WO1995022045A1 - Improved ndir gas sensor - Google Patents
Improved ndir gas sensor Download PDFInfo
- Publication number
- WO1995022045A1 WO1995022045A1 PCT/US1995/001229 US9501229W WO9522045A1 WO 1995022045 A1 WO1995022045 A1 WO 1995022045A1 US 9501229 W US9501229 W US 9501229W WO 9522045 A1 WO9522045 A1 WO 9522045A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas sensor
- light source
- sample chamber
- sensor according
- detector
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 55
- 239000004065 semiconductor Substances 0.000 claims abstract description 28
- 239000000463 material Substances 0.000 claims abstract description 23
- 239000002245 particle Substances 0.000 claims abstract description 11
- 238000012545 processing Methods 0.000 claims abstract description 11
- 238000009792 diffusion process Methods 0.000 claims abstract description 5
- 238000001745 non-dispersive infrared spectroscopy Methods 0.000 claims abstract 33
- 239000000758 substrate Substances 0.000 claims description 81
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 239000010703 silicon Substances 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 8
- 238000002310 reflectometry Methods 0.000 claims description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- ZXEYZECDXFPJRJ-UHFFFAOYSA-N $l^{3}-silane;platinum Chemical compound [SiH3].[Pt] ZXEYZECDXFPJRJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 3
- 229920006362 Teflon® Polymers 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910021339 platinum silicide Inorganic materials 0.000 claims description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 claims description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 7
- 238000000034 method Methods 0.000 abstract description 19
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000000428 dust Substances 0.000 abstract description 4
- 239000000779 smoke Substances 0.000 abstract description 4
- 239000012528 membrane Substances 0.000 abstract description 2
- 238000005459 micromachining Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 136
- 230000005855 radiation Effects 0.000 description 24
- 238000001914 filtration Methods 0.000 description 6
- 238000001465 metallisation Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 230000002452 interceptive effect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001603 reducing effect Effects 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
- G01N21/61—Non-dispersive gas analysers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/0303—Optical path conditioning in cuvettes, e.g. windows; adapted optical elements or systems; path modifying or adjustment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU16965/95A AU1696595A (en) | 1994-02-14 | 1995-01-30 | Improved ndir gas sensor |
KR1019960704435A KR970701341A (en) | 1994-02-14 | 1995-01-30 | IMPROVED NDIR GAS SENSOR |
MX9603406A MX9603406A (en) | 1994-02-14 | 1995-01-30 | Improved ndir gas sensor. |
EP95908745A EP0749573A4 (en) | 1994-02-14 | 1995-01-30 | Improved ndir gas sensor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US19552394A | 1994-02-14 | 1994-02-14 | |
US08/195,523 | 1994-02-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1995022045A1 true WO1995022045A1 (en) | 1995-08-17 |
Family
ID=22721730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1995/001229 WO1995022045A1 (en) | 1994-02-14 | 1995-01-30 | Improved ndir gas sensor |
Country Status (8)
Country | Link |
---|---|
US (1) | US5444249A (en) |
EP (1) | EP0749573A4 (en) |
KR (1) | KR970701341A (en) |
CN (1) | CN1145115A (en) |
AU (1) | AU1696595A (en) |
CA (1) | CA2183259A1 (en) |
MX (1) | MX9603406A (en) |
WO (1) | WO1995022045A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998049540A1 (en) * | 1997-04-30 | 1998-11-05 | Honeywell Inc. | Micromachined opto-flow gas sensor |
WO1999000659A1 (en) * | 1997-06-30 | 1999-01-07 | Honeywell Inc. | Micromachined opto-thermal gas sensor |
EP0896216A2 (en) * | 1997-08-04 | 1999-02-10 | Texas Instruments Incorporated | Method and apparatus for infrared sensing of gas |
WO2001050101A1 (en) * | 1999-12-29 | 2001-07-12 | Sensirion Ag | Sensor for determing a substance concentration and a measuring device |
WO2002004926A2 (en) * | 2000-07-11 | 2002-01-17 | Edwards Systems Technology, Inc. | A diffusion-type ndir gas analyzer with fast response time due to convection flow |
WO2002063281A2 (en) * | 2001-01-12 | 2002-08-15 | Edwards Systems Technology, Incorporated | Optical gas sensor based on diffusion |
WO2002077619A2 (en) * | 2001-02-06 | 2002-10-03 | Edwards Systems Technology, Incorporated | Optical gas sensor based on diffusion |
ITMI20092137A1 (en) * | 2009-12-03 | 2011-06-04 | Ribes Ricerche E Formazione S R L | OPTICAL ABSORPTION GAS SENSOR |
US9927360B2 (en) | 2016-08-29 | 2018-03-27 | Apple Inc. | Electronic devices with environmental sensors |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5747808A (en) * | 1994-02-14 | 1998-05-05 | Engelhard Sensor Technologies | NDIR gas sensor |
FI945124A0 (en) * | 1994-10-31 | 1994-10-31 | Valtion Teknillinen | Spektrometer |
US5721430A (en) * | 1995-04-13 | 1998-02-24 | Engelhard Sensor Technologies Inc. | Passive and active infrared analysis gas sensors and applicable multichannel detector assembles |
US7119337B1 (en) | 1997-08-04 | 2006-10-10 | Ion Optics, Inc. | Infrared radiation sources, sensors and source combinations, and methods of manufacture |
US5886348A (en) * | 1997-02-14 | 1999-03-23 | American Intell-Sensors Corporation | Non-dispersive infrared gas analyzer with interfering gas correction |
US5892140A (en) * | 1997-04-30 | 1999-04-06 | Honeywell Inc. | Micromachined inferential opto-thermal gas sensor |
US6138674A (en) * | 1997-10-16 | 2000-10-31 | Datex-Ohmeda, Inc. | Active temperature and humidity compensator for anesthesia monitoring systems |
US6155160A (en) * | 1998-06-04 | 2000-12-05 | Hochbrueckner; Kenneth | Propane detector system |
US6102085A (en) * | 1998-11-09 | 2000-08-15 | Marconi Commerce Systems, Inc. | Hydrocarbon vapor sensing |
DE19928165A1 (en) | 1999-06-19 | 2000-12-21 | Bosch Gmbh Robert | Ceramic sensor element has chamfered edge giving enhanced resistance to thermal shock |
US6500487B1 (en) * | 1999-10-18 | 2002-12-31 | Advanced Technology Materials, Inc | Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions |
AU2000248069A1 (en) * | 2000-04-28 | 2001-11-12 | Spx Corporation | Co2 gas measurement system for a laboratory incubator |
US6469303B1 (en) | 2000-05-17 | 2002-10-22 | Rae Systems, Inc. | Non-dispersive infrared gas sensor |
DE10203720B4 (en) * | 2001-02-02 | 2012-11-22 | Nippon Telegraph And Telephone Corp. | Blood flow meter and sensor part of the blood flow meter |
AU2003302503A1 (en) * | 2002-12-04 | 2004-06-23 | Honeywell International Inc. | Compact opto-fluidic chemical sensor |
US6843830B2 (en) * | 2003-04-15 | 2005-01-18 | Advanced Technology Materials, Inc. | Abatement system targeting a by-pass effluent stream of a semiconductor process tool |
US7034304B2 (en) | 2003-07-25 | 2006-04-25 | Honeywell International, Inc. | Chamber for gas detector |
US7449694B2 (en) * | 2003-12-12 | 2008-11-11 | Elt Inc. | Gas sensor |
DE102004015439A1 (en) * | 2004-03-30 | 2005-06-23 | Robert Bosch Gmbh | Apparatus for detecting gas (especially carbon dioxide) concentration has a reflector together with a single chip carrying both the radiation source and the receiver |
CN100356162C (en) * | 2004-07-07 | 2007-12-19 | 深圳迈瑞生物医疗电子股份有限公司 | Method and apparatus for measuring gas concentration based on light source modulation |
KR100838255B1 (en) * | 2007-02-02 | 2008-06-17 | 충주대학교 산학협력단 | Ndir gas sensor with self temperature compensation |
DE102007006153A1 (en) * | 2007-02-07 | 2008-08-21 | Tyco Electronics Raychem Gmbh | Optical gas sensor arrangement for use in motor vehicle, has detector device detecting changed radiation intensity in end region of reaction section, and producing output signal in dependence of presence of analyte in reaction path |
US20100192669A1 (en) * | 2007-07-06 | 2010-08-05 | Koninklijke Philips Electronics N.V. | Photo acoustic sample detector with light guide |
ES2465619T3 (en) * | 2007-07-19 | 2014-06-06 | Consejo Superior De Investigaciones Científicas | Interferometer and sensor based on a bimodal optical waveguide and detection procedure |
JP5345333B2 (en) * | 2008-03-31 | 2013-11-20 | Hoya株式会社 | Photomask blank, photomask and manufacturing method thereof |
KR101034647B1 (en) | 2008-09-30 | 2011-05-16 | (주)유우일렉트로닉스 | High sensitive infrared detector for ndir type gas sensor using wafer level packaging and its manufacturing method |
US8097856B2 (en) * | 2009-08-21 | 2012-01-17 | Airware, Inc. | Super-miniaturized NDIR gas sensor |
CN102495002B (en) * | 2011-12-01 | 2013-11-13 | 江苏省环境监测中心 | Ultra-wide infrared band colorimetric ware and preparation method thereof |
TWI497057B (en) | 2012-03-28 | 2015-08-21 | Ind Tech Res Inst | Optical gas sensor |
US8552380B1 (en) * | 2012-05-08 | 2013-10-08 | Cambridge Cmos Sensors Limited | IR detector |
WO2015010709A1 (en) * | 2013-07-22 | 2015-01-29 | Sentec Ag | Sensor for detection of gas and method for detection of gas |
CN104792378B (en) * | 2014-01-17 | 2018-04-06 | 无锡华润上华科技有限公司 | Infrared-gas densimeter, microfluidic sensor, thermo-sensitive resistor structure and its manufacture method |
WO2016060619A1 (en) | 2014-10-16 | 2016-04-21 | Agency For Science, Technology And Research | Optical waveguide structure and optical gas sensor, and methods of fabrication thereof |
US10483316B2 (en) | 2016-01-13 | 2019-11-19 | mPower Technology, Inc. | Fabrication and operation of multi-function flexible radiation detection systems |
DE102016003285A1 (en) * | 2016-03-18 | 2017-09-21 | Dräger Safety AG & Co. KGaA | In situ gas detection system for gas reactors with critical environments |
US10405581B2 (en) | 2016-07-08 | 2019-09-10 | Rai Strategic Holdings, Inc. | Gas sensing for an aerosol delivery device |
WO2018107164A1 (en) | 2016-12-09 | 2018-06-14 | mPower Technology, Inc. | High performance solar cells, arrays and manufacturing processes therefor |
CN110462377A (en) * | 2016-12-09 | 2019-11-15 | 新加坡国立大学 | Gas sensor MEMS structure and its manufacturing method |
GB201700905D0 (en) * | 2017-01-19 | 2017-03-08 | Cascade Tech Holdings Ltd | Close-Coupled Analyser |
US10914848B1 (en) | 2018-07-13 | 2021-02-09 | mPower Technology, Inc. | Fabrication, integration and operation of multi-function radiation detection systems |
US11796445B2 (en) | 2019-05-15 | 2023-10-24 | Analog Devices, Inc. | Optical improvements to compact smoke detectors, systems and apparatus |
US20200378892A1 (en) * | 2019-05-28 | 2020-12-03 | Si-Ware Systems | Integrated device for fluid analysis |
US11747272B2 (en) | 2019-06-10 | 2023-09-05 | Analog Devices, Inc. | Gas detection using differential path length measurement |
US10775560B1 (en) | 2020-07-02 | 2020-09-15 | Scidatek Inc. | Optical sensing and photocatalysis devices based on three-dimensional waveguiding structures and method of using same |
US11821836B2 (en) | 2020-07-13 | 2023-11-21 | Analog Devices, Inc. | Fully compensated optical gas sensing system and apparatus |
CN117147441B (en) * | 2023-07-18 | 2024-04-12 | 镭友芯科技(苏州)有限公司 | Gas detector and preparation method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5163332A (en) * | 1990-04-02 | 1992-11-17 | Gaztech International Corporation | Gas sample chamber |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4578762A (en) * | 1983-07-01 | 1986-03-25 | Tri-Med Inc. | Self-calibrating carbon dioxide analyzer |
US4694173A (en) * | 1985-10-09 | 1987-09-15 | Hibshman Corporation | Nondispersive gas analyzer having no moving parts |
US4709150A (en) * | 1986-03-18 | 1987-11-24 | Burough Irvin G | Method and apparatus for detecting gas |
DE3869237D1 (en) * | 1987-07-07 | 1992-04-23 | Siemens Ag | SENSOR FOR GASES OR IONS. |
US5265470A (en) * | 1987-11-09 | 1993-11-30 | California Institute Of Technology | Tunnel effect measuring systems and particle detectors |
US5255072A (en) * | 1987-12-11 | 1993-10-19 | Horiba, Ltd. | Apparatus for analyzing fluid by multi-fluid modulation mode |
US5268145A (en) * | 1988-09-01 | 1993-12-07 | Tdk Corporation | Chemical substance-sensing element |
DE3937141A1 (en) * | 1989-11-08 | 1991-05-16 | Hartmann & Braun Ag | NON-DISPERSIVE INFRARED GAS ANALYZER FOR SIMULTANEOUS MEASUREMENT OF THE CONCENTRATION OF SEVERAL COMPONENTS OF A GAS SAMPLE |
-
1994
- 1994-08-02 US US08/284,914 patent/US5444249A/en not_active Expired - Fee Related
-
1995
- 1995-01-30 CN CN95192405A patent/CN1145115A/en active Pending
- 1995-01-30 AU AU16965/95A patent/AU1696595A/en not_active Abandoned
- 1995-01-30 EP EP95908745A patent/EP0749573A4/en not_active Ceased
- 1995-01-30 WO PCT/US1995/001229 patent/WO1995022045A1/en active Search and Examination
- 1995-01-30 MX MX9603406A patent/MX9603406A/en unknown
- 1995-01-30 CA CA002183259A patent/CA2183259A1/en not_active Abandoned
- 1995-01-30 KR KR1019960704435A patent/KR970701341A/en not_active Application Discontinuation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5163332A (en) * | 1990-04-02 | 1992-11-17 | Gaztech International Corporation | Gas sample chamber |
Non-Patent Citations (2)
Title |
---|
AIP HANDBOOK OF MODERN SENSORS, PHYSICS, DESIGNS & APPLICATIONS, unknown date, J. FRADEN, Chapter 17, Chemical Sensors, Section 17.6 Optical Sensors, pages 545-546. * |
See also references of EP0749573A4 * |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998049540A1 (en) * | 1997-04-30 | 1998-11-05 | Honeywell Inc. | Micromachined opto-flow gas sensor |
US5869749A (en) * | 1997-04-30 | 1999-02-09 | Honeywell Inc. | Micromachined integrated opto-flow gas/liquid sensor |
WO1999000659A1 (en) * | 1997-06-30 | 1999-01-07 | Honeywell Inc. | Micromachined opto-thermal gas sensor |
EP0896216A2 (en) * | 1997-08-04 | 1999-02-10 | Texas Instruments Incorporated | Method and apparatus for infrared sensing of gas |
EP0896216A3 (en) * | 1997-08-04 | 1999-06-02 | Texas Instruments Incorporated | Method and apparatus for infrared sensing of gas |
US6067840A (en) * | 1997-08-04 | 2000-05-30 | Texas Instruments Incorporated | Method and apparatus for infrared sensing of gas |
US6410918B1 (en) | 1997-10-28 | 2002-06-25 | Edwards Systems Technology, Inc. | Diffusion-type NDIR gas analyzer with improved response time due to convection flow |
WO2001050101A1 (en) * | 1999-12-29 | 2001-07-12 | Sensirion Ag | Sensor for determing a substance concentration and a measuring device |
WO2002004926A3 (en) * | 2000-07-11 | 2002-06-20 | Edwards Systems Technology Inc | A diffusion-type ndir gas analyzer with fast response time due to convection flow |
WO2002004926A2 (en) * | 2000-07-11 | 2002-01-17 | Edwards Systems Technology, Inc. | A diffusion-type ndir gas analyzer with fast response time due to convection flow |
WO2002063281A2 (en) * | 2001-01-12 | 2002-08-15 | Edwards Systems Technology, Incorporated | Optical gas sensor based on diffusion |
WO2002063281A3 (en) * | 2001-01-12 | 2003-03-06 | Edwards Systems Technology Inc | Optical gas sensor based on diffusion |
WO2002077619A2 (en) * | 2001-02-06 | 2002-10-03 | Edwards Systems Technology, Incorporated | Optical gas sensor based on diffusion |
WO2002077619A3 (en) * | 2001-02-06 | 2002-12-12 | Edwards Systems Technology Inc | Optical gas sensor based on diffusion |
ITMI20092137A1 (en) * | 2009-12-03 | 2011-06-04 | Ribes Ricerche E Formazione S R L | OPTICAL ABSORPTION GAS SENSOR |
US9927360B2 (en) | 2016-08-29 | 2018-03-27 | Apple Inc. | Electronic devices with environmental sensors |
Also Published As
Publication number | Publication date |
---|---|
CA2183259A1 (en) | 1995-08-17 |
US5444249A (en) | 1995-08-22 |
KR970701341A (en) | 1997-03-17 |
CN1145115A (en) | 1997-03-12 |
AU1696595A (en) | 1995-08-29 |
MX9603406A (en) | 1997-03-29 |
EP0749573A1 (en) | 1996-12-27 |
EP0749573A4 (en) | 1998-11-18 |
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