US5219774A - Deposited tunneling oxide - Google Patents
Deposited tunneling oxide Download PDFInfo
- Publication number
- US5219774A US5219774A US07/545,122 US54512290A US5219774A US 5219774 A US5219774 A US 5219774A US 54512290 A US54512290 A US 54512290A US 5219774 A US5219774 A US 5219774A
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- United States
- Prior art keywords
- layer
- silicon dioxide
- tunneling
- oxide
- polysilicon
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 230000005641 tunneling Effects 0.000 title claims abstract description 61
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 74
- 238000000034 method Methods 0.000 claims abstract description 57
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 37
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 35
- 229920005591 polysilicon Polymers 0.000 claims abstract description 35
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 31
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims abstract description 25
- 238000000151 deposition Methods 0.000 claims abstract description 16
- 239000011261 inert gas Substances 0.000 claims abstract description 10
- 238000000137 annealing Methods 0.000 claims description 16
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 230000001737 promoting effect Effects 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 3
- 238000000354 decomposition reaction Methods 0.000 abstract description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 230000007547 defect Effects 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 229910052681 coesite Inorganic materials 0.000 description 6
- 229910052906 cristobalite Inorganic materials 0.000 description 6
- 229910052682 stishovite Inorganic materials 0.000 description 6
- 229910052905 tridymite Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000015556 catabolic process Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000035882 stress Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66825—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a floating gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/401—Multistep manufacturing processes
- H01L29/4011—Multistep manufacturing processes for data storage electrodes
- H01L29/40114—Multistep manufacturing processes for data storage electrodes the electrodes comprising a conductor-insulator-conductor-insulator-semiconductor structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/118—Oxide films
Definitions
- This invention relates to the field of integrated circuit processing and more specifically to a method of depositing tunneling oxide in an electrically eraseable read-only memory device.
- EEPROM devices are nonvolatile memory devices in which the presence or absence of charge on a floating gate electrode indicates a binary one or zero.
- One EEPROM device is described in U.S. Pat. No. 4,599,606, entitled “Nonvolatile Electrically Alterable Memory”. This patent is herein incorporated by reference.
- the floating gate electrode is electrically insulated from the other electrodes of the device by one or more layers of tunneling oxide. Electrical charge is transferred to the floating gate by placing a voltage on a programming electrode which is sufficient to cause electrons to tunnel through the tunneling oxide to the floating gate electrode.
- the tunneling oxide can conduct only a limited amount of charge under the high fields imposed across the oxide during tunneling before the tunneling oxide fails or breaks down, thus limiting the number of programming cycles. In some tunneling elements in an EEPROM array, this failure may occur in less than approximately 10,000 programming cycles, depending on the uniformity and intrinsic defect density of the tunneling oxide layer or layers.
- tunneling oxide layer The characteristics of the tunneling oxide layer are critical to the life and operation of an EEPROM device.
- tunneling oxides are produced by growing an oxide using a thermal oxidation process.
- the oxide defect density is quite high, which causes a large number of early breakdown failures. As presently understood, this is because any defects in the underlying silicon may propagate into the silicon dioxide layer as it is grown.
- the tunneling oxide develops a high level of stress. As presently understood, this phenomena causes defects resulting in early or premature failures in the oxide during tunneling, thus further limiting the life of the device.
- No technique is known for thermally growing a low-stress tunneling oxide, while providing an oxide layer with substantially zero defects.
- the present invention contemplates a method and means of depositing a tunneling oxide layer between two conductors with a low pressure, low temperature chemical vapor deposition (LPCVD) process.
- LPCVD low pressure, low temperature chemical vapor deposition
- TEOS tetraethylorthosilicate
- the present method is used in an EEPROM device and polysilicon layers are used for forming the device, the deposited oxide is formed as follows.
- a first layer of polysilicon is deposited and patterned as desired.
- a layer of silicon dioxide is then deposited by a decomposition of tetraethylorthosilicate to form a predetermined thickness of tunneling oxide on the surface of the polysilicon.
- the oxide layer formed from the deposited tetraethylorthosilicate is then thermally annealed and densified. Preferably, this is performed using a mixture of steam and an inert gas, such as argon, at a predetermined temperature. The process may be repeated where more than one tunneling layer is desired. Where necessary, prior to depositing the tetraethylorthosilicate, where enhanced emission structures are desired on the surface of the polysilicon, a layer of relatively thin oxide thermal oxide may be grown on the surface of the polysilicon.
- FIG. 1 is a cutaway view of a three layer thick-oxide EEPROM device constructed in accordance with the present invention.
- FIGS. 2A and 2B are flow diagrams detailing a process for manufacturing one of the tunneling oxide regions of the device of FIG. 1.
- FIG. 1 there is shown a cutaway view of a three layer polysilicon device which may advantageously employ the tunneling oxide layer of the present invention.
- the operation and manufacture of the device of FIG. 1 is substantially described in U.S. Pat. No. 4,599,706, the difference being the substitution of the present deposited oxide for the thermal oxide described in the above U.S. patent.
- the EEPROM device 10 of FIG. 1 is formed on a substrate 12 which comprises a "p"-type semiconductor material. Two n+ regions 20, 22 are diffused on opposing ends of the substrate. An n- region 24 is diffused in a central upper region of substrate 12. The n+ source, drain regions 20, 22 and n- diffusion 24 may be formed using a conventional well known diffusion process.
- the EEPROM device 10 further includes a polysilicon electrode 24 which is isolated from substrate 12 by oxide region 30 and polysilicon electrodes 26 and 28 which are separated from the substrate, and each other by tunneling oxide regions or elements 32 and 34. In prior EEPROM devices, the oxide used for forming these tunneling elements 32, 34 was thermally grown, which is believed to cause stress and defects in tunneling oxide elements 32, 34 because defects from the underlying silicon substrate or polysilicon region may propagate into the tunneling oxide.
- the present invention contemplates the use of a low pressure chemical vapor deposition process to form elements 32, 34.
- a thermal oxidation process once the tunneling oxides are grown, subsequent thermal processing causes thermal stress in the oxide, thus causing additional breakdown and charge trap-up problems in the device.
- the present invention contemplates the use of a low temperature process to minimize thermal oxide growth during the processing of the device, which significantly reduces stress and thereby increases the useful life of the device. This feature has also been found to enhance electron tunneling in the resulting device.
- the low pressure chemical vapor deposition process used according to the present invention for forming an oxide layer is believed to avoid the propagation of defects into the oxide from the underlying substrate or polysilicon.
- Atmospheric deposition of silicon has been attempted in the past using silicon rich SiO 2 in a chemical vapor deposition process.
- silicon rich SiO 2 in a chemical vapor deposition process.
- One such process is described in an article entitled "Silicon-Rich SiO 2 and Thermal SiO 2 Dual Dielectric for Yield Improvement and High Capacitance", IEEE Transactions on Electron Devices, Vol. ED-30, No. 8, P. 894, August 1983.
- the process described in this publication is experimental and has been found to be inadequate for use in manufacturing tunneling oxides because silicon rich SiO 2 is not a stoichiometric compound and thus contains impurities which affect the uniformity of the deposited oxide.
- the use of an atmospheric deposition also creates large variations in thickness of the resulting layer and, therefore, silicon rich SiO 2 has only been used for relatively thick layers.
- the added silicon in the above process provides a form of enhancement for electron tunneling through the dielectric formed by this process, it's not as efficient as the formation of a textured surface on the underlying silicon substrate or polysilicon conductive layer.
- the silicon rich SiO 2 apparently forms regions or balls of silicon in the silicon dioxide near the surface thereof but spread out.
- they are not conductive with each other or with the surface of the dielectric and so are less efficient as enhanced emission structures as compared with the textured surface of a polysilicon layer.
- TEOS tetraethylorthosilicate
- the present invention overcomes the above problem by modifying the known deposited oxide process using a densification or annealing step on the TEOS deposited oxide during processing. It has been found that by exposing the TEOS deposited oxide to a steam and inert gas mixture at a relatively high temperature, the properties of the TEOS oxide are modified to equal or exceed those of thermally grown oxides. The resulting material has substantially improved dielectric properties and the resulting material is substantially free of leakage and does not break down in the presence of a strong electric field. It is believed that this annealing process provides more uniform molecular bonding by permitting greater viscous flow in the TEOS deposited oxide thus reducing or eliminating defects in the resulting dielectric layer.
- the inert gas provides a partial pressure which is used to slow this undesired oxide growth rate while allowing the annealing process to proceed.
- the process of the present invention has been found to increase the total charge conducted through the dielectric layer by at least one order of magnitude before catastrophic breakdown, while at the same time providing a dramatic improvement in processing yields.
- the process 200 begins with step 202 wherein an initial layer of gate oxide, approximately 400 Angstroms thick is deposited on a substrate.
- This oxide layer may be formed with a conventional thermal oxide process.
- the first layer of polysilicon is formed with a conventional polysilicon deposition process.
- the first layer of polysilicon is deposited approximately 4000 Angstrons thick.
- the first layer of polysilicon is doped to render the polysilicon layer conductive.
- the first layer of polysilicon may then be masked in step 210 and etched in step 212 using either a reactive ion etch or wet etch process.
- each tunneling region be somewhat irregular to promote electron tunneling.
- These surface irregularities or microtextured surfaces are formed by thermally oxidizing the surface of the polysilicon layer with step 216.
- the thermal oxide of step 216 is then etched back to leave a layer of oxide approximately 150 Angstroms thick.
- the tunneling oxide layer is then formed by steps 220 and 222.
- step 220 oxide is deposited over the relatively thin layer of thermal oxide using a low pressure chemical vapor deposition system with TEOS as the preferred gaseous medium.
- the TEOS gas is supplied via a bubbler by direct pull with the furnace temperature at approximately 600° C.
- the deposition rate is controlled primarily by the bubbler and furnace temperatures.
- the oxide is deposited to create an oxide layer of between 250 and 2000 Angstroms thick. This oxide layer is then annealed in step 222.
- the annealing process of step 222 is done by exposing the TEOS produced silicon dioxide layer to a gaseous mixture of steam and argon at a temperature range of approximately 700°-1100° C. for approximately 1-5 minutes. This is preferrably followed by further thermal annealing in a solely nitrogen ambient to prevent further oxidation of the surface. This is performed at the same approximate temperature range for between 2 and 20 minutes. Other annealing processes, such as rapid optical annealing may also be employed at different temperatures and timing as is known in the art for thick deposited oxide layers.
- the process is continued at step 224 wherein the next layer of polysilicon, approximately 400014 6000 Angstroms thick, is deposited by conventional means.
- the second layer of polysilicon is then doped in step 226.
- the second layer of polysilicon is then masked for further processing in step 230.
- decision 232 either routes the process back to step 212 or exits the process at step 234.
- the resulting structure may then be metalized and finished according to conventional means.
Abstract
Description
Claims (14)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/545,122 US5219774A (en) | 1988-05-17 | 1990-06-26 | Deposited tunneling oxide |
US08/064,203 US5977585A (en) | 1988-05-17 | 1993-05-21 | Deposited tunneling oxide |
US10/053,140 USRE38370E1 (en) | 1988-05-17 | 2001-11-02 | Deposited tunneling oxide |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US19576688A | 1988-05-17 | 1988-05-17 | |
US07/545,122 US5219774A (en) | 1988-05-17 | 1990-06-26 | Deposited tunneling oxide |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US19576688A Continuation | 1988-05-17 | 1988-05-17 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US08/064,203 Division US5977585A (en) | 1988-05-17 | 1993-05-21 | Deposited tunneling oxide |
Publications (1)
Publication Number | Publication Date |
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US5219774A true US5219774A (en) | 1993-06-15 |
Family
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Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
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US07/545,122 Expired - Lifetime US5219774A (en) | 1988-05-17 | 1990-06-26 | Deposited tunneling oxide |
US08/064,203 Expired - Lifetime US5977585A (en) | 1988-05-17 | 1993-05-21 | Deposited tunneling oxide |
US10/053,140 Expired - Lifetime USRE38370E1 (en) | 1988-05-17 | 2001-11-02 | Deposited tunneling oxide |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/064,203 Expired - Lifetime US5977585A (en) | 1988-05-17 | 1993-05-21 | Deposited tunneling oxide |
US10/053,140 Expired - Lifetime USRE38370E1 (en) | 1988-05-17 | 2001-11-02 | Deposited tunneling oxide |
Country Status (1)
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US (3) | US5219774A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5296411A (en) * | 1993-04-28 | 1994-03-22 | Advanced Micro Devices, Inc. | Method for achieving an ultra-reliable thin oxide using a nitrogen anneal |
US5316981A (en) * | 1992-10-09 | 1994-05-31 | Advanced Micro Devices, Inc. | Method for achieving a high quality thin oxide using a sacrificial oxide anneal |
US5429966A (en) * | 1993-07-22 | 1995-07-04 | National Science Council | Method of fabricating a textured tunnel oxide for EEPROM applications |
US5498577A (en) * | 1994-07-26 | 1996-03-12 | Advanced Micro Devices, Inc. | Method for fabricating thin oxides for a semiconductor technology |
US5635425A (en) * | 1995-05-25 | 1997-06-03 | Industrial Technology Research Institute | In-situ N2 plasma treatment for PE TEOS oxide deposition |
US5869370A (en) * | 1997-12-29 | 1999-02-09 | Taiwan Semiconductor Manufacturing Company Ltd. | Ultra thin tunneling oxide using buffer CVD to improve edge thinning |
WO2000019504A2 (en) * | 1998-09-25 | 2000-04-06 | Conexant Systems, Inc. | Methods for fabricating interpoly dielectrics in non-volatile stacked-gate memory structures |
US6207468B1 (en) * | 1998-10-23 | 2001-03-27 | Lucent Technologies Inc. | Non-contact method for monitoring and controlling plasma charging damage in a semiconductor device |
US6479349B1 (en) * | 1997-07-18 | 2002-11-12 | Sanyo Electric Co., Ltd. | Laser transceiver system controller |
US6664800B2 (en) | 2001-01-08 | 2003-12-16 | Agere Systems Inc. | Non-contact method for determining quality of semiconductor dielectrics |
US20070134887A1 (en) * | 2004-09-16 | 2007-06-14 | Konstantin Bourdelle | Method of manufacturing a silicon dioxide layer |
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KR100338767B1 (en) | 1999-10-12 | 2002-05-30 | 윤종용 | Trench Isolation structure and semiconductor device having the same, trench isolation method |
DE10138585A1 (en) * | 2001-08-06 | 2003-03-06 | Infineon Technologies Ag | memory cell |
JP2003224214A (en) * | 2002-01-31 | 2003-08-08 | Oki Electric Ind Co Ltd | Method for fabricating semiconductor element |
US7019391B2 (en) | 2004-04-06 | 2006-03-28 | Bao Tran | NANO IC packaging |
BRPI0906527A2 (en) * | 2008-04-04 | 2016-09-06 | 3Mm Innovative Properties Company | apparatus for applying bandages to wounds and medical bandages |
Citations (7)
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US3934060A (en) * | 1973-12-19 | 1976-01-20 | Motorola, Inc. | Method for forming a deposited silicon dioxide layer on a semiconductor wafer |
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US4763299A (en) * | 1985-10-15 | 1988-08-09 | Emanuel Hazani | E2 PROM cell and architecture |
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1990
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-
1993
- 1993-05-21 US US08/064,203 patent/US5977585A/en not_active Expired - Lifetime
-
2001
- 2001-11-02 US US10/053,140 patent/USRE38370E1/en not_active Expired - Lifetime
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Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5316981A (en) * | 1992-10-09 | 1994-05-31 | Advanced Micro Devices, Inc. | Method for achieving a high quality thin oxide using a sacrificial oxide anneal |
US5538923A (en) * | 1992-10-09 | 1996-07-23 | Advanced Micro Devices, Inc. | Method for achieving a high quality thin oxide using a sacrificial oxide anneal |
US5296411A (en) * | 1993-04-28 | 1994-03-22 | Advanced Micro Devices, Inc. | Method for achieving an ultra-reliable thin oxide using a nitrogen anneal |
US5429966A (en) * | 1993-07-22 | 1995-07-04 | National Science Council | Method of fabricating a textured tunnel oxide for EEPROM applications |
US5498577A (en) * | 1994-07-26 | 1996-03-12 | Advanced Micro Devices, Inc. | Method for fabricating thin oxides for a semiconductor technology |
US5635425A (en) * | 1995-05-25 | 1997-06-03 | Industrial Technology Research Institute | In-situ N2 plasma treatment for PE TEOS oxide deposition |
US6479349B1 (en) * | 1997-07-18 | 2002-11-12 | Sanyo Electric Co., Ltd. | Laser transceiver system controller |
US5869370A (en) * | 1997-12-29 | 1999-02-09 | Taiwan Semiconductor Manufacturing Company Ltd. | Ultra thin tunneling oxide using buffer CVD to improve edge thinning |
WO2000019504A3 (en) * | 1998-09-25 | 2000-07-13 | Conexant Systems Inc | Methods for fabricating interpoly dielectrics in non-volatile stacked-gate memory structures |
US6339000B1 (en) * | 1998-09-25 | 2002-01-15 | Conexant Systems, Inc. | Method for fabricating interpoly dielectrics in non-volatile stacked-gate memory structures |
WO2000019504A2 (en) * | 1998-09-25 | 2000-04-06 | Conexant Systems, Inc. | Methods for fabricating interpoly dielectrics in non-volatile stacked-gate memory structures |
US6207468B1 (en) * | 1998-10-23 | 2001-03-27 | Lucent Technologies Inc. | Non-contact method for monitoring and controlling plasma charging damage in a semiconductor device |
US6664800B2 (en) | 2001-01-08 | 2003-12-16 | Agere Systems Inc. | Non-contact method for determining quality of semiconductor dielectrics |
US20070134887A1 (en) * | 2004-09-16 | 2007-06-14 | Konstantin Bourdelle | Method of manufacturing a silicon dioxide layer |
CN100474529C (en) * | 2004-09-16 | 2009-04-01 | S.O.I.泰克绝缘体硅技术公司 | Method for manufacturing silicon dioxide layer |
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US5977585A (en) | 1999-11-02 |
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