A1 (en) 2014-01-30
US20150033856A1 (en) 2015-02-05
US20160153780A1 (en) 2016-06-02
US20140026660A1 (en) 2014-01-30
US20150033855A1 (en) 2015-02-05
US20140026659A1 (en) 2014-01-30
US20150033854A1 (en) 2015-02-05
US20150226555A1 (en) 2015-08-13
US20160154020A1 (en) 2016-06-02
US20160154070A1 (en) 2016-06-02

Similar Documents

Publication Publication Date Title
US20140026658A1 (en) Mems device and a method of using the same
US9254992B2 (en) Method of making a MEMS gyroscope having a magnetic source and a magnetic sensing mechanism
US7195945B1 (en) Minimizing the effect of 1/ƒ noise with a MEMS flux concentrator
US20150033853A1 (en) Mems gyroscope
US8486723B1 (en) Three axis magnetic sensor device and method
US20140266170A1 (en) Magnetometer using magnetic materials on accelerometer
US10119988B2 (en) MLU based accelerometer using a magnetic tunnel junction
CN107421525A (en) A kind of tunnel magnetoresistive disresonance type 3 axis MEMS gyro
CN102854339A (en) Micro acceleration transducer based on silicon substrate giant magnetoresistance effect
US20140290365A1 (en) Mems device
JP2009122041A (en) Composite sensor
CN107356249A (en) A kind of micro- inertia component of tunnel magnetoresistive detection
CN107131819B (en) Single-axis micro-mechanical displacement sensor based on tunnel magnetoresistance effect
CN204730842U (en) A kind of micromechanical gyro based on tunnel magneto-resistance effect
CN107449410A (en) Microthrust test device is detected in electromagnetic drive type tunnel magnetoresistive face
CN110940329A (en) Triaxial microgyroscope device based on tunnel magnetic resistance detection
CN207395750U (en) Microthrust test device is detected in electromagnetic drive type tunnel magnetoresistive face
CN111521842A (en) Electrostatic rigidity adjustment Z-axis resonant micro-accelerometer based on tunnel magnetic resistance detection
CN207197533U (en) A kind of tunnel magnetoresistive disresonance type 3 axis MEMS gyro
Marra et al. 100 nT/√ Hz, 0.5 mm 2 monolithic, multi-loop low-power 3-axis MEMS magnetometer
JP4331630B2 (en) Magnetic sensor
CN110966997A (en) Piezoelectric driving type micro gyroscope device for in-plane detection of tunnel magneto-resistive
JP2009041949A (en) Magnetic acceleration sensor
CN111609870B (en) Large-scale production method of micro-electromechanical system sensor
CN211696425U (en) Triaxial microgyroscope device based on tunnel magnetic resistance detection

Legal Events

Date Code Title Description
STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION