US6690108B2 - Organic electroluminescence element and manufacturing method therefor - Google Patents
Organic electroluminescence element and manufacturing method therefor Download PDFInfo
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- US6690108B2 US6690108B2 US09/899,352 US89935201A US6690108B2 US 6690108 B2 US6690108 B2 US 6690108B2 US 89935201 A US89935201 A US 89935201A US 6690108 B2 US6690108 B2 US 6690108B2
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
- H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/341—Short-circuit prevention
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
Definitions
- the present invention relates to an organic electroluminescence (organic EL) element and a manufacturing method therefor.
- An electroluminescence element is a solid element which has high impact resistance and emits lights with high visibility.
- the use of an EL element as a light emitting element has been attempted in various display devices.
- organic EL elements have been recently developed which have structures such as the following:
- the organic EL elements show various superior properties, such as the capability to emit light with high brightness and high efficiency by merely applying a voltage between the cathode and the anode, and the capability to show multicolor.
- an example of the organic EL element is formed by laminating, on a glass substrate 1 , transparent electrodes 2 as anodes, an organic EL layer consisting of a hole injection layer 3 , a hole transport layer 4 , light emission layers 5 , an electron transport layer 6 , and a cathode 7 , in the above order.
- the transparent electrodes (anodes) 2 are generally made of indium tin oxide (ITO).
- the cathode 7 is made of an alloy or a mixture of magnesium and a group II metal.
- the light emission layers 5 are provided between the anodes 2 and the cathode 7 .
- the light emission layers 5 are formed respectively into patternings of a red light emission layer 5 a, a green light emission layer 5 b, and a blue light emission layer 5 c.
- the hole injection layer 3 , the hole transport layer 4 , and the electron transport layer 6 are provided in that order between the anodes 2 and the cathode 7 , so that the organic EL element can emit light with high brightness and high efficiency.
- each layer of the organic EL element has a thickness of 200 nm or less, except for the insulating organic layers 18 and the cathode 7 .
- the anodes 2 are formed into a patterning over a glass substrate 1 by using a photolithography technique, followed by forming films of a hole injection layer 3 , a hole transport layer 4 , light emission layers 5 , an electron transport layer 6 , and a cathode 7 , in that order.
- the workability of the patterning becomes low.
- both pattern edges 2 a, 2 a of the anode 2 made of ITO become rough and form taper angles of 15 to 90°, on which the hole injection layer 3 , the hole transport layer 4 , and the electron transport layer 6 are then respectively formed into films, in that order. Therefore, the thicknesses of the hole injection layer 3 , the hole transport layer 4 , and the electron transport layer 6 become irregular, generating thin or convex portions on which local film damage is caused by an applied voltage, and a short circuit is caused by a concentration of an electrical field. Thereby, the cathode 7 , which was last to be formed into a film, is in danger of being cut, resulting in a decrease in the reliability of the organic EL element.
- An object of the present invention is to provide an organic EL element which can be produced at low cost and which can improve the reliability by preventing problems such as the generation of a short circuit and the breaking of a cathode thereof, and to provide a manufacturing method therefor.
- the present invention provides an organic EL element including a plurality of transparent electrodes arranged in parallel on a base plate; a plurality of cathodes disposed above organic layers so as to cross the transparent electrodes; said organic layers including light emission layers and disposed between the transparent electrodes and the cathodes; and an insulating organic layer disposed in spaces between adjacent transparent electrodes.
- the insulating organic layers may comprise overhanging portions to cover the lateral end portions of the transparent electrodes.
- the overhanging portion may have a taper angle at each lateral end thereof, and the thickness of the overhanging portion decreases from the inside to the outside of the insulating organic layers in the width direction of the insulating organic layer.
- the taper angle of the overhanging portion may be set within the range of 0.01 to 70°.
- the maximum film thickness of the insulating organic layer may be set within the range of 10 to 500 nm.
- the widths of the overhanging portions may be set within the range of 1 to 15 ⁇ m.
- the insulating organic layer is made of at least one material used for the organic layer.
- the present invention provides a manufacturing method of an organic EL element comprising a plurality of transparent electrodes arranged in parallel on a base plate; a plurality of cathodes disposed above organic layers so as to cross the transparent electrodes; said organic layers including light emission layers and disposed between the transparent electrodes and the cathodes; and an insulating organic layer disposed in spaces between adjacent transparent electrodes, the method comprising the steps of: forming the insulating organic layer; forming the organic layer; and forming of the cathode, wherein the steps of forming the insulating organic layer, the organic layer, and the cathode are carried out in a vacuum state.
- the organic EL element of the present invention has the insulating organic layer disposed in the spaces between the adjacent transparent electrodes, a taper angle generated in the vicinity of a lateral end portion of the transparent electrode can be prevented from becoming steep, so that the organic layer and the cathode can be formed smoothly. Therefore, the cathode is prevented from breaking, and the film thickness of the organic layer is prevented from becoming thin and is uniformly formed, so that the generation of a short circuit can be also prevented.
- the insulating organic layers comprise overhanging portions to cover the lateral end portions of the transparent electrodes, even if the lateral end portions of the transparent electrodes are rough, the taper angle generated in the vicinity of the lateral end portion of the transparent electrodes can be prevented from becoming steep. Therefore, the variation of the film thickness of the organic layer, local film damage caused by an applied voltage, a short circuit caused by a concentration of an electric field, and the breaking of the cathode can be prevented.
- the overhanging portion has a taper angle at each lateral end thereof, and the thickness of the overhanging portion decreases from the inside to the outside of the insulating organic layers in the width direction of the insulating organic layer, the taper angle in the vicinity of the lateral end portions of the transparent electrodes can be prevented from becoming steep, so that the organic layer and the cathode can be formed smoothly.
- the taper angle of the overhanging portion is set within the range of 0.01 to 70°, the problems described above can be prevented more effectively.
- the cathode When the maximum film thickness of the insulating organic layer is set within the range of 10 to 500 nm, the cathode can be formed smoothly, so that the cathode is prevented from breaking, and the film thickness of the organic layer is prevented from becoming exceedingly thin and is uniformly formed, so that the generation of a short circuit can be also prevented.
- the steps of forming the insulating organic layer, the organic layer, and the cathode can be carried out in a vacuum state, so that the total number of manufacturing steps and the manufacturing cost can be reduced.
- the manufacturing method of the organic EL element by forming the insulating organic layer which may be made of at least one material used for the organic layer, the generation of dark spots, which are caused by moisture generated by patterning polyimide and the like and which darken the light emission areas, can be prevented. Moreover, since all of the steps can be carried out in a vacuum state, the number of manufacturing steps and the cost for manufacturing can be reduced, in comparison with the photolithography method using polyimide.
- FIG. 1 is a shematic planar view showing an organic EL element of one embodiment according to the present invention.
- FIG. 2 is an expanded cross-sectional view of the organic EL element taken along the line A—A of FIG. 1 .
- FIGS. 3A to 3 D are cross-sectional views showing a manufacturing method for an organic EL element of an embodiment according to the present invention.
- FIGS. 4A to 4 B are cross-sectional views showing a manufacturing method for an organic EL element of an embodiment according to the present invention.
- FIG. 5 is a cross-sectional view showing an organic EL element according to the prior art.
- a plurality of transparent electrodes (anodes) 12 are arranged in parallel on a glass substrate (base plate) 11 having a 1.1 mm thickness.
- the thicknesses of the transparent electrodes (anodes) 12 and the glass substrate (base plate) 11 are not limited to the above values in the present invention.
- a plurality of insulating organic layers 18 are disposed in spaces S between the adjacent transparent electrodes 12 on the glass substrate 11 , so as to touch both lateral edges of the transparent electrodes 12 .
- a hole injection layer 13 is laminated on the transparent electrodes 12 and the insulating organic layers 18 .
- a hole transport layer 14 is laminated on the hole injection layer 13 .
- light emission layers 15 are laminated on the hole transport layer 14 and above the transparent electrode 12 .
- an electron transport layer 16 is laminated.
- a plurality of cathodes 17 are patterned to form films so as to cross the transparent electrodes 12 .
- an organic layer 19 including the hole injection layer 13 , the hole transport layer 14 , the light emission layers 15 , and the electron transport layer 16 , is formed between the transparent electrodes 12 and the cathodes 17 .
- a dot is formed at a crossing portion of a transparent electrode 12 and a cathode 17 , and an image pixel is set to be formed by 3 RGB dots.
- the number of RGB dots required to form 1 image pixel is not limited to the above value in the present invention.
- the transparent electrode (anode) 12 is generally made of an indium tin oxide (ITO).
- ITO indium tin oxide
- the cathode 17 is preferably made of a material which has a smaller work function than that of the transparent electrode (anode) 12 .
- specific examples include indium, aluminum, magnesium, and an alloy or a mixed metal of magnesium-indium, magnesium-aluminum, or aluminum-lithium.
- the organic layer 19 is laminated between the anodes 12 and the cathodes 17 .
- the light emission layers 15 are included which can emit light due to an applied voltage between the transparent electrodes 12 and the cathodes 7 , and the hole injection layer 13 , the hole transport layer 14 , and the electron transport layer 16 are included so as to improve the efficiency of the light emission by the light emission layers 15 .
- the light emission layers 15 are patterned to respectively form a red light emission layer 15 a, a green light emission layer 15 b, and a blue light emission layer 15 c, corresponding to the 3 RGB dots which form an image pixel.
- a red light emission layer 15 a specific examples include alumi quinoline complex doped with 4-dicyanomethylene-2-methyl-6-(p-dimethylaminostyryl)-4H-pyrane (DCM, its doping concentration is preferably 5 wt %).
- DCM 4-dicyanomethylene-2-methyl-6-(p-dimethylaminostyryl)-4H-pyrane
- the materials used for the green light emission layer 15 b include tris(8-quinolinol)aluminium (aluminium complex) doped with quinacridone (its doping concentration is preferably 5 wt %).
- a specific example includes perylene.
- aryl amine such as 4,4′,4′′-tris(3-methylphenylphenylamino)-triphenylamine, 4-phenyl-4′,4′′-bis[di(3-methylphenyl)amino]triphenylamine, and triphenylamine; and diamine derivatives, such as N,N′-diphenyl-N,N′-bis(3-methylphenyl)-11′-biphenyl-4,4′-diamine (TPD), and N,N′-diphenyl-N,N′-bis( ⁇ -naphtyl)-1,1′-biphenyl-4,4′-diamine( ⁇ -NPD).
- aryl amine such as 4,4′,4′′-tris(3-methylphenylphenylamino)-triphenylamine, 4-phenyl-4′,4′′-bis[di(3-methylphenyl)amino]triphenylamine, and triphenyl
- any compounds that is normally used for the hole transport layer can be used; specific examples include diamines, such as bis(di(p-tolyl)aminophenyl)-1,1-cyclohexane, N,N′-diphenyl-N,N′-bis(3-methylphenyl)-1,1′-biphenyl-4,4′-diamine, and N,N′-diphenyl-N,N′-bis( ⁇ -naphtyl)-(1,1′-biphenyl)-4,4′-diamine, triamines, tetraamines, and starburst molecules.
- diamines such as bis(di(p-tolyl)aminophenyl)-1,1-cyclohexane, N,N′-diphenyl-N,N′-bis(3-methylphenyl)-1,1′-biphenyl-4,4′-diamine, and N,N′-diphenyl-N
- an organometallic complex such as tris(8-quinolinol)aluminium.
- the insulating organic layers 18 are formed in spaces S between the adjacent transparent electrodes 12 , so as to touch both lateral edges of the transparent electrodes 12 and to have overhanging portions 18 a which cover lateral end portions 12 a of the transparent electrodes 12 .
- the width of each overhanging portion may be set within the range of 1 to 15 ⁇ m.
- the overhanging portion has a taper angle ⁇ at each lateral end thereof, and the thickness of the overhanging portion 18 a decreases from the inside to the outside, that is, from the spaces S to the transparent electrode, of the insulating organic layers in the width direction of the insulating organic layer 18 .
- the taper angle ⁇ is formed by the top surface of the transparent electrode 12 and the taper surface of the overhanging portion 18 a.
- the taper angle ⁇ may be set within the range of 0.01 to 70°.
- the taper angel ⁇ is set within the range of 0.01 to 70°, the cathode 17 is more certainly prevented from breaking above the overhanging portion 18 a.
- the maximum film thickness of the insulating organic layer 18 may be set within the range of 10 to 500 nm, and may also be set to have about the same film thickness or less than the total film thickness of the transparent electrode 12 and the light emission layer 15 . Thereby, the cathodes 17 tend to be prevented from being roughly laminated at the top surface.
- the materials used for the insulating organic layer 18 include the same materials used for the hole injection layer 13 , the hole transport layer 14 , and the electron transport layer 16 .
- the insulating organic layer 18 is made of the same electron transporting material used for the electron transport layer 16 .
- the film thickness of each layer of the organic EL element 10 is set to be 200 nm or less.
- the organic EL element 10 of this embodiment can emit light at the light emission layer 15 by merely applying a voltage between the anode 12 and the cathode 17 .
- the organic EL element 10 of this embodiment includes the insulating organic layers 18 , which are disposed in the spaces S and have the overhanging portions 18 a to cover the lateral end portions of the transparent electrodes 12 and the overhanging portions have taper angles at each lateral end thereof, the taper angles of the organic layer 19 above the lateral end portion 12 a of the transparent electrode 12 can be prevented from becoming steep, so that the breaking of the cathode 17 can be prevented.
- the transparent electrode 12 is formed uniformly, so that the film thickness of the organic layer 19 is prevented from being thin, which is caused by the roughness of the transparent electrodes 12 at the lateral end portions thereof.
- the cathode 17 can be prevented from being roughly formed at the top surface.
- the cathodes 17 is prevented from being roughly laminated at the top surface. Thereby, the breaking of the cathode 17 , and a short circuit between the cathode 17 and the transparent electrode 12 can be prevented, so that the reliability of the organic EL element 10 can be improved.
- the organic EL element 10 of this embodiment can be prevented from having an increase in dark spots, which darken the light emission element areas and are caused by the patterning method using polyimide to prevent the breaking of the cathode 17 and a short circuit between the cathode 17 and the transparent electrode 12 .
- the organic EL element 10 is formed by laminating the insulating organic layer 18 made of the same materials as that of the other basic layers of the organic EL element 10 , so that the effects of moisture, which may result in the shrinkage of pixels, can be prevented.
- transparent electrodes 12 ′ each having a 150 nm thickness, are formed on a glass substrate 11 having a 1.1 mm thickness by using a spatter technique.
- the thicknesses of the transparent electrodes 12 ′ and the glass substrate 11 are not limited to the above values in this present invention.
- a plurality of transparent electrodes 12 are patterned to form spaces S, S between the transparent electrodes 12 by using a photolithography technique, as shown in FIG. 3 B.
- the insulating organic layer 18 made of the electron transporting material described above, is formed on the lateral end portion 12 a of the transparent electrode 12 and the spaces S, so as to have a film thickness of 300 nm, and include overhanging portions 18 a to cover lateral end portions 12 a of the transparent electrode 12 , by evaporate deposition using a metal mask M 1 , as shown in FIG. 3 C.
- the taper angle ⁇ of the overhanging portion 18 a is set to 10°, for example.
- evaporate deposition is carried out while controlling the distance between the metal mask M 1 and the base plate 11 in accordance with the taper angle ⁇ which is set in advance.
- evaporate deposition particles are deposited in the spaces S and the lateral end portions 12 a of the transparent electrode 12 , so that the overhanging portions 18 a, which have the taper angles ⁇ at each lateral end thereof and a thickness which decreases from the inside to the outside of the insulating organic layer 18 in the width direction of the insulating organic layer 18 , are automatically formed.
- the width of the overhanging portion is set to be 5 ⁇ m.
- the width can be determined in accordance with the slit length of the metal mask M 1 .
- the hole injection layer 13 and the hole transport layer 14 are formed on the transparent electrode 12 and the insulating organic layer 18 , in this order, while maintaining the vacuum state.
- the green light emission layer 15 b is formed on the hole transport layer 14 above the transparent electrode 12 using a metal mask M 2 .
- the red light emission layer 15 a and the blue light emission layer 15 c are respectively formed on the hole transport layer 14 above the transparent electrodes 12 , so that the light emission layers 15 are formed into patternings.
- the electron transport layer 16 and the cathode 17 are formed in this order, while maintaining the vacuum state.
- the cathodes 17 , 17 are patterned to cross the transparent electrodes 12 , as shown in FIG. 2 .
- the insulating organic layers 18 made of the same materials as that of the electron transport layer 16 are patterned on the lateral end portions 12 a of the transparent electrodes 12 and the spaces S between the adjacent transparent electrodes 12 using the metal mask M 1 and the like, evaporate deposition particles are deposited on the lateral end portion 12 a of the transparent electrode 12 and the spaces S, so that the overhanging portions 18 a, which have the taper angle ⁇ at each lateral end thereof and a thickness which decreases from the inside to the outside of the insulating organic layer 18 in the width direction of the insulating organic layer 18 , are automatically formed; thereby, the total number of steps required for manufacturing can be reduced.
- the cathode 17 is prevented from breaking, and the film thickness of the organic layer 19 is prevented form becoming thin and is uniformly formed, so that the generation of a short circuit can also be prevented.
- the dark spots which are caused by a very small quantity of moisture generated in the polyimide layers provided to prevent the breaking of the cathode and the generation of a short circuit between the cathode and the transparent electrode in the patterning method using polyimide and which darken the light emission element area, can be reduced.
- the organic EL element includes the insulating organic layer made of the same material such as that used for the organic layers and is formed in a vacuum state.
- other problems caused by moisture such as pixel shrinkage and the deterioration of the organic EL element caused by breaking the vacuum state, can be prevented.
- the insulating organic layer can be formed in a vacuum state and is made of the same material such as that used for the organic layers, the number of manufacturing steps and the cost for manufacturing can be reduced, in comparison with the photolithography method using polyimide.
- the insulating organic layer is disposed between the adjacent transparent electrodes and comprises the overhanging portions to cover the lateral end portions of the transparent electrode, and each overhanging portion has a taper angle at each lateral end thereof, the taper angles of layers laminated above the transparent electrodes can be prevented from becoming steep in the vicinity of the lateral end portions of the transparent electrodes, and the breaking of the cathode can also be prevented. Moreover, even if the lateral end portions of the transparent electrodes are rough, the film thicknesses of the layers laminated above the transparent electrodes can be prevented from becoming thin, so that a short circuit between the transparent electrode and the cathode can be prevented. Thus, the reliability of the organic EL element can be improved.
- the organic EL element includes the insulating organic layer made of the same material as is used for the basic layers of the organic EL element laminated by vacuum deposition, the increase in the dark spots caused by moisture which may result in pixel shrinkage can be prevented. Since the insulating organic layer is formed in a vacuum state and is made of the same material such as is used for the basic layers of the organic EL element, the number of manufacturing steps and the cost for manufacturing can be reduced.
Abstract
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Applications Claiming Priority (2)
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JP2000207463A JP2002025781A (en) | 2000-07-07 | 2000-07-07 | Organic el element and its manufacturing method |
JPP2000-207463 | 2000-07-07 |
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US20020003402A1 US20020003402A1 (en) | 2002-01-10 |
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Cited By (4)
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US20030218419A1 (en) * | 2002-05-21 | 2003-11-27 | Bae Sung Joon | Electroluminescence display device and method of fabricating the same |
US20050012448A1 (en) * | 2001-11-28 | 2005-01-20 | Lin Ke | Organic light emitting diode (oled) |
US20060262375A1 (en) * | 2005-05-23 | 2006-11-23 | Fuji Photo Film Co., Ltd. | Base plate with electrodes, process for producing the same, and electro-optical device |
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JP2002025781A (en) | 2002-01-25 |
US20020003402A1 (en) | 2002-01-10 |
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