US7261230B2 - Wirebonding insulated wire and capillary therefor - Google Patents
Wirebonding insulated wire and capillary therefor Download PDFInfo
- Publication number
- US7261230B2 US7261230B2 US10/652,434 US65243403A US7261230B2 US 7261230 B2 US7261230 B2 US 7261230B2 US 65243403 A US65243403 A US 65243403A US 7261230 B2 US7261230 B2 US 7261230B2
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- United States
- Prior art keywords
- wire
- bond
- bond pad
- electrical connection
- capillary
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
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- H01L2924/01—Chemical elements
- H01L2924/0102—Calcium [Ca]
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- H01L2924/01—Chemical elements
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
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- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20751—Diameter ranges larger or equal to 10 microns less than 20 microns
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20752—Diameter ranges larger or equal to 20 microns less than 30 microns
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20753—Diameter ranges larger or equal to 30 microns less than 40 microns
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20754—Diameter ranges larger or equal to 40 microns less than 50 microns
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20755—Diameter ranges larger or equal to 50 microns less than 60 microns
Definitions
- the present invention relates to wires for connecting integrated circuit (IC) die to leads and wirebonding, and more particularly, to a method of wirebonding insulated wires.
- IC integrated circuit
- An IC die is a small device formed on a semiconductor wafer, such as a silicon wafer. Such a die is typically cut from the wafer and attached to a substrate or base carrier for interconnect redistribution. Bond pads on the die are electrically connected to leads on the substrate with wires via wire bonding. Wires may also be used to cross connect bond pads of the die or to cross connect leads of the substrate. The die, wires and substrate are then encapsulated to form a packaged device.
- wires may unintentionally short to other conductive structures of the packaged device, such as other wires, pads, leads, or the die. This shorting may occur during IC die encapsulation as, for example, from “sweeping,” where the injection or transfer of the liquid molding encapsulant moves the wires against another conductive structure. Parts that use smaller diameter wires tend to have higher wire sweep rejects. Using insulated or coated wires may decrease such wire sweep and shortings. However, it is difficult to obtain good bonding quality when using coated wires, especially for the second bond. That is, a wirebonder makes a first bond at the die bond pad and a second bond at the carrier lead.
- Non-sticking on the lead is a common problem with insulated wire.
- One attempt at overcoming the weak second bond was to remove the insulator using an electric flame off (EFO).
- EFO electric flame off
- performing EFO at the second bond requires a special wirebonding machine and takes additional time.
- the present invention provides a method of wire bonding insulated or coated wire using a standard wirebonder that improves the bonding quality of the second bond.
- FIG. 1 is an enlarged side view of an electrical connection in accordance with the present invention
- FIGS. 2A-2C are cross-sectional views of a wire bonder capillary illustrating a method of bonding an insulated wire to a bond pad in accordance with an embodiment of the present invention.
- FIG. 3 is an enlarged perspective view of a capillary tip in accordance with an embodiment of the present invention.
- the present invention provides a method of electrically connecting a first device to a second device with an insulated wire.
- the method includes the steps of:
- the present invention also is a capillary for a wirebonder in which the capillary has a cylindrical tip through which a bond wire protrudes, wherein an outer surface of the capillary is roughened for tearing an insulative coating on a coated wire.
- FIG. 1 an enlarged, partial side view of a first device 10 attached to a second device 12 with a coated or insulated wire 14 , prior to encapsulation.
- the first device 10 may be a semiconductor device such as an integrated circuit formed on a silicon substrate.
- the second device 12 may also be a semiconductor device, such as a bottom or lower die in a stacked die configuration.
- the second device 12 is a carrier or substrate. More particularly, FIG. 1 shows a die bonding pad 16 of the first device electrically connected to a lead finger 18 of the second device 12 , which in this case is a leadframe.
- the first and second devices 10 , 12 and their bond pads 16 , 18 are of a type known to those of ordinary skill in the art and detailed descriptions thereof are not necessary for a full understanding of the invention.
- the bond wire 14 has a diameter of between about 15 um to about 55 um, although other diameter bond wires may be used and the invention should not be limited to a particular bond wire diameter.
- the insulated wire 14 has a diameter of less than about 25 um.
- the insulative coating preferably is an organic insulative coating having a thickness of about 0.5 um to about 2.0 um that can be thermally decomposed during free air ball formation.
- the wire 14 preferably has a melting temperature (Tg) of about 180° to 350° C.
- connection of the wire 14 at the die bonding pad 16 is referred to herein as a first bond and the connection of the wire 14 at the lead finger 18 as a second bond.
- the first bond is a ball bond and the second bond is a wedge bond.
- the term ‘wirebonding’ is generally accepted to mean the interconnection, via wire, of chips and substrates.
- ball bonding a capillary holds the wire.
- a ball is formed on one end of the wire and is pressed against the face of the capillary.
- the ball may be formed with a hydrogen flame or a spark.
- the capillary pushes the ball against the bond pad, and then, while holding the ball against the first pad, ultrasonic vibration is applied, which bonds the ball to the die.
- the capillary which is still holding the wire, is moved over a second bonding pad, such as the lead frame finger 18 , to which the first pad is to be electrically connected.
- the wire is pressed against the second pad and once again ultrasonic energy is applied until the wire is bonded to the second pad.
- the capillary is then lifted off the bond, breaking free from the wire.
- FIGS. 2A to 2C cross-sectional views of a wire bonder capillary 20 illustrating a method of bonding an insulated wire 14 to a lead finger 18 in accordance with an embodiment of the present invention are shown.
- the wire 14 extends through a hole 22 in the capillary 20 .
- FIG. 2A shows the wire 14 being pressed against the lead finger 18 by the capillary 20 .
- the capillary 20 is then moved horizontally over the surface of the lead finger 18 such that the bond wire 14 is rubbed between a tip of the capillary 20 and the lead finger 18 .
- FIG. 2B shows the wire 14 after it has been moved from right to left across the lead finger 18 .
- the thermocompression bonding step includes a combination of heat and pressure to attach the wire 14 to the lead finger 18 .
- Either a heated capillary or a heated pedestal (not shown) on which the lead frame is located or both may be used to generate heat.
- the temperature ranges from 100° C. to 200° C.
- the wirebonding may be performed using currently available wirebonders, such as the such as the ESEC 3088 iP and the Kulicke & Soffa 8060, with only modifications to the capillary tip required, as described below.
- the lead finger 18 may be heated with a local heat source 24 prior to the moving of the wire 14 against the lead finger 18 in order to increase the effectiveness of insulation tearing by the mechanical movement described above.
Abstract
Description
Claims (22)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/652,434 US7261230B2 (en) | 2003-08-29 | 2003-08-29 | Wirebonding insulated wire and capillary therefor |
JP2006524650A JP2007504648A (en) | 2003-08-29 | 2004-07-15 | Capillary used for wire bonding and wire bonding of insulated wires |
PCT/US2004/022512 WO2005024901A2 (en) | 2003-08-29 | 2004-07-15 | Wirebonding insulated wire and capillary therefor |
KR1020067004163A KR101077813B1 (en) | 2003-08-29 | 2004-07-15 | Wirebonding insulated wire and capillary therefor |
CNB2004800246379A CN100478117C (en) | 2003-08-29 | 2004-07-15 | Wirebonding insulated wire and capillary therefor |
TW093123235A TWI376776B (en) | 2003-08-29 | 2004-08-03 | Wirebonding insulated wire and capillary therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/652,434 US7261230B2 (en) | 2003-08-29 | 2003-08-29 | Wirebonding insulated wire and capillary therefor |
Publications (2)
Publication Number | Publication Date |
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US20050045692A1 US20050045692A1 (en) | 2005-03-03 |
US7261230B2 true US7261230B2 (en) | 2007-08-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/652,434 Expired - Fee Related US7261230B2 (en) | 2003-08-29 | 2003-08-29 | Wirebonding insulated wire and capillary therefor |
Country Status (6)
Country | Link |
---|---|
US (1) | US7261230B2 (en) |
JP (1) | JP2007504648A (en) |
KR (1) | KR101077813B1 (en) |
CN (1) | CN100478117C (en) |
TW (1) | TWI376776B (en) |
WO (1) | WO2005024901A2 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070262119A1 (en) * | 2006-05-09 | 2007-11-15 | Malliah Ramkumar | Wire bonding process for insulated wires |
US20080116548A1 (en) * | 2006-11-17 | 2008-05-22 | Freescale Semiconductor, Inc | Wire bond and method of forming same |
US20090321952A1 (en) * | 2008-06-27 | 2009-12-31 | Liang Xingzhi | Wire on wire stitch bonding in a semiconductor device |
US20170144328A1 (en) * | 2015-11-23 | 2017-05-25 | Lawrence Livermore National Security, Llc | High temperature additive manufacturing print head |
USD797172S1 (en) * | 2015-02-03 | 2017-09-12 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
USD797171S1 (en) * | 2015-02-03 | 2017-09-12 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
USD797826S1 (en) * | 2015-02-03 | 2017-09-19 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
US20190254546A1 (en) * | 2018-02-22 | 2019-08-22 | General Electric Company | Neural multielectrode arrays and their manufacture and use |
USD868123S1 (en) | 2016-12-20 | 2019-11-26 | Coorstek, Inc. | Wire bonding wedge tool |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060011710A1 (en) * | 2004-07-13 | 2006-01-19 | Asm Technology Singapore Pte Ltd | Formation of a wire bond with enhanced pull |
US20080314963A1 (en) * | 2006-07-03 | 2008-12-25 | Kulicke And Soffa Industries, Inc. | Bonding Tool With Improved Finish |
JP5978587B2 (en) * | 2011-10-13 | 2016-08-24 | 日立化成株式会社 | Semiconductor package and manufacturing method thereof |
AU2012329403B2 (en) | 2011-10-24 | 2015-08-20 | Agency For Science, Technology And Research | Encapsulation barrier stack |
CN102637613B (en) * | 2012-05-09 | 2015-07-01 | 四川立泰电子有限公司 | Realization method for lead bonding thick aluminum wire |
WO2014083805A1 (en) * | 2012-11-28 | 2014-06-05 | パナソニック株式会社 | Semiconductor device and wire bonding wiring method |
KR101411937B1 (en) * | 2013-08-19 | 2014-06-26 | (주)피엔티 | Method for examining quality of metal wire bonding in real time |
US9117721B1 (en) * | 2014-03-20 | 2015-08-25 | Excelitas Canada, Inc. | Reduced thickness and reduced footprint semiconductor packaging |
US9165904B1 (en) * | 2014-06-17 | 2015-10-20 | Freescale Semiconductor, Inc. | Insulated wire bonding with EFO before second bond |
CN112171098B (en) * | 2020-09-22 | 2022-05-20 | 苏州大学 | Connection method based on micro-arc discharge |
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2004
- 2004-07-15 CN CNB2004800246379A patent/CN100478117C/en not_active Expired - Fee Related
- 2004-07-15 JP JP2006524650A patent/JP2007504648A/en active Pending
- 2004-07-15 KR KR1020067004163A patent/KR101077813B1/en not_active IP Right Cessation
- 2004-07-15 WO PCT/US2004/022512 patent/WO2005024901A2/en active Application Filing
- 2004-08-03 TW TW093123235A patent/TWI376776B/en not_active IP Right Cessation
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US6497356B2 (en) | 2000-04-28 | 2002-12-24 | Kulicke & Soffa Investments, Inc. | Controlled attenuation capillary with planar surface |
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070262119A1 (en) * | 2006-05-09 | 2007-11-15 | Malliah Ramkumar | Wire bonding process for insulated wires |
US20080116548A1 (en) * | 2006-11-17 | 2008-05-22 | Freescale Semiconductor, Inc | Wire bond and method of forming same |
US20090321952A1 (en) * | 2008-06-27 | 2009-12-31 | Liang Xingzhi | Wire on wire stitch bonding in a semiconductor device |
US20090321501A1 (en) * | 2008-06-27 | 2009-12-31 | Liang Xingzhi | Method of fabricating wire on wire stitch bonding in a semiconductor device |
USD797171S1 (en) * | 2015-02-03 | 2017-09-12 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
USD797172S1 (en) * | 2015-02-03 | 2017-09-12 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
USD797826S1 (en) * | 2015-02-03 | 2017-09-19 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
USD821468S1 (en) | 2015-02-03 | 2018-06-26 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
USD824969S1 (en) | 2015-02-03 | 2018-08-07 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
USD824970S1 (en) | 2015-02-03 | 2018-08-07 | Coorstek, Inc. | Ceramic bonding tool with textured tip |
US20170144328A1 (en) * | 2015-11-23 | 2017-05-25 | Lawrence Livermore National Security, Llc | High temperature additive manufacturing print head |
US10807273B2 (en) * | 2015-11-23 | 2020-10-20 | Lawrence Livermore National Security, Llc | High temperature additive manufacturing print head |
USD868123S1 (en) | 2016-12-20 | 2019-11-26 | Coorstek, Inc. | Wire bonding wedge tool |
US20190254546A1 (en) * | 2018-02-22 | 2019-08-22 | General Electric Company | Neural multielectrode arrays and their manufacture and use |
Also Published As
Publication number | Publication date |
---|---|
KR20060121850A (en) | 2006-11-29 |
WO2005024901A2 (en) | 2005-03-17 |
KR101077813B1 (en) | 2011-10-31 |
TWI376776B (en) | 2012-11-11 |
JP2007504648A (en) | 2007-03-01 |
CN100478117C (en) | 2009-04-15 |
TW200511544A (en) | 2005-03-16 |
CN1842394A (en) | 2006-10-04 |
US20050045692A1 (en) | 2005-03-03 |
WO2005024901A3 (en) | 2005-05-19 |
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