US5392144A - Color filter substrate with color filter pattern and protective layers containing photosensitive polyamide resins - Google Patents
Color filter substrate with color filter pattern and protective layers containing photosensitive polyamide resins Download PDFInfo
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- US5392144A US5392144A US08/237,160 US23716094A US5392144A US 5392144 A US5392144 A US 5392144A US 23716094 A US23716094 A US 23716094A US 5392144 A US5392144 A US 5392144A
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- color filter
- ito
- filter substrate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/03—Viewing layer characterised by chemical composition
- C09K2323/031—Polarizer or dye
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24893—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including particulate material
- Y10T428/24901—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including particulate material including coloring matter
Definitions
- the present invention relates to a process for producing a substrate or electrode plate structure for a liquid crystal color display device, particularly a process for producing an electrode plate structure for a liquid crystal display device having an electrode pattern of ITO (indium-tin-oxide) formed on a color filter.
- ITO indium-tin-oxide
- a dyed color filter which is obtained by coating a substrate with a dyeable layer of a hydrophilic polymer, such as gelatin, casein, glue or polyvinyl alcohol, and dyeing the layer with a colorant to form a colored layer.
- a hydrophilic polymer such as gelatin, casein, glue or polyvinyl alcohol
- Such a color filter obtained through a dyeing process encounters a difficulty when it is subjected to a heat treatment as by formation of a transport conductor film of ITO, etc., thereon, because the colorant used in the dyeing has a relatively low heat resistance on the order of 150° C.
- An object of the present invention is to solve the problems accompanying the conventional process, i.e., poor heat resistance of a color filter, low-temperature formation of an ITO film required thereby and corresponding difficulty in etching thereof.
- Another object of the present invention is to provide a substrate or electrode plate structure for a liquid crystal color display device wherein a heat-resistant color filter is patterned in a simple step and an ITO film formed at a low temperature is then post-treated to have a good etching characteristic.
- a further object of the present invention is to provide an electrode plate structure for a liquid crystal color display device wherein an ITO electrode pattern is formed on a color filter through etching without damaging the color filter.
- a color filter layer comprising a photosensitive polyamide resin containing a colorant dispersed therein
- ITO indium-tin-oxide
- an etchant comprising hydroiodic acid or a hydroiodic acid-ferric chloride aqueous solution mixture to leave an ITO electrode pattern.
- the present invention it is possible to form a well-controlled ITO electrode pattern which has been difficult to provide. Further, it is possible to prevent a color filter pattern of a colored photosensitive polyamide resin formed below an ITO film from being damaged during etching, thus providing a reliable electrode plate structure for a liquid crystal color display device at a high yield.
- FIGS. 1A through 1M are schematic sectional views for illustrating individual steps involved in a preferred embodiment of the process for producing an electrode plate structure for a liquid crystal color display device according to the present invention.
- a substrate of, e.g., glass or plastic is coated with a photosensitive polyamide resin containing a colorant of a prescribed color, preferably an organic pigment.
- the photosensitive polyamide resin used herein is a polyamide resin having an unsaturated photosensitive group.
- Preferred examples of the photosensitive polyamide resin may include polyamides having any one of the following aromatic units including an unsaturated photosensitive group in addition to amide linkages:
- a solution of such a photosensitive polyamide resin in a solvent such as N-methylpyrrolidone containing further a prescribed colorant and a photopolymerization initiator as desired is applied onto a substrate 1, e.g., by spinner coating and dried to form a colored photosensitive polyamide layer 2 (FIG. 1A), which is then subjected to ordinary photolithographic steps including exposure with ultraviolet rays through a photomask 3 to form a photocured part 2a (FIGS. 1B and 1C) and developing with a solvent for removing the unexposed part to leave a color pattern 4 (FIG. 1D).
- a solvent such as N-methylpyrrolidone containing further a prescribed colorant and a photopolymerization initiator as desired
- the thus formed color filter layer is further coated with a protective layer 7 in a thickness of, e.g., 1-3 microns (FIG. 1F).
- the protective layer may also suitably formed by application of a photosensitive polyamide similar to the one used for constituting the color filter but substantially free from a colorant, followed by exposure with ultraviolet rays and preferably post-curing under heating around 200° C.
- an ITO (indium-tin-oxide) film 8 is formed on the protective layer 7 (FIG. 1G).
- the ITO film may preferably be formed in a thickness of 400-2000 ⁇ by vapor deposition, such as sputtering.
- the sputtering may be performed at an elevated temperature of 270° C. or lower, preferably 250° C. or lower and preferably at least 100° C.
- the sputtering at such an elevated temperature on the color filter layer is possible because the color filters 4-6 are formed by a colored photosensitive polyamide having an excellent heat resistance.
- the ITO film thus formed by sputtering at a relatively low temperature of at most 270° C. is present in an almost amorphous state and cannot have a sufficient crystallinity suitable for etching. Accordingly, if the ITO film is subjected to etching with an ordinary etchant, the time required for etching is fluctuated and the product quality can be remarkably lowered while requiring a quite long etching time if a complete degree of etching is desired.
- the ITO film after the deposition is subjected to post annealing.
- Preferable conditions for the annealing may for example include: gradual heating at a rate of, e.g., 100°-200° C./hour; holding at a temperature of 200°-300° C., preferably around 250° C.; and gradual cooling at a rate of, e.g., at most 100° C./hour, preferably at most 50° C./hour.
- the ITO film thus treated is subjected to patterning by ordinary lithographic steps, including formation of a photoresist 9 (FIG. 1H), pattern exposure through a photomask 10 (FIG. 1H), development of the exposed resist (FIG. 1J), etching (FIGS. 1K and 1L) and peeling of the resist to form an electrode plate structure for a liquid crystal color display device including an ITO electrode pattern corresponding to the respective color filter patterns (FIG. 1M).
- a photoresist 9 FIG. 1H
- pattern exposure through a photomask 10 FIG. 1H
- development of the exposed resist FIG. 1J
- etching FIGGS. 1K and 1L
- peeling of the resist to form an electrode plate structure for a liquid crystal color display device including an ITO electrode pattern corresponding to the respective color filter patterns (FIG. 1M).
- the ITO film is etched by using an etchant comprising hydroiodic acid or a mixture thereof with ferric chloride aqueous solution.
- an etchant for ITO i.e., hydrochloric acid-ferric chloride mixture or hydrochloric acid-nitric acid mixture
- the hydroiodic acid or hydroiodic acid-ferric chloride mixture can easily control the ITO electrode pattern and prevent any deterioration of the color filter layer comprising the colored photosensitive polyamide resin below the ITO film, thus allowing the production of an ITO electrode pattern having a good shape accuracy at a high yield.
- the hydrogen iodide may preferably be contained at a concentration of 55-58 wt. %.
- the hydroiodic acid-ferric chloride aqueous solution mixture etchant may preferably be formed by mixing a hydroiodic acid solution (55-58 wt. %) and a ferric chloride aqueous solution at a ratio of 2:1 to 3:1.
- a metal electrode may be disposed along a side of each ITO electrode pattern for providing an improved conductivity, and the entire surface may be further coated with an optional organic or inorganic insulating film and an organic or inorganic alignment control film, which may be imparted with a uniaxial orientation axis as by rubbing or oblique vapor deposition.
- the thus-treated electrode plate structure may be fixed to a similar electrode plate structure but with no color filter layer with an appropriate spacer therebetween and the periphery thereof is sealed with an epoxy adhesive, etc. to form a cell structure, into which a liquid crystal is injected through an injection port. Then, the injection port is sealed to form a liquid crystal cell (color display device).
- the electrode plate structure according to the present invention may be used for any type of liquid crystals inclusive of a conventional TN-liquid crystal, basically, but most suitably be used for a ferroelectric liquid crystal.
- An electrode plate structure was prepared through the steps as described with reference to FIGS. 1A-1M.
- a glass substrate 1 was provided with color filter patterns of R(4), G(5) and B(6) each in a thickness of about 1.5 micron (FIG. 1E) through repetition of ordinary lithographic steps including application of a colored photosensitive polyamide resin ("PA-1012R”, “PA-1012G” and “PA-1012B", available from Ube Kosan K.K.) dissolved in N-methyl-2-pyrrolidone at a viscosity of 90 to 130 cP by spinner coating (FIG. 1A), pattern exposure to ultraviolet rays from an ultra high-voltage mercury lamp to form a photocured part 2a (FIG. 1B and 1C), and development with a cyclohexane-based developer solution (FIG. 1D).
- a colored photosensitive polyamide resin ("PA-1012R”, “PA-1012G” and “PA-1012B”, available from Ube Kosan K.K.) dissolved in N-methyl-2-pyrrolidone at a viscosity of 90 to 130 cP by spinner
- the color filter layer including the color filter patterns 4-6 was further coated with a solution of a photosensitive polyamide resin ("PA-1000C", available from Ube Kosan K.K.), followed by drying, ultraviolet exposure and post-curing at 200° C. to form an about 2 micron-thick protective layer 7.
- PA-1000C photosensitive polyamide resin
- the above-treated substrate having a color filter pattern thereon was subjected to sputtering of ITO at a substrate temperature of 250° C. at a deposition pressure of 3 ⁇ 10 -3 Torr under Ar stream of 200 sccm and O 2 stream of 2 sccm to form an about 1000 ⁇ -thick ITO film 8. Then, the substrate having the ITO film 8 was placed in a clean oven, heated to 250° C. in 2 hours, held at that temperature for 1 hour and cooled gradually in 4 hours (FIG. 1G).
- the ITO film on the substrate was coated with a 1 micron-thick photoresist film 9 (FIG. 1H), which has then exposed through a prescribed electrode pattern mask (FIG. 1I) and developed with a prescribed developer (FIG. 1J). Then, the substrate having the thus-developed photoresist pattern 9 was dipped in a hydroiodic acid solution with a concentration of about 56 wt. % at 40° C. for 2 minutes under a light-shielding condition (FIG. 1K), and then the photoresist pattern 9 was peeled off to form an ITO electrode pattern (FIG. 1L and 1M).
- the thus formed ITO electrode pattern 9 (FIG. 1M) was free from thinning or irregularity of the pattern due to the etching to retain an accurate shape, and occurrence of short circuit between adjacent electrodes were extremely rare.
- the color filter pattern comprising the cured photosensitive polyamide was not damaged at all.
- An electrode plate structure was prepared in the same manner as in Example 1 except that the etching of the ITO film was performed for 2.5 minutes by using a 70/30-volume mixture of about 56 wt. %-hydroiodic acid solution/35 wt. %-ferric chloride at 40° C. as the etchant.
- the thus prepared electrode plate structure has an ITO electrode pattern which was free from thinning or irregularity of the pattern due to the etching to retain an accurate shape, and occurrence of short-circuit between adjacent electrodes were extremely rare.
- An electrode plate structure was prepared in the same manner as in Example 1 except that the etching of the ITO film was performed for 4 minutes by using a mixture of 60 vol. % of hydrochloric acid and 40 vol. % of ferric chloride aqueous solution (Fe 2 Cl 3 35 wt. %) at 47° C.
- the thus-prepared electrode plate structure had an ITO electrode pattern which was accompanied with remarkable thinning of the pattern due to side etching, thus failing to provide a prescribed electrode width.
- the color filter pattern comprising the cured photosensitive polyamide was accompanied with partial peeling or lifting along with a damage of the protective film, so that the resultant electrode plate structure was practically unacceptable at all.
Abstract
An electrode plate structure for a liquid crystal color display is produced by forming a color filter layer of a photosensitive polyamide resin containing a colorant dispersed therein; disposing a protective layer of a photosensitive polyamide resin on the color filter layer; forming an ITO (indium-tin-oxide) film on the protective layer, preferably at an elevated temperature of at most 270° C.; post-annealing the ITO film at a temperature of 200°-300° C. for improving the crystallinity of the ITO film suitable for etching; and selectively etching the ITO film patternwise with an etchant of hydroiodic acid or a hydroiodic acid-ferric chloride aqueous solution mixture to leave an ITO electrode pattern.
Description
This application is a division of application Ser. No. 08/148,335, filed Nov. 3, 1992, now U.S. Pat. No. 5,278,683, which is a division of application Ser. No. 07/728,707, filed Jul. 11, 1991, now U.S. Pat. No. 5,185,059, issued Feb. 9, 1993.
The present invention relates to a process for producing a substrate or electrode plate structure for a liquid crystal color display device, particularly a process for producing an electrode plate structure for a liquid crystal display device having an electrode pattern of ITO (indium-tin-oxide) formed on a color filter.
As a conventional type of color filter, there has been known a dyed color filter which is obtained by coating a substrate with a dyeable layer of a hydrophilic polymer, such as gelatin, casein, glue or polyvinyl alcohol, and dyeing the layer with a colorant to form a colored layer.
Such a color filter obtained through a dyeing process encounters a difficulty when it is subjected to a heat treatment as by formation of a transport conductor film of ITO, etc., thereon, because the colorant used in the dyeing has a relatively low heat resistance on the order of 150° C.
In the case of forming a layer of ITO, etc., on a color filter, it has been a usual practice to form such a layer at a low temperature in consideration of the insufficient heat resistance of the color filter. If the formation of an ITO film is effected at a low temperature, however, the crystalline structure of the ITO is not specified, thus requiring a long time for etching thereof when an ordinary etching liquid for ITO, such as a hydrochloric acid-ferric chloride mixture, or a hydrochloric acid-nitric acid mixture. As a result, it is extremely difficult to control the shape of an ITO electrode pattern and also the color filter layer formed below the ITO can be damaged due to such a long time of etching. These difficulties have provided a serious obstacle to practical utilization a dyed color filter for a liquid crystal device.
An object of the present invention is to solve the problems accompanying the conventional process, i.e., poor heat resistance of a color filter, low-temperature formation of an ITO film required thereby and corresponding difficulty in etching thereof.
Another object of the present invention is to provide a substrate or electrode plate structure for a liquid crystal color display device wherein a heat-resistant color filter is patterned in a simple step and an ITO film formed at a low temperature is then post-treated to have a good etching characteristic.
A further object of the present invention is to provide an electrode plate structure for a liquid crystal color display device wherein an ITO electrode pattern is formed on a color filter through etching without damaging the color filter.
According to the present invention, there is provided a process for producing an electrode plate structure for a liquid crystal color display, comprising the steps of:
forming on a substrate a color filter layer comprising a photosensitive polyamide resin containing a colorant dispersed therein,
coating the color filter layer with a protective layer comprising a photosensitive polyamide resin,
coating the protective layer with an ITO (indium-tin-oxide) film,
heat-treating the ITO film, and
selectively etching the ITO film patternwise with an etchant comprising hydroiodic acid or a hydroiodic acid-ferric chloride aqueous solution mixture to leave an ITO electrode pattern.
According to the present invention, it is possible to form a well-controlled ITO electrode pattern which has been difficult to provide. Further, it is possible to prevent a color filter pattern of a colored photosensitive polyamide resin formed below an ITO film from being damaged during etching, thus providing a reliable electrode plate structure for a liquid crystal color display device at a high yield.
These and other objects, features and advantages of the present invention will become more apparent upon a consideration of the following description of the preferred embodiments of the present invention taken in conjunction with the accompanying drawings.
FIGS. 1A through 1M are schematic sectional views for illustrating individual steps involved in a preferred embodiment of the process for producing an electrode plate structure for a liquid crystal color display device according to the present invention.
In the process for producing an electrode plate structure according to the present invention, first of all, a substrate of, e.g., glass or plastic, is coated with a photosensitive polyamide resin containing a colorant of a prescribed color, preferably an organic pigment.
The photosensitive polyamide resin used herein is a polyamide resin having an unsaturated photosensitive group. Preferred examples of the photosensitive polyamide resin may include polyamides having any one of the following aromatic units including an unsaturated photosensitive group in addition to amide linkages:
(1) Benzoate units as represented by ##STR1## wherein R1 : CHX═CY--COO--Z--
X: --H, --C6 H5
Y: --H, --CH3
Z: --C2 H5
(2) Benzoate acrylate units as represented by ##STR2## wherein Y: --H, --CH3
(3) Diphenyl ether units as represented by ##STR3## wherein R2 : CHX═CY--CONH--, CH2 ═CY--COO--(CH2)2 --OCO--, CH2 ═CY--COO--CH2 --
X: --H, --C6 H5
Y: --H, --CH3
Referring to FIGS. 1A to 1M for illustrating an embodiment, a solution of such a photosensitive polyamide resin in a solvent such as N-methylpyrrolidone containing further a prescribed colorant and a photopolymerization initiator as desired is applied onto a substrate 1, e.g., by spinner coating and dried to form a colored photosensitive polyamide layer 2 (FIG. 1A), which is then subjected to ordinary photolithographic steps including exposure with ultraviolet rays through a photomask 3 to form a photocured part 2a (FIGS. 1B and 1C) and developing with a solvent for removing the unexposed part to leave a color pattern 4 (FIG. 1D).
The above steps are repeated for a required number of colors, typically R (4), G (5) and B (6) to form a color filter layer in a thickness of, e.g., 1-3 microns (FIG. 1E).
Then, the thus formed color filter layer is further coated with a protective layer 7 in a thickness of, e.g., 1-3 microns (FIG. 1F). The protective layer may also suitably formed by application of a photosensitive polyamide similar to the one used for constituting the color filter but substantially free from a colorant, followed by exposure with ultraviolet rays and preferably post-curing under heating around 200° C.
Then, an ITO (indium-tin-oxide) film 8 is formed on the protective layer 7 (FIG. 1G). The ITO film may preferably be formed in a thickness of 400-2000 Å by vapor deposition, such as sputtering. The sputtering may be performed at an elevated temperature of 270° C. or lower, preferably 250° C. or lower and preferably at least 100° C. The sputtering at such an elevated temperature on the color filter layer is possible because the color filters 4-6 are formed by a colored photosensitive polyamide having an excellent heat resistance.
The ITO film thus formed by sputtering at a relatively low temperature of at most 270° C. is present in an almost amorphous state and cannot have a sufficient crystallinity suitable for etching. Accordingly, if the ITO film is subjected to etching with an ordinary etchant, the time required for etching is fluctuated and the product quality can be remarkably lowered while requiring a quite long etching time if a complete degree of etching is desired.
In the present invention, however, the ITO film after the deposition is subjected to post annealing. Preferable conditions for the annealing may for example include: gradual heating at a rate of, e.g., 100°-200° C./hour; holding at a temperature of 200°-300° C., preferably around 250° C.; and gradual cooling at a rate of, e.g., at most 100° C./hour, preferably at most 50° C./hour. By this annealing treatment, the crystallinity of the ITO film is improved to provide a good etching characteristic.
Then, the ITO film thus treated is subjected to patterning by ordinary lithographic steps, including formation of a photoresist 9 (FIG. 1H), pattern exposure through a photomask 10 (FIG. 1H), development of the exposed resist (FIG. 1J), etching (FIGS. 1K and 1L) and peeling of the resist to form an electrode plate structure for a liquid crystal color display device including an ITO electrode pattern corresponding to the respective color filter patterns (FIG. 1M).
In the etching step (FIG. 1K) according to the present invention, however, the ITO film is etched by using an etchant comprising hydroiodic acid or a mixture thereof with ferric chloride aqueous solution. Compared with an ordinary etchant for ITO, i.e., hydrochloric acid-ferric chloride mixture or hydrochloric acid-nitric acid mixture, the hydroiodic acid or hydroiodic acid-ferric chloride mixture can easily control the ITO electrode pattern and prevent any deterioration of the color filter layer comprising the colored photosensitive polyamide resin below the ITO film, thus allowing the production of an ITO electrode pattern having a good shape accuracy at a high yield.
In the hydroiodic acid etchant, the hydrogen iodide may preferably be contained at a concentration of 55-58 wt. %. Further, the hydroiodic acid-ferric chloride aqueous solution mixture etchant may preferably be formed by mixing a hydroiodic acid solution (55-58 wt. %) and a ferric chloride aqueous solution at a ratio of 2:1 to 3:1.
On the thus-prepared electrode plate structure according to the present invention as shown in FIG. 1M, a metal electrode may be disposed along a side of each ITO electrode pattern for providing an improved conductivity, and the entire surface may be further coated with an optional organic or inorganic insulating film and an organic or inorganic alignment control film, which may be imparted with a uniaxial orientation axis as by rubbing or oblique vapor deposition.
The thus-treated electrode plate structure may be fixed to a similar electrode plate structure but with no color filter layer with an appropriate spacer therebetween and the periphery thereof is sealed with an epoxy adhesive, etc. to form a cell structure, into which a liquid crystal is injected through an injection port. Then, the injection port is sealed to form a liquid crystal cell (color display device). The electrode plate structure according to the present invention may be used for any type of liquid crystals inclusive of a conventional TN-liquid crystal, basically, but most suitably be used for a ferroelectric liquid crystal.
Hereinbelow, the present invention will be more specifically described based on Examples.
An electrode plate structure was prepared through the steps as described with reference to FIGS. 1A-1M.
Referring to the figures, a glass substrate 1 was provided with color filter patterns of R(4), G(5) and B(6) each in a thickness of about 1.5 micron (FIG. 1E) through repetition of ordinary lithographic steps including application of a colored photosensitive polyamide resin ("PA-1012R", "PA-1012G" and "PA-1012B", available from Ube Kosan K.K.) dissolved in N-methyl-2-pyrrolidone at a viscosity of 90 to 130 cP by spinner coating (FIG. 1A), pattern exposure to ultraviolet rays from an ultra high-voltage mercury lamp to form a photocured part 2a (FIG. 1B and 1C), and development with a cyclohexane-based developer solution (FIG. 1D). Then, the color filter layer including the color filter patterns 4-6 was further coated with a solution of a photosensitive polyamide resin ("PA-1000C", available from Ube Kosan K.K.), followed by drying, ultraviolet exposure and post-curing at 200° C. to form an about 2 micron-thick protective layer 7.
Then, the above-treated substrate having a color filter pattern thereon was subjected to sputtering of ITO at a substrate temperature of 250° C. at a deposition pressure of 3×10-3 Torr under Ar stream of 200 sccm and O2 stream of 2 sccm to form an about 1000 Å-thick ITO film 8. Then, the substrate having the ITO film 8 was placed in a clean oven, heated to 250° C. in 2 hours, held at that temperature for 1 hour and cooled gradually in 4 hours (FIG. 1G).
Then, the ITO film on the substrate was coated with a 1 micron-thick photoresist film 9 (FIG. 1H), which has then exposed through a prescribed electrode pattern mask (FIG. 1I) and developed with a prescribed developer (FIG. 1J). Then, the substrate having the thus-developed photoresist pattern 9 was dipped in a hydroiodic acid solution with a concentration of about 56 wt. % at 40° C. for 2 minutes under a light-shielding condition (FIG. 1K), and then the photoresist pattern 9 was peeled off to form an ITO electrode pattern (FIG. 1L and 1M).
The thus formed ITO electrode pattern 9 (FIG. 1M) was free from thinning or irregularity of the pattern due to the etching to retain an accurate shape, and occurrence of short circuit between adjacent electrodes were extremely rare.
Further, as a result of the use of hydroiodic acid as the etchant, the color filter pattern comprising the cured photosensitive polyamide was not damaged at all.
An electrode plate structure was prepared in the same manner as in Example 1 except that the etching of the ITO film was performed for 2.5 minutes by using a 70/30-volume mixture of about 56 wt. %-hydroiodic acid solution/35 wt. %-ferric chloride at 40° C. as the etchant.
The thus prepared electrode plate structure has an ITO electrode pattern which was free from thinning or irregularity of the pattern due to the etching to retain an accurate shape, and occurrence of short-circuit between adjacent electrodes were extremely rare.
Further, as a result of the use of a hydroiodic acid-ferric chloride aqueous solution mixture as the etchant, the color filter pattern comprising the cured photosensitive polyamide was not damaged at all.
An electrode plate structure was prepared in the same manner as in Example 1 except that the etching of the ITO film was performed for 4 minutes by using a mixture of 60 vol. % of hydrochloric acid and 40 vol. % of ferric chloride aqueous solution (Fe2 Cl3 35 wt. %) at 47° C.
The thus-prepared electrode plate structure had an ITO electrode pattern which was accompanied with remarkable thinning of the pattern due to side etching, thus failing to provide a prescribed electrode width.
Further, as a result of the use of the hydrochloric acid-ferric chloride aqueous solution mixture, the color filter pattern comprising the cured photosensitive polyamide was accompanied with partial peeling or lifting along with a damage of the protective film, so that the resultant electrode plate structure was practically unacceptable at all.
Claims (6)
1. A color filter substrate, comprising:
(i) a color filter pattern formed from a photosensitive polyamide resin containing a colorant dispersed therein,
(ii) a protective layer formed from a photosensitive polyamide resin, and
(iii) an indium-tin oxide film.
2. A color filter substrate according to claim 1, wherein said indium-tin oxide film has been patterned after heating and annealing treatment.
3. A color filter substrate according to one of claims 1 or 2, wherein said protective layer comprises a cured film of a photosensitive polyamide including a photosensitive unit selected from the group consisting of:
(1) benzoate units represented by ##STR4## wherein R1 is CHX═CY--COO--Z-- (wherein X is H or C6 H5, Y is H or CH3 and Z is C2 H5);
(2) benzoate acrylate units represented by ##STR5## (3) diphenyl ether units represented by ##STR6## wherein R2 is independently CHX═CY--CONH--, CH2 ═CY--COO--(CH2)2 --OCO--, or CH2 ═CY--COO--CH2 --.
4. A color filter substrate according to one of claims 1 or 2, wherein said ITO film has been patterned with a etching solution containing hydroiodic acid at a concentration of 55-58 wt. %.
5. A color filter substrate according to one of claims 1 or 2, wherein said ITO film has been patterned with an etching solution comprising an admixture of from 2-3 parts of solution containing hydroiodic acid at a concentration of 55-58 wt. % with 1 part of an aqueous solution containing ferric chloride.
6. A color filter substrate according to claim 2, wherein said heating and annealing treatment comprises:
(i) heating said indium-tin oxide film to a temperature of 200°-300° C., and
(ii) cooling said indium-tin oxide film at a rate of at most 100° C./hour.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/237,160 US5392144A (en) | 1990-07-18 | 1994-05-03 | Color filter substrate with color filter pattern and protective layers containing photosensitive polyamide resins |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2187936A JP2808480B2 (en) | 1990-07-18 | 1990-07-18 | Method for manufacturing substrate for liquid crystal color display element |
JP2-187936 | 1990-07-18 | ||
US07/728,707 US5185059A (en) | 1990-07-18 | 1991-07-11 | Process for producing electrode plate structure for liquid crystal color display device |
US07/970,784 US5278683A (en) | 1990-07-18 | 1992-11-03 | Electrode plate structure for liquid crystal color display device |
US08/148,335 US5329389A (en) | 1990-07-18 | 1993-11-08 | Liquid crystal device |
US08/237,160 US5392144A (en) | 1990-07-18 | 1994-05-03 | Color filter substrate with color filter pattern and protective layers containing photosensitive polyamide resins |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/148,335 Division US5329389A (en) | 1990-07-18 | 1993-11-08 | Liquid crystal device |
Publications (1)
Publication Number | Publication Date |
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US5392144A true US5392144A (en) | 1995-02-21 |
Family
ID=16214774
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/728,707 Expired - Fee Related US5185059A (en) | 1990-07-18 | 1991-07-11 | Process for producing electrode plate structure for liquid crystal color display device |
US07/970,784 Expired - Fee Related US5278683A (en) | 1990-07-18 | 1992-11-03 | Electrode plate structure for liquid crystal color display device |
US08/148,335 Expired - Fee Related US5329389A (en) | 1990-07-18 | 1993-11-08 | Liquid crystal device |
US08/237,160 Expired - Fee Related US5392144A (en) | 1990-07-18 | 1994-05-03 | Color filter substrate with color filter pattern and protective layers containing photosensitive polyamide resins |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/728,707 Expired - Fee Related US5185059A (en) | 1990-07-18 | 1991-07-11 | Process for producing electrode plate structure for liquid crystal color display device |
US07/970,784 Expired - Fee Related US5278683A (en) | 1990-07-18 | 1992-11-03 | Electrode plate structure for liquid crystal color display device |
US08/148,335 Expired - Fee Related US5329389A (en) | 1990-07-18 | 1993-11-08 | Liquid crystal device |
Country Status (8)
Country | Link |
---|---|
US (4) | US5185059A (en) |
EP (1) | EP0468358B1 (en) |
JP (1) | JP2808480B2 (en) |
KR (1) | KR960008978B1 (en) |
AT (1) | ATE117101T1 (en) |
DE (1) | DE69106616T2 (en) |
ES (1) | ES2067096T3 (en) |
MY (1) | MY108300A (en) |
Cited By (1)
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US20070164672A1 (en) * | 2004-06-11 | 2007-07-19 | Tetsuji Omura | Display panel manufacturing method and display panel |
Families Citing this family (26)
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JP2808480B2 (en) * | 1990-07-18 | 1998-10-08 | キヤノン株式会社 | Method for manufacturing substrate for liquid crystal color display element |
JP2814155B2 (en) * | 1990-08-13 | 1998-10-22 | キヤノン株式会社 | Method of forming ITO film pattern and method of manufacturing substrate for liquid crystal display element |
US5285300A (en) * | 1991-10-07 | 1994-02-08 | Canon Kabushiki Kaisha | Liquid crystal device |
US6391117B2 (en) | 1992-02-07 | 2002-05-21 | Canon Kabushiki Kaisha | Method of washing substrate with UV radiation and ultrasonic cleaning |
JP2727481B2 (en) * | 1992-02-07 | 1998-03-11 | キヤノン株式会社 | Cleaning method for glass substrate for liquid crystal element |
US5482803A (en) * | 1992-02-07 | 1996-01-09 | Canon Kabushiki Kaisha | Process for preparing filter |
KR950011567B1 (en) * | 1992-02-21 | 1995-10-06 | 삼성전자주식회사 | Color filter manufacturing method |
US5552911A (en) * | 1992-10-19 | 1996-09-03 | Canon Kabushiki Kaisha | Color liquid crystal display device having varying cell thickness and varying pixel areas |
JP3345089B2 (en) * | 1993-03-26 | 2002-11-18 | 株式会社半導体エネルギー研究所 | Method for manufacturing color filter substrate |
JPH06331974A (en) * | 1993-05-26 | 1994-12-02 | Canon Inc | Color liquid crystal display device |
US5526145A (en) * | 1994-06-10 | 1996-06-11 | E. I. Du Pont De Nemours And Company | Color tuned holographic optical elements and methods of making and using the elements |
DE69535985D1 (en) * | 1994-06-10 | 2009-09-10 | Du Pont | Holographic multicolor optical elements for use in liquid crystal displays and methods of making the same |
US6057900A (en) * | 1995-02-09 | 2000-05-02 | Dai Nippon Printing Co., Ltd. | Color liquid crystal display device and method for producing color filter substrate |
US5611941A (en) * | 1995-07-17 | 1997-03-18 | Rainbow Display Serivices | Method for forming a ferroelectric liquid crystal spatial light modulator utilizing a planarization process |
US5805254A (en) * | 1995-10-12 | 1998-09-08 | Canon Kabushiki Kaisha | Liquid crystal device and process for production thereof having plural insulating layers |
KR0186183B1 (en) * | 1995-12-19 | 1999-03-20 | 문정환 | Color solid state imaging device |
JPH09185045A (en) * | 1995-12-28 | 1997-07-15 | Canon Inc | Manufacture of liquid crystal device |
US5721599A (en) * | 1996-01-16 | 1998-02-24 | Industrial Technology Research Institute | Black matrix for liquid crystal display |
JPH09258247A (en) * | 1996-03-26 | 1997-10-03 | Sharp Corp | Production of liquid crystal display device and film forming device |
US6240555B1 (en) * | 1996-03-29 | 2001-05-29 | Microsoft Corporation | Interactive entertainment system for presenting supplemental interactive content together with continuous video programs |
US5943108A (en) * | 1996-07-12 | 1999-08-24 | Canon Kabushiki Kaisha | Matrix type liquid crystal display with substrate having blue filter for masking at least 75% of total planar area of auxiliary electrodes |
US5954559A (en) * | 1997-01-13 | 1999-09-21 | Image Quest Technologies, Inc. | Color filter structure and method of making |
DE19710401C1 (en) * | 1997-03-13 | 1998-11-19 | Bosch Gmbh Robert | Process for the production of liquid crystal cells |
GB2325537B8 (en) * | 1997-03-31 | 2000-01-31 | Microsoft Corp | Query-based electronic program guide |
JPH117035A (en) | 1997-04-23 | 1999-01-12 | Sharp Corp | Liquid crystal display device and its manufacture |
US20080233291A1 (en) * | 2007-03-23 | 2008-09-25 | Chandrasekaran Casey K | Method for depositing an inorganic layer to a thermal transfer layer |
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JPS63203757A (en) * | 1987-02-20 | 1988-08-23 | Nippon Telegr & Teleph Corp <Ntt> | Method for annealing tin-added indium oxide film |
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-
1991
- 1991-07-11 US US07/728,707 patent/US5185059A/en not_active Expired - Fee Related
- 1991-07-16 KR KR91012113A patent/KR960008978B1/en not_active IP Right Cessation
- 1991-07-17 DE DE69106616T patent/DE69106616T2/en not_active Expired - Fee Related
- 1991-07-17 ES ES91111970T patent/ES2067096T3/en not_active Expired - Lifetime
- 1991-07-17 EP EP91111970A patent/EP0468358B1/en not_active Expired - Lifetime
- 1991-07-17 AT AT91111970T patent/ATE117101T1/en not_active IP Right Cessation
-
1992
- 1992-06-29 MY MYPI92001087A patent/MY108300A/en unknown
- 1992-11-03 US US07/970,784 patent/US5278683A/en not_active Expired - Fee Related
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1993
- 1993-11-08 US US08/148,335 patent/US5329389A/en not_active Expired - Fee Related
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1994
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070164672A1 (en) * | 2004-06-11 | 2007-07-19 | Tetsuji Omura | Display panel manufacturing method and display panel |
US7572162B2 (en) * | 2004-06-11 | 2009-08-11 | Sanyo Electric Co., Ltd. | Display panel manufacturing method and display panel |
Also Published As
Publication number | Publication date |
---|---|
ATE117101T1 (en) | 1995-01-15 |
MY108300A (en) | 1996-09-30 |
EP0468358B1 (en) | 1995-01-11 |
JPH0475028A (en) | 1992-03-10 |
JP2808480B2 (en) | 1998-10-08 |
KR960008978B1 (en) | 1996-07-10 |
US5329389A (en) | 1994-07-12 |
ES2067096T3 (en) | 1995-03-16 |
EP0468358A3 (en) | 1992-07-08 |
EP0468358A2 (en) | 1992-01-29 |
DE69106616D1 (en) | 1995-02-23 |
US5278683A (en) | 1994-01-11 |
US5185059A (en) | 1993-02-09 |
DE69106616T2 (en) | 1995-05-18 |
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