WO1995009255A1 - Method of protecting solderable copper and copper-alloy surfaces from corrosion - Google Patents
Method of protecting solderable copper and copper-alloy surfaces from corrosion Download PDFInfo
- Publication number
- WO1995009255A1 WO1995009255A1 PCT/EP1994/003140 EP9403140W WO9509255A1 WO 1995009255 A1 WO1995009255 A1 WO 1995009255A1 EP 9403140 W EP9403140 W EP 9403140W WO 9509255 A1 WO9509255 A1 WO 9509255A1
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- copper
- formula
- compounds
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- sulfur compounds
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/16—Sulfur-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/16—Sulfur-containing compounds
- C23F11/161—Mercaptans
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0591—Organic non-polymeric coating, e.g. for inhibiting corrosion thereby preserving solderability
Definitions
- the present invention relates to an improved method for protecting solderable copper and copper alloy surfaces, the solderability of which is maintained or even improved after the implementation of this method and after storage under the influence of the atmosphere.
- Exposed copper surfaces on printed circuit boards are usually protected mainly by hot tinning or by galvanic deposition of tin or a lead / tin alloy and are thus kept solderable. Following the galvanic deposition, however, a remelting process is generally necessary.
- DE-A 20 03 175 (1) relates to the use of 2-alkylimidazoles with a long straight-chain alkyl group having 5 to 21 carbon atoms in the 2-position and hydrogen or a lower alkyl group in the 4-position or the like Acid addition salts as protective agents for copper and copper alloy surfaces to be protected from the effects of the atmosphere.
- EP-A 178 864 (2) relates to a process for the production of printed circuit boards using aqueous solutions of acid addition salts of 2-alkylimidazoles, as described in (1).
- the object of the present invention was to provide a method in which protection for copper and copper alloy surfaces is produced by treatment with the solution of a suitable active ingredient, the protective layer produced being temperature-stable and, after thermal stress, a Soldering on such a surface is prevented as little as possible.
- R 1 denotes hydrogen or a radical of the formula -SA 2 -R 3 , A 1 and A 2 are straight-chain or branched C - to C 3 o-alkyl groups and
- R 2 and R 3 represent hydrogen or hydroxyl groups
- solderability is not impaired by the organic molecules or their degradation products covalently bonded as described in (3) and (4) after treatment of the coated copper and copper alloy surfaces at high temperatures.
- the method according to the invention can even be used on unpurified, i.e. not pre-cleaned copper and copper alloy surfaces with good results.
- the method according to the invention is preferably used for the corrosion protection of printed circuit boards.
- Suitable sulfur compounds I are:
- alkylene groups A 1 and A 2 are usually only slightly branched or preferably straight-chain alkyl groups with 4 to 30, preferably 6 to 24, in particular 7 to 18, especially 8 to 12 carbon atoms. With branched alkylene groups there are usually up to three methyl or ethyl side chains.
- a 1 and A 2 are polymethylene groups of the formula - (CH) n -, i where n is 6 to 24, in particular 7 to 18, especially 8 to 12.
- the alkylene groups A 1 and A 2 can be the same or different, but preference is given to the same groups A 1 and A 2 because the corresponding compounds I are easier to prepare.
- Suitable solvents for the compounds I are, above all, alcohols, e.g. Methanol, ethanol, iso-propanol or ethylene glycol, ether, e.g. Tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether (butyl glycol), dipropylene glycol monomethyl ether or dipropylene glycol monoethyl ether, ketones, e.g. Acetone, butanone or N-methylpyrrolidone, carbonic acid esters, e.g. Carbonic acid propylene glycol esters, polyethylene glycols, carboxylic acid esters, e.g.
- alcohols e.g. Methanol, ethanol, iso-propanol or ethylene glycol
- ether e.g. Tetrahydrofuran
- ethylene glycol monomethyl ether ethylene glycol monoethyl ether
- Solvent systems with low vapor pressure in particular dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether or ethylene glycol monobutyl ether (butyl glycol) are preferred.
- the solutions are generally applied by setting these treatment solutions to a temperature of 15 to 60 ° C., preferably 15 to 55 ° C., in particular 20 to 40 ° C., and thereby the copper and copper alloy surfaces for a time of at least 5 sec, preferably 10 to 60 sec, in particular 15 to 40 sec, in contact.
- the easiest way to bring them into contact is to immerse the object to be protected in the solution, but it is also possible to spray or brush the object with the solution.
- the surface of the article can be rinsed after the treatment with the other suitable solvent or water used, but preferably with the solvent or water used. Rinsing is not absolutely necessary. Rinsing takes place, for example, by immersing the object in the solvent or water, or by transferring the solvent or water over the surface of the object. Then the surface of the object is Licher dried, for example at room temperature in air or in a drying cabinet at about 40 to 100 ° C.
- the content of the compounds I in the solutions is usually 0.01 to 10% by weight, preferably 0.1 to 5% by weight, in particular 0.5 to 3% by weight. If the contents are less than 0.01% by weight, no protective effect can be demonstrated, and if the contents are greater than 10% by weight, an increased impairment of the solderability of the metal surfaces is observed after thermal stress.
- the solutions described are suitable for the effective protection of all metal surfaces, which consist primarily of pure copper, but also of copper alloys, for example also of brass surfaces.
- the method according to the invention is of particular importance for printed circuit board technology.
- the protective layers produced on the objects with copper-containing surfaces are temperature stable and do not hinder the soldering processes even after thermal stress.
- Drilled, copper-clad PCB base material pieces with a size of approx. 1 x 10 cm were 20 sec at 30 ° C in a solution consisting of 25 ml of conc. Sulfuric acid, 5 ml of 30% hydrogen peroxide, 1 drop of 5% by weight aqueous copper sulfate solution and 75 ml of water, etched, rinsed with water and compressed air dried.
- An etched circuit board base material piece was immersed in the solution of the test substance at 30 ° C. for 20 seconds and, after dripping, was dried in air at room temperature.
- Test A steam test
- the dipped and dried base material piece was in a test tube with a diameter of about 3 cm and a volume of 100 ml, which contained about 5 ml of water and a boiling stone and immersed in a heating bath at a temperature of 110 ° C, using a Thread and a glass rod hung for 45 minutes without being immersed in the water.
- the base piece of material was stored in the drying cabinet at 200 ° C. for 15 minutes after test A.
- solderability of the copper-clad piece of base material was checked by tinning in a vertical hot-tinning machine (soldering temperature: 240 ° C; immersion time: 4 sec; flux: 85% by weight of a commercially available mixture of several alkoxylates / 0.45% by weight). -% glutamic acid hydrochloride / water ad 100 wt .-%).
- H 2 0 / HOAc approx. 0.2 wt. -% aqueous acetic acid solution (pH 4 to 4, 5)
- Grade 3 moderate defects (dewetting, very low non-wetting)
- Grade 4 very strong defects (almost no wetting with solder).
- the effect of the method according to the invention can also be shown on printed circuit boards themselves.
- plated-through, tin-free printed circuit boards were used instead of copper-clad printed circuit board base material. As described above, these were etched, immersed and subjected to the tests mentioned. The circuit boards were then sent through a wave soldering machine (test D) without assembly (soldering temperature: 240 ° C; transport speed: 0.9 m / min). A 2% by weight solution of adipic acid in isopropanol was used as the activator.
- Dewetting grade 3 soldering with defects; Solder does not rise in the solder eyes; SMD surfaces with clear dewetting
- Grade 4 badly disturbed soldering; SMD surfaces and pads only partially wetted with solder.
Abstract
Proposed is a method of protecting solderable copper and copper-alloy surfaces from atmospheric corrosion, the method calling for the surface of the metal to be contacted with a solution of one or more sulphur compounds of the formula (I): R?2-A1-S-R1¿, in which R1 is hydrogen or a group of the formula: -S-A?2-R3, A1 and A2¿ are straight-chain or branched-chain C¿4?-C30 alkyl groups and R?2 and R3¿ are hydrogen atoms or hydroxyl groups, the surface then being rinsed if necessary and finally dried.
Description
Verfahren zum Schutz von lötfähigen Kupfer- und Kupfer¬ legierungsoberflächen vor KorrosionProcess for protecting solderable copper and copper alloy surfaces from corrosion
Beschreibungdescription
Die vorliegende Erfindung betrifft ein verbessertes Verfahren zum Schutz von lötfähigen Kupfer- und Kupferlegierungsoberflächen, wobei deren Lötbarkeit nach Durchführung dieses Verfahrens und nach Lagerung unter dem Einfluß der Atmosphäre erhalten oder so¬ gar verbessert wird.The present invention relates to an improved method for protecting solderable copper and copper alloy surfaces, the solderability of which is maintained or even improved after the implementation of this method and after storage under the influence of the atmosphere.
Die Lagerung unter dem Einfluß der Atmosphäre beeinträchtigt das Aussehen kupferner Gegenstände sowie die Lötbarkeit des Kupfers, was auf dem Gebiet der Elektronik und hier besonders bei Leiter¬ platten ein großes Problem darstellt.Storage under the influence of the atmosphere affects the appearance of copper objects and the solderability of the copper, which is a major problem in the field of electronics and here in particular in the case of printed circuit boards.
Üblicherweise werden freiliegende Kupferflächen auf Leiterplatten überwiegend durch Heißverzinnung oder durch galvanische Ab- Scheidung von Zinn oder einer Blei/Zinn-Legierung geschützt und somit lötfähig erhalten. Im Anschluß an die galvanische Ab¬ scheidung ist in der Regel jedoch ein Umschmelzprozeß erforder¬ lich.Exposed copper surfaces on printed circuit boards are usually protected mainly by hot tinning or by galvanic deposition of tin or a lead / tin alloy and are thus kept solderable. Following the galvanic deposition, however, a remelting process is generally necessary.
Zur Vermeidung dieser technisch aufwendigen und deshalb kostspie¬ ligen Heißverzinnungs- und Abscheidungsprozesse wurden einfachere Verfahren vorgeschlagen, die der temporären Erhaltung der Lötbar¬ keit von freiliegenden Kupferflächen auf Leiterplatten dienen. Diese Verfahren sehen die Behandlung von Kupferoberflächen mit Lösungen vor, die bestimmte schützende Wirkstoffe enthalten.In order to avoid these technically complex and therefore expensive hot tinning and deposition processes, simpler methods have been proposed which serve to temporarily maintain the solderability of exposed copper surfaces on printed circuit boards. These procedures involve treating copper surfaces with solutions that contain certain protective agents.
So betrifft die DE-A 20 03 175 (1) die Verwendung von 2-Alkyl- imidazolen mit einer langen geradkettigen Alkylgruppen mit 5 bis 21 C-Atomen in der 2-Position und Wasserstoff oder einer niederen Alkylgruppe in der 4-Position oder deren Säureadditionssalzen als schützende Mittel für vor der Einwirkung der Atmosphäre zu schützende Kupfer- und Kupferlegierungsoberflächen.For example, DE-A 20 03 175 (1) relates to the use of 2-alkylimidazoles with a long straight-chain alkyl group having 5 to 21 carbon atoms in the 2-position and hydrogen or a lower alkyl group in the 4-position or the like Acid addition salts as protective agents for copper and copper alloy surfaces to be protected from the effects of the atmosphere.
Die EP-A 178 864 (2) betrifft ein Verfahren zur Herstellung von Leiterplatten unter Mitverwendung von wäßrigen Lösungen von Säu¬ readditionssalzen von 2-Alkylimidazolen, wie sie in (1) beschrie¬ ben werden.EP-A 178 864 (2) relates to a process for the production of printed circuit boards using aqueous solutions of acid addition salts of 2-alkylimidazoles, as described in (1).
Der Nachteil bei der Verwendung solcher 2-Alkylimidazole liegt in der geringen Temperaturstabilität der hiermit erzeugten Schutz¬ schichten. Wenn eine mit einem solchen Schut- ausgerüstete Leiterplatte zur Härtung des Klebers von oberflächenmontierbaren
Bauteilen erwärmt wird oder in zwei Lötschichten bestückt werden soll, wird die Schutzschicht zerstört, wobei die Produkte des thermischen Abbaus die nachfolgende Lötung beeinträchtigen oder verhindern.The disadvantage of using such 2-alkylimidazoles is the low temperature stability of the protective layers produced therewith. If a circuit board equipped with such a protective device for curing the adhesive of surface-mountable If components are heated or if two solder layers are to be fitted, the protective layer is destroyed, the products of thermal degradation impairing or preventing subsequent soldering.
P.E. Laibinis und G.M. Whitesides beschreiben in J. Am. Chem. Soc. 1992, Vol. 114, S. 9022-9028 (3) die Verlang¬ samung der Oxidation von Kupfer durch Adsorption von n-Alkan- thiolen in einer monomolekularen Schicht auf der Metallober- fläche. Als hierfür geeignete Schwefelverbindungen werden Cβ- bis C22-n-Alkanthiole genannt. Die Schwefelverbindungen werden als Lösung, beispielsweise in Isooctan, auf die Kupferoberflächen aufgebracht.PE Laibinis and GM Whitesides describe in J. Am. Chem. Soc. 1992, Vol. 114, pp. 9022-9028 (3) the slowdown in the oxidation of copper by adsorption of n-alkanethiols in a monomolecular layer on the metal surface. Cβ- to C 22 -n-alkanethiols are mentioned as suitable sulfur compounds. The sulfur compounds are applied to the copper surfaces as a solution, for example in isooctane.
Y. Yamamoto, H. Nishihara und K. Aramaki beschreiben inY. Yamamoto, H. Nishihara and K. Aramaki describe in
J. Electrochem. Soc, Vol. 140, No. 2 (1993), S. 436-443 (4) ebenfalls die Korrosionsschutzwirkung von C6- bis Cia-Alkanthiolen sowie von ω-Hydroxyalkanthiolen für Kupferoberflächen durch Aus¬ bildung monomolekularer Schichten. Als derartige Schwefelver- bindungen wurden 1-Hexanthiol, 1-Dodecanthiol, 1-Octadecanthiol, 1-Docosanthiol und 11-Mercapto-l-undecanol getestet. Die Schwefelverbindungen wurden als Lösung, beispielsweise in Ethanol, Acetonitril oder Wasser, auf die Kupferoberflächen auf¬ gebracht.J. Electrochem. Soc, Vol. 140, No. 2 (1993), pp. 436-443 (4) also the corrosion protection effect of C 6 - to Cia-alkanethiols and of ω-hydroxyalkanethiols for copper surfaces by forming monomolecular layers. 1-Hexanethiol, 1-dodecanethiol, 1-octadecanethiol, 1-docosanethiol and 11-mercapto-1-undecanol were tested as such sulfur compounds. The sulfur compounds were applied to the copper surfaces as a solution, for example in ethanol, acetonitrile or water.
Der vorliegenden Erfindung lag die Aufgabe zugrunde, ein Ver¬ fahren bereitzustellen, bei dem durch Behandlung mit der Lösung eines geeigneten Wirkstoffs ein Schutz für Kupfer- und Kupfer¬ legierungsoberflächen erzeugt wird, wobei die erzeugte Schutz- Schicht temperaturstabil ist und nach einer thermischen Belastung eine Lötung auf einer solchen Oberfläche möglichst wenig be¬ hindert wird.The object of the present invention was to provide a method in which protection for copper and copper alloy surfaces is produced by treatment with the solution of a suitable active ingredient, the protective layer produced being temperature-stable and, after thermal stress, a Soldering on such a surface is prevented as little as possible.
Demgemäß wurde ein Verfahren zum Schutz von lötfähigen Kupfer- und Kupferlegierungsoberflächen von Korrosion unter dem Einfluß der Atmosphäre gefunden, welches dadurch gekennzeichnet ist, daß man die Metalloberflächen mit einer Lösung einer oder mehrerer Schwefelverbindungen der allgemeinen Formel IAccordingly, a process has been found for protecting solderable copper and copper alloy surfaces from corrosion under the influence of the atmosphere, which is characterized in that the metal surfaces are treated with a solution of one or more sulfur compounds of the general formula I
R -A'-S-R1 (I)R -A'-SR 1 (I)
in derin the
R1 Wasserstoff oder einen Rest der Formel -S-A2-R3 bezeichnet,
A1 und A2 geradkettige oder verzweigte C - bis C3o-Alkylgruppen bedeuten undR 1 denotes hydrogen or a radical of the formula -SA 2 -R 3 , A 1 and A 2 are straight-chain or branched C - to C 3 o-alkyl groups and
R2 und R3 für Wasserstoff oder Hydroxylgruppen stehen,R 2 and R 3 represent hydrogen or hydroxyl groups,
in Kontakt bringt, gegebenenfalls nachspült und anschließend trocknet.brings in contact, rinsed if necessary and then dries.
Aufgrund der negativen Erfahrungen mit den 2-Alkylimidazolen ge- maß (1) bzw. (2) war es überraschend, daß man mit dem erfindungs¬ gemäßen Verfahren eine erheblich größere Korrosionsschutzwirkung und einen erheblich besseren Erhalt der Lötfähigkeit erreichen kann. In einigen Fällen kann die Lötfähigkeit nicht nur erhalten, sondern sogar verbessert werden.Due to the negative experiences with the 2-alkylimidazoles according to (1) or (2), it was surprising that the process according to the invention can achieve a considerably greater corrosion protection effect and a considerably better preservation of the solderability. In some cases, solderability can not only be maintained, but even improved.
Besonders überraschend war hierbei, daß die Lötfähigkeit nicht durch die - wie in (3) und (4) beschrieben - kovalent gebundenen organischen Molekülen bzw. deren Abbauprodukte nach Behandlung der beschichteten Kupfer- und Kupferlegierungsoberflächen bei hohen Temperaturen beeinträchtigt wird.It was particularly surprising here that the solderability is not impaired by the organic molecules or their degradation products covalently bonded as described in (3) and (4) after treatment of the coated copper and copper alloy surfaces at high temperatures.
Das erfindungsgemäße Verfahren kann sogar an ungereinigten, d.h. nicht vorgereinigten Kupfer- und Kupferlegierungsoberflächen mit guten Ergebnissen durchgeführt werden.The method according to the invention can even be used on unpurified, i.e. not pre-cleaned copper and copper alloy surfaces with good results.
Das erfindungsgemäße Verfahren wird vorzugsweise für den Korrosi¬ onsschutz von Leiterplatten angewandt.The method according to the invention is preferably used for the corrosion protection of printed circuit boards.
Als Schwefelverbindungen I eignen sich:Suitable sulfur compounds I are:
Alkanthiole (R1 = R2 = Wasserstoff)Alkanthiols (R 1 = R 2 = hydrogen)
ω-Hydroxyalkanthiole (R1 = Wasserstoff, R2 = Hydroxyl)ω-hydroxyalkanthiols (R 1 = hydrogen, R 2 = hydroxyl)
- Alkyldisulfide (R1 →→ S-A2-R3, R2 = R3 = Wasserstoff)- alkyl disulfides (R 1 → → SA 2 -R 3 , R 2 = R 3 = hydrogen)
ω-Hydroxyalkyldisulfide (R1= -S-A2-R3, R2 = Hydroxyl, R3 = Wasserstoff)ω-hydroxyalkyl disulfides (R 1 = -SA 2 -R 3 , R 2 = hydroxyl, R 3 = hydrogen)
- ω,ω'-Dihydroxyalkyldisulfide (R1= -S-A2-R3, R2=R3=Hydroxyl) .- ω, ω'-dihydroxyalkyl disulfides (R 1 = -SA 2 -R 3 , R 2 = R 3 = hydroxyl).
Von den vorstehend aufgezählten Gruppen werden die ω-Hydroxy¬ alkanthiole der Formel HO-A1-S-H und die symmetrischen ω,ω'-Di- hydroxyalkyldisulfide der Formel HO-A1-S-S-A1-OH besonders bevor- zugt.
Die Alkylengruppen A1 bzw. A2 sind meist nur geringfügig ver¬ zweigte oder vorzugsweise geradkettige Alkylgruppen mit 4 bis 30, vorzugsweise 6 bis 24, insbesondere 7 bis 18, vor allem 8 bis 12 C-Atomen. Bei verzweigten Alkylengruppen sind normalerweise bis zu drei Methyl- oder Ethylseitenketten vorhanden.Of the groups listed above, the ω-hydroxyalkanethiols of the formula HO-A 1 -SH and the symmetrical ω, ω'-dihydroxyalkyl disulfides of the formula HO-A 1 -SSA 1 -OH are particularly preferred. The alkylene groups A 1 and A 2 are usually only slightly branched or preferably straight-chain alkyl groups with 4 to 30, preferably 6 to 24, in particular 7 to 18, especially 8 to 12 carbon atoms. With branched alkylene groups there are usually up to three methyl or ethyl side chains.
Besonders bevorzugt werden für A1 bzw. A2 Polymethylengruppen der Formel -(CH )n-, i der n für 6 bis 24, insbesondere 7 bis 18, vor allem 8 bis 12 steht.Particularly preferred for A 1 and A 2 are polymethylene groups of the formula - (CH) n -, i where n is 6 to 24, in particular 7 to 18, especially 8 to 12.
Die Alkylengruppen A1 und A2 können gleich oder verschieden sein, bevorzugt werden allerdings wegen der leichteren Herstellbarkeit der entsprechenden Verbindungen I gleiche Gruppen A1 und A2.The alkylene groups A 1 and A 2 can be the same or different, but preference is given to the same groups A 1 and A 2 because the corresponding compounds I are easier to prepare.
Als Lösungsmittel für die Verbindungen I eignen sich als organi¬ sche Lösungsmittel vor allem Alkohole, z.B. Methanol, Ethanol, iso-Propanol oder Ethylenglykol, Ether, z.B. Tetrahydrofuran, Ethylenglykolmonomethylether, Ethylenglykolmonoethylether, Ethylenglykolmonobutylether (Butylglykol) , Dipropylenglykolmono- methylether oder Dipropylenglykolmonoethylether, Ketone, z.B. Aceton, Butanon oder N-Methylpyrrolidon, Kohlensäureester, z.B. Kohlensäurepropylenglykolester, Polyethylenglykole, Carbonsäure- ester, z.B. Essigsäureethylester oder Essigsäurebutylester, oder Mischungen hieraus. Bevorzugt werden Lösungsmittelsysteme mit niedrigem Dampfdruck, insbesondere Dipropylenglykolmonomethyl- ether, Dipropylenglykolmonoethylether oder Ethylenglykolmono¬ butylether (Butylglykol) .Suitable solvents for the compounds I are, above all, alcohols, e.g. Methanol, ethanol, iso-propanol or ethylene glycol, ether, e.g. Tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether (butyl glycol), dipropylene glycol monomethyl ether or dipropylene glycol monoethyl ether, ketones, e.g. Acetone, butanone or N-methylpyrrolidone, carbonic acid esters, e.g. Carbonic acid propylene glycol esters, polyethylene glycols, carboxylic acid esters, e.g. Ethyl acetate or butyl acetate, or mixtures thereof. Solvent systems with low vapor pressure, in particular dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether or ethylene glycol monobutyl ether (butyl glycol) are preferred.
Die Applikation der Lösungen geschieht in der Regel dadurch, daß man diese Behandlungslösungen auf eine Temperatur von 15 bis 60°, vorzugsweise 15 bis 55°C, insbesondere 20 bis 40°C, einstellt und hiermit die Kupfer- und Kupferlegierungsoberflächen für eine Zeit von mindestens 5 sec, vorzugsweise 10 bis 60 sec, insbesondere 15 bis 40 sec, in Kontakt bringt. Das In-Kontakt-Bringen erfolgt am einfachsten durch Tauchen des zu schützenden Gegenstandes in die Lösung, man kann aber auch den Gegenstand mit der Lösung be¬ sprühen oder bepinseln.The solutions are generally applied by setting these treatment solutions to a temperature of 15 to 60 ° C., preferably 15 to 55 ° C., in particular 20 to 40 ° C., and thereby the copper and copper alloy surfaces for a time of at least 5 sec, preferably 10 to 60 sec, in particular 15 to 40 sec, in contact. The easiest way to bring them into contact is to immerse the object to be protected in the solution, but it is also possible to spray or brush the object with the solution.
Zur Vermeidung eines Wirkstoffüberschusses kann man die Ober- fläche des Gegenstandes nach der Behandlung mit dem verwendeten, einem anderen geeigneten Lösungsmittel oder Wasser, vorzugsweise jedoch mit dem verwendeten Lösungsmittel oder Wasser, nachspülen. Ein Nachspülen ist jedoch nicht unbedingt erforderlich. Das Nach¬ spülen geschieht beispielsweise durch Eintauchen des Gegenstandes in das Lösungsmittel oder Wasser, oder durch Überleitung des Lösungsmittels oder des Wassers über die Oberfläche des Gegen¬ standes. Anschließend wird die Oberfläche des Gegenstandes in üb-
licher Weise getrocknet, beispielsweise bei Raumtemperatur an der Luft oder im Trockenschrank bei ca. 40 bis 100°C.To avoid an excess of active substance, the surface of the article can be rinsed after the treatment with the other suitable solvent or water used, but preferably with the solvent or water used. Rinsing is not absolutely necessary. Rinsing takes place, for example, by immersing the object in the solvent or water, or by transferring the solvent or water over the surface of the object. Then the surface of the object is Licher dried, for example at room temperature in air or in a drying cabinet at about 40 to 100 ° C.
Der Gehalt der Lösungen an den Verbindungen I beträgt üblicher- weise 0,01 bis 10 Gew.-%, vorzugsweise 0,1 bis 5 Gew.-%, ins¬ besondere 0,5 bis 3 Gew.-%. Bei kleineren Gehalten als 0,01 Gew.-% ist keine Schutzwirkung mehr nachweisbar, bei größeren Gehalten als 10 Gew.-% wird eine erhöhte Beeinträch¬ tigung der Lötbarkeit der Metalloberflächen nach einer thermi- sehen Belastung beobachtet.The content of the compounds I in the solutions is usually 0.01 to 10% by weight, preferably 0.1 to 5% by weight, in particular 0.5 to 3% by weight. If the contents are less than 0.01% by weight, no protective effect can be demonstrated, and if the contents are greater than 10% by weight, an increased impairment of the solderability of the metal surfaces is observed after thermal stress.
Die beschriebenen Lösungen eignen sich zum effektiven Schutz aller Metalloberflächen, die vor allem aus reinem Kupfer, aber auch aus Kupferlegierungen bestehen, so beispielsweise auch von Messingoberflächen. Man kommt zudem beim erfindungsgemäßen Ver¬ fahren mit relativ niedrigkonzentrierten Behandlungslösungen aus, wodurch Wirksubstanz eingespart werden kann. Von besonderer Be¬ deutung ist das erfindungsgemäße Verfahren für die Leiterplatten¬ technologie. Die auf den Gegenständen mit kupferhaltigen Oberflä- chen erzeugten Schutzschichten sind temperaturstabil und behin¬ dern auch nach einer thermischen Belastung die Lötvorgänge nicht.The solutions described are suitable for the effective protection of all metal surfaces, which consist primarily of pure copper, but also of copper alloys, for example also of brass surfaces. In the process according to the invention, it is also possible to use relatively low-concentration treatment solutions, as a result of which active substance can be saved. The method according to the invention is of particular importance for printed circuit board technology. The protective layers produced on the objects with copper-containing surfaces are temperature stable and do not hinder the soldering processes even after thermal stress.
BeispieleExamples
Lösungen der Prüfungssubstanzen wurden hergestellt. Die chemische Struktur der Prüfsubstanzen, das jeweils verwendete Lösungsmittel und die Konzentration der PrüfSubstanzen in der Lösung sind in den folgenden Tabellen jeweils angegeben.Solutions of the test substances were made. The chemical structure of the test substances, the solvent used in each case and the concentration of the test substances in the solution are given in the tables below.
Gebohrte, kupferkaschierte Leiterplatten-Basismaterialstücke mit einer Größe von ca. 1 x 10 cm wurden 20 sec bei 30°C in einer Lösung, bestehend aus 25 ml konz . Schwefelsäure, 5 ml 30 ge«..-%igem Wasserstoffperoxid, 1 Tropfen 5 gew.-%iger wäßriger Kupfersulfatlösung und 75 ml Wasser, angeätzt, mit Wasser nach- gespült und Preßluft getrocknet.Drilled, copper-clad PCB base material pieces with a size of approx. 1 x 10 cm were 20 sec at 30 ° C in a solution consisting of 25 ml of conc. Sulfuric acid, 5 ml of 30% hydrogen peroxide, 1 drop of 5% by weight aqueous copper sulfate solution and 75 ml of water, etched, rinsed with water and compressed air dried.
Ein angeätztes Leiterplatten-Basismaterialstück wurde 20 sec bei 30°C in die Lösung der Prüfsubstanz getaucht und nach dem Ab¬ tropfen an der Luft bei Raumtemperatur getrocknet.An etched circuit board base material piece was immersed in the solution of the test substance at 30 ° C. for 20 seconds and, after dripping, was dried in air at room temperature.
Die so behandelten Leiterplatten-Basismaterialstücke wurden folgenden Prüfungen unterzogen:
Prüfung A (Dampftest)The PCB base material pieces treated in this way were subjected to the following tests: Test A (steam test)
Das getauchte und getrocknete Basismaterialstück wurde in einem Reagenzglas mit einem Durchmesser von ca. 3 cm und einem Volumen von 100 ml, das ca. 5 ml Wasser und einen Siedestein enthielt und in ein Heizbad mit einer Temperatur von 110°C eintauchte, mit Hilfe eines Fadens und eines Glasstabs 45 min lang aufgehängt, ohne daß es in das Wasser eintauchte.The dipped and dried base material piece was in a test tube with a diameter of about 3 cm and a volume of 100 ml, which contained about 5 ml of water and a boiling stone and immersed in a heating bath at a temperature of 110 ° C, using a Thread and a glass rod hung for 45 minutes without being immersed in the water.
Prüfung B (Hitzetest)Test B (heat test)
Das Basismaterialstück wurde im Anschluß an Prüfung A 15 min im Trockenschrank bei 200°C gelagert.The base piece of material was stored in the drying cabinet at 200 ° C. for 15 minutes after test A.
Prüfung C (Lötbarkeitstest)Test C (solderability test)
Die Lötbarkeit des kupferkaschierten Basismaterialstücks wurde durch Verzinnung in einer vertikal arbeitenden Heißverzinnungs- maschine geprüft (Lottemperatur: 240°C; Eintauchzeit: 4 sec; Flu߬ mittel: 85 Gew.-% einer handelsüblichen Mischung mehrerer Alkoxy- late/0,45 Gew.-% Glutaminsäure-Hydrochlorid/Wasser ad 100 Gew.-%) .The solderability of the copper-clad piece of base material was checked by tinning in a vertical hot-tinning machine (soldering temperature: 240 ° C; immersion time: 4 sec; flux: 85% by weight of a commercially available mixture of several alkoxylates / 0.45% by weight). -% glutamic acid hydrochloride / water ad 100 wt .-%).
Die Tabelle 1 gibt die erhaltenen Ergebnisse wieder.
Table 1 shows the results obtained.
Tabelle 1Table 1
Erhaltung der Lötfähigkeit von kupferkaschiertem Leiterplatten-BasismaterialMaintaining the solderability of copper-clad printed circuit board base material
Bsp. Substanz Konz. Lösungsmittel Prüfungen Note Nr. [Gew.-%]E.g. substance conc. Solvent tests grade no. [% By weight]
1 HO-(CH2)ιo-SH 5 Butylglykol A + C 11 HO- (CH 2 ) ιo-SH 5 butyl glycol A + C 1
2 HO-(CH2)ιo-SH 0,1 Dipropylenglykol¬ A + C 1-2 monoethylether2 HO- (CH 2 ) ιo-SH 0.1 dipropylene glycol A + C 1-2 monoethyl ether
3 HO-(CH2)ιo-SH 1 Dipropylenglykolmo¬ A + C 1 noethylether3 HO- (CH 2 ) ιo-SH 1 Dipropylenglykolmo¬ A + C 1 noethyl ether
4 HO-(CH?)8-SH 5 Butylglykol A + C 1-24 HO- (CH ? ) 8 -SH 5 butyl glycol A + C 1-2
5 [HO-(CH2 )ιo-S]2 1 Butylglykol A + C 1-25 [HO- ( CH 2 ) ιo-S] 2 1 butyl glycol A + C 1-2
6 wie Bsp. Nr. 1 A + B + C 26 as example no.1 A + B + C 2
7 wie Bsp. Nr. 2 A + B + C 1-27 as example no.2 A + B + C 1-2
8 wie Bsp. Nr. 3 A + B + C 1-28 as example no.3 A + B + C 1-2
9 HO-(CH2)i2-SH 1 Butylglykol A + B + C 29 HO- (CH 2 ) i 2 -SH 1 butyl glycol A + B + C 2
10 HO-(CH2)6-SH 5 Butylglykol A + C 2-310 HO- (CH 2 ) 6 -SH 5 butyl glycol A + C 2-3
Zum Vergleich:For comparison:
A 2-Undecylimidazol 2 H20/HOAc A + C 3A 2-Undecylimidazole 2 H 2 0 / HOAc A + C 3
B wie Bsp. A A + B + C 4B as for example A A + B + C 4
H20/HOAc : ca . 0 , 2 gew . -%ige wäßrige Essigsäurelösung (pH 4 bis 4 , 5 )H 2 0 / HOAc: approx. 0.2 wt. -% aqueous acetic acid solution (pH 4 to 4, 5)
Benotung :Grading:
Note 1 = perfekte VerzinnungGrade 1 = perfect tinning
Note 2 = leichte Fehler (geringe Entnetzung)Grade 2 = slight errors (low dewetting)
Note 3 = mäßige Fehler (Entnetzung, sehr geringe Nichtbenetzung) Note 4 = sehr starke Fehler (nahezu keine Benetzung mit Lot) .Grade 3 = moderate defects (dewetting, very low non-wetting) Grade 4 = very strong defects (almost no wetting with solder).
Die Wirkung des erfindungsgemäßen Verfahrens kann auch an Leiter¬ platten selbst gezeigt werden. Hierzu wurden anstelle von kupfer¬ kaschiertem Leiterplatten-Basismaterial durchkontaktierte, unver- zinnte Leiterplatten verwendet. Diese wurden, wie oben be¬ schrieben, geätzt, getaucht und den angeführten Prüfungen unter¬ zogen. Danach wurden die Leiterplatten ohne Bestückung durch eine Wellenlötmaschine (Prüfung D) geschickt (Löttemperatur: 240°C; Transportgeschwindigkeit: 0,9 m/min). Als Aktivator wurde eine 2 gew.-%ige Lösung von Adipinsäure in Isopropanol verwendet.The effect of the method according to the invention can also be shown on printed circuit boards themselves. For this purpose, plated-through, tin-free printed circuit boards were used instead of copper-clad printed circuit board base material. As described above, these were etched, immersed and subjected to the tests mentioned. The circuit boards were then sent through a wave soldering machine (test D) without assembly (soldering temperature: 240 ° C; transport speed: 0.9 m / min). A 2% by weight solution of adipic acid in isopropanol was used as the activator.
Die Ergebnisse sind in der Tabelle 2 aufgeführt.The results are shown in Table 2.
Tabelle 2Table 2
Erhaltung der Lötfähigkeit von nicht verzinnten LeiterplattenMaintaining the solderability of non-tinned circuit boards
Bsp. Substanz Prüfungen Note Nr.E.g. substance tests note no.
11 wie Bsp. Nr. 1 D 111 as example no. 1 D 1
12 wie Bsp. Nr. 2 B + D 112 as example no.2 B + D 1
13 wie Bsp. Nr. 3 B + D 1-213 as Example No. 3 B + D 1-2
14 wie Bsp. Nr. 2 A + B + D 114 as example no.2 A + B + D 1
15 wie Bsp. Nr. 9 A + B + D 115 as example no.9 A + B + D 1
Zum Vergleich:For comparison:
C wie Bsp. A A + B + D 3-4
Benotung :C like Ex. AA + B + D 3-4 Grading:
Note 1 = perfekte Lötung; Lot steigt in den Lötaugen empor; SMD- Flächen (Kontaktflächen für oberflächenmontierbare Bau¬ teile) vollständig benetzt Note 2 = Lötung mit leichten Mängeln; SMD-Flächen mit geringerGrade 1 = perfect soldering; Solder rises in the pads; SMD surfaces (contact surfaces for surface-mountable components) completely wetted Note 2 = soldering with slight defects; SMD areas with less
Entnetzung Note 3 = Lötung mit Mängeln; Lot steigt nicht in den Lötäugen empor; SMD-Flächen mit deutlicher EntnetzungDewetting grade 3 = soldering with defects; Solder does not rise in the solder eyes; SMD surfaces with clear dewetting
Note 4 = stark gestörte Lötung; SMD-Flächen und Lötaugen nur teil¬ weise mit Lot benetzt.
Grade 4 = badly disturbed soldering; SMD surfaces and pads only partially wetted with solder.
Claims
1. Verfahren zum Schutz von lötfähigen Kupfer- und Kupfer- legierungsoberflächen vor Korrosion unter dem Einfluß der1. Process for the protection of solderable copper and copper alloy surfaces against corrosion under the influence of
Atmosphäre, dadurch gekennzeichnet, daß man die Metallober- fläohen mit einer Lösung einer oder mehrerer Schwefelver¬ bindungen der allgemeinen Formel IAtmosphere, characterized in that the metal surfaces with a solution of one or more sulfur compounds of the general formula I
R2-A1-S-R1 (I)R 2 -A 1 -SR 1 (I)
in derin the
R1 Wasserstoff oder einen Rest der Formel -S-A2-R3 be- zeichnet,R 1 denotes hydrogen or a radical of the formula -SA 2 -R 3 ,
A1 und A2 geradkettige oder verzweigte C - bis C o~Alkyl- gruppen bedeuten undA 1 and A 2 are straight-chain or branched C - to C o ~ alkyl groups and
R2 und R3 für Wasserstoff oder Hydroxylgruppen stehen,R 2 and R 3 represent hydrogen or hydroxyl groups,
in Kontakt bringt, gegebenenfalls nachspült und anschließend trocknet.brings in contact, rinsed if necessary and then dries.
2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß man es für den Korrosionsschutz von Leiterplatten anwendet.2. The method according to claim 1, characterized in that it is used for the corrosion protection of printed circuit boards.
3. Verfahren nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß man als Schwefelverbindungen I solche einsetzt, bei denen A1 und A2 Polymethylengruppen der Formel -(CH2)n~, in der n für 6 bis 24 steht, bedeuten.3. The method according to claim 1 or 2, characterized in that the sulfur compounds I used are those in which A 1 and A 2 polymethylene groups of the formula - (CH 2 ) n ~, i n of n is 6 to 24, mean.
4. Verfahren nach den Ansprüchen 1 bis 3, dadurch gekennzeich¬ net, daß man als Schwefelverbindungen I ω-Hydroxyalkanthiole der Formel HO-A1-S-H oder symmetrische ω,ω'-Dihydroxyalkyl- disulfide der Formel HO-A1-S-S-A1-OH einsetzt.4. Process according to claims 1 to 3, characterized in that the sulfur compounds I ω-hydroxyalkanthiols of the formula HO-A 1 -SH or symmetrical ω, ω'-dihydroxyalkyl disulfides of the formula HO-A 1 -SSA 1st -OH sets in.
5. Verfahren nach den Ansprüchen 1 bis 4, dadurch gekennzeich¬ net, daß man als Lösungsmittel für die Verbindungen I organi- sehe Lösungsmittel oder Mischungen von organischen Lösungs¬ mitteln oder Mischungen von organischen Lösungsmitteln mit Wasser verwendet. 5. Process according to claims 1 to 4, characterized gekennzeich¬ net that as a solvent for the compounds I see organic solvents or mixtures of organic solvents or mixtures of organic solvents with water.
6. Verfahren nach den Ansprüchen 1 bis 5, dadurch gekennzeich¬ net, daß man die Lösungen der Verbindungen I auf eine Temperatur von 15 bis 60°C einstellt und hiermit die Metall¬ oberflächen für eine Zeit von mindestens 5 sec in Kontakt bringt.6. The method according to claims 1 to 5, characterized gekennzeich¬ net that the solutions of the compounds I at a temperature of 15 to 60 ° C and hereby brings the Metall¬ surfaces in contact for a time of at least 5 sec.
7. Verfahren nach den Ansprüchen 1 bis 6, dadurch gekennzeich¬ net, daß man Lösungen der Verbindungen I mit einem Gehalt von 0,01 bis 10 Gew.-% verwendet.7. The method according to claims 1 to 6, characterized gekennzeich¬ net that solutions of the compounds I are used with a content of 0.01 to 10 wt .-%.
Verwendung von Lösungen einer oder mehrerer Schwefelver¬ bindungen I gemäß Anspruch 1, 3 oder 4 zum Schutz von lötfä¬ higen Kupfer- und Kupferlegierungsoberflächen vor Korrosion unter dem Einfluß der Atmosphäre. Use of solutions of one or more sulfur compounds I according to claim 1, 3 or 4 for protecting solderable copper and copper alloy surfaces from corrosion under the influence of the atmosphere.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DEP4333127.0 | 1993-09-29 | ||
DE19934333127 DE4333127A1 (en) | 1993-09-29 | 1993-09-29 | Process for protecting solderable copper and copper alloy surfaces from corrosion |
Publications (1)
Publication Number | Publication Date |
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WO1995009255A1 true WO1995009255A1 (en) | 1995-04-06 |
Family
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PCT/EP1994/003140 WO1995009255A1 (en) | 1993-09-29 | 1994-09-20 | Method of protecting solderable copper and copper-alloy surfaces from corrosion |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6365067B1 (en) * | 1999-08-12 | 2002-04-02 | Baker Hughes Incorporated | Mercaptoalcohol corrosion inhibitors |
US7396596B2 (en) | 2004-06-23 | 2008-07-08 | Ormecon Gmbh | Article with a coating of electrically conductive polymer |
US7547479B2 (en) | 2004-06-25 | 2009-06-16 | Ormecon Gmbh | Tin-coated printed circuit boards with low tendency to whisker formation |
US7947199B2 (en) | 2005-03-02 | 2011-05-24 | Ormecon Gmbh | Conductive polymers consisting of anisotropic morphology particles |
US7989533B2 (en) | 2005-08-19 | 2011-08-02 | Ormecon Gmbh | Chemical compound comprising an indium-containing intrinsically conductive polymer |
US8153271B2 (en) | 2006-09-13 | 2012-04-10 | Ormecon Gmbh | Article with a coating of electrically conductive polymer and precious/semiprecious metal and process for production thereof |
CN113737167A (en) * | 2021-09-22 | 2021-12-03 | 东莞市四辉表面处理科技有限公司 | Copper material antioxidant and preparation method thereof |
Families Citing this family (3)
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DE19757302A1 (en) * | 1997-12-22 | 1999-07-01 | Siemens Ag | Coating of metal surfaces, especially for microelectronics |
DE19836544C2 (en) * | 1998-08-07 | 2001-06-28 | Hahn Meitner Inst Berlin Gmbh | Use of di-tert-butyl disulfide (TBDS) and / or tert-butyl mercaptan (TBM) as corrosion inhibitors of the microbial corrosion of metals |
DE102004003784B4 (en) | 2004-01-23 | 2011-01-13 | Ormecon Gmbh | Dispersion of intrinsically conductive polyaniline and their use |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
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US7947199B2 (en) | 2005-03-02 | 2011-05-24 | Ormecon Gmbh | Conductive polymers consisting of anisotropic morphology particles |
US7989533B2 (en) | 2005-08-19 | 2011-08-02 | Ormecon Gmbh | Chemical compound comprising an indium-containing intrinsically conductive polymer |
US8153271B2 (en) | 2006-09-13 | 2012-04-10 | Ormecon Gmbh | Article with a coating of electrically conductive polymer and precious/semiprecious metal and process for production thereof |
CN113737167A (en) * | 2021-09-22 | 2021-12-03 | 东莞市四辉表面处理科技有限公司 | Copper material antioxidant and preparation method thereof |
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