US3886310A - Electrostatically deflectable light valve with improved diffraction properties - Google Patents
Electrostatically deflectable light valve with improved diffraction properties Download PDFInfo
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- US3886310A US3886310A US390470A US39047073A US3886310A US 3886310 A US3886310 A US 3886310A US 390470 A US390470 A US 390470A US 39047073 A US39047073 A US 39047073A US 3886310 A US3886310 A US 3886310A
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- light
- wing portions
- core portion
- reflective
- central core
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/74—Projection arrangements for image reproduction, e.g. using eidophor
- H04N5/7416—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal
- H04N5/7425—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal the modulator being a dielectric deformable layer controlled by an electron beam, e.g. eidophor projector
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/37—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements
- G09F9/372—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being movable elements the positions of the elements being controlled by the application of an electric field
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/12—Screens on or from which an image or pattern is formed, picked up, converted or stored acting as light valves by shutter operation, e.g. for eidophor
Definitions
- the light valve structure is such that a plurality of reflective wing portions are free to be deflected along directional axes which are at an angle to the prime directional axes of the overall array, so that light which is predominantly diffracted along the array axes may be decoupled or separated from the signal light produced by activated light valves and used to project the image.
- the contrast ratio of signal light to background light for the system is significantly improved, using this method of discrimination.
- FIG. 5 3f ELECTROSTATICALLY DEFLECTABLE LIGHT VALVE WITH IMPROVED DIFFRACTION PROPERTIES BACKGROUND OF THE INVENTION 1.
- This invention relates to electrostatically deflectable light valves which are adpated for use with a cathode ray tube, and in conjunction with schlieren optics forming a system for projecting television images upon a large display screen, and which may be operated either as a real-time or a storage mode device.
- Another feasible system utilizes an array of electrostatically deflectable light valves or very small mirrors, which are deflectable corresponding to the informational pattern.
- Such a system is disclosed in US. Pat. No. 3,746,91 1.
- an array of the deflectable light valves form the target of a cathode ray tube.
- An external light source is directed onto this target which is modulated to deflect individual valves of the array in an informational pattern.
- the light is reflected from the light valves, and for deflected valves the light is stopped while for deflected valves the light passes the schlieren stop and is projected upon the display screen with suitable magnification.
- a problem with these prior art television image pro jection systems is the poor screen contrast caused by optical diffraction effects related to the target array.
- arrays have rows and columns of light valves which define an array having an X and a Y axes.
- the electrostatic deflection of each light valve modifies the diffraction pattern of the reflected light by tilting of the reflective plane as well as bending or bowing of the reflective surface. Because of constructional constraints the deflection of the light valves is also along one of these major axes. This diffraction effect causes light to pass about the schlieren optical stop primarily along one of the major axes of the array.
- a reflective light valve element having a structure which permits the elimination of transmission of background light to the screen to provide significantly improved contrast for the display.
- the light reflective element is adapted for use in an array as part of a projection system for displaying television images.
- the light reflective element comprises a central core portion supported by a central post member which extends from the underside of the core portion.
- a plurality of symmetrically spaced and shaped deformable reflective wing portions extend outwardly from the cen tral core portion. The extending ends of the wing por tions have slits therebetween.
- the slits are aligned with the predominant axes of the array,
- the wing portions are then free to bend or deflect along an axis which is at an angle to the predominant axes of the array.
- a method of providing this improved light valve structure is also detailed.
- FIG. 1 is a schematic overall view of a projection system of the present invention.
- FIG. 2 is an enlarged plan view of a single light valve of the present invention.
- FIG. 3 is a sectional view taken along line Ill-Ill of FIG. 2 of the light valve.
- FIG. 4 illustrates the various stages of preparation of the light valve of the present invention.
- FIG. 5 illustrates the various stages of another method of construction of the present light valve.
- FIG. 6 is a perspective view of the schlieren stop used in the projection system of the present invention.
- the projection system comprises an electron beam tube 10.
- a high intensity light source 12 of preferably well balanced light is provided for illumination.
- the light from source 12 is focused by a lens 14 and refracted by a 45 angle reflective schlieren mirror 15.
- the reflected light is collimated by lens 18 onto target 20 associated with the faceplate of cathode ray tube 10.
- the light will be reflected back from element 22 to be focused on the schlieren mirror 15 and remain within the original light cone.
- Deflection or deformation of a light valve element due to electrostatic forces as will be explained will result in the light passing the schlieren mirror 15 and being projected through lens system 24 to the enlarged display screen 26. In this manner, a light image will be procluced upon the screen 26, which corresponds to the informational pattern established upon target 20 by deformation of the individual light valve elements 22.
- the deformation of the elements 22 corresponds to the applied video signal.
- the schlieren mirror or stop I5 is shown in an em larged view in FIG. 6, and comprises a generally square shaped mirror member 16 and rod support means 17.
- the mirror member is inclined at the proper angle to direct the light onto the light valve target.
- the support means 17 here comprise opaque rods which facilitate support of the mirror member 16, and extend from the ends of each side of mirror member I6 along the major X, Y axes corresponding to the X, Y directional axes of the mirror array.
- the opaque rods I7 then serve to block scattered light which can be expected along these axes, which light represents a background level that substantially degrades the display contrast.
- the electron beam tube 10 comprises an outer envelope 30 having a tubular body portion 32, and a base portion 34.
- the base portion 34 is provided with lead ins 36 for applying potential to the operative electrodes.
- the faceplate portion 38 is sealed to the oppo site end of the body portion 32.
- the target is disposed on the interior surface of the faceplate 38.
- An internal focusing electrode 27 is provided within envelope 30. and external focusing and deflection means 28 are disposed about envelope 30.
- the target structure 20 comprises a plurality of light valve elements 22, such as seen in greater detail in FIGS. 2 and 3.
- the light valve elements 22 form an ar ray, which is typically rows and columns of identical elements 22, with the total array including typically hundreds of thousands of the very small elements 22, which have a dimension of about -70 microns on a side.
- the elements 22 seen in FIG. I are thus shown greatly enlarged in a schematic sense to facilitate understanding of the device.
- the light valve elements 22, seen in greater detail in FIGS. 2 and 3 comprise a generally planar reflective portion 40, which comprises a central core portion 42, and a plurality of symmetrically spaced and shaped, deformable, reflective wing portions 44, which extend outwardly from the central core portion 42.
- An opening or slit 46 separates the wing portions 44.
- the portion 40 is generally of square configuration, and the four slits 46, define four wings or quadrants.
- the slits 46 extend in the direction of the axes of the array of elements 22, which for this embodiment would consist of horizontal rows and vertical columns.
- the elements 22 are supported upon a light transmissive substrate 38, which serves as the faceplate of the cathode ray tube 10.
- the substrate 38 may be formed of a vitreous material such as quartz, sapphire or spinel.
- a support or spacer post member 48 extends from the substrate to the underside of the central core portion 42.
- the post member 48 is typically a semi-insulator such as silicon, but can also be a conductor or insulator, and has a cross-sectional dimension of less than about 5 microns on a side, and a height of about L5 to 10 microns.
- the reflective array elements 22 are typically comprised of an electrical insulator, such as silicon dioxide, with a thin reflective layer 52 of metal, such as aluminum thereon. The material can also be metal or semiinsulating.
- the thickness of the planar portion 40 of element 22 is about 1,000-5000 Angstrorns.
- An electrically conductive grid 50 is provided on the interior surface of substrate 38 running between the spaced apart light valve elements 22.
- the grid 50 is typically formed of a thin metal film of suitable material, such as gold or aluminum, which is preferably thin enough to be light transmissive.
- the grid is connected to an external potential source 54.
- the potential source 54 may be a video signal source when the grid 50 is utilized to modulate the target voltage with the electron beam merely being a flood beam which charges the individual planar portion 40 of the light valves 22 to or near equilibrium with grid 62 which is typically located in close proximity to the target array.
- the grid 62 is connected to potential source 64.
- the electron beam may also be modulated, with the video signal applied via grid 56 proximate the cathode or beam source 60.
- a fixed bias would then be applied to electrode 27, grid 62, and grid 50.
- the grid 50 on the target 20 merely serves as a reference electrode necessary to produce electrostatic deflection of the planar portion 40 of light valves 22.
- the electrostatic bias is determined by the amount of charge deposited by the beam in accordance with the instantaneous value of the video signal.
- the array of light valve elements 22 may be fabricated according to the method outlined in the aforementioned U.S. Pat. No. 3,746,91 l but with the modification as outlined in FIG. 4.
- the substrate 38 has a heteroepitaxially grown layer of silicon 68 which is oxidized to a thickness of 3,0008,000 Angstrom to provide silicon dioxide layer 70 thereon.
- the oxide layer is delineated by a photoresist process to define the generally square configuration of element 22, and the slits 46 within elements 22 as seen in FIG. 4C.
- a reoxidation is carried out to a thickness of 2,000-4,000 Angstroms to partially close the slits and the spacing between elements 22 as seen in FIG. 4D.
- the oxide between elements 22 is then removed by another photoresist operation which does not effect the oxide at the central core of the elements 22 or of the slit areas as seen in FIG. 4E.
- the silicon dioxide is then undercut by etching with a solution of nitric, acetic, and hydrofluoric acid in a ratio of approximately 25/10/1. A slight oxide etch follows to ensure that any oxide between the slits is removed to provide the structure of FIG. 4F.
- the reflective metal layer 52 is then deposited upon the planar portions 40, and also upon substrate 38 to form grid 50 as seen in FIG. 4G.
- the above described process requires accurate successive alignment of the exposure mask in first delineating the elements, and then redelineating them following the reoxidation process, which ensures proper junction of the central post 48 and the planar portion 40.
- the fabrication can also be arranged with other materials and deposition materials, and the material temporarily closing the slits does not have to coincide with the material chosen for the planar portion 40.
- FIG. 5 Another process which obviates this realignment problem is to use a self-alignment technique which is generally depicted in FIG. 5.
- the substrate 38 has the silicon layer 68 thereon.
- the mask comprises a thin silicon dioxide layer 72, a silicon nitride layer 74 thereon, and a top thin layer 76 of silicon dioxide. These three mask layers are typically vapor deposited over the substrate and the silicon.
- the mask is photolithographically delineated, removing selected portions of the three layers to provide the matrix as seen in FIG. 5A.
- the silicon layer is then thermally oxidized to provide the planar portions 40 for light valve 22 as seen in FIG. 5B.
- the remaining mask portions can then be etched away, and the silicon dioxide undercut to the final shape and to form the support post as seen in FIGS. 5C and 5D.
- the slits are opened by a separate etch, which is followed by metallization of the surface of light valve 22 to ensure high reflectivity.
- the silicon dioxide layer 72, silicon nitride layer 74, and silicon dioxide layer 76 have typical layer thicknesses of 200-500 Angstroms, LOGO-3,000 Angstroms, and l,000-3,000 Angstroms, respectively.
- the etching is carried out with conventional solutions.
- the generally planar silicon dioxide portion 40 is produced by thermal oxidation to a thickness of for example 3,000l0,000 Angstroms. This thermally grown layer 40 is only produced in windows in the nitride mask. In the presence of the thin intermediate silicon dioxide layer 72 the edges of portions 40 will grow and merge in the slit area 46 as seen in FIG. 53.
- the structure can be further etched to open the slit areas 46, while also forming the post 48 from layer 68.
- the slit widths should be less than 2a, while the grids between light valve elements is larger than 2-3;.4. for this technique to work.
- An electrostatically deflectable light valve system comprising an array of spaced apart, deformable, light reflective elements supported upon a substrate, each of said reflective elements comprising a central core portion supported by a centrally located post member which extends from one side of the reflective elements to the supporting substrate, a plurality of generally planar, symmetrically spaced apart and shaped independently deformable and reflective wing portions extending outwardly from the central core portion, which wing portions are defined by an equal plurality of thin slits provided between said wing portions which slits extend from the central core portion to the outer edge of the wing portions.
- a light reflective element adapted for use as an electrostatically deflectable light valve which element comprises;
- wing portions extending outwardly from the central core portion, which wing portions are defined by an equal plurality of thin slits provided between said wing portions which slits extend from the central core portion to the outer edge of the wing portions.
- the light reflective element specified in claim 9 with four generally square wing portions provided, with thin slits separating the wing portions.
- An electrostatically deflectable light valve system comprising an array of spaced apart, deformable light reflective elements supported upon a substrate, the elements being arrayed along X and Y orthogonal axes, each of said reflective elements comprising a central core portion supported by a centrally located post member which extends from one side of the reflective elements to the supporting substrate, and four spaced apart, generally planar, symmetrically spaced and shaped deformable and reflective wing portions extending outwardly from a common central core portion, which four wing portions are spaced apart by slits extending in the direction of the X and Y axes of the array pattern.
Abstract
An electrostatically deflectable light valve adapted for use in an array for producing television pictures as a projected image upon a large display screen. The light valve structure is such that a plurality of reflective wing portions are free to be deflected along directional axes which are at an angle to the prime directional axes of the overall array, so that light which is predominantly diffracted along the array axes may be decoupled or separated from the signal light produced by activated light valves and used to project the image. The contrast ratio of signal light to background light for the system is significantly improved, using this method of discrimination.
Description
United States Patent Guldberg et al.
1 1 ELECTROSTATICALLY DEFLECTABLE LIGHT VALVE WITH IMPROVED DIFFRACTION PROPERTIES [75] Inventors: Jens Guldberg; Harvey C.
Nathanson, both of Pittsburgh, Pa.
[73] Assignee: Westinghouse Electric Corp.,
Pittsburgh, Pa.
[22] Filed: Aug. 22, 1973 [21] Appl. No.: 390,470
[52] 11.8. CI 178I7.5 D; 313/465; 315/372;
[51] Int. Cl. H04n 3/16; l-lOlj 29/12; G02f 1/28 [58] Field of Search 315/21 R; 313/91, 465;
l78/7.5 D, 5.4 BD; 350/161 [56] References Cited UNITED STATES PATENTS 2,681,423 6/1954 Auphan 313/91 X 2,682,010 6/1954 Orthuber 313/91 X 2,733,501 2/1956 Orthuber et a]. 313/91 X [451 May 27, 1975 Roltmiller 313/91 X Nathanson et a1. 315/21 R [57] ABSTRACT An electrostatically deflectable light valve adapted for use in an array for producing television pictures as a projected image upon a large display screen. The light valve structure is such that a plurality of reflective wing portions are free to be deflected along directional axes which are at an angle to the prime directional axes of the overall array, so that light which is predominantly diffracted along the array axes may be decoupled or separated from the signal light produced by activated light valves and used to project the image. The contrast ratio of signal light to background light for the system is significantly improved, using this method of discrimination.
11 Claims, 6 Drawing Figures PATENTED HAY 2 7 I975 SHEET j mm 'Ill'l/II'I PATENTEDMY 2 7 ms l I I I I 1 I l I VIAIVIA 40 K223 mlm K I I I I I I I 1 z 1 I FIG. 4
D FIG. 5 3f ELECTROSTATICALLY DEFLECTABLE LIGHT VALVE WITH IMPROVED DIFFRACTION PROPERTIES BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to electrostatically deflectable light valves which are adpated for use with a cathode ray tube, and in conjunction with schlieren optics forming a system for projecting television images upon a large display screen, and which may be operated either as a real-time or a storage mode device.
2, Description of the Prior Art A considerable effort has been expended in researching and developing systems for projecting television images upon a large screen. Such systems are aimed at expanding the usage of closed circuit television entertainment systems, as well as simply providing a greatly increased display area with its obvious advantages. The present commercial systems utilize an oil film surface as the target of a cathode ray tube, with the electron beam being used to produce a diffraction pattern on the film. An external light source is directed upon the film and an optical system with schlieren bars is utilized to project the desired image upon the display screen correspondence to the informational pattern upon the film. This oil film system is expensive and suffers from the inherent problem of having a fluid film operate within an evacuated cathode ray tube.
A variety of other display systems have tried to circumvent the problems associated with the use of oil films. Substitution of elastomer layers for the oil fiim results in very small deflections and consequently requires a sophisticated and expensive optical projection system. Techniques utilizing electro-optical materials, primarily KD PO, crystals, suffer from a basic problem of incompatibility in using the material in a vacuum. Another approach uses a taut metal membrane suspended on thin metal ribs and segmented to form an array of picture elements addressable by an electron beam. Energetic electrons of about 20 kilovolt potential penetrate the film and deposit a charge on the transparent glass substrate. The resulting electrostatic forces will deflect the metal membrane and the image is read out with ordinary schlieren optics.
Another feasible system utilizes an array of electrostatically deflectable light valves or very small mirrors, which are deflectable corresponding to the informational pattern. Such a system is disclosed in US. Pat. No. 3,746,91 1. In such systems an array of the deflectable light valves form the target of a cathode ray tube. An external light source is directed onto this target which is modulated to deflect individual valves of the array in an informational pattern. The light is reflected from the light valves, and for deflected valves the light is stopped while for deflected valves the light passes the schlieren stop and is projected upon the display screen with suitable magnification.
A problem with these prior art television image pro jection systems is the poor screen contrast caused by optical diffraction effects related to the target array. In general, such arrays have rows and columns of light valves which define an array having an X and a Y axes. The electrostatic deflection of each light valve modifies the diffraction pattern of the reflected light by tilting of the reflective plane as well as bending or bowing of the reflective surface. Because of constructional constraints the deflection of the light valves is also along one of these major axes. This diffraction effect causes light to pass about the schlieren optical stop primarily along one of the major axes of the array.
Consequently, a high contrast ratio with low background illumination can only be achieved with extremely large deflection angles.
This same problem exists for arrays other than rectangular arrays and for light valves other than simple square elements.
SUMMARY OF THE INVENTION A reflective light valve element is provided having a structure which permits the elimination of transmission of background light to the screen to provide significantly improved contrast for the display. The light reflective element is adapted for use in an array as part of a projection system for displaying television images. The light reflective element comprises a central core portion supported by a central post member which extends from the underside of the core portion. A plurality of symmetrically spaced and shaped deformable reflective wing portions extend outwardly from the cen tral core portion. The extending ends of the wing por tions have slits therebetween. When such reflective elements are arrayed as a target, the slits are aligned with the predominant axes of the array, The wing portions are then free to bend or deflect along an axis which is at an angle to the predominant axes of the array. A method of providing this improved light valve structure is also detailed.
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic overall view ofa projection system of the present invention.
FIG. 2 is an enlarged plan view of a single light valve of the present invention.
FIG. 3 is a sectional view taken along line Ill-Ill of FIG. 2 of the light valve.
FIG. 4 illustrates the various stages of preparation of the light valve of the present invention.
FIG. 5 illustrates the various stages of another method of construction of the present light valve.
FIG. 6 is a perspective view of the schlieren stop used in the projection system of the present invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention can be best understood by reference to the exemplary embodiment shown in the drawings.
The projection system comprises an electron beam tube 10. A high intensity light source 12 of preferably well balanced light is provided for illumination. The light from source 12 is focused by a lens 14 and refracted by a 45 angle reflective schlieren mirror 15. The reflected light is collimated by lens 18 onto target 20 associated with the faceplate of cathode ray tube 10. In the absence of actuation or deformation of individual light valve elements 22, the light will be reflected back from element 22 to be focused on the schlieren mirror 15 and remain within the original light cone. Deflection or deformation of a light valve element due to electrostatic forces as will be explained, will result in the light passing the schlieren mirror 15 and being projected through lens system 24 to the enlarged display screen 26. In this manner, a light image will be procluced upon the screen 26, which corresponds to the informational pattern established upon target 20 by deformation of the individual light valve elements 22. The deformation of the elements 22 corresponds to the applied video signal.
The schlieren mirror or stop I5 is shown in an em larged view in FIG. 6, and comprises a generally square shaped mirror member 16 and rod support means 17. The mirror member is inclined at the proper angle to direct the light onto the light valve target. The support means 17 here comprise opaque rods which facilitate support of the mirror member 16, and extend from the ends of each side of mirror member I6 along the major X, Y axes corresponding to the X, Y directional axes of the mirror array. The opaque rods I7 then serve to block scattered light which can be expected along these axes, which light represents a background level that substantially degrades the display contrast.
The electron beam tube 10 comprises an outer envelope 30 having a tubular body portion 32, and a base portion 34. The base portion 34 is provided with lead ins 36 for applying potential to the operative electrodes. The faceplate portion 38 is sealed to the oppo site end of the body portion 32. The target is disposed on the interior surface of the faceplate 38. An internal focusing electrode 27 is provided within envelope 30. and external focusing and deflection means 28 are disposed about envelope 30.
The target structure 20 comprises a plurality of light valve elements 22, such as seen in greater detail in FIGS. 2 and 3. The light valve elements 22 form an ar ray, which is typically rows and columns of identical elements 22, with the total array including typically hundreds of thousands of the very small elements 22, which have a dimension of about -70 microns on a side. The elements 22 seen in FIG. I, are thus shown greatly enlarged in a schematic sense to facilitate understanding of the device.
The light valve elements 22, seen in greater detail in FIGS. 2 and 3 comprise a generally planar reflective portion 40, which comprises a central core portion 42, and a plurality of symmetrically spaced and shaped, deformable, reflective wing portions 44, which extend outwardly from the central core portion 42. An opening or slit 46 separates the wing portions 44. In this embodiment, the portion 40 is generally of square configuration, and the four slits 46, define four wings or quadrants. The slits 46 extend in the direction of the axes of the array of elements 22, which for this embodiment would consist of horizontal rows and vertical columns. The elements 22 are supported upon a light transmissive substrate 38, which serves as the faceplate of the cathode ray tube 10. The substrate 38 may be formed of a vitreous material such as quartz, sapphire or spinel. A support or spacer post member 48 extends from the substrate to the underside of the central core portion 42. The post member 48 is typically a semi-insulator such as silicon, but can also be a conductor or insulator, and has a cross-sectional dimension of less than about 5 microns on a side, and a height of about L5 to 10 microns. The reflective array elements 22 are typically comprised of an electrical insulator, such as silicon dioxide, with a thin reflective layer 52 of metal, such as aluminum thereon. The material can also be metal or semiinsulating. The thickness of the planar portion 40 of element 22 is about 1,000-5000 Angstrorns.
An electrically conductive grid 50 is provided on the interior surface of substrate 38 running between the spaced apart light valve elements 22. The grid 50 is typically formed of a thin metal film of suitable material, such as gold or aluminum, which is preferably thin enough to be light transmissive. The grid is connected to an external potential source 54. The potential source 54 may be a video signal source when the grid 50 is utilized to modulate the target voltage with the electron beam merely being a flood beam which charges the individual planar portion 40 of the light valves 22 to or near equilibrium with grid 62 which is typically located in close proximity to the target array. The grid 62 is connected to potential source 64.
The electron beam may also be modulated, with the video signal applied via grid 56 proximate the cathode or beam source 60. A fixed bias would then be applied to electrode 27, grid 62, and grid 50. In this case the grid 50 on the target 20 merely serves as a reference electrode necessary to produce electrostatic deflection of the planar portion 40 of light valves 22. The electrostatic bias is determined by the amount of charge deposited by the beam in accordance with the instantaneous value of the video signal.
The array of light valve elements 22 may be fabricated according to the method outlined in the aforementioned U.S. Pat. No. 3,746,91 l but with the modification as outlined in FIG. 4. The substrate 38 has a heteroepitaxially grown layer of silicon 68 which is oxidized to a thickness of 3,0008,000 Angstrom to provide silicon dioxide layer 70 thereon. The oxide layer is delineated by a photoresist process to define the generally square configuration of element 22, and the slits 46 within elements 22 as seen in FIG. 4C. A reoxidation is carried out to a thickness of 2,000-4,000 Angstroms to partially close the slits and the spacing between elements 22 as seen in FIG. 4D. The oxide between elements 22 is then removed by another photoresist operation which does not effect the oxide at the central core of the elements 22 or of the slit areas as seen in FIG. 4E. The silicon dioxide is then undercut by etching with a solution of nitric, acetic, and hydrofluoric acid in a ratio of approximately 25/10/1. A slight oxide etch follows to ensure that any oxide between the slits is removed to provide the structure of FIG. 4F. The reflective metal layer 52 is then deposited upon the planar portions 40, and also upon substrate 38 to form grid 50 as seen in FIG. 4G.
The above described process requires accurate successive alignment of the exposure mask in first delineating the elements, and then redelineating them following the reoxidation process, which ensures proper junction of the central post 48 and the planar portion 40. The fabrication can also be arranged with other materials and deposition materials, and the material temporarily closing the slits does not have to coincide with the material chosen for the planar portion 40.
Another process which obviates this realignment problem is to use a self-alignment technique which is generally depicted in FIG. 5. The substrate 38 has the silicon layer 68 thereon.
Through a process of successive depositions and appropriate photolithographic operations a mask matrix can be built upon the silicon 40. The mask comprises a thin silicon dioxide layer 72, a silicon nitride layer 74 thereon, and a top thin layer 76 of silicon dioxide. These three mask layers are typically vapor deposited over the substrate and the silicon. The mask is photolithographically delineated, removing selected portions of the three layers to provide the matrix as seen in FIG. 5A. The silicon layer is then thermally oxidized to provide the planar portions 40 for light valve 22 as seen in FIG. 5B. The remaining mask portions can then be etched away, and the silicon dioxide undercut to the final shape and to form the support post as seen in FIGS. 5C and 5D. The slits are opened by a separate etch, which is followed by metallization of the surface of light valve 22 to ensure high reflectivity.
In the self-aligning mask technique the silicon dioxide layer 72, silicon nitride layer 74, and silicon dioxide layer 76, have typical layer thicknesses of 200-500 Angstroms, LOGO-3,000 Angstroms, and l,000-3,000 Angstroms, respectively. The etching is carried out with conventional solutions. The generally planar silicon dioxide portion 40 is produced by thermal oxidation to a thickness of for example 3,000l0,000 Angstroms. This thermally grown layer 40 is only produced in windows in the nitride mask. In the presence of the thin intermediate silicon dioxide layer 72 the edges of portions 40 will grow and merge in the slit area 46 as seen in FIG. 53. After removal of the silicon nitride layer 74, the structure can be further etched to open the slit areas 46, while also forming the post 48 from layer 68. In general the slit widths should be less than 2a, while the grids between light valve elements is larger than 2-3;.4. for this technique to work.
We claim:
1. An electrostatically deflectable light valve system comprising an array of spaced apart, deformable, light reflective elements supported upon a substrate, each of said reflective elements comprising a central core portion supported by a centrally located post member which extends from one side of the reflective elements to the supporting substrate, a plurality of generally planar, symmetrically spaced apart and shaped independently deformable and reflective wing portions extending outwardly from the central core portion, which wing portions are defined by an equal plurality of thin slits provided between said wing portions which slits extend from the central core portion to the outer edge of the wing portions.
2. The system specified in claim 1, wherein an electrode grid is disposed upon the supporting substrate.
3. The system specified in claim 1, wherein the substrate is a light transmissive material.
4. The system specified in claim 1 wherein four generally square wing portions are provided with thin slits separating the wing portions.
5. The system specififled in claim 4, wherein the slits are aligned with the axes of the array pattern in which the light valves are arranged.
6. The system specified in claim 5 when the planar portion of the light valve is substantially square and the slits extend from the edges of each wing to the central core portion.
7. The system specified in claim I, wherein a light reflective coating is provided on the top surface of the central core portion and the wing portions.
8. The system specified in claim 3, in combination with a light source, an optical system for directing light through the transmissive substrate to the surface of the reflective light valves, said optical system including an opaque stop disposed in the optical path between the array of light valves and a display screen, so that when the wing portions of the light valves are nondeflected the light reflected is substantially totally reflected off or blocked by the stop and no light reaches the display screen, while when the wing portions are deflected a portion of the light reflected therefrom passes around the central stop and produces a large, displayed image.
9. A light reflective element adapted for use as an electrostatically deflectable light valve which element comprises;
a central core portion supported by a post member which extends from one side of the core portion, and
a plurality of generally planar, symmetrically spaced and shaped independently deformable reflective wing portions extending outwardly from the central core portion, which wing portions are defined by an equal plurality of thin slits provided between said wing portions which slits extend from the central core portion to the outer edge of the wing portions.
10. The light reflective element specified in claim 9, with four generally square wing portions provided, with thin slits separating the wing portions.
11. An electrostatically deflectable light valve system comprising an array of spaced apart, deformable light reflective elements supported upon a substrate, the elements being arrayed along X and Y orthogonal axes, each of said reflective elements comprising a central core portion supported by a centrally located post member which extends from one side of the reflective elements to the supporting substrate, and four spaced apart, generally planar, symmetrically spaced and shaped deformable and reflective wing portions extending outwardly from a common central core portion, which four wing portions are spaced apart by slits extending in the direction of the X and Y axes of the array pattern.
Claims (11)
1. An electrostatically deflectable light valve system comprising an array of spaced apart, deformable, light reflective elements supported upon a substrate, each of said reflective elements comprising a central core portion supported by a centrally located post member which extends from one side of the reflective elements to the supporting substrate, a plurality of generally planar, symmetrically spaced apart and shaped independently deformable and reflective wing portions extending outwardly from the central core portion, which wing portions are defined by an equal plurality of thin slits provided between said wing portions which slits extend from the central core portion to the outer edge of the wing portions.
2. The system specified in claim 1, wherein an electrode grid is disposed upon the supporting substrate.
3. The system specified in claim 1, wherein the substrate is a light transmissive material.
4. The system specified in claim 1 wherein four generally square wing portions are provided with thin slits separating the wing portions.
5. The system specifified in claim 4, wherein the slits are aligned with the axes of the array pattern in which the light valves are arranged.
6. The system specified in claim 5 when the planar portion of the light valve is substantially square and the slits extend from the edges of each wing to the central core portion.
7. The system specified in claim 1, wherein a light reflective coating is provided on the top surface of the central core portion and the wing portions.
8. The system specified in claim 3, in combination with a light source, an optical system for directing light through the transmissive substrate to the surface of the reflective light valves, said optical system including an opaque stop disposed in the optical path between the array of light valves and a display screen, so that when the wing portions of the light valves are nondeflected the light reflected is substantially totally reflected off or blocked by the stop and no light reaches the display screen, while when the wing portions are deflected a portion of the light reflected therefrom passes around the central stop and produces a large, displayed image.
9. A light reflective element adapted for use as an electrostatically deflectable light valve which element comprises; a central core portion supported by a post member which extends from one side of the core portion, and a plurality of generally planar, symmetrically spaced and shaped independently deformable reflective wing portions extending outwardly from the central core portion, which wing portions are defined by an equal plurality of thin slits provided between said wing portions which slits extend from the central core portion to the outer edge of the wing portions.
10. The light reflective element specified in claim 9, with four generally square wing portions provided, with thin slits separating the wing portions.
11. An electrostatically deflectable light valve system comprising an array of spaced apart, deformable light reflective elements supported upon a substrate, the elements being arrayed along X and Y orthogonal axes, each of said reflective elements comprising a central core portion supported by a centrally located post member which extends from one side of the reflective elements to the supporting substrate, and four spaced apart, generally planar, symmetrically spaced and shaped deformable and reflective wing portions extending outwardly from a common central core portion, which four wing portions are spaced apart by slits extending in the direction of the X and Y axes of the array pattern.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US390470A US3886310A (en) | 1973-08-22 | 1973-08-22 | Electrostatically deflectable light valve with improved diffraction properties |
JP9432174A JPS531169B2 (en) | 1973-08-22 | 1974-08-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US390470A US3886310A (en) | 1973-08-22 | 1973-08-22 | Electrostatically deflectable light valve with improved diffraction properties |
Publications (1)
Publication Number | Publication Date |
---|---|
US3886310A true US3886310A (en) | 1975-05-27 |
Family
ID=23542587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US390470A Expired - Lifetime US3886310A (en) | 1973-08-22 | 1973-08-22 | Electrostatically deflectable light valve with improved diffraction properties |
Country Status (2)
Country | Link |
---|---|
US (1) | US3886310A (en) |
JP (1) | JPS531169B2 (en) |
Cited By (233)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4065840A (en) * | 1976-12-17 | 1978-01-03 | International Business Machines Corporation | Method for fabricating a DSDT target |
US4229081A (en) * | 1978-06-26 | 1980-10-21 | The United States Of America As Represented By The Secretary Of The Army | Electro-mechanical image converter |
US4229732A (en) * | 1978-12-11 | 1980-10-21 | International Business Machines Corporation | Micromechanical display logic and array |
EP0040302A2 (en) * | 1980-05-19 | 1981-11-25 | International Business Machines Corporation | An optical ray deflection apparatus |
US4322134A (en) * | 1975-04-04 | 1982-03-30 | Director, National U.S. Government, Security Agency | Electronic lens |
DE3108240A1 (en) * | 1980-03-11 | 1982-04-29 | Centre Electronique Horloger S.A., Neuchâtel | "MINIATURE DISPLAY ARRANGEMENT" |
US4356730A (en) * | 1981-01-08 | 1982-11-02 | International Business Machines Corporation | Electrostatically deformographic switches |
US4380373A (en) * | 1980-10-06 | 1983-04-19 | Xerox Corporation | Conformable proximity coupled electro-optic devices |
US4441791A (en) * | 1980-09-02 | 1984-04-10 | Texas Instruments Incorporated | Deformable mirror light modulator |
US4492435A (en) * | 1982-07-02 | 1985-01-08 | Xerox Corporation | Multiple array full width electro mechanical modulator |
US4564836A (en) * | 1981-07-02 | 1986-01-14 | Centre Electronique Horloger S.A. | Miniature shutter type display device with multiplexing capability |
JPS61116324A (en) * | 1984-07-31 | 1986-06-03 | テキサス インスツルメンツ インコ−ポレイテツド | Spatial light modulator and method thereof |
US4592628A (en) * | 1981-07-01 | 1986-06-03 | International Business Machines | Mirror array light valve |
US4615595A (en) * | 1984-10-10 | 1986-10-07 | Texas Instruments Incorporated | Frame addressed spatial light modulator |
US4662746A (en) * | 1985-10-30 | 1987-05-05 | Texas Instruments Incorporated | Spatial light modulator and method |
US4680579A (en) * | 1983-09-08 | 1987-07-14 | Texas Instruments Incorporated | Optical system for projection display using spatial light modulator device |
US4710732A (en) * | 1984-07-31 | 1987-12-01 | Texas Instruments Incorporated | Spatial light modulator and method |
US4728185A (en) * | 1985-07-03 | 1988-03-01 | Texas Instruments Incorporated | Imaging system |
US4755013A (en) * | 1985-01-23 | 1988-07-05 | Canon Kabushiki Kaisha | Light scanning optical system of an image output scanner using an electro mechanical light modulator |
US4775204A (en) * | 1985-01-23 | 1988-10-04 | Canon Kabushiki Kaisha | Light scanning optical system of an image output scanner using an electro-mechanical light modulator |
US4784448A (en) * | 1986-01-22 | 1988-11-15 | Messerschmitt-Bolkow-Blohm Gmbh | Retromodulator |
US4786149A (en) * | 1986-05-22 | 1988-11-22 | Siemens Aktiengesellschaft | Arrangement for optical image processing |
US4842396A (en) * | 1984-06-29 | 1989-06-27 | Canon Kabushiki Kaisha | Light modulation element and light modulation apparatus |
EP0332953A2 (en) * | 1988-03-16 | 1989-09-20 | Texas Instruments Incorporated | Spatial light modulator and method |
US4954789A (en) * | 1989-09-28 | 1990-09-04 | Texas Instruments Incorporated | Spatial light modulator |
US4956619A (en) * | 1988-02-19 | 1990-09-11 | Texas Instruments Incorporated | Spatial light modulator |
US5005968A (en) * | 1988-08-31 | 1991-04-09 | Asahi Kogaku Kogyo Kabushiki Kaisha | Contrast decreasing apparatus in image forming optical system |
WO1992009001A1 (en) * | 1990-11-16 | 1992-05-29 | Rank Cintel Limited | Improvements relating to spatial light modulators |
US5142405A (en) * | 1990-06-29 | 1992-08-25 | Texas Instruments Incorporated | Bistable dmd addressing circuit and method |
US5148157A (en) * | 1990-09-28 | 1992-09-15 | Texas Instruments Incorporated | Spatial light modulator with full complex light modulation capability |
US5150250A (en) * | 1985-01-23 | 1992-09-22 | Canon Kabushiki Kaisha | Light scanning optical system for an image output scanner using an electro-mechanical light modulator |
US5172262A (en) * | 1985-10-30 | 1992-12-15 | Texas Instruments Incorporated | Spatial light modulator and method |
WO1993002375A1 (en) * | 1991-07-17 | 1993-02-04 | Optron Systems, Inc. | Membrane light modulating systems |
US5216537A (en) * | 1990-06-29 | 1993-06-01 | Texas Instruments Incorporated | Architecture and process for integrating DMD with control circuit substrates |
GB2239101B (en) * | 1989-11-17 | 1993-09-22 | Marconi Gec Ltd | Optical device |
WO1993023959A1 (en) | 1992-05-18 | 1993-11-25 | Aura Systems, Inc. | Pixel intensity modulator |
US5307082A (en) * | 1992-10-28 | 1994-04-26 | North Carolina State University | Electrostatically shaped membranes |
US5408355A (en) * | 1991-10-30 | 1995-04-18 | Labor Dr. Hans Steinbichler | Micromechanical transducer |
US5457566A (en) * | 1991-11-22 | 1995-10-10 | Texas Instruments Incorporated | DMD scanner |
EP0692728A2 (en) | 1994-07-13 | 1996-01-17 | Texas Instruments Incorporated | Improvements in and relating to spatial light modulators |
US5488505A (en) * | 1992-10-01 | 1996-01-30 | Engle; Craig D. | Enhanced electrostatic shutter mosaic modulator |
EP0712022A2 (en) | 1994-11-14 | 1996-05-15 | Texas Instruments Incorporated | Improvements in or relating to micromechanical devices |
US5579151A (en) * | 1995-02-17 | 1996-11-26 | Texas Instruments Incorporated | Spatial light modulator |
US5581393A (en) * | 1993-03-23 | 1996-12-03 | Daewoo Electronics Co., Ltd. | Mirror array and method for the manufacture thereof |
US5600383A (en) * | 1990-06-29 | 1997-02-04 | Texas Instruments Incorporated | Multi-level deformable mirror device with torsion hinges placed in a layer different from the torsion beam layer |
US5610773A (en) * | 1994-04-30 | 1997-03-11 | Daewoo Electronic Co. Ltd. | Actuated mirror array and method for the manufacture thereof |
US5610438A (en) * | 1995-03-08 | 1997-03-11 | Texas Instruments Incorporated | Micro-mechanical device with non-evaporable getter |
US5612753A (en) * | 1995-01-27 | 1997-03-18 | Texas Instruments Incorporated | Full-color projection display system using two light modulators |
US5640266A (en) * | 1992-10-07 | 1997-06-17 | Engle; Craig D. | Electronically addressed deformable mirror device |
US5640214A (en) * | 1994-09-30 | 1997-06-17 | Texas Instruments Incorporated | Printer and display systems with bidirectional light collection structures |
US5696619A (en) * | 1995-02-27 | 1997-12-09 | Texas Instruments Incorporated | Micromechanical device having an improved beam |
US5719695A (en) * | 1995-03-31 | 1998-02-17 | Texas Instruments Incorporated | Spatial light modulator with superstructure light shield |
US5734492A (en) * | 1993-05-21 | 1998-03-31 | Daewoo Electronics Co Ltd | Piezoelectric actuated mirror array |
US5768009A (en) * | 1997-04-18 | 1998-06-16 | E-Beam | Light valve target comprising electrostatically-repelled micro-mirrors |
US5808797A (en) * | 1992-04-28 | 1998-09-15 | Silicon Light Machines | Method and apparatus for modulating a light beam |
US5841579A (en) * | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
US5839808A (en) * | 1994-09-28 | 1998-11-24 | Nikon Corporation | Projection optical system |
WO1999032919A1 (en) * | 1997-12-22 | 1999-07-01 | Robert Bosch Gmbh | Method for producing a micromechanical device |
US5982553A (en) * | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
US5991066A (en) * | 1998-10-15 | 1999-11-23 | Memsolutions, Inc. | Membrane-actuated charge controlled mirror |
US6025951A (en) * | 1996-11-27 | 2000-02-15 | National Optics Institute | Light modulating microdevice and method |
US6028696A (en) * | 1998-10-15 | 2000-02-22 | Memsolutions, Inc. | Charge controlled mirror with improved frame time utilization and method of addressing the same |
US6031657A (en) * | 1998-10-15 | 2000-02-29 | Memsolutions, Inc. | Membrane-actuated charge controlled mirror (CCM) projection display |
US6034810A (en) * | 1997-04-18 | 2000-03-07 | Memsolutions, Inc. | Field emission charge controlled mirror (FEA-CCM) |
US6038058A (en) * | 1998-10-15 | 2000-03-14 | Memsolutions, Inc. | Grid-actuated charge controlled mirror and method of addressing the same |
US6059416A (en) * | 1993-08-31 | 2000-05-09 | Daewoo Electronics Co., Ltd. | Actuated mirror array and method for the fabricating thereof |
US6088102A (en) * | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
US6101036A (en) * | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
JP2000221419A (en) * | 1999-01-28 | 2000-08-11 | Seiko Epson Corp | Light reflection unit and illuminator |
US6123985A (en) * | 1998-10-28 | 2000-09-26 | Solus Micro Technologies, Inc. | Method of fabricating a membrane-actuated charge controlled mirror (CCM) |
US6130770A (en) * | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
US6147789A (en) * | 1998-05-04 | 2000-11-14 | Gelbart; Daniel | High speed deformable mirror light valve |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
US6233087B1 (en) | 1998-12-18 | 2001-05-15 | Eastman Kodak Company | Electro-mechanical grating device |
US6233088B1 (en) * | 1998-03-17 | 2001-05-15 | Mcnc | Methods for modulating a radiation signal |
US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
US20010022382A1 (en) * | 1998-07-29 | 2001-09-20 | Shook James Gill | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
US6346776B1 (en) | 2000-07-10 | 2002-02-12 | Memsolutions, Inc. | Field emission array (FEA) addressed deformable light valve modulator |
US6356378B1 (en) | 1995-06-19 | 2002-03-12 | Reflectivity, Inc. | Double substrate reflective spatial light modulator |
US20020098610A1 (en) * | 2001-01-19 | 2002-07-25 | Alexander Payne | Reduced surface charging in silicon-based devices |
FR2820834A1 (en) * | 2001-02-15 | 2002-08-16 | Teem Photonics | METHOD FOR MANUFACTURING AN OPTICAL MICRO-MIRROR AND MICRO-MIRROR OR MICRO-MIRROR MATRIX OBTAINED BY THIS PROCESS |
US6437903B1 (en) * | 2002-02-20 | 2002-08-20 | Intel Corporation | Light modulator with two mirror sets |
WO2002065186A2 (en) * | 2001-02-15 | 2002-08-22 | Teem Photonics | Pivoting optical micromirror, array for such micromirrors and method for making same |
US20020196492A1 (en) * | 2001-06-25 | 2002-12-26 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US20030025984A1 (en) * | 2001-08-01 | 2003-02-06 | Chris Gudeman | Optical mem device with encapsulated dampening gas |
US6523961B2 (en) | 2000-08-30 | 2003-02-25 | Reflectivity, Inc. | Projection system and mirror elements for improved contrast ratio in spatial light modulators |
US20030103194A1 (en) * | 2001-11-30 | 2003-06-05 | Gross Kenneth P. | Display apparatus including RGB color combiner and 1D light valve relay including schlieren filter |
US6623144B2 (en) | 1991-04-30 | 2003-09-23 | Genlyte Thomas Group Llc | High intensity lighting projectors |
US6639722B2 (en) | 2001-08-15 | 2003-10-28 | Silicon Light Machines | Stress tuned blazed grating light valve |
US20030208753A1 (en) * | 2001-04-10 | 2003-11-06 | Silicon Light Machines | Method, system, and display apparatus for encrypted cinema |
US20030214639A1 (en) * | 2000-08-03 | 2003-11-20 | Satyadev Patel | Micromirrors with OFF-angle electrodes and stops |
US20030223675A1 (en) * | 2002-05-29 | 2003-12-04 | Silicon Light Machines | Optical switch |
US20030235932A1 (en) * | 2002-05-28 | 2003-12-25 | Silicon Light Machines | Integrated driver process flow |
US20040001264A1 (en) * | 2002-06-28 | 2004-01-01 | Christopher Gudeman | Micro-support structures |
US20040001257A1 (en) * | 2001-03-08 | 2004-01-01 | Akira Tomita | High contrast grating light valve |
US20040008399A1 (en) * | 2001-06-25 | 2004-01-15 | Trisnadi Jahja I. | Method, apparatus, and diffuser for reducing laser speckle |
US6707591B2 (en) | 2001-04-10 | 2004-03-16 | Silicon Light Machines | Angled illumination for a single order light modulator based projection system |
US20040057101A1 (en) * | 2002-06-28 | 2004-03-25 | James Hunter | Reduced formation of asperities in contact micro-structures |
US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
US6714337B1 (en) | 2002-06-28 | 2004-03-30 | Silicon Light Machines | Method and device for modulating a light beam and having an improved gamma response |
US6728023B1 (en) | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
US20040184132A1 (en) * | 2003-03-22 | 2004-09-23 | Novotny Vlad J. | Spatial light modulator with hidden comb actuator |
US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
US6813053B1 (en) | 2000-05-19 | 2004-11-02 | The Regents Of The University Of California | Apparatus and method for controlled cantilever motion through torsional beams and a counterweight |
US20040218154A1 (en) * | 2000-08-30 | 2004-11-04 | Huibers Andrew G. | Packaged micromirror array for a projection display |
US20040218292A1 (en) * | 2001-08-03 | 2004-11-04 | Huibers Andrew G | Micromirror array for projection TV |
US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
US6829258B1 (en) | 2002-06-26 | 2004-12-07 | Silicon Light Machines, Inc. | Rapidly tunable external cavity laser |
US6829077B1 (en) | 2003-02-28 | 2004-12-07 | Silicon Light Machines, Inc. | Diffractive light modulator with dynamically rotatable diffraction plane |
US20050002079A1 (en) * | 2003-03-22 | 2005-01-06 | Novotny Vlad J. | MEMS devices monolithically integrated with drive and control circuitry |
US6865346B1 (en) | 2001-06-05 | 2005-03-08 | Silicon Light Machines Corporation | Fiber optic transceiver |
US6872984B1 (en) | 1998-07-29 | 2005-03-29 | Silicon Light Machines Corporation | Method of sealing a hermetic lid to a semiconductor die at an angle |
US20050134957A1 (en) * | 2003-12-21 | 2005-06-23 | George Radominski | MEM devices having charge induced via focused beam to enter different states |
US20050157376A1 (en) * | 2002-11-26 | 2005-07-21 | Huibers Andrew G. | Spatial light modulators with light blocking/absorbing areas |
US6922272B1 (en) | 2003-02-14 | 2005-07-26 | Silicon Light Machines Corporation | Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices |
US6922273B1 (en) | 2003-02-28 | 2005-07-26 | Silicon Light Machines Corporation | PDL mitigation structure for diffractive MEMS and gratings |
US6927891B1 (en) | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
US6928207B1 (en) | 2002-12-12 | 2005-08-09 | Silicon Light Machines Corporation | Apparatus for selectively blocking WDM channels |
US20050181532A1 (en) * | 2000-12-07 | 2005-08-18 | Patel Satyadev R. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US6934070B1 (en) | 2002-12-18 | 2005-08-23 | Silicon Light Machines Corporation | Chirped optical MEM device |
US20050185251A1 (en) * | 2003-12-21 | 2005-08-25 | Shreeve Robert W. | Discharge of MEM devices having charge induced via focused beam to enter different states |
US6947613B1 (en) | 2003-02-11 | 2005-09-20 | Silicon Light Machines Corporation | Wavelength selective switch and equalizer |
US6956995B1 (en) | 2001-11-09 | 2005-10-18 | Silicon Light Machines Corporation | Optical communication arrangement |
US20050231792A1 (en) * | 2004-04-14 | 2005-10-20 | Christine Alain | Light modulating microdevice |
US20050275930A1 (en) * | 2004-06-15 | 2005-12-15 | Satyadev Patel | Micromirror array assembly with in-array pillars |
US20050286112A1 (en) * | 2004-06-23 | 2005-12-29 | Satyadev Patel | Micromirror having offset addressing electrode |
US20060007522A1 (en) * | 2003-10-30 | 2006-01-12 | Andrew Huibers | Micromirror and post arrangements on substrates |
US6987600B1 (en) * | 2002-12-17 | 2006-01-17 | Silicon Light Machines Corporation | Arbitrary phase profile for better equalization in dynamic gain equalizer |
US6991953B1 (en) | 2001-09-13 | 2006-01-31 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
US20060034006A1 (en) * | 2004-08-14 | 2006-02-16 | Fusao Ishii | Hinge for micro-mirror devices |
US20060056004A1 (en) * | 2004-09-14 | 2006-03-16 | Adel Jilani | Flexure |
US7027202B1 (en) | 2003-02-28 | 2006-04-11 | Silicon Light Machines Corp | Silicon substrate as a light modulator sacrificial layer |
US20060077154A1 (en) * | 2004-09-27 | 2006-04-13 | Gally Brian J | Optical films for directing light towards active areas of displays |
US20060077509A1 (en) * | 2004-09-27 | 2006-04-13 | Ming-Hau Tung | Method and post structures for interferometric modulation |
US20060077514A1 (en) * | 2004-09-27 | 2006-04-13 | Sampsell Jeffrey B | System and method of reducing color shift in a display |
US20060082858A1 (en) * | 2004-10-19 | 2006-04-20 | Peter Heureux | Micromirror array device and a method for making the same |
US7042611B1 (en) | 2003-03-03 | 2006-05-09 | Silicon Light Machines Corporation | Pre-deflected bias ribbons |
US7054515B1 (en) | 2002-05-30 | 2006-05-30 | Silicon Light Machines Corporation | Diffractive light modulator-based dynamic equalizer with integrated spectral monitor |
US7057819B1 (en) | 2002-12-17 | 2006-06-06 | Silicon Light Machines Corporation | High contrast tilting ribbon blazed grating |
US7057795B2 (en) | 2002-08-20 | 2006-06-06 | Silicon Light Machines Corporation | Micro-structures with individually addressable ribbon pairs |
US7068372B1 (en) | 2003-01-28 | 2006-06-27 | Silicon Light Machines Corporation | MEMS interferometer-based reconfigurable optical add-and-drop multiplexor |
US20060291269A1 (en) * | 2005-05-13 | 2006-12-28 | Institut National D'optique | Image projector with flexible reflective analog modulator |
US20070120438A1 (en) * | 2003-12-26 | 2007-05-31 | Commissariat A L'energie Atomique | Electrostatic control device |
US20070177247A1 (en) * | 1998-04-08 | 2007-08-02 | Miles Mark W | Method and device for modulating light with multiple electrodes |
US20070196040A1 (en) * | 2006-02-17 | 2007-08-23 | Chun-Ming Wang | Method and apparatus for providing back-lighting in an interferometric modulator display device |
US7286764B1 (en) | 2003-02-03 | 2007-10-23 | Silicon Light Machines Corporation | Reconfigurable modulator-based optical add-and-drop multiplexer |
US7295363B2 (en) | 2005-04-08 | 2007-11-13 | Texas Instruments Incorporated | Optical coating on light transmissive substrates of micromirror devices |
US20070268554A1 (en) * | 2005-04-27 | 2007-11-22 | Shreeve Robert W | Discharge of MEM Devices Having Charge Induced Via Focused Beam to Enter Different States |
WO2007140731A1 (en) * | 2006-06-03 | 2007-12-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Arrangement of electrodes with respect to moving micromechanical elements |
US20080013145A1 (en) * | 2004-09-27 | 2008-01-17 | Idc, Llc | Microelectromechanical device with optical function separated from mechanical and electrical function |
US20080055706A1 (en) * | 2004-09-27 | 2008-03-06 | Clarence Chui | Reflective display device having viewable display on both sides |
US7349139B2 (en) | 2004-09-27 | 2008-03-25 | Idc, Llc | System and method of illuminating interferometric modulators using backlighting |
US20080080043A1 (en) * | 2004-09-27 | 2008-04-03 | Idc, Llc | Conductive bus structure for interferometric modulator array |
US20080088910A1 (en) * | 1994-05-05 | 2008-04-17 | Idc, Llc | System and method for a mems device |
US7375874B1 (en) | 2003-03-22 | 2008-05-20 | Active Optical Mems Inc. | Light modulator with integrated drive and control circuitry |
US7391973B1 (en) | 2003-02-28 | 2008-06-24 | Silicon Light Machines Corporation | Two-stage gain equalizer |
US20080212035A1 (en) * | 2006-12-12 | 2008-09-04 | Christensen Robert R | System and method for aligning RGB light in a single modulator projector |
US20080218834A1 (en) * | 2007-03-08 | 2008-09-11 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing a light absorbing mask in an interferometric modulator display |
US20080247028A1 (en) * | 2004-09-27 | 2008-10-09 | Idc, Llc | Method and device for multistate interferometric light modulation |
US20080259988A1 (en) * | 2007-01-19 | 2008-10-23 | Evans & Sutherland Computer Corporation | Optical actuator with improved response time and method of making the same |
US20090002644A1 (en) * | 2007-05-21 | 2009-01-01 | Evans & Sutherland Computer Corporation | Invisible scanning safety system |
US20090168186A1 (en) * | 2007-09-07 | 2009-07-02 | Forrest Williams | Device and method for reducing etendue in a diode laser |
US20090201566A1 (en) * | 2004-09-27 | 2009-08-13 | Idc, Llc | Device having a conductive light absorbing mask and method for fabricating same |
US20090213450A1 (en) * | 2004-09-27 | 2009-08-27 | Idc, Llc | Support structures for electromechanical systems and methods of fabricating the same |
US20090219491A1 (en) * | 2007-10-18 | 2009-09-03 | Evans & Sutherland Computer Corporation | Method of combining multiple Gaussian beams for efficient uniform illumination of one-dimensional light modulators |
US20090231666A1 (en) * | 2008-02-22 | 2009-09-17 | Sauri Gudlavalleti | Microelectromechanical device with thermal expansion balancing layer or stiffening layer |
US20090256218A1 (en) * | 2006-02-23 | 2009-10-15 | Qualcomm Mems Technologies, Inc. | Mems device having a layer movable at asymmetric rates |
US20090273823A1 (en) * | 2006-06-30 | 2009-11-05 | Qualcomm Mems Technologies, Inc. | Method of manufacturing mems devices providing air gap control |
US20090322740A1 (en) * | 2008-05-23 | 2009-12-31 | Carlson Kenneth L | System and method for displaying a planar image on a curved surface |
US20100080890A1 (en) * | 2004-09-27 | 2010-04-01 | Qualcomm Mems Technologies, Inc. | Apparatus and method for reducing slippage between structures in an interferometric modulator |
US20100085625A1 (en) * | 2007-07-02 | 2010-04-08 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US7706050B2 (en) | 2004-03-05 | 2010-04-27 | Qualcomm Mems Technologies, Inc. | Integrated modulator illumination |
US7750886B2 (en) | 2004-09-27 | 2010-07-06 | Qualcomm Mems Technologies, Inc. | Methods and devices for lighting displays |
US7766498B2 (en) | 2006-06-21 | 2010-08-03 | Qualcomm Mems Technologies, Inc. | Linear solid state illuminator |
US20100195310A1 (en) * | 2009-02-04 | 2010-08-05 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
US20100226118A1 (en) * | 2009-03-06 | 2010-09-09 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
US7807488B2 (en) | 2004-09-27 | 2010-10-05 | Qualcomm Mems Technologies, Inc. | Display element having filter material diffused in a substrate of the display element |
US7830586B2 (en) | 1999-10-05 | 2010-11-09 | Qualcomm Mems Technologies, Inc. | Transparent thin films |
US7847999B2 (en) | 2007-09-14 | 2010-12-07 | Qualcomm Mems Technologies, Inc. | Interferometric modulator display devices |
US20100309540A1 (en) * | 1994-05-05 | 2010-12-09 | Qualcomm Mems Technologies, Inc. | Method and device for providing illumination to interferometric modulators |
US20100315695A1 (en) * | 1995-05-01 | 2010-12-16 | Miles Mark W | Microelectromechanical device with restoring electrode |
US7884989B2 (en) | 2005-05-27 | 2011-02-08 | Qualcomm Mems Technologies, Inc. | White interferometric modulators and methods for forming the same |
US20110032214A1 (en) * | 2009-06-01 | 2011-02-10 | Qualcomm Mems Technologies, Inc. | Front light based optical touch screen |
US7889417B2 (en) | 2007-05-09 | 2011-02-15 | Qualcomm Mems Technologies, Inc. | Electromechanical system having a dielectric movable membrane |
US20110038027A1 (en) * | 1994-05-05 | 2011-02-17 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light with semiconductor substrate |
US7898723B2 (en) | 2008-04-02 | 2011-03-01 | Qualcomm Mems Technologies, Inc. | Microelectromechanical systems display element with photovoltaic structure |
US20110080632A1 (en) * | 1996-12-19 | 2011-04-07 | Qualcomm Mems Technologies, Inc. | Method of making a light modulating display device and associated transistor circuitry and structures thereof |
US7936497B2 (en) | 2004-09-27 | 2011-05-03 | Qualcomm Mems Technologies, Inc. | MEMS device having deformable membrane characterized by mechanical persistence |
US7944604B2 (en) | 2008-03-07 | 2011-05-17 | Qualcomm Mems Technologies, Inc. | Interferometric modulator in transmission mode |
US7949213B2 (en) | 2007-12-07 | 2011-05-24 | Qualcomm Mems Technologies, Inc. | Light illumination of displays with front light guide and coupling elements |
US7969638B2 (en) | 2008-04-10 | 2011-06-28 | Qualcomm Mems Technologies, Inc. | Device having thin black mask and method of fabricating the same |
US20110177745A1 (en) * | 2006-01-13 | 2011-07-21 | Qualcomm Mems Technologies, Inc. | Interconnect structure for mems device |
US8008736B2 (en) | 2004-09-27 | 2011-08-30 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device |
US8023167B2 (en) | 2008-06-25 | 2011-09-20 | Qualcomm Mems Technologies, Inc. | Backlight displays |
US8045252B2 (en) | 2004-02-03 | 2011-10-25 | Qualcomm Mems Technologies, Inc. | Spatial light modulator with integrated optical compensation structure |
US8049951B2 (en) | 2008-04-15 | 2011-11-01 | Qualcomm Mems Technologies, Inc. | Light with bi-directional propagation |
US8054527B2 (en) | 2007-10-23 | 2011-11-08 | Qualcomm Mems Technologies, Inc. | Adjustably transmissive MEMS-based devices |
US8058549B2 (en) | 2007-10-19 | 2011-11-15 | Qualcomm Mems Technologies, Inc. | Photovoltaic devices with integrated color interferometric film stacks |
US8068269B2 (en) | 2008-03-27 | 2011-11-29 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device with spacing layer |
US8077378B1 (en) | 2008-11-12 | 2011-12-13 | Evans & Sutherland Computer Corporation | Calibration system and method for light modulation device |
US8081373B2 (en) | 2007-07-31 | 2011-12-20 | Qualcomm Mems Technologies, Inc. | Devices and methods for enhancing color shift of interferometric modulators |
US8098416B2 (en) | 2006-06-01 | 2012-01-17 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device with electrostatic actuation and release |
US8115987B2 (en) | 2007-02-01 | 2012-02-14 | Qualcomm Mems Technologies, Inc. | Modulating the intensity of light from an interferometric reflector |
US8270056B2 (en) | 2009-03-23 | 2012-09-18 | Qualcomm Mems Technologies, Inc. | Display device with openings between sub-pixels and method of making same |
US8270062B2 (en) | 2009-09-17 | 2012-09-18 | Qualcomm Mems Technologies, Inc. | Display device with at least one movable stop element |
US8358266B2 (en) | 2008-09-02 | 2013-01-22 | Qualcomm Mems Technologies, Inc. | Light turning device with prismatic light turning features |
US8405899B2 (en) | 2004-09-27 | 2013-03-26 | Qualcomm Mems Technologies, Inc | Photonic MEMS and structures |
US8488228B2 (en) | 2009-09-28 | 2013-07-16 | Qualcomm Mems Technologies, Inc. | Interferometric display with interferometric reflector |
US20130229784A1 (en) * | 2012-03-02 | 2013-09-05 | Osram Sylvania Inc. | Phosphor Sheet Having Tunable Color Temperature |
US8659816B2 (en) | 2011-04-25 | 2014-02-25 | Qualcomm Mems Technologies, Inc. | Mechanical layer and methods of making the same |
US8670171B2 (en) | 2010-10-18 | 2014-03-11 | Qualcomm Mems Technologies, Inc. | Display having an embedded microlens array |
US8702248B1 (en) | 2008-06-11 | 2014-04-22 | Evans & Sutherland Computer Corporation | Projection method for reducing interpixel gaps on a viewing surface |
US8736939B2 (en) | 2011-11-04 | 2014-05-27 | Qualcomm Mems Technologies, Inc. | Matching layer thin-films for an electromechanical systems reflective display device |
US8797632B2 (en) | 2010-08-17 | 2014-08-05 | Qualcomm Mems Technologies, Inc. | Actuation and calibration of charge neutral electrode of a display device |
US8797628B2 (en) | 2007-10-19 | 2014-08-05 | Qualcomm Memstechnologies, Inc. | Display with integrated photovoltaic device |
US8798425B2 (en) | 2007-12-07 | 2014-08-05 | Qualcomm Mems Technologies, Inc. | Decoupled holographic film and diffuser |
US8817357B2 (en) | 2010-04-09 | 2014-08-26 | Qualcomm Mems Technologies, Inc. | Mechanical layer and methods of forming the same |
US8848294B2 (en) | 2010-05-20 | 2014-09-30 | Qualcomm Mems Technologies, Inc. | Method and structure capable of changing color saturation |
US8872085B2 (en) | 2006-10-06 | 2014-10-28 | Qualcomm Mems Technologies, Inc. | Display device having front illuminator with turning features |
US8885244B2 (en) | 2004-09-27 | 2014-11-11 | Qualcomm Mems Technologies, Inc. | Display device |
US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
US8941631B2 (en) | 2007-11-16 | 2015-01-27 | Qualcomm Mems Technologies, Inc. | Simultaneous light collection and illumination on an active display |
US8963159B2 (en) | 2011-04-04 | 2015-02-24 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
US8979349B2 (en) | 2009-05-29 | 2015-03-17 | Qualcomm Mems Technologies, Inc. | Illumination devices and methods of fabrication thereof |
US9019183B2 (en) | 2006-10-06 | 2015-04-28 | Qualcomm Mems Technologies, Inc. | Optical loss structure integrated in an illumination apparatus |
US9025235B2 (en) | 2002-12-25 | 2015-05-05 | Qualcomm Mems Technologies, Inc. | Optical interference type of color display having optical diffusion layer between substrate and electrode |
US9057872B2 (en) | 2010-08-31 | 2015-06-16 | Qualcomm Mems Technologies, Inc. | Dielectric enhanced mirror for IMOD display |
US9134527B2 (en) | 2011-04-04 | 2015-09-15 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
US9641826B1 (en) | 2011-10-06 | 2017-05-02 | Evans & Sutherland Computer Corporation | System and method for displaying distant 3-D stereo on a dome surface |
US9912257B2 (en) | 2006-06-02 | 2018-03-06 | MicroZeus, LLC | Methods and systems for micro machines |
US10230928B2 (en) | 2014-10-27 | 2019-03-12 | Texas Instruments Incorporated | Color recapture using polarization recovery in a color-field sequential display system |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52120883U (en) * | 1976-03-11 | 1977-09-13 | ||
JPS534363U (en) * | 1976-06-29 | 1978-01-14 | ||
JPS5511716U (en) * | 1978-07-08 | 1980-01-25 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2681423A (en) * | 1949-06-09 | 1954-06-15 | Electronique Soc Gen | Light reflecting screen for cathode-ray tubes |
US2682010A (en) * | 1951-08-07 | 1954-06-22 | Us Air Force | Cathode-ray projection tube |
US2733501A (en) * | 1956-02-07 | Electrostatic shutter mosaic and method of manufacture | ||
US3667830A (en) * | 1970-04-08 | 1972-06-06 | Stromberg Datagraphix Inc | Display system utilizing a selectively deformable light-reflecting element |
US3746911A (en) * | 1971-04-13 | 1973-07-17 | Westinghouse Electric Corp | Electrostatically deflectable light valves for projection displays |
-
1973
- 1973-08-22 US US390470A patent/US3886310A/en not_active Expired - Lifetime
-
1974
- 1974-08-19 JP JP9432174A patent/JPS531169B2/ja not_active Expired
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2733501A (en) * | 1956-02-07 | Electrostatic shutter mosaic and method of manufacture | ||
US2681423A (en) * | 1949-06-09 | 1954-06-15 | Electronique Soc Gen | Light reflecting screen for cathode-ray tubes |
US2682010A (en) * | 1951-08-07 | 1954-06-22 | Us Air Force | Cathode-ray projection tube |
US3667830A (en) * | 1970-04-08 | 1972-06-06 | Stromberg Datagraphix Inc | Display system utilizing a selectively deformable light-reflecting element |
US3746911A (en) * | 1971-04-13 | 1973-07-17 | Westinghouse Electric Corp | Electrostatically deflectable light valves for projection displays |
Cited By (392)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4322134A (en) * | 1975-04-04 | 1982-03-30 | Director, National U.S. Government, Security Agency | Electronic lens |
US4065840A (en) * | 1976-12-17 | 1978-01-03 | International Business Machines Corporation | Method for fabricating a DSDT target |
US4229081A (en) * | 1978-06-26 | 1980-10-21 | The United States Of America As Represented By The Secretary Of The Army | Electro-mechanical image converter |
US4229732A (en) * | 1978-12-11 | 1980-10-21 | International Business Machines Corporation | Micromechanical display logic and array |
DE3108240A1 (en) * | 1980-03-11 | 1982-04-29 | Centre Electronique Horloger S.A., Neuchâtel | "MINIATURE DISPLAY ARRANGEMENT" |
EP0040302A2 (en) * | 1980-05-19 | 1981-11-25 | International Business Machines Corporation | An optical ray deflection apparatus |
US4317611A (en) * | 1980-05-19 | 1982-03-02 | International Business Machines Corporation | Optical ray deflection apparatus |
EP0040302A3 (en) * | 1980-05-19 | 1984-10-24 | International Business Machines Corporation | An optical ray deflection apparatus |
US4441791A (en) * | 1980-09-02 | 1984-04-10 | Texas Instruments Incorporated | Deformable mirror light modulator |
US4380373A (en) * | 1980-10-06 | 1983-04-19 | Xerox Corporation | Conformable proximity coupled electro-optic devices |
US4356730A (en) * | 1981-01-08 | 1982-11-02 | International Business Machines Corporation | Electrostatically deformographic switches |
US4592628A (en) * | 1981-07-01 | 1986-06-03 | International Business Machines | Mirror array light valve |
US4564836A (en) * | 1981-07-02 | 1986-01-14 | Centre Electronique Horloger S.A. | Miniature shutter type display device with multiplexing capability |
US4492435A (en) * | 1982-07-02 | 1985-01-08 | Xerox Corporation | Multiple array full width electro mechanical modulator |
US4680579A (en) * | 1983-09-08 | 1987-07-14 | Texas Instruments Incorporated | Optical system for projection display using spatial light modulator device |
US4842396A (en) * | 1984-06-29 | 1989-06-27 | Canon Kabushiki Kaisha | Light modulation element and light modulation apparatus |
US4710732A (en) * | 1984-07-31 | 1987-12-01 | Texas Instruments Incorporated | Spatial light modulator and method |
JPS61116324A (en) * | 1984-07-31 | 1986-06-03 | テキサス インスツルメンツ インコ−ポレイテツド | Spatial light modulator and method thereof |
US4615595A (en) * | 1984-10-10 | 1986-10-07 | Texas Instruments Incorporated | Frame addressed spatial light modulator |
US4755013A (en) * | 1985-01-23 | 1988-07-05 | Canon Kabushiki Kaisha | Light scanning optical system of an image output scanner using an electro mechanical light modulator |
US4775204A (en) * | 1985-01-23 | 1988-10-04 | Canon Kabushiki Kaisha | Light scanning optical system of an image output scanner using an electro-mechanical light modulator |
US5150250A (en) * | 1985-01-23 | 1992-09-22 | Canon Kabushiki Kaisha | Light scanning optical system for an image output scanner using an electro-mechanical light modulator |
US4728185A (en) * | 1985-07-03 | 1988-03-01 | Texas Instruments Incorporated | Imaging system |
US4662746A (en) * | 1985-10-30 | 1987-05-05 | Texas Instruments Incorporated | Spatial light modulator and method |
US5172262A (en) * | 1985-10-30 | 1992-12-15 | Texas Instruments Incorporated | Spatial light modulator and method |
US4784448A (en) * | 1986-01-22 | 1988-11-15 | Messerschmitt-Bolkow-Blohm Gmbh | Retromodulator |
US4786149A (en) * | 1986-05-22 | 1988-11-22 | Siemens Aktiengesellschaft | Arrangement for optical image processing |
US4956619A (en) * | 1988-02-19 | 1990-09-11 | Texas Instruments Incorporated | Spatial light modulator |
EP0332953A3 (en) * | 1988-03-16 | 1989-11-23 | Texas Instruments Incorporated | Spatial light modulator and method |
EP0332953A2 (en) * | 1988-03-16 | 1989-09-20 | Texas Instruments Incorporated | Spatial light modulator and method |
US5005968A (en) * | 1988-08-31 | 1991-04-09 | Asahi Kogaku Kogyo Kabushiki Kaisha | Contrast decreasing apparatus in image forming optical system |
US4954789A (en) * | 1989-09-28 | 1990-09-04 | Texas Instruments Incorporated | Spatial light modulator |
GB2239101B (en) * | 1989-11-17 | 1993-09-22 | Marconi Gec Ltd | Optical device |
US5142405A (en) * | 1990-06-29 | 1992-08-25 | Texas Instruments Incorporated | Bistable dmd addressing circuit and method |
US5600383A (en) * | 1990-06-29 | 1997-02-04 | Texas Instruments Incorporated | Multi-level deformable mirror device with torsion hinges placed in a layer different from the torsion beam layer |
US5216537A (en) * | 1990-06-29 | 1993-06-01 | Texas Instruments Incorporated | Architecture and process for integrating DMD with control circuit substrates |
US5148157A (en) * | 1990-09-28 | 1992-09-15 | Texas Instruments Incorporated | Spatial light modulator with full complex light modulation capability |
GB2265025A (en) * | 1990-11-16 | 1993-09-15 | Rank Cintel Ltd | Improvements relating to spatial light modulators |
GB2265025B (en) * | 1990-11-16 | 1995-05-17 | Rank Cintel Ltd | Improvements relating to spatial light modulators |
US5471584A (en) * | 1990-11-16 | 1995-11-28 | Rank Brimar Limited | Spatial light modulator with sub-divided modulation elements |
WO1992009001A1 (en) * | 1990-11-16 | 1992-05-29 | Rank Cintel Limited | Improvements relating to spatial light modulators |
US6623144B2 (en) | 1991-04-30 | 2003-09-23 | Genlyte Thomas Group Llc | High intensity lighting projectors |
US5287215A (en) * | 1991-07-17 | 1994-02-15 | Optron Systems, Inc. | Membrane light modulation systems |
WO1993002375A1 (en) * | 1991-07-17 | 1993-02-04 | Optron Systems, Inc. | Membrane light modulating systems |
AU661501B2 (en) * | 1991-07-17 | 1995-07-27 | Optron Systems, Inc. | Membrane light modulating systems |
US5408355A (en) * | 1991-10-30 | 1995-04-18 | Labor Dr. Hans Steinbichler | Micromechanical transducer |
US5457566A (en) * | 1991-11-22 | 1995-10-10 | Texas Instruments Incorporated | DMD scanner |
US5808797A (en) * | 1992-04-28 | 1998-09-15 | Silicon Light Machines | Method and apparatus for modulating a light beam |
EP0594829A1 (en) * | 1992-05-18 | 1994-05-04 | Aura Systems, Inc. | Pixel intensity modulator |
EP0594829A4 (en) * | 1992-05-18 | 1995-05-31 | Aura Systems Inc | Pixel intensity modulator. |
WO1993023959A1 (en) | 1992-05-18 | 1993-11-25 | Aura Systems, Inc. | Pixel intensity modulator |
US5488505A (en) * | 1992-10-01 | 1996-01-30 | Engle; Craig D. | Enhanced electrostatic shutter mosaic modulator |
US5640266A (en) * | 1992-10-07 | 1997-06-17 | Engle; Craig D. | Electronically addressed deformable mirror device |
US5307082A (en) * | 1992-10-28 | 1994-04-26 | North Carolina State University | Electrostatically shaped membranes |
US5581393A (en) * | 1993-03-23 | 1996-12-03 | Daewoo Electronics Co., Ltd. | Mirror array and method for the manufacture thereof |
US5734492A (en) * | 1993-05-21 | 1998-03-31 | Daewoo Electronics Co Ltd | Piezoelectric actuated mirror array |
US6059416A (en) * | 1993-08-31 | 2000-05-09 | Daewoo Electronics Co., Ltd. | Actuated mirror array and method for the fabricating thereof |
US5610773A (en) * | 1994-04-30 | 1997-03-11 | Daewoo Electronic Co. Ltd. | Actuated mirror array and method for the manufacture thereof |
US20110038027A1 (en) * | 1994-05-05 | 2011-02-17 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light with semiconductor substrate |
US8059326B2 (en) | 1994-05-05 | 2011-11-15 | Qualcomm Mems Technologies Inc. | Display devices comprising of interferometric modulator and sensor |
US8054532B2 (en) | 1994-05-05 | 2011-11-08 | Qualcomm Mems Technologies, Inc. | Method and device for providing illumination to interferometric modulators |
US8035884B2 (en) | 1994-05-05 | 2011-10-11 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light with semiconductor substrate |
US20100309540A1 (en) * | 1994-05-05 | 2010-12-09 | Qualcomm Mems Technologies, Inc. | Method and device for providing illumination to interferometric modulators |
US20080088910A1 (en) * | 1994-05-05 | 2008-04-17 | Idc, Llc | System and method for a mems device |
US8081369B2 (en) | 1994-05-05 | 2011-12-20 | Qualcomm Mems Technologies, Inc. | System and method for a MEMS device |
EP0692728A2 (en) | 1994-07-13 | 1996-01-17 | Texas Instruments Incorporated | Improvements in and relating to spatial light modulators |
US5839808A (en) * | 1994-09-28 | 1998-11-24 | Nikon Corporation | Projection optical system |
US5640214A (en) * | 1994-09-30 | 1997-06-17 | Texas Instruments Incorporated | Printer and display systems with bidirectional light collection structures |
EP0712022A2 (en) | 1994-11-14 | 1996-05-15 | Texas Instruments Incorporated | Improvements in or relating to micromechanical devices |
US5612753A (en) * | 1995-01-27 | 1997-03-18 | Texas Instruments Incorporated | Full-color projection display system using two light modulators |
US5579151A (en) * | 1995-02-17 | 1996-11-26 | Texas Instruments Incorporated | Spatial light modulator |
US5696619A (en) * | 1995-02-27 | 1997-12-09 | Texas Instruments Incorporated | Micromechanical device having an improved beam |
US5610438A (en) * | 1995-03-08 | 1997-03-11 | Texas Instruments Incorporated | Micro-mechanical device with non-evaporable getter |
US5719695A (en) * | 1995-03-31 | 1998-02-17 | Texas Instruments Incorporated | Spatial light modulator with superstructure light shield |
US20110188110A1 (en) * | 1995-05-01 | 2011-08-04 | Miles Mark W | Microelectromechanical device with restoring electrode |
US7898722B2 (en) * | 1995-05-01 | 2011-03-01 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device with restoring electrode |
US20100315695A1 (en) * | 1995-05-01 | 2010-12-16 | Miles Mark W | Microelectromechanical device with restoring electrode |
US5841579A (en) * | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
US7027207B2 (en) | 1995-06-19 | 2006-04-11 | Reflectivity, Inc | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US7403324B2 (en) | 1995-06-19 | 2008-07-22 | Texas Instruments Incorporated | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US20050168795A1 (en) * | 1995-06-19 | 2005-08-04 | Huibers Andrew G. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US20050041277A1 (en) * | 1995-06-19 | 2005-02-24 | Huibers Andrew G. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US20050174626A1 (en) * | 1995-06-19 | 2005-08-11 | Huibers Andrew G. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US20050174625A1 (en) * | 1995-06-19 | 2005-08-11 | Huibers Andrew G. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US6947200B2 (en) | 1995-06-19 | 2005-09-20 | Reflectivity, Inc | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US6690502B2 (en) | 1995-06-19 | 2004-02-10 | Reflectivity, Inc. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US6975444B2 (en) | 1995-06-19 | 2005-12-13 | Reflectivity, Inc. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US7009754B2 (en) | 1995-06-19 | 2006-03-07 | Reflectivity, Inc | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US7012733B2 (en) | 1995-06-19 | 2006-03-14 | Reflectivity, Inc | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US6356378B1 (en) | 1995-06-19 | 2002-03-12 | Reflectivity, Inc. | Double substrate reflective spatial light modulator |
US20050105160A1 (en) * | 1995-06-19 | 2005-05-19 | Huibers Andrew G. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US6798561B2 (en) | 1995-06-19 | 2004-09-28 | Reflectivity, Inc | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US20060132892A1 (en) * | 1995-06-19 | 2006-06-22 | Huibers Andrew G | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US20040141224A1 (en) * | 1995-06-19 | 2004-07-22 | Huibers Andrew G. | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US7023607B2 (en) | 1995-06-19 | 2006-04-04 | Reflectivity, Inc | Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements |
US6538800B2 (en) | 1995-06-19 | 2003-03-25 | Reflectivity, Inc. | Reflective spatial light modulator with deflectable elements formed on a light transmissive substrate |
US6025951A (en) * | 1996-11-27 | 2000-02-15 | National Optics Institute | Light modulating microdevice and method |
US20110080632A1 (en) * | 1996-12-19 | 2011-04-07 | Qualcomm Mems Technologies, Inc. | Method of making a light modulating display device and associated transistor circuitry and structures thereof |
US5982553A (en) * | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
US6034810A (en) * | 1997-04-18 | 2000-03-07 | Memsolutions, Inc. | Field emission charge controlled mirror (FEA-CCM) |
US5926309A (en) * | 1997-04-18 | 1999-07-20 | Memsolutions, Inc. | Light valve target comprising electrostatically-repelled micro-mirrors |
US5768009A (en) * | 1997-04-18 | 1998-06-16 | E-Beam | Light valve target comprising electrostatically-repelled micro-mirrors |
US6088102A (en) * | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
WO1999032919A1 (en) * | 1997-12-22 | 1999-07-01 | Robert Bosch Gmbh | Method for producing a micromechanical device |
US6369931B1 (en) | 1997-12-22 | 2002-04-09 | Robert Bosch Gmbh | Method for manufacturing a micromechanical device |
US6233088B1 (en) * | 1998-03-17 | 2001-05-15 | Mcnc | Methods for modulating a radiation signal |
US20070177247A1 (en) * | 1998-04-08 | 2007-08-02 | Miles Mark W | Method and device for modulating light with multiple electrodes |
US20110170167A1 (en) * | 1998-04-08 | 2011-07-14 | Qualcomm Mems Technologies, Inc. | Method for modulating light with multiple electrodes |
US7872792B2 (en) | 1998-04-08 | 2011-01-18 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light with multiple electrodes |
US9110289B2 (en) | 1998-04-08 | 2015-08-18 | Qualcomm Mems Technologies, Inc. | Device for modulating light with multiple electrodes |
US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
US6147789A (en) * | 1998-05-04 | 2000-11-14 | Gelbart; Daniel | High speed deformable mirror light valve |
US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
US6130770A (en) * | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
US6101036A (en) * | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
US6872984B1 (en) | 1998-07-29 | 2005-03-29 | Silicon Light Machines Corporation | Method of sealing a hermetic lid to a semiconductor die at an angle |
US6764875B2 (en) | 1998-07-29 | 2004-07-20 | Silicon Light Machines | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
US20010022382A1 (en) * | 1998-07-29 | 2001-09-20 | Shook James Gill | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
US6038058A (en) * | 1998-10-15 | 2000-03-14 | Memsolutions, Inc. | Grid-actuated charge controlled mirror and method of addressing the same |
US5991066A (en) * | 1998-10-15 | 1999-11-23 | Memsolutions, Inc. | Membrane-actuated charge controlled mirror |
US6028696A (en) * | 1998-10-15 | 2000-02-22 | Memsolutions, Inc. | Charge controlled mirror with improved frame time utilization and method of addressing the same |
US6031657A (en) * | 1998-10-15 | 2000-02-29 | Memsolutions, Inc. | Membrane-actuated charge controlled mirror (CCM) projection display |
US6123985A (en) * | 1998-10-28 | 2000-09-26 | Solus Micro Technologies, Inc. | Method of fabricating a membrane-actuated charge controlled mirror (CCM) |
US6233087B1 (en) | 1998-12-18 | 2001-05-15 | Eastman Kodak Company | Electro-mechanical grating device |
JP2000221419A (en) * | 1999-01-28 | 2000-08-11 | Seiko Epson Corp | Light reflection unit and illuminator |
US7830586B2 (en) | 1999-10-05 | 2010-11-09 | Qualcomm Mems Technologies, Inc. | Transparent thin films |
US6813053B1 (en) | 2000-05-19 | 2004-11-02 | The Regents Of The University Of California | Apparatus and method for controlled cantilever motion through torsional beams and a counterweight |
US6346776B1 (en) | 2000-07-10 | 2002-02-12 | Memsolutions, Inc. | Field emission array (FEA) addressed deformable light valve modulator |
US7099065B2 (en) | 2000-08-03 | 2006-08-29 | Reflectivity, Inc. | Micromirrors with OFF-angle electrodes and stops |
US20030214639A1 (en) * | 2000-08-03 | 2003-11-20 | Satyadev Patel | Micromirrors with OFF-angle electrodes and stops |
US20040223088A1 (en) * | 2000-08-30 | 2004-11-11 | Huibers Andrew G. | Projection TV with improved micromirror array |
US7167297B2 (en) | 2000-08-30 | 2007-01-23 | Reflectivity, Inc | Micromirror array |
US20040218149A1 (en) * | 2000-08-30 | 2004-11-04 | Huibers Andrew G. | Projection display |
US20040218293A1 (en) * | 2000-08-30 | 2004-11-04 | Huibers Andrew G. | Packaged micromirror array for a projection display |
US6523961B2 (en) | 2000-08-30 | 2003-02-25 | Reflectivity, Inc. | Projection system and mirror elements for improved contrast ratio in spatial light modulators |
US20040223240A1 (en) * | 2000-08-30 | 2004-11-11 | Huibers Andrew G. | Micromirror array |
US7012731B2 (en) | 2000-08-30 | 2006-03-14 | Reflectivity, Inc | Packaged micromirror array for a projection display |
US7018052B2 (en) | 2000-08-30 | 2006-03-28 | Reflectivity, Inc | Projection TV with improved micromirror array |
US20040233392A1 (en) * | 2000-08-30 | 2004-11-25 | Huibers Andrew G. | Projection TV with improved micromirror array |
US20040218154A1 (en) * | 2000-08-30 | 2004-11-04 | Huibers Andrew G. | Packaged micromirror array for a projection display |
US7172296B2 (en) | 2000-08-30 | 2007-02-06 | Reflectivity, Inc | Projection display |
US7196740B2 (en) | 2000-08-30 | 2007-03-27 | Texas Instruments Incorporated | Projection TV with improved micromirror array |
US20050007557A1 (en) * | 2000-08-30 | 2005-01-13 | Huibers Andrew G. | Rear projection TV with improved micromirror array |
US20050030490A1 (en) * | 2000-08-30 | 2005-02-10 | Huibers Andrew G. | Projection display |
US7006275B2 (en) | 2000-08-30 | 2006-02-28 | Reflectivity, Inc | Packaged micromirror array for a projection display |
US7262817B2 (en) | 2000-08-30 | 2007-08-28 | Texas Instruments Incorporated | Rear projection TV with improved micromirror array |
US7300162B2 (en) | 2000-08-30 | 2007-11-27 | Texas Instruments Incorporated | Projection display |
US20050214976A1 (en) * | 2000-12-07 | 2005-09-29 | Patel Satyadev R | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US20050181532A1 (en) * | 2000-12-07 | 2005-08-18 | Patel Satyadev R. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US7655492B2 (en) | 2000-12-07 | 2010-02-02 | Texas Instruments Incorporated | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US7671428B2 (en) | 2000-12-07 | 2010-03-02 | Texas Instruments Incorporated | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US7573111B2 (en) | 2000-12-07 | 2009-08-11 | Texas Instruments Incorporated | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US20070001247A1 (en) * | 2000-12-07 | 2007-01-04 | Patel Satyadev R | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US7286278B2 (en) | 2000-12-07 | 2007-10-23 | Texas Instruments Incorporated | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US20050260793A1 (en) * | 2000-12-07 | 2005-11-24 | Patel Satyadev R | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US20050191790A1 (en) * | 2000-12-07 | 2005-09-01 | Patel Satyadev R. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US20050180686A1 (en) * | 2000-12-07 | 2005-08-18 | Patel Satyadev R. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US20050179982A1 (en) * | 2000-12-07 | 2005-08-18 | Patel Satyadev R. | Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates |
US20020098610A1 (en) * | 2001-01-19 | 2002-07-25 | Alexander Payne | Reduced surface charging in silicon-based devices |
WO2002065186A3 (en) * | 2001-02-15 | 2003-11-27 | Teem Photonics | Pivoting optical micromirror, array for such micromirrors and method for making same |
WO2002065187A2 (en) * | 2001-02-15 | 2002-08-22 | Teem Photonics | Method for making an optical micromirror and micromirror or array of micromirrors obtained by said method |
US20040085606A1 (en) * | 2001-02-15 | 2004-05-06 | Serge Valette | Method for making an optical micromirror and micromirror or array of micromirrors obtained by said method |
US7022249B2 (en) | 2001-02-15 | 2006-04-04 | Teem Photonics | Method for making an optical micromirror and micromirror or array of micromirrors obtained by said method |
US20040061961A1 (en) * | 2001-02-15 | 2004-04-01 | Serge Valette | Pivoting optical micromirror, array for such micromirrors and method for making same |
WO2002065186A2 (en) * | 2001-02-15 | 2002-08-22 | Teem Photonics | Pivoting optical micromirror, array for such micromirrors and method for making same |
WO2002065187A3 (en) * | 2001-02-15 | 2003-11-27 | Teem Photonics | Method for making an optical micromirror and micromirror or array of micromirrors obtained by said method |
FR2820834A1 (en) * | 2001-02-15 | 2002-08-16 | Teem Photonics | METHOD FOR MANUFACTURING AN OPTICAL MICRO-MIRROR AND MICRO-MIRROR OR MICRO-MIRROR MATRIX OBTAINED BY THIS PROCESS |
US20040001257A1 (en) * | 2001-03-08 | 2004-01-01 | Akira Tomita | High contrast grating light valve |
US7177081B2 (en) | 2001-03-08 | 2007-02-13 | Silicon Light Machines Corporation | High contrast grating light valve type device |
US20030208753A1 (en) * | 2001-04-10 | 2003-11-06 | Silicon Light Machines | Method, system, and display apparatus for encrypted cinema |
US6707591B2 (en) | 2001-04-10 | 2004-03-16 | Silicon Light Machines | Angled illumination for a single order light modulator based projection system |
US6865346B1 (en) | 2001-06-05 | 2005-03-08 | Silicon Light Machines Corporation | Fiber optic transceiver |
US6782205B2 (en) | 2001-06-25 | 2004-08-24 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US20040008399A1 (en) * | 2001-06-25 | 2004-01-15 | Trisnadi Jahja I. | Method, apparatus, and diffuser for reducing laser speckle |
US6747781B2 (en) | 2001-06-25 | 2004-06-08 | Silicon Light Machines, Inc. | Method, apparatus, and diffuser for reducing laser speckle |
US20020196492A1 (en) * | 2001-06-25 | 2002-12-26 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US20030025984A1 (en) * | 2001-08-01 | 2003-02-06 | Chris Gudeman | Optical mem device with encapsulated dampening gas |
US7023606B2 (en) | 2001-08-03 | 2006-04-04 | Reflectivity, Inc | Micromirror array for projection TV |
US20040218292A1 (en) * | 2001-08-03 | 2004-11-04 | Huibers Andrew G | Micromirror array for projection TV |
US6639722B2 (en) | 2001-08-15 | 2003-10-28 | Silicon Light Machines | Stress tuned blazed grating light valve |
US6991953B1 (en) | 2001-09-13 | 2006-01-31 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
US7049164B2 (en) | 2001-09-13 | 2006-05-23 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
US6956995B1 (en) | 2001-11-09 | 2005-10-18 | Silicon Light Machines Corporation | Optical communication arrangement |
US20030103194A1 (en) * | 2001-11-30 | 2003-06-05 | Gross Kenneth P. | Display apparatus including RGB color combiner and 1D light valve relay including schlieren filter |
US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
US6437903B1 (en) * | 2002-02-20 | 2002-08-20 | Intel Corporation | Light modulator with two mirror sets |
US6767751B2 (en) | 2002-05-28 | 2004-07-27 | Silicon Light Machines, Inc. | Integrated driver process flow |
US20030235932A1 (en) * | 2002-05-28 | 2003-12-25 | Silicon Light Machines | Integrated driver process flow |
US6728023B1 (en) | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
US20030223675A1 (en) * | 2002-05-29 | 2003-12-04 | Silicon Light Machines | Optical switch |
US7054515B1 (en) | 2002-05-30 | 2006-05-30 | Silicon Light Machines Corporation | Diffractive light modulator-based dynamic equalizer with integrated spectral monitor |
US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
US6829258B1 (en) | 2002-06-26 | 2004-12-07 | Silicon Light Machines, Inc. | Rapidly tunable external cavity laser |
US6714337B1 (en) | 2002-06-28 | 2004-03-30 | Silicon Light Machines | Method and device for modulating a light beam and having an improved gamma response |
US6908201B2 (en) | 2002-06-28 | 2005-06-21 | Silicon Light Machines Corporation | Micro-support structures |
US6813059B2 (en) | 2002-06-28 | 2004-11-02 | Silicon Light Machines, Inc. | Reduced formation of asperities in contact micro-structures |
US20040057101A1 (en) * | 2002-06-28 | 2004-03-25 | James Hunter | Reduced formation of asperities in contact micro-structures |
US20040001264A1 (en) * | 2002-06-28 | 2004-01-01 | Christopher Gudeman | Micro-support structures |
US7057795B2 (en) | 2002-08-20 | 2006-06-06 | Silicon Light Machines Corporation | Micro-structures with individually addressable ribbon pairs |
US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
US20050157376A1 (en) * | 2002-11-26 | 2005-07-21 | Huibers Andrew G. | Spatial light modulators with light blocking/absorbing areas |
US7405860B2 (en) | 2002-11-26 | 2008-07-29 | Texas Instruments Incorporated | Spatial light modulators with light blocking/absorbing areas |
US6928207B1 (en) | 2002-12-12 | 2005-08-09 | Silicon Light Machines Corporation | Apparatus for selectively blocking WDM channels |
US6987600B1 (en) * | 2002-12-17 | 2006-01-17 | Silicon Light Machines Corporation | Arbitrary phase profile for better equalization in dynamic gain equalizer |
US7057819B1 (en) | 2002-12-17 | 2006-06-06 | Silicon Light Machines Corporation | High contrast tilting ribbon blazed grating |
US6934070B1 (en) | 2002-12-18 | 2005-08-23 | Silicon Light Machines Corporation | Chirped optical MEM device |
US6927891B1 (en) | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
US9025235B2 (en) | 2002-12-25 | 2015-05-05 | Qualcomm Mems Technologies, Inc. | Optical interference type of color display having optical diffusion layer between substrate and electrode |
US7068372B1 (en) | 2003-01-28 | 2006-06-27 | Silicon Light Machines Corporation | MEMS interferometer-based reconfigurable optical add-and-drop multiplexor |
US7286764B1 (en) | 2003-02-03 | 2007-10-23 | Silicon Light Machines Corporation | Reconfigurable modulator-based optical add-and-drop multiplexer |
US6947613B1 (en) | 2003-02-11 | 2005-09-20 | Silicon Light Machines Corporation | Wavelength selective switch and equalizer |
US6922272B1 (en) | 2003-02-14 | 2005-07-26 | Silicon Light Machines Corporation | Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices |
US7391973B1 (en) | 2003-02-28 | 2008-06-24 | Silicon Light Machines Corporation | Two-stage gain equalizer |
US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
US7027202B1 (en) | 2003-02-28 | 2006-04-11 | Silicon Light Machines Corp | Silicon substrate as a light modulator sacrificial layer |
US6829077B1 (en) | 2003-02-28 | 2004-12-07 | Silicon Light Machines, Inc. | Diffractive light modulator with dynamically rotatable diffraction plane |
US6922273B1 (en) | 2003-02-28 | 2005-07-26 | Silicon Light Machines Corporation | PDL mitigation structure for diffractive MEMS and gratings |
US7042611B1 (en) | 2003-03-03 | 2006-05-09 | Silicon Light Machines Corporation | Pre-deflected bias ribbons |
US7015885B2 (en) | 2003-03-22 | 2006-03-21 | Active Optical Networks, Inc. | MEMS devices monolithically integrated with drive and control circuitry |
US20080314869A1 (en) * | 2003-03-22 | 2008-12-25 | Novotny Vlad J | Methods for fabricating spatial light modulators with hidden comb actuators |
US6914711B2 (en) | 2003-03-22 | 2005-07-05 | Active Optical Networks, Inc. | Spatial light modulator with hidden comb actuator |
US20060077531A1 (en) * | 2003-03-22 | 2006-04-13 | Active Optical Networks, Inc. | Light modulator with integrated drive and control circuitry |
US7071109B2 (en) | 2003-03-22 | 2006-07-04 | Active Optical Networks, Inc. | Methods for fabricating spatial light modulators with hidden comb actuators |
US20050002079A1 (en) * | 2003-03-22 | 2005-01-06 | Novotny Vlad J. | MEMS devices monolithically integrated with drive and control circuitry |
US7075701B2 (en) | 2003-03-22 | 2006-07-11 | Active Optical Networks, Inc. | Light modulator with integrated drive and control circuitry |
US7375874B1 (en) | 2003-03-22 | 2008-05-20 | Active Optical Mems Inc. | Light modulator with integrated drive and control circuitry |
US20050185250A1 (en) * | 2003-03-22 | 2005-08-25 | Active Optical Networks, Inc. | Methods for fabricating spatial light modulators with hidden comb actuators |
US20040184132A1 (en) * | 2003-03-22 | 2004-09-23 | Novotny Vlad J. | Spatial light modulator with hidden comb actuator |
US20060018003A1 (en) * | 2003-10-30 | 2006-01-26 | Andrew Huibers | Micromirror and post arrangements on substrates |
US20060007522A1 (en) * | 2003-10-30 | 2006-01-12 | Andrew Huibers | Micromirror and post arrangements on substrates |
US7075702B2 (en) | 2003-10-30 | 2006-07-11 | Reflectivity, Inc | Micromirror and post arrangements on substrates |
US7362493B2 (en) | 2003-10-30 | 2008-04-22 | Texas Instruments Incorporated | Micromirror and post arrangements on substrates |
US20050185251A1 (en) * | 2003-12-21 | 2005-08-25 | Shreeve Robert W. | Discharge of MEM devices having charge induced via focused beam to enter different states |
US20050134957A1 (en) * | 2003-12-21 | 2005-06-23 | George Radominski | MEM devices having charge induced via focused beam to enter different states |
US7268933B2 (en) | 2003-12-21 | 2007-09-11 | Hewlett-Packard Development Company, L.P. | Discharge of MEM devices having charge induced via focused beam to enter different states |
US6943933B2 (en) | 2003-12-21 | 2005-09-13 | Hewlett-Packard Development Company, L.P. | MEM devices having charge induced via focused beam to enter different states |
US20070120438A1 (en) * | 2003-12-26 | 2007-05-31 | Commissariat A L'energie Atomique | Electrostatic control device |
US8045252B2 (en) | 2004-02-03 | 2011-10-25 | Qualcomm Mems Technologies, Inc. | Spatial light modulator with integrated optical compensation structure |
US8111445B2 (en) | 2004-02-03 | 2012-02-07 | Qualcomm Mems Technologies, Inc. | Spatial light modulator with integrated optical compensation structure |
US9019590B2 (en) | 2004-02-03 | 2015-04-28 | Qualcomm Mems Technologies, Inc. | Spatial light modulator with integrated optical compensation structure |
US7706050B2 (en) | 2004-03-05 | 2010-04-27 | Qualcomm Mems Technologies, Inc. | Integrated modulator illumination |
US7880954B2 (en) | 2004-03-05 | 2011-02-01 | Qualcomm Mems Technologies, Inc. | Integrated modulator illumination |
US20050231792A1 (en) * | 2004-04-14 | 2005-10-20 | Christine Alain | Light modulating microdevice |
US7088493B2 (en) | 2004-04-14 | 2006-08-08 | Institut National D'optique | Light modulating microdevice |
US9261696B2 (en) | 2004-06-15 | 2016-02-16 | Texas Insturments Incorporated | Micromirror array assembly |
US20050275930A1 (en) * | 2004-06-15 | 2005-12-15 | Satyadev Patel | Micromirror array assembly with in-array pillars |
US8693082B2 (en) | 2004-06-15 | 2014-04-08 | Texas Instruments Incorporated | Micromirror array assembly with in-array pillars |
US7787170B2 (en) | 2004-06-15 | 2010-08-31 | Texas Instruments Incorporated | Micromirror array assembly with in-array pillars |
US20100302618A1 (en) * | 2004-06-15 | 2010-12-02 | Texas Instruments Incorporated | Micromirror Array Assembly with In-Array Pillars |
US7113322B2 (en) | 2004-06-23 | 2006-09-26 | Reflectivity, Inc | Micromirror having offset addressing electrode |
US20050286112A1 (en) * | 2004-06-23 | 2005-12-29 | Satyadev Patel | Micromirror having offset addressing electrode |
US7183618B2 (en) * | 2004-08-14 | 2007-02-27 | Fusao Ishii | Hinge for micro-mirror devices |
GB2432227B (en) * | 2004-08-14 | 2009-04-22 | Fusao Ishii | Hinge for micro-mirror devices |
WO2006020987A3 (en) * | 2004-08-14 | 2006-06-01 | Fusao Ishii | Hinge for micro-mirror devices |
WO2006020987A2 (en) * | 2004-08-14 | 2006-02-23 | Fusao Ishii | Hinge for micro-mirror devices |
US20060034006A1 (en) * | 2004-08-14 | 2006-02-16 | Fusao Ishii | Hinge for micro-mirror devices |
GB2432227A (en) * | 2004-08-14 | 2007-05-16 | Fusao Ishii | Hinge for micro-mirror devices |
US7623142B2 (en) | 2004-09-14 | 2009-11-24 | Hewlett-Packard Development Company, L.P. | Flexure |
US20060056004A1 (en) * | 2004-09-14 | 2006-03-16 | Adel Jilani | Flexure |
US20060077154A1 (en) * | 2004-09-27 | 2006-04-13 | Gally Brian J | Optical films for directing light towards active areas of displays |
US7924494B2 (en) | 2004-09-27 | 2011-04-12 | Qualcomm Mems Technologies, Inc. | Apparatus and method for reducing slippage between structures in an interferometric modulator |
US8008736B2 (en) | 2004-09-27 | 2011-08-30 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device |
US20110188109A1 (en) * | 2004-09-27 | 2011-08-04 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US8638491B2 (en) | 2004-09-27 | 2014-01-28 | Qualcomm Mems Technologies, Inc. | Device having a conductive light absorbing mask and method for fabricating same |
US20090225394A1 (en) * | 2004-09-27 | 2009-09-10 | Idc, Llc | System and method of illuminating interferometric modulators using backlighting |
US8405899B2 (en) | 2004-09-27 | 2013-03-26 | Qualcomm Mems Technologies, Inc | Photonic MEMS and structures |
US8390547B2 (en) | 2004-09-27 | 2013-03-05 | Qualcomm Mems Technologies, Inc. | Conductive bus structure for interferometric modulator array |
US8885244B2 (en) | 2004-09-27 | 2014-11-11 | Qualcomm Mems Technologies, Inc. | Display device |
US20090213450A1 (en) * | 2004-09-27 | 2009-08-27 | Idc, Llc | Support structures for electromechanical systems and methods of fabricating the same |
US20100080890A1 (en) * | 2004-09-27 | 2010-04-01 | Qualcomm Mems Technologies, Inc. | Apparatus and method for reducing slippage between structures in an interferometric modulator |
US8289613B2 (en) | 2004-09-27 | 2012-10-16 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US20090201566A1 (en) * | 2004-09-27 | 2009-08-13 | Idc, Llc | Device having a conductive light absorbing mask and method for fabricating same |
US7719747B2 (en) | 2004-09-27 | 2010-05-18 | Qualcomm Mems Technologies, Inc. | Method and post structures for interferometric modulation |
US7750886B2 (en) | 2004-09-27 | 2010-07-06 | Qualcomm Mems Technologies, Inc. | Methods and devices for lighting displays |
US7349139B2 (en) | 2004-09-27 | 2008-03-25 | Idc, Llc | System and method of illuminating interferometric modulators using backlighting |
US8243360B2 (en) | 2004-09-27 | 2012-08-14 | Qualcomm Mems Technologies, Inc. | Device having a conductive light absorbing mask and method for fabricating same |
US7561323B2 (en) | 2004-09-27 | 2009-07-14 | Idc, Llc | Optical films for directing light towards active areas of displays |
US20060077509A1 (en) * | 2004-09-27 | 2006-04-13 | Ming-Hau Tung | Method and post structures for interferometric modulation |
US7807488B2 (en) | 2004-09-27 | 2010-10-05 | Qualcomm Mems Technologies, Inc. | Display element having filter material diffused in a substrate of the display element |
US7813026B2 (en) | 2004-09-27 | 2010-10-12 | Qualcomm Mems Technologies, Inc. | System and method of reducing color shift in a display |
US8213075B2 (en) | 2004-09-27 | 2012-07-03 | Qualcomm Mems Technologies, Inc. | Method and device for multistate interferometric light modulation |
US7982700B2 (en) | 2004-09-27 | 2011-07-19 | Qualcomm Mems Technologies, Inc. | Conductive bus structure for interferometric modulator array |
US7349141B2 (en) | 2004-09-27 | 2008-03-25 | Idc, Llc | Method and post structures for interferometric modulation |
US8970939B2 (en) | 2004-09-27 | 2015-03-03 | Qualcomm Mems Technologies, Inc. | Method and device for multistate interferometric light modulation |
US20080080043A1 (en) * | 2004-09-27 | 2008-04-03 | Idc, Llc | Conductive bus structure for interferometric modulator array |
US8040588B2 (en) | 2004-09-27 | 2011-10-18 | Qualcomm Mems Technologies, Inc. | System and method of illuminating interferometric modulators using backlighting |
US20080247028A1 (en) * | 2004-09-27 | 2008-10-09 | Idc, Llc | Method and device for multistate interferometric light modulation |
US20080055706A1 (en) * | 2004-09-27 | 2008-03-06 | Clarence Chui | Reflective display device having viewable display on both sides |
US7948671B2 (en) | 2004-09-27 | 2011-05-24 | Qualcomm Mems Technologies, Inc. | Apparatus and method for reducing slippage between structures in an interferometric modulator |
US20060077514A1 (en) * | 2004-09-27 | 2006-04-13 | Sampsell Jeffrey B | System and method of reducing color shift in a display |
US8081370B2 (en) | 2004-09-27 | 2011-12-20 | Qualcomm Mems Technologies, Inc. | Support structures for electromechanical systems and methods of fabricating the same |
US7889415B2 (en) | 2004-09-27 | 2011-02-15 | Qualcomm Mems Technologies, Inc. | Device having a conductive light absorbing mask and method for fabricating same |
US9086564B2 (en) | 2004-09-27 | 2015-07-21 | Qualcomm Mems Technologies, Inc. | Conductive bus structure for interferometric modulator array |
US9001412B2 (en) | 2004-09-27 | 2015-04-07 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US9097885B2 (en) | 2004-09-27 | 2015-08-04 | Qualcomm Mems Technologies, Inc. | Device having a conductive light absorbing mask and method for fabricating same |
US20080180777A1 (en) * | 2004-09-27 | 2008-07-31 | Idc, Llc | Method and post structures for interferometric modulation |
US20080013145A1 (en) * | 2004-09-27 | 2008-01-17 | Idc, Llc | Microelectromechanical device with optical function separated from mechanical and electrical function |
US7944599B2 (en) | 2004-09-27 | 2011-05-17 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US7355780B2 (en) | 2004-09-27 | 2008-04-08 | Idc, Llc | System and method of illuminating interferometric modulators using backlighting |
US8035883B2 (en) | 2004-09-27 | 2011-10-11 | Qualcomm Mems Technologies, Inc. | Device having a conductive light absorbing mask and method for fabricating same |
US7936497B2 (en) | 2004-09-27 | 2011-05-03 | Qualcomm Mems Technologies, Inc. | MEMS device having deformable membrane characterized by mechanical persistence |
US7092143B2 (en) | 2004-10-19 | 2006-08-15 | Reflectivity, Inc | Micromirror array device and a method for making the same |
US20060082858A1 (en) * | 2004-10-19 | 2006-04-20 | Peter Heureux | Micromirror array device and a method for making the same |
US7295363B2 (en) | 2005-04-08 | 2007-11-13 | Texas Instruments Incorporated | Optical coating on light transmissive substrates of micromirror devices |
US20070268554A1 (en) * | 2005-04-27 | 2007-11-22 | Shreeve Robert W | Discharge of MEM Devices Having Charge Induced Via Focused Beam to Enter Different States |
US7535619B2 (en) | 2005-04-27 | 2009-05-19 | Hewlett-Packard Development Company, L.P. | Discharge of MEM devices having charge induced via focused beam to enter different states |
US7835056B2 (en) | 2005-05-13 | 2010-11-16 | Her Majesty the Queen in Right of Canada, as represented by Institut National d'Optique | Image projector with flexible reflective analog modulator |
US20060291269A1 (en) * | 2005-05-13 | 2006-12-28 | Institut National D'optique | Image projector with flexible reflective analog modulator |
US7884989B2 (en) | 2005-05-27 | 2011-02-08 | Qualcomm Mems Technologies, Inc. | White interferometric modulators and methods for forming the same |
US8971675B2 (en) | 2006-01-13 | 2015-03-03 | Qualcomm Mems Technologies, Inc. | Interconnect structure for MEMS device |
US20110177745A1 (en) * | 2006-01-13 | 2011-07-21 | Qualcomm Mems Technologies, Inc. | Interconnect structure for mems device |
US20070196040A1 (en) * | 2006-02-17 | 2007-08-23 | Chun-Ming Wang | Method and apparatus for providing back-lighting in an interferometric modulator display device |
US7603001B2 (en) | 2006-02-17 | 2009-10-13 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing back-lighting in an interferometric modulator display device |
US20090256218A1 (en) * | 2006-02-23 | 2009-10-15 | Qualcomm Mems Technologies, Inc. | Mems device having a layer movable at asymmetric rates |
US8098416B2 (en) | 2006-06-01 | 2012-01-17 | Qualcomm Mems Technologies, Inc. | Analog interferometric modulator device with electrostatic actuation and release |
US9912257B2 (en) | 2006-06-02 | 2018-03-06 | MicroZeus, LLC | Methods and systems for micro machines |
US10734924B2 (en) | 2006-06-02 | 2020-08-04 | MicroZeus, LLC | Methods and systems for micro machines |
US8254005B2 (en) | 2006-06-03 | 2012-08-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Arrangement of micromechanical elements |
WO2007140731A1 (en) * | 2006-06-03 | 2007-12-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Arrangement of electrodes with respect to moving micromechanical elements |
US20090310204A1 (en) * | 2006-06-03 | 2009-12-17 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Arrangement of micromechanical elements |
US7766498B2 (en) | 2006-06-21 | 2010-08-03 | Qualcomm Mems Technologies, Inc. | Linear solid state illuminator |
US8102590B2 (en) | 2006-06-30 | 2012-01-24 | Qualcomm Mems Technologies, Inc. | Method of manufacturing MEMS devices providing air gap control |
US7952787B2 (en) | 2006-06-30 | 2011-05-31 | Qualcomm Mems Technologies, Inc. | Method of manufacturing MEMS devices providing air gap control |
US20090273823A1 (en) * | 2006-06-30 | 2009-11-05 | Qualcomm Mems Technologies, Inc. | Method of manufacturing mems devices providing air gap control |
US8964280B2 (en) | 2006-06-30 | 2015-02-24 | Qualcomm Mems Technologies, Inc. | Method of manufacturing MEMS devices providing air gap control |
US8872085B2 (en) | 2006-10-06 | 2014-10-28 | Qualcomm Mems Technologies, Inc. | Display device having front illuminator with turning features |
US9019183B2 (en) | 2006-10-06 | 2015-04-28 | Qualcomm Mems Technologies, Inc. | Optical loss structure integrated in an illumination apparatus |
US7891818B2 (en) | 2006-12-12 | 2011-02-22 | Evans & Sutherland Computer Corporation | System and method for aligning RGB light in a single modulator projector |
US20080212035A1 (en) * | 2006-12-12 | 2008-09-04 | Christensen Robert R | System and method for aligning RGB light in a single modulator projector |
US20080259988A1 (en) * | 2007-01-19 | 2008-10-23 | Evans & Sutherland Computer Corporation | Optical actuator with improved response time and method of making the same |
US8115987B2 (en) | 2007-02-01 | 2012-02-14 | Qualcomm Mems Technologies, Inc. | Modulating the intensity of light from an interferometric reflector |
US20080218834A1 (en) * | 2007-03-08 | 2008-09-11 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing a light absorbing mask in an interferometric modulator display |
US7916378B2 (en) | 2007-03-08 | 2011-03-29 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing a light absorbing mask in an interferometric modulator display |
US8098417B2 (en) | 2007-05-09 | 2012-01-17 | Qualcomm Mems Technologies, Inc. | Electromechanical system having a dielectric movable membrane |
US7889417B2 (en) | 2007-05-09 | 2011-02-15 | Qualcomm Mems Technologies, Inc. | Electromechanical system having a dielectric movable membrane |
US20090002644A1 (en) * | 2007-05-21 | 2009-01-01 | Evans & Sutherland Computer Corporation | Invisible scanning safety system |
US20100085625A1 (en) * | 2007-07-02 | 2010-04-08 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US20110170168A1 (en) * | 2007-07-02 | 2011-07-14 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US7920319B2 (en) | 2007-07-02 | 2011-04-05 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US8368997B2 (en) | 2007-07-02 | 2013-02-05 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US8081373B2 (en) | 2007-07-31 | 2011-12-20 | Qualcomm Mems Technologies, Inc. | Devices and methods for enhancing color shift of interferometric modulators |
US8736949B2 (en) | 2007-07-31 | 2014-05-27 | Qualcomm Mems Technologies, Inc. | Devices and methods for enhancing color shift of interferometric modulators |
US20090168186A1 (en) * | 2007-09-07 | 2009-07-02 | Forrest Williams | Device and method for reducing etendue in a diode laser |
US7847999B2 (en) | 2007-09-14 | 2010-12-07 | Qualcomm Mems Technologies, Inc. | Interferometric modulator display devices |
US20090219491A1 (en) * | 2007-10-18 | 2009-09-03 | Evans & Sutherland Computer Corporation | Method of combining multiple Gaussian beams for efficient uniform illumination of one-dimensional light modulators |
US8058549B2 (en) | 2007-10-19 | 2011-11-15 | Qualcomm Mems Technologies, Inc. | Photovoltaic devices with integrated color interferometric film stacks |
US8797628B2 (en) | 2007-10-19 | 2014-08-05 | Qualcomm Memstechnologies, Inc. | Display with integrated photovoltaic device |
US8054527B2 (en) | 2007-10-23 | 2011-11-08 | Qualcomm Mems Technologies, Inc. | Adjustably transmissive MEMS-based devices |
US8941631B2 (en) | 2007-11-16 | 2015-01-27 | Qualcomm Mems Technologies, Inc. | Simultaneous light collection and illumination on an active display |
US7949213B2 (en) | 2007-12-07 | 2011-05-24 | Qualcomm Mems Technologies, Inc. | Light illumination of displays with front light guide and coupling elements |
US8798425B2 (en) | 2007-12-07 | 2014-08-05 | Qualcomm Mems Technologies, Inc. | Decoupled holographic film and diffuser |
US8164821B2 (en) | 2008-02-22 | 2012-04-24 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device with thermal expansion balancing layer or stiffening layer |
US20090231666A1 (en) * | 2008-02-22 | 2009-09-17 | Sauri Gudlavalleti | Microelectromechanical device with thermal expansion balancing layer or stiffening layer |
US8693084B2 (en) | 2008-03-07 | 2014-04-08 | Qualcomm Mems Technologies, Inc. | Interferometric modulator in transmission mode |
US8174752B2 (en) | 2008-03-07 | 2012-05-08 | Qualcomm Mems Technologies, Inc. | Interferometric modulator in transmission mode |
US7944604B2 (en) | 2008-03-07 | 2011-05-17 | Qualcomm Mems Technologies, Inc. | Interferometric modulator in transmission mode |
US8068269B2 (en) | 2008-03-27 | 2011-11-29 | Qualcomm Mems Technologies, Inc. | Microelectromechanical device with spacing layer |
US7898723B2 (en) | 2008-04-02 | 2011-03-01 | Qualcomm Mems Technologies, Inc. | Microelectromechanical systems display element with photovoltaic structure |
US7969638B2 (en) | 2008-04-10 | 2011-06-28 | Qualcomm Mems Technologies, Inc. | Device having thin black mask and method of fabricating the same |
US8049951B2 (en) | 2008-04-15 | 2011-11-01 | Qualcomm Mems Technologies, Inc. | Light with bi-directional propagation |
US8358317B2 (en) | 2008-05-23 | 2013-01-22 | Evans & Sutherland Computer Corporation | System and method for displaying a planar image on a curved surface |
US20090322740A1 (en) * | 2008-05-23 | 2009-12-31 | Carlson Kenneth L | System and method for displaying a planar image on a curved surface |
US8702248B1 (en) | 2008-06-11 | 2014-04-22 | Evans & Sutherland Computer Corporation | Projection method for reducing interpixel gaps on a viewing surface |
US8023167B2 (en) | 2008-06-25 | 2011-09-20 | Qualcomm Mems Technologies, Inc. | Backlight displays |
US8358266B2 (en) | 2008-09-02 | 2013-01-22 | Qualcomm Mems Technologies, Inc. | Light turning device with prismatic light turning features |
US8077378B1 (en) | 2008-11-12 | 2011-12-13 | Evans & Sutherland Computer Corporation | Calibration system and method for light modulation device |
US20100195310A1 (en) * | 2009-02-04 | 2010-08-05 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
US20100226118A1 (en) * | 2009-03-06 | 2010-09-09 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
US8172417B2 (en) | 2009-03-06 | 2012-05-08 | Qualcomm Mems Technologies, Inc. | Shaped frontlight reflector for use with display |
US8270056B2 (en) | 2009-03-23 | 2012-09-18 | Qualcomm Mems Technologies, Inc. | Display device with openings between sub-pixels and method of making same |
US9121979B2 (en) | 2009-05-29 | 2015-09-01 | Qualcomm Mems Technologies, Inc. | Illumination devices and methods of fabrication thereof |
US8979349B2 (en) | 2009-05-29 | 2015-03-17 | Qualcomm Mems Technologies, Inc. | Illumination devices and methods of fabrication thereof |
US20110032214A1 (en) * | 2009-06-01 | 2011-02-10 | Qualcomm Mems Technologies, Inc. | Front light based optical touch screen |
US8270062B2 (en) | 2009-09-17 | 2012-09-18 | Qualcomm Mems Technologies, Inc. | Display device with at least one movable stop element |
US8488228B2 (en) | 2009-09-28 | 2013-07-16 | Qualcomm Mems Technologies, Inc. | Interferometric display with interferometric reflector |
US8817357B2 (en) | 2010-04-09 | 2014-08-26 | Qualcomm Mems Technologies, Inc. | Mechanical layer and methods of forming the same |
US8848294B2 (en) | 2010-05-20 | 2014-09-30 | Qualcomm Mems Technologies, Inc. | Method and structure capable of changing color saturation |
US8797632B2 (en) | 2010-08-17 | 2014-08-05 | Qualcomm Mems Technologies, Inc. | Actuation and calibration of charge neutral electrode of a display device |
US9057872B2 (en) | 2010-08-31 | 2015-06-16 | Qualcomm Mems Technologies, Inc. | Dielectric enhanced mirror for IMOD display |
US8670171B2 (en) | 2010-10-18 | 2014-03-11 | Qualcomm Mems Technologies, Inc. | Display having an embedded microlens array |
US8963159B2 (en) | 2011-04-04 | 2015-02-24 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
US9134527B2 (en) | 2011-04-04 | 2015-09-15 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
US8659816B2 (en) | 2011-04-25 | 2014-02-25 | Qualcomm Mems Technologies, Inc. | Mechanical layer and methods of making the same |
US9641826B1 (en) | 2011-10-06 | 2017-05-02 | Evans & Sutherland Computer Corporation | System and method for displaying distant 3-D stereo on a dome surface |
US10110876B1 (en) | 2011-10-06 | 2018-10-23 | Evans & Sutherland Computer Corporation | System and method for displaying images in 3-D stereo |
US9081188B2 (en) | 2011-11-04 | 2015-07-14 | Qualcomm Mems Technologies, Inc. | Matching layer thin-films for an electromechanical systems reflective display device |
US8736939B2 (en) | 2011-11-04 | 2014-05-27 | Qualcomm Mems Technologies, Inc. | Matching layer thin-films for an electromechanical systems reflective display device |
US20130229784A1 (en) * | 2012-03-02 | 2013-09-05 | Osram Sylvania Inc. | Phosphor Sheet Having Tunable Color Temperature |
US8591076B2 (en) * | 2012-03-02 | 2013-11-26 | Osram Sylvania Inc. | Phosphor sheet having tunable color temperature |
US10230928B2 (en) | 2014-10-27 | 2019-03-12 | Texas Instruments Incorporated | Color recapture using polarization recovery in a color-field sequential display system |
Also Published As
Publication number | Publication date |
---|---|
JPS5051615A (en) | 1975-05-08 |
JPS531169B2 (en) | 1978-01-17 |
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