USD341418S - Supply nozzle for applying liquid resist to a semiconductor wafer - Google Patents
Supply nozzle for applying liquid resist to a semiconductor wafer Download PDFInfo
- Publication number
- USD341418S USD341418S US07/748,061 US74806191F USD341418S US D341418 S USD341418 S US D341418S US 74806191 F US74806191 F US 74806191F US D341418 S USD341418 S US D341418S
- Authority
- US
- United States
- Prior art keywords
- semiconductor wafer
- supply nozzle
- applying liquid
- liquid resist
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
FIG. 1 is a top, front and left side perspective view of supply nozzle for applying liquid resist to a semiconductor wafer showing my new design;
FIG. 2 is a top plan view thereof;
FIG. 3 is a front elevational view thereof, the rear being a mirror image;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a cross-sectional view thereof taken on line 7--7 in FIG. 3; and,
FIG. 8 is a cross-sectional view thereof taken on line 8--8 in FIG. 2.
Claims (1)
- The ornamental design for supply nozzle for applying liquid resist to a semiconductor wafer, as shown and described.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3-4465 | 1991-02-22 | ||
| JP446591 | 1991-02-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD341418S true USD341418S (en) | 1993-11-16 |
Family
ID=70778536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/748,061 Expired - Lifetime USD341418S (en) | 1991-02-22 | 1991-08-21 | Supply nozzle for applying liquid resist to a semiconductor wafer |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD341418S (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6248171B1 (en) | 1998-09-17 | 2001-06-19 | Silicon Valley Group, Inc. | Yield and line width performance for liquid polymers and other materials |
| US6689215B2 (en) | 1998-09-17 | 2004-02-10 | Asml Holdings, N.V. | Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface |
| US6746826B1 (en) | 2000-07-25 | 2004-06-08 | Asml Holding N.V. | Method for an improved developing process in wafer photolithography |
| US7357842B2 (en) | 2004-12-22 | 2008-04-15 | Sokudo Co., Ltd. | Cluster tool architecture for processing a substrate |
| US7651306B2 (en) | 2004-12-22 | 2010-01-26 | Applied Materials, Inc. | Cartesian robot cluster tool architecture |
| US7699021B2 (en) | 2004-12-22 | 2010-04-20 | Sokudo Co., Ltd. | Cluster tool substrate throughput optimization |
| US7798764B2 (en) | 2005-12-22 | 2010-09-21 | Applied Materials, Inc. | Substrate processing sequence in a cartesian robot cluster tool |
| US20160198891A1 (en) * | 2015-01-09 | 2016-07-14 | Jura Elektroapparate Ag | Beverage outlet for a beverage preperation machine |
| USD762752S1 (en) * | 2015-06-01 | 2016-08-02 | E3D-Online Ltd | Nozzle |
| USD929534S1 (en) * | 2019-04-25 | 2021-08-31 | Tokyo Electron Limited | Liquid discharge nozzle for semiconductor substrate processing apparatus |
| USD930796S1 (en) * | 2020-06-08 | 2021-09-14 | Tokyo Electron Limited | Liquid discharge nozzle for semiconductor substrate processing apparatus |
| USD930789S1 (en) * | 2019-12-05 | 2021-09-14 | Scott J. McGehee | Spray nozzle |
| USD1017561S1 (en) * | 2021-03-22 | 2024-03-12 | Kokusai Electric Corporation | Nozzle holder of substrate processing apparatus |
-
1991
- 1991-08-21 US US07/748,061 patent/USD341418S/en not_active Expired - Lifetime
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7625692B2 (en) | 1998-09-17 | 2009-12-01 | Asml Holding N.V. | Yield and line width performance for liquid polymers and other materials |
| US6669779B2 (en) | 1998-09-17 | 2003-12-30 | Asml Holding N.V. | Yield and line width performance for liquid polymers and other materials |
| US6689215B2 (en) | 1998-09-17 | 2004-02-10 | Asml Holdings, N.V. | Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface |
| US7208262B2 (en) | 1998-09-17 | 2007-04-24 | Asml Holdings N.V. | Yield and line width performance for liquid polymers and other materials |
| US6248171B1 (en) | 1998-09-17 | 2001-06-19 | Silicon Valley Group, Inc. | Yield and line width performance for liquid polymers and other materials |
| US6746826B1 (en) | 2000-07-25 | 2004-06-08 | Asml Holding N.V. | Method for an improved developing process in wafer photolithography |
| US7743728B2 (en) | 2004-12-22 | 2010-06-29 | Applied Materials, Inc. | Cluster tool architecture for processing a substrate |
| US8550031B2 (en) | 2004-12-22 | 2013-10-08 | Applied Materials, Inc. | Cluster tool architecture for processing a substrate |
| US7694647B2 (en) | 2004-12-22 | 2010-04-13 | Applied Materials, Inc. | Cluster tool architecture for processing a substrate |
| US7699021B2 (en) | 2004-12-22 | 2010-04-20 | Sokudo Co., Ltd. | Cluster tool substrate throughput optimization |
| US7357842B2 (en) | 2004-12-22 | 2008-04-15 | Sokudo Co., Ltd. | Cluster tool architecture for processing a substrate |
| US7651306B2 (en) | 2004-12-22 | 2010-01-26 | Applied Materials, Inc. | Cartesian robot cluster tool architecture |
| US7925377B2 (en) | 2004-12-22 | 2011-04-12 | Applied Materials, Inc. | Cluster tool architecture for processing a substrate |
| US8911193B2 (en) | 2004-12-22 | 2014-12-16 | Applied Materials, Inc. | Substrate processing sequence in a cartesian robot cluster tool |
| US7798764B2 (en) | 2005-12-22 | 2010-09-21 | Applied Materials, Inc. | Substrate processing sequence in a cartesian robot cluster tool |
| US8066466B2 (en) | 2005-12-22 | 2011-11-29 | Applied Materials, Inc. | Substrate processing sequence in a Cartesian robot cluster tool |
| US20160198891A1 (en) * | 2015-01-09 | 2016-07-14 | Jura Elektroapparate Ag | Beverage outlet for a beverage preperation machine |
| US10143332B2 (en) * | 2015-01-09 | 2018-12-04 | Jura Elecktroapparate AG | Beverage outlet for a beverage preparation machine |
| USD762752S1 (en) * | 2015-06-01 | 2016-08-02 | E3D-Online Ltd | Nozzle |
| USD929534S1 (en) * | 2019-04-25 | 2021-08-31 | Tokyo Electron Limited | Liquid discharge nozzle for semiconductor substrate processing apparatus |
| USD930789S1 (en) * | 2019-12-05 | 2021-09-14 | Scott J. McGehee | Spray nozzle |
| USD930796S1 (en) * | 2020-06-08 | 2021-09-14 | Tokyo Electron Limited | Liquid discharge nozzle for semiconductor substrate processing apparatus |
| USD1017561S1 (en) * | 2021-03-22 | 2024-03-12 | Kokusai Electric Corporation | Nozzle holder of substrate processing apparatus |
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