US6537010B2 - Wafer boat support and method for twin tower wafer boat loader - Google Patents
Wafer boat support and method for twin tower wafer boat loader Download PDFInfo
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- US6537010B2 US6537010B2 US09/812,014 US81201401A US6537010B2 US 6537010 B2 US6537010 B2 US 6537010B2 US 81201401 A US81201401 A US 81201401A US 6537010 B2 US6537010 B2 US 6537010B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
- Y10S414/138—Wafers positioned vertically within cassette
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
Definitions
- the invention relates to a system for automatically and simultaneously loading a plurality of boat loads of semiconductor wafers into a semiconductor diffusion furnace.
- FIG. 1A of Pat. No. 5,765,982 shows a furnace loading station 10.
- a queue mechanism 30 having a stationary base is loaded with up to eight boatloads of semiconductor wafers 26 .
- the queue mechanism 30 shifts the right hand boatload of wafers to an index position at the right end of queue mechanism 30 such that a pair of horizontal elevator tines 38 of a vertical elevator mechanism 34 can pick up one boatload of wafers at a time in the manner of a fork lift, raise them upward in the direction of arrows 60 into alignment with one of a number of horizontal loading assemblies such as 14 and 16.
- Each loading assembly includes a carriage such as 20 or 42 which moves horizontally on a track toward a semiconductor furnace tube located in a furnace cabinet on the right hand side of furnace loading station 10 so that up to eight boatloads of wafers supported on either a horizontal cantilever paddle such as 47 or in a horizontal cantilever diffusion tube such as 21 can be inserted into the hot zone of a corresponding furnace tube.
- a horizontal robotic mechanism 37 is supported by vertical elevator 34.
- Horizontal robotic mechanism 37 supports the tines 38 which pick up one boatload of wafers and moves them horizontally in the direction of arrows 39 to position each boatload of wafers, one at a time, over the paddle 47, lower it onto the paddle 47.
- the carriage 42 supporting the paddle 47 moves in the direction of arrow 59 into the hot zone of the corresponding furnace tube.
- the entire operation is controlled by a programmed computer or control system 29 that controls the various described moving mechanisms.
- a major shortcoming of the foregoing system of Pat. No. 5,765,982 is that the process of loading and unloading each cantilever paddle 47 with up to eight boatloads of wafers one at a time, inserting them all at once into and withdrawing them all at once from the furnace tube, the unloading of the processed boatloads of wafers, one at a time, and depositing them back on the queue mechanism 30 is very time-consuming.
- a typical prior art loading station 10 includes four loading assemblies such as 16, so 24 to 32 boatloads of wafers have to be transferred one at a time from queue mechanism 30 and loaded one at a time onto the cantilever paddles 47 prior to processing them in the furnace tube. After processing they then must be unloaded from paddles 47 one at a time and returned to queue mechanism 30. This may require a total of more than 15 minutes.
- the mechanism 30 in Pat. No. 5,765,982 is undesirably complex and slow.
- the invention provides an apparatus for automatically and simultaneously loading a “long” wafer boat or a plurality of wafer boats onto a cantilever paddle, and automatically and/or simultaneously unloading the loaded wafer boats from the cantilever paddle.
- a stationary first track ( 16 - 1 , 43 ) is aligned with a first opening of a furnace, and a first carriage ( 42 - 1 ) is moveable on the first track, the first carriage ( 42 - 1 ) supporting the first cantilever paddle ( 47 - 1 ).
- the apparatus includes a first vertical translation mechanism ( 34 A), a second vertical translation mechanism ( 34 B), a first horizontal translation mechanism ( 50 A) supported by the first vertical translation mechanism ( 34 A), and a second horizontal translation mechanism ( 50 B) supported by the first vertical translation mechanism.
- the first vertical translation mechanism ( 34 A) includes a first stationary part ( 62 A, 63 A) and a first vertically moveable support ( 61 A)
- the second vertical translation mechanism ( 62 B, 63 B) includes a second stationary part ( 62 B, 63 B) and a second vertically moveable support ( 61 B).
- the first horizontal translation mechanism ( 50 A) has a first base ( 86 ) supported by the first vertically moveable support ( 61 A).
- the first horizontal translation mechanism includes a first horizontally moveable arm ( 51 A) supported by the first base ( 86 ).
- the second horizontal translation mechanism has a second base supported by the second vertically moveable support, and includes a second horizontally moveable arm ( 51 B) supported by the second base.
- a horizontal support apparatus ( 102 ) is adapted to support a plurality of wafer boats ( 24 ) each loaded with semiconductor wafers ( 26 ).
- the horizontal support apparatus ( 102 ) has a first end supported by the first horizontally moveable arm ( 51 A) and a second end supported by the second horizontally moveable arm ( 51 B).
- a stationary wafer boat edge lift member ( 97 ) has a first end rigidly supported by the first horizontally moveable arm ( 51 A) and a second end rigidly supported by the second horizontally moveable arm ( 51 B).
- a moveable wafer boat edge lift member ( 96 ) has a first end supported by and in moveable relationship to the first horizontally moveable arm ( 51 A) and a second end supported by and in moveable relationship to the second horizontally moveable arm ( 51 B).
- the moveable wafer boat edge lift member ( 96 ) includes first and second end portions supported by outer ends of first ( 97 A) and second ( 97 B) rotary arms, respectively, having inner end portions supported by first and second rotary drives supported by the first and second horizontally moveable arms, respectively.
- the first and second rotary drive mechanisms rotate the rotary arms to bring the moveable wafer boat edge lifting member ( 96 ) into a lower first position to engage an edge of a wafer boat ( 24 ) and to an upper second position above the wafers ( 26 ) in the wafer boat ( 24 ) so as to clear the wafers ( 26 ) as the first ( 50 A) and second ( 50 B) horizontal translation mechanisms are withdrawn from the wafer boat after they are set on the cantilever paddle.
- FIG. 1A is a perspective view of an automatic wafer boat loading system with a plurality of boatloads of wafers ready to be transported to and set down on one of a plurality of silicon carbide cantilever paddles.
- FIG. 1B is an enlarged perspective view of a portion of the system shown in FIG. 1 .
- FIG. 1C is a partial section view useful in describing the operation of the system in FIG. 1 A.
- FIG. 1D is a simplified front elevational view of the drive mechanisms in the two elevators in FIG. 1 A.
- FIG. 1E is a simplified side elevational view of part of a Y-drive mechanism of a horizontal translation mechanism in FIG. 1 A.
- FIG. 1F is a plan view diagram illustrating the cantilever paddle edge sensors and operation used to simultaneously and automatically align a plurality of boatloads of semiconductor wafers with the cantilever paddle.
- FIG. 1G is a block diagram of a programmed microcontroller connected to various sensors, actuators, motors, and switches involved in operation of the automatic wafer boat loading system of FIGS. 1A-F.
- FIG. 2A is a perspective view of the system of FIG. 1 showing a mechanism positioned to lift a plurality of boatloads of wafers from a silicon carbide cantilever paddle.
- FIG. 2B is an enlarged perspective view of a portion of the system as shown in FIG. 2 A.
- FIG. 2C is a partial section view useful in describing the operation of unloading a plurality of boatloads of wafers from a paddle as shown in FIG. 2 A.
- FIG. 3 is a diagram showing a plurality of boatloads of wafers supported by an intermediate carrier that is carried by the parallel Y-drive mechanisms.
- FIGS. 4A-4D constitute a succession of perspective views showing a support assembly supported by a horizontal translation mechanism during successive stages of the operation of loading a boatload of wafers onto a cantilever paddle of a wafer boat loading system.
- FIG. 5 is a partial perspective view of the load platform 87 of FIGS. 4A-D.
- automatic wafer boat loading station 10 includes four conventional loading mechanisms 16 , similar to those described in above mentioned Pat. No. 5,765,982.
- Each loading mechanism 16 includes a carriage 42 horizontally moveable on a longitudinal track 43 .
- Each loading mechanism 16 supports a horizontal cantilevered silicon carbide paddle 47 that supports up to eight “standard” wafer boats loaded with semiconductor wafers (i.e., about 150 to 300 wafers) along with additional cylindrical devices called “baffle boats”.
- Baffle boats include baffle disks that are provided to establish the desired gas flow patterns and thermal patterns in the furnace tube.
- a group of boatloads of semiconductor wafers 26 are shown on cantilever paddle 16 - 1 , ready to be carried into the hot zone of a diffusion furnace tube by the cantilever paddle 47 - 1 and carriage 42 - 1 .
- Another group of wafer boats loaded with semiconductor wafers 26 is shown loaded onto a subsequently described wafer boat transporting mechanism, and is ready to be loaded onto another one of the available cantilever paddles 47 .
- the silicon carbide cantilever paddles 47 herein do not need to have a slot such as the one designated by numeral 47A in Pat. No. 5,765,982.
- a single large wafer boat of the kind commonly referred to as a “long boat”, rather than up to eight “standard” wafer boats can be supported on a cantilever paddle 47 and carried by it into the hot zone of the furnace tube.
- a typical “standard” wafer boat carries either 25 or 50 semiconductor wafers, and a typical “long boat” carries 150 or 300 semiconductor wafers.
- Automatic wafer boat loading station 10 of FIGS 1 A- 1 F includes two vertical elevator systems, rather than only one as in the prior art.
- the two vertical elevator systems are designated by numerals 34 A and 34 B, and are also referred to as “vertical translation mechanisms” 34 A and 34 B, respectively.
- Loading station 10 also includes two horizontal translation mechanisms 50 A and 50 B, which themselves are moveable vertically in the directions of arrows 20 by vertical elevator mechanisms 34 A and 34 B, respectively.
- Horizontal translation mechanisms 50 A and 50 B are also referred to as “Y-drives” 50 A and 50 B, respectively.
- Horizontal translation mechanisms 50 A and 50 B include horizontally moveable arms 51 A and 51 B, respectively, which each are moveable horizontally in the directions of arrows 22 .
- FIG. 1D illustrates the vertical translation mechanisms included in elevators 34 A and 34 B of FIG. 1 A.
- Belt 61 A, idler pulleys 62 A and 63 A, encoder 68 , over-running coupling 66 A, and slip clutch 67 A are included in elevator 34 A.
- vertical belt 61 B, idler pulley 63 B, encoder 70 , drive pulley 62 B, motor and drive assembly 64 , over-running coupling 66 B and slip clutch 67 B are included in the vertical translation mechanism in elevator 34 B.
- Y-drive mechanism 50 A is supported on belt 61 A and is carried vertically in the directions of arrows 20 .
- Drive pulley 62 B is driven by motor and drive assembly 64 in response to control signals 29 B from microcontroller 29 of FIG. 1 G.
- Y-drive mechanism 50 B is attached to belt 61 B.
- Belt 61 B is carried vertically in the directions of arrows 20 by drive pulley 62 B and imparts an identical rotation to idler pulley 63 B.
- Idler pulley 63 B drives axle 69 , which drives idler pulley 63 A.
- Rotary encoder 70 in FIG. 1E is connected to rotary axle 69 and provides, for example, 1000 equally spaced counts per inch of vertical movement of belt 61 B, and generates corresponding signals on one of conductors 29 A applied to the input of microcontroller 29 .
- Belt 61 A is driven by idler pulley 63 A, to which horizontal translation mechanism 50 A is attached.
- Belt 61 A imparts the same rotation to idler pulley 62 A, which turns rotary encoder 68 .
- Encoder 68 provides 1,000 counts per inch of movement of belt 61 A, and provides corresponding signals on one of conductors 29 A as an input to microcontroller 29 .
- microcontroller 29 of FIG. 1G continuously monitors the vertical positions of Y-drives 50 A and 50 B and the horizontal positions of horizontally moveable arms 51 A and 51 B to ensure that the Y-drives 50 A and 50 B are at the same elevation.
- Over-running couplings 66 A and 66 B together with adjustable slip clutches 67 A and 67 B perform the function of, in effect, “counter-balancing” the weight of the loaded wafer boats, Y-drive mechanisms 50 A and 50 B, and wafer boat support apparatus, which combined may weigh from about 30 pounds to about 50 pounds. That weight is supported by only one side of each of belts 61 A and 61 B, and needs to be offset to prevent excessive vertical drift of the 30 to 50 pounds supported by one side of belts 61 A and 61 B. (Note that instead of using axle 69 to translate rotation of idler pulley 63 B to idler pulley 63 A, axle 69 could be omitted, and axle 65 B could be extended to be connected to axle 65 A. Then only one clutch and one over-running coupling would be needed.)
- over-running couplings 66 A and 66 B decouple adjustable slip-clutches 67 A and 67 B from rotary shafts 65 A and 65 B while the weight of Y-drives 50 A and 50 B and the wafer boats supported thereby are being lifted.
- over-running couplings 66 A and 66 B connect shafts 65 A and 65 B to slip-clutches 67 A and 67 B, respectively, which then act as brakes to counter lowering of the weight of Y-drives 50 A and 50 B and the wafer boats supported thereby. This avoids the need for use of massive counterbalancing weights on the opposite sides of belts 61 A and 61 B from the Y-drives 50 A and 50 B.
- Slip-clutch mechanisms 67 A and 67 B each include a stationary, non-rotational plate, and a rotary plate coupled to shaft 65 A or 65 B, by overrunning coupler 66 A or 66 B, respectively, and act as controllable friction brakes to offset the 30 to 50 pound weight on one side of belts 61 A or 61 B.
- Over-running couplings 66 A and 66 B thereby prevent the drift or back-rotation of pulleys 62 A and 62 B due to the weight of the mass connected to one side of each of belts 61 A and 61 B.
- Slip clutches are enclosed to contain any particulates generated by the friction therein.
- Horizontal translation mechanisms 50 A and 50 B include wafer boat edge engaging mechanisms 45 A and 45 B, respectively, that typically lift up to eight conventional boats loaded with semiconductor wafers 26 . Or, a single conventional long boat loaded with 150 or 300 semiconductor wafers could be engaged and lifted by wafer boat edge engaging mechanisms 45 A and 45 B.
- the wafer boat edge engaging mechanisms 45 A and 45 B also lift several baffle boats 48 at opposite ends of the group of up to eight boatloads of wafers (which are used to establish uniform process gas flow around the boatloads of wafers).
- the system including vertical elevators 34 A and 34 B and the two horizontal translation mechanisms 50 A and 50 B and associated wafer boat edge engaging mechanisms 45 A and 45 B can carry up to eight standard wafer boats (or one long boat) loaded with wafers and associated baffle boats to any of the four silicon carbide cantilever paddles 47 in a single pass.
- FIGS. 1E and 1F show partial detail of Y-drive or horizontal translation mechanism 50 A, including horizontally moveable arm 51 A.
- An optical sensor 70 A is attached to the outer end of horizontally moveable arm 51 A, and emits a beam 71 downward as indicated by the dotted line arrow 71 .
- beam 71 is reflected back to sensor 70 A, which causes it to transmit a signal to programmed microcontroller 29 .
- This in conjunction with the signals produced by the encoder 85 of horizontal translation mechanism 50 A, indicates precisely the location of horizontally moveable arm 51 A at the time it moves over the front edge 47 A of cantilever paddle 47 , as shown in FIG. 1 F.
- a similar optical sensor 70 B on the outer edge of horizontally moveable arm 51 B senses the edge of cantilever paddle 47 and transmits a signal to microcontroller 29 .
- This in conjunction with the signals produced by encoder 85 of horizontal translation mechanism 50 B, indicates precisely the location of horizontally moveable arm 51 A at the time it moves over the front edge 47 A of cantilever paddle 47 , as shown in FIG. 1 F.
- Microcontroller 29 uses the positional information from the two encoders 85 of the two horizontal translation mechanisms and the edge sensors thereof to compute any offset correction needed to adjust the relative positions of horizontally moveable arms 51 A and 51 B as necessary to make the wafer boats held thereby precisely parallel to the longitudinal axis of cantilever paddle 47 .
- Microcontroller 29 can use the information from sensors 70 A and 70 B and the positional information from encoders 85 of the two Y-drives 50 A and 50 B in various ways to accomplish accurate alignment of the wafer boats carried by horizontally moveable arms 51 A and 51 B with cantilever paddle 47 before lowering the wafer boats onto it.
- microcontroller 29 can independently advance each of the horizontally moveable arms 51 A and 51 B the known precise amount of distance from the edge of cantilever paddle 47 to the longitudinal axis thereof. Or, microcontroller 29 can stop whichever horizontally moveable arm first reaches the edge of cantilever paddle 47 , wait for the other one to catch up, and then advance them together into alignment with the horizontal axis of cantilever paddle 47 .
- Microcontroller 29 thus adjusts the relative positions of horizontally moveable arms 51 A and 51 B as they independently advance further over cantilever paddle 47 to the precise location along the Y direction at which up to eight wafer boats are to be loaded onto or unloaded from cantilever paddle 47 . At that location the longitudinal axis of the cantilever paddle 47 is precisely aligned with the longitudinal axes of the up to eight wafer boats 24 .
- horizontally moveable arm 51 A is supported on a suitable precision track by an intermediate horizontally moveable arm 72 that moves in the directions of arrows 79 .
- Intermediate horizontally moveable arm 72 is supported on a suitable precision track on a base 86 that is attached to and carried vertically upward or downward by belt 61 A.
- Base 86 includes a drive motor 84 which drives a right angle transmission 83 .
- Transmission 83 drives a pinion gear 82 which engages a rack gear 81 on horizontally moveable intermediate arm 72 . Therefore, as motor 84 operates, it causes intermediate horizontally moveable arm 72 to move in one of the directions indicated by arrow 79 .
- a second rack gear 78 is attached to the upper surface of base 86 .
- a pinion gear 79 is rotatably supported on horizontally moveable intermediate arm 72 , causing it to rotate as intermediate horizontally moveable arm 72 moves in the direction of one of arrows 79 as a result of operation of motor 84 .
- a pulley 76 is mounted axially with and attached to pinion gear 77 .
- Pulley 76 carries a belt 74 which is also supported by an idler pulley 75 at the opposite end of horizontally moveable intermediate arm 72 .
- a coupler 73 connects a point on belt 74 , which moves in one of the directions of arrows 80 , to horizontally moveable arm 51 A, causing it to move in one of the directions of arrows 22 in response to operation of motor 84 .
- Rotary encoder 85 provides 10,000 equally spaced counts per inch of movement of horizontally moveable arm 51 A in the direction of arrows 22 , and sends signals indicative of the position of horizontally moveable arm 51 A to microcontroller 29 , which then generates control signals to control motor 84 via one of conductors 29 B.
- Y-drive mechanism 50 B The structure and operation of Y-drive mechanism 50 B are essentially identical to those of Y-drive mechanism 50 A.
- rods 52 A and 52 B rotate to cause wafer boat edge engaging members 45 A and 45 B to pivot so as to engage edge support rails 24 B and 24 C of opposite edges of each wafer boat 24 , as indicated by arrows 55 and 56 in FIGS. 1B and 1C.
- the wafer boat support rails 24 B and 24 C of each wafer boat 24 can be placed directly on V-shaped intersections formed by boat edge-support arms 53 C, 53 D of edge engaging member 53 and V-shaped intersections formed by boat edge support arms 54 C, 54 D.
- the outer ends of boat edge-support arms 53 D are stabilized by member 53 B, and the outer edges of boat edge support arms 54 D are stabilized by member 54 B.
- V-shaped intersections formed by boat edge-support arms 53 C, 53 D and boat edge-support arms 54 C, 54 D ensure that the wafer boats 24 are accurately aligned with horizontally moveable arms 51 A and 51 B when the wafer boat support rails 24 B and 24 C rest in the V-shaped intersections.
- Microcontroller 29 then causes motor assembly 64 of FIG. 1D to operate belts 61 A and 61 B to raise the horizontal translation devices 50 A and 50 B and the up to eight loaded wafer boats 24 supported thereby to a level slightly above that of a “destination” cantilever paddle 47 , with the wafer boat edge-support arms remaining in the boat-supporting configuration indicated by the solid lines in FIGS. 1B and 1C.
- microcontroller 29 operates to move horizontally moveable arms 51 A and 51 B and the loaded wafer boats supported thereby over the destination cantilever paddle, for example cantilever paddle 47 - 1 , as shown in FIG. 2 A.
- Microcontroller 29 also adjusts for any needed offset correction as previously described to ensure that the wafer boats are precisely aligned with the longitudinal axis of cantilever paddle 47 - 1 .
- Control software of the system 29 causes horizontal translation mechanisms 50 A and 50 B to perfectly align the up to eight boatloads of wafers over the cantilever paddle 47 , and then gently lower them onto cantilever paddle 47 without any abrasion.
- Microcontroller 29 then operates motor assembly 64 of FIG. 1D to gently rest the wafer boats 26 onto cantilever paddle 47 - 1 .
- Microcontroller 29 then rotates rods 52 A and 52 B to pivot edge-support arms 53 C, 53 D and 54 C, 54 D so they swing clear of wafer boats 24 , as indicated by arrows 57 and 58 in FIG. 2 C.
- Microcontroller 29 then operates elevators 34 A and 34 B to raise horizontal translation mechanisms 50 A and 50 B so that horizontally moveable arms 51 A and 51 B, the wafer edge support mechanisms 53 and 54 , and rods 52 A and 52 B completely clear wafers 26 .
- Microcontroller 29 then operates the horizontal translation mechanisms 50 A and 50 B to horizontally withdraw moveable arms 51 A and 51 B to their “home” positions, and then operates elevators 34 A and 34 B to return horizontal translation mechanisms 50 A and 50 B to the home position to pick up another group of typically up to eight loaded standard wafer boats or a single long boat to be loaded onto another cantilever paddle 47 .
- the wafer boat loading/unloading mechanism then is operated in the reverse order from that described above to remove each group of loaded wafer boats from the cantilever paddle 47 and return each group to the location shown in FIG. 1 A. All of the wafer boats of each group then can be carried away by an operator, or, if available, an automated shuttle machine.
- an intermediate silicon carbide carrier 26 A is used instead of using above described wafer boat engaging mechanisms 52 A and 52 B of FIGS. 1A and 2A.
- Intermediate silicon carbide carrier 26 A is provided with a hook end 26 A that is supported by a receiving element 30 attached to the horizontally moveable arm (not shown) of horizontal translation mechanism 50 A.
- a similar hook at the opposite end of intermediate carrier 26 A is supported by a horizontally moveable arm of horizontal translation mechanism 50 B.
- up to eight loaded standard wafer boats or a long boat carrying 150 or 300 semiconductor wafers then are precisely aligned with and placed on intermediate carrier 26 A. If a single long boat is used, its opposite ends can be provided with hook ends that are supported by receiving elements 30 , in which case the intermediate carrier 26 A is not used.
- the vertical translation mechanisms in elevators 34 A and 34 B and the horizontal translation mechanisms 50 A and 50 B then operate as described above with reference to FIGS. 1A-G and FIGS. 2A-C to place intermediate carrier 26 A and the loaded wafer boats therein onto cantilever paddle 47 .
- the carriage 42 moves to position cantilever paddle 47 with intermediate carrier 26 and the up to eight loaded wafer boats in the processing zone of an adjacent furnace tube.
- An important advantage of the above described wafer loading system is that a queue mechanism of the type designated by numeral 30 in FIG. 1 of prior art Pat. No. 5,765,982 to load or unload individual wafer boats onto or off of a particular cantilever paddle is not used in the present invention. Instead, up to eight wafer boats are simultaneously loaded onto a cantilever paddle or are simultaneously unloaded from the cantilever paddle in the same amount of time required for loading or unloading a single wafer boat in the prior art wafer loading systems. The amount of time required for loading and unloading wafers into the diffusion furnace therefore is reduced by a factor of up to eight or more over the system shown in previously described Pat. No. 5,765,982.
- a horizontal wafer boat transport/handler system 100 includes a horizontal translation assembly 101 (see FIG. 4C) and a boat support assembly 102 carried by the moveable arms 51 A and 51 B of the above described horizontal transport mechanisms 50 A and 50 B, respectively. (Note that where convenient, the same reference numerals are used in FIGS. 4A-4D as in the earlier drawings, to designate the same or similar parts.)
- Boat support assembly 102 is operable to carry a number of wafer boats 24 loaded with wafers 26 from a wafer boat nest 99 on a load platform 87 of horizontal translation assembly 101 along a horizontal path to a location (shown in FIG. 4C) immediately over cantilever paddle 47 , and to allow the loaded wafer boats 24 to be gently lowered and deposited onto cantilever paddle 47 .
- Boat support assembly 102 also is operable under control of microcontroller 29 of FIG. 1G to move clear of (i.e., avoid touching) the wafers 26 in all of the wafer boats 24 resting on cantilever paddle 47 as boat support assembly 102 is moved away from cantilever paddle 47 after the wafer boats 24 have been loaded on cantilever paddle 47 .
- the wafer boats 24 thereon are moved by the carriage 16 supporting cantilever paddle 47 into a horizontal furnace tube (not shown) for wafer processing.
- cantilever paddle 47 wafer boats 24 and the processed wafers are withdrawn from the furnace tube.
- Boat support assembly 102 then is moved back over cantilever paddle 47 and then is operable to pick up all of the wafer boats 24 from cantilever paddle 47 and carry them and the processed wafers 26 back to a location immediately above load platform 87 .
- Load platform 87 then is raised so as to support the wafer boats 24 .
- the above mentioned wafer boat nest 99 includes a wafer boat locating nest 93 , a plurality of precisely positioned raised features 90 , and a plurality of position adjustment slots 94 . Screws (not shown) extending through position adjustment slots 94 into the supper surface 87 A of load platform 87 to attach wafer boat nest 99 thereto.
- Load platform 87 rests on a thick support plate 103 that extends from plate 59 B of mounting bracket 59 to plate 88 B of mounting bracket 88 .
- FIG. 4B is essentially identical to the drawing in FIG. 4A, except that in FIG. 4B the upper surface 87 A is lower than in FIG. 4A because the internal bladder 107 shown in subsequently described FIG. 5 has been deflated so as to lower surface 87 A.
- the upper surface 87 A of load platform 87 can be precisely raised and lowered by means of an elongated, inflatable bladder and inflation pump as shown in FIG. 5 to allow wafer boat nest 99 to be lowered enough to clear the lowest portions of boat support assembly 102 and wafer boats 24 as wafer boats 24 are carried between load platform 87 and the location shown in FIG. 4 C.
- load platform 87 includes a moveable outer inverted U-shaped section 87 B which is “nested” over a stationary inner lower section 87 C that is rigidly attached to support plate 103 .
- the bladder 107 includes a hollow inflatable section 107 A that can rest on a suitable platform supported by support plate 103 .
- Hollow inflatable section 107 A preferably directly supports the horizontal upper inner surface of outer section 87 B, but bladder 107 can include an optional upper solid section 107 B that supports the horizontal upper inner surface of outer section 87 B.
- bladder 107 is inflated or deflated by a compressed air source controlled by microcontroller 29 of FIG. 1G to raise and lower wafer boat nest 99 .
- FIGS. 4B and 4C show wafer boats 24 supported by a stationary support rail 97 and a moveable support rail 96 .
- FIG. 4C shows boat support assembly 102 precisely positioned and aligned directly above cantilever paddle 47 .
- Stationary support rail 97 and moveable support rail 96 each include one or a plurality of rigid support tabs 95 , which can be composed of suitable high temperature material such as ceramic, silicon carbide or polyamide. Some of the support tabs 95 are attached to the vertical inner face of stationary support rail 97 , and the rest of support tabs 95 are attached to the inner vertical face of moveable support rail 96 , as shown in FIGS. 4A-4C. Support tabs 95 directly engage the lower surfaces of the opposed support edges along either side of wafer boat 24 as to support it and wafers 26 .
- Stationary support rail 97 is attached by a pair of plates such as 92 in FIGS. 4A-4D to the inner face of a first support drive mounting plate 89 A that is attached to horizontally moveable arm 51 A of horizontal translation mechanism 50 A and to the inner face of a second support drive mounting plate 89 B supported by horizontally moveable arm 51 B of horizontal translation assembly 50 B.
- Moveable support rail 96 is rigidly attached to the outer ends of a pair of rotary support arms 96 A and 96 B.
- the opposite ends of rotary support arms 96 A and 96 B are connected to axles (not shown) which are supported by and extend through support drive mount plates 89 A and 89 B, respectively, and are driven by DC servo motors 98 A and 98 B, respectively, which are controlled by microcontroller 29 of FIG. 1 G.
- wafer boats 24 loaded with wafers 26 initially are placed on wafer boat nest 99 .
- the raised features 90 of wafer boat nest 99 ensure precise placements of the wafer boats 24 on load platform 87 , and hence later on cantilever paddle 47 , and still later within the furnace tube.
- internal bladder 107 is precisely deflated under control of microprocessor 29 , lowering the upper surface 87 A of load platform 87 to the level shown in FIG. 4B so the opposed parallel support edges of the wafer boats 24 are supported by the finger tabs 95 on stationary rail 97 and moveable rail 96 .
- the vertical drives 34 A and 34 B (FIG. 4D) then are operated by microcontroller 29 to position the wafer boats 24 at a suitable vertical level relative to the particular cantilever paddle 47 onto which the wafer boats 24 are to be loaded.
- horizontal translation mechanisms 50 A and 50 B are operated to extend horizontal translation arms 51 A and 51 B to the position indicated in FIG. 4 C.
- the upper surface 87 A of load platform 87 has been lowered enough to clear the wafer boats and the lowest portions of the boat support assembly 102 as it is moved from the position shown in FIG. 4B to the position shown in FIG. 4 C.
- Wafer boats 24 then are gently lowered onto cantilever paddle 47 , wherein the vertical translation mechanisms shown in FIG. 1D are actuated to lower horizontal translation assemblies 50 A and 50 B until the bottoms of the wafer boats 24 rest on cantilever paddle 47 .
- Precise alignment of boat support assembly 102 and wafer boats 24 with cantilever paddle 47 is achieved by operating the microcontroller 29 to monitor the two horizontal rotary encoders 85 of horizontal translation mechanisms 50 A and 50 B, or alternatively, by means of sensors 70 A and 70 B such as those shown in FIG. 1F in the automated manner previously described herein.
- the vertical drives of FIG. 1D then are operated to lower moveable support rail 96 and stationary support rail 97 enough to disengage it from the lower support edge surfaces of the wafer boats 24 .
- rotary arms 96 A and 96 B and moveable support rail 96 then are rotated by DC servo motors 98 A and 98 B to lift moveable support rail 96 over wafers 26 in wafer boat 24 , as shown.
- the horizontal translation mechanisms 50 A and 50 B then are actuated to move boat support assembly 102 away from the wafer boats 24 in cantilever paddle 47 .
- Movable support rail 96 is lowered, and boat support assembly 100 to is returned to the home position.
- cantilever paddle 47 and wafer boats 24 thereon are moved horizontally by carriage 16 into the furnace tube, wherein the wafers 26 are processed. After the wafer processing is complete, cantilever paddle 47 and wafer boats 24 are withdrawn from the furnace tube.
- the horizontal wafer boat transport/handler system 100 then is operated under control of microcontroller 29 in the reverse order from that described above so as to engage the support edge surfaces of wafer boats 24 and lift them from cantilever paddle 47 , return them to a position precisely over load platform 87 and wafer boat nest 99 .
- Bladder 107 then is inflated under control of microcontroller 29 to raise load platform 87 enough to cause wafer boat nest 99 to support the wafer boats 24 , so as to allow wafer boats 24 to be removed from load platform 87 , either by a human operator or a robotic machine.
Abstract
Description
Claims (13)
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US09/812,014 US6537010B2 (en) | 1999-07-07 | 2001-03-19 | Wafer boat support and method for twin tower wafer boat loader |
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US09/348,997 US6352399B1 (en) | 1999-07-07 | 1999-07-07 | Twin tower wafer boat loading system and method |
US19251600P | 2000-03-28 | 2000-03-28 | |
US09/812,014 US6537010B2 (en) | 1999-07-07 | 2001-03-19 | Wafer boat support and method for twin tower wafer boat loader |
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US09/348,997 Continuation-In-Part US6352399B1 (en) | 1999-07-07 | 1999-07-07 | Twin tower wafer boat loading system and method |
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US20010041118A1 US20010041118A1 (en) | 2001-11-15 |
US6537010B2 true US6537010B2 (en) | 2003-03-25 |
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US09/812,014 Expired - Lifetime US6537010B2 (en) | 1999-07-07 | 2001-03-19 | Wafer boat support and method for twin tower wafer boat loader |
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US7534069B1 (en) | 2007-11-09 | 2009-05-19 | Stanley James C | Programmable boatlift system with boat position sensor |
US20090185861A1 (en) * | 2007-11-09 | 2009-07-23 | Stanley James C | Programmable boatlift system with boat position sensor |
US20110062053A1 (en) * | 2009-07-13 | 2011-03-17 | Greene Tweed Of Delaware, Inc. | Chimerized Wafer Boat for Use in Semiconductor Chip Processing and Related Methods |
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US7595089B2 (en) * | 2003-05-13 | 2009-09-29 | Sumitomo Electric Industries, Ltd. | Deposition method for semiconductor laser bars using a clamping jig |
US20050282298A1 (en) * | 2004-05-04 | 2005-12-22 | Chi-Min Liao | Transport speed monitoring apparatus and semiconductor processing system utilizing the same |
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US20090220300A1 (en) * | 2007-11-09 | 2009-09-03 | Stanley James C | Programmable boatlift system with boat position sensor |
US20090185861A1 (en) * | 2007-11-09 | 2009-07-23 | Stanley James C | Programmable boatlift system with boat position sensor |
US7534069B1 (en) | 2007-11-09 | 2009-05-19 | Stanley James C | Programmable boatlift system with boat position sensor |
US7637690B2 (en) | 2007-11-09 | 2009-12-29 | Calyle Custom Builders, LLC | Programmable boatlift system with boat position sensor |
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CN103319180A (en) * | 2013-07-01 | 2013-09-25 | 潍坊华美精细技术陶瓷有限公司 | Preparation method of reaction sintered silicon carbide cantilever paddle |
CN104328502A (en) * | 2014-11-06 | 2015-02-04 | 北京七星华创电子股份有限公司 | Automatic feeding device of horizontal diffusion furnace |
CN109659401A (en) * | 2019-01-09 | 2019-04-19 | 湖南红太阳光电科技有限公司 | A kind of clean bench of high-temperature service |
CN109659401B (en) * | 2019-01-09 | 2020-07-10 | 湖南红太阳光电科技有限公司 | Clean bench of high temperature equipment |
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