USRE43817E1 - Low-maintenance coatings - Google Patents

Low-maintenance coatings Download PDF

Info

Publication number
USRE43817E1
USRE43817E1 US13/271,794 US201113271794A USRE43817E US RE43817 E1 USRE43817 E1 US RE43817E1 US 201113271794 A US201113271794 A US 201113271794A US RE43817 E USRE43817 E US RE43817E
Authority
US
United States
Prior art keywords
film
angstroms
low
coating
maintenance coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active, expires
Application number
US13/271,794
Inventor
Annette J. Krisko
Kari B. Myli
Gary L. Pfaff
James E. Brownlee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cardinal CG Co
Original Assignee
Cardinal CG Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cardinal CG Co filed Critical Cardinal CG Co
Priority to US13/271,794 priority Critical patent/USRE43817E1/en
Application granted granted Critical
Publication of USRE43817E1 publication Critical patent/USRE43817E1/en
Active legal-status Critical Current
Adjusted expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3423Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings comprising a suboxide
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10Glass or silica
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/212TiO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/213SiO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/70Properties of coatings
    • C03C2217/71Photocatalytic coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • C03C2218/155Deposition methods from the vapour phase by sputtering by reactive sputtering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • C03C2218/156Deposition methods from the vapour phase by sputtering by magnetron sputtering

Definitions

  • the present invention provides thin film coatings for glass sheets and other substrates. More particularly, the invention provides thin film coatings including a thin photocatalytic film, such as titania, deposited over a thin base layer, such as silica. The invention also provides methods of depositing such coatings onto glass sheets and other substrates.
  • a thin photocatalytic film such as titania
  • titanium dioxide can be used as a photocatalyst.
  • a great deal of research has been done with a view toward providing photocatalytic coatings that have self-cleaning properties.
  • the pursuit of self-cleaning photocatalytic window coatings, in particular, has been an active field of exploration.
  • Such coatings typically involve a titanium dioxide layer carried by a glass pane.
  • These coatings are commonly provided with a relatively thick layer of titanium dioxide and/or a specific under-layer system designed for achieving high levels of photoactivity. Thick titanium dioxide layers, unfortunately, produce high levels of visible reflectance, thus creating a somewhat mirror-like appearance. This high visible reflection tends to exaggerate the appearance of dirt on a window.
  • known under-layer systems commonly teach that specific materials and crystal structures must be used for the under-layer film(s) to achieve acceptable photoactivity levels.
  • many photocatalytic coating systems teach that heating is required during or after film deposition to achieve acceptable levels of photoactivity.
  • Known photocatalytic coatings also tend to have properties that are less than ideal for applications in which the coatings are used on windows. As noted above, the visible reflectance of many known photocatalytic coatings is unacceptably high. Moreover, the reflected colors of these coatings tend not to be ideal. Further, some of these coatings have particularly high surface roughness, as they are designed to have large surface areas that facilitate high photoactivity levels. These rough coatings, unfortunately, tend to be quite vulnerable to being abraded. They are also particularly susceptible to taking on and stubbornly retaining dirt and other contaminants, due to their high surface roughness.
  • the present invention provides low-maintenance coatings that offer exceptional durability, exceptional optical properties, reliable production processes, and surprising cleanliness/maintenance properties.
  • the invention provides a low-maintenance coating on a glass sheet.
  • the low-maintenance coating comprises a first film positioned directly over a first major surface of the glass sheet and a second film positioned directly over the first film.
  • the first film includes a thin base film, (e.g. silica) that has a thickness of less than about 300 angstroms, alternatively less than about 150 angstroms, and further alternatively between about 70 angstroms and about 120 angstroms.
  • the second film in various embodiments of the present invention includes a thin photocatalytic film (e.g. titania) that has a thickness of less than about 300 angstroms, alternatively less than about 150 angstroms, and further alternatively between about 30 angstroms and about 120 angstroms.
  • the invention provides a method of depositing a low-maintenance coating.
  • the method comprises depositing a low-maintenance coating on a glass sheet by depositing first film directly over a first major surface of the glass sheet and then depositing a second film directly over the first film.
  • the first film comprises silica and is deposited at a thickness of between about 70 angstroms and about 120 angstroms.
  • the second film comprises titania and is deposited at a thickness of between about 30 angstroms and about 120 angstroms.
  • both films are deposited by sputtering, preferably while maintaining the substrate at a low temperature (e.g., less than about 250 degrees Celsius, and preferably less than 200 degrees Celsius).
  • FIG. 1 is a partially broken-away schematic cross-sectional side view of a substrate bearing a low-maintenance coating in accordance with certain embodiments of the invention
  • FIG. 2 is a partially broken-away perspective view of a window pane bearing a low-maintenance coating, the pane is mounted in an exterior wall of a building in accordance with certain embodiments of the invention.
  • FIG. 3 is a schematic side end view of a sputtering chamber that is adapted for use in certain methods of the invention.
  • the invention provides a substrate 10 bearing a low-maintenance coating 40 .
  • the substrate 10 is a sheet-like substrate having generally or substantially opposed first 12 and second 14 major surfaces.
  • the substrate is a sheet of transparent material (i.e., a transparent sheet).
  • the substrate is not required to be transparent.
  • the substrate will comprise a transparent (or at least translucent) material, such as glass or clear plastic.
  • the substrate 10 is a glass sheet (e.g., a window pane) in preferred embodiments.
  • a variety of known glass types can be used, and soda-lime glass is preferred.
  • Substrates of various sizes can be used in the present invention. Commonly, large-area substrates are used. Certain embodiments involve a substrate 10 having a width of at least about 0.5 meter, preferably at least about 1 meter, perhaps more preferably at least about 1.5 meters (e.g., between about 2 meters and about 4 meters), and in some cases at least about 3 meters.
  • substrates e.g., glass sheets
  • substrates having a thickness of about 1-5 mm
  • Certain embodiments involve a substrate 10 with a thickness of between about 2.3 mm and about 4.8 mm, and perhaps more preferably between about 2.5 mm and about 4.8 mm.
  • a sheet of glass e.g., soda-lime glass
  • a thickness of about 3 mm will be used.
  • the invention provides a substrate 10 bearing a low-maintenance coating 40 .
  • the coating 40 is preferably deposited over (e.g., over an entirety of) a major surface 12 of the substrate 10 .
  • the low-maintenance coating 40 includes two films: (1) a first film 30 deposited over a major surface 12 of the substrate 10 ; and (2) a second film 50 deposited over the first film 30 .
  • the first film 30 includes a base film, such as silica (e.g., silicon dioxide), and desirably is deposited directly over the substrate 10 (e.g., directly over a major surface 12 of the substrate).
  • This film preferably consists of, or consists essentially of, silicon dioxide.
  • the silica in the first film 30 can include small amounts of an electrically-conductive material, such as aluminum, which may be oxidized in the film 30 .
  • this film 30 can be deposited by sputtering a silicon-containing target that includes a small amount of aluminum or another metal that enhances the electrical conductivity of the target.
  • the first film 30 (an entire thickness of which may consist essentially of silica) desirably has (e.g., is deposited at) a physical thickness of less than about 300 angstroms, alternatively less than about 150 angstroms (e.g., between about 40 angstroms and about 150 angstroms), and further alternatively about 70 angstroms and about 120 angstroms. These incredibly small thicknesses facilitate a surprisingly array of exceptional properties in the present coating.
  • the coating 40 includes a second film 50 that includes a photocatalytic film, such as titania, and desirably is deposited directly over the first film 30 .
  • a photocatalytic film such as titania
  • one or more photocatalytic materials may be used in embodiments of the present invention including but not limited to oxides of titanium, iron, silver, copper, tungsten, aluminum, zinc, strontium, palladium, gold, platinum, nickel, cobalt and combinations thereof.
  • this film 50 consists of, or consists essentially of, titanium dioxide.
  • the second film 50 consists of, or consists essentially of, substoichiometric titanium oxide (TiO x , where x is less than 2).
  • the second film 50 (an entire thickness of which may consist essentially of titania) desirably has (e.g., is deposited at) a physical thickness of less than about 300 angstroms, alternatively less than about 150 angstroms (e.g., between about 30 angstroms and about 150 angstroms), and further alternatively between about 30 angstroms and about 120 angstroms.
  • the second film 50 when provided at these incredibly small thicknesses, particularly when consisting essentially of titanium oxide and provided in combination with a first film consisting essentially of silicon dioxide at the noted thicknesses, provides unexpected maintenance properties (including exceptional characteristics in terms of taking on limited amounts of dirt and other contaminants and providing easy removal of those contaminants that do accumulate on the coating), while at the same time achieving exceptionally low visible reflection, neutral color, and exceptional durability.
  • the second film is a sputtered film deposited at low temperatures (e.g., sputter deposited while maintaining the substrate at less than about 250 degrees Celsius and preferably less than 200 degrees Celsius), and it is especially surprising that a sputtered film of this nature exhibits such exceptional low-maintenance properties.
  • a substrate 10 e.g., a glass sheet having a first major surface 12 directly over which is deposited a first film 30 consisting essentially of silica (e.g., SiO 2 ) at a thickness of between about 70 angstroms and about 120 angstroms, wherein a second film 50 consisting essentially of titania (e.g., TiO 2 ) is deposited directly over the first film 30 at a thickness of between about 30 angstroms and about 300 angstroms.
  • silica e.g., SiO 2
  • titania e.g., TiO 2
  • the first film 30 has a thickness of between about 70 angstroms and about 120 angstroms, perhaps optimally about 100 angstroms, while the second film 50 has a thickness of between about 30 angstroms and about 120 angstroms, perhaps optimally about 100 angstroms.
  • the thickness of the second film 50 is less than 100 angstroms (and optionally less than about 80 angstroms) but greater than about 30 angstroms
  • the first film 30 has a thickness of less than about 300 angstroms (and optionally less than about 100 angstroms) but greater than about 30 angstroms.
  • the first film consists essentially of silica while the second film consists essentially of titania.
  • the second film 50 desirably is the outermost film of the coating.
  • Conventional wisdom in the art would suggest that the thin nature of the present coating 40 would not have enough photoactivity to give desirable self-cleaning properties, especially for embodiments where the second film 50 is sputtered, particularly while maintaining the substrate at a low temperature.
  • the present coating is incredibly effective in keeping windows (e.g., monolithic panes or IG units) free of the particular contaminants that build up on windows during the course of routine production.
  • the present coatings also exhibit advantageous water-sheeting properties, while at the same time having exceptional optical properties and durability.
  • the illustrated substrate 10 is provided with two coatings: the low-maintenance coating 40 on the first surface 12 of the substrate and a low-emissivity coating 80 on the second surface 14 of the substrate.
  • the low-emissivity coating 80 may be positioned on the third surface of the insulated glass unit (the third surface is considered the surface of the second, e.g., inboard, pane that is exposed to the between-pane space of the insulated glass unit).
  • the low-emissivity coating 80 is optional. When provided, any desired low-emissivity coating can be used. Suitable examples of a low-emissivity coating are described in U.S. patent application Ser. No. 09/728,435, entitled “Haze-Resistant Transparent Film Stacks”, the entire teachings of which are incorporated herein by reference.
  • the low-maintenance coating 40 is preferably on the “first” surface of a window.
  • the substrate 10 which may be a glass pane
  • the substrate 10 is a window pane that is mounted on a window frame 95 (e.g., in an exterior wall 98 of a building 99 ).
  • the coated first surface (i.e., the surface 12 on which the coating 40 is provided) of such a window will be exposed to an outdoor environment (e.g., such that the coating 40 will be in periodic contact with rain).
  • the low-maintenance coating is applied to the “fourth” surface of a window (e.g., the #4 surface of a double-pane window unit), optionally in addition to providing the low-maintenance coating 40 on the first surface of the same window.
  • the low-maintenance coating 40 can be provided on only the #1 surface, on only the #2 surface, or on both the #1 and #2 surfaces.
  • the invention also provides methods for producing coated substrates. These methods involve depositing a low-maintenance coating 40 (i.e., by depositing each film 30 , 50 of any embodiment described above) upon a substrate 10 .
  • the low-maintenance coating includes two films. These films 30 , 50 can be deposited by a variety of well known coating techniques.
  • the coating 40 (or at least the second film 50 ) is deposited by sputtering, preferably at a low temperature (e.g., while maintaining the substrate at below about 250 degrees Celsius, and more preferably below 200 degrees Celsius).
  • CVD chemical vapor deposition
  • plasma enhanced chemical vapor deposition plasma enhanced chemical vapor deposition
  • pyrolytic deposition can be used.
  • the present methods involve depositing any of the described coating embodiments by any thin film deposition method, with sputtering being preferred, though not required, for at least the second film 50 and preferably for the whole coating 40 .
  • FIG. 3 depicts an exemplary magnetron sputtering chamber 200 .
  • Magnetron sputtering chambers and related equipment are commercially available from a variety of sources (e.g., Leybold). Useful magnetron sputtering techniques and equipment are described in U.S. Pat. No. 4,166,018, issued to Chapin, the entire teachings of which are incorporated herein by reference.
  • the invention provides methods of producing a coated substrate by sputter depositing onto the substrate each film of any above-described coating embodiment.
  • the sputtering of the coating 40 (or at least the sputtering of the second film 50 ) is carried out while maintaining the substrate at a temperature of less than about 250 degrees Celsius, and more preferably less than 200 degrees Celsius (e.g., without heating the substrate).
  • the low-maintenance coating 40 is applied to a substrate 10 in a multiple-chamber sputtering line.
  • Sputtering lines are well known in the present art.
  • a typical sputtering line includes a series of sputtering chambers aligned and connected such that a sheet-like substrate can be passed from one chamber to the next by conveying the substrate horizontally over spaced-apart transport rollers 210 in each of the chambers (the rollers form a continuous path of substrate travel P through the sputtering line).
  • the substrate is typically conveyed at speeds of between about 100-500 inches per minute.
  • the substrate 10 is positioned at the inlet of the sputtering line and conveyed to a desired coat zone.
  • This coat zone is provided with three cathodes that are adapted to deposit the first film 30 .
  • each of these cathodes comprises a silicon sputtering target.
  • the silicon targets in this coat zone are sputtered in an oxidizing atmosphere to deposit a silicon dioxide film directly upon the first major surface 12 of the substrate.
  • This atmosphere may consist essentially of oxygen (e.g., about 100% O 2 ).
  • this atmosphere may comprise Ar/O 2 (e.g., oxygen and up to about 40% argon).
  • a power of about 38 kW is applied to the first cathode, while a power of about 38 kW is applied to the second cathode, and a power of about 38 kW is applied to the third cathode.
  • the substrate 10 is conveyed beneath all three of these targets at a rate of about 200 inches per minute, while sputtering each of these targets at the noted power level, such that a silicon dioxide film is applied at a thickness of about 100 ⁇ .
  • each silicon target may include some aluminum or another material to enhance the conductivity of the target.
  • the thus coated substrate is then conveyed into a subsequent coat zone.
  • three cathodes are used to deposit the second film 50 .
  • Each of these three cathodes comprises a titanium sputtering target.
  • the titanium targets in this coat zone are sputtered in an oxidizing atmosphere to deposit a titanium dioxide film directly upon the first film 30 .
  • This atmosphere may consist essentially of oxygen. Alternatively, this atmosphere may comprise Ar/O 2 .
  • a power of about 43 kW is applied to the first cathode, a power of about 43 kW is applied to the second cathode, and a power of about 43 kW is applied to the third cathode.
  • the substrate 10 is conveyed beneath all three of these targets at a rate of about 200 inches per minute, while sputtering each of these targets at the noted power level, such that a titanium dioxide film is applied at a thickness of about 100 ⁇ . This titanium dioxide forms the outermost portion (and is exposed) of the coating 40 in the present embodiment.
  • the second major surface 14 of the substrate 10 may previously have been, or may subsequently be, coated with an optional low-emissivity coating 80 .
  • the coat zones just described for use in depositing the first 30 and second 50 films can be a sputter-up coat zones located toward the end of a sputtering line that includes a relatively large number of preceding sputter-down coat zones in which the optional low-emissivity coating 80 may have been applied.
  • Particularly useful sputter-up/sputter-down methods and equipment are described in U.S. patent application Ser. No. 09/868,542, the entire contents of which are incorporated herein by reference.

Abstract

The invention provides a substrate bearing a low-maintenance coating. The coating includes two films: a first film comprising silica (e.g., silicon dioxide) and a second film comprising titania (e.g., titanium dioxide). Preferably, both films are provided within particular thickness ranges. The invention also provides methods of depositing such coatings.

Description

CROSS REFERENCE To RELATED APPLICATIONS
The present application claims priority to provisional U.S. patent application filed Jul. 12, 2004 and assigned Ser. No. 60/587,210, and provisional U.S. patent application filed Mar. 7, 2005 and assigned Ser. No. 60/659,491, the entire disclosures of which are incorporated herein by reference.
FIELD OF THE INVENTION
The present invention provides thin film coatings for glass sheets and other substrates. More particularly, the invention provides thin film coatings including a thin photocatalytic film, such as titania, deposited over a thin base layer, such as silica. The invention also provides methods of depositing such coatings onto glass sheets and other substrates.
BACKGROUND OF THE INVENTION
For many years, it has been known that titanium dioxide can be used as a photocatalyst. A great deal of research has been done with a view toward providing photocatalytic coatings that have self-cleaning properties. The pursuit of self-cleaning photocatalytic window coatings, in particular, has been an active field of exploration. Such coatings typically involve a titanium dioxide layer carried by a glass pane. These coatings are commonly provided with a relatively thick layer of titanium dioxide and/or a specific under-layer system designed for achieving high levels of photoactivity. Thick titanium dioxide layers, unfortunately, produce high levels of visible reflectance, thus creating a somewhat mirror-like appearance. This high visible reflection tends to exaggerate the appearance of dirt on a window. Further, known under-layer systems commonly teach that specific materials and crystal structures must be used for the under-layer film(s) to achieve acceptable photoactivity levels. Moreover, many photocatalytic coating systems teach that heating is required during or after film deposition to achieve acceptable levels of photoactivity.
Known photocatalytic coatings also tend to have properties that are less than ideal for applications in which the coatings are used on windows. As noted above, the visible reflectance of many known photocatalytic coatings is unacceptably high. Moreover, the reflected colors of these coatings tend not to be ideal. Further, some of these coatings have particularly high surface roughness, as they are designed to have large surface areas that facilitate high photoactivity levels. These rough coatings, unfortunately, tend to be quite vulnerable to being abraded. They are also particularly susceptible to taking on and stubbornly retaining dirt and other contaminants, due to their high surface roughness. Finally, with many recent photocatalytic coatings (e.g., those in which complex under-layer systems are used to maximize photoactivity), it is unclear whether these coatings will exhibit the longevity (e.g., in-field durability over time) that is required for number-one-surface coatings.
The present invention provides low-maintenance coatings that offer exceptional durability, exceptional optical properties, reliable production processes, and surprising cleanliness/maintenance properties.
SUMMARY OF THE INVENTION
In certain embodiments, the invention provides a low-maintenance coating on a glass sheet. The low-maintenance coating comprises a first film positioned directly over a first major surface of the glass sheet and a second film positioned directly over the first film. In various embodiments of the present invention, the first film includes a thin base film, (e.g. silica) that has a thickness of less than about 300 angstroms, alternatively less than about 150 angstroms, and further alternatively between about 70 angstroms and about 120 angstroms. The second film in various embodiments of the present invention includes a thin photocatalytic film (e.g. titania) that has a thickness of less than about 300 angstroms, alternatively less than about 150 angstroms, and further alternatively between about 30 angstroms and about 120 angstroms.
In other embodiments, the invention provides a method of depositing a low-maintenance coating. The method comprises depositing a low-maintenance coating on a glass sheet by depositing first film directly over a first major surface of the glass sheet and then depositing a second film directly over the first film. In one embodiment of the present invention, the first film comprises silica and is deposited at a thickness of between about 70 angstroms and about 120 angstroms. The second film comprises titania and is deposited at a thickness of between about 30 angstroms and about 120 angstroms. In some of these embodiments, both films are deposited by sputtering, preferably while maintaining the substrate at a low temperature (e.g., less than about 250 degrees Celsius, and preferably less than 200 degrees Celsius).
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a partially broken-away schematic cross-sectional side view of a substrate bearing a low-maintenance coating in accordance with certain embodiments of the invention;
FIG. 2 is a partially broken-away perspective view of a window pane bearing a low-maintenance coating, the pane is mounted in an exterior wall of a building in accordance with certain embodiments of the invention; and
FIG. 3 is a schematic side end view of a sputtering chamber that is adapted for use in certain methods of the invention.
DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
The following detailed description is to be read with reference to the drawings, in which like elements in different drawings have like reference numerals. The drawings, which are not necessarily to scale, depict selected embodiments and are not intended to limit the scope of the invention. Skilled artisans will recognize that the given examples have many alternatives that fall within the scope of the invention.
In certain embodiments, the invention provides a substrate 10 bearing a low-maintenance coating 40. A variety of substrates are suitable for use in the invention. Preferably, the substrate 10 is a sheet-like substrate having generally or substantially opposed first 12 and second 14 major surfaces. In many embodiments, the substrate is a sheet of transparent material (i.e., a transparent sheet). The substrate, however, is not required to be transparent. For most applications, though, the substrate will comprise a transparent (or at least translucent) material, such as glass or clear plastic. For example, the substrate 10 is a glass sheet (e.g., a window pane) in preferred embodiments. A variety of known glass types can be used, and soda-lime glass is preferred.
Substrates of various sizes can be used in the present invention. Commonly, large-area substrates are used. Certain embodiments involve a substrate 10 having a width of at least about 0.5 meter, preferably at least about 1 meter, perhaps more preferably at least about 1.5 meters (e.g., between about 2 meters and about 4 meters), and in some cases at least about 3 meters.
Substrates of various thicknesses can be used in the present invention. Commonly, substrates (e.g., glass sheets) having a thickness of about 1-5 mm are used. Certain embodiments involve a substrate 10 with a thickness of between about 2.3 mm and about 4.8 mm, and perhaps more preferably between about 2.5 mm and about 4.8 mm. In some cases, a sheet of glass (e.g., soda-lime glass) with a thickness of about 3 mm will be used.
In certain embodiments, the invention provides a substrate 10 bearing a low-maintenance coating 40. The coating 40 is preferably deposited over (e.g., over an entirety of) a major surface 12 of the substrate 10. The low-maintenance coating 40 includes two films: (1) a first film 30 deposited over a major surface 12 of the substrate 10; and (2) a second film 50 deposited over the first film 30.
In various embodiments of the present invention, the first film 30 includes a base film, such as silica (e.g., silicon dioxide), and desirably is deposited directly over the substrate 10 (e.g., directly over a major surface 12 of the substrate). This film preferably consists of, or consists essentially of, silicon dioxide. The silica in the first film 30, however, can include small amounts of an electrically-conductive material, such as aluminum, which may be oxidized in the film 30. For example, this film 30 can be deposited by sputtering a silicon-containing target that includes a small amount of aluminum or another metal that enhances the electrical conductivity of the target. The first film 30 (an entire thickness of which may consist essentially of silica) desirably has (e.g., is deposited at) a physical thickness of less than about 300 angstroms, alternatively less than about 150 angstroms (e.g., between about 40 angstroms and about 150 angstroms), and further alternatively about 70 angstroms and about 120 angstroms. These incredibly small thicknesses facilitate a surprisingly array of exceptional properties in the present coating.
The coating 40 includes a second film 50 that includes a photocatalytic film, such as titania, and desirably is deposited directly over the first film 30. It is noted that one or more photocatalytic materials may be used in embodiments of the present invention including but not limited to oxides of titanium, iron, silver, copper, tungsten, aluminum, zinc, strontium, palladium, gold, platinum, nickel, cobalt and combinations thereof. In preferred embodiments, this film 50 consists of, or consists essentially of, titanium dioxide. In some embodiments though, the second film 50 consists of, or consists essentially of, substoichiometric titanium oxide (TiOx, where x is less than 2). The second film 50 (an entire thickness of which may consist essentially of titania) desirably has (e.g., is deposited at) a physical thickness of less than about 300 angstroms, alternatively less than about 150 angstroms (e.g., between about 30 angstroms and about 150 angstroms), and further alternatively between about 30 angstroms and about 120 angstroms. It has been discovered that the second film 50 when provided at these incredibly small thicknesses, particularly when consisting essentially of titanium oxide and provided in combination with a first film consisting essentially of silicon dioxide at the noted thicknesses, provides unexpected maintenance properties (including exceptional characteristics in terms of taking on limited amounts of dirt and other contaminants and providing easy removal of those contaminants that do accumulate on the coating), while at the same time achieving exceptionally low visible reflection, neutral color, and exceptional durability. Moreover, in preferred embodiments, the second film is a sputtered film deposited at low temperatures (e.g., sputter deposited while maintaining the substrate at less than about 250 degrees Celsius and preferably less than 200 degrees Celsius), and it is especially surprising that a sputtered film of this nature exhibits such exceptional low-maintenance properties.
Certain particular embodiments provide a substrate 10 (e.g., a glass sheet) having a first major surface 12 directly over which is deposited a first film 30 consisting essentially of silica (e.g., SiO2) at a thickness of between about 70 angstroms and about 120 angstroms, wherein a second film 50 consisting essentially of titania (e.g., TiO2) is deposited directly over the first film 30 at a thickness of between about 30 angstroms and about 300 angstroms. In some preferred embodiments of this nature, the first film 30 has a thickness of between about 70 angstroms and about 120 angstroms, perhaps optimally about 100 angstroms, while the second film 50 has a thickness of between about 30 angstroms and about 120 angstroms, perhaps optimally about 100 angstroms.
In a further embodiment, the thickness of the second film 50 is less than 100 angstroms (and optionally less than about 80 angstroms) but greater than about 30 angstroms, while the first film 30 has a thickness of less than about 300 angstroms (and optionally less than about 100 angstroms) but greater than about 30 angstroms. In some cases of this nature, the first film consists essentially of silica while the second film consists essentially of titania.
In the present coating 40, the second film 50 desirably is the outermost film of the coating. Conventional wisdom in the art would suggest that the thin nature of the present coating 40 would not have enough photoactivity to give desirable self-cleaning properties, especially for embodiments where the second film 50 is sputtered, particularly while maintaining the substrate at a low temperature. Surprisingly, though, the present coating is incredibly effective in keeping windows (e.g., monolithic panes or IG units) free of the particular contaminants that build up on windows during the course of routine production. The present coatings also exhibit advantageous water-sheeting properties, while at the same time having exceptional optical properties and durability.
In FIG. 3, the illustrated substrate 10 is provided with two coatings: the low-maintenance coating 40 on the first surface 12 of the substrate and a low-emissivity coating 80 on the second surface 14 of the substrate. It is noted that, alternatively, in an insulating glass unit, the low-emissivity coating 80 may be positioned on the third surface of the insulated glass unit (the third surface is considered the surface of the second, e.g., inboard, pane that is exposed to the between-pane space of the insulated glass unit). The low-emissivity coating 80 is optional. When provided, any desired low-emissivity coating can be used. Suitable examples of a low-emissivity coating are described in U.S. patent application Ser. No. 09/728,435, entitled “Haze-Resistant Transparent Film Stacks”, the entire teachings of which are incorporated herein by reference.
With reference to FIG. 2, the low-maintenance coating 40 is preferably on the “first” surface of a window. This can be appreciated with reference to FIG. 2, which exemplifies embodiments wherein the substrate 10 (which may be a glass pane) is a window pane that is mounted on a window frame 95 (e.g., in an exterior wall 98 of a building 99). In certain applications, the coated first surface (i.e., the surface 12 on which the coating 40 is provided) of such a window will be exposed to an outdoor environment (e.g., such that the coating 40 will be in periodic contact with rain). In another embodiment, the low-maintenance coating is applied to the “fourth” surface of a window (e.g., the #4 surface of a double-pane window unit), optionally in addition to providing the low-maintenance coating 40 on the first surface of the same window. Further, in monolithic windows, the low-maintenance coating 40 can be provided on only the #1 surface, on only the #2 surface, or on both the #1 and #2 surfaces.
The invention also provides methods for producing coated substrates. These methods involve depositing a low-maintenance coating 40 (i.e., by depositing each film 30, 50 of any embodiment described above) upon a substrate 10. As noted above, the low-maintenance coating includes two films. These films 30, 50 can be deposited by a variety of well known coating techniques. In certain particularly preferred embodiments, the coating 40 (or at least the second film 50) is deposited by sputtering, preferably at a low temperature (e.g., while maintaining the substrate at below about 250 degrees Celsius, and more preferably below 200 degrees Celsius). However, other coating techniques, such as chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition, and pyrolytic deposition can be used. Various embodiments of the coating 40 have been described, and the present methods involve depositing any of the described coating embodiments by any thin film deposition method, with sputtering being preferred, though not required, for at least the second film 50 and preferably for the whole coating 40.
Sputtering is well known in the present art. FIG. 3 depicts an exemplary magnetron sputtering chamber 200. Magnetron sputtering chambers and related equipment are commercially available from a variety of sources (e.g., Leybold). Useful magnetron sputtering techniques and equipment are described in U.S. Pat. No. 4,166,018, issued to Chapin, the entire teachings of which are incorporated herein by reference.
In preferred embodiments, the invention provides methods of producing a coated substrate by sputter depositing onto the substrate each film of any above-described coating embodiment. Preferably, the sputtering of the coating 40 (or at least the sputtering of the second film 50) is carried out while maintaining the substrate at a temperature of less than about 250 degrees Celsius, and more preferably less than 200 degrees Celsius (e.g., without heating the substrate).
In favored methods of the invention, the low-maintenance coating 40 is applied to a substrate 10 in a multiple-chamber sputtering line. Sputtering lines are well known in the present art. A typical sputtering line includes a series of sputtering chambers aligned and connected such that a sheet-like substrate can be passed from one chamber to the next by conveying the substrate horizontally over spaced-apart transport rollers 210 in each of the chambers (the rollers form a continuous path of substrate travel P through the sputtering line). The substrate is typically conveyed at speeds of between about 100-500 inches per minute.
In one particular method, the substrate 10 is positioned at the inlet of the sputtering line and conveyed to a desired coat zone. This coat zone is provided with three cathodes that are adapted to deposit the first film 30. In more detail, each of these cathodes comprises a silicon sputtering target. The silicon targets in this coat zone are sputtered in an oxidizing atmosphere to deposit a silicon dioxide film directly upon the first major surface 12 of the substrate. This atmosphere may consist essentially of oxygen (e.g., about 100% O2). Alternatively, this atmosphere may comprise Ar/O2 (e.g., oxygen and up to about 40% argon). A power of about 38 kW is applied to the first cathode, while a power of about 38 kW is applied to the second cathode, and a power of about 38 kW is applied to the third cathode. The substrate 10 is conveyed beneath all three of these targets at a rate of about 200 inches per minute, while sputtering each of these targets at the noted power level, such that a silicon dioxide film is applied at a thickness of about 100 Å. As noted above, each silicon target may include some aluminum or another material to enhance the conductivity of the target.
The thus coated substrate is then conveyed into a subsequent coat zone. In this zone, three cathodes are used to deposit the second film 50. Each of these three cathodes comprises a titanium sputtering target. The titanium targets in this coat zone are sputtered in an oxidizing atmosphere to deposit a titanium dioxide film directly upon the first film 30. This atmosphere may consist essentially of oxygen. Alternatively, this atmosphere may comprise Ar/O2. A power of about 43 kW is applied to the first cathode, a power of about 43 kW is applied to the second cathode, and a power of about 43 kW is applied to the third cathode. The substrate 10 is conveyed beneath all three of these targets at a rate of about 200 inches per minute, while sputtering each of these targets at the noted power level, such that a titanium dioxide film is applied at a thickness of about 100 Å. This titanium dioxide forms the outermost portion (and is exposed) of the coating 40 in the present embodiment.
In the method just described, it is to be appreciated that the second major surface 14 of the substrate 10 may previously have been, or may subsequently be, coated with an optional low-emissivity coating 80. For instance, the coat zones just described for use in depositing the first 30 and second 50 films can be a sputter-up coat zones located toward the end of a sputtering line that includes a relatively large number of preceding sputter-down coat zones in which the optional low-emissivity coating 80 may have been applied. Particularly useful sputter-up/sputter-down methods and equipment are described in U.S. patent application Ser. No. 09/868,542, the entire contents of which are incorporated herein by reference.
While preferred embodiments of the present invention have been described, it should be understood that numerous changes, adaptations, and modifications can be made therein without departing from the spirit of the invention and the scope of the appended claims.

Claims (22)

1. A low-maintenance coating on a glass sheet, the coating comprising a first base film positioned directly over a first major surface of the glass sheet and a second photocatalytic film positioned directly over the first base film, wherein the first base film includes a base film and has a thickness of less than about 100 angstroms, and wherein the second film includes a photocatalytic film and has a thickness of less than about 100 angstroms.
2. The low-maintenance coating of claim 1 wherein the base film is silica.
3. The low-maintenance coating of claim 2 wherein the coated first major surface is in periodic contact with rain.
4. The low-maintenance coating of claim 1 wherein the photocatalytic film is titania.
5. The low-maintenance coating of claim 1 wherein the thickness of the first base film is between about 70 angstroms and about 100 angstroms.
6. The low-maintenance coating of claim 1 wherein the thickness of the second photocatalytic film is between about 30 angstroms and about 120 100 angstroms.
7. The low-maintenance coating of claim 1 wherein the glass sheet is a window pane mounted in a window frame, and wherein the coated first major surface is exposed to an outdoor environment.
8. The low-maintenance coating of claim 1 wherein the first base film consists essentially of silica and the second photocatalytic film consists essentially of titania.
9. The low-maintenance coating of claim 8 wherein the silica is silicon dioxide, and the titania is titanium dioxide or substoichiometric titanium oxide.
10. The low-maintenance coating of claim 1 wherein the first base and second photocatalytic films are both sputtered films.
11. A low-maintenance coating on a glass sheet, the coating comprising a first film positioned directly over a first major surface of the glass sheet and a second film positioned directly over the first film, wherein the first film consists essentially of silica and has a thickness of between about 30 angstroms and about 100 angstroms, and wherein the second film consists essentially of titania and has a thickness of less than 100 angstroms but greater than about 30 angstroms.
12. The low-maintenance coating of claim 11 wherein the second film has a thickness of less than about 80 angstroms.
13. The low-maintenance coating of claim 11 wherein the silica of the first film contains aluminum oxide.
14. The low-maintenance coating of claim 11 wherein the silica of the first film includes an electrically conductive material present in oxidized form.
15. The low-maintenance coating of claim 14 wherein the second film is an outermost film of the coating.
16. The low-maintenance coating of claim 2 wherein the base film further comprises an oxidized electrically conductive material.
17. The low-maintenance coating of claim 16 wherein the electrically conductive material is aluminum.
18. The low-maintenance coating of claim 8 wherein the base film has a thickness of between about 70 angstroms and about 100 angstroms, and the photocatalytic film has a thickness of between about 30 angstroms and about 100 angstroms.
19. A low-maintenance coating on a substrate, the coating comprising a base film extending directly from a first major surface of the substrate to a thickness of less than about 100 angstroms, and a photocatalytic film extending directly from a surface of the base film to a thickness of less than about 100 angstroms.
20. The low-maintenance coating of claim 19 wherein the base film consists essentially of silica and the photocatalytic film consists essentially of titania.
21. The low-maintenance coating of claim 19 wherein the base and photocatalytic films are both sputtered films.
22. The low-maintenance coating of claim 19 wherein the base film extends directly from the first major surface of the substrate to a thickness of between about 70 angstroms and about 100 angstroms, and the photocatalytic film extends directly from the surface of the base film to a thickness of between about 30 angstroms and about 100 angstroms.
US13/271,794 2004-07-12 2011-10-12 Low-maintenance coatings Active 2026-07-01 USRE43817E1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/271,794 USRE43817E1 (en) 2004-07-12 2011-10-12 Low-maintenance coatings

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US58721004P 2004-07-12 2004-07-12
US65949105P 2005-03-07 2005-03-07
US11/179,178 US7713632B2 (en) 2004-07-12 2005-07-12 Low-maintenance coatings
US13/271,794 USRE43817E1 (en) 2004-07-12 2011-10-12 Low-maintenance coatings

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US11/179,178 Reissue US7713632B2 (en) 2004-07-12 2005-07-12 Low-maintenance coatings

Publications (1)

Publication Number Publication Date
USRE43817E1 true USRE43817E1 (en) 2012-11-20

Family

ID=35427555

Family Applications (4)

Application Number Title Priority Date Filing Date
US11/179,178 Ceased US7713632B2 (en) 2004-07-12 2005-07-12 Low-maintenance coatings
US11/179,852 Ceased US7604865B2 (en) 2004-07-12 2005-07-12 Low-maintenance coatings
US13/271,776 Active 2026-10-07 USRE44155E1 (en) 2004-07-12 2011-10-12 Low-maintenance coatings
US13/271,794 Active 2026-07-01 USRE43817E1 (en) 2004-07-12 2011-10-12 Low-maintenance coatings

Family Applications Before (3)

Application Number Title Priority Date Filing Date
US11/179,178 Ceased US7713632B2 (en) 2004-07-12 2005-07-12 Low-maintenance coatings
US11/179,852 Ceased US7604865B2 (en) 2004-07-12 2005-07-12 Low-maintenance coatings
US13/271,776 Active 2026-10-07 USRE44155E1 (en) 2004-07-12 2011-10-12 Low-maintenance coatings

Country Status (7)

Country Link
US (4) US7713632B2 (en)
EP (2) EP1773729B1 (en)
JP (2) JP2008505842A (en)
AT (2) ATE377579T1 (en)
CA (2) CA2570369C (en)
DE (2) DE602005003234T2 (en)
WO (2) WO2006017311A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9738967B2 (en) 2006-07-12 2017-08-22 Cardinal Cg Company Sputtering apparatus including target mounting and control
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
US11008248B2 (en) * 2017-05-04 2021-05-18 Agc Glass Europe Coated substrate
US20210207428A1 (en) * 2018-06-25 2021-07-08 The Regents Of The University Of California Optically-transparent, thermally-insulating nanoporous coatings and monoliths

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040149307A1 (en) * 2002-12-18 2004-08-05 Klaus Hartig Reversible self-cleaning window assemblies and methods of use thereof
DE602005003234T2 (en) 2004-07-12 2008-08-28 Cardinal Cg Co., Eden Prairie MAINTENANCE-FREE COATINGS
EP1797017B1 (en) * 2004-10-04 2010-11-24 Cardinal CG Company Thin film coating and temporary protection technology, insulating glazing units, and associated methods
US7923114B2 (en) 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US8092660B2 (en) 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
US7342716B2 (en) 2005-10-11 2008-03-11 Cardinal Cg Company Multiple cavity low-emissivity coatings
EP2278269B1 (en) 2005-11-07 2016-07-27 Cardinal CG Company Method for identifying photocatalytic coatings
US20070125304A1 (en) * 2005-12-01 2007-06-07 Cardinal Cg Company Transport rollers
US20070231553A1 (en) * 2006-03-28 2007-10-04 Cardinal Cg Company Removable protective cover
WO2007121211A2 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US7989094B2 (en) 2006-04-19 2011-08-02 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
JP2010513175A (en) * 2006-06-30 2010-04-30 カーディナル・シージー・カンパニー Carbon nanotube glazing technology
JP2008233547A (en) * 2007-03-20 2008-10-02 Hoya Corp Lens glass material for on-vehicle camera and lens for on-vehicle camera
WO2009036284A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
FR2948037B1 (en) * 2009-07-17 2012-12-28 Saint Gobain PHOTOCATALYTIC MATERIAL
FR2949774B1 (en) * 2009-09-08 2011-08-26 Saint Gobain MATERIAL COMPRISING A GLASS SUBSTRATE COATED WITH A THIN FILM STACK
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
US11155493B2 (en) 2010-01-16 2021-10-26 Cardinal Cg Company Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods
US9862640B2 (en) 2010-01-16 2018-01-09 Cardinal Cg Company Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
EP2524099B1 (en) * 2010-01-16 2020-09-30 Cardinal CG Company High quality emission control coatings, emission control glazings
US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
US10040719B2 (en) 2012-01-17 2018-08-07 Cardinal Cg Company Low solar transmittance coatings
JP5989802B2 (en) 2012-12-28 2016-09-07 日本板硝子株式会社 Decompression double-glazed glass panel
FR3021966B1 (en) * 2014-06-04 2016-05-27 Saint Gobain GLAZING FOR SOLAR PROTECTION WITH THIN FILM COATINGS
US9752377B2 (en) 2015-03-20 2017-09-05 Cardinal Cg Company Nickel-aluminum blocker film controlled transmission coating
US9745792B2 (en) 2015-03-20 2017-08-29 Cardinal Cg Company Nickel-aluminum blocker film multiple cavity controlled transmission coating
EP3325420B1 (en) 2015-07-23 2020-10-14 Cardinal CG Company Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
WO2017078910A1 (en) 2015-11-06 2017-05-11 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
US9674895B1 (en) 2015-12-15 2017-06-06 Cardinal Cg Company Glazing perimeter anticondensation coating production technology
US9810017B2 (en) * 2015-12-15 2017-11-07 Cardinal Cg Company Glazing perimeter anticondensation coating technology
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
EP4098632A1 (en) 2020-01-10 2022-12-07 Cardinal CG Company Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods

Citations (627)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1256818A (en) 1915-07-26 1918-02-19 Herbert J Nile Protective covering for glass panes.
US2780553A (en) 1955-07-07 1957-02-05 Ohio Commw Eng Co Process of providing a controlled atmosphere containing a heat decomposable metal compound
US2808351A (en) 1952-10-31 1957-10-01 Libbey Owens Ford Glass Co Electrically conducting coated glass or ceramic articles suitable for use as a lens, a window or a windshield, or the like
US3505092A (en) 1968-06-14 1970-04-07 Libbey Owens Ford Co Method for producing filmed articles
US3528906A (en) 1967-06-05 1970-09-15 Texas Instruments Inc Rf sputtering method and system
GB1231280A (en) 1967-12-14 1971-05-12
US3679291A (en) 1970-04-21 1972-07-25 Optical Coating Laboratory Inc Filter with neutral transmitting multilayer coating having asymmetric reflectance
US3727666A (en) 1971-08-16 1973-04-17 Howmet Corp Method of casting using a mold having a refractory coating thereon
US3829197A (en) 1971-10-20 1974-08-13 Balzers Patent Beteilig Ag Antireflective multilayer coating on a highly refractive substrate
US3840451A (en) 1971-10-28 1974-10-08 V Golyanov Method of producing an artificial diamond film
US3844924A (en) 1970-08-03 1974-10-29 Texas Instruments Inc Sputtering apparatus for forming ohmic contacts for semiconductor devices
US3852098A (en) 1972-12-15 1974-12-03 Ppg Industries Inc Method for increasing rate of coating using vaporized reactants
US3854796A (en) 1972-10-19 1974-12-17 Balzers Patent Beteilig Ag Reflection-reducing coating
US3911579A (en) 1971-05-18 1975-10-14 Warner Lambert Co Cutting instruments and methods of making same
US3925182A (en) 1973-09-25 1975-12-09 Shatterproof Glass Corp Method for continuous production of sputter-coated glass products
US3934961A (en) 1970-10-29 1976-01-27 Canon Kabushiki Kaisha Three layer anti-reflection film
GB1426906A (en) 1972-05-17 1976-03-03 Glaverbel Edge protection of vitreous panels
GB1438462A (en) 1973-01-05 1976-06-09 Hoechst Ag Electrode for electrolytic processes
US3968018A (en) 1969-09-29 1976-07-06 Warner-Lambert Company Sputter coating method
US3970037A (en) 1972-12-15 1976-07-20 Ppg Industries, Inc. Coating composition vaporizer
US3990784A (en) 1974-06-05 1976-11-09 Optical Coating Laboratory, Inc. Coated architectural glass system and method
US4012119A (en) 1975-12-12 1977-03-15 Xerox Corporation Direct current liquid crystal display with highly reflecting dielectric mirror
US4029566A (en) 1974-02-02 1977-06-14 Sigri Elektrographit Gmbh Electrode for electrochemical processes and method of producing the same
US4045125A (en) 1974-06-27 1977-08-30 Etat Francias Band filters for use in protective glasses
US4052520A (en) 1974-09-30 1977-10-04 American Optical Corporation Process for coating a synthetic polymer sheet material with a durable abrasion-resistant vitreous composition
US4060660A (en) 1976-01-15 1977-11-29 Rca Corporation Deposition of transparent amorphous carbon films
US4107350A (en) 1972-08-14 1978-08-15 Berg Joseph E Method for depositing film on a substrate
US4130672A (en) 1973-10-16 1978-12-19 Hoya Lens Co., Ltd. Method for coating anti-reflection film on surface of optical material
US4166018A (en) 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US4194022A (en) 1977-07-25 1980-03-18 Ppg Industries, Inc. Transparent, colorless, electrically conductive coating
US4212663A (en) 1978-01-26 1980-07-15 Corning Glass Works Reactants delivery system for optical waveguide manufacturing
US4212903A (en) 1972-11-09 1980-07-15 Basf Aktiengesellschaft Improving the magnetic properties of gamma-iron (III) oxide
US4214014A (en) 1977-12-16 1980-07-22 Titmus Eurocon Kontaklinsen GmbH & Co. KG Method for surface treatment of contact lenses
US4216259A (en) 1979-01-02 1980-08-05 Bfg Glassgroup Heat reflecting pane and a method of producing it
US4238276A (en) 1978-05-19 1980-12-09 Hitachi, Ltd. Process for producing liquid crystal display element
US4252629A (en) 1977-11-26 1981-02-24 Sigri Elektrographit Gmbh Electrode for electrochemical processes especially electrowinning and method for manufacturing same
US4261722A (en) 1979-12-27 1981-04-14 American Glass Research, Inc. Method for applying an inorganic coating to a glass surface
GB1595061A (en) 1976-11-22 1981-08-05 Atomic Energy Authority Uk Electrically conductive layers produced by plasma spraying
US4322276A (en) 1979-06-20 1982-03-30 Deposition Technology, Inc. Method for producing an inhomogeneous film for selective reflection/transmission of solar radiation
US4331526A (en) 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4332922A (en) 1980-07-18 1982-06-01 Titmus Eurocon Process for rendering silicone rubber contact lenses hydrophilic
US4336119A (en) 1981-01-29 1982-06-22 Ppg Industries, Inc. Method of and apparatus for control of reactive sputtering deposition
JPS57140339A (en) 1981-02-24 1982-08-30 Nippon Sheet Glass Co Ltd Removing method for metallic oxide film
JPS57140339U (en) 1981-02-28 1982-09-02
US4351861A (en) 1977-09-23 1982-09-28 Ppg Industries Inc. Deposition of coatings from vaporized reactants
US4356073A (en) 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
GB2028376B (en) 1978-08-23 1982-11-03 Ppg Industries Inc Electrically conductive coatings
US4377613A (en) 1981-09-14 1983-03-22 Gordon Roy G Non-iridescent glass structures
US4422917A (en) 1980-09-10 1983-12-27 Imi Marston Limited Electrode material, electrode and electrochemical cell
US4422916A (en) 1981-02-12 1983-12-27 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4440822A (en) 1977-04-04 1984-04-03 Gordon Roy G Non-iridescent glass structures
US4465575A (en) 1981-09-21 1984-08-14 Atlantic Richfield Company Method for forming photovoltaic cells employing multinary semiconductor films
US4466258A (en) 1982-01-06 1984-08-21 Sando Iron Works Co., Ltd. Apparatus for low-temperature plasma treatment of a textile product
US4466877A (en) 1983-10-11 1984-08-21 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4485146A (en) 1981-08-06 1984-11-27 Asahi Glass Company Ltd Glass body provided with an alkali diffusion-preventing silicon oxide layer
US4486286A (en) 1982-09-28 1984-12-04 Nerken Research Corp. Method of depositing a carbon film on a substrate and products obtained thereby
US4503125A (en) 1979-10-01 1985-03-05 Xebec, Inc. Protective overcoating for magnetic recording discs and method for forming the same
US4504519A (en) 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same
JPS6081048A (en) 1983-10-06 1985-05-09 Toyota Motor Corp Glass having thin titanium nitride film and its manufacture
JPS6081048U (en) 1983-11-07 1985-06-05 株式会社東海理化電機製作所 Manually operated foldable outer mirror
US4556599A (en) 1982-05-20 1985-12-03 Nippon Soken, Inc. Heat reflection film
US4568622A (en) 1983-06-21 1986-02-04 Sanyo Electric Co., Ltd. Electrophotographic photosensitive member and method for making such a member containing amorphous silicon
US4569738A (en) 1983-05-06 1986-02-11 Leybold-Heraeus Gmbh Method of producing amorphous carbon coatings on substrates by plasma deposition
US4571350A (en) 1984-09-24 1986-02-18 Corning Glass Works Method for depositing thin, transparent metal oxide films
US4576864A (en) 1984-01-03 1986-03-18 Rohm Gmbh Chemische Fabrik Water spreading plastic material, method for its manufacture and its use as a glazing and roofing material
JPS6191042A (en) 1984-10-08 1986-05-09 Toyota Motor Corp Anti-fogging glass and its production
JPS6191042U (en) 1984-11-19 1986-06-13
EP0207646A1 (en) 1985-06-28 1987-01-07 The Standard Oil Company Dual ion beam deposition of dense films
US4663234A (en) 1983-03-11 1987-05-05 Agence Spatiale Europeenne Coating capables of resisting to high thermal stress and particularly to coatings for satellites and spatial vessels and to methods for producing those coatings
JPS62161945A (en) 1985-08-20 1987-07-17 Toyo Soda Mfg Co Ltd Production of ceramic sputtering target
US4692428A (en) 1985-12-31 1987-09-08 Exxon Research And Engineering Company Preparation and use of catalysts comprising mixtures of tungsten oxide and silica on alumina
JPS62161945U (en) 1986-04-02 1987-10-15
US4704339A (en) 1982-10-12 1987-11-03 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Infra-red transparent optical components
WO1987006626A1 (en) 1986-05-02 1987-11-05 Deposition Technology, Inc. Sputter-coated thin glass sheeting in roll form and method for continuous production thereof
US4713311A (en) 1982-12-09 1987-12-15 Licentia Patent-Verwaltungs-Gmbh Homogeneous photoconductive layer of amorphous silicon and hydrogen
US4717622A (en) 1985-03-13 1988-01-05 Matsushita Electric Industrial Co., Ltd. Magnetic recording media
US4725345A (en) 1985-04-22 1988-02-16 Kabushiki Kaisha Kenwood Method for forming a hard carbon thin film on article and applications thereof
US4728529A (en) 1984-06-12 1988-03-01 Battelle-Institut E.V. Method of producing diamond-like carbon-coatings
US4732454A (en) 1985-04-22 1988-03-22 Toray Industries, Inc. Light-transmissible plate shielding electromagnetic waves
US4737252A (en) 1981-05-18 1988-04-12 Westinghouse Electric Corp. Method of coating a metallic article of merchandise with a protective transparent film of abrasion-resistance material
GB2201428A (en) 1987-02-02 1988-09-01 Boc Group Inc Transparent coatings by reactive sputtering
US4777090A (en) 1986-11-03 1988-10-11 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
US4780334A (en) 1987-03-13 1988-10-25 General Electric Company Method and composition for depositing silicon dioxide layers
US4798660A (en) 1985-07-16 1989-01-17 Atlantic Richfield Company Method for forming Cu In Se2 films
US4814056A (en) 1987-06-23 1989-03-21 Vac-Tec Systems, Inc. Apparatus for producing graded-composition coatings
US4816127A (en) 1984-11-15 1989-03-28 Xidex Corporation Method of producing thin-film storage disk
JPH0114129Y2 (en) 1985-09-11 1989-04-25
JPH01118807A (en) 1987-11-02 1989-05-11 Hitachi Ltd Production of thin film of titanium oxide
US4834857A (en) 1988-04-01 1989-05-30 Ppg Industries, Inc. Neutral sputtered films of metal alloy oxides
US4838935A (en) 1988-05-31 1989-06-13 Cominco Ltd. Method for making tungsten-titanium sputtering targets and product
US4849081A (en) 1988-06-22 1989-07-18 The Boc Group, Inc. Formation of oxide films by reactive sputtering
US4851095A (en) 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US4854670A (en) 1986-12-17 1989-08-08 Gte Products Corporation Wide angle optical filters
US4859493A (en) 1987-03-31 1989-08-22 Lemelson Jerome H Methods of forming synthetic diamond coatings on particles using microwaves
US4861680A (en) 1988-02-11 1989-08-29 Southwall Technologies Bronze-grey glazing film and window made therefrom
WO1989010430A1 (en) 1988-04-27 1989-11-02 American Thin Film Laboratories, Inc. Vacuum coating system
US4883574A (en) 1987-08-11 1989-11-28 Hartec Gesellschaft Fur Hartstoffe Und Dunnschichttechnik Mbh & Co. Kg Method for applying coatings to objects by means of magnetic field supported reactive cathode sputtering
US4882827A (en) 1987-09-28 1989-11-28 Hoya Corporation Process for producing glass mold
US4894133A (en) 1985-11-12 1990-01-16 Virgle L. Hedgcoth Method and apparatus making magnetic recording disk
US4902580A (en) 1988-04-01 1990-02-20 Ppg Industries, Inc. Neutral reflecting coated articles with sputtered multilayer films of metal oxides
US4915977A (en) 1987-02-26 1990-04-10 Nissin Electric Co., Ltd. Method of forming a diamond film
US4919778A (en) 1985-12-06 1990-04-24 Leybold-Heraeus Gmbh Process for the production of curve glazing with a high transmittance in the visible spectral range and a high reflectance for thermal radiation
US4931315A (en) 1986-12-17 1990-06-05 Gte Products Corporation Wide angle optical filters
US4931213A (en) 1987-01-23 1990-06-05 Cass Richard B Electrically-conductive titanium suboxides
US4931778A (en) 1989-02-27 1990-06-05 Teledyne Industries, Inc. Circuitry for indicating the presence of an overload or short circuit in solid state relay circuits
US4940636A (en) 1987-07-22 1990-07-10 U.S. Philips Corporation Optical interference filter
US4952430A (en) 1985-05-16 1990-08-28 Ppg Industries, Inc. Insulated window units
US4954465A (en) 1988-01-22 1990-09-04 Hitachi, Ltd. Apparatus for removing stink
DE3906453A1 (en) 1989-03-01 1990-09-06 Leybold Ag METHOD FOR COATING SUBSTRATES MADE OF TRANSPARENT MATERIAL, FOR EXAMPLE FROM FLOATGLASS
US4961958A (en) 1989-06-30 1990-10-09 The Regents Of The Univ. Of Calif. Process for making diamond, and doped diamond films at low temperature
US4963240A (en) 1987-03-30 1990-10-16 Kabushiki Kaisha Toshiba Sputtering alloy target and method of producing an alloy film
US4981568A (en) 1988-09-20 1991-01-01 International Business Machines Corp. Apparatus and method for producing high purity diamond films at low temperatures
US4995893A (en) 1988-06-23 1991-02-26 Pilkington Plc Method of making coatings on glass surfaces
US4997576A (en) 1989-09-25 1991-03-05 Board Of Regents, The University Of Texas System Materials and methods for photocatalyzing oxidation of organic compounds on water
US5006248A (en) 1989-10-23 1991-04-09 Wisconsin Alumni Research Foundation Metal oxide porous ceramic membranes with small pore sizes
US5008002A (en) 1989-01-30 1991-04-16 Hoya Corporation Process for producing mold used for obtaining press molded glass article
JPH03122274A (en) 1989-10-05 1991-05-24 Asahi Glass Co Ltd Production of thin film and device thereof
US5020288A (en) 1990-06-12 1991-06-04 Swensen William B Method to protect glass in doors and windows from scratches, abrasion, and painting processes
US5026415A (en) 1988-08-16 1991-06-25 Canon Kabushiki Kaisha Mold with hydrogenated amorphous carbon film for molding an optical element
US5032421A (en) 1990-08-21 1991-07-16 Amp Incorporated Metal coating method
US5035784A (en) 1987-07-27 1991-07-30 Wisconsin Alumni Research Foundation Degradation of organic chemicals with titanium ceramic membranes
JPH03187039A (en) 1989-12-15 1991-08-15 Shin Etsu Chem Co Ltd Magneto-optical recording medium
JPH03193872A (en) 1989-12-21 1991-08-23 Tdk Corp High-frequency sputtering method and production of magnetic recording medium
US5047131A (en) 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
US5071206A (en) 1986-06-30 1991-12-10 Southwall Technologies Inc. Color-corrected heat-reflecting composite films and glazing products containing the same
JPH03122274U (en) 1990-03-28 1991-12-13
US5073450A (en) 1990-12-17 1991-12-17 Ford Motor Company Laminated glazing unit
US5073451A (en) 1989-07-31 1991-12-17 Central Glass Company, Limited Heat insulating glass with dielectric multilayer coating
US5073241A (en) 1986-01-31 1991-12-17 Kabushiki Kaisha Meidenshae Method for carbon film production
US5090985A (en) 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
US5105310A (en) 1990-10-11 1992-04-14 Viratec Thin Films, Inc. Dc reactively sputtered antireflection coatings
US5104539A (en) 1990-08-06 1992-04-14 Wisconsin Alumni Research Foundation Metal oxide porous ceramic membranes with small pore sizes
US5106671A (en) 1990-12-10 1992-04-21 Ford Motor Company Transparent anti-reflective coating
US5107643A (en) 1990-04-10 1992-04-28 Swensen William B Method to protect glass in doors and windows from scratches, abrasion, and painting processes
US5108574A (en) 1991-01-29 1992-04-28 The Boc Group, Inc. Cylindrical magnetron shield structure
US5110637A (en) 1988-03-03 1992-05-05 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5126218A (en) 1985-04-23 1992-06-30 Clarke Robert L Conductive ceramic substrate for batteries
US5139633A (en) 1990-08-08 1992-08-18 Shin-Etsu Chemical Co., Ltd. Film-forming on substrate by sputtering
USRE34035E (en) 1982-02-27 1992-08-18 U.S. Philips Corp. Carbon containing layer
JPH04276066A (en) 1991-03-01 1992-10-01 Matsushita Electric Ind Co Ltd Sputtering system
WO1992017621A1 (en) 1991-04-04 1992-10-15 Conner Peripherals, Inc. Apparatus and method for high throughput sputtering
US5160534A (en) 1990-06-15 1992-11-03 Hitachi Metals Ltd. Titanium-tungsten target material for sputtering and manufacturing method therefor
US5165972A (en) 1984-08-13 1992-11-24 Pilkington Plc Coated glass
US5168003A (en) 1991-06-24 1992-12-01 Ford Motor Company Step gradient anti-iridescent coatings
US5171414A (en) 1990-12-10 1992-12-15 Ford Motor Company Method of making transparent anti-reflective coating
US5176897A (en) 1989-05-01 1993-01-05 Allied-Signal Inc. Catalytic destruction of organohalogen compounds
US5179468A (en) 1991-11-05 1993-01-12 Gte Products Corporation Interleaving of similar thin-film stacks for producing optical interference coatings
US5190807A (en) 1990-10-18 1993-03-02 Diamonex, Incorporated Abrasion wear resistant polymeric substrate product
US5194990A (en) 1991-10-07 1993-03-16 Ford Motor Company Low color purity, anti-reflection coatings for transparent glazings oriented at high angles of incidence
US5196400A (en) 1990-08-17 1993-03-23 At&T Bell Laboratories High temperature superconductor deposition by sputtering
US5201926A (en) 1987-08-08 1993-04-13 Leybold Aktiengesellschaft Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation
US5209996A (en) 1989-07-26 1993-05-11 Shin-Etsu Chemical Co., Ltd. Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same
US5211759A (en) 1991-03-05 1993-05-18 Balzers Aktiengesellschaft Method for a doublesided coating of optical substrates
US5234487A (en) 1991-04-15 1993-08-10 Tosoh Smd, Inc. Method of producing tungsten-titanium sputter targets and targets produced thereby
JPH05214525A (en) 1991-08-28 1993-08-24 Asahi Glass Co Ltd Ceramic rotational cathode target and its manufacture
US5245468A (en) 1990-12-14 1993-09-14 Ford Motor Company Anti-reflective transparent coating
US5254392A (en) 1991-06-24 1993-10-19 Ford Motor Company Anti-iridescence coatings
EP0369581B1 (en) 1988-10-12 1993-12-29 Imperial Chemical Industries Plc Temporary protective aqueous coating composition
EP0574119A3 (en) 1992-04-21 1994-01-19 Kabushiki Kaisha Toshiba Ti-W sputtering target and method of manufacturing the same
US5284539A (en) 1993-04-05 1994-02-08 Regents Of The University Of California Method of making segmented pyrolytic graphite sputtering targets
US5286524A (en) 1991-12-13 1994-02-15 General Electric Company Method for producing CVD diamond film substantially free of thermal stress-induced cracks
US5298338A (en) 1990-06-15 1994-03-29 Hitachi Metals, Ltd. Titanium-tungsten target material and manufacturing method thereof
US5298048A (en) 1991-12-09 1994-03-29 Guardian Industries Corp. Heat treatable sputter-coated glass systems
US5302449A (en) 1992-03-27 1994-04-12 Cardinal Ig Company High transmittance, low emissivity coatings for substrates
US5306547A (en) 1990-12-14 1994-04-26 Southwall Technologies Inc. Low transmission heat-reflective glazing materials
US5306569A (en) 1990-06-15 1994-04-26 Hitachi Metals, Ltd. Titanium-tungsten target material and manufacturing method thereof
US5318830A (en) 1991-05-29 1994-06-07 Central Glass Company, Limited Glass pane with reflectance reducing coating
US5338422A (en) 1992-09-29 1994-08-16 The Boc Group, Inc. Device and method for depositing metal oxide films
US5342676A (en) 1991-11-26 1994-08-30 Saint-Gobain Vitrage International Glass substrate provided with a low emissivity film
US5346600A (en) 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
US5354446A (en) 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US5356718A (en) 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
DE4313284A1 (en) 1993-04-23 1994-10-27 Leybold Ag Slot lock for introducing or discharging substrates from one treatment chamber into an adjacent one
US5366764A (en) 1992-06-15 1994-11-22 Sunthankar Mandar B Environmentally safe methods and apparatus for depositing and/or reclaiming a metal or semi-conductor material using sublimation
JPH06330297A (en) 1993-05-21 1994-11-29 Vacuum Metallurgical Co Ltd Sputtering target for forming dielectric body thin film
US5378527A (en) 1991-02-15 1995-01-03 Toyota Jidosha Kabushiki Kaisha Carbon film coated glass
EP0637572A1 (en) 1993-08-05 1995-02-08 Caradon Everest Limited Coated sheet glass and insulated glazing units
FR2699164B1 (en) 1992-12-11 1995-02-24 Saint Gobain Vitrage Int Method for treating thin layers based on metal oxide or nitride.
US5394269A (en) 1992-11-13 1995-02-28 Central Glass Company, Ltd. Reflectance reducing film and method of forming same on glass substrate
US5397050A (en) 1993-10-27 1995-03-14 Tosoh Smd, Inc. Method of bonding tungsten titanium sputter targets to titanium plates and target assemblies produced thereby
US5401543A (en) 1993-11-09 1995-03-28 Minnesota Mining And Manufacturing Company Method for forming macroparticle-free DLC films by cathodic arc discharge
US5405517A (en) 1993-12-06 1995-04-11 Curtis M. Lampkin Magnetron sputtering method and apparatus for compound thin films
US5415756A (en) 1994-03-28 1995-05-16 University Of Houston Ion assisted deposition process including reactive source gassification
US5417827A (en) 1991-11-29 1995-05-23 Ppg Industries, Inc. Cathode targets of silicon and transition metal
JPH07149545A (en) 1993-09-23 1995-06-13 Saint Gobain Vitrage Transparent base material provided with thin film laminate acting to sunlight and/or infrared ray
US5424130A (en) 1991-05-13 1995-06-13 Toyota Jidosha Kabushiki Kaisha Water repellent glass and process for producing the same
JPH07215074A (en) 1994-02-07 1995-08-15 Toyota Motor Corp Under-cover device for vehicle
JPH07233469A (en) 1994-02-22 1995-09-05 Asahi Glass Co Ltd Target, its production and production of high-refractive-index film
JPH07508491A (en) 1993-04-29 1995-09-21 サン−ゴバン ビトラージュ Window glass with functional conductive and/or low emissivity layer
US5453459A (en) 1992-08-10 1995-09-26 Henkel Corporation Temporary coating system
US5470661A (en) 1993-01-07 1995-11-28 International Business Machines Corporation Diamond-like carbon films from a hydrocarbon helium plasma
JPH07315889A (en) 1994-03-30 1995-12-05 Nippon Sheet Glass Co Ltd Heat shielding glass and its composite material
JPH07315874A (en) 1994-03-30 1995-12-05 Nippon Sheet Glass Co Ltd Heat ray shielding glass
US5476713A (en) 1990-11-07 1995-12-19 Sony Corporation Magneto-optical recording medium
US5482602A (en) 1993-11-04 1996-01-09 United Technologies Corporation Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
JPH0811631A (en) 1994-06-29 1996-01-16 Murakami Kaimeidou:Kk Mirror for vehicle
JPH0812378A (en) 1994-06-30 1996-01-16 Nissan Motor Co Ltd Heat ray cut-off glass and its production
JPH0811631B2 (en) 1990-10-04 1996-02-07 三菱重工業株式会社 Automatic operation device for continuous unloader
JPH0812378B2 (en) 1988-11-01 1996-02-07 株式会社平河工業社 Plate making camera
US5496621A (en) 1993-04-16 1996-03-05 Central Glass Company, Limited Glass pane with reflectance reducing coating and combiner of head-up display system
US5498475A (en) 1990-05-31 1996-03-12 Nippon Sheet Glass Co., Ltd. Coated plastic molded articles
US5507930A (en) 1992-03-20 1996-04-16 Komag, Incorporated Method of sputtering a carbon protective film on a magnetic disk by superimposing an AC voltage on a DC bias voltage
US5512152A (en) 1993-07-15 1996-04-30 Saint Gobain Vitrage Process for preparation of stabilized oxide thin layers
JPH08109043A (en) 1994-10-05 1996-04-30 Nippon Soda Co Ltd Transparent electroconductive film-attached glass having high resistance
US5513039A (en) 1993-05-26 1996-04-30 Litton Systems, Inc. Ultraviolet resistive coated mirror and method of fabrication
US5514485A (en) 1988-03-03 1996-05-07 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
JPH08134638A (en) 1994-11-04 1996-05-28 Asahi Glass Co Ltd Formation of titanium oxide film
US5520996A (en) 1993-04-29 1996-05-28 Saint-Gobain Vitrage Glazing provided with a conducting and/or low emissive functional coating
US5525406A (en) 1993-07-08 1996-06-11 Libbey-Owens-Ford Co. Coatings on glass
US5527755A (en) 1992-04-09 1996-06-18 Consortium Fur Elektrochemische Industrie Gmbh Catalyst for the catalytic afterburning of exhaust gases containing carbon monoxide and/or oxidizable organic compounds
JPH08158048A (en) 1994-09-26 1996-06-18 Asahi Glass Co Ltd Target and its production and formation of film high in refractive index
US5529631A (en) 1989-10-30 1996-06-25 Bridgestone Corporation Apparatus for the continuous surface treatment of sheet material
WO1996025534A1 (en) 1995-02-13 1996-08-22 Deposition Sciences, Inc. Apparatus and method for a reliable return current path for sputtering processes
JPH08227006A (en) 1995-02-22 1996-09-03 Nissan Motor Co Ltd Hydrophilic mirror and its production
US5552180A (en) 1991-11-29 1996-09-03 Ppg Industries, Inc. Multilayer heat processable vacuum coatings with metallic properties
US5558751A (en) 1994-04-20 1996-09-24 Leybold Aktiengesellschaft Dual cathode sputter coating apparatus
US5563734A (en) 1993-04-28 1996-10-08 The Boc Group, Inc. Durable low-emissivity solar control thin film coating
US5589280A (en) 1993-02-05 1996-12-31 Southwall Technologies Inc. Metal on plastic films with adhesion-promoting layer
US5593784A (en) 1993-11-23 1997-01-14 Glaverbel Glazing unit and a method for its manufacture
US5593786A (en) 1994-11-09 1997-01-14 Libbey-Owens-Ford Company Self-adhering polyvinyl chloride safety glass interlayer
US5595813A (en) 1992-09-22 1997-01-21 Takenaka Corporation Architectural material using metal oxide exhibiting photocatalytic activity
US5597622A (en) 1991-08-28 1997-01-28 Leybold Aktiengesellschaft Process for the production of a reflection-reducing coating on lenses
US5599422A (en) 1991-05-30 1997-02-04 Oregon Glass Company Method for producing masked glazing panels
WO1997003763A1 (en) 1995-07-24 1997-02-06 Southwall Technologies Inc. Improved laminate structure and process for its production
US5605609A (en) 1988-03-03 1997-02-25 Asahi Glass Company Ltd. Method for forming low refractive index film comprising silicon dioxide
WO1997007066A1 (en) 1995-08-14 1997-02-27 Libbey-Owens-Ford Co. Glass sheet conveying and bending apparatus
WO1997007069A1 (en) 1995-08-18 1997-02-27 Adam Heller Self-cleaning glass and method of making thereof
US5607723A (en) 1988-10-21 1997-03-04 Crystallume Method for making continuous thin diamond film
WO1997008359A1 (en) 1995-08-23 1997-03-06 Asahi Glass Company Ltd. Target, process for production thereof, and method of forming highly refractive film
US5609924A (en) 1993-12-20 1997-03-11 Libbey-Owens-Ford Co. Method for protecting glass surfaces
US5611899A (en) 1994-11-19 1997-03-18 Leybold Aktiengesellschaft Device for suppressing flashovers in cathode sputtering installations
WO1997010186A1 (en) 1995-09-15 1997-03-20 Saint-Gobain Vitrage Photocatalytic coating substrate
WO1997010185A1 (en) 1995-09-15 1997-03-20 Rhodia Chimie Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions
US5616532A (en) 1990-12-14 1997-04-01 E. Heller & Company Photocatalyst-binder compositions
US5616225A (en) 1994-03-23 1997-04-01 The Boc Group, Inc. Use of multiple anodes in a magnetron for improving the uniformity of its plasma
WO1997011916A1 (en) 1995-09-27 1997-04-03 Glasstech, Inc. Method and apparatus for coating glass sheet ribbon and resultant coated glass sheet
US5618590A (en) 1991-09-20 1997-04-08 Teikoku Piston Ring Co., Ltd. Process for manufacturing a piston ring
US5618388A (en) 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US5620572A (en) 1993-10-25 1997-04-15 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
US5624423A (en) 1994-11-30 1997-04-29 Kimberly-Clark Corporation Absorbent article having barrier means and medial bulge
US5624760A (en) 1991-10-11 1997-04-29 Caradon Doors & Windows Limited - Cet Fire resistant glass
WO1997015499A1 (en) 1995-10-27 1997-05-01 Cal-West Equipment Company, Inc. Polymeric peel-off coating compositions and methods of use thereof
US5633208A (en) 1993-12-01 1997-05-27 Nec Corporation Planarization of insulation film using low wettingness surface
US5635287A (en) 1992-05-26 1997-06-03 Saint-Gobain Vitrage International Pane provided with a functional film
US5643432A (en) 1995-07-13 1997-07-01 Avx Corporation Selective anodization of capacitor anode body
US5643423A (en) 1990-09-27 1997-07-01 Monsanto Company Method for producing an abrasion resistant coated substrate product
US5645699A (en) 1994-09-06 1997-07-08 The Boc Group, Inc. Dual cylindrical target magnetron with multiple anodes
US5645900A (en) 1993-04-22 1997-07-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Diamond composite films for protective coatings on metals and method of formation
WO1997025201A1 (en) 1996-01-11 1997-07-17 Libbey-Owens-Ford Co. Coated glass article having a solar control coating
JPH09189801A (en) 1996-01-09 1997-07-22 Shin Etsu Chem Co Ltd Optical parts with heat resistant antireflection film
JPH09202651A (en) 1996-01-25 1997-08-05 Central Glass Co Ltd Hydrophilic coating membrane and its formation
JPH09249967A (en) 1996-03-14 1997-09-22 Mitsubishi Materials Corp High purity barium-strontium titanate sputtering target material and its production
US5669144A (en) 1991-11-15 1997-09-23 The Gillette Company Razor blade technology
US5674625A (en) 1993-11-10 1997-10-07 Central Glass Company, Limited Multilayered water-repellent film and method of forming same on glass substrate
US5674658A (en) 1994-06-16 1997-10-07 Eastman Kodak Company Lithographic printing plates utilizing an oleophilic imaging layer
WO1997037801A1 (en) 1996-04-10 1997-10-16 Sony Corporation Single phase tungsten-titanium sputter targets and method of producing same
WO1997037946A1 (en) 1996-04-04 1997-10-16 Corning Incorporated Barrier film for hydrogen coloration in glass
FR2738812B1 (en) 1995-09-15 1997-10-17 Saint Gobain Vitrage SUBSTRATE WITH PHOTOCATALYTIC COATING
US5679978A (en) 1993-12-06 1997-10-21 Fujitsu Limited Semiconductor device having resin gate hole through substrate for resin encapsulation
US5679431A (en) 1993-10-08 1997-10-21 Hmt Technology Corporation Sputtered carbon overcoat in a thin-film medium and sputtering method
US5683560A (en) 1995-07-08 1997-11-04 Balzers Und Leybold Deutschland Holding Ag Cathode assembly
US5686372A (en) 1995-05-26 1997-11-11 University Technologies International Inc. Photocatalyst with modified alkyl silicate ester support and process for production thereof
WO1997042357A1 (en) 1996-05-06 1997-11-13 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
WO1997042351A1 (en) 1996-05-03 1997-11-13 Stackpole Limited Making metal powder articles by sintering, spheroidizing and warm forming
US5715103A (en) 1993-08-26 1998-02-03 Canon Kabushiki Kaisha Neutral density (ND) filter
JPH1036144A (en) 1996-07-26 1998-02-10 Murakami Corp Antifogging element
US5719705A (en) 1995-06-07 1998-02-17 Sola International, Inc. Anti-static anti-reflection coating
WO1998006675A1 (en) 1996-08-13 1998-02-19 Pilkington Plc Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
JPH1048805A (en) 1996-07-30 1998-02-20 Toppan Printing Co Ltd Halftone phase shift mask blank and halftone phase shift mask
US5724187A (en) 1994-05-05 1998-03-03 Donnelly Corporation Electrochromic mirrors and devices
US5723172A (en) 1994-03-11 1998-03-03 Dan Sherman Method for forming a protective coating on glass
DE19736925A1 (en) 1996-08-26 1998-03-05 Central Glass Co Ltd Hydrophilic film and method for producing the same on a substrate
US5733660A (en) 1994-05-20 1998-03-31 Central Glass Company, Limited Glass pane with reflectance reducing coating
US5733669A (en) 1995-03-09 1998-03-31 U.S. Philips Corporation Resistive component comprising a CRSI resistive film
US5745291A (en) 1992-07-11 1998-04-28 Pilkington Glass Limited Mirror including a glass substrate and a pyrolytic silicon reflecting layer
US5744215A (en) 1996-01-04 1998-04-28 Ppg Industries, Inc. Reduction of haze in transparent coatings
DE19644752A1 (en) 1996-10-28 1998-04-30 Leybold Systems Gmbh Interference layer system
US5750265A (en) 1996-01-11 1998-05-12 Libbey-Owens-Ford Co. Coated glass article having a pyrolytic solar control coating
US5755867A (en) 1995-12-22 1998-05-26 Shin-Etsu Chemical Co., Ltd. Photocatalytic hydrophilic coating compositions
WO1998023549A1 (en) 1996-11-26 1998-06-04 Saint-Gobain Vitrage Substrate with improved hydrophilic or hydrophobic properties, comprising irregularities
US5763087A (en) 1993-04-16 1998-06-09 Regents Of The University Of California Amorphous diamond films
WO1998025700A1 (en) 1996-12-09 1998-06-18 Toshiba Lighting & Technology Corporation Photocatalyst, light source and lighting device
US5780119A (en) 1996-03-20 1998-07-14 Southwest Research Institute Treatments to reduce friction and wear on metal alloy components
US5780380A (en) 1995-12-21 1998-07-14 Asahi Glass Company Ltd. Photocatalyst composition and process for its production, and photocatalyst composition-attached substrate
US5780149A (en) 1996-09-13 1998-07-14 Libbey-Ownes-Ford Co. Glass article having a solar control coating
FR2738836B1 (en) 1995-09-15 1998-07-17 Rhone Poulenc Chimie SUBSTRATE WITH PHOTOCATALYTIC PROPERTIES BASED ON TITANIUM DIOXIDE AND ORGANIC DISPERSIONS BASED ON TITANIUM DIOXIDE
US5789040A (en) 1997-05-21 1998-08-04 Optical Coating Laboratory, Inc. Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition
EP0771766B1 (en) 1995-11-02 1998-09-09 Guardian Industries Corp. Neutral, high performance, durable low-e glass coating system, insulating glass units made therefrom, and methods of making same
US5812405A (en) 1995-05-23 1998-09-22 Viratec Thin Films, Inc. Three variable optimization system for thin film coating design
US5811191A (en) 1994-12-27 1998-09-22 Ppg Industries, Inc. Multilayer antireflective coating with a graded base layer
US5814195A (en) 1995-04-25 1998-09-29 The Boc Group, Inc. Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
US5820994A (en) 1996-02-16 1998-10-13 Mitsui Chemicals, Inc. Laminate and method for preparing same
JPH10278165A (en) 1997-04-08 1998-10-20 Asahi Glass Co Ltd Manufacture of laminate
US5827490A (en) 1991-09-27 1998-10-27 Noell, Inc. Method for converting urea to ammonia
US5830252A (en) 1994-10-04 1998-11-03 Ppg Industries, Inc. Alkali metal diffusion barrier layer
US5830332A (en) 1995-01-26 1998-11-03 International Business Machines Corporation Sputter deposition of hydrogenated amorphous carbon film and applications thereof
US5830327A (en) 1996-10-02 1998-11-03 Intevac, Inc. Methods and apparatus for sputtering with rotating magnet sputter sources
EP0753882B1 (en) 1995-07-08 1998-11-18 Balzers und Leybold Deutschland Holding Aktiengesellschaft Cathode assembly for a target sputtering device
CA2290999A1 (en) 1997-05-28 1998-12-03 Conny Petersen Plant and process for coating a multi-sided mineral fibre element
US5846613A (en) 1994-11-07 1998-12-08 Neuville; Stephane Method for depositing a hard protective coating
US5849200A (en) 1993-10-26 1998-12-15 E. Heller & Company Photocatalyst-binder compositions
US5853866A (en) 1993-12-10 1998-12-29 Toto Ltd. Multi-functional material with photocalytic functions and method of manufacturing same
DE19831610A1 (en) 1997-07-15 1999-01-21 Central Glass Co Ltd Photocatalytic glass article and process for its manufacture
US5863398A (en) 1996-10-11 1999-01-26 Johnson Matthey Electonics, Inc. Hot pressed and sintered sputtering target assemblies and method for making same
US5866199A (en) 1995-10-31 1999-02-02 Cal-West Equipment Company, Inc. Primer-paint mask composition and methods of use thereof
US5869187A (en) 1996-03-07 1999-02-09 Nissan Motor Co., Ltd. Defogging article and method of producing same
US5869808A (en) 1992-11-09 1999-02-09 American Roller Company Ceramic heater roller and methods of making same
US5871843A (en) 1996-03-27 1999-02-16 Asahi Glass Company Ltd. Laminate and process for its production
EP0799255B1 (en) 1994-12-21 1999-02-17 Union Carbide Chemicals & Plastics Technology Corporation Method for the preparation of water-borne coating compositions using thermoplastic polyhydroxyether resins having narrow polydispersity
US5873203A (en) 1997-09-02 1999-02-23 Ppg Industries, Inc. Photoelectrolytically-desiccating multiple-glazed window units
US5874701A (en) 1992-10-11 1999-02-23 Toto Co., Ltd. Photocatalytic air treatment process under room light
US5877391A (en) 1996-03-05 1999-03-02 Hitachi, Ltd. Method for treating gas containing organohalogen compounds, and catalyst for decomposing the organohalogen compounds
GB2302102B (en) 1995-06-09 1999-03-10 Glaverbel A glazing panel having solar screening properties and a process for making such a panel
EP0901991A2 (en) 1997-08-29 1999-03-17 Central Glass Company, Limited Photocatalytic glass pane and method for producing same
US5888593A (en) 1994-03-03 1999-03-30 Monsanto Company Ion beam process for deposition of highly wear-resistant optical coatings
US5891556A (en) 1995-02-23 1999-04-06 Saint-Gobain Vitrage Transparent substrate with antireflection coating
JPH1195014A (en) 1997-09-19 1999-04-09 Sumitomo Bakelite Co Ltd Conversing sheet for back light
EP0636702B1 (en) 1993-07-28 1999-05-19 Asahi Glass Company Ltd. Methods for producing functional films
US5935716A (en) 1997-07-07 1999-08-10 Libbey-Owens-Ford Co. Anti-reflective films
US5939201A (en) 1996-08-07 1999-08-17 Saint-Gobain Vitrage Method for depositing a reflective layer on glass, and products obtained
US5939194A (en) 1996-12-09 1999-08-17 Toto Ltd. Photocatalytically hydrophilifying and hydrophobifying material
US5939188A (en) 1991-07-15 1999-08-17 Pilkington Aerospace, Inc. Transparent coating systems for improving the environmental durability of transparency substrates
US5948538A (en) 1996-11-21 1999-09-07 Saint-Gobain Village Glazing assembly comprising a substrate provided with a stack of thin layers for solar protection and/or thermal insulation
WO1999044954A1 (en) 1998-03-05 1999-09-10 Saint-Gobain Glass France Substrate with photocatalytic coating
US5962115A (en) 1995-06-08 1999-10-05 Balzers Und Leybold Deutschland Holding Ag Pane of transparent material having a low emissivity
US5961843A (en) 1994-10-05 1999-10-05 Toto Ltd. Antimicrobial solid material, process for producing the same, and method of utilizing the same
US5965246A (en) 1995-06-01 1999-10-12 Saint-Gobain Vitrage Transparent substrates coated with a stack of thin layers having reflection properties in the infrared and/or in the solar radiation range
US5968328A (en) 1996-12-11 1999-10-19 Leybold Systems Gmbh Device for sputter deposition of thin layers on flat substrates
JPH11302038A (en) 1998-04-17 1999-11-02 Nippon Sheet Glass Co Ltd Heat ray reflective light-transmissible plate and heat ray reflective double layer light-transmissible plate using the same
US5981426A (en) 1995-03-02 1999-11-09 University Technologies International Inc. Photocatalyst having an x-ray diffraction pattern which is substanially free of characteristic reflections associated with crystalline TiO2
EP0884288A3 (en) 1997-06-09 1999-11-24 Nissan Motor Company, Limited Hydrophilic article
US5993734A (en) 1998-03-25 1999-11-30 Sony Corporation Method for making W/Ti sputtering targets and products in an inert atmosphere
US6013372A (en) 1995-03-20 2000-01-11 Toto, Ltd. Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with superhydrophilic photocatalytic surface, and method of making thereof
US6027766A (en) 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
WO2000013257A1 (en) 1998-08-26 2000-03-09 Maxon Systems Inc. (London) Ltd. An antenna collar apparatus for operating switches and the like
US6040939A (en) 1998-06-16 2000-03-21 Turkiye Sise Ve Cam Fabrikalari A.S. Anti-solar and low emissivity functioning multi-layer coatings on transparent substrates
WO2000015571A1 (en) 1998-09-17 2000-03-23 Ppg Industries Ohio, Inc. Alkali metal diffusion barrier layer
JP2000094569A (en) 1998-09-24 2000-04-04 Asahi Chem Ind Co Ltd Soil resistant/electromagnetic wave shielding laminate and its production
US6046403A (en) 1997-08-08 2000-04-04 Bridgestone Corporation Solar battery module
US6054227A (en) 1997-03-14 2000-04-25 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning appliances
US6054024A (en) 1996-09-12 2000-04-25 Canon Kabushiki Kaisha Apparatus for forming transparent conductive film by sputtering and method therefor
US6068914A (en) 1996-05-14 2000-05-30 Saint-Gobain Vitrage Glazing pane having an anti-reflection coating
US6071623A (en) 1998-02-13 2000-06-06 Central Glass Company, Limited Hydrophilic article and method for producing same
US6074981A (en) 1996-08-05 2000-06-13 Nippon Sheet Glass Co., Ltd. Photocatalyst and process for the preparation thereof
US6077482A (en) 1994-12-28 2000-06-20 Hitachi, Ltd. Method for treating organohalogen compounds with catalyst
US6077492A (en) 1996-01-22 2000-06-20 Petroleum Energy Center Photocatalyst, process for producing the photocatalyst, and photocatalytic reaction method
WO2000037376A1 (en) 1998-12-21 2000-06-29 Cardinal Ig Company Low-emissivity, soil-resistant coating for glass surfaces
WO2000037377A1 (en) 1998-12-21 2000-06-29 Cardinal Ig Company Soil-resistant coating for glass surfaces
WO2000040402A1 (en) 1998-12-28 2000-07-13 Asahi Glass Company, Limited Layered product
US6090489A (en) 1995-12-22 2000-07-18 Toto, Ltd. Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface
WO2000050354A1 (en) 1999-02-23 2000-08-31 Ineos Acrylics Newton Aycliffe Limited Glass coating
US6114043A (en) 1997-02-10 2000-09-05 Saint-Gobain Vitrage Transparent substrate provided with at least one thin layer based on silicone nitride or oxynitride and the process for obtaining it
US6120747A (en) 1996-12-27 2000-09-19 Nippon Shokubai Co., Ltd. Catalyst for removing organic halogen compounds, preparation method therefor and method for removing organic halogen compounds
EP0639655B1 (en) 1993-07-28 2000-09-27 Asahi Glass Company Ltd. Method and apparatus for sputtering
US6139968A (en) 1995-03-08 2000-10-31 Corion Corporation Multilayer ion plated coatings comprising titanium oxide
US6139803A (en) 1992-11-10 2000-10-31 Toto Co., Ltd. Photocatalytic air treatment process under room light
WO2000027771A9 (en) 1998-11-09 2000-11-09 Ppg Ind Ohio Inc Solar control coatings and coated articles
US6153067A (en) 1998-12-30 2000-11-28 Advanced Ion Technology, Inc. Method for combined treatment of an object with an ion beam and a magnetron plasma with a combined magnetron-plasma and ion-beam source
US6154311A (en) 1998-04-20 2000-11-28 Simtek Hardcoatings, Inc. UV reflective photocatalytic dielectric combiner having indices of refraction greater than 2.0
US6156409A (en) 1996-12-09 2000-12-05 Nippon Sheet Glass Co., Ltd. Non-fogging article and process for the production thereof
WO2000075083A1 (en) 1999-06-03 2000-12-14 Grt, Inc. Treatment of contaminated liquids with oxidizing gases and liquids
WO2000075087A1 (en) 1999-06-08 2000-12-14 Pilkington Plc Process for the production of photocatalytic coatings on substrates
US6165256A (en) 1996-07-19 2000-12-26 Toto Ltd. Photocatalytically hydrophilifiable coating composition
US6165598A (en) 1998-08-14 2000-12-26 Libbey-Owens-Ford Co. Color suppressed anti-reflective glass
US6165616A (en) 1995-06-07 2000-12-26 Lemelson; Jerome H. Synthetic diamond coatings with intermediate bonding layers and methods of applying such coatings
US6171659B1 (en) 1996-07-12 2001-01-09 Recherche et d{acute over (e)}veloppement du groupe Cockerill Sambre, en abr{acute over (e)}g{acute over (e)} Process for the formation of a coating on a substrate and device for the use this process
US6179972B1 (en) 1999-06-02 2001-01-30 Kse, Inc. Two stage process and apparatus for photocatalytic and catalytic conversion of contaminants
US6179971B1 (en) 1999-04-30 2001-01-30 Kse, Inc. Two stage process and catalyst for photocatalytic conversion of contaminants
US6191062B1 (en) 1994-11-16 2001-02-20 Toto Ltd. Photocatalytic functional material and method for producing the same
US6193378B1 (en) 1999-06-25 2001-02-27 Gentex Corporation Electrochromic device having a self-cleaning hydrophilic coating
US6197101B1 (en) 1997-09-12 2001-03-06 Shin-Etsu Chemical Co., Ltd. Coating compositions, method of forming hydrophilic films, and hydrophilic film-coated articles
US6210750B1 (en) 1997-06-26 2001-04-03 Samsung Corning Co., Ltd. Water-repellent glass and process for preparing same
US6228480B1 (en) 1995-06-19 2001-05-08 Nippon Soda Co., Ltd. Photocatalyst-carrying structure and photocatalyst coating material
US6228502B1 (en) 1997-06-24 2001-05-08 Kousei Co., Ltd. Material having titanium dioxide crystalline orientation film and method for producing the same
WO2001032578A1 (en) 1999-11-05 2001-05-10 Saint-Gobain Glass France Transparent substrate provided with a silicon derivative layer
US6238738B1 (en) 1996-08-13 2001-05-29 Libbey-Owens-Ford Co. Method for depositing titanium oxide coatings on flat glass
US6248397B1 (en) 1997-11-04 2001-06-19 Pilkington Plc Method of depositing a silicon oxide coating on glass and the coated glass
US20010007715A1 (en) 2000-01-07 2001-07-12 Takayuki Toyoshima Method of coating substrate and coated article
WO2001002496A3 (en) 1999-07-02 2001-07-12 Ppg Ind Ohio Inc Light-transmitting and/or coated article with removable protective coating and methods of making the same
DE10100221A1 (en) 2000-01-07 2001-07-12 Nippon Sheet Glass Co Ltd Process for coating a substrate comprises sputtering a target material in a vacuum chamber uses a sputtering gas whose composition can be changed
US6261693B1 (en) 1999-05-03 2001-07-17 Guardian Industries Corporation Highly tetrahedral amorphous carbon coating on glass
US6270633B1 (en) 1997-02-14 2001-08-07 Matsushita Electric Industrial Co., Ltd. Artificial latticed multi-layer film deposition apparatus
EP0657562B1 (en) 1993-11-12 2001-09-12 PPG Industries Ohio, Inc. Durable sputtered metal oxide coating
WO2001068786A1 (en) 2000-03-13 2001-09-20 Toto Ltd. Hydrophilic member and method for manufacture thereof
WO2001071055A1 (en) 2000-03-22 2001-09-27 Nippon Sheet Glass Co., Ltd. Substrate with photocatalytic film and method for producing the same
US20010030808A1 (en) 1998-08-06 2001-10-18 Toru Komatsu Anti-fog mirror and method for manufacturing the same
US6319326B1 (en) 1997-12-05 2001-11-20 Korea Institute Of Science And Technology Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
US6329060B1 (en) 1999-11-10 2001-12-11 Ppg Industries Ohio, Inc. Solvent-free film-forming compositions for clearcoats, coated substrates and method related thereto
US6329925B1 (en) 1999-11-24 2001-12-11 Donnelly Corporation Rearview mirror assembly with added feature modular display
US6333084B1 (en) 1994-09-09 2001-12-25 Southwall Technologies, Inc. Double-sided reflector films
US6335479B1 (en) 1998-10-13 2002-01-01 Dai Nippon Printing Co., Ltd. Protective sheet for solar battery module, method of fabricating the same and solar battery module
US6336998B1 (en) 1998-10-07 2002-01-08 Chung Shan Institute Of Science And Technology UV lamp device for air cleaning
US20020012779A1 (en) 2000-05-11 2002-01-31 Ichikoh Industries, Ltd. Visible light response type phptocatalyst
US20020014634A1 (en) 2000-07-26 2002-02-07 Masato Koyama Semiconductor device and method of manufacturing the same
US20020016250A1 (en) 1995-03-20 2002-02-07 Makoto Hayakawa Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with a superhydrophilic photocatalytic surface, and method of making thereof
US6350397B1 (en) 1999-03-10 2002-02-26 Aspen Research Corporation Optical member with layer having a coating geometry and composition that enhance cleaning properties
US6354109B1 (en) 1995-07-12 2002-03-12 Saint-Gobain Glass France Process and apparatus for providing a film with a gradient
WO2002024971A1 (en) 2000-09-20 2002-03-28 Saint-Gobain Glass France Substrate with photocatalytic coating
US6365014B2 (en) 1991-11-29 2002-04-02 Ppg Industries Ohio, Inc. Cathode targets of silicon and transition metal
US6365010B1 (en) 1998-11-06 2002-04-02 Scivac Sputtering apparatus and process for high rate coatings
US6368668B1 (en) 1998-07-30 2002-04-09 Toto Ltd. Method and apparatus for producing a photocatalytic material
US6368664B1 (en) 1999-05-03 2002-04-09 Guardian Industries Corp. Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon
US20020045073A1 (en) 2000-08-31 2002-04-18 Finley James J. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US20020046945A1 (en) 1999-10-28 2002-04-25 Applied Materials, Inc. High performance magnetron for DC sputtering systems
US6379746B1 (en) 1999-02-02 2002-04-30 Corning Incorporated Method for temporarily protecting glass articles
US6379776B1 (en) 1996-12-18 2002-04-30 Nippon Sheet Glass Co., Ltd. Nonfogging and stainproof glass articles
US6387844B1 (en) 1994-10-31 2002-05-14 Akira Fujishima Titanium dioxide photocatalyst
EP0737513B1 (en) 1994-10-31 2002-05-29 Kanagawa Academy Of Science And Technology Titanium oxide photocatalyst structure and method of manufacturing the same
US6403686B1 (en) 2000-04-11 2002-06-11 W.R. Grace & Co. - Conn. Rheologically-dynamic, liquid-applicable elastomeric compositions
US6403689B1 (en) 1997-07-22 2002-06-11 Rhodia Chimie Dispersion of titanium particles comprising a binder based on polyorgansiloxane
WO2002049980A1 (en) 2000-12-21 2002-06-27 Ferro Gmbh Substrates with a self-cleaning surface, a process for their production and their use
US6414213B2 (en) 1999-01-07 2002-07-02 Showa Denko K.K. Titanium oxide particle-coated interior member or indoor equipment
US6419800B2 (en) 2000-01-19 2002-07-16 Nippon Sheet Glass Co., Ltd. Film-forming apparatus and film-forming method
US6425670B1 (en) 1999-11-12 2002-07-30 Murakami Corporation Colored anti-fog mirror
US20020102352A1 (en) 1999-12-02 2002-08-01 Klaus Hartig Haze-resistant transparent film stacks
US6428172B1 (en) 1999-11-24 2002-08-06 Donnelly Corporation Rearview mirror assembly with utility functions
US6436542B1 (en) 1999-07-14 2002-08-20 Nippon Sheet Glass Co., Ltd. Multilayer structure and process for producing the same
US6461686B1 (en) 1996-01-05 2002-10-08 Bekaert Vds Sputtering targets and method for the preparation thereof
US6464951B1 (en) 2002-04-20 2002-10-15 Kse, Inc. Method, catalyst, and photocatalyst for the destruction of phosgene
US6468428B1 (en) 1996-02-28 2002-10-22 Hoya Corporation Glass material for carrying a photocatalyst, filter device using the same and light irradiating method
US20020155265A1 (en) 1998-02-19 2002-10-24 Hyung-Chul Choi Antireflection film
US20020155299A1 (en) 1997-03-14 2002-10-24 Harris Caroline S. Photo-induced hydrophilic article and method of making same
US20020172775A1 (en) 2000-10-24 2002-11-21 Harry Buhay Method of making coated articles and coated articles made thereby
US6488824B1 (en) 1998-11-06 2002-12-03 Raycom Technologies, Inc. Sputtering apparatus and process for high rate coatings
US20020189938A1 (en) 2001-03-16 2002-12-19 4Wave, Inc. System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals
US6500690B1 (en) 1999-10-27 2002-12-31 Kaneka Corporation Method of producing a thin-film photovoltaic device
WO2003006393A1 (en) 2001-07-13 2003-01-23 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
WO2003012540A1 (en) 2001-07-26 2003-02-13 Murakami Corporation Antiglare anticlouding device and automotive outer mirror
US20030038028A1 (en) 2001-08-17 2003-02-27 W. C. Heraeus Gmbh & Co. Kg Sputter target based on titanium dioxide
US20030039843A1 (en) 1997-03-14 2003-02-27 Christopher Johnson Photoactive coating, coated article, and method of making same
US20030043464A1 (en) 2001-08-30 2003-03-06 Dannenberg Rand David Optical coatings and associated methods
US20030054177A1 (en) 2001-09-20 2003-03-20 National Inst. Of Advanced Ind. Science And Tech. Multifunctional energy efficient window coating
US20030064231A1 (en) 1999-06-08 2003-04-03 Hurst Simon James Coated substrates
US6570709B2 (en) 2000-07-27 2003-05-27 Asahi Glass Company, Limited Substrate provided with antireflection films and its production method
US6576344B1 (en) 1998-09-30 2003-06-10 Nippon Sheet Glass Co., Ltd. Photocatalyst article, anti-fogging, anti-soiling articles, and production method of anti-fogging, anti-soiling articles
US6582839B1 (en) 1999-09-02 2003-06-24 Central Glass Company, Limited Article with photocatalytic film
WO2003053577A1 (en) 2001-12-21 2003-07-03 Nippon Sheet Glass Co., Ltd. Member having photocatalytic function and method for manufacture thereof
US6596664B2 (en) 2000-04-20 2003-07-22 Kse, Inc. Method, catalyst, and photocatalyst for the destruction of phosgene
US20030143437A1 (en) 2002-01-31 2003-07-31 Fuji Xerox Co., Ltd. Titanium oxide photocatalyst thin film and production method of titanium oxide photocatalyst thin film
US20030152780A1 (en) 2000-04-01 2003-08-14 Martin Baumann Glass ceramic and metal substrates with a self-cleaning surface, method for the production and use thereof
WO2003068500A1 (en) 2002-02-11 2003-08-21 Ppg Industries Ohio, Inc. Solar control coating
WO2003072849A1 (en) 2002-02-22 2003-09-04 Afg Industries, Inc. Method of making self-cleaning substrates
WO2003080530A1 (en) 2002-03-26 2003-10-02 Nippon Sheet Glass Company, Limited Glass substrate and process for producing the same
US20030186089A1 (en) 2002-03-27 2003-10-02 Murakami Corporation Composite material
US6635155B2 (en) 2000-10-20 2003-10-21 Asahi Glass Company, Limited Method for preparing an optical thin film
WO2003087002A1 (en) 2002-04-17 2003-10-23 Saint-Gobain Glass France Substrate with a self-cleaning coating
WO2003087005A1 (en) 2002-04-17 2003-10-23 Saint-Gobain Glass France Substrate with a self-cleaning coating
JP2003311157A (en) 2002-04-18 2003-11-05 Toyota Central Res & Dev Lab Inc Metal oxide photocatalytic body and manufacturing method therefor
WO2003093188A1 (en) 2002-05-03 2003-11-13 Ppg Industries Ohio, Inc. Substrate having thermal management coating for an insulating glass unit
US20030215647A1 (en) 2002-04-05 2003-11-20 Murakami Corporation Composite material
WO2003095385A1 (en) 2002-04-25 2003-11-20 Ppg Industries Ohio, Inc. Methods of changing the visible light transmittance of coated articles and coated articles made thereby
EP1046727A3 (en) 1999-04-23 2003-11-26 Nippon Sheet Glass Co. Ltd. Method of film deposition on substrate surface and substrate produced by the method
WO2003097549A1 (en) 2002-05-14 2003-11-27 Pilkington North America, Inc. Reflective, solar control coated glass article
US20030224620A1 (en) 2002-05-31 2003-12-04 Kools Jacques C.S. Method and apparatus for smoothing surfaces on an atomic scale
US6660365B1 (en) 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
WO2003106732A1 (en) 2002-06-17 2003-12-24 日本板硝子株式会社 Article coated with titanium compound film, process for producing the article and sputtering target for use in the film coating
US20030235720A1 (en) 2000-08-31 2003-12-25 Athey Pat Ruzakowski Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
EP1375444A1 (en) 1997-03-14 2004-01-02 PPG Industries Ohio, Inc. Photocatalytically-activated self-cleaning appliances
US6673738B2 (en) 2001-11-28 2004-01-06 K.K. Ueda Shikimono Kojyo Photocatalytic active carbon, colored photocatalytic active carbon, coloring active carbon, and deodorant and adsorption product using them
US20040005466A1 (en) 2000-07-12 2004-01-08 Daisuke Arai Photocatalytic member
US20040020761A1 (en) 2002-05-06 2004-02-05 Guardian Industries Corp. Sputter coating apparatus including ion beam source(s), and corresponding method
WO2003062166A3 (en) 2002-01-25 2004-03-11 Saint Gobain Treatment of organic pollution on an inorganic substrate
US20040063320A1 (en) 2002-09-30 2004-04-01 Hollars Dennis R. Manufacturing apparatus and method for large-scale production of thin-film solar cells
US6716323B1 (en) 1999-02-12 2004-04-06 Pilkington Plc Coating glass
WO2004034105A1 (en) 2002-10-10 2004-04-22 Glaverbel Hydrophilic reflective article
US6730630B2 (en) 2000-10-20 2004-05-04 Sumitomo Chemical Company, Limited Photocatalyst, process for producing the same and photocatalyst coating composition comprising the same
WO2004013376A3 (en) 2002-07-30 2004-05-06 Saint Gobain Titania coatings by plasma cvd at atmospheric pressure
US6743749B2 (en) 2000-01-27 2004-06-01 Kabushiki Kaisha Toyota Chuo Kenkyusho Photocatalyst
US20040115362A1 (en) 2002-01-14 2004-06-17 Klause Hartig Photocatalytic sputtering targets and methods for the production and use thereof
US6761984B2 (en) 1999-12-21 2004-07-13 Nippon Sheet Glass Co., Ltd. Article coated with photocatalyst film, method for preparing the article and sputtering target for use in coating with the film
US20040140198A1 (en) 2003-01-15 2004-07-22 Jun-Sik Cho Method of forming ITO film
WO2004061151A1 (en) 2002-12-31 2004-07-22 Cardinal Cg Company Coater having substrate cleaning device and coating deposition methods employing such coater
US6770321B2 (en) 2002-01-25 2004-08-03 Afg Industries, Inc. Method of making transparent articles utilizing protective layers for optical coatings
US20040149307A1 (en) 2002-12-18 2004-08-05 Klaus Hartig Reversible self-cleaning window assemblies and methods of use thereof
WO2004067464A1 (en) 2003-01-28 2004-08-12 Philips Intellectual Property & Standards Gmbh Method of producing transparent titanium oxide coatings having a rutile structure
US20040163945A1 (en) 2002-12-18 2004-08-26 Klaus Hartig Plasma-enhanced film deposition
US6787199B2 (en) 2000-11-24 2004-09-07 Murakami Corporation Composite device and manufacturing method therefor
WO2003050056A8 (en) 2001-12-08 2004-09-10 Pilkington Plc Self-cleaning glazing sheet
US20040180216A1 (en) 2003-03-11 2004-09-16 Veerasamy Vijayen S. Coated article including titanium oxycarbide and method of making same
US20040180220A1 (en) 2001-05-16 2004-09-16 Lethicia Gueneau Substrate with a photocatalytic coating
US20040179978A1 (en) 2001-10-18 2004-09-16 Takeshi Kobayashi Photocatalytic material and uses thereof
US6794065B1 (en) 1999-08-05 2004-09-21 Kabushiki Kaisha Toyota Chuo Kenkyusho Photocatalytic material and photocatalytic article
EP1074525B1 (en) 1999-08-05 2004-09-29 Nippon Sheet Glass Co., Ltd. Article having photocatalytic activity
US6800182B2 (en) 1999-10-13 2004-10-05 Asahi Glass Company, Limited Sputtering target, process for its production and film forming method
US6800183B2 (en) 2001-11-05 2004-10-05 Anelva Corporation Sputtering device
WO2004085701A1 (en) 2003-03-25 2004-10-07 Pilkington Plc Titania coatings
US20040196580A1 (en) 2003-04-03 2004-10-07 Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho Reflecting mirror
US6804048B2 (en) 1994-12-23 2004-10-12 Saint-Gobain Glass France Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
US20040202890A1 (en) 2003-04-08 2004-10-14 Kutilek Luke A. Methods of making crystalline titania coatings
WO2004089836A1 (en) 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and process for its production
US20040206024A1 (en) 2001-08-28 2004-10-21 Wolfgang Graf System comprising a glazing element and a gas supply device
WO2004089839A1 (en) 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and process for its production
WO2004089838A1 (en) 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and optical material for euv lithography
US20040214010A1 (en) 1999-12-28 2004-10-28 Kenji Murata Glass for use in freezers/refrigerator and glass article using said glass
US6811856B2 (en) 2001-04-12 2004-11-02 Creavis Gesellschaft Fuer Technologie Und Innovation Mbh Properties of structure-formers for self-cleaning surfaces, and the production of the same
WO2004085699A3 (en) 2003-03-25 2004-11-04 Bekaert Vds Contacting of an electrode with a device in vacuum
US20040219348A1 (en) 2001-07-25 2004-11-04 Catherine Jacquiod Substrate coated with a composite film, method for making same and uses thereof
US20040241040A1 (en) 2003-05-30 2004-12-02 Di Wei Tungsten oxide/titanium dioxide photocatalyst for improving indoor air quality
US20040241490A1 (en) 2003-03-28 2004-12-02 Finley James J. Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal
US6829084B2 (en) 1999-11-05 2004-12-07 Asahi Glass Company, Limited Ultraviolet and vacuum ultraviolet antireflection substrate
US20040248725A1 (en) 2001-09-28 2004-12-09 Junji Hiraoka Photocatalyst element, method and device for preparing the same
WO2003091471A3 (en) 2002-04-25 2004-12-09 Ppg Ind Ohio Inc Coated articles having a protective coating and cathode targets for making the coated articles
US20040247901A1 (en) 2003-06-05 2004-12-09 Fuji Photo Film Co., Ltd. Plastic optical elements
US20040253471A1 (en) 2003-05-30 2004-12-16 Thiel James P. Appliance with coated transparency
US20040253382A1 (en) 2001-08-13 2004-12-16 Wilmert De Bosscher Sputter target
WO2004108619A1 (en) 2003-06-06 2004-12-16 Pilkington Plc Coated glass
WO2004113064A1 (en) 2003-06-20 2004-12-29 Nippon Sheet Glass Co., Ltd. Member having photocatalytic activity and multilayered glass
WO2005005337A1 (en) 2003-07-01 2005-01-20 Pilkington North America, Inc. Process for chemical vapor deposition of a nitrogen-doped titanium oxide coating
WO2005007286A1 (en) 2003-07-16 2005-01-27 Profine Gmbh Photocatalytically active coating of a substrate
US20050016835A1 (en) 1998-12-21 2005-01-27 Cardinal Cg Company Soil-resistant coating for glass surfaces
US20050020444A1 (en) 2001-11-29 2005-01-27 Junji Hiraoka Method and apparatus for producing photocatalyst
US20050019505A1 (en) 2001-10-16 2005-01-27 Nitto Denko Corporation Method of producing polarizing plate, and liquid crystal display comprising the polarizing plate
US20050031876A1 (en) 2003-07-18 2005-02-10 Songwei Lu Nanostructured coatings and related methods
WO2005012593A1 (en) 2003-07-01 2005-02-10 Saint-Gobain Glass France Method for deposition of titanium oxide by a plasma source
WO2004097063A3 (en) 2003-04-25 2005-02-24 Asahi Glass Co Ltd Method for producing silicon oxide film and method for producing optical multilayer film
US20050042375A1 (en) 2002-02-28 2005-02-24 Japan Science And Technology Agency Titania nanosheet alignment thin film, process for producing the same and article including the titania nanosheet alignment thin film
US20050044894A1 (en) 2003-08-29 2005-03-03 Douglas Nelson Deposition of silica coatings on a substrate
US20050051422A1 (en) 2003-02-21 2005-03-10 Rietzel James G. Cylindrical magnetron with self cleaning target
US6869644B2 (en) 2000-10-24 2005-03-22 Ppg Industries Ohio, Inc. Method of making coated articles and coated articles made thereby
US6870657B1 (en) 1999-10-11 2005-03-22 University College Dublin Electrochromic device
US6878242B2 (en) 2003-04-08 2005-04-12 Guardian Industries Corp. Segmented sputtering target and method/apparatus for using same
US6881701B2 (en) 2000-03-21 2005-04-19 3M Innovative Properties Company Photocatalytic composition and method for preventing algae growth on building materials
WO2005040058A1 (en) 2003-10-23 2005-05-06 Saint-Gobain Glass France Substrate, in particular glass substrate, supporting at least one stack of a photocatalytic layer and a sublayer for the heteroepitaxial growth of said layer
US6890656B2 (en) 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
US20050106397A1 (en) 1999-05-18 2005-05-19 Krisko Annette J. Carbon based soil resistant coatings for glass surfaces
US6908881B1 (en) 1998-08-21 2005-06-21 Ecodevice Laboratory Co., Ltd. Visible radiation type photocatalyst and production method thereof
US20050137084A1 (en) 2003-12-22 2005-06-23 Krisko Annette J. Graded photocatalytic coatings
WO2005040056A3 (en) 2003-10-23 2005-06-30 Saint Gobain Substrate, in particular glass substrate, supporting a photocatalytic layer coated with a protective thin layer
WO2004108846A3 (en) 2003-06-05 2005-07-14 Chemetall Gmbh Coating system for glass surfaces, method for the production and use thereof
US6921579B2 (en) 2000-09-11 2005-07-26 Cardinal Cg Company Temporary protective covers
JP2005213585A (en) 2004-01-29 2005-08-11 Konica Minolta Opto Inc Magnetron sputtering apparatus
US20050191522A1 (en) 2002-08-29 2005-09-01 Nippon Sheet Glass Co., Ltd. Article coated with zirconium compound film, method for preparing the article and sputtering target for use in coating with the film
US20050191505A1 (en) 2002-07-09 2005-09-01 Institut Fuer Neue Materialien Gemeinnuetzige Gmbh Substrates comprising a photocatalytic TiO2 layer
US6952299B1 (en) 2002-08-29 2005-10-04 Murakami Corporation Electrochromic device
WO2005000758A3 (en) 2003-06-27 2005-10-13 Saint Gobain Dielectric-layer-coated substrate and installation for production thereof
US20050227008A1 (en) 2002-03-25 2005-10-13 Katsumi Okada Titanium oxide photocatalyst, process for producing the same and application
US20050233893A1 (en) 2004-03-17 2005-10-20 Sumitomo Chemical Company, Limited Coating composition of photocatalyst
US20050244678A1 (en) 1999-11-10 2005-11-03 Denglas Technologies, L.L.C. Niobium oxide-based layers for thin film optical coatings and processes for producing the same
US6962759B2 (en) 2001-10-22 2005-11-08 Ppg Industries Ohio, Inc. Method of making coated articles having an oxygen barrier coating and coated articles made thereby
US20050247555A1 (en) 2004-05-06 2005-11-10 Thiel James P MSVD coating process
US20050248824A1 (en) 2002-12-24 2005-11-10 Murakami Corporation Electrochromic element
US20050258030A1 (en) 2004-04-27 2005-11-24 Finley James J Effects of methods of manufacturing sputtering targets on characteristics of coatings
US20050266248A1 (en) 2004-05-28 2005-12-01 Millero Edward R Multi-layer coatings and related methods
US6974629B1 (en) 1999-08-06 2005-12-13 Cardinal Cg Company Low-emissivity, soil-resistant coating for glass surfaces
WO2005009914A3 (en) 2003-07-23 2005-12-22 Saint Gobain Method for preparing a photocatalytic coating integrated into glazing heat treatment
US20060003545A1 (en) 2003-12-15 2006-01-05 Guardian Industries Corp. Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
WO2006004169A1 (en) 2004-07-01 2006-01-12 Asahi Glass Company, Limited Silica glass containing tio2 and process for its production
US20060014027A1 (en) 2004-07-14 2006-01-19 Afg Industries, Inc. Silicon oxycarbide coatings having durable hydrophilic properties
US20060011945A1 (en) 2001-10-29 2006-01-19 Valerie Spitzer-Keller Photocatalyst and process for purifying gas effluent by photocatalytic oxidation
US20060029813A1 (en) 2004-08-09 2006-02-09 Kutilek Luke A Coated substrates that include an undercoating
US20060031681A1 (en) 2004-08-05 2006-02-09 Motorola, Inc. Method and system for controlling access to a wireless client device
WO2006017349A1 (en) 2004-07-12 2006-02-16 Cardinal Cg Company Low-maintenance coatings
US7005188B2 (en) 1999-05-20 2006-02-28 Saint-Gobain Transparent substrate with an antireflection, low-emissivity or solar-protection coating
WO2005102953A3 (en) 2004-04-09 2006-03-02 Saint Gobain Substrate, such as a glass substrate, bearing a layer with photocatalytic properties which has been modified to absorb photons in the visible spectrum
US7011691B2 (en) 2002-08-30 2006-03-14 Sumitomo Metal Mining Co. Ltd. Oxide sintered body
US20060055513A1 (en) 2003-12-22 2006-03-16 James French Control system
WO2006028729A1 (en) 2004-09-01 2006-03-16 Ppg Industries Ohio, Inc. Metal based coating composition and related coated substrates
US7022416B2 (en) 2001-11-08 2006-04-04 Nippon Sheet Glass Company, Limited Article coated with coating film, and functional article coated with coating film using the same
US20060070869A1 (en) 2004-10-04 2006-04-06 Krisko Annette J Thin film coating and temporary protection technology, insulating glazing units, and associated methods
WO2006036605A1 (en) 2004-09-27 2006-04-06 Guardian Industries Corp. Method of making heat treated coated glass article, and intermediate product used in same
WO2005110937A3 (en) 2004-05-10 2006-04-06 Saint Gobain Substrate having a photocatalytic coating
US20060090996A1 (en) 2004-11-03 2006-05-04 Nano-Proprietary, Inc. Photocatalytic process
US20060105103A1 (en) 2004-11-15 2006-05-18 Klaus Hartig Methods and equipment for depositing coatings having sequenced structures
US20060107599A1 (en) 2004-11-24 2006-05-25 Guardian Industries Corp. Flush-mounted slider window for pick-up truck with hydrophilic coating on interior surface thereof, and method of making same
US20060110605A1 (en) 2004-11-24 2006-05-25 Guardian Industries Corp. Hydrophilic coating and method of making same
WO2006054954A1 (en) 2004-11-22 2006-05-26 Water And Environmental Technologies Pte. Ltd Fabrication of a densely packed nano-structured photocatalyst for environmental applications
US20060118406A1 (en) 2004-12-08 2006-06-08 Energy Photovoltaics, Inc. Sputtered transparent conductive films
US20060121315A1 (en) 2004-12-03 2006-06-08 Kari Myli Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US7060643B2 (en) 2000-12-28 2006-06-13 Showa Denko Kabushiki Kaisha Photo-functional powder and applications thereof
US20060127604A1 (en) 2004-12-15 2006-06-15 Nippon Sheet Glass Company, Ltd. Optical film
US20060134322A1 (en) 2004-12-20 2006-06-22 Harris Caroline S Substrates coated with a polycrystalline functional coating
WO2006064059A1 (en) 2004-12-16 2006-06-22 Glaverbel Substrate with antimicrobial properties
US20060134436A1 (en) 2004-12-17 2006-06-22 Afg Industries, Inc. Air oxidizable scratch resistant protective layer for optical coatings
WO2004086104A8 (en) 2003-03-25 2006-06-29 Organization Of Shinshu Univer Anti-reflection coating
US20060159906A1 (en) 1999-05-25 2006-07-20 Saint-Gobain Glass France Transparent glazing and use thereof in a chilling chamber door comprising in particular a glazing under vacuum
WO2006077839A1 (en) 2005-01-18 2006-07-27 Nippon Shokubai Co., Ltd. Visible light-responsive photocatalyst composition and process for producing the same
WO2005102952A3 (en) 2004-04-13 2006-08-24 Saint Gobain Photocatalytic substrate active under a visible light
WO2006089964A1 (en) 2005-02-28 2006-08-31 Glaverbel Substrate for hydrophobic coating
US20060196765A1 (en) 2005-03-07 2006-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Metallization target optimization method providing enhanced metallization layer uniformity
US20060210783A1 (en) 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
US20060210810A1 (en) 2005-03-21 2006-09-21 Harris Caroline S Substrates coated with a multi-film functional coating
US7118936B2 (en) 2001-10-11 2006-10-10 Bridgestone Corporation Organic dye-sensitized metal oxide semiconductor electrode and its manufacturing method, and organic dye-sensitized solar cell
US20060225999A1 (en) 2003-12-09 2006-10-12 Asahi Glass Company, Limited Ti oxide film having visible light-responsive photocatalytic activites and process for its production
WO2006108985A1 (en) 2005-04-11 2006-10-19 Saint-Gobain Glass France Microbicidal substrate
US20060247125A1 (en) 2005-04-27 2006-11-02 Korea Institute Of Science And Technology C and n-doped titaniumoxide-based photocatalytic and self-cleaning thin films and the process for production thereof
WO2006055513B1 (en) 2004-11-18 2006-11-02 Honeywell Int Inc Methods of forming three-dimensional pvd targets
JP2006305527A (en) 2005-05-02 2006-11-09 Altis Kk Photocatalyst particle, coating material containing the photocatalyst particle, and method for producing the photocatalyst particle
WO2006117345A1 (en) 2005-04-29 2006-11-09 Agc Flat Glass Europe Sa Coated substrate and process for the production of a coated substrate
US7138181B2 (en) 1998-09-17 2006-11-21 Pilkington North America, Inc. Heat strengthened coated glass article
WO2006134335A1 (en) 2005-06-16 2006-12-21 Pilkington Group Limited Coated glass pane
US20070025000A1 (en) 2005-07-29 2007-02-01 Chia-Cheng Lin Simulated high refractive index glass
US20070031593A1 (en) 2005-08-02 2007-02-08 Alexey Krasnov Method of thermally tempering coated article with transparent conductive oxide (TCO) coating using flame(s) in tempering furnace adjacent TCO to burn off oxygen and product made using same
US20070030569A1 (en) 2005-08-04 2007-02-08 Guardian Industries Corp. Broad band antireflection coating and method of making same
US20070031682A1 (en) 2005-08-02 2007-02-08 Guardian Industries Corp. Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating and product made using same
US20070029527A1 (en) 2003-03-12 2007-02-08 University Of Strathclyde Indicator for detecting a photocatalyst
US7175911B2 (en) 2002-09-18 2007-02-13 Toshiba Ceramics Co., Ltd. Titanium dioxide fine particles and method for producing the same, and method for producing visible light activatable photocatalyst
US7179527B2 (en) 2001-10-19 2007-02-20 Asahi Glass Company, Limited Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element
US20070065670A1 (en) 2005-09-20 2007-03-22 Guardian Industries Corp. Coating with infrared and ultraviolet blocking characterstics
US7195821B2 (en) 1998-03-20 2007-03-27 Glaverbel Coated substrate with high reflectance
US20070077406A1 (en) 2005-09-30 2007-04-05 Jacobs Jeffry L Photocatalytic coating
US20070087187A1 (en) 2003-07-18 2007-04-19 Ppg Industries Ohio, Inc. Nanostructured coatings and related methods
US7211543B2 (en) 2002-06-03 2007-05-01 Asahi Kasei Kabushiki Kaisha Photocatalyst composition
US20070108043A1 (en) 2005-11-14 2007-05-17 Guardian Industries Corp. Sputtering target including titanium silicon oxide and method of making coated article using the same
US20070109543A1 (en) 2005-11-07 2007-05-17 Cardinal Cg Company Method and appartus for identifying photocatalytic coatings
US20070116966A1 (en) 2005-11-22 2007-05-24 Guardian Industries Corp. Solar cell with antireflective coating with graded layer including mixture of titanium oxide and silicon oxide
US7223523B2 (en) 2002-09-18 2007-05-29 Ppg Industries Ohio, Inc. Demonstration kit and method for enhancing and/or demonstrating photoactive properties
US20070134501A1 (en) 2005-12-13 2007-06-14 Mcmaster Alan J Self-cleaning coatings applied to solar thermal devices
US7232615B2 (en) 2001-10-22 2007-06-19 Ppg Industries Ohio, Inc. Coating stack comprising a layer of barrier coating
US20070137673A1 (en) 2002-09-10 2007-06-21 Ppg Industries, Inc. Method and apparatus for cleaning a photoactive and/or hydrophilic surface
WO2007080428A1 (en) 2006-01-11 2007-07-19 Pilkington Group Limited Heat treatable coated glass pane
WO2007045805A8 (en) 2005-10-21 2007-07-26 Saint Gobain Antifouling material and production method thereof
US20070184291A1 (en) 2006-02-08 2007-08-09 Harris Caroline S Coated substrates having undercoating layers that exhibit improved photocatalytic activity
WO2007093823A1 (en) 2006-02-14 2007-08-23 Pilkington Automotive Limited Vehicle glazing
US7261942B2 (en) 2002-12-31 2007-08-28 Prizmalite Industries Inc. Photocatalytically-active, self-cleaning aqueous coating compositions and methods
WO2007110482A1 (en) 2006-03-27 2007-10-04 Beneq Oy A method for producing functional glass surfaces by changing the composition of the original surface
US20070237968A1 (en) 2004-12-06 2007-10-11 Nippon Sheet Glass Company, Limited Glass Member Having Photocatalytic Function and Heat Reflecting Function and Double Paned Glass Including The Same
WO2007096461A3 (en) 2006-02-23 2007-10-18 Picodeon Ltd Oy Method for producing high-quality surfaces and a product having a high-quality surface
WO2007121215A1 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20070254163A1 (en) 2006-04-27 2007-11-01 Guardian Industries Corp. Window with anti-bacterial and/or anti-fungal feature and method of making same
US20070254164A1 (en) 2006-04-27 2007-11-01 Guardian Industries Corp. Photocatalytic window and method of making same
US20070275252A1 (en) 2006-05-23 2007-11-29 Guardian Industries Corp. Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating in color compression configuration, and product made using same
US7309664B1 (en) 1998-06-10 2007-12-18 Saint-Gobain Recherche Substrate with a photocatalytic coating
US7311961B2 (en) 2000-10-24 2007-12-25 Ppg Industries Ohio, Inc. Method of making coated articles and coated articles made thereby
US20080014349A1 (en) 2004-11-19 2008-01-17 Nippon Sheet Glass Company, Limited Process For Producing Glass Plate With Thin Film
US20080011408A1 (en) 2004-02-25 2008-01-17 Afg Industries, Inc. Heat stabilized sub-stoichiometric dielectrics
FR2884147B3 (en) 2005-04-11 2008-06-13 Saint Gobain MICROBICIDE SUBSTRATE
US20080188370A1 (en) 2005-08-09 2008-08-07 Evonik Degussa Gmbh Use of Titanium Dioxide Mixed Oxide as a Photocatalyst

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL78045A0 (en) * 1986-03-05 1986-07-31 Bron Dan Drip emitter
US5868808A (en) * 1997-08-06 1999-02-09 Henderson; Michael J. Velocity stack filter
US20040200238A1 (en) * 2001-07-23 2004-10-14 Masato Hyodo Low emissivity glass and method for production thereof
US7063893B2 (en) * 2002-04-29 2006-06-20 Cardinal Cg Company Low-emissivity coating having low solar reflectance

Patent Citations (857)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1256818A (en) 1915-07-26 1918-02-19 Herbert J Nile Protective covering for glass panes.
US2808351A (en) 1952-10-31 1957-10-01 Libbey Owens Ford Glass Co Electrically conducting coated glass or ceramic articles suitable for use as a lens, a window or a windshield, or the like
US2780553A (en) 1955-07-07 1957-02-05 Ohio Commw Eng Co Process of providing a controlled atmosphere containing a heat decomposable metal compound
US3528906A (en) 1967-06-05 1970-09-15 Texas Instruments Inc Rf sputtering method and system
GB1231280A (en) 1967-12-14 1971-05-12
US3505092A (en) 1968-06-14 1970-04-07 Libbey Owens Ford Co Method for producing filmed articles
US3968018A (en) 1969-09-29 1976-07-06 Warner-Lambert Company Sputter coating method
US3679291A (en) 1970-04-21 1972-07-25 Optical Coating Laboratory Inc Filter with neutral transmitting multilayer coating having asymmetric reflectance
US3844924A (en) 1970-08-03 1974-10-29 Texas Instruments Inc Sputtering apparatus for forming ohmic contacts for semiconductor devices
US3934961A (en) 1970-10-29 1976-01-27 Canon Kabushiki Kaisha Three layer anti-reflection film
US3911579A (en) 1971-05-18 1975-10-14 Warner Lambert Co Cutting instruments and methods of making same
US3727666A (en) 1971-08-16 1973-04-17 Howmet Corp Method of casting using a mold having a refractory coating thereon
US3829197A (en) 1971-10-20 1974-08-13 Balzers Patent Beteilig Ag Antireflective multilayer coating on a highly refractive substrate
US3840451A (en) 1971-10-28 1974-10-08 V Golyanov Method of producing an artificial diamond film
GB1426906A (en) 1972-05-17 1976-03-03 Glaverbel Edge protection of vitreous panels
US4107350A (en) 1972-08-14 1978-08-15 Berg Joseph E Method for depositing film on a substrate
US3854796A (en) 1972-10-19 1974-12-17 Balzers Patent Beteilig Ag Reflection-reducing coating
US4212903A (en) 1972-11-09 1980-07-15 Basf Aktiengesellschaft Improving the magnetic properties of gamma-iron (III) oxide
US3970037A (en) 1972-12-15 1976-07-20 Ppg Industries, Inc. Coating composition vaporizer
US3852098A (en) 1972-12-15 1974-12-03 Ppg Industries Inc Method for increasing rate of coating using vaporized reactants
GB1438462A (en) 1973-01-05 1976-06-09 Hoechst Ag Electrode for electrolytic processes
US3925182A (en) 1973-09-25 1975-12-09 Shatterproof Glass Corp Method for continuous production of sputter-coated glass products
US4130672A (en) 1973-10-16 1978-12-19 Hoya Lens Co., Ltd. Method for coating anti-reflection film on surface of optical material
US4166018A (en) 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US4029566A (en) 1974-02-02 1977-06-14 Sigri Elektrographit Gmbh Electrode for electrochemical processes and method of producing the same
US3990784A (en) 1974-06-05 1976-11-09 Optical Coating Laboratory, Inc. Coated architectural glass system and method
US4045125A (en) 1974-06-27 1977-08-30 Etat Francias Band filters for use in protective glasses
US4052520A (en) 1974-09-30 1977-10-04 American Optical Corporation Process for coating a synthetic polymer sheet material with a durable abrasion-resistant vitreous composition
US4012119A (en) 1975-12-12 1977-03-15 Xerox Corporation Direct current liquid crystal display with highly reflecting dielectric mirror
US4060660A (en) 1976-01-15 1977-11-29 Rca Corporation Deposition of transparent amorphous carbon films
GB1595061A (en) 1976-11-22 1981-08-05 Atomic Energy Authority Uk Electrically conductive layers produced by plasma spraying
US4440822A (en) 1977-04-04 1984-04-03 Gordon Roy G Non-iridescent glass structures
US4194022A (en) 1977-07-25 1980-03-18 Ppg Industries, Inc. Transparent, colorless, electrically conductive coating
US4351861A (en) 1977-09-23 1982-09-28 Ppg Industries Inc. Deposition of coatings from vaporized reactants
US4252629A (en) 1977-11-26 1981-02-24 Sigri Elektrographit Gmbh Electrode for electrochemical processes especially electrowinning and method for manufacturing same
US4214014A (en) 1977-12-16 1980-07-22 Titmus Eurocon Kontaklinsen GmbH & Co. KG Method for surface treatment of contact lenses
US4212663A (en) 1978-01-26 1980-07-15 Corning Glass Works Reactants delivery system for optical waveguide manufacturing
US4238276A (en) 1978-05-19 1980-12-09 Hitachi, Ltd. Process for producing liquid crystal display element
GB2028376B (en) 1978-08-23 1982-11-03 Ppg Industries Inc Electrically conductive coatings
US4216259A (en) 1979-01-02 1980-08-05 Bfg Glassgroup Heat reflecting pane and a method of producing it
US4322276A (en) 1979-06-20 1982-03-30 Deposition Technology, Inc. Method for producing an inhomogeneous film for selective reflection/transmission of solar radiation
US4331526A (en) 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4503125A (en) 1979-10-01 1985-03-05 Xebec, Inc. Protective overcoating for magnetic recording discs and method for forming the same
US4261722A (en) 1979-12-27 1981-04-14 American Glass Research, Inc. Method for applying an inorganic coating to a glass surface
US4332922A (en) 1980-07-18 1982-06-01 Titmus Eurocon Process for rendering silicone rubber contact lenses hydrophilic
US4422917A (en) 1980-09-10 1983-12-27 Imi Marston Limited Electrode material, electrode and electrochemical cell
US4336119A (en) 1981-01-29 1982-06-22 Ppg Industries, Inc. Method of and apparatus for control of reactive sputtering deposition
US4422916A (en) 1981-02-12 1983-12-27 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4356073A (en) 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
JPS57140339A (en) 1981-02-24 1982-08-30 Nippon Sheet Glass Co Ltd Removing method for metallic oxide film
JPS57140339U (en) 1981-02-28 1982-09-02
US4737252A (en) 1981-05-18 1988-04-12 Westinghouse Electric Corp. Method of coating a metallic article of merchandise with a protective transparent film of abrasion-resistance material
US4485146A (en) 1981-08-06 1984-11-27 Asahi Glass Company Ltd Glass body provided with an alkali diffusion-preventing silicon oxide layer
US4377613A (en) 1981-09-14 1983-03-22 Gordon Roy G Non-iridescent glass structures
US4465575A (en) 1981-09-21 1984-08-14 Atlantic Richfield Company Method for forming photovoltaic cells employing multinary semiconductor films
US4504519A (en) 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same
US4466258A (en) 1982-01-06 1984-08-21 Sando Iron Works Co., Ltd. Apparatus for low-temperature plasma treatment of a textile product
USRE34035E (en) 1982-02-27 1992-08-18 U.S. Philips Corp. Carbon containing layer
US4556599A (en) 1982-05-20 1985-12-03 Nippon Soken, Inc. Heat reflection film
US4486286A (en) 1982-09-28 1984-12-04 Nerken Research Corp. Method of depositing a carbon film on a substrate and products obtained thereby
US4704339A (en) 1982-10-12 1987-11-03 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Infra-red transparent optical components
US4713311A (en) 1982-12-09 1987-12-15 Licentia Patent-Verwaltungs-Gmbh Homogeneous photoconductive layer of amorphous silicon and hydrogen
US4663234A (en) 1983-03-11 1987-05-05 Agence Spatiale Europeenne Coating capables of resisting to high thermal stress and particularly to coatings for satellites and spatial vessels and to methods for producing those coatings
US4661409A (en) 1983-05-06 1987-04-28 Leybold-Heraeus Gmbh Method of producing amorphous carbon coatings on substrates and substrates coated by this method
US4569738A (en) 1983-05-06 1986-02-11 Leybold-Heraeus Gmbh Method of producing amorphous carbon coatings on substrates by plasma deposition
US4568622A (en) 1983-06-21 1986-02-04 Sanyo Electric Co., Ltd. Electrophotographic photosensitive member and method for making such a member containing amorphous silicon
JPS6081048A (en) 1983-10-06 1985-05-09 Toyota Motor Corp Glass having thin titanium nitride film and its manufacture
US4466877A (en) 1983-10-11 1984-08-21 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
JPS6081048U (en) 1983-11-07 1985-06-05 株式会社東海理化電機製作所 Manually operated foldable outer mirror
US4576864A (en) 1984-01-03 1986-03-18 Rohm Gmbh Chemische Fabrik Water spreading plastic material, method for its manufacture and its use as a glazing and roofing material
US4728529A (en) 1984-06-12 1988-03-01 Battelle-Institut E.V. Method of producing diamond-like carbon-coatings
US5165972A (en) 1984-08-13 1992-11-24 Pilkington Plc Coated glass
US4571350A (en) 1984-09-24 1986-02-18 Corning Glass Works Method for depositing thin, transparent metal oxide films
JPS6191042A (en) 1984-10-08 1986-05-09 Toyota Motor Corp Anti-fogging glass and its production
US4816127A (en) 1984-11-15 1989-03-28 Xidex Corporation Method of producing thin-film storage disk
JPS6191042U (en) 1984-11-19 1986-06-13
US4717622A (en) 1985-03-13 1988-01-05 Matsushita Electric Industrial Co., Ltd. Magnetic recording media
US4725345A (en) 1985-04-22 1988-02-16 Kabushiki Kaisha Kenwood Method for forming a hard carbon thin film on article and applications thereof
US4732454A (en) 1985-04-22 1988-03-22 Toray Industries, Inc. Light-transmissible plate shielding electromagnetic waves
US5126218A (en) 1985-04-23 1992-06-30 Clarke Robert L Conductive ceramic substrate for batteries
US4952430A (en) 1985-05-16 1990-08-28 Ppg Industries, Inc. Insulated window units
EP0207646A1 (en) 1985-06-28 1987-01-07 The Standard Oil Company Dual ion beam deposition of dense films
US4673475A (en) 1985-06-28 1987-06-16 The Standard Oil Company Dual ion beam deposition of dense films
US4798660A (en) 1985-07-16 1989-01-17 Atlantic Richfield Company Method for forming Cu In Se2 films
JPS62161945A (en) 1985-08-20 1987-07-17 Toyo Soda Mfg Co Ltd Production of ceramic sputtering target
JPH0114129Y2 (en) 1985-09-11 1989-04-25
US4894133A (en) 1985-11-12 1990-01-16 Virgle L. Hedgcoth Method and apparatus making magnetic recording disk
US4919778A (en) 1985-12-06 1990-04-24 Leybold-Heraeus Gmbh Process for the production of curve glazing with a high transmittance in the visible spectral range and a high reflectance for thermal radiation
US4692428A (en) 1985-12-31 1987-09-08 Exxon Research And Engineering Company Preparation and use of catalysts comprising mixtures of tungsten oxide and silica on alumina
US5073241A (en) 1986-01-31 1991-12-17 Kabushiki Kaisha Meidenshae Method for carbon film production
JPS62161945U (en) 1986-04-02 1987-10-15
WO1987006626A1 (en) 1986-05-02 1987-11-05 Deposition Technology, Inc. Sputter-coated thin glass sheeting in roll form and method for continuous production thereof
US5071206A (en) 1986-06-30 1991-12-10 Southwall Technologies Inc. Color-corrected heat-reflecting composite films and glazing products containing the same
US4777090A (en) 1986-11-03 1988-10-11 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
US4931315A (en) 1986-12-17 1990-06-05 Gte Products Corporation Wide angle optical filters
US4854670A (en) 1986-12-17 1989-08-08 Gte Products Corporation Wide angle optical filters
US4931213A (en) 1987-01-23 1990-06-05 Cass Richard B Electrically-conductive titanium suboxides
US4769291A (en) 1987-02-02 1988-09-06 The Boc Group, Inc. Transparent coatings by reactive sputtering
GB2201428A (en) 1987-02-02 1988-09-01 Boc Group Inc Transparent coatings by reactive sputtering
EP0279550B1 (en) 1987-02-02 1993-04-21 The BOC Group, Inc. Transparent coatings by reactive sputtering
US4915977A (en) 1987-02-26 1990-04-10 Nissin Electric Co., Ltd. Method of forming a diamond film
US4780334A (en) 1987-03-13 1988-10-25 General Electric Company Method and composition for depositing silicon dioxide layers
US4963240A (en) 1987-03-30 1990-10-16 Kabushiki Kaisha Toshiba Sputtering alloy target and method of producing an alloy film
US4859493A (en) 1987-03-31 1989-08-22 Lemelson Jerome H Methods of forming synthetic diamond coatings on particles using microwaves
US4814056A (en) 1987-06-23 1989-03-21 Vac-Tec Systems, Inc. Apparatus for producing graded-composition coatings
US4940636A (en) 1987-07-22 1990-07-10 U.S. Philips Corporation Optical interference filter
US5035784A (en) 1987-07-27 1991-07-30 Wisconsin Alumni Research Foundation Degradation of organic chemicals with titanium ceramic membranes
US5201926A (en) 1987-08-08 1993-04-13 Leybold Aktiengesellschaft Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation
US4883574A (en) 1987-08-11 1989-11-28 Hartec Gesellschaft Fur Hartstoffe Und Dunnschichttechnik Mbh & Co. Kg Method for applying coatings to objects by means of magnetic field supported reactive cathode sputtering
US4882827A (en) 1987-09-28 1989-11-28 Hoya Corporation Process for producing glass mold
JPH01118807A (en) 1987-11-02 1989-05-11 Hitachi Ltd Production of thin film of titanium oxide
US4954465A (en) 1988-01-22 1990-09-04 Hitachi, Ltd. Apparatus for removing stink
EP0328257B1 (en) 1988-02-08 1997-04-02 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US4851095A (en) 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US5618388A (en) 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US4861680A (en) 1988-02-11 1989-08-29 Southwall Technologies Bronze-grey glazing film and window made therefrom
US5110637A (en) 1988-03-03 1992-05-05 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5514485A (en) 1988-03-03 1996-05-07 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5605609A (en) 1988-03-03 1997-02-25 Asahi Glass Company Ltd. Method for forming low refractive index film comprising silicon dioxide
US5354446A (en) 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US4834857A (en) 1988-04-01 1989-05-30 Ppg Industries, Inc. Neutral sputtered films of metal alloy oxides
US4902580A (en) 1988-04-01 1990-02-20 Ppg Industries, Inc. Neutral reflecting coated articles with sputtered multilayer films of metal oxides
WO1989010430A1 (en) 1988-04-27 1989-11-02 American Thin Film Laboratories, Inc. Vacuum coating system
EP0345045B2 (en) 1988-05-31 2000-01-05 Johnson Matthey Public Limited Company Method of making tungsten-titanium sputtering targets
US4838935A (en) 1988-05-31 1989-06-13 Cominco Ltd. Method for making tungsten-titanium sputtering targets and product
US4849081A (en) 1988-06-22 1989-07-18 The Boc Group, Inc. Formation of oxide films by reactive sputtering
US4995893A (en) 1988-06-23 1991-02-26 Pilkington Plc Method of making coatings on glass surfaces
US5026415A (en) 1988-08-16 1991-06-25 Canon Kabushiki Kaisha Mold with hydrogenated amorphous carbon film for molding an optical element
US4981568A (en) 1988-09-20 1991-01-01 International Business Machines Corp. Apparatus and method for producing high purity diamond films at low temperatures
EP0369581B1 (en) 1988-10-12 1993-12-29 Imperial Chemical Industries Plc Temporary protective aqueous coating composition
US5607723A (en) 1988-10-21 1997-03-04 Crystallume Method for making continuous thin diamond film
JPH0812378B2 (en) 1988-11-01 1996-02-07 株式会社平河工業社 Plate making camera
US5008002A (en) 1989-01-30 1991-04-16 Hoya Corporation Process for producing mold used for obtaining press molded glass article
US4931778A (en) 1989-02-27 1990-06-05 Teledyne Industries, Inc. Circuitry for indicating the presence of an overload or short circuit in solid state relay circuits
DE3906453A1 (en) 1989-03-01 1990-09-06 Leybold Ag METHOD FOR COATING SUBSTRATES MADE OF TRANSPARENT MATERIAL, FOR EXAMPLE FROM FLOATGLASS
US4990234A (en) 1989-03-01 1991-02-05 Leybold Aktiengesellschaft Process for coating substrates made of a transparent material, for example floatglass
US5176897A (en) 1989-05-01 1993-01-05 Allied-Signal Inc. Catalytic destruction of organohalogen compounds
US4961958A (en) 1989-06-30 1990-10-09 The Regents Of The Univ. Of Calif. Process for making diamond, and doped diamond films at low temperature
US5209996A (en) 1989-07-26 1993-05-11 Shin-Etsu Chemical Co., Ltd. Membrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the same
US5073451A (en) 1989-07-31 1991-12-17 Central Glass Company, Limited Heat insulating glass with dielectric multilayer coating
US4997576A (en) 1989-09-25 1991-03-05 Board Of Regents, The University Of Texas System Materials and methods for photocatalyzing oxidation of organic compounds on water
JPH03122274A (en) 1989-10-05 1991-05-24 Asahi Glass Co Ltd Production of thin film and device thereof
US5090985A (en) 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
US5006248A (en) 1989-10-23 1991-04-09 Wisconsin Alumni Research Foundation Metal oxide porous ceramic membranes with small pore sizes
US5529631A (en) 1989-10-30 1996-06-25 Bridgestone Corporation Apparatus for the continuous surface treatment of sheet material
US5047131A (en) 1989-11-08 1991-09-10 The Boc Group, Inc. Method for coating substrates with silicon based compounds
JPH03187039A (en) 1989-12-15 1991-08-15 Shin Etsu Chem Co Ltd Magneto-optical recording medium
JPH03193872A (en) 1989-12-21 1991-08-23 Tdk Corp High-frequency sputtering method and production of magnetic recording medium
JPH03122274U (en) 1990-03-28 1991-12-13
US5107643A (en) 1990-04-10 1992-04-28 Swensen William B Method to protect glass in doors and windows from scratches, abrasion, and painting processes
US5498475A (en) 1990-05-31 1996-03-12 Nippon Sheet Glass Co., Ltd. Coated plastic molded articles
US5020288A (en) 1990-06-12 1991-06-04 Swensen William B Method to protect glass in doors and windows from scratches, abrasion, and painting processes
US5306569A (en) 1990-06-15 1994-04-26 Hitachi Metals, Ltd. Titanium-tungsten target material and manufacturing method thereof
US5160534A (en) 1990-06-15 1992-11-03 Hitachi Metals Ltd. Titanium-tungsten target material for sputtering and manufacturing method therefor
US5298338A (en) 1990-06-15 1994-03-29 Hitachi Metals, Ltd. Titanium-tungsten target material and manufacturing method thereof
US5104539A (en) 1990-08-06 1992-04-14 Wisconsin Alumni Research Foundation Metal oxide porous ceramic membranes with small pore sizes
US5139633A (en) 1990-08-08 1992-08-18 Shin-Etsu Chemical Co., Ltd. Film-forming on substrate by sputtering
EP0470379B1 (en) 1990-08-08 1996-10-09 Shin-Etsu Chemical Co., Ltd. Improvement in film-forming on substrate by sputtering
US5196400A (en) 1990-08-17 1993-03-23 At&T Bell Laboratories High temperature superconductor deposition by sputtering
US5032421A (en) 1990-08-21 1991-07-16 Amp Incorporated Metal coating method
US5643423A (en) 1990-09-27 1997-07-01 Monsanto Company Method for producing an abrasion resistant coated substrate product
JPH0811631B2 (en) 1990-10-04 1996-02-07 三菱重工業株式会社 Automatic operation device for continuous unloader
US5105310A (en) 1990-10-11 1992-04-14 Viratec Thin Films, Inc. Dc reactively sputtered antireflection coatings
US5190807A (en) 1990-10-18 1993-03-02 Diamonex, Incorporated Abrasion wear resistant polymeric substrate product
US5476713A (en) 1990-11-07 1995-12-19 Sony Corporation Magneto-optical recording medium
US5106671A (en) 1990-12-10 1992-04-21 Ford Motor Company Transparent anti-reflective coating
US5171414A (en) 1990-12-10 1992-12-15 Ford Motor Company Method of making transparent anti-reflective coating
US5616532A (en) 1990-12-14 1997-04-01 E. Heller & Company Photocatalyst-binder compositions
US5306547A (en) 1990-12-14 1994-04-26 Southwall Technologies Inc. Low transmission heat-reflective glazing materials
US5245468A (en) 1990-12-14 1993-09-14 Ford Motor Company Anti-reflective transparent coating
US5073450A (en) 1990-12-17 1991-12-17 Ford Motor Company Laminated glazing unit
US5108574A (en) 1991-01-29 1992-04-28 The Boc Group, Inc. Cylindrical magnetron shield structure
US5378527A (en) 1991-02-15 1995-01-03 Toyota Jidosha Kabushiki Kaisha Carbon film coated glass
JPH04276066A (en) 1991-03-01 1992-10-01 Matsushita Electric Ind Co Ltd Sputtering system
US5211759A (en) 1991-03-05 1993-05-18 Balzers Aktiengesellschaft Method for a doublesided coating of optical substrates
US5683561A (en) 1991-04-04 1997-11-04 Conner Peripherals, Inc. Apparatus and method for high throughput sputtering
US5814196A (en) 1991-04-04 1998-09-29 Conner Peripherals, Inc. Apparatus and method for high throughput sputtering
US5972184A (en) 1991-04-04 1999-10-26 Seagate Technology, Inc. Heating system for high throughput sputtering
US6156171A (en) 1991-04-04 2000-12-05 Seagate Technology, Inc. Sputtering magnetron
WO1992017621A1 (en) 1991-04-04 1992-10-15 Conner Peripherals, Inc. Apparatus and method for high throughput sputtering
US5234487A (en) 1991-04-15 1993-08-10 Tosoh Smd, Inc. Method of producing tungsten-titanium sputter targets and targets produced thereby
US5424130A (en) 1991-05-13 1995-06-13 Toyota Jidosha Kabushiki Kaisha Water repellent glass and process for producing the same
US5318830A (en) 1991-05-29 1994-06-07 Central Glass Company, Limited Glass pane with reflectance reducing coating
EP0515847B1 (en) 1991-05-29 1995-02-22 Central Glass Company, Limited Glass pane with reflectance reducing coating
US5599422A (en) 1991-05-30 1997-02-04 Oregon Glass Company Method for producing masked glazing panels
US5866260A (en) 1991-05-30 1999-02-02 Oregon Glass Company Masked glazing panels
US5254392A (en) 1991-06-24 1993-10-19 Ford Motor Company Anti-iridescence coatings
US5168003A (en) 1991-06-24 1992-12-01 Ford Motor Company Step gradient anti-iridescent coatings
US5939188A (en) 1991-07-15 1999-08-17 Pilkington Aerospace, Inc. Transparent coating systems for improving the environmental durability of transparency substrates
US5597622A (en) 1991-08-28 1997-01-28 Leybold Aktiengesellschaft Process for the production of a reflection-reducing coating on lenses
JPH05214525A (en) 1991-08-28 1993-08-24 Asahi Glass Co Ltd Ceramic rotational cathode target and its manufacture
US5618590A (en) 1991-09-20 1997-04-08 Teikoku Piston Ring Co., Ltd. Process for manufacturing a piston ring
US5827490A (en) 1991-09-27 1998-10-27 Noell, Inc. Method for converting urea to ammonia
US5194990A (en) 1991-10-07 1993-03-16 Ford Motor Company Low color purity, anti-reflection coatings for transparent glazings oriented at high angles of incidence
US5624760A (en) 1991-10-11 1997-04-29 Caradon Doors & Windows Limited - Cet Fire resistant glass
US5179468A (en) 1991-11-05 1993-01-12 Gte Products Corporation Interleaving of similar thin-film stacks for producing optical interference coatings
US5669144A (en) 1991-11-15 1997-09-23 The Gillette Company Razor blade technology
US5342676A (en) 1991-11-26 1994-08-30 Saint-Gobain Vitrage International Glass substrate provided with a low emissivity film
US6365014B2 (en) 1991-11-29 2002-04-02 Ppg Industries Ohio, Inc. Cathode targets of silicon and transition metal
US5417827A (en) 1991-11-29 1995-05-23 Ppg Industries, Inc. Cathode targets of silicon and transition metal
US5552180A (en) 1991-11-29 1996-09-03 Ppg Industries, Inc. Multilayer heat processable vacuum coatings with metallic properties
US6274244B1 (en) 1991-11-29 2001-08-14 Ppg Industries Ohio, Inc. Multilayer heat processable vacuum coatings with metallic properties
US5298048A (en) 1991-12-09 1994-03-29 Guardian Industries Corp. Heat treatable sputter-coated glass systems
US5286524A (en) 1991-12-13 1994-02-15 General Electric Company Method for producing CVD diamond film substantially free of thermal stress-induced cracks
US5507930A (en) 1992-03-20 1996-04-16 Komag, Incorporated Method of sputtering a carbon protective film on a magnetic disk by superimposing an AC voltage on a DC bias voltage
US5302449A (en) 1992-03-27 1994-04-12 Cardinal Ig Company High transmittance, low emissivity coatings for substrates
US5527755A (en) 1992-04-09 1996-06-18 Consortium Fur Elektrochemische Industrie Gmbh Catalyst for the catalytic afterburning of exhaust gases containing carbon monoxide and/or oxidizable organic compounds
US5470527A (en) 1992-04-21 1995-11-28 Kabushiki Kaisha Toshiba Ti-W sputtering target and method for manufacturing same
EP0574119A3 (en) 1992-04-21 1994-01-19 Kabushiki Kaisha Toshiba Ti-W sputtering target and method of manufacturing the same
US5635287A (en) 1992-05-26 1997-06-03 Saint-Gobain Vitrage International Pane provided with a functional film
US5366764A (en) 1992-06-15 1994-11-22 Sunthankar Mandar B Environmentally safe methods and apparatus for depositing and/or reclaiming a metal or semi-conductor material using sublimation
US5745291A (en) 1992-07-11 1998-04-28 Pilkington Glass Limited Mirror including a glass substrate and a pyrolytic silicon reflecting layer
US5453459A (en) 1992-08-10 1995-09-26 Henkel Corporation Temporary coating system
US5346600A (en) 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
EP0590477B2 (en) 1992-09-22 2004-10-13 Takenaka Corporation Architectural material using metal oxide exhibiting photocatalytic activity
US5595813A (en) 1992-09-22 1997-01-21 Takenaka Corporation Architectural material using metal oxide exhibiting photocatalytic activity
US5338422A (en) 1992-09-29 1994-08-16 The Boc Group, Inc. Device and method for depositing metal oxide films
US5874701A (en) 1992-10-11 1999-02-23 Toto Co., Ltd. Photocatalytic air treatment process under room light
US5869808A (en) 1992-11-09 1999-02-09 American Roller Company Ceramic heater roller and methods of making same
US6139803A (en) 1992-11-10 2000-10-31 Toto Co., Ltd. Photocatalytic air treatment process under room light
US5394269A (en) 1992-11-13 1995-02-28 Central Glass Company, Ltd. Reflectance reducing film and method of forming same on glass substrate
FR2699164B1 (en) 1992-12-11 1995-02-24 Saint Gobain Vitrage Int Method for treating thin layers based on metal oxide or nitride.
EP0601928B1 (en) 1992-12-11 2001-10-17 Saint-Gobain Glass France Process for the treatment of metal oxide or nitride thin films
US5569362A (en) 1992-12-11 1996-10-29 Saint-Gobain Vitrage International Process for treatment of thin films based upon metallic oxide or nitride
US5470661A (en) 1993-01-07 1995-11-28 International Business Machines Corporation Diamond-like carbon films from a hydrocarbon helium plasma
US5569501A (en) 1993-01-07 1996-10-29 International Business Machines Corporation Diamond-like carbon films from a hydrocarbon helium plasma
US5589280A (en) 1993-02-05 1996-12-31 Southwall Technologies Inc. Metal on plastic films with adhesion-promoting layer
US5356718A (en) 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
EP0611733B1 (en) 1993-02-16 2003-06-18 PPG Industries Ohio, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glass and coated glass substrates
US5284539A (en) 1993-04-05 1994-02-08 Regents Of The University Of California Method of making segmented pyrolytic graphite sputtering targets
US5763087A (en) 1993-04-16 1998-06-09 Regents Of The University Of California Amorphous diamond films
US5496621A (en) 1993-04-16 1996-03-05 Central Glass Company, Limited Glass pane with reflectance reducing coating and combiner of head-up display system
US5645900A (en) 1993-04-22 1997-07-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Diamond composite films for protective coatings on metals and method of formation
DE4313284A1 (en) 1993-04-23 1994-10-27 Leybold Ag Slot lock for introducing or discharging substrates from one treatment chamber into an adjacent one
US5563734A (en) 1993-04-28 1996-10-08 The Boc Group, Inc. Durable low-emissivity solar control thin film coating
JPH07508491A (en) 1993-04-29 1995-09-21 サン−ゴバン ビトラージュ Window glass with functional conductive and/or low emissivity layer
US5520996A (en) 1993-04-29 1996-05-28 Saint-Gobain Vitrage Glazing provided with a conducting and/or low emissive functional coating
JPH06330297A (en) 1993-05-21 1994-11-29 Vacuum Metallurgical Co Ltd Sputtering target for forming dielectric body thin film
US5513039A (en) 1993-05-26 1996-04-30 Litton Systems, Inc. Ultraviolet resistive coated mirror and method of fabrication
US5525406A (en) 1993-07-08 1996-06-11 Libbey-Owens-Ford Co. Coatings on glass
US5512152A (en) 1993-07-15 1996-04-30 Saint Gobain Vitrage Process for preparation of stabilized oxide thin layers
EP0639655B1 (en) 1993-07-28 2000-09-27 Asahi Glass Company Ltd. Method and apparatus for sputtering
EP0636702B1 (en) 1993-07-28 1999-05-19 Asahi Glass Company Ltd. Methods for producing functional films
US6468403B1 (en) 1993-07-28 2002-10-22 Asahi Glass Company Ltd. Methods for producing functional films
EP0637572A1 (en) 1993-08-05 1995-02-08 Caradon Everest Limited Coated sheet glass and insulated glazing units
US5715103A (en) 1993-08-26 1998-02-03 Canon Kabushiki Kaisha Neutral density (ND) filter
JPH07149545A (en) 1993-09-23 1995-06-13 Saint Gobain Vitrage Transparent base material provided with thin film laminate acting to sunlight and/or infrared ray
US5595825A (en) 1993-09-23 1997-01-21 Saint-Gobain Vitrage Transparent substrate provided with a stack of thin films acting on solar and/or infrared radiation
US5679431A (en) 1993-10-08 1997-10-21 Hmt Technology Corporation Sputtered carbon overcoat in a thin-film medium and sputtering method
US5620572A (en) 1993-10-25 1997-04-15 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
US5849200A (en) 1993-10-26 1998-12-15 E. Heller & Company Photocatalyst-binder compositions
US5854169A (en) 1993-10-26 1998-12-29 E. Heller & Company Photocatalyst-binder compositions
US5397050A (en) 1993-10-27 1995-03-14 Tosoh Smd, Inc. Method of bonding tungsten titanium sputter targets to titanium plates and target assemblies produced thereby
US5482602A (en) 1993-11-04 1996-01-09 United Technologies Corporation Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
US5401543A (en) 1993-11-09 1995-03-28 Minnesota Mining And Manufacturing Company Method for forming macroparticle-free DLC films by cathodic arc discharge
US5674625A (en) 1993-11-10 1997-10-07 Central Glass Company, Limited Multilayered water-repellent film and method of forming same on glass substrate
EP0657562B1 (en) 1993-11-12 2001-09-12 PPG Industries Ohio, Inc. Durable sputtered metal oxide coating
US6346174B1 (en) 1993-11-12 2002-02-12 Ppg Industries Ohio, Inc. Durable sputtered metal oxide coating
US5593784A (en) 1993-11-23 1997-01-14 Glaverbel Glazing unit and a method for its manufacture
US5633208A (en) 1993-12-01 1997-05-27 Nec Corporation Planarization of insulation film using low wettingness surface
US5679978A (en) 1993-12-06 1997-10-21 Fujitsu Limited Semiconductor device having resin gate hole through substrate for resin encapsulation
US5405517A (en) 1993-12-06 1995-04-11 Curtis M. Lampkin Magnetron sputtering method and apparatus for compound thin films
US6210779B1 (en) 1993-12-10 2001-04-03 Toto Ltd. Multi-functional material with photocatalytic functions and method of manufacturing same
US5853866A (en) 1993-12-10 1998-12-29 Toto Ltd. Multi-functional material with photocalytic functions and method of manufacturing same
US5609924A (en) 1993-12-20 1997-03-11 Libbey-Owens-Ford Co. Method for protecting glass surfaces
JPH07215074A (en) 1994-02-07 1995-08-15 Toyota Motor Corp Under-cover device for vehicle
JPH07233469A (en) 1994-02-22 1995-09-05 Asahi Glass Co Ltd Target, its production and production of high-refractive-index film
US5888593A (en) 1994-03-03 1999-03-30 Monsanto Company Ion beam process for deposition of highly wear-resistant optical coatings
US5723172A (en) 1994-03-11 1998-03-03 Dan Sherman Method for forming a protective coating on glass
US5616225A (en) 1994-03-23 1997-04-01 The Boc Group, Inc. Use of multiple anodes in a magnetron for improving the uniformity of its plasma
US5415756A (en) 1994-03-28 1995-05-16 University Of Houston Ion assisted deposition process including reactive source gassification
JPH07315874A (en) 1994-03-30 1995-12-05 Nippon Sheet Glass Co Ltd Heat ray shielding glass
JPH07315889A (en) 1994-03-30 1995-12-05 Nippon Sheet Glass Co Ltd Heat shielding glass and its composite material
US5558751A (en) 1994-04-20 1996-09-24 Leybold Aktiengesellschaft Dual cathode sputter coating apparatus
US5724187A (en) 1994-05-05 1998-03-03 Donnelly Corporation Electrochromic mirrors and devices
US5733660A (en) 1994-05-20 1998-03-31 Central Glass Company, Limited Glass pane with reflectance reducing coating
US5674658A (en) 1994-06-16 1997-10-07 Eastman Kodak Company Lithographic printing plates utilizing an oleophilic imaging layer
EP0689096B1 (en) 1994-06-16 1999-09-22 Kodak Polychrome Graphics LLC Lithographic printing plates utilizing an oleophilic imaging layer
EP0689962B2 (en) 1994-06-29 2005-07-06 Murakami Kaimeido Co., Ltd Vehicle mirror
US5594585A (en) 1994-06-29 1997-01-14 Murakami Kaimeido Co., Ltd. Vehicle mirror
US5594585B1 (en) 1994-06-29 1998-11-03 Murakami Kaimeido Kk Vehicle mirror
JPH0811631A (en) 1994-06-29 1996-01-16 Murakami Kaimeidou:Kk Mirror for vehicle
JPH0812378A (en) 1994-06-30 1996-01-16 Nissan Motor Co Ltd Heat ray cut-off glass and its production
US5645699A (en) 1994-09-06 1997-07-08 The Boc Group, Inc. Dual cylindrical target magnetron with multiple anodes
US6333084B1 (en) 1994-09-09 2001-12-25 Southwall Technologies, Inc. Double-sided reflector films
JPH08158048A (en) 1994-09-26 1996-06-18 Asahi Glass Co Ltd Target and its production and formation of film high in refractive index
US5830252A (en) 1994-10-04 1998-11-03 Ppg Industries, Inc. Alkali metal diffusion barrier layer
US6352755B1 (en) 1994-10-04 2002-03-05 Ppg Industries Ohio, Inc. Alkali metal diffusion barrier layer
US5961843A (en) 1994-10-05 1999-10-05 Toto Ltd. Antimicrobial solid material, process for producing the same, and method of utilizing the same
JPH08109043A (en) 1994-10-05 1996-04-30 Nippon Soda Co Ltd Transparent electroconductive film-attached glass having high resistance
US7157840B2 (en) 1994-10-31 2007-01-02 Kanagawa Academy Of Science And Technology Illuminating devices employing titanium dioxide photocatalysts
US6939611B2 (en) 1994-10-31 2005-09-06 Kanagawa Academy Of Science And Technology Window glass employing titanium dioxide photocatalyst
US6387844B1 (en) 1994-10-31 2002-05-14 Akira Fujishima Titanium dioxide photocatalyst
EP0737513B1 (en) 1994-10-31 2002-05-29 Kanagawa Academy Of Science And Technology Titanium oxide photocatalyst structure and method of manufacturing the same
US20030096701A1 (en) 1994-10-31 2003-05-22 Akira Fujishima Illuminating devices employing titanium dioxide photocatalysts
JPH08134638A (en) 1994-11-04 1996-05-28 Asahi Glass Co Ltd Formation of titanium oxide film
US5846613A (en) 1994-11-07 1998-12-08 Neuville; Stephane Method for depositing a hard protective coating
US5593786A (en) 1994-11-09 1997-01-14 Libbey-Owens-Ford Company Self-adhering polyvinyl chloride safety glass interlayer
US6191062B1 (en) 1994-11-16 2001-02-20 Toto Ltd. Photocatalytic functional material and method for producing the same
US5611899A (en) 1994-11-19 1997-03-18 Leybold Aktiengesellschaft Device for suppressing flashovers in cathode sputtering installations
US5624423A (en) 1994-11-30 1997-04-29 Kimberly-Clark Corporation Absorbent article having barrier means and medial bulge
EP0799255B1 (en) 1994-12-21 1999-02-17 Union Carbide Chemicals & Plastics Technology Corporation Method for the preparation of water-borne coating compositions using thermoplastic polyhydroxyether resins having narrow polydispersity
US6804048B2 (en) 1994-12-23 2004-10-12 Saint-Gobain Glass France Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
US5811191A (en) 1994-12-27 1998-09-22 Ppg Industries, Inc. Multilayer antireflective coating with a graded base layer
US6077482A (en) 1994-12-28 2000-06-20 Hitachi, Ltd. Method for treating organohalogen compounds with catalyst
US5830332A (en) 1995-01-26 1998-11-03 International Business Machines Corporation Sputter deposition of hydrogenated amorphous carbon film and applications thereof
WO1996025534A1 (en) 1995-02-13 1996-08-22 Deposition Sciences, Inc. Apparatus and method for a reliable return current path for sputtering processes
JPH08227006A (en) 1995-02-22 1996-09-03 Nissan Motor Co Ltd Hydrophilic mirror and its production
US5891556A (en) 1995-02-23 1999-04-06 Saint-Gobain Vitrage Transparent substrate with antireflection coating
US6337124B1 (en) 1995-02-23 2002-01-08 Saint-Gobain Vitrage Transparent substrate with antireflection coating
US5981426A (en) 1995-03-02 1999-11-09 University Technologies International Inc. Photocatalyst having an x-ray diffraction pattern which is substanially free of characteristic reflections associated with crystalline TiO2
US6139968A (en) 1995-03-08 2000-10-31 Corion Corporation Multilayer ion plated coatings comprising titanium oxide
US5733669A (en) 1995-03-09 1998-03-31 U.S. Philips Corporation Resistive component comprising a CRSI resistive film
EP0816466B1 (en) 1995-03-20 2006-05-17 Toto Ltd. Use of material having ultrahydrophilic and photocatalytic surface
US7294365B2 (en) 1995-03-20 2007-11-13 Toto Ltd. Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with superhydrophilic photocatalytic surface, and method of making thereof
US6830785B1 (en) 1995-03-20 2004-12-14 Toto Ltd. Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with a superhydrophilic photocatalytic surface, and method of making thereof
US6013372A (en) 1995-03-20 2000-01-11 Toto, Ltd. Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with superhydrophilic photocatalytic surface, and method of making thereof
US20050019700A1 (en) 1995-03-20 2005-01-27 Makoto Hayakawa Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with superhydrophilic photocatalytic surface, and method of making thereof
US20020016250A1 (en) 1995-03-20 2002-02-07 Makoto Hayakawa Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with a superhydrophilic photocatalytic surface, and method of making thereof
US5814195A (en) 1995-04-25 1998-09-29 The Boc Group, Inc. Sputtering system using cylindrical rotating magnetron electrically powered using alternating current
US5812405A (en) 1995-05-23 1998-09-22 Viratec Thin Films, Inc. Three variable optimization system for thin film coating design
US5686372A (en) 1995-05-26 1997-11-11 University Technologies International Inc. Photocatalyst with modified alkyl silicate ester support and process for production thereof
US5965246A (en) 1995-06-01 1999-10-12 Saint-Gobain Vitrage Transparent substrates coated with a stack of thin layers having reflection properties in the infrared and/or in the solar radiation range
US5719705A (en) 1995-06-07 1998-02-17 Sola International, Inc. Anti-static anti-reflection coating
US6165616A (en) 1995-06-07 2000-12-26 Lemelson; Jerome H. Synthetic diamond coatings with intermediate bonding layers and methods of applying such coatings
US5962115A (en) 1995-06-08 1999-10-05 Balzers Und Leybold Deutschland Holding Ag Pane of transparent material having a low emissivity
GB2302102B (en) 1995-06-09 1999-03-10 Glaverbel A glazing panel having solar screening properties and a process for making such a panel
US6228480B1 (en) 1995-06-19 2001-05-08 Nippon Soda Co., Ltd. Photocatalyst-carrying structure and photocatalyst coating material
US5683560A (en) 1995-07-08 1997-11-04 Balzers Und Leybold Deutschland Holding Ag Cathode assembly
EP0753882B1 (en) 1995-07-08 1998-11-18 Balzers und Leybold Deutschland Holding Aktiengesellschaft Cathode assembly for a target sputtering device
US6354109B1 (en) 1995-07-12 2002-03-12 Saint-Gobain Glass France Process and apparatus for providing a film with a gradient
US5643432A (en) 1995-07-13 1997-07-01 Avx Corporation Selective anodization of capacitor anode body
WO1997003763A1 (en) 1995-07-24 1997-02-06 Southwall Technologies Inc. Improved laminate structure and process for its production
WO1997007066A1 (en) 1995-08-14 1997-02-27 Libbey-Owens-Ford Co. Glass sheet conveying and bending apparatus
WO1997007069A1 (en) 1995-08-18 1997-02-27 Adam Heller Self-cleaning glass and method of making thereof
US6743343B2 (en) 1995-08-23 2004-06-01 Asahi Glass Ceramics Co., Ltd. Target and process for its production, and method of forming a film having a high refractive index
WO1997008359A1 (en) 1995-08-23 1997-03-06 Asahi Glass Company Ltd. Target, process for production thereof, and method of forming highly refractive film
US6193856B1 (en) 1995-08-23 2001-02-27 Asahi Glass Company Ltd. Target and process for its production, and method for forming a film having a highly refractive index
US6334938B2 (en) 1995-08-23 2002-01-01 Asahi Glass Company, Ltd. Target and process for its production, and method for forming a film having a high refractive index
US6440278B1 (en) 1995-08-23 2002-08-27 Asahi Glass Company Ltd. Target and process for its production, and method for forming a film having a high refractive index
FR2738836B1 (en) 1995-09-15 1998-07-17 Rhone Poulenc Chimie SUBSTRATE WITH PHOTOCATALYTIC PROPERTIES BASED ON TITANIUM DIOXIDE AND ORGANIC DISPERSIONS BASED ON TITANIUM DIOXIDE
US6326079B1 (en) 1995-09-15 2001-12-04 Saint-Gobain Glass France Substrate with a photocatalytic coating
US6103363A (en) 1995-09-15 2000-08-15 Saint-Gobain Recherche Substrate with a photocatalytic coating
US20020119307A1 (en) 1995-09-15 2002-08-29 Saint-Gobain Glass France Substrate with a photocatalytic coating
FR2738812B1 (en) 1995-09-15 1997-10-17 Saint Gobain Vitrage SUBSTRATE WITH PHOTOCATALYTIC COATING
US20020110638A1 (en) 1995-09-15 2002-08-15 Saint-Gobain Glass France Substrate with a photocatalytic coating
US20020071956A1 (en) 1995-09-15 2002-06-13 Saint-Gobain Glass France Substrate with a photocatalytic coating
WO1997010186A1 (en) 1995-09-15 1997-03-20 Saint-Gobain Vitrage Photocatalytic coating substrate
FR2738813B1 (en) 1995-09-15 1997-10-17 Saint Gobain Vitrage SUBSTRATE WITH PHOTO-CATALYTIC COATING
WO1997010185A1 (en) 1995-09-15 1997-03-20 Rhodia Chimie Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions
US20030207028A1 (en) 1995-09-15 2003-11-06 Saint-Gobain Glass France Substrate with a photocatalytic coating
US6037289A (en) 1995-09-15 2000-03-14 Rhodia Chimie Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions
US20020028361A1 (en) 1995-09-15 2002-03-07 Saint-Gobain Glass France Substrate with a photocatalytic coating
EP0850204B1 (en) 1995-09-15 2001-12-05 Saint-Gobain Glass France Photocatalytic coating substrate
US6846556B2 (en) 1995-09-15 2005-01-25 Saint-Gobain Glass France Substrate with a photocatalytic coating
US6680135B2 (en) 1995-09-15 2004-01-20 Saint-Gobain Glass France Substrate with a photocatalytic coating
EP1518836A2 (en) 1995-09-15 2005-03-30 Saint-Gobain Glass France Substrate with photocatalytic coating
US20040216487A1 (en) 1995-09-15 2004-11-04 Saint-Gobain Glass France Substrate with a photocatalytic coating
US6362121B1 (en) 1995-09-15 2002-03-26 Rhodia Chimie Substrate with a photocatalytic coating based on titanium dioxide and organic dispersions based on titanium dioxide
EP0850203B1 (en) 1995-09-15 2001-01-17 Rhodia Chimie Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions
US5762674A (en) 1995-09-27 1998-06-09 Glasstech, Inc. Apparatus for coating glass sheet ribbon
WO1997011916A1 (en) 1995-09-27 1997-04-03 Glasstech, Inc. Method and apparatus for coating glass sheet ribbon and resultant coated glass sheet
WO1997015499A1 (en) 1995-10-27 1997-05-01 Cal-West Equipment Company, Inc. Polymeric peel-off coating compositions and methods of use thereof
US6124044A (en) 1995-10-27 2000-09-26 Cal-West Equipment Company, Inc. Polymeric peel-off coating compositions and methods of use thereof
US5866199A (en) 1995-10-31 1999-02-02 Cal-West Equipment Company, Inc. Primer-paint mask composition and methods of use thereof
EP0771766B1 (en) 1995-11-02 1998-09-09 Guardian Industries Corp. Neutral, high performance, durable low-e glass coating system, insulating glass units made therefrom, and methods of making same
US5780380A (en) 1995-12-21 1998-07-14 Asahi Glass Company Ltd. Photocatalyst composition and process for its production, and photocatalyst composition-attached substrate
US6090489A (en) 1995-12-22 2000-07-18 Toto, Ltd. Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface
US5755867A (en) 1995-12-22 1998-05-26 Shin-Etsu Chemical Co., Ltd. Photocatalytic hydrophilic coating compositions
US5744215A (en) 1996-01-04 1998-04-28 Ppg Industries, Inc. Reduction of haze in transparent coatings
US6468402B1 (en) 1996-01-05 2002-10-22 Bekaert Vds Process for coating a substrate with titanium dioxide
US20040069623A1 (en) 1996-01-05 2004-04-15 Rotar, Inc. Sputtering targets and method for the preparation thereof
US6511587B2 (en) 1996-01-05 2003-01-28 Bekaert Vds Sputtering targets and method for the preparation thereof
US6461686B1 (en) 1996-01-05 2002-10-08 Bekaert Vds Sputtering targets and method for the preparation thereof
JPH09189801A (en) 1996-01-09 1997-07-22 Shin Etsu Chem Co Ltd Optical parts with heat resistant antireflection film
US5897957A (en) 1996-01-11 1999-04-27 Libbey-Owens-Ford Co. Coated glass article having a solar control coating
WO1997025201A1 (en) 1996-01-11 1997-07-17 Libbey-Owens-Ford Co. Coated glass article having a solar control coating
US5750265A (en) 1996-01-11 1998-05-12 Libbey-Owens-Ford Co. Coated glass article having a pyrolytic solar control coating
US6077492A (en) 1996-01-22 2000-06-20 Petroleum Energy Center Photocatalyst, process for producing the photocatalyst, and photocatalytic reaction method
JPH09202651A (en) 1996-01-25 1997-08-05 Central Glass Co Ltd Hydrophilic coating membrane and its formation
EP0787696B1 (en) 1996-02-01 2000-03-15 PPG Industries Ohio, Inc. Method of making an alkali metal diffusion barrier layer
US5820994A (en) 1996-02-16 1998-10-13 Mitsui Chemicals, Inc. Laminate and method for preparing same
US6468428B1 (en) 1996-02-28 2002-10-22 Hoya Corporation Glass material for carrying a photocatalyst, filter device using the same and light irradiating method
US5877391A (en) 1996-03-05 1999-03-02 Hitachi, Ltd. Method for treating gas containing organohalogen compounds, and catalyst for decomposing the organohalogen compounds
US5869187A (en) 1996-03-07 1999-02-09 Nissan Motor Co., Ltd. Defogging article and method of producing same
JPH09249967A (en) 1996-03-14 1997-09-22 Mitsubishi Materials Corp High purity barium-strontium titanate sputtering target material and its production
US5780119A (en) 1996-03-20 1998-07-14 Southwest Research Institute Treatments to reduce friction and wear on metal alloy components
US5871843A (en) 1996-03-27 1999-02-16 Asahi Glass Company Ltd. Laminate and process for its production
WO1997037946A1 (en) 1996-04-04 1997-10-16 Corning Incorporated Barrier film for hydrogen coloration in glass
WO1997037801A1 (en) 1996-04-10 1997-10-16 Sony Corporation Single phase tungsten-titanium sputter targets and method of producing same
US5896553A (en) 1996-04-10 1999-04-20 Sony Corporation Single phase tungsten-titanium sputter targets and method of producing same
WO1997042351A1 (en) 1996-05-03 1997-11-13 Stackpole Limited Making metal powder articles by sintering, spheroidizing and warm forming
WO1997042357A1 (en) 1996-05-06 1997-11-13 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
US5698262A (en) 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
US6068914A (en) 1996-05-14 2000-05-30 Saint-Gobain Vitrage Glazing pane having an anti-reflection coating
US6171659B1 (en) 1996-07-12 2001-01-09 Recherche et d{acute over (e)}veloppement du groupe Cockerill Sambre, en abr{acute over (e)}g{acute over (e)} Process for the formation of a coating on a substrate and device for the use this process
US6165256A (en) 1996-07-19 2000-12-26 Toto Ltd. Photocatalytically hydrophilifiable coating composition
US5854708A (en) 1996-07-26 1998-12-29 Murakami Corporation Anti-fog element
EP0820967B1 (en) 1996-07-26 2004-09-29 Murakami Corporation Anti-fog element
JPH1036144A (en) 1996-07-26 1998-02-10 Murakami Corp Antifogging element
JPH1048805A (en) 1996-07-30 1998-02-20 Toppan Printing Co Ltd Halftone phase shift mask blank and halftone phase shift mask
US6074981A (en) 1996-08-05 2000-06-13 Nippon Sheet Glass Co., Ltd. Photocatalyst and process for the preparation thereof
US6194346B1 (en) 1996-08-05 2001-02-27 Nippon Sheet Glass Co., Ltd. Photocatalyst and method of making
EP0870530B1 (en) 1996-08-05 2005-01-19 Nippon Sheet Glass Co., Ltd. Photocatalyst and process for the preparation thereof
US5939201A (en) 1996-08-07 1999-08-17 Saint-Gobain Vitrage Method for depositing a reflective layer on glass, and products obtained
US20060228476A1 (en) 1996-08-13 2006-10-12 Pilkington Pllc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
WO1998006675A1 (en) 1996-08-13 1998-02-19 Pilkington Plc Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
EP0944557B1 (en) 1996-08-13 2002-11-06 Pilkington Plc Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
US6238738B1 (en) 1996-08-13 2001-05-29 Libbey-Owens-Ford Co. Method for depositing titanium oxide coatings on flat glass
US6071606A (en) 1996-08-26 2000-06-06 Nissan Motor Co., Ltd Hydrophilic film and method for forming same on substrate
DE19736925A1 (en) 1996-08-26 1998-03-05 Central Glass Co Ltd Hydrophilic film and method for producing the same on a substrate
GB2316687B (en) 1996-08-26 1998-10-28 Nissan Motor Hydrophilic film and method for forming same on substrate
US6054024A (en) 1996-09-12 2000-04-25 Canon Kabushiki Kaisha Apparatus for forming transparent conductive film by sputtering and method therefor
US5780149A (en) 1996-09-13 1998-07-14 Libbey-Ownes-Ford Co. Glass article having a solar control coating
US5830327A (en) 1996-10-02 1998-11-03 Intevac, Inc. Methods and apparatus for sputtering with rotating magnet sputter sources
US5863398A (en) 1996-10-11 1999-01-26 Johnson Matthey Electonics, Inc. Hot pressed and sintered sputtering target assemblies and method for making same
US6451178B2 (en) 1996-10-28 2002-09-17 Leybold Systems Gmbh Interference layer system
EP0838535B1 (en) 1996-10-28 2000-02-02 Leybold Systems GmbH Interference layer system
DE19644752A1 (en) 1996-10-28 1998-04-30 Leybold Systems Gmbh Interference layer system
US5948538A (en) 1996-11-21 1999-09-07 Saint-Gobain Village Glazing assembly comprising a substrate provided with a stack of thin layers for solar protection and/or thermal insulation
WO1998023549A1 (en) 1996-11-26 1998-06-04 Saint-Gobain Vitrage Substrate with improved hydrophilic or hydrophobic properties, comprising irregularities
US6299981B1 (en) 1996-11-26 2001-10-09 Saint-Gobain Vitrage Substrate with improved hydrophilic or hydrophobic properties, comprising irregularities
WO1998025700A1 (en) 1996-12-09 1998-06-18 Toshiba Lighting & Technology Corporation Photocatalyst, light source and lighting device
EP0887104B1 (en) 1996-12-09 2003-11-12 Toshiba Lighting & Technology Corporation Photocatalyst, light source and lighting device
US5939194A (en) 1996-12-09 1999-08-17 Toto Ltd. Photocatalytically hydrophilifying and hydrophobifying material
US6242752B1 (en) 1996-12-09 2001-06-05 Toshiba Lighting And Technology Corp. Photocatalyst, light source and lighting device
US6156409A (en) 1996-12-09 2000-12-05 Nippon Sheet Glass Co., Ltd. Non-fogging article and process for the production thereof
US5968328A (en) 1996-12-11 1999-10-19 Leybold Systems Gmbh Device for sputter deposition of thin layers on flat substrates
US6379776B1 (en) 1996-12-18 2002-04-30 Nippon Sheet Glass Co., Ltd. Nonfogging and stainproof glass articles
US6120747A (en) 1996-12-27 2000-09-19 Nippon Shokubai Co., Ltd. Catalyst for removing organic halogen compounds, preparation method therefor and method for removing organic halogen compounds
US6114043A (en) 1997-02-10 2000-09-05 Saint-Gobain Vitrage Transparent substrate provided with at least one thin layer based on silicone nitride or oxynitride and the process for obtaining it
US6270633B1 (en) 1997-02-14 2001-08-07 Matsushita Electric Industrial Co., Ltd. Artificial latticed multi-layer film deposition apparatus
US6722159B2 (en) 1997-03-14 2004-04-20 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
EP1375444A1 (en) 1997-03-14 2004-01-02 PPG Industries Ohio, Inc. Photocatalytically-activated self-cleaning appliances
US6027766A (en) 1997-03-14 2000-02-22 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
US6054227A (en) 1997-03-14 2000-04-25 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning appliances
US7049002B2 (en) 1997-03-14 2006-05-23 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
US20020155299A1 (en) 1997-03-14 2002-10-24 Harris Caroline S. Photo-induced hydrophilic article and method of making same
US7096692B2 (en) 1997-03-14 2006-08-29 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
US20070218265A1 (en) 1997-03-14 2007-09-20 Harris Caroline S Photo-induced hydrophilic article and method of making same
US20030039843A1 (en) 1997-03-14 2003-02-27 Christopher Johnson Photoactive coating, coated article, and method of making same
US20030235695A1 (en) 1997-03-14 2003-12-25 Greenberg Charles B. Photocatalytically-activated self-cleaning article and method of making same
US6413581B1 (en) 1997-03-14 2002-07-02 Ppg Industries Ohio, Inc. Photocatalytically-activated self-cleaning article and method of making same
US20060263610A1 (en) 1997-03-14 2006-11-23 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
JPH10278165A (en) 1997-04-08 1998-10-20 Asahi Glass Co Ltd Manufacture of laminate
US5789040A (en) 1997-05-21 1998-08-04 Optical Coating Laboratory, Inc. Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition
CA2290999A1 (en) 1997-05-28 1998-12-03 Conny Petersen Plant and process for coating a multi-sided mineral fibre element
EP0884288A3 (en) 1997-06-09 1999-11-24 Nissan Motor Company, Limited Hydrophilic article
US6045903A (en) 1997-06-09 2000-04-04 Nissan Motor Co., Ltd. Hydrophilic article and method for producing same
US6228502B1 (en) 1997-06-24 2001-05-08 Kousei Co., Ltd. Material having titanium dioxide crystalline orientation film and method for producing the same
US6210750B1 (en) 1997-06-26 2001-04-03 Samsung Corning Co., Ltd. Water-repellent glass and process for preparing same
US5935716A (en) 1997-07-07 1999-08-10 Libbey-Owens-Ford Co. Anti-reflective films
GB2327428B (en) 1997-07-15 2002-11-20 Central Glass Co Ltd Photocatalytic glass article and method for producing same
DE19831610A1 (en) 1997-07-15 1999-01-21 Central Glass Co Ltd Photocatalytic glass article and process for its manufacture
US6403689B1 (en) 1997-07-22 2002-06-11 Rhodia Chimie Dispersion of titanium particles comprising a binder based on polyorgansiloxane
US6046403A (en) 1997-08-08 2000-04-04 Bridgestone Corporation Solar battery module
EP0901991A2 (en) 1997-08-29 1999-03-17 Central Glass Company, Limited Photocatalytic glass pane and method for producing same
US5873203A (en) 1997-09-02 1999-02-23 Ppg Industries, Inc. Photoelectrolytically-desiccating multiple-glazed window units
WO1999011896A1 (en) 1997-09-02 1999-03-11 Ppg Industries Ohio, Inc Photoelectrolytically-desiccating multiple-glazed window units
US6197101B1 (en) 1997-09-12 2001-03-06 Shin-Etsu Chemical Co., Ltd. Coating compositions, method of forming hydrophilic films, and hydrophilic film-coated articles
JPH1195014A (en) 1997-09-19 1999-04-09 Sumitomo Bakelite Co Ltd Conversing sheet for back light
US6248397B1 (en) 1997-11-04 2001-06-19 Pilkington Plc Method of depositing a silicon oxide coating on glass and the coated glass
US6319326B1 (en) 1997-12-05 2001-11-20 Korea Institute Of Science And Technology Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
US6071623A (en) 1998-02-13 2000-06-06 Central Glass Company, Limited Hydrophilic article and method for producing same
US20020155265A1 (en) 1998-02-19 2002-10-24 Hyung-Chul Choi Antireflection film
US6720066B2 (en) 1998-03-05 2004-04-13 Saint-Gobain Glass France Substrate with a photocatalytic coating
WO1999044954A1 (en) 1998-03-05 1999-09-10 Saint-Gobain Glass France Substrate with photocatalytic coating
US6465088B1 (en) 1998-03-05 2002-10-15 Saint-Gobain Glass France Substrate with a photocatalytic coating
US7195821B2 (en) 1998-03-20 2007-03-27 Glaverbel Coated substrate with high reflectance
US5993734A (en) 1998-03-25 1999-11-30 Sony Corporation Method for making W/Ti sputtering targets and products in an inert atmosphere
JPH11302038A (en) 1998-04-17 1999-11-02 Nippon Sheet Glass Co Ltd Heat ray reflective light-transmissible plate and heat ray reflective double layer light-transmissible plate using the same
US6154311A (en) 1998-04-20 2000-11-28 Simtek Hardcoatings, Inc. UV reflective photocatalytic dielectric combiner having indices of refraction greater than 2.0
US7309664B1 (en) 1998-06-10 2007-12-18 Saint-Gobain Recherche Substrate with a photocatalytic coating
US6040939A (en) 1998-06-16 2000-03-21 Turkiye Sise Ve Cam Fabrikalari A.S. Anti-solar and low emissivity functioning multi-layer coatings on transparent substrates
US6368668B1 (en) 1998-07-30 2002-04-09 Toto Ltd. Method and apparatus for producing a photocatalytic material
US20010030808A1 (en) 1998-08-06 2001-10-18 Toru Komatsu Anti-fog mirror and method for manufacturing the same
US6165598A (en) 1998-08-14 2000-12-26 Libbey-Owens-Ford Co. Color suppressed anti-reflective glass
US6908881B1 (en) 1998-08-21 2005-06-21 Ecodevice Laboratory Co., Ltd. Visible radiation type photocatalyst and production method thereof
WO2000013257A1 (en) 1998-08-26 2000-03-09 Maxon Systems Inc. (London) Ltd. An antenna collar apparatus for operating switches and the like
US7138181B2 (en) 1998-09-17 2006-11-21 Pilkington North America, Inc. Heat strengthened coated glass article
WO2000015571A1 (en) 1998-09-17 2000-03-23 Ppg Industries Ohio, Inc. Alkali metal diffusion barrier layer
JP2000094569A (en) 1998-09-24 2000-04-04 Asahi Chem Ind Co Ltd Soil resistant/electromagnetic wave shielding laminate and its production
US6576344B1 (en) 1998-09-30 2003-06-10 Nippon Sheet Glass Co., Ltd. Photocatalyst article, anti-fogging, anti-soiling articles, and production method of anti-fogging, anti-soiling articles
EP1066878B1 (en) 1998-09-30 2006-03-15 Nippon Sheet Glass Co., Ltd. Photocatalyst article, article prevented from fogging and fouling, and process for producing article prevented from fogging and fouling
US6336998B1 (en) 1998-10-07 2002-01-08 Chung Shan Institute Of Science And Technology UV lamp device for air cleaning
US6335479B1 (en) 1998-10-13 2002-01-01 Dai Nippon Printing Co., Ltd. Protective sheet for solar battery module, method of fabricating the same and solar battery module
US6365010B1 (en) 1998-11-06 2002-04-02 Scivac Sputtering apparatus and process for high rate coatings
US6488824B1 (en) 1998-11-06 2002-12-03 Raycom Technologies, Inc. Sputtering apparatus and process for high rate coatings
WO2000027771A9 (en) 1998-11-09 2000-11-09 Ppg Ind Ohio Inc Solar control coatings and coated articles
EP1179515B1 (en) 1998-12-21 2009-05-06 Cardinal CG Company Soil-resistant coating for glass surfaces
US6660365B1 (en) 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
US6964731B1 (en) 1998-12-21 2005-11-15 Cardinal Cg Company Soil-resistant coating for glass surfaces
US20050025982A1 (en) 1998-12-21 2005-02-03 Cardinal Cg Company Soil-resistant coating for glass surfaces
WO2000037377A1 (en) 1998-12-21 2000-06-29 Cardinal Ig Company Soil-resistant coating for glass surfaces
WO2000037376A1 (en) 1998-12-21 2000-06-29 Cardinal Ig Company Low-emissivity, soil-resistant coating for glass surfaces
US20050016835A1 (en) 1998-12-21 2005-01-27 Cardinal Cg Company Soil-resistant coating for glass surfaces
WO2000040402A1 (en) 1998-12-28 2000-07-13 Asahi Glass Company, Limited Layered product
US7005189B1 (en) 1998-12-28 2006-02-28 Asahi Glass Company, Limited Laminate and its production method
US6153067A (en) 1998-12-30 2000-11-28 Advanced Ion Technology, Inc. Method for combined treatment of an object with an ion beam and a magnetron plasma with a combined magnetron-plasma and ion-beam source
US6414213B2 (en) 1999-01-07 2002-07-02 Showa Denko K.K. Titanium oxide particle-coated interior member or indoor equipment
US6379746B1 (en) 1999-02-02 2002-04-30 Corning Incorporated Method for temporarily protecting glass articles
US6716323B1 (en) 1999-02-12 2004-04-06 Pilkington Plc Coating glass
WO2000050354A1 (en) 1999-02-23 2000-08-31 Ineos Acrylics Newton Aycliffe Limited Glass coating
US6350397B1 (en) 1999-03-10 2002-02-26 Aspen Research Corporation Optical member with layer having a coating geometry and composition that enhance cleaning properties
EP1046727A3 (en) 1999-04-23 2003-11-26 Nippon Sheet Glass Co. Ltd. Method of film deposition on substrate surface and substrate produced by the method
US6179971B1 (en) 1999-04-30 2001-01-30 Kse, Inc. Two stage process and catalyst for photocatalytic conversion of contaminants
US6368664B1 (en) 1999-05-03 2002-04-09 Guardian Industries Corp. Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon
US6777030B2 (en) 1999-05-03 2004-08-17 Guardian Industries Corp. Method of ion beam milling a glass substrate prior to depositing a coating system thereon, and corresponding system for carrying out the same
US6261693B1 (en) 1999-05-03 2001-07-17 Guardian Industries Corporation Highly tetrahedral amorphous carbon coating on glass
US20050106397A1 (en) 1999-05-18 2005-05-19 Krisko Annette J. Carbon based soil resistant coatings for glass surfaces
US7005188B2 (en) 1999-05-20 2006-02-28 Saint-Gobain Transparent substrate with an antireflection, low-emissivity or solar-protection coating
US20060159906A1 (en) 1999-05-25 2006-07-20 Saint-Gobain Glass France Transparent glazing and use thereof in a chilling chamber door comprising in particular a glazing under vacuum
US6179972B1 (en) 1999-06-02 2001-01-30 Kse, Inc. Two stage process and apparatus for photocatalytic and catalytic conversion of contaminants
WO2000075083A1 (en) 1999-06-03 2000-12-14 Grt, Inc. Treatment of contaminated liquids with oxidizing gases and liquids
US20030064231A1 (en) 1999-06-08 2003-04-03 Hurst Simon James Coated substrates
WO2000075087A1 (en) 1999-06-08 2000-12-14 Pilkington Plc Process for the production of photocatalytic coatings on substrates
US6929862B2 (en) 1999-06-08 2005-08-16 Libbey-Owens-Ford Co. Coated substrates
US6840061B1 (en) 1999-06-08 2005-01-11 Libbey-Owens-Ford Co. Coatings on substrates
EP1254870A3 (en) 1999-06-08 2003-01-02 Pilkington Plc Photocatalytically active coated substrates
US20060019104A1 (en) 1999-06-08 2006-01-26 Hurst Simon J Coated substrates
US20030048538A1 (en) 1999-06-25 2003-03-13 Tonar William L. Electrochromic device having a self-cleaning hydrophilic coating
US6789906B2 (en) 1999-06-25 2004-09-14 Gentex Corporation Electrochromic device having a self-cleaning hydrophilic coating
US6447123B2 (en) 1999-06-25 2002-09-10 Gentex Corporation Electrochromic device having a self-cleaning hydrophilic coating
US6193378B1 (en) 1999-06-25 2001-02-27 Gentex Corporation Electrochromic device having a self-cleaning hydrophilic coating
WO2001002496A3 (en) 1999-07-02 2001-07-12 Ppg Ind Ohio Inc Light-transmitting and/or coated article with removable protective coating and methods of making the same
US6682773B2 (en) 1999-07-02 2004-01-27 Ppg Industries Ohio, Inc. Light-transmitting and/or coated article with removable protective coating and methods of making the same
US6436542B1 (en) 1999-07-14 2002-08-20 Nippon Sheet Glass Co., Ltd. Multilayer structure and process for producing the same
US6835688B2 (en) 1999-08-05 2004-12-28 Kabushiki Kaisha Toyota Chuo Kenkyusho Photocatalytic material, photocatalyst, photocatalytic article, and method for the preparation thereof
US6833089B1 (en) 1999-08-05 2004-12-21 Nippon Sheet Glass Co., Ltd. Article having photocatalytic activity
US6794065B1 (en) 1999-08-05 2004-09-21 Kabushiki Kaisha Toyota Chuo Kenkyusho Photocatalytic material and photocatalytic article
EP1074525B1 (en) 1999-08-05 2004-09-29 Nippon Sheet Glass Co., Ltd. Article having photocatalytic activity
US6974629B1 (en) 1999-08-06 2005-12-13 Cardinal Cg Company Low-emissivity, soil-resistant coating for glass surfaces
US6582839B1 (en) 1999-09-02 2003-06-24 Central Glass Company, Limited Article with photocatalytic film
US6870657B1 (en) 1999-10-11 2005-03-22 University College Dublin Electrochromic device
US6800182B2 (en) 1999-10-13 2004-10-05 Asahi Glass Company, Limited Sputtering target, process for its production and film forming method
US6500690B1 (en) 1999-10-27 2002-12-31 Kaneka Corporation Method of producing a thin-film photovoltaic device
US20020046945A1 (en) 1999-10-28 2002-04-25 Applied Materials, Inc. High performance magnetron for DC sputtering systems
US6818309B1 (en) 1999-11-05 2004-11-16 Saint-Gobian Glass France Transparent substrate provided with a silicon derivative layer
FR2800731B1 (en) 1999-11-05 2002-01-18 Saint Gobain Vitrage TRANSPARENT SUBSTRATE HAVING A SILICON-DERIVED LAYER
WO2001032578A1 (en) 1999-11-05 2001-05-10 Saint-Gobain Glass France Transparent substrate provided with a silicon derivative layer
US6829084B2 (en) 1999-11-05 2004-12-07 Asahi Glass Company, Limited Ultraviolet and vacuum ultraviolet antireflection substrate
US6329060B1 (en) 1999-11-10 2001-12-11 Ppg Industries Ohio, Inc. Solvent-free film-forming compositions for clearcoats, coated substrates and method related thereto
US20050244678A1 (en) 1999-11-10 2005-11-03 Denglas Technologies, L.L.C. Niobium oxide-based layers for thin film optical coatings and processes for producing the same
US6425670B1 (en) 1999-11-12 2002-07-30 Murakami Corporation Colored anti-fog mirror
US6501387B2 (en) 1999-11-24 2002-12-31 Donnelly Corporation Rearview mirror assembly with added feature modular display
US6428172B1 (en) 1999-11-24 2002-08-06 Donnelly Corporation Rearview mirror assembly with utility functions
US6329925B1 (en) 1999-11-24 2001-12-11 Donnelly Corporation Rearview mirror assembly with added feature modular display
US20040146721A1 (en) 1999-12-02 2004-07-29 Klaus Hartig Haze-resistant transparent film stacks
US20020102352A1 (en) 1999-12-02 2002-08-01 Klaus Hartig Haze-resistant transparent film stacks
US6761984B2 (en) 1999-12-21 2004-07-13 Nippon Sheet Glass Co., Ltd. Article coated with photocatalyst film, method for preparing the article and sputtering target for use in coating with the film
US20040214010A1 (en) 1999-12-28 2004-10-28 Kenji Murata Glass for use in freezers/refrigerator and glass article using said glass
US20010016262A1 (en) 2000-01-07 2001-08-23 Takayuki Toyoshima Method of coating substrate and coated article
DE10100223A1 (en) 2000-01-07 2001-07-12 Nippon Sheet Glass Co Ltd Process for coating a substrate and coated article
DE10100221A1 (en) 2000-01-07 2001-07-12 Nippon Sheet Glass Co Ltd Process for coating a substrate comprises sputtering a target material in a vacuum chamber uses a sputtering gas whose composition can be changed
US20010007715A1 (en) 2000-01-07 2001-07-12 Takayuki Toyoshima Method of coating substrate and coated article
US6419800B2 (en) 2000-01-19 2002-07-16 Nippon Sheet Glass Co., Ltd. Film-forming apparatus and film-forming method
US6743749B2 (en) 2000-01-27 2004-06-01 Kabushiki Kaisha Toyota Chuo Kenkyusho Photocatalyst
WO2001068786A1 (en) 2000-03-13 2001-09-20 Toto Ltd. Hydrophilic member and method for manufacture thereof
US6881701B2 (en) 2000-03-21 2005-04-19 3M Innovative Properties Company Photocatalytic composition and method for preventing algae growth on building materials
WO2001071055A1 (en) 2000-03-22 2001-09-27 Nippon Sheet Glass Co., Ltd. Substrate with photocatalytic film and method for producing the same
US6777091B2 (en) 2000-03-22 2004-08-17 Nippon Sheet Glass Co., Ltd. Substrate with photocatalytic film and method for producing the same
US20030152780A1 (en) 2000-04-01 2003-08-14 Martin Baumann Glass ceramic and metal substrates with a self-cleaning surface, method for the production and use thereof
US6872441B2 (en) 2000-04-01 2005-03-29 Ferro Gmbh Glass ceramic and metal substrates with a self-cleaning surface, method for the production and use thereof
US6403686B1 (en) 2000-04-11 2002-06-11 W.R. Grace & Co. - Conn. Rheologically-dynamic, liquid-applicable elastomeric compositions
US6596664B2 (en) 2000-04-20 2003-07-22 Kse, Inc. Method, catalyst, and photocatalyst for the destruction of phosgene
US20020012779A1 (en) 2000-05-11 2002-01-31 Ichikoh Industries, Ltd. Visible light response type phptocatalyst
US20040005466A1 (en) 2000-07-12 2004-01-08 Daisuke Arai Photocatalytic member
US20020014634A1 (en) 2000-07-26 2002-02-07 Masato Koyama Semiconductor device and method of manufacturing the same
US6570709B2 (en) 2000-07-27 2003-05-27 Asahi Glass Company, Limited Substrate provided with antireflection films and its production method
US7323249B2 (en) 2000-08-31 2008-01-29 Ppg Industries Ohio, Inc. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US20020045073A1 (en) 2000-08-31 2002-04-18 Finley James J. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US6677063B2 (en) 2000-08-31 2004-01-13 Ppg Industries Ohio, Inc. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
WO2002040417A9 (en) 2000-08-31 2003-03-27 Ppg Ind Ohio Inc Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US20080124460A1 (en) 2000-08-31 2008-05-29 Ppg Industries Ohio, Inc. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US20030235720A1 (en) 2000-08-31 2003-12-25 Athey Pat Ruzakowski Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
US6921579B2 (en) 2000-09-11 2005-07-26 Cardinal Cg Company Temporary protective covers
WO2002024971A1 (en) 2000-09-20 2002-03-28 Saint-Gobain Glass France Substrate with photocatalytic coating
US20040043260A1 (en) 2000-09-20 2004-03-04 Nicolas Nadaud Substrate with photocatalytic coating
FR2814094B1 (en) 2000-09-20 2003-08-15 Saint Gobain SUBSTRATE WITH PHOTOCATALYTIC COATING AND MANUFACTURING METHOD THEREOF
US6875319B2 (en) 2000-09-20 2005-04-05 Saint-Gobain Glass France Substrate with photocatalytic coating
US6730630B2 (en) 2000-10-20 2004-05-04 Sumitomo Chemical Company, Limited Photocatalyst, process for producing the same and photocatalyst coating composition comprising the same
US6635155B2 (en) 2000-10-20 2003-10-21 Asahi Glass Company, Limited Method for preparing an optical thin film
US7311961B2 (en) 2000-10-24 2007-12-25 Ppg Industries Ohio, Inc. Method of making coated articles and coated articles made thereby
US20050238861A1 (en) 2000-10-24 2005-10-27 Harry Buhay Coated article
US6869644B2 (en) 2000-10-24 2005-03-22 Ppg Industries Ohio, Inc. Method of making coated articles and coated articles made thereby
US20020172775A1 (en) 2000-10-24 2002-11-21 Harry Buhay Method of making coated articles and coated articles made thereby
US6878450B2 (en) 2000-11-24 2005-04-12 Murakami Corporation Composite element and method for preparation thereof
US6787199B2 (en) 2000-11-24 2004-09-07 Murakami Corporation Composite device and manufacturing method therefor
WO2002049980A1 (en) 2000-12-21 2002-06-27 Ferro Gmbh Substrates with a self-cleaning surface, a process for their production and their use
US6800354B2 (en) 2000-12-21 2004-10-05 Ferro Gmbh Substrates with a self-cleaning surface, a process for their production and their use
US7060643B2 (en) 2000-12-28 2006-06-13 Showa Denko Kabushiki Kaisha Photo-functional powder and applications thereof
WO2002085809A8 (en) 2001-02-28 2003-04-10 Ppg Ind Ohio Inc Photo-induced hydrophilic article and method of making same
US20020189938A1 (en) 2001-03-16 2002-12-19 4Wave, Inc. System and method for performing sputter deposition with multiple targets using independent ion and electron sources and independent target biasing with DC pulse signals
US6811856B2 (en) 2001-04-12 2004-11-02 Creavis Gesellschaft Fuer Technologie Und Innovation Mbh Properties of structure-formers for self-cleaning surfaces, and the production of the same
US7387839B2 (en) 2001-05-16 2008-06-17 Saint-Gobain Glass France Substrate with photocatalytic coating
US20040180220A1 (en) 2001-05-16 2004-09-16 Lethicia Gueneau Substrate with a photocatalytic coating
WO2003006393A1 (en) 2001-07-13 2003-01-23 Ppg Industries Ohio, Inc. Visible-light-responsive photoactive coating, coated article, and method of making same
WO2003009061A3 (en) 2001-07-13 2003-11-13 Ppg Ind Ohio Inc Photoactive coating, coated article, and method of making same
US7348054B2 (en) 2001-07-25 2008-03-25 Saint-Gobain Glass France Substrate coated with a composite film, method for making same and uses thereof
US20040219348A1 (en) 2001-07-25 2004-11-04 Catherine Jacquiod Substrate coated with a composite film, method for making same and uses thereof
US20040032655A1 (en) 2001-07-26 2004-02-19 Hideyuki Kikuchi Antiglare anticlouding device and automotive outer mirror
EP1411386A4 (en) 2001-07-26 2005-02-09 Murakami Corp Antiglare anticlouding device and automotive outer mirror
US6781738B2 (en) 2001-07-26 2004-08-24 Murakami Corporation Antiglare anticlouding device and automotive outer mirror
WO2003012540A1 (en) 2001-07-26 2003-02-13 Murakami Corporation Antiglare anticlouding device and automotive outer mirror
US20040253382A1 (en) 2001-08-13 2004-12-16 Wilmert De Bosscher Sputter target
US20030038028A1 (en) 2001-08-17 2003-02-27 W. C. Heraeus Gmbh & Co. Kg Sputter target based on titanium dioxide
US20040206024A1 (en) 2001-08-28 2004-10-21 Wolfgang Graf System comprising a glazing element and a gas supply device
US20030043464A1 (en) 2001-08-30 2003-03-06 Dannenberg Rand David Optical coatings and associated methods
US20030054177A1 (en) 2001-09-20 2003-03-20 National Inst. Of Advanced Ind. Science And Tech. Multifunctional energy efficient window coating
US20040248725A1 (en) 2001-09-28 2004-12-09 Junji Hiraoka Photocatalyst element, method and device for preparing the same
US7118936B2 (en) 2001-10-11 2006-10-10 Bridgestone Corporation Organic dye-sensitized metal oxide semiconductor electrode and its manufacturing method, and organic dye-sensitized solar cell
US6954240B2 (en) 2001-10-16 2005-10-11 Nitto Denko Corporation Method of producing polarizing plate, and liquid crystal display comprising the polarizing plate
US20050019505A1 (en) 2001-10-16 2005-01-27 Nitto Denko Corporation Method of producing polarizing plate, and liquid crystal display comprising the polarizing plate
US20040179978A1 (en) 2001-10-18 2004-09-16 Takeshi Kobayashi Photocatalytic material and uses thereof
US7179527B2 (en) 2001-10-19 2007-02-20 Asahi Glass Company, Limited Substrate with transparent conductive oxide film, process for its production and photoelectric conversion element
US20070224357A1 (en) 2001-10-22 2007-09-27 Ppg Industries Ohio, Inc. Coating stack comprising a layer of barrier coating
US6916542B2 (en) 2001-10-22 2005-07-12 Ppg Industries Ohio, Inc. Coated articles having a protective coating and cathode targets for making the coated articles
US6962759B2 (en) 2001-10-22 2005-11-08 Ppg Industries Ohio, Inc. Method of making coated articles having an oxygen barrier coating and coated articles made thereby
US7232615B2 (en) 2001-10-22 2007-06-19 Ppg Industries Ohio, Inc. Coating stack comprising a layer of barrier coating
US20060011945A1 (en) 2001-10-29 2006-01-19 Valerie Spitzer-Keller Photocatalyst and process for purifying gas effluent by photocatalytic oxidation
US6800183B2 (en) 2001-11-05 2004-10-05 Anelva Corporation Sputtering device
US7022416B2 (en) 2001-11-08 2006-04-04 Nippon Sheet Glass Company, Limited Article coated with coating film, and functional article coated with coating film using the same
US6673738B2 (en) 2001-11-28 2004-01-06 K.K. Ueda Shikimono Kojyo Photocatalytic active carbon, colored photocatalytic active carbon, coloring active carbon, and deodorant and adsorption product using them
US20050020444A1 (en) 2001-11-29 2005-01-27 Junji Hiraoka Method and apparatus for producing photocatalyst
WO2003050056A8 (en) 2001-12-08 2004-09-10 Pilkington Plc Self-cleaning glazing sheet
US20050252108A1 (en) 2001-12-08 2005-11-17 Sanderson Kevin D Self-cleaning glazing sheet
EP1466665B1 (en) 2001-12-21 2012-10-10 Nippon Sheet Glass Co., Ltd. Member having photocatalytic function and method for manufacture thereof
US20050233899A1 (en) 2001-12-21 2005-10-20 Toshiaki Anzaki Member having photocatalytic function and method for manufacture thereof
WO2003053577A1 (en) 2001-12-21 2003-07-03 Nippon Sheet Glass Co., Ltd. Member having photocatalytic function and method for manufacture thereof
US20040115362A1 (en) 2002-01-14 2004-06-17 Klause Hartig Photocatalytic sputtering targets and methods for the production and use thereof
WO2003062166A3 (en) 2002-01-25 2004-03-11 Saint Gobain Treatment of organic pollution on an inorganic substrate
US6770321B2 (en) 2002-01-25 2004-08-03 Afg Industries, Inc. Method of making transparent articles utilizing protective layers for optical coatings
US20050084688A1 (en) 2002-01-25 2005-04-21 Saint-Gobain Glass Franch Treatment of organic pollution on an inorganic substrate
US20030143437A1 (en) 2002-01-31 2003-07-31 Fuji Xerox Co., Ltd. Titanium oxide photocatalyst thin film and production method of titanium oxide photocatalyst thin film
US20030180547A1 (en) 2002-02-11 2003-09-25 Harry Buhay Solar control coating
WO2003068500A1 (en) 2002-02-11 2003-08-21 Ppg Industries Ohio, Inc. Solar control coating
US6679978B2 (en) 2002-02-22 2004-01-20 Afg Industries, Inc. Method of making self-cleaning substrates
WO2003072849A1 (en) 2002-02-22 2003-09-04 Afg Industries, Inc. Method of making self-cleaning substrates
US20050042375A1 (en) 2002-02-28 2005-02-24 Japan Science And Technology Agency Titania nanosheet alignment thin film, process for producing the same and article including the titania nanosheet alignment thin film
US20050227008A1 (en) 2002-03-25 2005-10-13 Katsumi Okada Titanium oxide photocatalyst, process for producing the same and application
EP1500634A4 (en) 2002-03-26 2008-01-23 Nippon Sheet Glass Co Ltd Glass substrate and process for producing the same
WO2003080530A1 (en) 2002-03-26 2003-10-02 Nippon Sheet Glass Company, Limited Glass substrate and process for producing the same
US7320827B2 (en) 2002-03-26 2008-01-22 Nippon Sheet Glass Company, Limited Glass substrate and method of manufacturing the same
US20030186089A1 (en) 2002-03-27 2003-10-02 Murakami Corporation Composite material
US20030215647A1 (en) 2002-04-05 2003-11-20 Murakami Corporation Composite material
US6908698B2 (en) 2002-04-05 2005-06-21 Murakami Corporation Composite material
WO2003087002A1 (en) 2002-04-17 2003-10-23 Saint-Gobain Glass France Substrate with a self-cleaning coating
US20060014050A1 (en) 2002-04-17 2006-01-19 Lethicia Gueneau Substrate with a self-cleaning coating
FR2838734B1 (en) 2002-04-17 2005-04-15 Saint Gobain SELF-CLEANING COATING SUBSTRATE
FR2838735B1 (en) 2002-04-17 2005-04-15 Saint Gobain SELF-CLEANING COATING SUBSTRATE
WO2003087005A1 (en) 2002-04-17 2003-10-23 Saint-Gobain Glass France Substrate with a self-cleaning coating
US20050221098A1 (en) 2002-04-17 2005-10-06 Saint-Gobain Glass France Substrate with a self-cleaning coating
JP2003311157A (en) 2002-04-18 2003-11-05 Toyota Central Res & Dev Lab Inc Metal oxide photocatalytic body and manufacturing method therefor
US6464951B1 (en) 2002-04-20 2002-10-15 Kse, Inc. Method, catalyst, and photocatalyst for the destruction of phosgene
WO2003095385A1 (en) 2002-04-25 2003-11-20 Ppg Industries Ohio, Inc. Methods of changing the visible light transmittance of coated articles and coated articles made thereby
WO2003091471A3 (en) 2002-04-25 2004-12-09 Ppg Ind Ohio Inc Coated articles having a protective coating and cathode targets for making the coated articles
WO2003093188A1 (en) 2002-05-03 2003-11-13 Ppg Industries Ohio, Inc. Substrate having thermal management coating for an insulating glass unit
US20040009356A1 (en) 2002-05-03 2004-01-15 Medwick Paul A. Substrate having thermal management coating for an insulating glass unit
US20070116967A1 (en) 2002-05-03 2007-05-24 Ppg Industries Ohio, Inc. Substrate having thermal management coating for an insulating glass unit
US7198699B2 (en) 2002-05-06 2007-04-03 Guardian Industries Corp. Sputter coating apparatus including ion beam source(s), and corresponding method
WO2003095695A3 (en) 2002-05-06 2004-06-03 Guardian Industries Sputter coating apparatus including ion beam source(s), and corresponding method
US20040020761A1 (en) 2002-05-06 2004-02-05 Guardian Industries Corp. Sputter coating apparatus including ion beam source(s), and corresponding method
WO2003097549A1 (en) 2002-05-14 2003-11-27 Pilkington North America, Inc. Reflective, solar control coated glass article
US6733889B2 (en) 2002-05-14 2004-05-11 Pilkington North America, Inc. Reflective, solar control coated glass article
EP1506143B1 (en) 2002-05-14 2006-05-31 Pilkington North America, Inc. Reflective, solar control coated glass article
US20030224620A1 (en) 2002-05-31 2003-12-04 Kools Jacques C.S. Method and apparatus for smoothing surfaces on an atomic scale
US20050003672A1 (en) 2002-05-31 2005-01-06 Kools Jacques C.S. Method and apparatus for smoothing surfaces on an atomic scale
US7211543B2 (en) 2002-06-03 2007-05-01 Asahi Kasei Kabushiki Kaisha Photocatalyst composition
US20060051597A1 (en) 2002-06-17 2006-03-09 Nippon Sheet Glass Co., Ltd. Article coated with titanium compound film, process for producing the article and sputtering target for use in coating the film
WO2003106732A1 (en) 2002-06-17 2003-12-24 日本板硝子株式会社 Article coated with titanium compound film, process for producing the article and sputtering target for use in the film coating
US20050191505A1 (en) 2002-07-09 2005-09-01 Institut Fuer Neue Materialien Gemeinnuetzige Gmbh Substrates comprising a photocatalytic TiO2 layer
WO2004013376A3 (en) 2002-07-30 2004-05-06 Saint Gobain Titania coatings by plasma cvd at atmospheric pressure
US20060141290A1 (en) 2002-07-30 2006-06-29 Saint-Gobain Glass Grance Titania coatings by cvd at atmospheric pressure
US20050191522A1 (en) 2002-08-29 2005-09-01 Nippon Sheet Glass Co., Ltd. Article coated with zirconium compound film, method for preparing the article and sputtering target for use in coating with the film
US6952299B1 (en) 2002-08-29 2005-10-04 Murakami Corporation Electrochromic device
US7011691B2 (en) 2002-08-30 2006-03-14 Sumitomo Metal Mining Co. Ltd. Oxide sintered body
US20070137673A1 (en) 2002-09-10 2007-06-21 Ppg Industries, Inc. Method and apparatus for cleaning a photoactive and/or hydrophilic surface
US7223523B2 (en) 2002-09-18 2007-05-29 Ppg Industries Ohio, Inc. Demonstration kit and method for enhancing and/or demonstrating photoactive properties
US7175911B2 (en) 2002-09-18 2007-02-13 Toshiba Ceramics Co., Ltd. Titanium dioxide fine particles and method for producing the same, and method for producing visible light activatable photocatalyst
US20040063320A1 (en) 2002-09-30 2004-04-01 Hollars Dennis R. Manufacturing apparatus and method for large-scale production of thin-film solar cells
US20060152832A1 (en) 2002-10-10 2006-07-13 Laurent Aumercier Hydrophilic reflective article
WO2004034105A1 (en) 2002-10-10 2004-04-22 Glaverbel Hydrophilic reflective article
US20040163945A1 (en) 2002-12-18 2004-08-26 Klaus Hartig Plasma-enhanced film deposition
US20040149307A1 (en) 2002-12-18 2004-08-05 Klaus Hartig Reversible self-cleaning window assemblies and methods of use thereof
US6890656B2 (en) 2002-12-20 2005-05-10 General Electric Company High rate deposition of titanium dioxide
US20050248824A1 (en) 2002-12-24 2005-11-10 Murakami Corporation Electrochromic element
US7261942B2 (en) 2002-12-31 2007-08-28 Prizmalite Industries Inc. Photocatalytically-active, self-cleaning aqueous coating compositions and methods
WO2004061151A1 (en) 2002-12-31 2004-07-22 Cardinal Cg Company Coater having substrate cleaning device and coating deposition methods employing such coater
US7264741B2 (en) 2002-12-31 2007-09-04 Cardinal Cg Company Coater having substrate cleaning device and coating deposition methods employing such coater
US7309405B2 (en) 2003-01-15 2007-12-18 P & I Corp. Method of forming ITO film
US20040140198A1 (en) 2003-01-15 2004-07-22 Jun-Sik Cho Method of forming ITO film
WO2004067464A1 (en) 2003-01-28 2004-08-12 Philips Intellectual Property & Standards Gmbh Method of producing transparent titanium oxide coatings having a rutile structure
US20050051422A1 (en) 2003-02-21 2005-03-10 Rietzel James G. Cylindrical magnetron with self cleaning target
US20060165996A1 (en) 2003-03-11 2006-07-27 Guardian Industries Corp. Coated article including titanium oxycarbide and method of making same
US7052585B2 (en) 2003-03-11 2006-05-30 Guardian Industries Corp. Coated article including titanium oxycarbide and method of making same
US20040180216A1 (en) 2003-03-11 2004-09-16 Veerasamy Vijayen S. Coated article including titanium oxycarbide and method of making same
US20070029527A1 (en) 2003-03-12 2007-02-08 University Of Strathclyde Indicator for detecting a photocatalyst
US20060102465A1 (en) 2003-03-25 2006-05-18 Bekaert Vds Contacting of an electrode with a substance in vacuum
WO2004085701A1 (en) 2003-03-25 2004-10-07 Pilkington Plc Titania coatings
WO2004086104A8 (en) 2003-03-25 2006-06-29 Organization Of Shinshu Univer Anti-reflection coating
US20060194066A1 (en) 2003-03-25 2006-08-31 Liang Ye Titania coatings
WO2004085699A3 (en) 2003-03-25 2004-11-04 Bekaert Vds Contacting of an electrode with a device in vacuum
WO2004087985A3 (en) 2003-03-28 2005-01-20 Ppg Ind Ohio Inc Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal
US20070231501A1 (en) 2003-03-28 2007-10-04 Finley James J Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal
US20040241490A1 (en) 2003-03-28 2004-12-02 Finley James J. Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal
US20050245383A1 (en) 2003-04-03 2005-11-03 Asahi Glass Company Limited Silica glass containing TiO2 and optical material for EUV lithography
US20050272590A1 (en) 2003-04-03 2005-12-08 Asahi Glass Company Limited Silica glass containing TiO2 and process for its production
US20050245382A1 (en) 2003-04-03 2005-11-03 Asahi Glass Company Limited Silica glass containing TiO2 and process for its production
WO2004089839A1 (en) 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and process for its production
US20040196580A1 (en) 2003-04-03 2004-10-07 Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho Reflecting mirror
WO2004089836A1 (en) 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and process for its production
WO2004089838A1 (en) 2003-04-03 2004-10-21 Asahi Glass Company Limited Silica glass containing tio2 and optical material for euv lithography
US6997570B2 (en) 2003-04-03 2006-02-14 Kabushiki Kaisha Tokai-Rika-Denki Seisakusho Reflecting mirror
US20040202890A1 (en) 2003-04-08 2004-10-14 Kutilek Luke A. Methods of making crystalline titania coatings
US6878242B2 (en) 2003-04-08 2005-04-12 Guardian Industries Corp. Segmented sputtering target and method/apparatus for using same
WO2004092088A3 (en) 2003-04-08 2005-06-16 Ppg Ind Ohio Inc Methods of making crystalline titania coatings
WO2004092089A1 (en) 2003-04-08 2004-10-28 Ppg Industries Ohio, Inc. Methods of obtaining photoactive coatings and articles made thereby
WO2004097063A3 (en) 2003-04-25 2005-02-24 Asahi Glass Co Ltd Method for producing silicon oxide film and method for producing optical multilayer film
US20060032739A1 (en) 2003-04-25 2006-02-16 Asahi Glass Company, Limited Method for producing silicon oxide film and method for producing optical multilayer film
US20070275253A1 (en) 2003-05-30 2007-11-29 Ppg Industries Ohio, Inc. Appliance with coated transparency
WO2004108618A3 (en) 2003-05-30 2005-06-23 Ppg Ind Ohio Inc Appliance with coated transparency
US20040241040A1 (en) 2003-05-30 2004-12-02 Di Wei Tungsten oxide/titanium dioxide photocatalyst for improving indoor air quality
US20040253471A1 (en) 2003-05-30 2004-12-16 Thiel James P. Appliance with coated transparency
US7255831B2 (en) 2003-05-30 2007-08-14 Carrier Corporation Tungsten oxide/titanium dioxide photocatalyst for improving indoor air quality
US20040247901A1 (en) 2003-06-05 2004-12-09 Fuji Photo Film Co., Ltd. Plastic optical elements
WO2004108846A3 (en) 2003-06-05 2005-07-14 Chemetall Gmbh Coating system for glass surfaces, method for the production and use thereof
US20070111012A1 (en) 2003-06-06 2007-05-17 David Rimmer Coated glass
WO2004108619A1 (en) 2003-06-06 2004-12-16 Pilkington Plc Coated glass
WO2004113064A1 (en) 2003-06-20 2004-12-29 Nippon Sheet Glass Co., Ltd. Member having photocatalytic activity and multilayered glass
EP1640149A1 (en) 2003-06-20 2006-03-29 Nippon Sheet Glass Company, Limited Member having photocatalytic activity and multilayered glass
US20070031681A1 (en) 2003-06-20 2007-02-08 Nippon Sheet Glass Co., Ltd. Member having photocatalytic activity and multilayered glass
US20060234064A1 (en) 2003-06-27 2006-10-19 Saint Gobain Glass France Dielectric-layer-coated substrate and installation for production thereof
WO2005000758A3 (en) 2003-06-27 2005-10-13 Saint Gobain Dielectric-layer-coated substrate and installation for production thereof
US20060275612A1 (en) 2003-06-27 2006-12-07 Saint-Gobain Glass France Dielectric-layer-coated substrate and installation for production thereof
WO2005000759A3 (en) 2003-06-27 2006-04-20 Saint Gobain Dielectric-layer-coated substrate and installation for production thereof
US20070092734A1 (en) 2003-07-01 2007-04-26 Saint-Gobain Glass France Method for deposition of titanium oxide by a plasma source
WO2005005337A1 (en) 2003-07-01 2005-01-20 Pilkington North America, Inc. Process for chemical vapor deposition of a nitrogen-doped titanium oxide coating
US7211513B2 (en) 2003-07-01 2007-05-01 Pilkington North America, Inc. Process for chemical vapor desposition of a nitrogen-doped titanium oxide coating
WO2005012593A1 (en) 2003-07-01 2005-02-10 Saint-Gobain Glass France Method for deposition of titanium oxide by a plasma source
WO2005007286A1 (en) 2003-07-16 2005-01-27 Profine Gmbh Photocatalytically active coating of a substrate
US20080026161A1 (en) 2003-07-16 2008-01-31 Wolfgang Frings Photocatalytically Active Coating of a Substrate
US20050031876A1 (en) 2003-07-18 2005-02-10 Songwei Lu Nanostructured coatings and related methods
US20070087187A1 (en) 2003-07-18 2007-04-19 Ppg Industries Ohio, Inc. Nanostructured coatings and related methods
FR2857885B1 (en) 2003-07-23 2006-12-22 Saint Gobain PROCESS FOR THE PREPARATION OF A PHOTOCATALYTIC COATING INTEGRATED IN THE THERMAL TREATMENT OF A GLAZING
US20060201203A1 (en) 2003-07-23 2006-09-14 Saint-Gobain Glass France Method for preparing a photocatalytic coating integated into glazing heat treatment
WO2005009914A3 (en) 2003-07-23 2005-12-22 Saint Gobain Method for preparing a photocatalytic coating integrated into glazing heat treatment
WO2005023723A1 (en) 2003-08-29 2005-03-17 Pilkington North America, Inc. Deposition of silica coatings on a substrate
US20050044894A1 (en) 2003-08-29 2005-03-03 Douglas Nelson Deposition of silica coatings on a substrate
WO2005040058A1 (en) 2003-10-23 2005-05-06 Saint-Gobain Glass France Substrate, in particular glass substrate, supporting at least one stack of a photocatalytic layer and a sublayer for the heteroepitaxial growth of said layer
FR2861385B1 (en) 2003-10-23 2006-02-17 Saint Gobain SUBSTRATE, IN PARTICULAR GLASS SUBSTRATE, CARRYING AT LEAST ONE PHOTOCATALYTIC LAYER STACK WITH THE HETEROEPITAXIAL GROWTH LAYER OF THE LAYER
WO2005040056A3 (en) 2003-10-23 2005-06-30 Saint Gobain Substrate, in particular glass substrate, supporting a photocatalytic layer coated with a protective thin layer
US20070129248A1 (en) 2003-10-23 2007-06-07 Laurent Labrousse Substrate, in particular glass substrate, supporting at least one stack of a photocatalytic layer and a sublayer for the heteroepitaxial growth of said layer
US20070148064A1 (en) 2003-10-23 2007-06-28 Laurent Labrousse Substrate, in particular glass substrate, supporting a photocatalytic layer coated with a protective thin layer
FR2861386B1 (en) 2003-10-23 2006-02-17 Saint Gobain SUBSTRATE, IN PARTICULAR GLASS SUBSTRATE, CARRYING A PHOTOCATALYTIC LAYER COATED WITH A PROTECTIVE THIN LAYER.
US20060225999A1 (en) 2003-12-09 2006-10-12 Asahi Glass Company, Limited Ti oxide film having visible light-responsive photocatalytic activites and process for its production
US20060003545A1 (en) 2003-12-15 2006-01-05 Guardian Industries Corp. Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s)
WO2005063646A1 (en) 2003-12-22 2005-07-14 Cardinal Cg Company Graded photocatalytic coatings
US20060055513A1 (en) 2003-12-22 2006-03-16 James French Control system
US7294404B2 (en) 2003-12-22 2007-11-13 Cardinal Cg Company Graded photocatalytic coatings
US20050137084A1 (en) 2003-12-22 2005-06-23 Krisko Annette J. Graded photocatalytic coatings
JP2005213585A (en) 2004-01-29 2005-08-11 Konica Minolta Opto Inc Magnetron sputtering apparatus
US20080011408A1 (en) 2004-02-25 2008-01-17 Afg Industries, Inc. Heat stabilized sub-stoichiometric dielectrics
US20050233893A1 (en) 2004-03-17 2005-10-20 Sumitomo Chemical Company, Limited Coating composition of photocatalyst
WO2005102953A3 (en) 2004-04-09 2006-03-02 Saint Gobain Substrate, such as a glass substrate, bearing a layer with photocatalytic properties which has been modified to absorb photons in the visible spectrum
US20080115471A1 (en) 2004-04-09 2008-05-22 Saint-Gobain Glass France Substrate, Such as a Glass Substrate, Bearing a Layer with Photocatalytic Properties Which has Been Modified to Absorb Photons in the Visible Spectrum
WO2005102952A3 (en) 2004-04-13 2006-08-24 Saint Gobain Photocatalytic substrate active under a visible light
WO2005111257A3 (en) 2004-04-27 2007-11-15 Ppg Ind Ohio Inc Effects of methods of manufacturing sputtering targets on characteristics of coatings
US20050258030A1 (en) 2004-04-27 2005-11-24 Finley James J Effects of methods of manufacturing sputtering targets on characteristics of coatings
WO2006007062A3 (en) 2004-05-06 2006-03-23 Ppg Ind Ohio Inc Msvd coating process
US20050247555A1 (en) 2004-05-06 2005-11-10 Thiel James P MSVD coating process
FR2869897B1 (en) 2004-05-10 2006-10-27 Saint Gobain PHOTOCATALYTIC COATING SUBSTRATE
WO2005110937A3 (en) 2004-05-10 2006-04-06 Saint Gobain Substrate having a photocatalytic coating
US20070218264A1 (en) 2004-05-10 2007-09-20 Saint- Gobain Glass France Substrate Having a Photocatalytic Coating
US7354624B2 (en) 2004-05-28 2008-04-08 Ppg Industries Ohio, Inc. Multi-layer coatings and related methods
US20050266248A1 (en) 2004-05-28 2005-12-01 Millero Edward R Multi-layer coatings and related methods
WO2006004169A1 (en) 2004-07-01 2006-01-12 Asahi Glass Company, Limited Silica glass containing tio2 and process for its production
US20070042893A1 (en) 2004-07-01 2007-02-22 Asahi Glass Company, Limited Silica glass containing TiO2 and process for its production
WO2006017311A1 (en) 2004-07-12 2006-02-16 Cardinal Cg Company Low-maintenance coatings
WO2006017349A1 (en) 2004-07-12 2006-02-16 Cardinal Cg Company Low-maintenance coatings
US20060057401A1 (en) 2004-07-12 2006-03-16 Krisko Annette J Low-maintenance coatings
US20060057298A1 (en) 2004-07-12 2006-03-16 Krisko Annette J Low-maintenance coatings
US7713632B2 (en) 2004-07-12 2010-05-11 Cardinal Cg Company Low-maintenance coatings
US7604865B2 (en) 2004-07-12 2009-10-20 Cardinal Cg Company Low-maintenance coatings
WO2006019995A3 (en) 2004-07-14 2007-05-24 Afg Ind Inc Silicon oxycarbide coatings having durable hydrophilic properties
US20060014027A1 (en) 2004-07-14 2006-01-19 Afg Industries, Inc. Silicon oxycarbide coatings having durable hydrophilic properties
US20060031681A1 (en) 2004-08-05 2006-02-09 Motorola, Inc. Method and system for controlling access to a wireless client device
WO2006020477A3 (en) 2004-08-09 2006-09-28 Ppg Ind Ohio Inc Coated substrates that include an undercoating
US20060029813A1 (en) 2004-08-09 2006-02-09 Kutilek Luke A Coated substrates that include an undercoating
US20070218311A1 (en) 2004-09-01 2007-09-20 O'shaughnessy Dennis J Metal based coating composition and related coated substrates
WO2006028729A1 (en) 2004-09-01 2006-03-16 Ppg Industries Ohio, Inc. Metal based coating composition and related coated substrates
WO2006036605A1 (en) 2004-09-27 2006-04-06 Guardian Industries Corp. Method of making heat treated coated glass article, and intermediate product used in same
US20060070869A1 (en) 2004-10-04 2006-04-06 Krisko Annette J Thin film coating and temporary protection technology, insulating glazing units, and associated methods
US20060090996A1 (en) 2004-11-03 2006-05-04 Nano-Proprietary, Inc. Photocatalytic process
US7300634B2 (en) 2004-11-03 2007-11-27 Nano-Proprietary, Inc. Photocatalytic process
US7534466B2 (en) 2004-11-15 2009-05-19 Cardinal Cg Company Methods and equipment for depositing coatings having sequenced structures
US20060105103A1 (en) 2004-11-15 2006-05-18 Klaus Hartig Methods and equipment for depositing coatings having sequenced structures
WO2006055513B1 (en) 2004-11-18 2006-11-02 Honeywell Int Inc Methods of forming three-dimensional pvd targets
US20070196563A1 (en) 2004-11-18 2007-08-23 Yi Wuwen Three-dimensional pvd targets, and methods of forming three-dimensional pvd targets
US20080014349A1 (en) 2004-11-19 2008-01-17 Nippon Sheet Glass Company, Limited Process For Producing Glass Plate With Thin Film
WO2006054954A1 (en) 2004-11-22 2006-05-26 Water And Environmental Technologies Pte. Ltd Fabrication of a densely packed nano-structured photocatalyst for environmental applications
WO2006057830A3 (en) 2004-11-24 2007-01-11 Guardian Industries Flush-mounted slider window for pick-up truck with hydrophilic coating on interior surface thereof, and method of making same
US20060110605A1 (en) 2004-11-24 2006-05-25 Guardian Industries Corp. Hydrophilic coating and method of making same
US20060107599A1 (en) 2004-11-24 2006-05-25 Guardian Industries Corp. Flush-mounted slider window for pick-up truck with hydrophilic coating on interior surface thereof, and method of making same
US20060121315A1 (en) 2004-12-03 2006-06-08 Kari Myli Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US20070237968A1 (en) 2004-12-06 2007-10-11 Nippon Sheet Glass Company, Limited Glass Member Having Photocatalytic Function and Heat Reflecting Function and Double Paned Glass Including The Same
US20060118406A1 (en) 2004-12-08 2006-06-08 Energy Photovoltaics, Inc. Sputtered transparent conductive films
WO2006062902A2 (en) 2004-12-09 2006-06-15 Guardian Industries Corp. Hydrophilic coating and method of making same
US20060127604A1 (en) 2004-12-15 2006-06-15 Nippon Sheet Glass Company, Ltd. Optical film
US7361963B2 (en) 2004-12-15 2008-04-22 Nippon Sheet Glass Company, Ltd. Optical film
WO2006064060A1 (en) 2004-12-16 2006-06-22 Glaverbel Substrate with antimicrobial properties
WO2006064059A1 (en) 2004-12-16 2006-06-22 Glaverbel Substrate with antimicrobial properties
WO2006066101A3 (en) 2004-12-17 2006-10-12 Afg Ind Inc Air oxidizable scratch resistant protective layer for optical coatings
US20060134436A1 (en) 2004-12-17 2006-06-22 Afg Industries, Inc. Air oxidizable scratch resistant protective layer for optical coatings
US20060134322A1 (en) 2004-12-20 2006-06-22 Harris Caroline S Substrates coated with a polycrystalline functional coating
US20080119352A1 (en) 2005-01-18 2008-05-22 Shinya Kitaguchi Visible Light-Responsive Photocatalyst Composition and Process for Producing the Same
WO2006077839A1 (en) 2005-01-18 2006-07-27 Nippon Shokubai Co., Ltd. Visible light-responsive photocatalyst composition and process for producing the same
WO2006089964A1 (en) 2005-02-28 2006-08-31 Glaverbel Substrate for hydrophobic coating
US20060196765A1 (en) 2005-03-07 2006-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Metallization target optimization method providing enhanced metallization layer uniformity
WO2006101994A3 (en) 2005-03-18 2007-10-11 Guardian Industries Coated article with anti-reflective coating and method of making same
US20060210783A1 (en) 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
US20060210810A1 (en) 2005-03-21 2006-09-21 Harris Caroline S Substrates coated with a multi-film functional coating
FR2884147B3 (en) 2005-04-11 2008-06-13 Saint Gobain MICROBICIDE SUBSTRATE
WO2006108985A1 (en) 2005-04-11 2006-10-19 Saint-Gobain Glass France Microbicidal substrate
US20060247125A1 (en) 2005-04-27 2006-11-02 Korea Institute Of Science And Technology C and n-doped titaniumoxide-based photocatalytic and self-cleaning thin films and the process for production thereof
WO2006117345A1 (en) 2005-04-29 2006-11-09 Agc Flat Glass Europe Sa Coated substrate and process for the production of a coated substrate
JP2006305527A (en) 2005-05-02 2006-11-09 Altis Kk Photocatalyst particle, coating material containing the photocatalyst particle, and method for producing the photocatalyst particle
WO2006134335A1 (en) 2005-06-16 2006-12-21 Pilkington Group Limited Coated glass pane
WO2007016127A3 (en) 2005-07-29 2007-03-29 Ppg Ind Ohio Inc Simulated high refractive index glass
US20070025000A1 (en) 2005-07-29 2007-02-01 Chia-Cheng Lin Simulated high refractive index glass
US20070031593A1 (en) 2005-08-02 2007-02-08 Alexey Krasnov Method of thermally tempering coated article with transparent conductive oxide (TCO) coating using flame(s) in tempering furnace adjacent TCO to burn off oxygen and product made using same
US20070029187A1 (en) 2005-08-02 2007-02-08 Guardian Industries Corp. Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating and product made using same
WO2007018975A1 (en) 2005-08-02 2007-02-15 Guardian Industries Corp. Method of making thermally tempered coated article
US20070031682A1 (en) 2005-08-02 2007-02-08 Guardian Industries Corp. Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating and product made using same
WO2007018974A3 (en) 2005-08-04 2008-01-10 Guardian Industries Broad band antireflection coating and method of making same
US20070030569A1 (en) 2005-08-04 2007-02-08 Guardian Industries Corp. Broad band antireflection coating and method of making same
US20080188370A1 (en) 2005-08-09 2008-08-07 Evonik Degussa Gmbh Use of Titanium Dioxide Mixed Oxide as a Photocatalyst
US20070065670A1 (en) 2005-09-20 2007-03-22 Guardian Industries Corp. Coating with infrared and ultraviolet blocking characterstics
US20070077406A1 (en) 2005-09-30 2007-04-05 Jacobs Jeffry L Photocatalytic coating
WO2007045805A8 (en) 2005-10-21 2007-07-26 Saint Gobain Antifouling material and production method thereof
US20070109543A1 (en) 2005-11-07 2007-05-17 Cardinal Cg Company Method and appartus for identifying photocatalytic coatings
US20070108043A1 (en) 2005-11-14 2007-05-17 Guardian Industries Corp. Sputtering target including titanium silicon oxide and method of making coated article using the same
US20070116966A1 (en) 2005-11-22 2007-05-24 Guardian Industries Corp. Solar cell with antireflective coating with graded layer including mixture of titanium oxide and silicon oxide
US20070134501A1 (en) 2005-12-13 2007-06-14 Mcmaster Alan J Self-cleaning coatings applied to solar thermal devices
WO2007080428A1 (en) 2006-01-11 2007-07-19 Pilkington Group Limited Heat treatable coated glass pane
WO2007092511A3 (en) 2006-02-08 2008-03-06 Ppg Ind Ohio Inc Coated substrates having undercoating layers that exhibit improved photocatalytic activity
US20070184291A1 (en) 2006-02-08 2007-08-09 Harris Caroline S Coated substrates having undercoating layers that exhibit improved photocatalytic activity
WO2007093823A1 (en) 2006-02-14 2007-08-23 Pilkington Automotive Limited Vehicle glazing
WO2007096461A3 (en) 2006-02-23 2007-10-18 Picodeon Ltd Oy Method for producing high-quality surfaces and a product having a high-quality surface
WO2007110482A1 (en) 2006-03-27 2007-10-04 Beneq Oy A method for producing functional glass surfaces by changing the composition of the original surface
WO2007121215A1 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
WO2007121211A3 (en) 2006-04-11 2007-12-13 Cardinal Cg Co Photocatalytic coatings having improved low-maintenance properties
US20070264494A1 (en) 2006-04-11 2007-11-15 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20070254164A1 (en) 2006-04-27 2007-11-01 Guardian Industries Corp. Photocatalytic window and method of making same
US20070254163A1 (en) 2006-04-27 2007-11-01 Guardian Industries Corp. Window with anti-bacterial and/or anti-fungal feature and method of making same
WO2007130140A1 (en) 2006-04-27 2007-11-15 Guardian Industries Corp. Window with anti-bacterial and/or anti-fungal feature and method of making same
WO2007127060A3 (en) 2006-04-27 2008-03-06 Guardian Industries Photocatalytic window and method of making same
US20070275252A1 (en) 2006-05-23 2007-11-29 Guardian Industries Corp. Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating in color compression configuration, and product made using same

Non-Patent Citations (102)

* Cited by examiner, † Cited by third party
Title
"Surface Hardening of Ceramic and Glass Materials," IBM Technical Disclosure Bulletin, vol. 36, Issue 1 (Jan. 1993), p. 225.
"Surface Hardening of Ceramic and Glass Materials," IBM Technical Disclosure Bulletin, vol. 36, Issue 3 (Mar. 1993), pp. 291-292.
Abstract Japanese Patent Publication 08158048A.
Abstract-Japanese Patent Publication 4-276066.
Abstract-Japanese Patent Publication 5-214525.
Abstract-Japanese Patent Publication 6-330297.
Anderson et al., "An Improved Photocatalyst of TiO2/SiO2 prepared by a Sol-Gel Synthesis", J. Phys. Chem., 1995, 99, 9882-9885.
Anderson et al., "Improved Photocatalytic Activity and Characterization of Mixed TiO2/SiO2 and TiO2/Al2O3 Materials", J. Phys. Chem., 1997, 101, 2611-2616.
Ang et al., "Deposition of high stability thin film ternary alloy resistors by sputtering," In: International conf. On Vacuum Metallurgy, 4th, Tokyo, Japan Jun. 4-8, 1973.
Bell et al., "Electrochromism in sol-gel deposited TiO2 films," Proceedings SPIE-The International Society for Optical Engineering, vol. 2255, Apr. 18-22, 1994.
Brat et al., "The Influence of Tungsten-10Wt% Titanium Sputtering Target Purity and Density on VLSI Applications," 2nd ASM International(TM) Electronic Materials and Processing Congress (Apr. 24-28, 1989, Philadelphia, PA).
Brat et al., "The Influence of Tungsten-10Wt% Titanium Sputtering Target Purity and Density on VLSI Applications," 2nd ASM International™ Electronic Materials and Processing Congress (Apr. 24-28, 1989, Philadelphia, PA).
Chen Wen-mei et al, "The Effect of SiO2 Additive on Super-hydrophilic Property of TiO2-SiO2 Thin Film by Sol-gel Method", Journal of Wuhan University of Technology-Mater. Sci. Ed. (Sep. 2001), vol. 16, No. 3, 30-33.
Creighton, "Non-Selective Tungsten CVD Using Tungsten Hezxacarbonyl," Sandia National Laboratories, Albuquerque, NM, 1987.
de Tacconi et al., "Nanoporous TiO2 and WO3 Films by Anodization of Titanium and Tungsten Substrates: Influence of process Variables on Morphology and Photoelectrochemical Response," J. Phys. Chem B 2006, 110, pp. 25347-25355.
Derwent Abstract 007612002 (Abstract of JP 879697), (1988).
Derwent Abstract 007612002 (Abstract of JP 879697).
Diesburg et al., "Low Mobile Ion Contamination From Sputtered High Purity Tungsten," 12th International Plansee Seminar, 1973, 1989, pp. 371-378.
Enesca et al., "Novel Approach of TiO2/WO3 for Water Splitting," 20th European photovoltaic Solar Energy Conference, Jun. 6-10, 2005, pp. 262-265.
English-language abstract for DE 39 06 453 (Leybold AG).
English-language abstract for JP 2005-213585 (Konica Minolta).
Gao et al., "Great Enhancement of Photocatalytic Activity of Nitrogen-Doped Titania by Coupling with Tungsten Ozxide," J. Phys. Chem B 2006, 110, pp. 14391-14397.
Göttsche et al., "Electrochromic mixed Wo3-TiO2 thin films produced by sputtering and the sol-gel technique: a comparison," Solar Energy Materials and Solar Cells 31 (1993) pp. 415-428.
Guan et al, "Enhanced effect and mechanism of SiO2 addition in super-hydrophilic property of TiO2 films" Surf. And Coating Tech 173 (2003) pp. 219-223.
Guan, "Hydrophilic property of TiO2/SiO2 mixing films" Trans. Nonferrous Met. Soc. China (2004), vol. 14, No. 2, pp. 251-254.
Guan, "Relationship between photocatalytic activity, hydrophilicity and self-cleaning effect of TiO2/SiO2 films" Surf. And Coating Tech 191 (2005) pp. 155-160.
Gusev et al., "Sputtering of tungsten, tungsten oxide, and tungsten-carbon mixed layers by deuterium ions in the threshold energy region," Tech Phys. 44 (9), Sep. 1999, pp. 1123-1127.
Hamelmann et al., "Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD," Thin Solid Films 358 (2000), pp. 90-93.
Hans-Joachim Becker et al., "Herstellung and Eigenschaften von Flachgläsern, die mittels Hochvakuum-zerstäubungsverfahrens beschichtet wurden" Magazine Silikattechnik 36 (1985) Issue 5.
Hans-Joachin Gläser, "Beschichtung grobetaflächiger Substratscheiben durch Kathodenzerstäubung" Glastechnische Berichte 56 (1983) No. 9.
Hans-Joachin Gläser, "Beschichtung groβflächiger Substratscheiben durch Kathodenzerstäubung" Glastechnische Berichte 56 (1983) No. 9.
Hashimoto et al., "Lifetime of Electrochromism of AmorphousWO3-TiO2 thin Films," J. Electrochem. Soc., vol. 138, No. 8, Aug. 1991, pp. 2403-2408.
Herrera et al., "Synthesis, characterization, and catalytic function of novel highly dispersed tungsten oxide catalysts on mesoporous silica," J. Catalysis 239 (2006), pp. 200-211.
Higashimoto et al., "Photoelectrochemical properties of hybrid WO3TiO2 electrode. Effect of structures of WO3 on charge separation," Thin Solid Films 503 (2006), pp. 201-206.
Hodgson et al., "Photocatalytic Reactor Systems with Tungsten Oxide-Modified Titanium Dioxide for Indoor Air Applications," 11th Conference on TiO2 Photocatalysis: fundamentals & Applications (Sep. 25-28, 2006, Pittsburgh, PA).
Ingo et al., "XPS studies of SiO2-TiO2 powders prepared by sol-gel process", Appl. Surf. Sci. 1993, 70/71A, pp. 230-234.
International Preliminary Report on Patentability, dated Oct. 22, 2008 for PCT Application No. PCT/US2007/066685, 7 pages.
International Search Report and Written Opinion, dated Apr. 17, 2009 for PCT Application No. PCT/US2008/076157, 18 pages.
International Search Report and Written Opinion, dated Sep. 1, 2009 for PCT Application No. PCT/US2008/076183, 10 pages.
Ion-Based Methods for Optical Thin Film Deposition (Journal of Material Science; J.P. Marting, 21 (1986) 1-25).
Irie et al., "Interfacial structure dependence of layered TiO2/Wo3 thin films on the photoinduced hydrophilic property," Vacuum 74 (2004), pp. 625-629.
Jossen et al., "Thermal stability and catalytic activity of flame-made silica-vanadia-tungsten oxide-titania,", App. Catalysis B: Environmental 69 (2007), pp. 181-188.
Kanou, "Application of High Purity W for VLSI Sputtering Targets," 7th International Tungsten Symposium, Sep. 1996, pp. 410-418.
Keller et al., "Photocatalytic oxidation of butyl acetate in vapor phase on TiO2, Pt/TiO2 and WO3/TiO2 catalysts," Journal of Catalysis 215 (2003), pp. 129-138.
Kobayashi et al., "V2 O5-WO3/TiO2-SiO2-SO42- catalysts: Influence of active components and supports on activities in the selective catalytic reduction of NO by NH3 and in the oxidation of SO2" App. Cat. B: Enviro 63. (2006), pp. 104-113.
Kobayashi et al., "V2O5-WO3/TiO2-SiO2-SO42-catalysts: Influence of active components and supports on activities in the selective catalytic reduction of NO by NH3 and in the oxidation of SO2," Applied Catalysis B: Environmental 63 (2006), pp. 104-113.
Lassaletta et al., "Spectroscopic Characterization of Quantum-Sized TiO2 Supported on Silica: Influence of Size and TiO2-SiO2 Interface Composition", J. Phys. Chem., 1995, 99, 484-1490.
Lo et al., "Influence of Target Structure on Film Stress in WTI Sputtering," Mat. Res. Soc. Symp. Proc. vol. 505, 1998, pp. 427-432.
Manfred Von Ardenne, "The Effects of Physics and Their Applications," Verlag Harri Deutsch, Thun and Frankfurt am Main, 1997, 4 pages.
Manfred Von Ardenne, "The Effects of Physics and Their Applications," Verlag Harri Deutsch, Thun and Frankfurt am Main, 1997, 7 pages (English Translation).
Matthews et al., "An Adsorption Water Purifier with in Situ Photocatalytic Regeneration", J. Catal. 1988, 113, pp. 549-555.
MikroElektronick-High-rate Sputtering System for Two-Sided Coating (HZS-04).
Minero et al., "Role of Adsorption in Photocatalyzed Reactions of Organic Molecules in Aqueous of TiO2 Suspensions", Langmuir, 1992, 113, pp. 481-486.
Miyashita et al., "Spectrum response of the vacuum-deposited SiO2/TiO2 multilayer film with improved photo-catalytic activity", Journal of Materials Science Letters, 2001, 20, 2137-2140.
Miyashita, et al., "Enhanced Effect of Vacuum-deposited SiO2 Overlayer on Photo-induced Hydrophilicity of TiO2 Film", Journal of Materials Science 36 (2001) p. 3877-3884.
Miyauchi et al., "A Highly Hydrophilic Thin Film Under 1 muW/cm2 UV Illumination," Adv. Mater. 2000, 12, pp. 1923-1927.
Miyauchi et al., "A Highly Hydrophilic Thin Film Under 1 μW/cm2 UV Illumination," Adv. Mater. 2000, 12, pp. 1923-1927.
Nakamura, et al., "Hydrophilic property of SiO2/TiO2 double layer films" Photocatalytic Coatings, Panel Session, pp. 345-350.
Niwa et al., Ammoxidation of Toluene Over SiO2-Al2O3 ZrO2-SiO2 and TiO2-SiO2, J. Catal. 1981, 69, pp. 69-76.
Novotná, et al., "Photocatalytical TiO2/SiO2-PDMS layers on glass" Photocatalytic Coatings, Panel Session, pp. 383-387.
Obee et al., "A Kinetic Study of Photocatalytic Oxidation of VOCs on WO3 Coated Titanium Dioxide," 11th Conference on TiO2 Photocatalysis: fundamentals & Applications (Sep. 25-28, 2006, Pittsburgh, PA).
Ohsaki, et al., "Photocatalytic properties of SnO2/TiO2 multilayers" Photocatalytic Coatings, Panel Session, pp. 369-376.
Okimura et al., "Characteristics of rutile TiO2 films prepared by R.F. magnetron sputtering at a low temperature," Thin Solid Films 281-282 (1996) pp. 427-430.
Ramana et al., "Structural Stability and Phase Transitions in WO3 Thin Films," J. Phys Chem B (2006), pp. 10430-10435.
Ramirez-Del-Solar et al., "Effect of the Method of Preparation on the Texture of TiO2-SiO2 Gels", J. Non-Cryst. Solids 1990, 121, pp. 84-89.
Richardson et al., "Tungsten-Vanadium Oxide Sputtered Films for Electrochromic Devices," http://btech.lbl.gov/papers/42381.pdf.
Saeki et al., "The Photoelectrochemical Response of TiO2-Wo3 Mixed Oxide Films Prepared by Thermal Oxidation of Titanium Coated with Tungsten," J. Electrochem. Soc., vol. 143, No. 7, Jul. 1996, pp. 2226-2229.
Salvado et al., "TiO2-SiO2 glasses prepared by the alkoxide route", J. Non-Cryst. Solids 1992, 147/148, pp. 256-261.
Satoh et al., "Sol-gel-derived binary silica glasses with high refractive index", J. Non-Cryst. Solids 1992, 146, pp. 121-128.
Schiller et al., "Influence of Deposition Parameters on the Optical and Structural Properties of TiO2 Films Produced by Reactive D.C. Plasmetron Sputtering," Thin Solid Films 83 (1981), pp. 239-245.
Schintlmeister et al., "Optical Coatings (nb2O5, Ta2O5 and WO3) for LAC-applications Obtained by DC Quaslreactive magnetron Sputtering of Ceramic Sputtering Targets," 46th Annual Technical Conference Proceedings-Soc. Of Vacuum Coaters, May 3-8, 2003, pp. 296-301.
Schraml-Marth et al., "Porous silica gels and TiO2-SiO2 mixed oxides prepared via the sol-gel process: characterization by spectroscopic techniques", J. Non-Cryst. Solids 1992, 143, pp. 93-111.
Schwarz et al., Thermal material spraying-an alternative technique for the production of special purpose sputtering targets-abstract.
Shen et al., "A new method to prepare tungsten and nitrogen co-doped titanium dioxide and its excellent photocatalytic activities irradiated by visible light," 11th Conference on TiO2 Photocatalysis: fundamentals & Applications (Sep. 25-28, 2006, Pittsburgh, PA).
Shibata, K., et al., "Acidic Properties of Binary Metal Oxides", Bull. Chem. Soc. Jpn. 1973, 46, pp. 2985-2988.
Shiyanovskaya et al., "Biocomponent WO3/TiO2 Films as Photoelectrodes," J. Electrochemical Soc. 146 (1999), pp. 243-249.
Sinel'nikova et al., "Interaction of a Mixture of Oxides of Tungsten and Silicon With Carbon," Soviet Powder Metallurgy and Metal Ceramics, vol. 29, No. 3(327), Mar. 1990, pp. 234-236.
Song et al., "Efficient degradation of organic pollutant with Wox modified nano TiO2 under visible irradiation," J. of Photochemistry and Photobiology A: Chemistry 181 (2006), pp. 421-428.
Spectrum Response of the Vacuum-Deposited SiO2/TiO2 Multilayer Film With Improved Photo-Catalytic Activity, Journal of Materials Science Letters 20, 2001, pp. 2137-2140.
Staffler et al, "Advanced Coating Technology Based Upon Sputtering Targets Produced by Powder Metallurgy," Horizons of Powder Metallurgy Part I, Proceedings of the 1986 International Powder Metallurgy Conference and Exhibition, Jul. 7-11, 1986, pp. 219-222.
Stakheev, et al., "XPS and XAES Study of TiO2-SiO2 Mixed Oxide System", J. Phys. Chem. 1993, 97, pp. 5668-5672.
Stankova et al., "Thin (0 0 1) tungsten trioxide films grown by laser deposition," App. Surface Science 247 (2005), pp. 401-405.
Stumpp et al, "Manufacturing of Superclean Refractory and Reactive Metals and Alloys in High Vacuum for Advanced Technologies," 8th ICVM: Special Melting/Refining and Metallurgical Coating Under Vacuum or Controlled Atmosphere, vol. 2, Sep. 1985, pp. 1310-1324.
Su et al., "All Solid-State Smart Window of Electrodeposited WO3 and TiO2 Particulate Film With PTREFG Gel Electrolyte," J. Phys Chem Solids, vol. 59, No. 8, 1998, pp. 1175-1180.
Szczyrbowski et al., "Properties of TiO2-Layers Prepared by Medium Frequency and DC Reactive Sputtering," 1997 Soc. Of Vacuum Coaters (1997), pp. 237-241.
Tada et al., "Deactivation of the TiO2 Photocatalyst by Coupling with WO3 and the Electrochemically Assisted High Photocatalytic Activity of WO3," Langmuir 20 (2004), pp. 4665-4670.
Takeuchi, et al., "Preparation of Titanium-Silicon Binary Oxide Thin Film Photocatalysts by an Ionized Cluster Beam Deposition Method. Their Photocatalytic Activity and Photoinduced Super-Hydrophilicity", J. Phys. Chem. 2003, 107, pp. 14278-14282.
U.S. Appl. No. 11/273,979 Non Final Office Action mailed Jun. 16, 2008, 9 pgs.
U.S. Appl. No. 11/273,979 Response to Non Final Office Action filed Dec. 16, 2008, 15 pgs.
Vakuumbeschichtung 5 Anwendungen Teil II, VDI Verlag 1993, ISBN 3-18-401315-4.
Veersamy, et al., "Optical and Electronic Properties of Amorphous Diamond." Diamond and Related Materials, vol. 2 (1993), pp. 782-787.
Wachs et al., "Catalysis science of the solid acidity of model supported tungsten oxide catalysts," Catalysis Today 116 (2006), pp. 162-168.
Wilhartitz et al., "3D-SIMS analysis of ultra high purity molybdenum and tungsten: a characterisation of different manufacturing techniques," Fresenius J Anal Chem. (1995) 353: pp. 524-532.
Yamamoto et al., "Characteristics of Tungsten Gate Devices for MOS VLSI's," Materials Research Society, 1986, pp. 297-311.
Yamamoto et al., "Fabrication of Highly Reliable Tungsten Gate MOS VLSI's," J. Electrochem. Soc., vol. 133, No. 2, Feb. 1986, pp. 401-407.
Yamauchi et al., "Development of W-Ti Binary Alloy Sputtering Target and Study of its sputtering Characteristics," Nippon Tungsten Review, vol. 22 (1989), pp. 55-72.
Yoo et al., "Effects of annealing temperature and method on structural and optical properties of TiO2 films prepared by RF magnetron sputtering at room temperature," App. Surface Science 253 (2007), pp. 3888-3892.
Yoon et al., "Growth kinetics and oxidation behavior of WSi2 coating formed by chemical vapor deposition of Si on W substrate," J. Alloys and Compounds 420 (2006), pp. 199-206.
Yu et al., "The grain size and surface hydroxyl content of super-hydrophilic TiO2-SiO2 composite nanometer thin films" J. Mat. Sci. Lett. (2001) 20, pp. 1745-1748.
Zanhai et al., "Preparation of W-Ti Sputtering Targets under Inert Atmosphere," Chinese Journal of Rare Metals, vol. 30, No. 5, 2006, Abstract.
Zanhai et al., "Tungsten-Titanium Targets and Manufacturing Technology," Chinese Journal of Rare Metals, vol. 30, No. 1, 2006, Abstract.
Zemen et al., "Self-cleaning and antifogging effects of TiO2 films prepared by radio frequency magnetron sputtering," J. Vac. Sci. Technol. A, Mar./Apr. 2002, pp. 388-393.

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9738967B2 (en) 2006-07-12 2017-08-22 Cardinal Cg Company Sputtering apparatus including target mounting and control
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
US11325859B2 (en) 2016-11-17 2022-05-10 Cardinal Cg Company Static-dissipative coating technology
US11008248B2 (en) * 2017-05-04 2021-05-18 Agc Glass Europe Coated substrate
US20210207428A1 (en) * 2018-06-25 2021-07-08 The Regents Of The University Of California Optically-transparent, thermally-insulating nanoporous coatings and monoliths

Also Published As

Publication number Publication date
EP1773729B1 (en) 2007-11-07
CA2570369C (en) 2008-02-19
CA2573428A1 (en) 2006-02-16
ATE377579T1 (en) 2007-11-15
DE602005003234D1 (en) 2007-12-20
DE602005003228T2 (en) 2008-08-28
EP1765740A1 (en) 2007-03-28
ATE377580T1 (en) 2007-11-15
US7604865B2 (en) 2009-10-20
WO2006017311A1 (en) 2006-02-16
US20060057298A1 (en) 2006-03-16
US20060057401A1 (en) 2006-03-16
US7713632B2 (en) 2010-05-11
JP2008505842A (en) 2008-02-28
USRE44155E1 (en) 2013-04-16
CA2570369A1 (en) 2006-02-16
JP2008505841A (en) 2008-02-28
CA2573428C (en) 2008-04-01
DE602005003228D1 (en) 2007-12-20
DE602005003234T2 (en) 2008-08-28
EP1765740B1 (en) 2007-11-07
EP1773729A1 (en) 2007-04-18
WO2006017349A1 (en) 2006-02-16

Similar Documents

Publication Publication Date Title
USRE43817E1 (en) Low-maintenance coatings
US20210032159A1 (en) Deposition methods for high quality reflectance coatings
US6572940B1 (en) Coatings with a silver layer
US7537677B2 (en) Method of making low-E coating using ceramic zinc inclusive target, and target used in same
EP0622645A1 (en) Thin film coating and method of marking
US20150329417A1 (en) Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
US20160272537A1 (en) Nickel-aluminum blocker film low-emissivity coatings
JP2006036631A (en) Low-maintenance coating
US20200148587A1 (en) Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods
EP3325420B1 (en) Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
EP4098631A1 (en) Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods

Legal Events

Date Code Title Description
FPAY Fee payment

Year of fee payment: 4

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 8TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1552)

Year of fee payment: 8

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 12TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1553); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 12