US5051762A - Production of images using an array of light emitting diodes - Google Patents
Production of images using an array of light emitting diodes Download PDFInfo
- Publication number
- US5051762A US5051762A US07/596,851 US59685190A US5051762A US 5051762 A US5051762 A US 5051762A US 59685190 A US59685190 A US 59685190A US 5051762 A US5051762 A US 5051762A
- Authority
- US
- United States
- Prior art keywords
- light emitting
- emitting diodes
- exposure
- array
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B17/00—Details of cameras or camera bodies; Accessories therefor
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/40025—Circuits exciting or modulating particular heads for reproducing continuous tone value scales
- H04N1/4005—Circuits exciting or modulating particular heads for reproducing continuous tone value scales with regulating circuits, e.g. dependent upon ambient temperature or feedback control
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K15/00—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers
- G06K15/02—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers
- G06K15/12—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers
- G06K15/1238—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point
- G06K15/1242—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point on one main scanning line
- G06K15/1247—Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point on one main scanning line using an array of light sources, e.g. a linear array
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/40025—Circuits exciting or modulating particular heads for reproducing continuous tone value scales
- H04N1/40031—Circuits exciting or modulating particular heads for reproducing continuous tone value scales for a plurality of reproducing elements simultaneously
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/40—Picture signal circuits
- H04N1/401—Compensating positionally unequal response of the pick-up or reproducing head
- H04N1/4015—Compensating positionally unequal response of the pick-up or reproducing head of the reproducing head
Definitions
- This invention relates to the production of images, particularly grey scale images, using an array of light emitting diodes (LEDs) as the exposure source.
- LEDs light emitting diodes
- bi-level imaging and continuous tone (grey-scale) imaging.
- continuous tone imaging requires that each pixel receives an exposure that is continuously variable, or variable over a sufficiently large number of discrete levels so as to mimic continuous variability.
- the latter type of imaging is needed in areas such as high quality colour reproduction, and requires control of the exposure parameters with a degree of precision not achieved in the prior art, involving the solution of problems not hitherto recognised. These include transient turn-on and -off effects, and pixel shape and spacing effects, and also source wavelength variation effects. The latter effects are addressed by the present invention.
- the present invention provides an imaging method in which the LED exposure apparatus is calibrated to take into account the wavelength difference between LED emissions and the spectral sensitivity of the photosensitive medium.
- a method of calibrating an exposure apparatus comprising an array of light emitting diodes to a photosensitive material to be imaged, which method comprises making separate energy measurements of each light emitting diode with a detector through a coloured filter, so that the spectral response of the detector and filter combination matches that of the photosensitive material in the wavelength region of the emission of the light emitting diode and using said energy measurements to modulate each exposure level of the array of light emitting diodes.
- the invention also extends to the use of the calibration method during exposure of the photosensitive material by the array of LED's, particularly for grey scale imaging, and to exposure apparatus incorporating calibration means comprising the detector and filter and control means to modulate exposure in response to the energy measurements.
- the energy output of each individual element must be measured, and a corresponding correction applied during exposure.
- the energy measured by a photosensor depends on the spectrum of the source and the spectral response of the detector and will be the integral of the product of the two.
- the effective exposure detected by the photosensitive material depends on the LED spectrum and the spectral sensitivity of the photosensitive medium. If all the LEDs in a bar have the same spectrum then there is a constant ratio between the detector measurements and the integrated energy detected by the photosensitive material.
- LED bars typically show wavelength variations of a few nm, which means that photodetector measurements are no longer representative of the exposure seen by the film.
- the arrangement of the invention is to make energy measurements through a coloured filter so that the spectral response of the detector/filter combination matches that of the photosensitive material.
- the detector then detects exactly what is detected by the photosensitive material.
- Measurements of LED energy may be performed at the factory to calibrate a bar initially, but must also be done in situ to automatically re-calibrate the bar during use.
- Photodetectors with filters are preferably built into the machine itself and accordingly the machine will be calibrated only for one particular photosensitive material.
- S( ⁇ ) is the spectrum of the LED.
- FIG. 1 shows the spectra over the wavelength range 730 nm to 810 nm of three LEDs on a 400 dots per inch (dpi) Hitachi HLB440A bar commercially available from Hitachi. These spectra represent the extremes of variation across the bar; a difference in the peak wavelength of about 10 nm. There are also differences in both the width and shape, of the spectra, such that the peak wavelength is not sufficient to characterise the spectrum of an LED.
- dpi dots per inch
- FIG. 2 shows the spectral sensitivity of laser imager film commercially available from Minnesota Mining and Manufacturing Company under the Trade Mark 3M SX560, and the spectral transmission of a Wratten 11 filter.
- the response of a silicon photodiode is fairly flat compared with these two plots.
- FIG. 3 shows the ratio of these two measurements; the variation is entirely due to the filter and reveals the effects of LED spectral variations.
- the Hitachi LED bar is made up of 32 chips, each with 128 LEDs. It is notable that gross variations can be seen from chip to chip. This is to be expected since the LED spectrum depends principally on the doping levels of the material, and this is likely to be fairly consistent within a chip, but will vary from chip to chip, especially if they are selected from different batches.
- the LEDs whose spectra are shown in FIG. 1 are marked on FIG. 3.
- FIG. 4 shows microdensitometer scans of exposed film covering about 256 LEDs, for the three cases of:
- the central block visible in these plots corresponds to LEDs numbers 2432-2559 which have peak wavelengths of about 780 nm, while the LEDs at either end of the plot have peak wavelengths of about 773 nm.
- the spectra of the LEDs of the Hitachi bar were also found to have side peaks in the region of 880 nm which may contribute to film density variations.
- Other LED bars, e.g., Sanyo LPH-13216-07 do not have side peaks in their emission spectra. In order to minimise the problem caused by exposure at different wavelengths it is preferable to use LEDs which have no side peaks in their emission spectra.
- a preferred exposure system includes one or more temperature sensors at the LED bar, look-up tables and associated software to automatically apply any necessary temperature-dependent correction to the exposure time of the LEDs.
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Theoretical Computer Science (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
- Dot-Matrix Printers And Others (AREA)
- Led Devices (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Facsimile Heads (AREA)
Abstract
Description
E (detector+filter)=E(film) (5)
Claims (5)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB898923709A GB8923709D0 (en) | 1989-10-20 | 1989-10-20 | Production of images using an array of light emmiting diodes |
Publications (1)
Publication Number | Publication Date |
---|---|
US5051762A true US5051762A (en) | 1991-09-24 |
Family
ID=10664924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/596,851 Expired - Lifetime US5051762A (en) | 1989-10-20 | 1990-10-12 | Production of images using an array of light emitting diodes |
Country Status (8)
Country | Link |
---|---|
US (1) | US5051762A (en) |
EP (1) | EP0424174B1 (en) |
JP (1) | JP2938956B2 (en) |
KR (1) | KR910008473A (en) |
AU (1) | AU629415B2 (en) |
CA (1) | CA2028051A1 (en) |
DE (1) | DE69022528T2 (en) |
GB (1) | GB8923709D0 (en) |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5978105A (en) * | 1996-06-15 | 1999-11-02 | Eastman Kodak Company | Scanning of images |
US6388694B1 (en) * | 1996-12-19 | 2002-05-14 | Minolta Co., Ltd. | Method for calculating the output characteristic of an optical tip array and image forming apparatus |
US6515693B1 (en) * | 2000-06-29 | 2003-02-04 | Eastman Kodak Company | Calibration station for a printhead adapted to compensate for the wavelength sensitivity of an image recording material |
US20040196477A1 (en) * | 2001-05-25 | 2004-10-07 | Breen Edmond Joseph | Imaging means for excisions apparatus |
US20110188016A1 (en) * | 2008-09-22 | 2011-08-04 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
US8896815B2 (en) | 2011-10-31 | 2014-11-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9041911B2 (en) | 2010-02-25 | 2015-05-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9134630B2 (en) | 2010-02-09 | 2015-09-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9235140B2 (en) | 2010-02-23 | 2016-01-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9304401B2 (en) | 2011-03-29 | 2016-04-05 | Asml Netherlands B.V. | Measurement of the position of a radiation beam spot in lithography |
US9316926B2 (en) | 2010-12-08 | 2016-04-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9341960B2 (en) | 2011-12-05 | 2016-05-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9354502B2 (en) | 2012-01-12 | 2016-05-31 | Asml Netherlands B.V. | Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program |
US9488921B2 (en) | 2011-12-06 | 2016-11-08 | Asml Netherlands B.V. | Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program |
US9494869B2 (en) | 2011-12-27 | 2016-11-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9513561B2 (en) | 2011-04-21 | 2016-12-06 | Asml Netherlands B.V. | Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method |
US9568831B2 (en) | 2012-01-17 | 2017-02-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9645502B2 (en) | 2011-04-08 | 2017-05-09 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
US9690210B2 (en) | 2011-08-18 | 2017-06-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9696633B2 (en) | 2010-04-12 | 2017-07-04 | Asml Netherlands B.V. | Substrate handling apparatus and lithographic apparatus |
US9696636B2 (en) | 2011-11-29 | 2017-07-04 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and computer program |
US9715183B2 (en) | 2012-02-23 | 2017-07-25 | Asml Netherlands B.V. | Device, lithographic apparatus, method for guiding radiation and device manufacturing method |
US9823576B2 (en) | 2013-01-29 | 2017-11-21 | Asml Netherlands B.V. | Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method |
US10346729B2 (en) | 2011-11-29 | 2019-07-09 | Asml Netherlands B.V. | Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0554433A1 (en) * | 1991-08-23 | 1993-08-11 | Eastman Kodak Company | Image forming apparatus using high numerical aperture lens and optical fiber |
WO1993013499A1 (en) * | 1991-12-20 | 1993-07-08 | Siemens Nixdorf Informationssysteme Aktiengesellschaft | Electrographic printer or copier with a device to compensate for the wavelength-dependent light sensitivity of the charge image substrate |
JP2885301B2 (en) * | 1993-06-14 | 1999-04-19 | ノーリツ鋼機株式会社 | Image printer |
JP2812145B2 (en) * | 1993-06-15 | 1998-10-22 | ノーリツ鋼機株式会社 | Photo printing equipment |
US6034710A (en) * | 1994-11-16 | 2000-03-07 | Konica Corporation | Image forming method for silver halide photographic material |
EP0713328B1 (en) * | 1994-11-16 | 1999-09-15 | Konica Corporation | Image forming for silver halide photographic material, providing non-uniformity correction between exposure elements |
JP2000000996A (en) | 1998-06-16 | 2000-01-07 | Noritsu Koki Co Ltd | Method and device for position detecting |
KR100399328B1 (en) * | 2000-12-14 | 2003-09-26 | 엘지전자 주식회사 | Steam exhausting apparatus of Dishwasher |
JP2002325714A (en) * | 2001-03-01 | 2002-11-12 | Sanyo Electric Co Ltd | Dishwasher |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3827062A (en) * | 1972-12-18 | 1974-07-30 | Xerox Corp | Optical arrangement for high speed printout system |
US4096486A (en) * | 1976-07-15 | 1978-06-20 | Agfa-Gevaert Ag | Recorder |
US4435064A (en) * | 1980-06-28 | 1984-03-06 | Ricoh Co., Ltd. | Optical exposure unit for electrophotographic printing device |
US4589745A (en) * | 1985-01-25 | 1986-05-20 | Polaroid Corporation | Geometric LED layout for line exposure |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58161572A (en) * | 1982-03-19 | 1983-09-26 | Fuji Xerox Co Ltd | Heat-sensitive recorder |
GB2212691B (en) * | 1987-11-20 | 1992-04-15 | Mitsubishi Electric Corp | Halftone printing system |
JPH02204062A (en) * | 1989-02-03 | 1990-08-14 | Hitachi Koki Co Ltd | Optical printer |
-
1989
- 1989-10-20 GB GB898923709A patent/GB8923709D0/en active Pending
-
1990
- 1990-10-12 US US07/596,851 patent/US5051762A/en not_active Expired - Lifetime
- 1990-10-18 AU AU64722/90A patent/AU629415B2/en not_active Ceased
- 1990-10-19 KR KR1019900016694A patent/KR910008473A/en not_active Application Discontinuation
- 1990-10-19 JP JP28174590A patent/JP2938956B2/en not_active Expired - Fee Related
- 1990-10-19 CA CA002028051A patent/CA2028051A1/en not_active Abandoned
- 1990-10-19 EP EP90311514A patent/EP0424174B1/en not_active Expired - Lifetime
- 1990-10-19 DE DE69022528T patent/DE69022528T2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3827062A (en) * | 1972-12-18 | 1974-07-30 | Xerox Corp | Optical arrangement for high speed printout system |
US4096486A (en) * | 1976-07-15 | 1978-06-20 | Agfa-Gevaert Ag | Recorder |
US4435064A (en) * | 1980-06-28 | 1984-03-06 | Ricoh Co., Ltd. | Optical exposure unit for electrophotographic printing device |
US4589745A (en) * | 1985-01-25 | 1986-05-20 | Polaroid Corporation | Geometric LED layout for line exposure |
Cited By (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5978105A (en) * | 1996-06-15 | 1999-11-02 | Eastman Kodak Company | Scanning of images |
US6388694B1 (en) * | 1996-12-19 | 2002-05-14 | Minolta Co., Ltd. | Method for calculating the output characteristic of an optical tip array and image forming apparatus |
US6515693B1 (en) * | 2000-06-29 | 2003-02-04 | Eastman Kodak Company | Calibration station for a printhead adapted to compensate for the wavelength sensitivity of an image recording material |
US20040196477A1 (en) * | 2001-05-25 | 2004-10-07 | Breen Edmond Joseph | Imaging means for excisions apparatus |
US20110188016A1 (en) * | 2008-09-22 | 2011-08-04 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
US8531648B2 (en) | 2008-09-22 | 2013-09-10 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
US9335638B2 (en) | 2008-09-22 | 2016-05-10 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
US9372412B2 (en) | 2010-02-09 | 2016-06-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9134630B2 (en) | 2010-02-09 | 2015-09-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9235140B2 (en) | 2010-02-23 | 2016-01-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9041911B2 (en) | 2010-02-25 | 2015-05-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9696633B2 (en) | 2010-04-12 | 2017-07-04 | Asml Netherlands B.V. | Substrate handling apparatus and lithographic apparatus |
US9316926B2 (en) | 2010-12-08 | 2016-04-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9304401B2 (en) | 2011-03-29 | 2016-04-05 | Asml Netherlands B.V. | Measurement of the position of a radiation beam spot in lithography |
US9645502B2 (en) | 2011-04-08 | 2017-05-09 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
US9513561B2 (en) | 2011-04-21 | 2016-12-06 | Asml Netherlands B.V. | Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method |
US9690210B2 (en) | 2011-08-18 | 2017-06-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8896815B2 (en) | 2011-10-31 | 2014-11-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9696636B2 (en) | 2011-11-29 | 2017-07-04 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and computer program |
US10346729B2 (en) | 2011-11-29 | 2019-07-09 | Asml Netherlands B.V. | Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method |
US9341960B2 (en) | 2011-12-05 | 2016-05-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9488921B2 (en) | 2011-12-06 | 2016-11-08 | Asml Netherlands B.V. | Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program |
US9494869B2 (en) | 2011-12-27 | 2016-11-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9354502B2 (en) | 2012-01-12 | 2016-05-31 | Asml Netherlands B.V. | Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program |
US9568831B2 (en) | 2012-01-17 | 2017-02-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9715183B2 (en) | 2012-02-23 | 2017-07-25 | Asml Netherlands B.V. | Device, lithographic apparatus, method for guiding radiation and device manufacturing method |
US9823576B2 (en) | 2013-01-29 | 2017-11-21 | Asml Netherlands B.V. | Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
DE69022528T2 (en) | 1996-02-22 |
JPH03254959A (en) | 1991-11-13 |
EP0424174A3 (en) | 1992-05-27 |
EP0424174A2 (en) | 1991-04-24 |
GB8923709D0 (en) | 1989-12-06 |
AU629415B2 (en) | 1992-10-01 |
AU6472290A (en) | 1991-04-26 |
EP0424174B1 (en) | 1995-09-20 |
CA2028051A1 (en) | 1991-04-21 |
JP2938956B2 (en) | 1999-08-25 |
DE69022528D1 (en) | 1995-10-26 |
KR910008473A (en) | 1991-05-31 |
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Owner name: CREDIT SUISSE, CAYMAN ISLANDS BRANCH, AS ADMINISTR Free format text: FIRST LIEN OF INTELLECTUAL PROPERTY SECURITY AGREEMENT;ASSIGNOR:CARESTREAM HEALTH, INC.;REEL/FRAME:019649/0454 Effective date: 20070430 Owner name: CREDIT SUISSE, CAYMAN ISLANDS BRANCH, AS ADMINISTR Free format text: SECOND LIEN INTELLECTUAL PROPERTY SECURITY AGREEME;ASSIGNOR:CARESTREAM HEALTH, INC.;REEL/FRAME:019773/0319 Effective date: 20070430 |
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Owner name: CARESTREAM HEALTH, INC., NEW YORK Free format text: RELEASE OF SECURITY INTEREST IN INTELLECTUAL PROPERTY (FIRST LIEN);ASSIGNOR:CREDIT SUISSE AG, CAYMAN ISLANDS BRANCH;REEL/FRAME:026069/0012 Effective date: 20110225 |