US3814983A - Apparatus and method for plasma generation and material treatment with electromagnetic radiation - Google Patents
Apparatus and method for plasma generation and material treatment with electromagnetic radiation Download PDFInfo
- Publication number
- US3814983A US3814983A US00224038A US22403872A US3814983A US 3814983 A US3814983 A US 3814983A US 00224038 A US00224038 A US 00224038A US 22403872 A US22403872 A US 22403872A US 3814983 A US3814983 A US 3814983A
- Authority
- US
- United States
- Prior art keywords
- microwave
- slow wave
- energy
- plasma
- wave structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
Abstract
Description
Claims (32)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00224038A US3814983A (en) | 1972-02-07 | 1972-02-07 | Apparatus and method for plasma generation and material treatment with electromagnetic radiation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00224038A US3814983A (en) | 1972-02-07 | 1972-02-07 | Apparatus and method for plasma generation and material treatment with electromagnetic radiation |
Publications (1)
Publication Number | Publication Date |
---|---|
US3814983A true US3814983A (en) | 1974-06-04 |
Family
ID=22839048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00224038A Expired - Lifetime US3814983A (en) | 1972-02-07 | 1972-02-07 | Apparatus and method for plasma generation and material treatment with electromagnetic radiation |
Country Status (1)
Country | Link |
---|---|
US (1) | US3814983A (en) |
Cited By (56)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3147986A1 (en) * | 1981-12-04 | 1983-06-16 | Leybold-Heraeus GmbH, 5000 Köln | DEVICE FOR PRODUCING A MICROWAVE PLASMA FOR TREATING SUBSTRATES, IN PARTICULAR FOR PLASMAPOLYMERIZATION OF MONOMERS |
DE3314375A1 (en) * | 1982-04-29 | 1983-11-03 | Energy Conversion Devices, Inc., 48084 Troy, Mich. | GAS LOCK |
US4474828A (en) * | 1983-03-30 | 1984-10-02 | Sperry Corporation | Method of controlling the supercurrent of a Josephson junction device |
US4524080A (en) * | 1982-06-16 | 1985-06-18 | House Food Industrial Company Limited | Method of improving quality of wheat flour |
US4599678A (en) * | 1985-03-19 | 1986-07-08 | Wertheimer Michael R | Plasma-deposited capacitor dielectrics |
DE3521318A1 (en) * | 1985-06-14 | 1986-12-18 | Leybold-Heraeus GmbH, 5000 Köln | METHOD AND DEVICE FOR TREATING, IN PARTICULAR FOR COATING, SUBSTRATES BY PLASMA DISCHARGE |
US4633140A (en) * | 1984-12-24 | 1986-12-30 | Fusion Systems Corporation | Electrodeless lamp having staggered turn-on of microwave sources |
US4673846A (en) * | 1984-03-02 | 1987-06-16 | Mitsubishi Denki Kabushiki Kaisha | Microwave discharge light source apparatus |
US4728863A (en) * | 1985-12-04 | 1988-03-01 | Wertheimer Michael R | Apparatus and method for plasma treatment of substrates |
DE3711184A1 (en) * | 1987-04-02 | 1988-10-20 | Leybold Ag | DEVICE FOR THE APPLICATION OF MICROWAVE ENERGY WITH AN OPEN MICROWAVE LEAD |
EP0335675A2 (en) * | 1988-03-29 | 1989-10-04 | Canon Kabushiki Kaisha | Large area microwave plasma apparatus |
US4883570A (en) * | 1987-06-08 | 1989-11-28 | Research-Cottrell, Inc. | Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves |
DE3440651C1 (en) * | 1984-11-07 | 1990-02-15 | BMP Plasmatechnologie GmbH, 8046 Garching | Process and device for the surface pretreatment of workpieces by means of low-pressure plasma |
US4939424A (en) * | 1987-02-21 | 1990-07-03 | Leybold Aktiengesellschaft | Apparatus for producing a plasma and for the treatment of substrates |
US5055421A (en) * | 1987-08-03 | 1991-10-08 | Siemens Aktiengesellschaft | Method for the plasma deposition of hydrogenated, amorphous carbon using predetermined retention times of gaseous hydrocarbons |
US5063330A (en) * | 1988-05-09 | 1991-11-05 | Centre National De La Recherche Scientifique | Plasma reactor |
EP0462377A2 (en) * | 1990-06-21 | 1991-12-27 | Leybold Aktiengesellschaft | Ion source |
US5131992A (en) * | 1990-01-08 | 1992-07-21 | The United States Of America, As Represented By The Secretary Of The Interior | Microwave induced plasma process for producing tungsten carbide |
DE4218196A1 (en) * | 1992-06-03 | 1993-12-09 | Fraunhofer Ges Forschung | Installation for surface treatment of components by low-pressure plasma - with the low-pressure container sealed by the component undergoing treatment |
US5276386A (en) * | 1991-03-06 | 1994-01-04 | Hitachi, Ltd. | Microwave plasma generating method and apparatus |
US5296036A (en) * | 1990-11-29 | 1994-03-22 | Canon Kabushiki Kaisha | Apparatus for continuously forming a large area functional deposit film including microwave transmissive member transfer mean |
DE4308632A1 (en) * | 1993-03-18 | 1994-09-22 | Leybold Ag | Method and device for the post-treatment of aluminium-coated plastic films |
US5397395A (en) * | 1990-10-29 | 1995-03-14 | Canon Kabushiki Kaisha | Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same |
US5397962A (en) * | 1992-06-29 | 1995-03-14 | Texas Instruments Incorporated | Source and method for generating high-density plasma with inductive power coupling |
EP0667921A1 (en) * | 1992-11-13 | 1995-08-23 | Energy Conversion Devices, Inc. | Microwave apparatus for depositing thin films |
DE4423471A1 (en) * | 1994-07-05 | 1996-01-11 | Buck Chem Tech Werke | Device for the plasma treatment of fine-grained goods |
US5510151A (en) * | 1989-06-28 | 1996-04-23 | Canon Kabushiki Kaisha | Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space |
US5514217A (en) * | 1990-11-16 | 1996-05-07 | Canon Kabushiki Kaisha | Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof |
US5520740A (en) * | 1989-06-28 | 1996-05-28 | Canon Kabushiki Kaisha | Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same |
US5527391A (en) * | 1989-06-28 | 1996-06-18 | Canon Kabushiki Kaisha | Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method |
US5580595A (en) * | 1993-11-01 | 1996-12-03 | Unilever Patent Holdings B.V. | Process for the preparation of a food product |
US5789040A (en) * | 1997-05-21 | 1998-08-04 | Optical Coating Laboratory, Inc. | Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition |
EP0949013A2 (en) * | 1998-04-04 | 1999-10-13 | Beiersdorf Aktiengesellschaft | Process for manufacturing an adhesion promoting layer |
US5976257A (en) * | 1991-01-23 | 1999-11-02 | Canon Kabushiki Kaisha | Apparatus for continuously forming a large area deposited film by means of microwave plasma CVD process |
US6083355A (en) * | 1997-07-14 | 2000-07-04 | The University Of Tennessee Research Corporation | Electrodes for plasma treater systems |
US6087778A (en) * | 1996-06-28 | 2000-07-11 | Lam Research Corporation | Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna |
US6106659A (en) * | 1997-07-14 | 2000-08-22 | The University Of Tennessee Research Corporation | Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials |
DE19923018A1 (en) * | 1999-05-19 | 2000-11-30 | Univ Dresden Tech | Plasma treatment apparatus, for strip materials or linked individual flat substrates, comprises a screened rectangular passage with a wound internal conductor enclosing a moving workpiece |
US6175095B1 (en) | 1999-03-18 | 2001-01-16 | Gasonics International | Resonant impedance-matching slow-wave ring structure microwave applicator for plasmas |
US6211621B1 (en) * | 1999-03-18 | 2001-04-03 | Gasonics International | Energy transfer microwave plasma source |
US6246175B1 (en) | 1999-10-25 | 2001-06-12 | National Science Council | Large area microwave plasma generator |
US6281492B1 (en) * | 1996-12-30 | 2001-08-28 | Almesaaker Marianne | Method and device for directing a fluid in motion |
US6518703B1 (en) * | 1998-03-16 | 2003-02-11 | Matsushita Electrical Industrial Co., Ltd. | Electrodeless discharge energy supply apparatus and electrodeless discharge lamp device using surface wave transmission line |
US6633130B2 (en) * | 2002-03-06 | 2003-10-14 | Lg Electronics Inc. | Cooling system of lighting apparatus using microwave energy |
WO2004068559A2 (en) * | 2003-01-30 | 2004-08-12 | Axcelis Technologies Inc. | Helix coupled remote plasma source |
US20050163816A1 (en) * | 2002-03-08 | 2005-07-28 | Board Of Regents, The University Of Texas Systems | Gas-plasma treatment of implants |
DE102007031629B3 (en) * | 2007-07-06 | 2009-03-19 | Eastman Kodak Co. | Microwave stimulated-radiation source for use in printing medium fixing device, has segments positioned on different areas of lamp body, where microwave power output of one segment is adjusted independent of other segment |
US20100320916A1 (en) * | 2008-01-18 | 2010-12-23 | Kyocera Corporation | Plasma Generator and Discharge Device and Reactor Using Plasma Generator |
WO2012087730A1 (en) | 2010-12-21 | 2012-06-28 | Advanced Technologies And Regenerative Medicine, Llc | Silicone polymer substrates having improved biological response from hkdcs |
WO2012087616A2 (en) | 2010-12-21 | 2012-06-28 | Advanced Technologies And Regenerative Medicine, Llc | Polymer substrates having improved biological response from hkdcs |
WO2012174054A1 (en) | 2011-06-17 | 2012-12-20 | Ethicon, Inc. | Process for in situ plasma polymerization of silicone coating for surgical needles |
US20130041199A1 (en) * | 2011-08-12 | 2013-02-14 | Harris Corporation | Method for the sublimation or pyrolysis of hydrocarbons using rf energy to break covalent bonds |
US8657354B2 (en) * | 2006-05-19 | 2014-02-25 | Breya, Llc. | Mobile radiation therapy |
US20140251955A1 (en) * | 2013-03-05 | 2014-09-11 | National University Corporation Nagoya University | Microwave waveguide apparatus, plasma processing apparatus and plasma processing method |
EP3686916A1 (en) * | 2019-01-25 | 2020-07-29 | Ining s.r.o. | Gasification device and plasma shutter with slowing system of the gasification device |
US11469077B2 (en) * | 2018-04-24 | 2022-10-11 | FD3M, Inc. | Microwave plasma chemical vapor deposition device and application thereof |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3111604A (en) * | 1960-06-13 | 1963-11-19 | Ericsson Telefon Ab L M | Electronic device for generating or amplifying high frequency oscillations |
US3270244A (en) * | 1963-01-29 | 1966-08-30 | Nippon Electric Co | Micro-wave amplifier utilizing the interaction between an electron beam and a plasma stream |
US3317784A (en) * | 1962-08-10 | 1967-05-02 | M O Valve Co Ltd | Travelling wave tube using a plasmafilled waveguide as a slow wave structure |
US3358179A (en) * | 1964-03-09 | 1967-12-12 | Sfd Lab Inc | Discharge device slow wave circuit wherein the beam alternately interacts with the series and shunt voltage fields of the slow wave structure |
US3374393A (en) * | 1965-02-12 | 1968-03-19 | Melpar Inc | Intense incoherent light source obtained by quenching the higher excited states and concentrating the energy on the lower states |
US3378723A (en) * | 1964-01-02 | 1968-04-16 | Rca Corp | Fast wave transmission line coupled to a plasma |
US3431461A (en) * | 1962-01-22 | 1969-03-04 | Hitachi Ltd | Electron cyclotron resonance heating device |
US3470489A (en) * | 1968-03-11 | 1969-09-30 | Nasa | Parametric microwave noise generator |
US3549938A (en) * | 1962-01-03 | 1970-12-22 | Varian Associates | Microwave tube with a rod array slow wave circuit having capacitive coupling between alternate rods |
US3646388A (en) * | 1970-06-01 | 1972-02-29 | Raytheon Co | Crossed field microwave device |
US3663858A (en) * | 1969-11-06 | 1972-05-16 | Giuseppe Lisitano | Radio-frequency plasma generator |
-
1972
- 1972-02-07 US US00224038A patent/US3814983A/en not_active Expired - Lifetime
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3111604A (en) * | 1960-06-13 | 1963-11-19 | Ericsson Telefon Ab L M | Electronic device for generating or amplifying high frequency oscillations |
US3549938A (en) * | 1962-01-03 | 1970-12-22 | Varian Associates | Microwave tube with a rod array slow wave circuit having capacitive coupling between alternate rods |
US3431461A (en) * | 1962-01-22 | 1969-03-04 | Hitachi Ltd | Electron cyclotron resonance heating device |
US3317784A (en) * | 1962-08-10 | 1967-05-02 | M O Valve Co Ltd | Travelling wave tube using a plasmafilled waveguide as a slow wave structure |
US3270244A (en) * | 1963-01-29 | 1966-08-30 | Nippon Electric Co | Micro-wave amplifier utilizing the interaction between an electron beam and a plasma stream |
US3378723A (en) * | 1964-01-02 | 1968-04-16 | Rca Corp | Fast wave transmission line coupled to a plasma |
US3358179A (en) * | 1964-03-09 | 1967-12-12 | Sfd Lab Inc | Discharge device slow wave circuit wherein the beam alternately interacts with the series and shunt voltage fields of the slow wave structure |
US3374393A (en) * | 1965-02-12 | 1968-03-19 | Melpar Inc | Intense incoherent light source obtained by quenching the higher excited states and concentrating the energy on the lower states |
US3470489A (en) * | 1968-03-11 | 1969-09-30 | Nasa | Parametric microwave noise generator |
US3663858A (en) * | 1969-11-06 | 1972-05-16 | Giuseppe Lisitano | Radio-frequency plasma generator |
US3646388A (en) * | 1970-06-01 | 1972-02-29 | Raytheon Co | Crossed field microwave device |
Cited By (85)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4521717A (en) * | 1981-10-17 | 1985-06-04 | Leybold-Heraeus Gmbh | Apparatus for producing a microwave plasma for the treatment of substrates, in particular for the plasma-polymerization of monomers thereon |
DE3147986A1 (en) * | 1981-12-04 | 1983-06-16 | Leybold-Heraeus GmbH, 5000 Köln | DEVICE FOR PRODUCING A MICROWAVE PLASMA FOR TREATING SUBSTRATES, IN PARTICULAR FOR PLASMAPOLYMERIZATION OF MONOMERS |
DE4132556A1 (en) * | 1981-12-04 | 1993-01-07 | Ecole Polytech | DEVICE FOR GENERATING A MICROWAVE PLASMA FOR THE TREATMENT OF SUBSTRATES, IN PARTICULAR FOR THE MONASTERY PLASMAPOLYMERIZATION |
DE3314375A1 (en) * | 1982-04-29 | 1983-11-03 | Energy Conversion Devices, Inc., 48084 Troy, Mich. | GAS LOCK |
US4524080A (en) * | 1982-06-16 | 1985-06-18 | House Food Industrial Company Limited | Method of improving quality of wheat flour |
US4474828A (en) * | 1983-03-30 | 1984-10-02 | Sperry Corporation | Method of controlling the supercurrent of a Josephson junction device |
US4673846A (en) * | 1984-03-02 | 1987-06-16 | Mitsubishi Denki Kabushiki Kaisha | Microwave discharge light source apparatus |
DE3440651C1 (en) * | 1984-11-07 | 1990-02-15 | BMP Plasmatechnologie GmbH, 8046 Garching | Process and device for the surface pretreatment of workpieces by means of low-pressure plasma |
US4633140A (en) * | 1984-12-24 | 1986-12-30 | Fusion Systems Corporation | Electrodeless lamp having staggered turn-on of microwave sources |
US4599678A (en) * | 1985-03-19 | 1986-07-08 | Wertheimer Michael R | Plasma-deposited capacitor dielectrics |
DE3521318A1 (en) * | 1985-06-14 | 1986-12-18 | Leybold-Heraeus GmbH, 5000 Köln | METHOD AND DEVICE FOR TREATING, IN PARTICULAR FOR COATING, SUBSTRATES BY PLASMA DISCHARGE |
US4863756A (en) * | 1985-06-14 | 1989-09-05 | Leybold Aktiengesellschaft | Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plasma |
US4728863A (en) * | 1985-12-04 | 1988-03-01 | Wertheimer Michael R | Apparatus and method for plasma treatment of substrates |
US4939424A (en) * | 1987-02-21 | 1990-07-03 | Leybold Aktiengesellschaft | Apparatus for producing a plasma and for the treatment of substrates |
US4847460A (en) * | 1987-04-02 | 1989-07-11 | Leybold Aktiengesellschaft | Apparatus for injecting microwave energy by means of an open microwave guide |
DE3711184A1 (en) * | 1987-04-02 | 1988-10-20 | Leybold Ag | DEVICE FOR THE APPLICATION OF MICROWAVE ENERGY WITH AN OPEN MICROWAVE LEAD |
US4883570A (en) * | 1987-06-08 | 1989-11-28 | Research-Cottrell, Inc. | Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves |
US5055421A (en) * | 1987-08-03 | 1991-10-08 | Siemens Aktiengesellschaft | Method for the plasma deposition of hydrogenated, amorphous carbon using predetermined retention times of gaseous hydrocarbons |
US4893584A (en) * | 1988-03-29 | 1990-01-16 | Energy Conversion Devices, Inc. | Large area microwave plasma apparatus |
EP0335675A3 (en) * | 1988-03-29 | 1990-02-07 | Canon Kabushiki Kaisha | Large area microwave plasma apparatus |
EP0335675A2 (en) * | 1988-03-29 | 1989-10-04 | Canon Kabushiki Kaisha | Large area microwave plasma apparatus |
US5063330A (en) * | 1988-05-09 | 1991-11-05 | Centre National De La Recherche Scientifique | Plasma reactor |
US5714010A (en) * | 1989-06-28 | 1998-02-03 | Canon Kabushiki Kaisha | Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same |
US5520740A (en) * | 1989-06-28 | 1996-05-28 | Canon Kabushiki Kaisha | Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same |
US5510151A (en) * | 1989-06-28 | 1996-04-23 | Canon Kabushiki Kaisha | Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space |
US5527391A (en) * | 1989-06-28 | 1996-06-18 | Canon Kabushiki Kaisha | Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method |
US5131992A (en) * | 1990-01-08 | 1992-07-21 | The United States Of America, As Represented By The Secretary Of The Interior | Microwave induced plasma process for producing tungsten carbide |
EP0462377A2 (en) * | 1990-06-21 | 1991-12-27 | Leybold Aktiengesellschaft | Ion source |
DE4019729A1 (en) * | 1990-06-21 | 1992-01-02 | Leybold Ag | ION SOURCE |
US5124526A (en) * | 1990-06-21 | 1992-06-23 | Leybold Aktiengesellschaft | Ion source |
EP0462377A3 (en) * | 1990-06-21 | 1992-05-13 | Leybold Aktiengesellschaft | Ion source |
US5397395A (en) * | 1990-10-29 | 1995-03-14 | Canon Kabushiki Kaisha | Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same |
US5523126A (en) * | 1990-10-29 | 1996-06-04 | Canon Kabushiki Kaisha | Method of continuously forming a large area functional deposited film by microwave PCVD |
US5514217A (en) * | 1990-11-16 | 1996-05-07 | Canon Kabushiki Kaisha | Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof |
US5296036A (en) * | 1990-11-29 | 1994-03-22 | Canon Kabushiki Kaisha | Apparatus for continuously forming a large area functional deposit film including microwave transmissive member transfer mean |
US5976257A (en) * | 1991-01-23 | 1999-11-02 | Canon Kabushiki Kaisha | Apparatus for continuously forming a large area deposited film by means of microwave plasma CVD process |
US5276386A (en) * | 1991-03-06 | 1994-01-04 | Hitachi, Ltd. | Microwave plasma generating method and apparatus |
DE4218196A1 (en) * | 1992-06-03 | 1993-12-09 | Fraunhofer Ges Forschung | Installation for surface treatment of components by low-pressure plasma - with the low-pressure container sealed by the component undergoing treatment |
US5397962A (en) * | 1992-06-29 | 1995-03-14 | Texas Instruments Incorporated | Source and method for generating high-density plasma with inductive power coupling |
EP0667921A4 (en) * | 1992-11-13 | 1997-12-29 | Energy Conversion Devices Inc | Microwave apparatus for depositing thin films. |
EP0667921A1 (en) * | 1992-11-13 | 1995-08-23 | Energy Conversion Devices, Inc. | Microwave apparatus for depositing thin films |
DE4308632A1 (en) * | 1993-03-18 | 1994-09-22 | Leybold Ag | Method and device for the post-treatment of aluminium-coated plastic films |
DE4308632B4 (en) * | 1993-03-18 | 2007-10-04 | Applied Materials Gmbh & Co. Kg | Method and device for the aftertreatment of aluminum-coated plastic films |
US5580595A (en) * | 1993-11-01 | 1996-12-03 | Unilever Patent Holdings B.V. | Process for the preparation of a food product |
DE4423471A1 (en) * | 1994-07-05 | 1996-01-11 | Buck Chem Tech Werke | Device for the plasma treatment of fine-grained goods |
US6087778A (en) * | 1996-06-28 | 2000-07-11 | Lam Research Corporation | Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna |
US6281492B1 (en) * | 1996-12-30 | 2001-08-28 | Almesaaker Marianne | Method and device for directing a fluid in motion |
US5789040A (en) * | 1997-05-21 | 1998-08-04 | Optical Coating Laboratory, Inc. | Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition |
US6106659A (en) * | 1997-07-14 | 2000-08-22 | The University Of Tennessee Research Corporation | Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials |
US6083355A (en) * | 1997-07-14 | 2000-07-04 | The University Of Tennessee Research Corporation | Electrodes for plasma treater systems |
US6518703B1 (en) * | 1998-03-16 | 2003-02-11 | Matsushita Electrical Industrial Co., Ltd. | Electrodeless discharge energy supply apparatus and electrodeless discharge lamp device using surface wave transmission line |
EP0949013A3 (en) * | 1998-04-04 | 2003-04-16 | Tesa AG | Process for manufacturing an adhesion promoting layer |
EP0949013A2 (en) * | 1998-04-04 | 1999-10-13 | Beiersdorf Aktiengesellschaft | Process for manufacturing an adhesion promoting layer |
US6211621B1 (en) * | 1999-03-18 | 2001-04-03 | Gasonics International | Energy transfer microwave plasma source |
US6175095B1 (en) | 1999-03-18 | 2001-01-16 | Gasonics International | Resonant impedance-matching slow-wave ring structure microwave applicator for plasmas |
DE19923018A1 (en) * | 1999-05-19 | 2000-11-30 | Univ Dresden Tech | Plasma treatment apparatus, for strip materials or linked individual flat substrates, comprises a screened rectangular passage with a wound internal conductor enclosing a moving workpiece |
DE19923018C2 (en) * | 1999-05-19 | 2001-09-27 | Univ Dresden Tech | Device for processing band-shaped workpieces using resonant high-frequency plasmas |
US6246175B1 (en) | 1999-10-25 | 2001-06-12 | National Science Council | Large area microwave plasma generator |
US6633130B2 (en) * | 2002-03-06 | 2003-10-14 | Lg Electronics Inc. | Cooling system of lighting apparatus using microwave energy |
US7803393B2 (en) | 2002-03-08 | 2010-09-28 | Board Of Regents, The University Of Texas System | Preparing an implant by gas-plasma treatment of a substrate to couple cells |
US20050163816A1 (en) * | 2002-03-08 | 2005-07-28 | Board Of Regents, The University Of Texas Systems | Gas-plasma treatment of implants |
WO2004068559A2 (en) * | 2003-01-30 | 2004-08-12 | Axcelis Technologies Inc. | Helix coupled remote plasma source |
JP2006516806A (en) * | 2003-01-30 | 2006-07-06 | アクセリス テクノロジーズ インコーポレーテッド | Spiral coil coupled remote plasma source |
WO2004068559A3 (en) * | 2003-01-30 | 2004-11-11 | Axcelis Tech Inc | Helix coupled remote plasma source |
US8657354B2 (en) * | 2006-05-19 | 2014-02-25 | Breya, Llc. | Mobile radiation therapy |
DE102007031629B3 (en) * | 2007-07-06 | 2009-03-19 | Eastman Kodak Co. | Microwave stimulated-radiation source for use in printing medium fixing device, has segments positioned on different areas of lamp body, where microwave power output of one segment is adjusted independent of other segment |
US20100320916A1 (en) * | 2008-01-18 | 2010-12-23 | Kyocera Corporation | Plasma Generator and Discharge Device and Reactor Using Plasma Generator |
US8729805B2 (en) * | 2008-01-18 | 2014-05-20 | Kyocera Corporation | Plasma generator and discharge device and reactor using plasma generator |
WO2012087730A1 (en) | 2010-12-21 | 2012-06-28 | Advanced Technologies And Regenerative Medicine, Llc | Silicone polymer substrates having improved biological response from hkdcs |
WO2012087616A2 (en) | 2010-12-21 | 2012-06-28 | Advanced Technologies And Regenerative Medicine, Llc | Polymer substrates having improved biological response from hkdcs |
WO2012174054A1 (en) | 2011-06-17 | 2012-12-20 | Ethicon, Inc. | Process for in situ plasma polymerization of silicone coating for surgical needles |
US20130041199A1 (en) * | 2011-08-12 | 2013-02-14 | Harris Corporation | Method for the sublimation or pyrolysis of hydrocarbons using rf energy to break covalent bonds |
US8888995B2 (en) * | 2011-08-12 | 2014-11-18 | Harris Corporation | Method for the sublimation or pyrolysis of hydrocarbons using RF energy to break covalent bonds |
US20140251955A1 (en) * | 2013-03-05 | 2014-09-11 | National University Corporation Nagoya University | Microwave waveguide apparatus, plasma processing apparatus and plasma processing method |
US9252000B2 (en) * | 2013-03-05 | 2016-02-02 | National University Corporation Nagoya University | Microwave waveguide apparatus, plasma processing apparatus and plasma processing method |
US11469077B2 (en) * | 2018-04-24 | 2022-10-11 | FD3M, Inc. | Microwave plasma chemical vapor deposition device and application thereof |
CN113348531A (en) * | 2019-01-25 | 2021-09-03 | 伊宁有限公司 | Gasification device and plasma switch with microwave plasma deceleration system of gasification device |
WO2020151774A1 (en) | 2019-01-25 | 2020-07-30 | Ining S.R.O. | Gasification device and plasma shutter with a microwave plazma slowing system of the gasification device |
KR20210124285A (en) * | 2019-01-25 | 2021-10-14 | 이닝 에스.알.오. | Plasma Shutter with Gasification Device and Microwave Plasma Delay System of Gasification Device |
JP2022510725A (en) * | 2019-01-25 | 2022-01-27 | イニング エス.アール.オー. | A gasification device and a plasma shutter with a microwave plasma deceleration system for the gasification device. |
JP7025815B2 (en) | 2019-01-25 | 2022-02-25 | イニング エス.アール.オー. | A gasification device and a plasma shutter with a microwave plasma deceleration system for the gasification device. |
EA039756B1 (en) * | 2019-01-25 | 2022-03-10 | Ининг С.Р.О. | Gasification device and plasma shutter with a microwave plazma slowing system of the gasification device |
CN113348531B (en) * | 2019-01-25 | 2022-07-08 | 伊宁有限公司 | Gasification device and plasma switch with microwave plasma deceleration system of gasification device |
US11393660B2 (en) * | 2019-01-25 | 2022-07-19 | Ining S.Ro. | Gasification device and plasma shutter with a microwave plazma slowing system of the gasification device |
EP3686916A1 (en) * | 2019-01-25 | 2020-07-29 | Ining s.r.o. | Gasification device and plasma shutter with slowing system of the gasification device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3814983A (en) | Apparatus and method for plasma generation and material treatment with electromagnetic radiation | |
Bosisio et al. | The large volume microwave plasma generator (LMP™): A new tool for research and industrial processing | |
JP3163193B2 (en) | [TMNMO] Microwave discharge device with cavity | |
US3911318A (en) | Method and apparatus for generating electromagnetic radiation | |
US6029602A (en) | Apparatus and method for efficient and compact remote microwave plasma generation | |
US3872349A (en) | Apparatus and method for generating radiation | |
CN101395973B (en) | Plasma generator and method of generating plasma using the same | |
US4883570A (en) | Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves | |
US6224836B1 (en) | Device for exciting a gas by a surface wave plasma and gas treatment apparatus incorporating such a device | |
US4049940A (en) | Devices and methods of using HF waves to energize a column of gas enclosed in an insulating casing | |
KR960005583B1 (en) | Process for the electrical excitation of laser gas | |
US4933602A (en) | Apparatus for generating light by utilizing microwave | |
JPH04223039A (en) | Irradiation device | |
KR970071945A (en) | Plasma treatment method and apparatus | |
US4513424A (en) | Laser pumped by X-band microwaves | |
CA2666131A1 (en) | Device and method for locally producing microwave plasma | |
Bosisio et al. | Generation of large volume microwave plasmas | |
US6863773B1 (en) | Linearly extended device for large-surface microwave treatment and for large surface plasma production | |
US5270616A (en) | Microwave plasma generating apparatus | |
US4247379A (en) | Method for chemical reactions using high intensity radiant energy and system therefor | |
US5144199A (en) | Microwave discharge light source device | |
Weissfloch et al. | Plasma-generating apparatus and process | |
JPH0562649A (en) | Microwave-excited type ultraviolet lamp device | |
CN115442951A (en) | Double-frequency microwave low-pressure plasma source based on waveguide slot feed multi-die cavity | |
EP0420101A2 (en) | Microwave plasma generating apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: CENTRE D'INNOVATION INDUSTRIELLE (MONTREAL), MONTR Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:LA CORPORATION DE L'ECOLE POLYTECHNIQUE;REEL/FRAME:004164/0584 Effective date: 19830816 |
|
STCF | Information on status: patent grant |
Free format text: PATENTED FILE - (OLD CASE ADDED FOR FILE TRACKING PURPOSES) |
|
AS | Assignment |
Owner name: CORPORATION DE L'ECOLE POLYTECHNIQUE DE MONTREAL, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:CENTRE D'INNOVATION INDUSTRIELLE MONTREAL;REEL/FRAME:004658/0966 Effective date: 19861023 Owner name: CORPORATION DE L'ECOLE POLYTECHNIQUE DE MONTREAL, Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:CENTRE D'INNOVATION INDUSTRIELLE MONTREAL;REEL/FRAME:004658/0966 Effective date: 19861023 |
|
AS | Assignment |
Owner name: POLYPLASMA INC., 630 DORCHESTER BLVD. WEST, SUIT 2 Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:CORPORATION DE L'ECOLE POLYTECHNIQUE DE MONTREAL;REEL/FRAME:004837/0464 Effective date: 19871130 |