WO1994014176A1 - Q-controlled microresonators and tunable electronic filters using such resonators - Google Patents

Q-controlled microresonators and tunable electronic filters using such resonators Download PDF

Info

Publication number
WO1994014176A1
WO1994014176A1 PCT/US1993/011600 US9311600W WO9414176A1 WO 1994014176 A1 WO1994014176 A1 WO 1994014176A1 US 9311600 W US9311600 W US 9311600W WO 9414176 A1 WO9414176 A1 WO 9414176A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
fingers
resonator
feedback
microresonator
Prior art date
Application number
PCT/US1993/011600
Other languages
French (fr)
Inventor
Clark Tu-Cuong Nguyen
Roger T. Howe
Original Assignee
The Regents Of The University Of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The Regents Of The University Of California filed Critical The Regents Of The University Of California
Priority to AU58966/94A priority Critical patent/AU5896694A/en
Publication of WO1994014176A1 publication Critical patent/WO1994014176A1/en

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H9/02338Suspension means
    • H03H9/02362Folded-flexure
    • H03H9/02377Symmetric folded-flexure
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/028Electrodynamic magnetometers
    • G01R33/0286Electrodynamic magnetometers comprising microelectromechanical systems [MEMS]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G5/00Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
    • H01G5/04Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode
    • H01G5/14Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of effective area of electrode due to longitudinal movement of electrodes
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H9/02393Post-fabrication trimming of parameters, e.g. resonance frequency, Q factor
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H9/02393Post-fabrication trimming of parameters, e.g. resonance frequency, Q factor
    • H03H9/02417Post-fabrication trimming of parameters, e.g. resonance frequency, Q factor involving adjustment of the transducing gap
    • H03H9/02425Post-fabrication trimming of parameters, e.g. resonance frequency, Q factor involving adjustment of the transducing gap by electrostatically pulling the beam
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/462Microelectro-mechanical filters
    • H03H9/467Post-fabrication trimming of parameters, e.g. center frequency
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02244Details of microelectro-mechanical resonators
    • H03H2009/02488Vibration modes
    • H03H2009/02496Horizontal, i.e. parallel to the substrate plane
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/0023Balance-unbalance or balance-balance networks

Definitions

  • the present invention relates generally to resonant microstructures, and more particularly to Q-control for resonant microstructures and electronic filters using such microstructures.
  • IF filtering in frequency modulated (FM) receivers has been performed at 10.7 Mega-Hertz (MHz) IF frequency, using highly selective inductive-capacitance (LC) ceramic or crystal filters.
  • IC integrated circuit
  • designs based upon a coupled biquad filter architectures suffer from dynamic range reduction introduced when attempting high-Q operational simulation of LC stages.
  • Q is a figure of merit equal to reactance divided by resistance. The Q of a system determines the rate of decay of stored energy.
  • Modulation filtering techniques such as N-path designs, suffer from the generation of extraneous signals, such as image and clock components inside the signal band, resulting from the remodulation process.
  • micromachined mechanical resonators or resonant microstructures may be used. These microresonators are integrated electromechanical devices with frequency selectivity superior to integrated resistance-capacitance (RC) active filtering techniques.
  • RC resistance-capacitance
  • An object of the present invention is thus to provide feedback techniques for precise control of the Q-factor of a micromechanical resonator.
  • Another object of the present invention is to provide very high Q microelectromechanical filters constructed of Q-controlled microresonator biquads in biquad filter architectures.
  • the invention provides a means for passband correction of spring- coupled or parallel micromechanical resonators via control over the Q-factor of the constituent resonators.
  • the present invention is directed to a resonator structure.
  • the resonator structure comprises a first electrode at which an input signal may be applied and a second electrode at which an output signal may be sensed.
  • the resonator structure further includes a feedback means for applying the output signal to the first electrode for controlling the Q of the resonator structure.
  • the equivalent circuit series resistance (R x ) of the resonator of the present invention is proportional to the inverse of the Q of the resonator. As such, the controlled value of Q is independent of the original Q of the resonator. Rather, it is dependent only on the control voltage (V Q ) or some other controlling factor such as resistance values.
  • the gain of the resonator (v 0 /v j ) is equal to the number of input fingers divided by the number of feedback fingers. This is advantageous in that it offers very precise gain values. This enables construction of bandpass biquads with precisely settable gains. Also, the gain will stay constant as the Q is changed.
  • Dimensions of a microresonator of the present invention may be: a length between about 5 microns ( ⁇ m) and lOOO m, a width between about 5 ⁇ m and lOO ⁇ m, and a thickness from between about 0.1 and lOO ⁇ m.
  • High-Q tunable electronic filters based upon the Q-controlled microresonators of the present invention are suitable for batch fabrication using standard complementary metal-oxide semiconductor (CMOS) integrated circuit and micromachining technologies.
  • CMOS complementary metal-oxide semiconductor
  • the Q-controlled microresonators may serve as adjustable biquad stages in various filter architectures such as coupled (or cascaded) biquad, follow-the-leader feedback (FLF) , or other multiple-loop feedback techniques. Frequency and bandwidth are independently voltage- controllable. This permits adaptive signal processing. Noise analysis determines that the dynamic range of a proposed high-Q filter is much higher than that of its high-Q active RC counterparts, i.e.. switched- capacitor MOSFET-C, and g m -C filters.
  • a dynamic range in excess of 90 decibels (dB) is predicted for a filter centered at 10.7 MegaHertz (MHz) with a bandwidth of 56 KiloHertz (kHz) .
  • dB decibels
  • MHz MegaHertz
  • kHz 56 KiloHertz
  • temperature insensitivity can be achieved through micro- oven control, which, on a micron scale, provides orders of magnitude improvement in power dissipation and thermal time constant over equivalent macroscopic methods.
  • Figure 1A is a schematic representation of a Q-control scheme for a three-port electrostatic-comb driven microresonator.
  • Figure IB is a schematic cross-section along lines IB-IB of Figure 1A.
  • Figure 2 is a system block diagram for the circuit of Figure 1.
  • Figure 3 is a schematic representation of a Q-control scheme for a two-port microresonator.
  • Figure 4 is a system block diagram for the circuit of Figure 3.
  • Figure 5 is a schematic representation of a scheme for raising the Q of a three-port microresonator.
  • Figure 6 is an equivalent circuit diagram for a three-port microresonator biased and excited as shown in Figure 1A.
  • Figure 7 is a schematic representation of a balanced Q-control scheme for a four-port microresonator using two balanced amplifiers (one of them transimpedance) and metal oxide semiconductor (MOS) resistors.
  • two balanced amplifiers one of them transimpedance
  • MOS metal oxide semiconductor
  • Figure 8 is a schematic representation of a balanced Q-control scheme for a six-port microresonator using one balanced transimpedance amplifier.
  • Figure 9 is a schematic representation of a Q-controlled microresonator filter using a balanced FLF architecture.
  • Figure 10A is a system block diagram for a general FLF filter.
  • Figure 10B is a single-ended noise block diagram for the circuit of Figure 3 or 6.
  • Figure 11 is a graphical representation of simulated responses for the filter of Figure 9.
  • Figure 12 is a graphical representation of the measured transconductance spectra of the embodiment of Figure 1A using different values of R ⁇ p and demonstrating control of the Q-factor through control of
  • Figure 14A is a schematic representation of a microresonator including sloped drive fingers, which allow resonance frequency-pulling.
  • Figure 14B is an enlarged schematic representation of the relationship between the sloped and straight drive fingers.
  • Figure 15A is a schematic representation of a microresonator including a third polylayer to introduce a nonlinear variation in the voltage-to-force transfer function of the resonator and thus allow frequency- pulling.
  • Figure 15B is a view along lines 15B-15B of Figure 15A.
  • Figure 16A is a schematic representation of a microresonator including spring-pulling electrodes for frequency tuning.
  • Figure 16B is a graphical representation of resonance frequency versus frequency pulling voltage for the microresonator of Figure 16A.
  • Figure 17A is a schematic representation of feedback control circuitry for a micro-oven controlled resonator fabricated on a microplatform for thermal and mechanical isolation.
  • Figure 17B is a scanning electron micrograph of a resonator fabricated on top of a thermally-isolated microplatform.
  • Figure 18 is a circuit diagram of a high gain transresistance amplifier which may be used in the present invention.
  • Figures 19A and 19B are graphical representations of filter passband correction.
  • Figure 20 is a circuit diagram showing the implementation of passband correction for a parallel microresonator filter.
  • Figure 21 is a circuit diagram for Q control of a resonator structure with a single port.
  • the present invention will be described in terms of a number of different embodiments. It is directed to Q-control for microresonators. These resonators may be used to build very high Q microelectromechanical filters.
  • the filters may be constructed of coupled, Q- controlled microresonator biquads, spring-coupled resonators or resonators electrically connected in parallel. Spring-coupled resonators and resonators electrically connected in parallel are described in the above-identified, co-pending application entitled "Microelectromechanical Signal Processors,” which has been incorporated by reference.
  • a basic Q-control architecture for a microresonator 20 is shown in Figure 1.
  • the microresonator is of the type shown in U.S. Patent No. 5,025,346, issued June 18, 1991, which is hereby incorporated by reference.
  • resonator shown in U.S. Patent No. 5,025,346 is preferred in the context of the present invention.
  • the principles of the present invention equally apply to other types of resonators, and the Q-control scheme discussed herein may be used with those resonators.
  • the filter architectures, frequency- pulling schemes and micro-oven schemes discussed below may be applied to these other types of resonators.
  • Such resonators include, but are not limited to, those which use piezoelectric, piezoresistive, parallel-plate electrostatic, or magnetic drive and sense, and to resonators with arbitrary geometries, such as cantilevers or double-ended tuning forks.
  • resonator 20 has three ports, comprising a drive electrode 22, a sense electrode 23, and a feedback electrode 24.
  • the resonator is driven electrostatically by the drive electrode and capacitive motional current is sensed at the sense electrode. Signals are fed back to the microresonator via the feedback electrode.
  • the electrodes comprise interdigitated finger (comb) structures 25 and 27.
  • the fingers 25 are stationary, being anchored to a substrate 29a, which may be a silicon wafer substrate, or anchored to passivation layers, which may be a nitride layer 29b over an oxide layer 29c, over the substrate.
  • the darkly shaded region 28 represents the anchor point for the drive electrode 22 and its associated fingers 25.
  • the fingers 27 are attached to a suspended, movable shuttle 27a; thus, they are movable.
  • the shuttle 27a and fingers 27 are spaced above the substrate, and are allowed to move laterally relative to the substrate overlayers and stationary fingers 25.
  • a folded-beam suspension arrangement represented generally by reference numeral 30, allows shuttle 27a and attached fingers 27 to move.
  • the folded beam suspension 30 comprises folded beams 31a, 31b, 31c, and 3Id, and truss support beam 31f, all of which are suspended above the substrate 29a and associated overlayers 29b and 29c. Motivations for this truss suspension are its large compliance and its capability for relief of built-in residual strains in the structural film.
  • the cantilever beams 31b and 3Id are anchored at one end to a ground plane 29d, which is fabricated over the substrate 29a and substrate overlayers 29b and 29c, near a center point 31e (a darkly shaded region) and attached at the other end to the folding truss beam 31f.
  • Cantilever beams 31a and 31c are attached at one end to the folding truss beam 3If and at the other to the shuttle 27a.
  • the folded beam suspension 30 allows expansion or contraction of the four beams along the y-axis, increasing the linear range of operation of the resonator 20.
  • the folded beam suspension comprising 32a, 32b, 32c, 32d, and 32f, is anchored through beams 32b and 32c to ground plane 29d and/or overlayers 29b and 29c at location 32e, and the suspension operates like beams 31a-31f.
  • the long effective support length of beams 31a- 31d and 32a-32d result in a highly compliant suspension for movable fingers 27 of the drive, sense, and feedback electrodes.
  • the substrate overlayers may be eliminated. The anchor points would then be formed on the substrate, and the substrate would serve as the ground plane.
  • the motion of the movable fingers is sensed by detecting the motional current through the time-varying interdigitated finger capacitor formed by the movable and stationary fingers of the sense electrode 23 with a direct current (dc) bias voltage V p applied to ground plane 29b, which is attached to the shuttle 27a and movable fingers 27 through anchor points 31e and 32e.
  • the driving force F x and the output sensitivity are proportional to the variation of the comb capacitance C with the lateral displacement x of the structure dC/ ⁇ x.
  • a key feature of the electrostatic-comb drive is that dC/dx. is a constant, independent of the displacement x, so long as x is less than the finger overlap.
  • ⁇ C/ ⁇ x for a given port is a function of the number of overlaps between movable and stationary fingers 27 and 25, respectively, of the port in question.
  • drive port or drive electrode 28 sense port or sense electrode 23, and feedback port or feedback electrode 24.
  • (dC/dx) fl may be used for the drive, sense, and feedback ports, respectively.
  • sense electrode 23 harmonic motion of the structure results in a sense current I, which is represented by:
  • I s V p (dC/dx) s (dx/dt) (1)
  • Equation (3) v d is the amplitude of the input ac signal
  • V P is the previously-mentioned dc-bias applied to the resonator
  • ( ⁇ C/ ⁇ x) d is a constant for the inter-digitated-finger capacitor 23 or 24 is used.
  • the second-harmonic term on the right-hand side of Equation (3) is negligible if v d ⁇ V P .
  • a push-pull (differential) drive this term results in a common-mode force and is cancelled to the first order.
  • Planar electrode or ground plane 29d ( Figures 1A and IB) can be grounded or set to a dc potential in order to minimize parasitic capacitive coupling between the drive, feedback and sense ports.
  • An additional function of this electrode is to suppress the excitation of undesired modes of the structure.
  • the motional current output from the resonator is electronically sensed by means of sense electrode 23.
  • the motional current is applied to a transimpedence or transresistance amplifier 34, where it is converted to a voltage v 0 .
  • the voltage v 0 is fed back to the microresonator via feedback electrode 24.
  • the drive voltage v d is applied to the resonator via drive electrode 22.
  • the Q of the microresonator is effectively controlled by the gain of amplifier 34, which can be made voltage controllable through the voltage V Q .
  • R ⁇ . is the equivalent series resistance of the resonator from any port J ⁇ to any port n
  • ⁇ 0 is the natural resonance frequency.
  • the equivalent series resistance is discussed below in relation to Figure 5.
  • any port m or n may be d, s, or fb, corresponding to drive, sense, or feedback ports, respectively.
  • R ⁇ is the value of the transresistance or transimpedence of amplifier 34 and where
  • Equation (2) is the controlled value of the Q-factor.
  • the gain of Equation (2) reduces to ( ⁇ fb -,/R Xd - s ) > which, as will be seen, is determined by the number of input and feedback fingers, and stays constant as Q is varied.
  • the Q can be changed, as noted, by adjusting the gain of amplifier 34 through the voltage V Q .
  • FIG. 3 A schematic of the Q-control architecture for a two-port resonator 40 is shown in Figure 3.
  • Figure 3 shows a resonator with equal numbers of drive and sense fingers, the number of fingers need not be equal.
  • This resonator includes only a drive electrode 22 and a sense electrode 23.
  • a summing amplifier 42 is provided to sum the input and feedback signals v d and v of respectively, which in Figure 1A were summed by the multi-port resonator itself.
  • the resistances R k and R f are variable. These resistances and R. ⁇ provide gain factors for signals applied to amplifier 42. Thus, they directly determine the Q and gain of the Q-control circuit.
  • Figure 4 shows the single-ended system block diagram equivalent of the circuit of Figure 3.
  • gain factor _s
  • n corresponds to the port of the resonator (drive, sense, or feedback) in question
  • C OT is the overlap capacitance across the motionless shuttle and electrode fingers
  • the 's represent multiplication factors for the current-controlled current sources shown in the figure.
  • the equivalent drive-to-sense resistance of the microresonator may be calculated from the following equation:
  • the loop gain of the circuit, A (R amp /R xft - s ) should have a wide range.
  • ⁇ . should be minimized, which in turn requires that R ⁇ be minimized and ⁇ ffb be maximized.
  • Reduction in R ⁇ can be achieved by increasing the number of feedback fingers, decreasing the gaps between these fingers, and increasing finger thickness. ⁇ ffb is increased with similar modifications to the output fingers.
  • V Program ⁇ ⁇ R xd - s ® sfb R x d " (dC/dx) fb N fb
  • N d and N ft are the number of input and feedback fingers, respectively. The last equality assumes identical finger gaps and thicknesses for both ports.
  • the gain is determined by resonator geometry and is independent of variables which determine the controlled Q.
  • FIG. 3 presented a schematic of Q-control using a two-port microresonator, two amplifiers, and linear resistors.
  • MOS metal oxide semiconductor resistors
  • the value of resistance realized by an MOS resistor can be varied through variation of the gate voltage of such devices.
  • MOS resistors suffer from the drawback that they are less linear than their passive counterparts.
  • a balanced architecture In order to linearize MOS resistors, a balanced architecture must be used.
  • FIG 7 illustrates Q-control using MOS resistors and a four-port microresonator 50.
  • the microresonator 50 is similar in construction to microresonator 20 in that it includes movable and stationary, interdigitated fingers forming differential drive and sense electrodes 52 and 54, respectively.
  • stationary electrode fingers 55 are anchored to the overlayers 29b and 29c (see Figure IB) at the darkly shaded regions or anchor points 56.
  • the movable fingers 57 are suspended above the ground plane by means of the folded beam suspension arrangement 58.
  • Drive voltages Vj W and v j(+) are applied to the drive electrodes.
  • the output voltages v ⁇ . ) and Vo +) represent amplifications of the signals sensed by sense electrodes 54. Since the shuttle and its fingers are electrically connected to the ground plane, they are at the same voltage, V p , as the ground plane.
  • the architecture of Figure 7 also utilizes metal oxide semiconductor (MOS) resistors M Q ,, M Q2 , M K ,, M J Q, ⁇ ,, and M,,-,- ⁇ .
  • MOS metal oxide semiconductor
  • Such resistors are normally nonlinear, unless operated in a fully balanced architecture, such as that depicted in Figure 7.
  • Fully balanced operation minimizes the even ordered harmonics of the MOS resistor voltage-to-current response, thus greatly reducing the total nonlinearity in such devices.
  • gain factor f is determined by a ratio of MOS W/L's, which are the width over length ratios, and thus can be accurately set to a 0.2% or better tolerance using integrated circuit processes.
  • This summation completes the feedback loop for Q-control as in the block diagram for the equivalent single-ended version given in Figure 3.
  • Equations (9) through (11) The equations dictating Q-control for the balanced version of Figure 7 are similar to those for Figure 3, Equations (9) through (11) , except for changes in the drive-to-sense resistance R ⁇ .,, which must now account for the four-port nature of the resonator, and can be easily obtained using an analysis similar to that of Equations (13) through (18) .
  • the circuitry further includes a balanced transimpedance or transresistance amplifier 60, which may or may not be variable. As shown, it is voltage- controllable via V R . For large loop gain, the gain in the scheme of Figure 7 is determined by a ratio of MOS resistor gate
  • any Q may be realized using the embodiment discussed herein; thus, any bandpass biquad transfer function may be implemented. Since both the Q and gain of the stage of the embodiment of Figure 7 depend mainly on ratios of the MOS resistors, which can _be made to tolerances as low as 0.2%, this scheme, as well as the other embodiments of the present invention, is quite suitable for bulk fabrication.
  • the initial high Q of microresonators allows for the fabrication of high-Q filters.
  • the Q of the Q-control circuit and thus the bandwidth of a filter in which the circuit may be incorporated may be adjusted by changing the loop gain of the circuit. This can be achieved by merely changing a single voltage V Q which controls the value of the channel resistance realized by, for example, resistors M Q , and M Q2 . This simple control of a filter bandwidth encourages adaptive circuit techniques for very precise control of filter characteristics.
  • microresonator 70 is a six- port resonator using one balanced transresistance amplifier 60.
  • the drive voltages v i(+) and v iw are applied to drive electrodes 71 and 72 which, as in the other embodiments, comprise stationary and movable interdigitated fingers.
  • the output signal from amplifier 60, voltages v 0 (+) and v 0 (-), is channeled directly back to resonator 70 via feedback electrodes 73 and 74.
  • the output at sense electrodes 75 and 76 is applied to the negative and positive inputs, respectively, of amplifier 60.
  • Q is controlled by varying the transresistance (transimpedance) of amplifier 60, which is controllable via the control voltage V Q .
  • Equation (20) shows no dependence on the original Q, and thus, the Q-factor can be set irrespective, for example, of the ambient operating pressure.
  • Positive feedback implementations of Q-control can be realized by merely changing the transresistance amplification R ⁇ , from positive to negative, in the embodiments of Figures 7 and 8.
  • positive feedback can also be achieved by keeping the R.-. p of amplifier 60 positive and interchanging (crossing) any two parallel leads in the feedback loop.
  • the equation for controlled Q under positive feedback is
  • R ⁇ is the equivalent series resistance from the feedback port to the sense port.
  • the controlled Q is dependent upon the original Q.
  • the Q-controlled microresonator architectures described above, the embodiments of Figures 1, 3, 7 and 8, can implement any arbitrary bandpass biquads transfer function. Thus, they can be used as biquad stages in various filter architectures such as follow the leader feedback (FLF) , coupled (or cascaded) biquad, or other multiple-loop feedback techniques. FLF designs are quite desirable, since they have low element sensitivities, comparable or superior to those of leapfrog designs.
  • FLF leader feedback
  • a FLF version of a filter represented generally by reference numeral 75, is shown in Figure 9, and the equivalent system block diagram for a general FLF filter design is shown in Figure 10A.
  • the bandpass biquad stages 80, 81 and 82 all have identical center frequency and Q (but differing gains Kj) . They may be implemented using any of the Q-control microresonator architectures of Figures 1, 3, 7, or 8.
  • Filter 75 includes MOS transistors M ⁇ , M ⁇ , M FBA , M FBB M 3 __, Mp 2A . M F2B .
  • the transistors M Fn3 ., where n can be 2 or 3 and x can be A or B in correspondence with Figure 9, are used as variable MOS resistors to realize the feedback gains F n depicted in Figure 10A.
  • x can be either A or B and n can be either 2 or 3 in correspondence with Figure 9.
  • the transistors M B ⁇ a where n can be 1, 2 or 3 and x can be A or B in correspondence with Figure 9, are used as variable MOS resistors to realize the feedforward gains B n depicted in Figure 10A.
  • the MOS resistors are directed into operational amplifier 72, which is connected as a summing amplifier with MOS resistors M FFA and Mp
  • Filter 75 uses its three identical microresonator biquads 80, 81 and 82 to realize a sixth order bandpass filter with equiripple passband and stopband. Loss pole locations are determined by the loop gains of balanced feedback loops 84a and 84b, and 85a and 85b, while stopband zeros are determined by the feedforward coefficients realized by the and M Bnx 's.
  • the bandpass stages 80, 81 and 82 determine the center frequency and Q-factor of the filter.
  • the feedback gains -F 2 , -F 3 and -F n are implemented by ratios of MOS W/L's as are the biquad gains Kj.
  • the bandwidth of the whole filter is likewise controllable via this single voltage.
  • Pole/zero precision for the filter should be comparable to that for switched-capacitor circuits, since poles and zeros can be made dependent on microresonator matching and ratios of the MOS resistors W/L's, i.e.. (W/L) 2 / (W/L)j, in much the same way capacitor ratios determine the characteristics of switch capacitor filters. Fabrication of such filters may be achieved through a combination of standard CMOS integrated circuit and micromachining technologies, such as the recent Modular Integration of CMOS and Sensors (MICS) process.
  • MICS Modular Integration of CMOS and Sensors
  • Figure 11 shows simulated responses, v sacrifice in decibels (db) , using SPICE for filter 75, for different values of V Q , V Q , and V Q2 , demonstrating bandwidth control and the potential for high Q.
  • the filter Q for the solid plot is about 250, and the bandwidth is less than 100 Hz.
  • the dynamic range of the high-Q filter 75 has been calculated to be much higher than that of its high- Q active RC counterparts, i.e. switched capacitor, MOSFET-C and g m -C filters.
  • Such active RC filters which are designed via operational simulation of LC ladders, have reduced dynamic range when implementing high-Q filters, because the noise per stage is amplified by a factor approximately equal to the filter Q. This comes about because the large currents and voltages present in high-Q LC circuits are represented by integrator outputs in the active RC equivalent; thus, attenuation must be provided at appropriate nodes to prevent saturation.
  • Q-controlled microresonator filters do not share this drawback, because the high-Q elements, the microresonators, are effectively passive transconductance devices.
  • the noise block diagram of Figure 10B wherein the block 100 schematically represents a two-port resonator, such as in Figure 3, can be used to calculate the output noise per Q-control stage. Straightforward analysis yields
  • Equation (24) shows that noise in the high-Q filter is not amplified by filter Q.
  • Equation (24) the dynamic range of filter 75 ( Figure 9) , having a bandwidth of 56kHz and a 5V supply, is calculated to be in excess of 90dB.
  • the amplifiers 34 and 60 represent single-ended and balanced versions of transimpedance or transresistance amplifiers of any general design.
  • the design could be as simple as shunt-shunt feedback applied to an operational amplifier or commercial designs of transimpedance amplifiers used in optical receivers.
  • amplifiers 34 or 60 should be designed for maximum gain bandwidth product.
  • transistors Ml through M9, as shown in Figure 18, comprise a current feedback pair input stage, which has the advantages of low input noise current and large gain bandwidth product.
  • Transistors M10 through M25 comprise a video amplifier second stage, featuring a current feedback pair architecture for high bandwidth.
  • transistors M26 through M29 make up a common-mode feedback loop, which minimizes the common-mode gain of the amplifier and forces the output dc level to the "Balancing Level" voltage.
  • All transistors in Figure 18 operate as MOS transistors in the saturation region, except for Mn, M ⁇ , ⁇ , and M f4 , which operate as MOS resistors for the current feedback pairs in which they operate.
  • the gain of the amplifier is varible through voltage V QA and V QB , or V Q if these nodes are tied as shown by the dashed connections.
  • the quality factor of a microresonator is strongly dependent upon the ambient pressure in which it operates.
  • the intrinsic Q of a microresonator is a function of the anchor and is also temperature dependent.
  • the Q ranges from under 50 in atmosphere to over 50,000 in 10 mTorr vacuum. Since the operational pressure for a microresonator is not easily controlled, a Q-control method independent of the original Q of the resonator is desirable.
  • the controlled Q in the resonators of the present invention can be shown to be independent of the original resonator Q, and thus, of ambient pressure, using the equivalent series resistance discussed above. Inserting Equation (18) in (8) and assuming sufficient loop gain (_L_e__ (Ra m p/R x b-,) 1) yields
  • Figure 13 presents experimental verification that the value of the controlled Q is invariant under changing ambient pressures, being dependent only on the Q-controlling feedback set by transresistance
  • the present invention also contemplates different methods for voltage-controlled tuning of the resonance frequency of a microresonator, and thus, of a filter in which it may be used.
  • One method involves the introduction of some nonlinearity into the voltage-to- force transfer function of the microresonator, which gives rise to a bias dependence of the resonance frequency.
  • the most convenient way to do this is to use sloped drive fingers, as shown in Figures 14A and 14B.
  • sloped drive fingers 92 of microresonator 90 form part of the interdigitated fingers (comb) of the frequency-pulling electrode pair 91a.
  • drive electrodes 91 and 93 also include straight, movable electrode fingers 94 and straight, fixed electrode fingers 95.
  • the sense electrodes are represented by reference numeral 96, and as discussed above, include fixed and movable fingers.
  • sloped drive fingers 92 may be sloped at an angle ⁇ .
  • a distance d may separate sloped fingers 92 and straight fingers 94.
  • An overlap L 0 may exist between sloped fingers 92 and straight fingers 94.
  • can be about 15°, d 0 about 2 ⁇ m, and L 0 about 20 ⁇ m.
  • the straight movable fingers 94 are displaced in the x direction when the resonator is driven by the drive electrodes 91 and 93.
  • the straight fingers 95 of drive fingers 91 and 93 can also be sloped to enhance the frequency-pulling effect.
  • the sloped drive fingers introduce a nonlinear voltage-to-force transfer function, which in turn results in a bias dependent resonance frequency, allowing center frequency tunability. Sloped drive fingers cause the capacitance variation with displacement dC/ ⁇ x to be nonlinear, which makes the voltage-to-force transfer function nonlinear.
  • the force versus voltage transfer function is given in phasor form by: (dC/dX) lin V df (26) where N d is the number of shuttle or movable fingers surrounded by straight drive, fixed fingers, N p is the number of shuttle fingers surrounded by sloped fingers, and ( dC/dx.) corresponds to the straight drive fingers.
  • Equations (27) and (28) indicate that resonator resonance frequency can be pulled by simply varying the bias voltage V p . Sloped drive fingers are not the only way to introduce a nonlinearity into the voltage-to-force transfer function.
  • microresonator 100 includes sense electrodes 101 and differential drive electrodes 102.
  • the fixed fingers 103 of one electrode pair 110 are triangular in shape and include a third polylayer 107 wherein a first polylayer 109 forms a shuttle ground plane 105a and an elctrode ground plane 105b, and a second polylayer 108 forms the movable fingers 104.
  • fingers 104 are disposed between third polylayer 107 and electrode ground plane 105b.
  • the third polylayer 107 and electrode ground plane 105b introduce a non-linear variation of the voltage-to-force transfer function of the resonator, i.e.. introduces a nonlinear capacitance versus displacement transfer function, allowing for resonance frequency pulling via variation of the applied voltage V .
  • the first polylayer 109 forming electrode ground plane 105b matches the third polylayer 107 under the triangular-areas to balance vertically-directed electrostatic forces, preventing the possible pull-in of the suspended or movable fingers 104.
  • Another method for tuning the center frequency involves pulling the "springs" (beams) of a microresonator 110, as shown in Figure 16A.
  • the tension in the suspending springs is varied by electrostatically pulling on the truss support, where the supporting beams 114a-114d and 115a-115d fold.
  • the pulling force is applied via voltage source (V ⁇ ) which is different from bias voltage V p and applied to spring-pulling electrodes 116 and 118 located on opposite sides of folded beam arrangement 112.
  • the variation of filter characteristics with temperature is determined mainly by the dependence of resonator resonance frequency on temperature.
  • two methods for minimizing the temperature dependence of the crystal resonance frequency are: (1) temperature compensation, where circuit techniques which pull the frequency of resonance are used to compensate for frequency changes due to temperature variation; and (2) temperature control, where the temperature of the system is held at a certain point in an attempt to eliminate from the start the mechanism for frequency variation.
  • temperature control can achieve better frequency stability than compensation, the former has been less frequently used due to the following drawbacks: (1) a large volume is required for thermal isolation; (2) a warm-up time for the oven is needed; and (3) the power consumption, particularly in cold environments, is large (up to 10 watts (W) ) .
  • microminiaturization offers, of course, smaller volume, and this combined with the potential for using a vacuum shell and/or special micromachining processing techniques for thermal isolation, solves all of the above problems, since orders of magnitude less warm-up time and power consumption are required to stabilize the temperature of micron-sized structures.
  • the resonance frequency of a micromechanical resonator may be stabilized by using heating and sensing resistors in a feedback loop to maintain a constant temperature.
  • Such a scheme is depicted in Figure 17A.
  • the voltage V ft is initially high and causes the amplifier 121 to supply current to the heating resistors 122.
  • the resistance of thermistors 123 which may be polysilicon resistors, decreases, causing V ⁇ to rise to the optimum value V ref , where the feedback loop, represented by connection 124, attempts to stabilize V ⁇ .
  • the temperature of the system is, thus, set by V ref , and this temperature may be chosen at a point in the fractional frequency change versus temperature curve where the slope is zero, and the temperature exceeds room temperature.
  • the power consumption required to maintain the specified temperature is determined by the thermal loss in the system, which should be minimized to minimize the power requirement.
  • the thermal loss in the system which should be minimized to minimize the power requirement.
  • miniaturized resonators since it is in the reduction of thermal loss where microminiaturization proves most rewarding.
  • microresonator 120, heating resistors 122, and thermistors 123 are fabricated on a microplatform 125, which is connected to a substrate (not shown) by only thin supporting beams 126. Designs where the filter circuitry and micro-oven control circuits are fabricated on the microplatform are possible as well.
  • Such a microplatform for thermal isolation purposes has been previously considered wherein bulk micromachining processes were used to achieve a silicon nitride microplatform. Experimental measurements found that the power required to maintain 300°C was only 8 mW, and the thermal time constant was only 3.3 msec. These figures are to be compared with up to 10W and 15 to 30 minutes for macroscopic temperature-controlled quartz crystal oscillators.
  • FIG. 17B A scanning electron micrograph (SEM) of a resonator fabricated on top of a thermally-isolated microplatform is shown in Figure 17B.
  • SEM scanning electron micrograph
  • electrostatic feedback techniques which control the Q of the microresonator have been demonstrated.
  • Such Q-control techniques can be applied to passband smoothing of micromechanical filters and/or Q-controlled biquads in biquad filter architectures.
  • the solid curves in Figures 19A and 19B show frequency versus amplitude responses for a fourth order parallel, microresonator filter as described in the above- identified application entitled "Microelectromechanical Signal Processors.
  • Figures 19A also shows the responses of the two resonators, resonator 1 and resonator 2, which constitute the filter. Immediately after fabrication, and in a vacuum, the Q's of the resonators constituting the filter are large and unpredictable, resulting in a filter frequency response similar to the one in Figure 19A.
  • the passband may be corrected to be flat as shown in Figure 19B.
  • Figure 20 shows an implementation of such passband correction.
  • two four-port resonators are represented by equivalent circuit diagrams 130, where the central structure depicts the shuttle and supporting springs, and the vertical lines represent ports, and if is understood that this resonator circuit diagram can be generalized to any number of ports.
  • each resonator has one drive port 136 and 137, two sense ports 132, 135 and 133, 138, and one feedback port 130 and 134.
  • the drive voltages v i(+) and v ⁇ to each resonator are 180° out of phase.
  • Motional current from sense ports 132 and 133 is summed and then amplified to a voltage by amplifier 34, generating the output of the filter.
  • the quality factor of each resonator is controlled by negative feedback loops involving negative transimpedance (or transresistance) amplifiers 131, which amplify sense currents from ports 135 and 138, and feed them back to ports 134 and 130, as shown in Figure 20.
  • the Q-control implementation operates as discussed above. Using the implementation of Figure 20, corrected bandpass filter responses as shown in Figure 19B can be obtained.
  • FIG 21 shows a schematic of Q-control for a single-port resonator.
  • single-port resonator 140 is driven at port 143.
  • the motional current resulting from capacitive variation of port 143 flows through the resonator 140 and into node 144, and is 90° phase-shifted from the drive voltage at port 143.
  • the current is sensed directly from the resonator via capacitive amplifier 141.
  • the lead to node 144 from resonator 140 is electrically connected to the resonator ground plane (not shown) . As discussed, the ground plane and the resonator shuttle are at the same voltage potential.
  • Capacitive amplifier 141 has amplification factor C ⁇ and provides an additional +90° , hase-shift, which allows negative feedback of the output signal v 0 to the summing amplifier consisting of operational amplifier 42 and resistor R ⁇ mn .
  • Reverse-biased diode 142 is provided to bias node 144 to the dc voltage V p .
  • the circuit of Figure 21 then operates as the previous embodiments, with control of Q through variation of R x and R Q , which track each other.
  • the ability to control Q to the above precision also has implications beyond this.
  • changes in pressure can be quantified by measuring the feedback signal at the output of the summing amplifier, which adjusts to maintain constant Q under varying pressure.
  • Such a Q-balanced resonator pressure sensor would have the advantage of automatic limiting of the resonator amplitude, and thus, would have a wide sensing range.

Abstract

A microresonant structure includes a first fixed electrode (22) for receiving input, a second fixed electrode (23) for transmitting output, and a movable electrode (27) located between the first and second fixed electrodes. The electrodes are formed with interdigitated comb-like fingers (25, 27). The fixed electrodes are secured to and elevated above a silicon substrate. The movable electrode is supported above the substrate by flexible beams. A feedback loop (34) supplies output from the second fixed electrode back as input to the first fixed electrode to control the quality factor of the microresonant structure. The structure is useful as a high frequency filter.

Description

0-CONTROLLED ICRORESONATORS AND TUNABLE ELECTRONIC FILTERS USING SUCH RESONATORS
CROSS-REFERENCE TO RELATED APPLICATIONS This application is related to a co-pending, commonly-owned application entitled "Microelectro- mechanical Signal Processors," filed on December 11, 1992. The entire disclosure of this application is hereby incorporated by reference.
BACKGROUND OF THE INVENTION The present invention relates generally to resonant microstructures, and more particularly to Q-control for resonant microstructures and electronic filters using such microstructures.
The need for high-frequency bandpass filters with high selectivity for telecommunication systems has stimulated interest in* integrated versions of such filters wherein entire systems may be integrated onto a single silicon chip. Examples of systems requiring these filters include radio-frequency (RF) receiver systems, mobile phone networks, and satellite communication systems.
Previously, intermediate frequency (IF) filtering in frequency modulated (FM) receivers has been performed at 10.7 Mega-Hertz (MHz) IF frequency, using highly selective inductive-capacitance (LC) ceramic or crystal filters. Recently, integrated versions using integrated circuit (IC) switched-capacitor techniques have been attempted. However, designs based upon a coupled biquad filter architectures suffer from dynamic range reduction introduced when attempting high-Q operational simulation of LC stages. (Q is a figure of merit equal to reactance divided by resistance. The Q of a system determines the rate of decay of stored energy.) Modulation filtering techniques, such as N-path designs, suffer from the generation of extraneous signals, such as image and clock components inside the signal band, resulting from the remodulation process.
Recent advances in micromachining offer another analog, high frequency, high-Q, tunable integrated filter technology that can enhance filter performance over that of previous integrated versions while maintaining design characteristics appropriate for bulk fabrication in very large-scale integrated (VLSI) systems. Specifically, micromachined mechanical resonators or resonant microstructures may be used. These microresonators are integrated electromechanical devices with frequency selectivity superior to integrated resistance-capacitance (RC) active filtering techniques. Using integrated micromechanical resonators, which have Q-factors in the tens of thousands, microelectromechanical filters with selectivity comparable to macroscopic mechanical and crystal filters may be fabricated on a chip.
Since the passband shape of these filter designs depends strongly on the Q of the constituent resonators, a precise technique for controlling resonator Q is required to optimize the filter passband. Such a Q- control technique would be most convenient and effective if the Q was controllable through a single voltage or an element value, e.g. , a resistor, and if the controlled value of Q was independent of the original Q. An object of the present invention is thus to provide feedback techniques for precise control of the Q-factor of a micromechanical resonator. Another object of the present invention is to provide very high Q microelectromechanical filters constructed of Q-controlled microresonator biquads in biquad filter architectures. In addition, the invention provides a means for passband correction of spring- coupled or parallel micromechanical resonators via control over the Q-factor of the constituent resonators.
Additional objects and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objects and advantages of the invention may be realized and obtained by means of the instrumentalities and combinations particularly pointed out in the claims.
SUMMARY OF THE INVENTION The present invention is directed to a resonator structure. The resonator structure comprises a first electrode at which an input signal may be applied and a second electrode at which an output signal may be sensed. The resonator structure further includes a feedback means for applying the output signal to the first electrode for controlling the Q of the resonator structure. The equivalent circuit series resistance (Rx) of the resonator of the present invention is proportional to the inverse of the Q of the resonator. As such, the controlled value of Q is independent of the original Q of the resonator. Rather, it is dependent only on the control voltage (VQ) or some other controlling factor such as resistance values.
Additionally, the gain of the resonator (v0/vj) is equal to the number of input fingers divided by the number of feedback fingers. This is advantageous in that it offers very precise gain values. This enables construction of bandpass biquads with precisely settable gains. Also, the gain will stay constant as the Q is changed.
Dimensions of a microresonator of the present invention may be: a length between about 5 microns (μm) and lOOO m, a width between about 5μm and lOOμm, and a thickness from between about 0.1 and lOOμm.
High-Q tunable electronic filters based upon the Q-controlled microresonators of the present invention are suitable for batch fabrication using standard complementary metal-oxide semiconductor (CMOS) integrated circuit and micromachining technologies. The Q-controlled microresonators may serve as adjustable biquad stages in various filter architectures such as coupled (or cascaded) biquad, follow-the-leader feedback (FLF) , or other multiple-loop feedback techniques. Frequency and bandwidth are independently voltage- controllable. This permits adaptive signal processing. Noise analysis determines that the dynamic range of a proposed high-Q filter is much higher than that of its high-Q active RC counterparts, i.e.. switched- capacitor MOSFET-C, and gm-C filters. Specifically, a dynamic range in excess of 90 decibels (dB) is predicted for a filter centered at 10.7 MegaHertz (MHz) with a bandwidth of 56 KiloHertz (kHz) . With the resonators of the present invention, temperature insensitivity can be achieved through micro- oven control, which, on a micron scale, provides orders of magnitude improvement in power dissipation and thermal time constant over equivalent macroscopic methods.
BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are incorporated in and constitute a part of the specification, schematically illustrate a preferred embodiment of the invention and, together with a general description given above and the detailed description of the preferred embodiment given below, will serve to explain the principles of the invention.
Figure 1A is a schematic representation of a Q-control scheme for a three-port electrostatic-comb driven microresonator.
Figure IB is a schematic cross-section along lines IB-IB of Figure 1A.
Figure 2 is a system block diagram for the circuit of Figure 1. Figure 3 is a schematic representation of a Q-control scheme for a two-port microresonator.
Figure 4 is a system block diagram for the circuit of Figure 3.
Figure 5 is a schematic representation of a scheme for raising the Q of a three-port microresonator.
Figure 6 is an equivalent circuit diagram for a three-port microresonator biased and excited as shown in Figure 1A.
Figure 7 is a schematic representation of a balanced Q-control scheme for a four-port microresonator using two balanced amplifiers (one of them transimpedance) and metal oxide semiconductor (MOS) resistors.
Figure 8 is a schematic representation of a balanced Q-control scheme for a six-port microresonator using one balanced transimpedance amplifier.
Figure 9 is a schematic representation of a Q-controlled microresonator filter using a balanced FLF architecture. Figure 10A is a system block diagram for a general FLF filter.
Figure 10B is a single-ended noise block diagram for the circuit of Figure 3 or 6.
Figure 11 is a graphical representation of simulated responses for the filter of Figure 9.
Figure 12 is a graphical representation of the measured transconductance spectra of the embodiment of Figure 1A using different values of R^p and demonstrating control of the Q-factor through control of
Figure 13 is a graphical representation of the transconductance spectra for the microresonator of Figure 1A subjected to Q-control with R,^ = 3.3 mega- ohms and with varying ambient pressure.
Figure 14A is a schematic representation of a microresonator including sloped drive fingers, which allow resonance frequency-pulling.
Figure 14B is an enlarged schematic representation of the relationship between the sloped and straight drive fingers.
Figure 15A is a schematic representation of a microresonator including a third polylayer to introduce a nonlinear variation in the voltage-to-force transfer function of the resonator and thus allow frequency- pulling.
Figure 15B is a view along lines 15B-15B of Figure 15A.
Figure 16A is a schematic representation of a microresonator including spring-pulling electrodes for frequency tuning.
Figure 16B is a graphical representation of resonance frequency versus frequency pulling voltage for the microresonator of Figure 16A.
Figure 17A is a schematic representation of feedback control circuitry for a micro-oven controlled resonator fabricated on a microplatform for thermal and mechanical isolation.
Figure 17B is a scanning electron micrograph of a resonator fabricated on top of a thermally-isolated microplatform.
Figure 18 is a circuit diagram of a high gain transresistance amplifier which may be used in the present invention. Figures 19A and 19B are graphical representations of filter passband correction.
Figure 20 is a circuit diagram showing the implementation of passband correction for a parallel microresonator filter.
Figure 21 is a circuit diagram for Q control of a resonator structure with a single port.
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in terms of a number of different embodiments. It is directed to Q-control for microresonators. These resonators may be used to build very high Q microelectromechanical filters. The filters may be constructed of coupled, Q- controlled microresonator biquads, spring-coupled resonators or resonators electrically connected in parallel. Spring-coupled resonators and resonators electrically connected in parallel are described in the above-identified, co-pending application entitled "Microelectromechanical Signal Processors," which has been incorporated by reference.
A basic Q-control architecture for a microresonator 20 is shown in Figure 1. The microresonator is of the type shown in U.S. Patent No. 5,025,346, issued June 18, 1991, which is hereby incorporated by reference.
The resonator shown in U.S. Patent No. 5,025,346 is preferred in the context of the present invention. However, the principles of the present invention equally apply to other types of resonators, and the Q-control scheme discussed herein may be used with those resonators. Also the filter architectures, frequency- pulling schemes and micro-oven schemes discussed below may be applied to these other types of resonators. Such resonators include, but are not limited to, those which use piezoelectric, piezoresistive, parallel-plate electrostatic, or magnetic drive and sense, and to resonators with arbitrary geometries, such as cantilevers or double-ended tuning forks.
As shown in Figure 1, resonator 20 has three ports, comprising a drive electrode 22, a sense electrode 23, and a feedback electrode 24. The resonator is driven electrostatically by the drive electrode and capacitive motional current is sensed at the sense electrode. Signals are fed back to the microresonator via the feedback electrode. The electrodes comprise interdigitated finger (comb) structures 25 and 27. The fingers 25 are stationary, being anchored to a substrate 29a, which may be a silicon wafer substrate, or anchored to passivation layers, which may be a nitride layer 29b over an oxide layer 29c, over the substrate. The darkly shaded region 28 represents the anchor point for the drive electrode 22 and its associated fingers 25. The fingers 27 are attached to a suspended, movable shuttle 27a; thus, they are movable. The shuttle 27a and fingers 27 are spaced above the substrate, and are allowed to move laterally relative to the substrate overlayers and stationary fingers 25. A folded-beam suspension arrangement, represented generally by reference numeral 30, allows shuttle 27a and attached fingers 27 to move. The folded beam suspension 30 comprises folded beams 31a, 31b, 31c, and 3Id, and truss support beam 31f, all of which are suspended above the substrate 29a and associated overlayers 29b and 29c. Motivations for this truss suspension are its large compliance and its capability for relief of built-in residual strains in the structural film. The cantilever beams 31b and 3Id are anchored at one end to a ground plane 29d, which is fabricated over the substrate 29a and substrate overlayers 29b and 29c, near a center point 31e (a darkly shaded region) and attached at the other end to the folding truss beam 31f. Cantilever beams 31a and 31c are attached at one end to the folding truss beam 3If and at the other to the shuttle 27a. The folded beam suspension 30 allows expansion or contraction of the four beams along the y-axis, increasing the linear range of operation of the resonator 20. The folded beam suspension, comprising 32a, 32b, 32c, 32d, and 32f, is anchored through beams 32b and 32c to ground plane 29d and/or overlayers 29b and 29c at location 32e, and the suspension operates like beams 31a-31f.
The long effective support length of beams 31a- 31d and 32a-32d result in a highly compliant suspension for movable fingers 27 of the drive, sense, and feedback electrodes. In an alternate arrangement, the substrate overlayers may be eliminated. The anchor points would then be formed on the substrate, and the substrate would serve as the ground plane.
The motion of the movable fingers is sensed by detecting the motional current through the time-varying interdigitated finger capacitor formed by the movable and stationary fingers of the sense electrode 23 with a direct current (dc) bias voltage Vp applied to ground plane 29b, which is attached to the shuttle 27a and movable fingers 27 through anchor points 31e and 32e. The driving force Fx and the output sensitivity are proportional to the variation of the comb capacitance C with the lateral displacement x of the structure dC/θx. A key feature of the electrostatic-comb drive is that dC/dx. is a constant, independent of the displacement x, so long as x is less than the finger overlap. Note that θC/θx for a given port is a function of the number of overlaps between movable and stationary fingers 27 and 25, respectively, of the port in question. Thus, it can be different for drive port or drive electrode 28, sense port or sense electrode 23, and feedback port or feedback electrode 24. To distinguish these values, (9C/9x)d, (θC/dx),, and
(dC/dx)fl, may be used for the drive, sense, and feedback ports, respectively. At sense electrode 23, harmonic motion of the structure results in a sense current I, which is represented by:
Is=Vp (dC/dx) s (dx/dt) (1)
At drive electrode 22, the static displacement is a function of drive voltage vD given by:
Figure imgf000012_0001
where Fx is the electrostatic force in the x direction and k,ys is the system spring constant . For a drive voltage vD ( t) =VP+Vd sin ( ω fc) the time derivative of x is te = OC/dx) d d ( vD2) ( 3 ) "at 2kεys dt
(dC/dx) 2
= — — - [2ω Vpvdcos ( ω t) +ωvdsin (2ω t) ]
-^sys
where vd is the amplitude of the input ac signal, VP is the previously-mentioned dc-bias applied to the resonator, and where the fact that (θC/θx)d is a constant for the inter-digitated-finger capacitor 23 or 24 is used. The second-harmonic term on the right-hand side of Equation (3) is negligible if vd<<VP. Furthermore, if a push-pull (differential) drive is used, this term results in a common-mode force and is cancelled to the first order. At mechanical resonance, the magnitude of the linear term in Equation (3) is multiplied by the Q- factor, from which it follows that the magnitude of the transfer function T(jωr)=X/vD relating the phasor displacement X to phasor drive voltage Vd at the resonant frequency ωr is:
Figure imgf000013_0001
The transconductance of the resonant structure is defined by Y(jω)=I,/Vd. Its magnitude at resonance can be found by substitution of Equation (4) into the phasor form of Equation (1) :
Figure imgf000013_0002
Planar electrode or ground plane 29d (Figures 1A and IB) can be grounded or set to a dc potential in order to minimize parasitic capacitive coupling between the drive, feedback and sense ports. An additional function of this electrode is to suppress the excitation of undesired modes of the structure.
As noted, the motional current output from the resonator is electronically sensed by means of sense electrode 23. The motional current is applied to a transimpedence or transresistance amplifier 34, where it is converted to a voltage v0. The voltage v0 is fed back to the microresonator via feedback electrode 24. The drive voltage vd is applied to the resonator via drive electrode 22. The microresonator sums the drive voltage and the negative feedback signal, v^ = v0, closing the loop and reducing its own original Q. The Q of the microresonator is effectively controlled by the gain of amplifier 34, which can be made voltage controllable through the voltage VQ.
The equivalent system block diagram for the architecture of Figure 1A is shown in Figure 2, where γ d-s(jω) and Yfb-,(jω) correspond to the microresonator drive port-to-output and feedback port-to-output transfer functions, respectively. Using Figure 2, and modelling the resonator n port to m port transfer functions Ym .n (jω) with the form
_1 i ( 6 ) Y {j ω ) = Rχm.n l +2jQ ( A ω / ω0 )
where R^.,, is the equivalent series resistance of the resonator from any port JΠ to any port n, and ω0 is the natural resonance frequency. The equivalent series resistance is discussed below in relation to Figure 5. In the equations that follow, any port m or n may be d, s, or fb, corresponding to drive, sense, or feedback ports, respectively. Direct analysis of Figure 2 yields
Figure imgf000014_0001
where R^ is the value of the transresistance or transimpedence of amplifier 34 and where
Figure imgf000014_0002
is the controlled value of the Q-factor. For large loop gain, the gain of Equation (2) reduces to ( χfb-,/RXd-s) > which, as will be seen, is determined by the number of input and feedback fingers, and stays constant as Q is varied. The Q can be changed, as noted, by adjusting the gain of amplifier 34 through the voltage VQ.
A schematic of the Q-control architecture for a two-port resonator 40 is shown in Figure 3. Although Figure 3 shows a resonator with equal numbers of drive and sense fingers, the number of fingers need not be equal. This resonator includes only a drive electrode 22 and a sense electrode 23. A summing amplifier 42 is provided to sum the input and feedback signals vd and vof respectively, which in Figure 1A were summed by the multi-port resonator itself. The resistances Rk and Rf are variable. These resistances and R.^ provide gain factors for signals applied to amplifier 42. Thus, they directly determine the Q and gain of the Q-control circuit.
Figure 4 shows the single-ended system block diagram equivalent of the circuit of Figure 3. p
Referring to Figures 3 and 4, gain factor =_s and
gain factor κ=—?-~ . Using Figure 4, and modeling the
Rk resonator with the transfer function
•r(Ja)-lfc-.2jg(Aω/ω0)' where R,.,,., is the equivalent drive-to-sense series resistance of the resonator. Direct analysis yields
Figure imgf000015_0001
where
£>'=- Q
(11)
1 + (R/Rxd.ε) f
is the controlled value, of the Q-factor. For large loop
gain, the gain of Equation (10) reduces to -^ , which in
_R turn reduces to -^ . In addition, Q' can be varied by κk
changing Rf, with Rk tracking this change.
The discussion of Q-control has so far concentrated on the lowering of Q through the application of a negative feedback voltage. By using a positive feedback, however, the Q of a resonator can be raised. Positive feedback implementations of Q-control can be realized by merely changing the amplification of amplifier 34 from positive to negative on the architectures of Figures 1A and 3. Alternatively, and more conveniently, positive feedback may be obtained by interchanging finger connections as shown in Figure 5. Specifically, the connections to microresonator 20 of Figure 1A are reversed so sense electrode 23 becomes drive electrode 22' in the embodiment of Figure 5. Similarly, drive electrode 22 of Figure 1A becomes sense electrode 23' , and the feedback electrode 24' is at the input or drive side of microresonator 20 where the input voltage vs is applied. The equation for controlled Q under positive feedback is:
Figure imgf000016_0001
To design for a specific Q and voltage gain —2 vd
for the architecture of Figure 1A, the equivalent drive- to-sense and feedback-to-sense series resistances, Rxd.. and R^t,-,, respectively, of the resonator are required. To calculate these resistances, reference may be made to an equivalent circuit for a three-port micromechanical resonator. The equivalent circuit, as shown in Figure 6, is biased and excited as in the circuit of Figure 1A. The equations for the circuit elements are as follows:
Figure imgf000017_0001
c ' on = r " "dc-overlapn
where n corresponds to the port of the resonator (drive, sense, or feedback) in question, COT is the overlap capacitance across the motionless shuttle and electrode fingers, and the 's represent multiplication factors for the current-controlled current sources shown in the figure. Typical element values for high-Q (Q=50,000) operation of a microresonator are f0 = 20kHz, C0 = 15fF, C_=0.3fF, ^=100 KH, and Rx= 500 K 0.
The equivalent drive-to-sense resistance of the microresonator may be calculated from the following equation:
Figure imgf000017_0002
Driving the equivalent circuit of Figure 6 at the input port d and grounding the other ports, the output motional current i, at resonance is:
V„ S Ψsd d αllU- d r, (15) κxd
Applying Equation (15 ) to ( 14 ) , gives :
~ - Rχd
(17)
A similar analysis yields p _ Rxfb κxfb-s - ~ ( 18 )
Ψsfb
To maximize the range of Q-control afforded by a given amplifier 34, the loop gain of the circuit, A = (Ramp/Rxft-s) should have a wide range. Thus, ^., should be minimized, which in turn requires that R^ be minimized and Φffb be maximized. Reduction in R^ can be achieved by increasing the number of feedback fingers, decreasing the gaps between these fingers, and increasing finger thickness. Φffb is increased with similar modifications to the output fingers.
The number of input and feedback fingers also determines the gain of the Q-control circuit. Using Equation (17) and (18) , the equation for gain at resonance is:
V,, _ Rχfb.s _ Rχfb Φsd _ dC/θx) d _ Nd
(19)
V„ ω=ω R xd-s ®sfb Rxd " (dC/dx) fb Nfb
where Nd and Nft are the number of input and feedback fingers, respectively. The last equality assumes identical finger gaps and thicknesses for both ports.
Thus, the gain is determined by resonator geometry and is independent of variables which determine the controlled Q.
Figure 3 presented a schematic of Q-control using a two-port microresonator, two amplifiers, and linear resistors. In order to implement variability of Q through voltage control, metal oxide semiconductor resistors (MOS) can replace the linear resistors of Figure 3. The value of resistance realized by an MOS resistor can be varied through variation of the gate voltage of such devices. However, MOS resistors suffer from the drawback that they are less linear than their passive counterparts. In order to linearize MOS resistors, a balanced architecture must be used.
Such a balanced architecture is shown in Figure 7, which illustrates Q-control using MOS resistors and a four-port microresonator 50. The microresonator 50 is similar in construction to microresonator 20 in that it includes movable and stationary, interdigitated fingers forming differential drive and sense electrodes 52 and 54, respectively. As in the embodiment of Figure 1A, stationary electrode fingers 55 are anchored to the overlayers 29b and 29c (see Figure IB) at the darkly shaded regions or anchor points 56. The movable fingers 57 are suspended above the ground plane by means of the folded beam suspension arrangement 58. Drive voltages VjW and vj(+) are applied to the drive electrodes. The output voltages v^.) and Vo+) represent amplifications of the signals sensed by sense electrodes 54. Since the shuttle and its fingers are electrically connected to the ground plane, they are at the same voltage, Vp, as the ground plane.
The architecture of Figure 7 also utilizes metal oxide semiconductor (MOS) resistors MQ,, MQ2, MK,, MJQ, ^,, and M,,-,-^. Such resistors are normally nonlinear, unless operated in a fully balanced architecture, such as that depicted in Figure 7. Fully balanced operation minimizes the even ordered harmonics of the MOS resistor voltage-to-current response, thus greatly reducing the total nonlinearity in such devices. In Figure 7, MOS resistors MQJ and MQ2 serve to feed back the output signal v0 with the appropriate gain factor f = Rsum/^Qn = (W/ ) &/ (W/L) smnn , (see Figure 4) where n is either 1 or 2, to the summing amplifier composed of balanced operational amplifier 62 and shunt-shunt MOS resistors M,,^ and M,^. Note that gain factor f is determined by a ratio of MOS W/L's, which are the width over length ratios, and thus can be accurately set to a 0.2% or better tolerance using integrated circuit processes. MOS resistors and N direct the input signal Vj with the appropriate gain factor K = Rsum„/Rκn = (W/L) fo/ (W/L) }lιmn to the summing amplifier to be summed with the negative feedback signal from MOS resistors ^ and MQ2. This summation completes the feedback loop for Q-control as in the block diagram for the equivalent single-ended version given in Figure 3. The equations dictating Q-control for the balanced version of Figure 7 are similar to those for Figure 3, Equations (9) through (11) , except for changes in the drive-to-sense resistance R^.,, which must now account for the four-port nature of the resonator, and can be easily obtained using an analysis similar to that of Equations (13) through (18) .
The circuitry further includes a balanced transimpedance or transresistance amplifier 60, which may or may not be variable. As shown, it is voltage- controllable via VR. For large loop gain, the gain in the scheme of Figure 7 is determined by a ratio of MOS resistor gate
width over gate length ratios (— ) 'ε , specifically
and
Figure imgf000020_0001
f=Rium/RQ=(W/L)Qn/(W/L)Rlπιn. The gain of the stage in Figure 7 stays constant with changing Q, since the channel resistances of MQ and MR track with VQ.
Any Q may be realized using the embodiment discussed herein; thus, any bandpass biquad transfer function may be implemented. Since both the Q and gain of the stage of the embodiment of Figure 7 depend mainly on ratios of the MOS resistors, which can _be made to tolerances as low as 0.2%, this scheme, as well as the other embodiments of the present invention, is quite suitable for bulk fabrication. The initial high Q of microresonators allows for the fabrication of high-Q filters. In addition, the Q of the Q-control circuit and thus the bandwidth of a filter in which the circuit may be incorporated, may be adjusted by changing the loop gain of the circuit. This can be achieved by merely changing a single voltage VQ which controls the value of the channel resistance realized by, for example, resistors MQ, and MQ2. This simple control of a filter bandwidth encourages adaptive circuit techniques for very precise control of filter characteristics.
As shown in Figure 8, the Q-control scheme of the embodiment of Figure 7 can be further simplified by using additional microresonator ports to sum the input and feedback signals, removing the requirement for summing amplifier 62. In this scheme, only one transresistance amplifier 60 is required per two filter poles. As shown in Figure 8, microresonator 70 is a six- port resonator using one balanced transresistance amplifier 60. The drive voltages vi(+) and viw are applied to drive electrodes 71 and 72 which, as in the other embodiments, comprise stationary and movable interdigitated fingers. The output signal from amplifier 60, voltages v0(+) and v0(-), is channeled directly back to resonator 70 via feedback electrodes 73 and 74. The output at sense electrodes 75 and 76 is applied to the negative and positive inputs, respectively, of amplifier 60. Q is controlled by varying the transresistance (transimpedance) of amplifier 60, which is controllable via the control voltage VQ.
By expanding Equation (8) using elements from above analyses resulting from the equivalent circuit of Figure 6, it can be shown that the value of controlled Q is independent of the original Q. Doing this, the controlled Q for the embodiment of Figure 1A is:
(20)
Figure imgf000022_0001
where M^p is an effective mass of the resonator (including support beams and folding truss) , k, is the system spring constant, VP is the applied dc-bias, and (dc/θx)ft/ and (θc/θx), are the change in capacitance per displacement of the microresonator's feedback and sense ports, respectively. Equation (20) shows no dependence on the original Q, and thus, the Q-factor can be set irrespective, for example, of the ambient operating pressure.
A similar expansion applied to the architecture of Figure 3 yields
Figure imgf000022_0002
which is also independent of the original Q.
As discussed, by using positive feedback, the Q of a resonator can be raised. Positive feedback implementations of Q-control can be realized by merely changing the transresistance amplification R^, from positive to negative, in the embodiments of Figures 7 and 8. Alternatively, positive feedback can also be achieved by keeping the R.-.p of amplifier 60 positive and interchanging (crossing) any two parallel leads in the feedback loop. For the one amplifier Q-control version (Figure 8) , the equation for controlled Q under positive feedback is
nl- Q
Ramp ' (22)
R xfb-s
where R^, is the equivalent series resistance from the feedback port to the sense port. For positive feedback, the controlled Q is dependent upon the original Q.
The Q-controlled microresonator architectures described above, the embodiments of Figures 1, 3, 7 and 8, can implement any arbitrary bandpass biquads transfer function. Thus, they can be used as biquad stages in various filter architectures such as follow the leader feedback (FLF) , coupled (or cascaded) biquad, or other multiple-loop feedback techniques. FLF designs are quite desirable, since they have low element sensitivities, comparable or superior to those of leapfrog designs.
A FLF version of a filter, represented generally by reference numeral 75, is shown in Figure 9, and the equivalent system block diagram for a general FLF filter design is shown in Figure 10A. In filter 75, the bandpass biquad stages 80, 81 and 82 all have identical center frequency and Q (but differing gains Kj) . They may be implemented using any of the Q-control microresonator architectures of Figures 1, 3, 7, or 8. Filter 75 includes MOS transistors M^, M^, MFBA, MFBB M3__, Mp2A. MF2B. Mp3B, MB,A, MB2A, M3A, MB1B, MBB, M^B, MFFA, and MFFB connected to implement the feedback in the total system. The transistors MFn3., where n can be 2 or 3 and x can be A or B in correspondence with Figure 9, are used as variable MOS resistors to realize the feedback gains Fn depicted in Figure 10A. The MOS resistors are directed into operational amplifier 76, which is connected as a summing amplifier with MOS resistors MFBA and MFBB. In this configuration, the feedback gains are given by F„ = (W/L)FBx/ (W/L)Fm. where x can be either A or B and n can be either 2 or 3 in correspondence with Figure 9. The M^ are also used as MOS resistors going into the amplifier 76. They realize the gain factor K in Figure 10A via the equation J =
Figure imgf000024_0001
(W/L) &. where again, x can be either A or B in correspondence with Figure 9.
The transistors MBιa, where n can be 1, 2 or 3 and x can be A or B in correspondence with Figure 9, are used as variable MOS resistors to realize the feedforward gains Bn depicted in Figure 10A. The MOS resistors are directed into operational amplifier 72, which is connected as a summing amplifier with MOS resistors MFFA and Mp|.B. In this configuration, the feedforward gains are given by Bn = (W/L) PFx/ (W/L) Bm, where x can be either A or B and n can be 1, 2, or 3, in correspondence with Figure 9. Both the center frequency and bandwidth filter are variable via the single voltage VQ.
Filter 75 uses its three identical microresonator biquads 80, 81 and 82 to realize a sixth order bandpass filter with equiripple passband and stopband. Loss pole locations are determined by the loop gains of balanced feedback loops 84a and 84b, and 85a and 85b, while stopband zeros are determined by the feedforward coefficients realized by the
Figure imgf000024_0002
and MBnx's. The bandpass stages 80, 81 and 82 determine the center frequency and Q-factor of the filter. In filter 75, the feedback gains -F2, -F3 and -Fn (Figure 10A) are implemented by ratios of MOS W/L's as are the biquad gains Kj. Since the Q of the biquads 80, 81 and 82 are controllable via the voltage VQ (Figures 1, 3, 7 or 8) , the bandwidth of the whole filter is likewise controllable via this single voltage. Pole/zero precision for the filter should be comparable to that for switched-capacitor circuits, since poles and zeros can be made dependent on microresonator matching and ratios of the MOS resistors W/L's, i.e.. (W/L)2/ (W/L)j, in much the same way capacitor ratios determine the characteristics of switch capacitor filters. Fabrication of such filters may be achieved through a combination of standard CMOS integrated circuit and micromachining technologies, such as the recent Modular Integration of CMOS and Sensors (MICS) process.
Figure 11 shows simulated responses, v„ in decibels (db) , using SPICE for filter 75, for different values of VQ, VQ, and VQ2, demonstrating bandwidth control and the potential for high Q. The filter Q for the solid plot is about 250, and the bandwidth is less than 100 Hz.
The dynamic range of the high-Q filter 75 has been calculated to be much higher than that of its high- Q active RC counterparts, i.e. switched capacitor, MOSFET-C and gm-C filters. Such active RC filters, which are designed via operational simulation of LC ladders, have reduced dynamic range when implementing high-Q filters, because the noise per stage is amplified by a factor approximately equal to the filter Q. This comes about because the large currents and voltages present in high-Q LC circuits are represented by integrator outputs in the active RC equivalent; thus, attenuation must be provided at appropriate nodes to prevent saturation. Q-controlled microresonator filters do not share this drawback, because the high-Q elements, the microresonators, are effectively passive transconductance devices. The noise block diagram of Figure 10B, wherein the block 100 schematically represents a two-port resonator, such as in Figure 3, can be used to calculate the output noise per Q-control stage. Straightforward analysis yields
(23 )
K. K^x l+2 0 (Δω/ω0)
Vnk l - 2jQ'(Aω/ω0) ' Vak+ A ι+2ji?' <Δω/ω0) ' ^
which at resonance, reduces to
Figure imgf000026_0001
where Rx is the equivalent drive-to-sense resistance of resonator 100. Equation (24) shows that noise in the high-Q filter is not amplified by filter Q.
Using Equation (24) , the dynamic range of filter 75 (Figure 9) , having a bandwidth of 56kHz and a 5V supply, is calculated to be in excess of 90dB.
The amplifiers 34 and 60 represent single-ended and balanced versions of transimpedance or transresistance amplifiers of any general design. The design could be as simple as shunt-shunt feedback applied to an operational amplifier or commercial designs of transimpedance amplifiers used in optical receivers.
If it is desired to obtain large loop gains for the Q-control architectures described above, amplifiers 34 or 60 should be designed for maximum gain bandwidth product. One such design which utilizes CMOS transistors, but can use any technology, be it bipolar, BiCMOS, etc., is shown in Figure 18. (MOS technology has the advantage that the input noise current into the gate of a transistor is minuscule at lower frequencies.) In this design, which is fully balanced, transistors Ml through M9, as shown in Figure 18, comprise a current feedback pair input stage, which has the advantages of low input noise current and large gain bandwidth product. Transistors M10 through M25 comprise a video amplifier second stage, featuring a current feedback pair architecture for high bandwidth. The bandwidth of this amplifier is large because all nodes in its signal path are low impedance nodes. Finally, transistors M26 through M29 make up a common-mode feedback loop, which minimizes the common-mode gain of the amplifier and forces the output dc level to the "Balancing Level" voltage. All transistors in Figure 18 operate as MOS transistors in the saturation region, except for Mn, Mβ, β, and Mf4, which operate as MOS resistors for the current feedback pairs in which they operate. The gain of the amplifier is varible through voltage VQA and VQB, or VQ if these nodes are tied as shown by the dashed connections.
Using the design of Figure 18, gains of over 100 mega-ohms with bandwidths over 100 MHz can be attained, depending upon the technology being used. A single- ended version of the amplifier follows readily from Figure 18.
Because of squeeze-film damping, Couette flow, or similar fluid-based damping mechanisms, the quality factor of a microresonator is strongly dependent upon the ambient pressure in which it operates. In addition, the intrinsic Q of a microresonator is a function of the anchor and is also temperature dependent. For lateral electrostatic-comb driven resonators, the Q ranges from under 50 in atmosphere to over 50,000 in 10 mTorr vacuum. Since the operational pressure for a microresonator is not easily controlled, a Q-control method independent of the original Q of the resonator is desirable.
The controlled Q in the resonators of the present invention can be shown to be independent of the original resonator Q, and thus, of ambient pressure, using the equivalent series resistance discussed above. Inserting Equation (18) in (8) and assuming sufficient loop gain (_L_e__ (Ramp/Rxb-,) 1) yields
Figure imgf000028_0001
where the equation for the first mode resonance frequency css0=^~~~~~7f has been inserted. In the above equations, M^ is an effective mass of the resonator, including the support beams and folding truss. Note that the controlled quality factor Q' depends only upon the transresistance amplification R^p, the bias voltage Vp, and microresonator geometry. It has no dependence on the original Q provided there is sufficient loop gain. Initial experimental verification of the feasibility of the filters of the present invention has been achieved by demonstrating the Q-control techniques described above. Figure 12 shows measured microresonator transconductance spectra under different loop gains, varied by changing the value of the transresistance of amplifier 34 in the circuit of Figure 1A. As shown, the measured values of Q are 53,000 for Rj-np = 1 mega-ohm and 18,000 for R^ = 3.3 mega-ohms. The measurements were made under vacuum at a pressure of 10 mTorr.
Figure 13 presents experimental verification that the value of the controlled Q is invariant under changing ambient pressures, being dependent only on the Q-controlling feedback set by transresistance
(transimpedance) amplifier 34 (Figure 1A) . Without Q- control, the original Q at 8mTorr is 53000 and that at 50mTorr is 84000. With Q-control, the Q for both cases is 18000. The present invention also contemplates different methods for voltage-controlled tuning of the resonance frequency of a microresonator, and thus, of a filter in which it may be used. One method involves the introduction of some nonlinearity into the voltage-to- force transfer function of the microresonator, which gives rise to a bias dependence of the resonance frequency. For an electrostatic-comb driven lateral micromechanical resonator, the most convenient way to do this is to use sloped drive fingers, as shown in Figures 14A and 14B.
Specifically, sloped drive fingers 92 of microresonator 90 form part of the interdigitated fingers (comb) of the frequency-pulling electrode pair 91a. As shown, drive electrodes 91 and 93 also include straight, movable electrode fingers 94 and straight, fixed electrode fingers 95. The sense electrodes are represented by reference numeral 96, and as discussed above, include fixed and movable fingers. As shown in Figure 14B, sloped drive fingers 92 may be sloped at an angle θ. A distance d,, may separate sloped fingers 92 and straight fingers 94. An overlap L0 may exist between sloped fingers 92 and straight fingers 94. By way of example, θ can be about 15°, d0 about 2 μm, and L0 about 20 μm. The straight movable fingers 94 are displaced in the x direction when the resonator is driven by the drive electrodes 91 and 93. The straight fingers 95 of drive fingers 91 and 93 can also be sloped to enhance the frequency-pulling effect. The sloped drive fingers introduce a nonlinear voltage-to-force transfer function, which in turn results in a bias dependent resonance frequency, allowing center frequency tunability. Sloped drive fingers cause the capacitance variation with displacement dC/θx to be nonlinear, which makes the voltage-to-force transfer function nonlinear. The force versus voltage transfer function is given in phasor form by: (dC/dX) linVdf (26)
Figure imgf000030_0001
where Nd is the number of shuttle or movable fingers surrounded by straight drive, fixed fingers, Np is the number of shuttle fingers surrounded by sloped fingers, and ( dC/dx.) corresponds to the straight drive fingers. Using Equation (26) to derive the equation for
Y(jω) = .r7. . and then extracting the resonance
'd( ω) frequency, the following is obtained
(27) ω ' 11 l -grSJ /
where
Figure imgf000030_0002
Equations (27) and (28) indicate that resonator resonance frequency can be pulled by simply varying the bias voltage Vp. Sloped drive fingers are not the only way to introduce a nonlinearity into the voltage-to-force transfer function. A third polylayer as shown in Figures 15A and 15B, would also work, as would other geometrical configurations. Here, microresonator 100 includes sense electrodes 101 and differential drive electrodes 102. The fixed fingers 103 of one electrode pair 110 are triangular in shape and include a third polylayer 107 wherein a first polylayer 109 forms a shuttle ground plane 105a and an elctrode ground plane 105b, and a second polylayer 108 forms the movable fingers 104. As shown, fingers 104 (second polylayer 108) are disposed between third polylayer 107 and electrode ground plane 105b. The third polylayer 107 and electrode ground plane 105b introduce a non-linear variation of the voltage-to-force transfer function of the resonator, i.e.. introduces a nonlinear capacitance versus displacement transfer function, allowing for resonance frequency pulling via variation of the applied voltage V . The first polylayer 109 forming electrode ground plane 105b matches the third polylayer 107 under the triangular-areas to balance vertically-directed electrostatic forces, preventing the possible pull-in of the suspended or movable fingers 104.
Another method for tuning the center frequency involves pulling the "springs" (beams) of a microresonator 110, as shown in Figure 16A. The tension in the suspending springs is varied by electrostatically pulling on the truss support, where the supporting beams 114a-114d and 115a-115d fold. The pulling force is applied via voltage source (V^) which is different from bias voltage Vp and applied to spring-pulling electrodes 116 and 118 located on opposite sides of folded beam arrangement 112.
Initial analysis indicates that for a parallel- plate electrostatic pull with a gap g0= 0.5 μm between the electrode 116 or 118 and the spring-folding truss 119 and capacitor area of 400 μm2, a force of 17.7 μN is generated for an applied pulling voltage of 50 volts (V^) corresponding to a 1% change in resonance frequency. Smaller gaps and larger capacitor area, of course, will result in much larger frequency shifts, as large as 10%. Figure 16B shows a plot of resonance frequency versus frequency-pulling voltage V^ for a fabricated device of the type shown in Figure 16A. For V^ = 40V, a 0.2% shift in frequency in measured.
The variation of filter characteristics with temperature is determined mainly by the dependence of resonator resonance frequency on temperature. In macroscopic crystal oscillator circuits, two methods for minimizing the temperature dependence of the crystal resonance frequency are: (1) temperature compensation, where circuit techniques which pull the frequency of resonance are used to compensate for frequency changes due to temperature variation; and (2) temperature control, where the temperature of the system is held at a certain point in an attempt to eliminate from the start the mechanism for frequency variation. Although temperature control can achieve better frequency stability than compensation, the former has been less frequently used due to the following drawbacks: (1) a large volume is required for thermal isolation; (2) a warm-up time for the oven is needed; and (3) the power consumption, particularly in cold environments, is large (up to 10 watts (W) ) .
Thus, temperature compensation has proven to be the predominant technique for achieving temperature stable oscillators in the macroscopic world. For microresonators, however, there is a strong potential for reversing the situation. Micro¬ miniaturization can eliminate many of the drawbacks noted above. In particular, microminiaturization offers, of course, smaller volume, and this combined with the potential for using a vacuum shell and/or special micromachining processing techniques for thermal isolation, solves all of the above problems, since orders of magnitude less warm-up time and power consumption are required to stabilize the temperature of micron-sized structures.
Thus, for a micro-oven control, the resonance frequency of a micromechanical resonator may be stabilized by using heating and sensing resistors in a feedback loop to maintain a constant temperature. Such a scheme is depicted in Figure 17A.
In this embodiment, the voltage Vft is initially high and causes the amplifier 121 to supply current to the heating resistors 122. As the temperature rises, the resistance of thermistors 123, which may be polysilicon resistors, decreases, causing VΛ to rise to the optimum value Vref, where the feedback loop, represented by connection 124, attempts to stabilize VΛ. The temperature of the system is, thus, set by Vref, and this temperature may be chosen at a point in the fractional frequency change versus temperature curve where the slope is zero, and the temperature exceeds room temperature.
The power consumption required to maintain the specified temperature is determined by the thermal loss in the system, which should be minimized to minimize the power requirement. Herein lies the main advantage of miniaturized resonators, since it is in the reduction of thermal loss where microminiaturization proves most rewarding.
In the embodiment of Figure 17A, microresonator 120, heating resistors 122, and thermistors 123 are fabricated on a microplatform 125, which is connected to a substrate (not shown) by only thin supporting beams 126. Designs where the filter circuitry and micro-oven control circuits are fabricated on the microplatform are possible as well. Such a microplatform for thermal isolation purposes has been previously considered wherein bulk micromachining processes were used to achieve a silicon nitride microplatform. Experimental measurements found that the power required to maintain 300°C was only 8 mW, and the thermal time constant was only 3.3 msec. These figures are to be compared with up to 10W and 15 to 30 minutes for macroscopic temperature-controlled quartz crystal oscillators. Evidently, several orders of magnitude improvement in power dissipation and warm-up time can be achieved with microresonators. A scanning electron micrograph (SEM) of a resonator fabricated on top of a thermally-isolated microplatform is shown in Figure 17B. Using additional ports on a micromechanical resonator, electrostatic feedback techniques which control the Q of the microresonator have been demonstrated. Such Q-control techniques can be applied to passband smoothing of micromechanical filters and/or Q-controlled biquads in biquad filter architectures. The solid curves in Figures 19A and 19B show frequency versus amplitude responses for a fourth order parallel, microresonator filter as described in the above- identified application entitled "Microelectromechanical Signal Processors. " Figures 19A also shows the responses of the two resonators, resonator 1 and resonator 2, which constitute the filter. Immediately after fabrication, and in a vacuum, the Q's of the resonators constituting the filter are large and unpredictable, resulting in a filter frequency response similar to the one in Figure 19A. By applying Q-control to each resonator, as described herein and in accordance with the present invention, the passband may be corrected to be flat as shown in Figure 19B.
Figure 20 shows an implementation of such passband correction. In Figure 20, two four-port resonators are represented by equivalent circuit diagrams 130, where the central structure depicts the shuttle and supporting springs, and the vertical lines represent ports, and if is understood that this resonator circuit diagram can be generalized to any number of ports. In the scheme of Figure 20, each resonator has one drive port 136 and 137, two sense ports 132, 135 and 133, 138, and one feedback port 130 and 134. As in the normal parallel microresonator bandpass filter implementation, the drive voltages vi(+) and v^ to each resonator are 180° out of phase. Motional current from sense ports 132 and 133 is summed and then amplified to a voltage by amplifier 34, generating the output of the filter. The quality factor of each resonator is controlled by negative feedback loops involving negative transimpedance (or transresistance) amplifiers 131, which amplify sense currents from ports 135 and 138, and feed them back to ports 134 and 130, as shown in Figure 20. The Q-control implementation operates as discussed above. Using the implementation of Figure 20, corrected bandpass filter responses as shown in Figure 19B can be obtained.
Although Q-control has been discussed using multiport resonators, single-port resonator implementations are also possible. Figure 21 shows a schematic of Q-control for a single-port resonator. Here, single-port resonator 140 is driven at port 143. The motional current resulting from capacitive variation of port 143 flows through the resonator 140 and into node 144, and is 90° phase-shifted from the drive voltage at port 143. The current is sensed directly from the resonator via capacitive amplifier 141. The lead to node 144 from resonator 140 is electrically connected to the resonator ground plane (not shown) . As discussed, the ground plane and the resonator shuttle are at the same voltage potential. Capacitive amplifier 141 has amplification factor C^ and provides an additional +90° , hase-shift, which allows negative feedback of the output signal v0 to the summing amplifier consisting of operational amplifier 42 and resistor Rιmn . Reverse-biased diode 142 is provided to bias node 144 to the dc voltage Vp.
With these changes, the circuit of Figure 21 then operates as the previous embodiments, with control of Q through variation of Rx and RQ, which track each other. The ability to control Q to the above precision also has implications beyond this. For example, using the Q-control architecture of Figure 3, changes in pressure can be quantified by measuring the feedback signal at the output of the summing amplifier, which adjusts to maintain constant Q under varying pressure. Such a Q-balanced resonator pressure sensor would have the advantage of automatic limiting of the resonator amplitude, and thus, would have a wide sensing range.
The present invention has been described in terms of a number of different embodiments. The invention, however, is not limited to the embodiments depicted and described. Rather, the scope of the invention is defined by the appended claims.

Claims

WHAT IS CLAIMED IS:
1. A resonator structure, comprising: a first electrode at which an input signal may be applied; a second electrode at which an output signal may be sensed; and feedback means for applying said output signal to first electrode for controlling the quality factor of the resonator structure.
2. A resonator structure, comprising: a substrate, a stationary electrode secured to said substrate and located in a plane thereabove wherein an input signal can be applied to said electrode; a movable plate overlying said substrate and suspended by flexible supporting beams arms above said substrate; said movable plate and electrode being patterned to provide for each at least one comb with fingers interdigitated with those of the other; a feedback means for applying an output signal from the resonator structure to said electrode.
3. A resonator structure, comprising: a silicon substrate; first and second stationary electrodes secured to and elevated above said substrate comprising a plurality of comb fingers wherein an input signal can be applied to said first electrode and an output signal may be sensed at said second electrode; a movable plate suspended by flexible supporting beams in the same plane as said first and second stationary electrode fingers and comprising a comb with a plurality of fingers interdigitated with said first and second electrode fingers; and eans forming a feedback loop for applying the output signal to at least one of said first and second electrodes.
PCT/US1993/011600 1992-12-11 1993-12-03 Q-controlled microresonators and tunable electronic filters using such resonators WO1994014176A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU58966/94A AU5896694A (en) 1992-12-11 1993-12-03 Q-controlled microresonators and tunable electronic filters using such resonators

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/989,396 US5491604A (en) 1992-12-11 1992-12-11 Q-controlled microresonators and tunable electronic filters using such resonators
US07/989,396 1992-12-11

Publications (1)

Publication Number Publication Date
WO1994014176A1 true WO1994014176A1 (en) 1994-06-23

Family

ID=25535082

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1993/011600 WO1994014176A1 (en) 1992-12-11 1993-12-03 Q-controlled microresonators and tunable electronic filters using such resonators

Country Status (3)

Country Link
US (3) US5491604A (en)
AU (1) AU5896694A (en)
WO (1) WO1994014176A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000002110A2 (en) * 1998-06-24 2000-01-13 Valtion Teknillinen Tutkimuskeskus Micromechanical alternating and direct voltage reference apparatus
US6027408A (en) * 1994-11-09 2000-02-22 Star; Jack Interactive probe game

Families Citing this family (180)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5491604A (en) 1992-12-11 1996-02-13 The Regents Of The University Of California Q-controlled microresonators and tunable electronic filters using such resonators
US5640133A (en) * 1995-06-23 1997-06-17 Cornell Research Foundation, Inc. Capacitance based tunable micromechanical resonators
US6745627B1 (en) 1996-05-21 2004-06-08 Honeywell International Inc. Electrostatic drive for accelerometer
US5948981A (en) * 1996-05-21 1999-09-07 Alliedsignal Inc. Vibrating beam accelerometer
US5992233A (en) 1996-05-31 1999-11-30 The Regents Of The University Of California Micromachined Z-axis vibratory rate gyroscope
US6250156B1 (en) 1996-05-31 2001-06-26 The Regents Of The University Of California Dual-mass micromachined vibratory rate gyroscope
US5783973A (en) 1997-02-24 1998-07-21 The Charles Stark Draper Laboratory, Inc. Temperature insensitive silicon oscillator and precision voltage reference formed therefrom
US5959516A (en) * 1998-01-08 1999-09-28 Rockwell Science Center, Llc Tunable-trimmable micro electro mechanical system (MEMS) capacitor
US5821836A (en) * 1997-05-23 1998-10-13 The Regents Of The University Of Michigan Miniaturized filter assembly
US5914553A (en) * 1997-06-16 1999-06-22 Cornell Research Foundation, Inc. Multistable tunable micromechanical resonators
US6268765B1 (en) * 1997-12-15 2001-07-31 Texas Instruments Incorporated 2.5V, 30-100 MHz 7th order equiripple delay continuous-time filter and variable gain amplifier
US5963857A (en) * 1998-01-20 1999-10-05 Lucent Technologies, Inc. Article comprising a micro-machined filter
FI104591B (en) * 1998-02-04 2000-02-29 Adc Solitra Oy Method of making the filter and filter and part of the filter housing structure
US5948982A (en) * 1998-02-23 1999-09-07 Alliedsignal Inc. Vibrating beam accelerometers and methods of forming vibrating beam accelerometers
DE19808549B4 (en) * 1998-02-28 2008-07-10 Robert Bosch Gmbh Micromechanical comb structure as well as acceleration sensor and drive with this comb structure
US6085594A (en) * 1998-09-04 2000-07-11 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration High resolution and large dynamic range resonant pressure sensor based on Q-factor measurement
US6424074B2 (en) 1999-01-14 2002-07-23 The Regents Of The University Of Michigan Method and apparatus for upconverting and filtering an information signal utilizing a vibrating micromechanical device
US6593831B2 (en) 1999-01-14 2003-07-15 The Regents Of The University Of Michigan Method and apparatus for filtering signals in a subsystem including a power amplifier utilizing a bank of vibrating micromechanical apparatus
US6577040B2 (en) 1999-01-14 2003-06-10 The Regents Of The University Of Michigan Method and apparatus for generating a signal having at least one desired output frequency utilizing a bank of vibrating micromechanical devices
US6600252B2 (en) * 1999-01-14 2003-07-29 The Regents Of The University Of Michigan Method and subsystem for processing signals utilizing a plurality of vibrating micromechanical devices
US6249073B1 (en) 1999-01-14 2001-06-19 The Regents Of The University Of Michigan Device including a micromechanical resonator having an operating frequency and method of extending same
US6713938B2 (en) 1999-01-14 2004-03-30 The Regents Of The University Of Michigan Method and apparatus for filtering signals utilizing a vibrating micromechanical resonator
US6566786B2 (en) 1999-01-14 2003-05-20 The Regents Of The University Of Michigan Method and apparatus for selecting at least one desired channel utilizing a bank of vibrating micromechanical apparatus
JP4511739B2 (en) * 1999-01-15 2010-07-28 ザ リージェンツ オブ ザ ユニヴァーシティ オブ カリフォルニア Polycrystalline silicon germanium films for forming microelectromechanical systems
US6058027A (en) * 1999-02-16 2000-05-02 Maxim Integrated Products, Inc. Micromachined circuit elements driven by micromachined DC-to-DC converter on a common substrate
US6175170B1 (en) * 1999-09-10 2001-01-16 Sridhar Kota Compliant displacement-multiplying apparatus for microelectromechanical systems
US6328802B1 (en) * 1999-09-14 2001-12-11 Lsi Logic Corporation Method and apparatus for determining temperature of a semiconductor wafer during fabrication thereof
US6803755B2 (en) 1999-09-21 2004-10-12 Rockwell Automation Technologies, Inc. Microelectromechanical system (MEMS) with improved beam suspension
US6798312B1 (en) 1999-09-21 2004-09-28 Rockwell Automation Technologies, Inc. Microelectromechanical system (MEMS) analog electrical isolator
US6617750B2 (en) * 1999-09-21 2003-09-09 Rockwell Automation Technologies, Inc. Microelectricalmechanical system (MEMS) electrical isolator with reduced sensitivity to inertial noise
US6853067B1 (en) 1999-10-12 2005-02-08 Microassembly Technologies, Inc. Microelectromechanical systems using thermocompression bonding
US6822304B1 (en) * 1999-11-12 2004-11-23 The Board Of Trustees Of The Leland Stanford Junior University Sputtered silicon for microstructures and microcavities
US6393913B1 (en) 2000-02-08 2002-05-28 Sandia Corporation Microelectromechanical dual-mass resonator structure
US6787969B2 (en) * 2000-06-06 2004-09-07 Iolon, Inc. Damped micromechanical device
US6628177B2 (en) 2000-08-24 2003-09-30 The Regents Of The University Of Michigan Micromechanical resonator device and micromechanical device utilizing same
US6739190B2 (en) * 2000-08-24 2004-05-25 The Regents Of The University Of Michigan Micromechanical resonator device
US20020070816A1 (en) * 2000-08-24 2002-06-13 Wan-Thai Hsu Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby
US6539253B2 (en) 2000-08-26 2003-03-25 Medtronic, Inc. Implantable medical device incorporating integrated circuit notch filters
US20020115198A1 (en) * 2000-09-20 2002-08-22 Nerenberg Michael I. Microfabricated ultrasound array for use as resonant sensors
US20020096421A1 (en) * 2000-11-29 2002-07-25 Cohn Michael B. MEMS device with integral packaging
DE10065723A1 (en) * 2000-12-29 2002-07-04 Bosch Gmbh Robert Arrangement for temperature measurement and control
US6568264B2 (en) * 2001-02-23 2003-05-27 Charles E. Heger Wireless swimming pool water level system
US7280014B2 (en) * 2001-03-13 2007-10-09 Rochester Institute Of Technology Micro-electro-mechanical switch and a method of using and making thereof
US6794271B2 (en) * 2001-09-28 2004-09-21 Rockwell Automation Technologies, Inc. Method for fabricating a microelectromechanical system (MEMS) device using a pre-patterned bridge
US6815243B2 (en) 2001-04-26 2004-11-09 Rockwell Automation Technologies, Inc. Method of fabricating a microelectromechanical system (MEMS) device using a pre-patterned substrate
US6756310B2 (en) 2001-09-26 2004-06-29 Rockwell Automation Technologies, Inc. Method for constructing an isolate microelectromechanical system (MEMS) device using surface fabrication techniques
US6761829B2 (en) 2001-04-26 2004-07-13 Rockwell Automation Technologies, Inc. Method for fabricating an isolated microelectromechanical system (MEMS) device using an internal void
US6768628B2 (en) 2001-04-26 2004-07-27 Rockwell Automation Technologies, Inc. Method for fabricating an isolated microelectromechanical system (MEMS) device incorporating a wafer level cap
US7195393B2 (en) * 2001-05-31 2007-03-27 Rochester Institute Of Technology Micro fluidic valves, agitators, and pumps and methods thereof
US6594994B2 (en) * 2001-06-01 2003-07-22 Wisconsin Alumni Research Foundation Micromechanical actuation apparatus
US6747389B2 (en) * 2001-06-11 2004-06-08 Intel Corporation Apparatus for adjusting the resonance frequency of a microelectromechanical (MEMS) resonator using tensile/compressive strain and applications therefor
JP3900911B2 (en) * 2001-07-16 2007-04-04 セイコーエプソン株式会社 Oscillation circuit and electronic equipment
US6664786B2 (en) 2001-07-30 2003-12-16 Rockwell Automation Technologies, Inc. Magnetic field sensor using microelectromechanical system
US6597258B2 (en) * 2001-08-30 2003-07-22 Spectrum Astro High performance diplexer and method
US6624726B2 (en) * 2001-08-31 2003-09-23 Motorola, Inc. High Q factor MEMS resonators
US6717488B2 (en) * 2001-09-13 2004-04-06 Nth Tech Corporation Resonator with a member having an embedded charge and a method of making thereof
US6842009B2 (en) * 2001-09-13 2005-01-11 Nth Tech Corporation Biohazard sensing system and methods thereof
US6690178B2 (en) * 2001-10-26 2004-02-10 Rockwell Automation Technologies, Inc. On-board microelectromechanical system (MEMS) sensing device for power semiconductors
US7211923B2 (en) * 2001-10-26 2007-05-01 Nth Tech Corporation Rotational motion based, electrostatic power source and methods thereof
US7378775B2 (en) * 2001-10-26 2008-05-27 Nth Tech Corporation Motion based, electrostatic power source and methods thereof
FR2832270B1 (en) * 2001-11-15 2006-07-28 Centre Nat Rech Scient METHOD FOR ADJUSTING THE DISTANCE OF TWO MECHANICAL ELEMENTS OF A SUBSTANTIALLY FLAT MICROMECHANICAL STRUCTURE AND CORRESPONDING ELECTROMECHANICAL RESONATOR
US6611168B1 (en) * 2001-12-19 2003-08-26 Analog Devices, Inc. Differential parametric amplifier with physically-coupled electrically-isolated micromachined structures
WO2003059805A2 (en) * 2002-01-16 2003-07-24 Matsushita Electric Industrial Co., Ltd. Micro device
US6785117B2 (en) * 2002-03-15 2004-08-31 Denso Corporation Capacitive device
US7006720B2 (en) * 2002-04-30 2006-02-28 Xerox Corporation Optical switching system
US6891240B2 (en) * 2002-04-30 2005-05-10 Xerox Corporation Electrode design and positioning for controlled movement of a moveable electrode and associated support structure
US6959583B2 (en) * 2002-04-30 2005-11-01 Honeywell International Inc. Passive temperature compensation technique for MEMS devices
US6838640B2 (en) * 2002-05-13 2005-01-04 The Regents Of The University Of Michigan Separation microcolumn assembly for a microgas chromatograph and the like
US6710512B2 (en) * 2002-06-21 2004-03-23 Industrial Technology Research Institute Microelement piezoelectric feedback type picking and releasing device
US6909221B2 (en) * 2002-08-01 2005-06-21 Georgia Tech Research Corporation Piezoelectric on semiconductor-on-insulator microelectromechanical resonators
AU2003290513A1 (en) * 2002-08-07 2004-04-08 Georgia Tech Research Corporation Capacitive resonators and methods of fabrication
AU2003259906A1 (en) * 2002-08-20 2004-03-11 Lockheed Martin Corporation Method and apparatus for modifying a radio frequency response
JP4189637B2 (en) * 2002-09-19 2008-12-03 日本電気株式会社 FILTER, COMPOSITE FILTER, FILTER MOUNTING BODY WITH THE SAME, INTEGRATED CIRCUIT CHIP, ELECTRONIC DEVICE, AND METHOD FOR CHANGE THE FREQUENCY CHARACTERISTICS OF THE SAME
WO2004082363A2 (en) * 2003-03-17 2004-09-30 Michael Nerenberg Sensor assembly and methods of making and using same
US7514283B2 (en) * 2003-03-20 2009-04-07 Robert Bosch Gmbh Method of fabricating electromechanical device having a controlled atmosphere
US6975193B2 (en) * 2003-03-25 2005-12-13 Rockwell Automation Technologies, Inc. Microelectromechanical isolating circuit
US6987432B2 (en) * 2003-04-16 2006-01-17 Robert Bosch Gmbh Temperature compensation for silicon MEMS resonator
US8912174B2 (en) * 2003-04-16 2014-12-16 Mylan Pharmaceuticals Inc. Formulations and methods for treating rhinosinusitis
US7095295B1 (en) 2003-05-21 2006-08-22 Sandia Corporation Multi-tunable microelectromechanical system (MEMS) resonators
US7075160B2 (en) * 2003-06-04 2006-07-11 Robert Bosch Gmbh Microelectromechanical systems and devices having thin film encapsulated mechanical structures
US6936491B2 (en) 2003-06-04 2005-08-30 Robert Bosch Gmbh Method of fabricating microelectromechanical systems and devices having trench isolated contacts
US6822929B1 (en) 2003-06-25 2004-11-23 Sandia Corporation Micro acoustic spectrum analyzer
US6952041B2 (en) * 2003-07-25 2005-10-04 Robert Bosch Gmbh Anchors for microelectromechanical systems having an SOI substrate, and method of fabricating same
US6870444B1 (en) * 2003-08-28 2005-03-22 Motorola, Inc. Electromechanical resonator and method of operating same
US7287328B2 (en) * 2003-08-29 2007-10-30 Rochester Institute Of Technology Methods for distributed electrode injection
US7217582B2 (en) 2003-08-29 2007-05-15 Rochester Institute Of Technology Method for non-damaging charge injection and a system thereof
EP1665527B1 (en) * 2003-09-10 2011-05-18 Nxp B.V. Electromechanical transducer and electrical device
US7372346B2 (en) * 2003-12-24 2008-05-13 Interuniversitair Microelektronica Centrum (Imec) Acoustic resonator
EP1548768B1 (en) * 2003-12-24 2012-02-22 Imec Micromachined film bulk acoustic resonator
US8581308B2 (en) * 2004-02-19 2013-11-12 Rochester Institute Of Technology High temperature embedded charge devices and methods thereof
US20050186815A1 (en) * 2004-02-20 2005-08-25 Motorola, Inc. AC grounding structure for electronics enclosure
US7068125B2 (en) * 2004-03-04 2006-06-27 Robert Bosch Gmbh Temperature controlled MEMS resonator and method for controlling resonator frequency
JP2005265795A (en) * 2004-03-22 2005-09-29 Denso Corp Semiconductor mechanical quantity sensor
US7102467B2 (en) * 2004-04-28 2006-09-05 Robert Bosch Gmbh Method for adjusting the frequency of a MEMS resonator
US7236092B1 (en) * 2004-08-02 2007-06-26 Joy James A Passive sensor technology incorporating energy storage mechanism
EP1645847B1 (en) * 2004-10-08 2014-07-02 STMicroelectronics Srl Temperature compensated micro-electromechanical device and method of temperature compensation in a micro-electromechanical device
FI20041344A (en) * 2004-10-15 2006-04-16 Valtion Teknillinen Sensor and method for measuring a quantity applied to a component
US7511870B2 (en) * 2004-10-18 2009-03-31 Georgia Tech Research Corp. Highly tunable low-impedance capacitive micromechanical resonators, oscillators, and processes relating thereto
US7262677B2 (en) * 2004-10-25 2007-08-28 Micro-Mobio, Inc. Frequency filtering circuit for wireless communication devices
US7433668B2 (en) * 2004-12-23 2008-10-07 Lucent Technologies Inc. Controlling Q-factor of filters
JP4604730B2 (en) * 2005-01-20 2011-01-05 ソニー株式会社 Micro vibrator, semiconductor device, and communication device
KR20060091492A (en) * 2005-02-15 2006-08-21 삼성전자주식회사 Spring structure, and small device having the same
EP1715580B1 (en) * 2005-03-31 2018-11-28 STMicroelectronics Srl Device for controlling the resonance frequency of a MEMS resonator
US7812680B1 (en) * 2005-05-03 2010-10-12 Discera, Inc. MEMS resonator-based signal modulation
US7449968B1 (en) 2005-05-03 2008-11-11 Discera, Inc. Frequency and temperature compensation synthesis for a MEMS resonator
US7692521B1 (en) * 2005-05-12 2010-04-06 Microassembly Technologies, Inc. High force MEMS device
US20070074731A1 (en) * 2005-10-05 2007-04-05 Nth Tech Corporation Bio-implantable energy harvester systems and methods thereof
US7509870B2 (en) * 2005-10-26 2009-03-31 Orthodata Technologies Llc MEMS capacitive bending and axial strain sensor
US20070170528A1 (en) * 2006-01-20 2007-07-26 Aaron Partridge Wafer encapsulated microelectromechanical structure and method of manufacturing same
US7443258B2 (en) * 2006-04-06 2008-10-28 Sitime Corporation Oscillator system having a plurality of microelectromechanical resonators and method of designing, controlling or operating same
US8111114B2 (en) * 2006-05-02 2012-02-07 Cornell Center for Technology, Enterprise & Commericialization MEMS filter with voltage tunable center frequency and bandwidth
US7578189B1 (en) 2006-05-10 2009-08-25 Qualtre, Inc. Three-axis accelerometers
US7741933B2 (en) * 2006-06-30 2010-06-22 The Charles Stark Draper Laboratory, Inc. Electromagnetic composite metamaterial
WO2008021144A2 (en) * 2006-08-08 2008-02-21 The Arizona Board Of Regents, A Body Corporate Of The State Of Arizona Acting For And On Behalf Of Arizona State University Mems comb drive actuators and method of manufacture
US20080153539A1 (en) * 2006-12-26 2008-06-26 Motorola, Inc. Control of electromagnetic field patterns on a wireless communication device
US7715813B2 (en) * 2007-01-15 2010-05-11 Mediatek Singapore Pte Ltd Receiver having tunable amplifier with integrated tracking filter
WO2009079460A1 (en) * 2007-12-14 2009-06-25 University Of Florida Research Foundation, Inc. Electrothermal microactuator for large vertical displacement without tilt or lateral shift
WO2009148677A2 (en) * 2008-03-11 2009-12-10 The Regents Of The University Of California Microelectromechanical system (mems) resonant switches and applications for power converters and amplifiers
JP5339755B2 (en) * 2008-03-25 2013-11-13 ラピスセミコンダクタ株式会社 MEMS vibrator, semiconductor package
US7990229B2 (en) 2008-04-01 2011-08-02 Sand9, Inc. Methods and devices for compensating a signal using resonators
US8044736B2 (en) * 2008-04-29 2011-10-25 Sand9, Inc. Timing oscillators and related methods
US8476809B2 (en) 2008-04-29 2013-07-02 Sand 9, Inc. Microelectromechanical systems (MEMS) resonators and related apparatus and methods
US8410868B2 (en) 2009-06-04 2013-04-02 Sand 9, Inc. Methods and apparatus for temperature control of devices and mechanical resonating structures
US8044737B2 (en) * 2008-04-29 2011-10-25 Sand9, Inc. Timing oscillators and related methods
US8111108B2 (en) * 2008-07-29 2012-02-07 Sand9, Inc. Micromechanical resonating devices and related methods
US8729973B2 (en) 2008-09-09 2014-05-20 Nxp, B.V. MEMS resonator
US8049579B2 (en) * 2008-10-30 2011-11-01 Hewlett-Packard Development Company, L.P. Resonator having a stator coupled to three stator voltages
FR2939581B1 (en) * 2008-12-09 2010-11-26 Commissariat Energie Atomique NETWORK OF COUPLED RESONATORS, PASS-BAND FILTER AND OSCILLATOR.
US9048811B2 (en) 2009-03-31 2015-06-02 Sand 9, Inc. Integration of piezoelectric materials with substrates
US20100331733A1 (en) * 2009-06-30 2010-12-30 Orthosensor Sensing device and method for an orthopedic joint
US9970764B2 (en) 2009-08-31 2018-05-15 Georgia Tech Research Corporation Bulk acoustic wave gyroscope with spoked structure
US20110063068A1 (en) * 2009-09-17 2011-03-17 The George Washington University Thermally actuated rf microelectromechanical systems switch
FR2954021B1 (en) * 2009-12-10 2012-08-03 Commissariat Energie Atomique COMPENSATED MICRO / RESONATOR WITH IMPROVED CAPACITIVE DETECTION AND METHOD FOR PRODUCING THE SAME
ITTO20090973A1 (en) * 2009-12-10 2011-06-11 St Microelectronics Srl TRIASSIAL INTEGRATED MAGNETOMETER OF SEMICONDUCTOR MATERIAL MADE IN MEMS TECHNOLOGY
US20110210801A1 (en) * 2010-02-26 2011-09-01 Imec Temperature measurement system comprising a resonant mems device
EP2416495B1 (en) * 2010-08-05 2014-05-07 Nxp B.V. MEMS Oscillator
EP2616389B1 (en) 2010-09-18 2017-04-05 Fairchild Semiconductor Corporation Multi-die mems package
US8813564B2 (en) 2010-09-18 2014-08-26 Fairchild Semiconductor Corporation MEMS multi-axis gyroscope with central suspension and gimbal structure
CN103221779B (en) 2010-09-18 2017-05-31 快捷半导体公司 The axle inertial sensor of micromechanics monoblock type six
EP2616772B1 (en) 2010-09-18 2016-06-22 Fairchild Semiconductor Corporation Micromachined monolithic 3-axis gyroscope with single drive
US9352961B2 (en) 2010-09-18 2016-05-31 Fairchild Semiconductor Corporation Flexure bearing to reduce quadrature for resonating micromachined devices
EP2616388A4 (en) 2010-09-18 2014-08-13 Fairchild Semiconductor Sealed packaging for microelectromechanical systems
CN103221795B (en) 2010-09-20 2015-03-11 快捷半导体公司 Microelectromechanical pressure sensor including reference capacitor
WO2012040245A2 (en) 2010-09-20 2012-03-29 Fairchild Semiconductor Corporation Through silicon via with reduced shunt capacitance
EP2515436A1 (en) * 2011-04-18 2012-10-24 Nxp B.V. MEMS resonator and method of controlling the same
US9062972B2 (en) 2012-01-31 2015-06-23 Fairchild Semiconductor Corporation MEMS multi-axis accelerometer electrode structure
US8978475B2 (en) 2012-02-01 2015-03-17 Fairchild Semiconductor Corporation MEMS proof mass with split z-axis portions
US9488693B2 (en) 2012-04-04 2016-11-08 Fairchild Semiconductor Corporation Self test of MEMS accelerometer with ASICS integrated capacitors
EP2647952B1 (en) 2012-04-05 2017-11-15 Fairchild Semiconductor Corporation Mems device automatic-gain control loop for mechanical amplitude drive
EP2648334B1 (en) 2012-04-05 2020-06-10 Fairchild Semiconductor Corporation Mems device front-end charge amplifier
US9069006B2 (en) 2012-04-05 2015-06-30 Fairchild Semiconductor Corporation Self test of MEMS gyroscope with ASICs integrated capacitors
EP2647955B8 (en) 2012-04-05 2018-12-19 Fairchild Semiconductor Corporation MEMS device quadrature phase shift cancellation
US9625272B2 (en) 2012-04-12 2017-04-18 Fairchild Semiconductor Corporation MEMS quadrature cancellation and signal demodulation
US9094027B2 (en) * 2012-04-12 2015-07-28 Fairchild Semiconductor Corporation Micro-electro-mechanical-system (MEMS) driver
CA2874395A1 (en) 2012-05-24 2013-12-19 Douglas H. Lundy Threat detection system having multi-hop, wifi or cellular network arrangement of wireless detectors, sensors and sub-sensors that report data and location non-compliance, and enable related devices while blanketing a venue
DE102013014881B4 (en) 2012-09-12 2023-05-04 Fairchild Semiconductor Corporation Enhanced silicon via with multi-material fill
US8994464B2 (en) * 2012-10-09 2015-03-31 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for a high gain bandwidth, low power trans-impedance voltage gain amplifier (TIVA) topology
US9759564B2 (en) 2013-03-15 2017-09-12 Fairchild Semiconductor Corporation Temperature and power supply calibration
EP2987239B1 (en) 2013-04-19 2016-12-14 KOC Universitesi A nanomechanical resonator array and production method thereof
EP2830213A1 (en) * 2013-07-23 2015-01-28 Alcatel Lucent Apparatus, method, and computer program for generating an oscillating signal
CN103401527B (en) * 2013-08-23 2016-03-02 西安电子科技大学 The variable micromechanical resonator of a kind of electrostatic driving frequency
US20150125342A1 (en) * 2013-11-06 2015-05-07 Kimberly-Clark Worldwide, Inc. Controlled Retention and Removal of Biomaterials and Microbes
US9835647B2 (en) 2014-03-18 2017-12-05 Fairchild Semiconductor Corporation Apparatus and method for extending analog front end sense range of a high-Q MEMS sensor
CN106796147B (en) * 2014-08-27 2019-09-06 3M创新有限公司 With the magnetic mechanical resonator sensor for pre-seting quality
US9866200B2 (en) 2014-10-22 2018-01-09 Microchip Technology Incorporated Multiple coil spring MEMS resonator
US9923545B2 (en) * 2014-10-22 2018-03-20 Microchip Technology Incorporated Compound spring MEMS resonators for frequency and timing generation
US10236858B1 (en) * 2015-08-26 2019-03-19 Hrl Laboratories, Llc Differential split-electrode feedthrough cancellation mechanism
MY192162A (en) 2015-11-23 2022-08-03 Anlotek Ltd Variable filter
KR101724488B1 (en) * 2015-12-11 2017-04-07 현대자동차 주식회사 Mems resonator
KR102588800B1 (en) 2016-02-22 2023-10-13 삼성전기주식회사 Acoustic filter device and method for manufacturing the same
US10177710B1 (en) * 2016-09-16 2019-01-08 Lockheed Martin Corporation System and method for lossless phase noise cancellation in a microelectromechanical system (MEMS) resonator
US10903791B2 (en) 2017-02-11 2021-01-26 Mumec, Inc. Super-regenerative transceiver with improved frequency discrimination
CN117318668A (en) 2017-05-24 2023-12-29 安乐泰克有限公司 Apparatus and method for controlling resonator
JP7203630B2 (en) * 2019-02-19 2023-01-13 昭和電工株式会社 Magnetic sensors and magnetic sensor systems
US11277110B2 (en) 2019-09-03 2022-03-15 Anlotek Limited Fast frequency switching in a resonant high-Q analog filter
JP2023504732A (en) 2019-12-05 2023-02-06 アンロテック リミテッド Using Stable, Adjustable Active-Feedback Analog Filters in Frequency Synthesis
US11876499B2 (en) 2020-06-15 2024-01-16 Anlotek Limited Tunable bandpass filter with high stability and orthogonal tuning
DE102020210119A1 (en) 2020-08-11 2022-02-17 Robert Bosch Gesellschaft mit beschränkter Haftung Drive structure, micromechanical system, method for producing a micromechanical system, method for operating a micromechanical system
US11661333B2 (en) * 2020-10-14 2023-05-30 Taiwan Semiconductor Manufacturing Company Ltd. Semiconductor structure and manufacturing method thereof
US11955942B2 (en) 2021-02-27 2024-04-09 Anlotek Limited Active multi-pole filter

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3056890A (en) * 1959-06-23 1962-10-02 Sylvania Electric Prod Keyed integrate and dump filter having crystal as integrator
US3533022A (en) * 1967-08-11 1970-10-06 Gen Electric Magnetically driven electromechanical filter with cantilevered resonator and variable q
US4262269A (en) * 1979-12-10 1981-04-14 Hughes Aircraft Company Q Enhanced resonator
US4581592A (en) * 1983-05-03 1986-04-08 R F Monolithics, Inc. Saw stabilized oscillator with controlled pull-range
US5025346A (en) * 1989-02-17 1991-06-18 Regents Of The University Of California Laterally driven resonant microstructures
US5090254A (en) * 1990-04-11 1992-02-25 Wisconsin Alumni Research Foundation Polysilicon resonating beam transducers

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2803800A (en) * 1957-08-20 Vilbig
US3490056A (en) * 1967-05-16 1970-01-13 Gen Electric Electromechanical resonator for integrated circuits
US3517349A (en) * 1967-08-11 1970-06-23 Gen Electric Miniature electromechanical filter with magnetic drive
US3634787A (en) * 1968-01-23 1972-01-11 Westinghouse Electric Corp Electromechanical tuning apparatus particularly for microelectronic components
JPS6041868B2 (en) * 1978-09-22 1985-09-19 松島工業株式会社 circuit unit
DE3176140D1 (en) * 1981-10-30 1987-05-27 Ibm Deutschland Contact device for the detachable connection of electrical components
US4517486A (en) * 1984-02-21 1985-05-14 The United States Of America As Represented By The Secretary Of The Army Monolitic band-pass filter using piezoelectric cantilevers
US5408877A (en) * 1992-03-16 1995-04-25 The Charles Stark Draper Laboratory, Inc. Micromechanical gyroscopic transducer with improved drive and sense capabilities
US5767405A (en) * 1992-04-07 1998-06-16 The Charles Stark Draper Laboratory, Inc. Comb-drive micromechanical tuning fork gyroscope with piezoelectric readout
US5349855A (en) * 1992-04-07 1994-09-27 The Charles Stark Draper Laboratory, Inc. Comb drive micromechanical tuning fork gyro
AU5869994A (en) * 1992-12-11 1994-07-04 Regents Of The University Of California, The Microelectromechanical signal processors
US5491604A (en) * 1992-12-11 1996-02-13 The Regents Of The University Of California Q-controlled microresonators and tunable electronic filters using such resonators
US5550516A (en) * 1994-12-16 1996-08-27 Honeywell Inc. Integrated resonant microbeam sensor and transistor oscillator

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3056890A (en) * 1959-06-23 1962-10-02 Sylvania Electric Prod Keyed integrate and dump filter having crystal as integrator
US3533022A (en) * 1967-08-11 1970-10-06 Gen Electric Magnetically driven electromechanical filter with cantilevered resonator and variable q
US4262269A (en) * 1979-12-10 1981-04-14 Hughes Aircraft Company Q Enhanced resonator
US4581592A (en) * 1983-05-03 1986-04-08 R F Monolithics, Inc. Saw stabilized oscillator with controlled pull-range
US5025346A (en) * 1989-02-17 1991-06-18 Regents Of The University Of California Laterally driven resonant microstructures
US5090254A (en) * 1990-04-11 1992-02-25 Wisconsin Alumni Research Foundation Polysilicon resonating beam transducers

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
C.T.C. NGUYEN, "Electromechanical Characterization of Microresonators for Circuit Applications", M.S. REPORT, DEPT. OF ELECTRICAL ENGINEERING AND COMPUTER SCIENCES, University of CALIFORNIA at BERKLEY, April 1991, page 1. *
IEEE MICRO ELECTROMECHANICAL SYSTEMS WORKSHOP, Vol. 20, February 1989, W.C. TANG et al., "Laterally Driven Polysilicon Resonant Microstructures", pages 25-32. *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6027408A (en) * 1994-11-09 2000-02-22 Star; Jack Interactive probe game
WO2000002110A2 (en) * 1998-06-24 2000-01-13 Valtion Teknillinen Tutkimuskeskus Micromechanical alternating and direct voltage reference apparatus
WO2000002110A3 (en) * 1998-06-24 2000-02-17 Valtion Teknillinen Micromechanical alternating and direct voltage reference apparatus
US6657442B1 (en) 1998-06-24 2003-12-02 Valtion Teknillinen Tutkimuskeskus Micromechanical alternating and direct voltage reference apparatus

Also Published As

Publication number Publication date
AU5896694A (en) 1994-07-04
US6236281B1 (en) 2001-05-22
US5955932A (en) 1999-09-21
US5491604A (en) 1996-02-13

Similar Documents

Publication Publication Date Title
US5955932A (en) Q-controlled microresonators and tunable electric filters using such resonators
Pourkamali et al. Electrically coupled MEMS bandpass filters: Part I: With coupling element
Nguyen et al. An integrated CMOS micromechanical resonator high-Q oscillator
Nguyen Frequency-selective MEMS for miniaturized low-power communication devices
Nguyen Micromechanical resonators for oscillators and filters
EP1712002B1 (en) Reference oscillator frequency stabilization
Wang et al. High-order micromechanical electronic filters
US7511870B2 (en) Highly tunable low-impedance capacitive micromechanical resonators, oscillators, and processes relating thereto
US6069505A (en) Digitally controlled tuner circuit
US7436271B2 (en) Dielectrically transduced single-ended to differential MEMS filter
JP3110430B2 (en) Drain biased transresistance device
Nguyen et al. Quality factor control for micromechanical resonators
US6593831B2 (en) Method and apparatus for filtering signals in a subsystem including a power amplifier utilizing a bank of vibrating micromechanical apparatus
US20040058591A1 (en) Electrically-coupled micro-electro-mechanical filter systems and methods
GB2175763A (en) Transconductors
JPH08307199A (en) Capacitive component reduction circuit for electrostatic conversion means and driver and detector for electrostatic conversion means
WO2015176041A1 (en) Active resonator system with tunable quality factor, frequency, and impedance
Mattila et al. 14 MHz micromechanical oscillator
Nguyen Frequency-selective MEMS for miniaturized communication devices
US6763726B2 (en) Mechanical force sensor
Piazza Contour-mode aluminum nitride piezoelectric MEMS resonators and filters
Liu et al. A Review of Eigen-Mode and Frequency Control in Piezoelectric MEMS Resonators
Nabki et al. A high gain-bandwidth product transimpedance amplifier for MEMS-based oscillators
Islam et al. A programmable sustaining amplifier for flexible multimode MEMS-referenced oscillators
Baghelani et al. MEMS based oscillator for UHF applications with automatic amplitude control

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AT AU BB BG BR BY CA CH CZ DE DK ES FI GB HU JP KP KR KZ LK LU LV MG MN MW NL NO NZ PL PT RO RU SD SE SK UA UZ VN

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: CA