WO1998014804A1 - Electrically adjustable optical filter - Google Patents
Electrically adjustable optical filter Download PDFInfo
- Publication number
- WO1998014804A1 WO1998014804A1 PCT/FI1997/000600 FI9700600W WO9814804A1 WO 1998014804 A1 WO1998014804 A1 WO 1998014804A1 FI 9700600 W FI9700600 W FI 9700600W WO 9814804 A1 WO9814804 A1 WO 9814804A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- filter
- optical
- mirror element
- mirror
- silicon
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/284—Interference filters of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates
Definitions
- the present invention relates to an electrically adjustable optical bandpass filter according to the preamble of claim 1.
- the invention is intended for use as an electrically modulatable optical bandpass filter in applications requiring a high contrast ratio or 1-2 adjustable bandwidths.
- Fabry-Perot interferometers are used in optical analysis and modulators as optical bandpass filters.
- Surface micromachining of silicon offers a practicable approach to the manufacture of high-quality interferometer-type filters for the VIS-IR (Visible Infrared) range.
- Interferometers manufactured using this technique are so-called short interferometers, which means that the length of the optical resonator is in the range 1-3 half- wavelengths.
- the bandwidth shape of the filter passband is determined by the reflection coefficients of the mirrors.
- the filter performance can be characterized by the width of its transmittance curve (Full Width at Half Maximum, FWHM) and the contrast ratio of the filter, which is defined as d e ratio of the filter maximum passband transmittance to the filter transmittance just adjacent to the passband.
- FWHM Full Width at Half Maximum
- d e ratio of the filter maximum passband transmittance to the filter transmittance just adjacent to the passband In a silicon-silicon dioxide-silicon three-layer mirror, the bandwidth can be made as small as about 2 % of the passband center wavelength.
- the contrast ratio of the filter is typically about 200-300. Using electrostatic control techniques, a control range of approx. 25 % about the zero-control-voltage wavelength can be obtained.
- Optical bandpass filters are generally implemented as multilayer interference filters lacking any means of controlling the passband.
- controllable filters are of the Fabry-Perot- type, of which the latest versions are implemented by silicon micromechanical techniques. This technology is described in, e.g. , the US Pat. Appl. No. 08/386,773 "An electrically controllable silicon surface micro- mechanical Fabry-Perot interferometer for use in optical material analysis" , filed by the inventors M. Blomberg, M. Orpana and A. Lehto. These devices typically have three-layer mirrors made from alternate layers of polysilicon and silicon dioxide. The optical thickness of the mirror layers are made an odd multiple of a quarterwave ⁇ /4, typically one ⁇ /4. While the filter bandwidth shape may be affected by the number of mirror layers, no significant increase of the filter contrast ratio or division of filter bandwidth into separate bandwidths cannot be attained in this way.
- the present invention is based on constructing an optical bandpass filter by virtue of placing two electrically controllable, surface micromechanically fabricated
- optical filter according to the invention is characterized by what is stated in the characterizing part of claim 1.
- the invention offers significant benefits.
- the arrangement according to the invention permits an increase of the filter con- trast ratio to a level of tens of thousands, even up to hundred thousand, or alternatively, splitting of the filter bandwidth into two separate bandwidths.
- the filter transmittance curve can be made slightly dual-peaked.
- the center mirror is made identical with the outer mirrors, two bandwidths are obtained having a contrast ratio in the order of 10,000 using a silicon-silicon dioxide-silicon mirror structure. This feature facilitates analysis simultaneously at two wavelengths, which is not possible by means of single-bandwidth filter.
- the present filter construction permits separate center wavelength control of the filter passbands.
- Figure 1 shows a longitudinally sectional side view of an optical filter according to the invention
- Figure 2 shows the transmittance curve of a bandpass filter according to the invention having the outer mirrors matched with an air layer
- Figure 3 shows the transmittance curve of a bandpass filter according to the invention having the outer mirrors matched with a silicon dioxide layer
- Figure 4 shows the transmittance curve of a bandpass filter according to the invention having the outer mirrors matched with a silicon nitride layer
- Figure 5 shows the transmittance curve of a bandpass filter according to the invention at three different control voltage levels corresponding to air layer thicknesses 420 nm, 450 nm and 480 nm;
- Figure 6a shows a longitudinally sectional side view of a filter structure according to the invention suited for wavelengths shorter than 1.1 ⁇ m;
- Figure 6b shows a longitudinally sectional side view of a filter structure according to the invention suited for wavelengths longer than 1.1 ⁇ m;
- Figure 7 shows a longitudinally sectional side view of a filter structure according to the invention having the optical matching of the outer mirrors implemented by means of an intermirror air layer;
- Figure 8 shows a top view of a filter according to the invention
- Figure 9 shows a longitudinally sectional side view of a filter structure according to the invention with a common center mirror and the air layer gaps adjusted to 450 nm;
- Figure 10 shows a bandwidth curve of the filter structure of Fig. 9 with the air gaps adjusted to 450 nm.
- the interferometer-type filter structure according to the invention shown therein comprises a first optical resonator 15, 10, 12 formed on a substrate 1 and a second optical resonator 20, 10, 16 located above the first resonator.
- the lowermost element of the filter structure is the silicon substrate 1 having an opening 5 etched at the filter cavity.
- Above the opening 5 is formed a three-layer mirror 15, herein denominated as the first mirror analogously to its manufacturing order.
- the mirror 15 is formed by alternating polysilicon layers 2 and silicon dioxide layers 3.
- a similar mirror 16 is located as the topmost member of the filter structure acting as the third mirror.
- the center element formed by a layered element 17 comprises two identical three-layer mirrors 12 and 20 having a index-matching layer 18 with an optical thickness of ⁇ /4 provided thereinbetween.
- the wavelength ⁇ herein denotes the center wavelength of the filter passband.
- the refractive index of the material used in the matching layer 18 is most advantageously 1 (i.e. , that of air or a vacuum) when a single bandwidth of high contrast ratio is desired. In practice a good result is also obtained by making the matching layer 18 from silicon dioxide having a refractive index of about 1.46.
- the gap of the cavities 10 can be adjusted independently from each other by means of control voltages V, and V 2 applied to conducting areas 13 and 14, whereby the applied voltages impose an electrical force between the center mirror structure 17 and outer mirrors 15 and 16.
- the center mirror structure 17 can be used as a common terminal for the control voltages.
- the outer mirrors 15 and 16 are flexed toward the center mirror 17.
- the required control voltage varies typically from a few volts to a few tens of volts, depending on the rest wavelength determined by the resonator gap and the internal tension of the mirror structures.
- the wavelength adjustment can be accomplished using either DC or AC as the control voltage.
- Fig. 6b under the mirrors is redundant, because at these wavelengths lightly doped silicon is transparent.
- Fig. 2 is shown the bandwidth curve of the interferometer filter illustrated in Fig. 6a when the matching layer 18 has the refractive index made equal to one
- Fig. 3 when the matching layer is of silicon dioxide and in Fig. 4 when the layer is of silicon nitride.
- Fig. 5 is shown the effect of the control voltage on the filter passband center wavelength when the control voltages applied to either interferometer structure are equal.
- the optical matching layer 18 is in both structures made of silicon dioxide.
- Figs. 6a and 6b illustrate in more detail the manufacture of the layered interferometer structure on a silicon substrate.
- the interferometer filter is fabricated by growing alternately polysilicon layers 2 and silicon dioxide layers 3 on a planar substrate 1.
- the substrate 1 may be selected from the group of single-crystal silicon, germanium, a metal oxide or nitride, lithium niobate, glass or any combination compound semiconductor such as GaAs.
- the metal oxide can be, e.g. , aluminium oxide and the metal nitride can be, e.g. , titanium nitride.
- the substrate 1 can be of any material on which the deposition of the mirror layers can be performed and which has optical properties compatible with the specifications of the interferometer filter.
- the opening 5 will be redundant.
- the oxide from the gap 10 between the mirrors of the interferometer filter can be removed via openings 4 using, e.g., hydrofluoric acid as the etchant.
- the walls of the openings 4 may be of polysilicon, for instance.
- the diameter of the mirrors in the interferometer filter is in the order of 1-2 mm, whereby the optical thickness of the mirror layers 2 and 3 is ⁇ /4.
- the openings 4 can have a very small diameter, e.g. , a diameter of a few micrometers will be sufficient.
- the opening 5 is etched in silicon using, e.g. , KOH or TMAH as the etchant, whereby the layer 6, typically made of silicon nitride, acts as the etching barrier.
- the layer 6 typically made of silicon nitride
- the layer 6 is advantageously of silicon dioxide.
- the optical thickness of the antireflective layer 7 is ⁇ /4 for any substrate, and most advantageously the refractive index of the layer is adjusted to be the square root of the substrate refractive index.
- the structure of the interferometer filter will be such as shown in Fig. 7.
- the center mirrors are located tightly adjacent to each other.
- the interferometer filter will have the structure shown in Fig. 8.
- the upper mirror 16 as well as the other mirrors are advantageously made circular, and also the openings 4 are placed about the perimeter of a circle.
- the square areas 20 marked dark indicate contact pad areas for electrical connections.
- the center mirror 17 is typically a combination of two mirrors, it may be made using a smaller number of layers.
- Fig. 9 is shown a structure having the center mirror 17 made identical to the other mirrors.
- Fig. 10 shows a bandwidth curve of two bandwidths corresponding to such a structure.
- the contrast ratio of this structure will be about 10,000 when the interferometer filter is implemented as a silicon-silicon dioxide-silicon mirror construction.
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU44626/97A AU4462697A (en) | 1996-10-03 | 1997-10-03 | Electrically adjustable optical filter |
JP51626898A JP2001525075A (en) | 1996-10-03 | 1997-10-03 | Electrically adjustable optical filters |
EP97942986A EP0929830A1 (en) | 1996-10-03 | 1997-10-03 | Electrically adjustable optical filter |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI963976 | 1996-10-03 | ||
FI963976A FI108581B (en) | 1996-10-03 | 1996-10-03 | Electrically adjustable optical filter |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1998014804A1 true WO1998014804A1 (en) | 1998-04-09 |
Family
ID=8546805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FI1997/000600 WO1998014804A1 (en) | 1996-10-03 | 1997-10-03 | Electrically adjustable optical filter |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0929830A1 (en) |
JP (1) | JP2001525075A (en) |
AU (1) | AU4462697A (en) |
FI (1) | FI108581B (en) |
WO (1) | WO1998014804A1 (en) |
Cited By (32)
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ES2119712A1 (en) * | 1996-12-17 | 1998-10-01 | Consejo Superior Investigacion | Procedure and microfabricated optical device for detecting absorption/emission bands in the infrared. |
WO1999067692A1 (en) * | 1998-06-24 | 1999-12-29 | Valtion Teknillinen Tutkimuskeskus | Method and system for electrically controlling the spacing between micromechanical electrodes |
JP2002350751A (en) * | 2001-05-30 | 2002-12-04 | Sony Corp | Optical multi-layer structure and its manufacturing method, optical switching element, and image display device |
WO2003001251A1 (en) * | 2001-06-25 | 2003-01-03 | Massachusetts Institute Of Technology | Air gaps for optical applications |
JP2003075733A (en) * | 2001-09-05 | 2003-03-12 | Sony Corp | Thin film optical device |
WO2003056367A1 (en) * | 2001-12-21 | 2003-07-10 | Nokia Corporation | Reflective flat panel display |
CN101228093A (en) * | 2005-07-22 | 2008-07-23 | 高通股份有限公司 | MEMS devices having support structures and methods of fabricating the same |
EP1364190B1 (en) * | 2001-02-05 | 2008-09-17 | Centre National De La Recherche Scientifique | Optoelectronic device with wavelength filtering by cavity coupling |
DE102008040613A1 (en) | 2007-07-23 | 2009-01-29 | Carl Zeiss Smt Ag | Optical system of a microlithographic projection exposure apparatus |
DE102008045504A1 (en) | 2008-09-03 | 2010-03-04 | Gottfried Wilhelm Leibniz Universität Hannover | Optical sensor for scanning images comprises a photoelectric image scanning sensor unit with semiconductor layers impinged with a variably adjusted blocking voltage |
US7957004B2 (en) | 2005-04-15 | 2011-06-07 | Sinvent As | Interference filter |
US8693084B2 (en) | 2008-03-07 | 2014-04-08 | Qualcomm Mems Technologies, Inc. | Interferometric modulator in transmission mode |
US8736939B2 (en) | 2011-11-04 | 2014-05-27 | Qualcomm Mems Technologies, Inc. | Matching layer thin-films for an electromechanical systems reflective display device |
US8885244B2 (en) | 2004-09-27 | 2014-11-11 | Qualcomm Mems Technologies, Inc. | Display device |
US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
US8941631B2 (en) | 2007-11-16 | 2015-01-27 | Qualcomm Mems Technologies, Inc. | Simultaneous light collection and illumination on an active display |
US8964280B2 (en) | 2006-06-30 | 2015-02-24 | Qualcomm Mems Technologies, Inc. | Method of manufacturing MEMS devices providing air gap control |
US8963159B2 (en) | 2011-04-04 | 2015-02-24 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
US8970939B2 (en) | 2004-09-27 | 2015-03-03 | Qualcomm Mems Technologies, Inc. | Method and device for multistate interferometric light modulation |
US8971675B2 (en) | 2006-01-13 | 2015-03-03 | Qualcomm Mems Technologies, Inc. | Interconnect structure for MEMS device |
US8979349B2 (en) | 2009-05-29 | 2015-03-17 | Qualcomm Mems Technologies, Inc. | Illumination devices and methods of fabrication thereof |
US8995043B2 (en) | 2011-11-29 | 2015-03-31 | Qualcomm Mems Technologies, Inc. | Interferometric modulator with dual absorbing layers |
US9001412B2 (en) | 2004-09-27 | 2015-04-07 | Qualcomm Mems Technologies, Inc. | Electromechanical device with optical function separated from mechanical and electrical function |
US9041751B2 (en) | 2012-11-01 | 2015-05-26 | Qualcomm Mems Technologies, Inc. | Electromechanical systems display device including a movable absorber and a movable reflector assembly |
CN104656176A (en) * | 2013-11-19 | 2015-05-27 | 精工爱普生株式会社 | Optical filter device, optical module and electronic device |
US9057872B2 (en) | 2010-08-31 | 2015-06-16 | Qualcomm Mems Technologies, Inc. | Dielectric enhanced mirror for IMOD display |
US9086564B2 (en) | 2004-09-27 | 2015-07-21 | Qualcomm Mems Technologies, Inc. | Conductive bus structure for interferometric modulator array |
US9097885B2 (en) | 2004-09-27 | 2015-08-04 | Qualcomm Mems Technologies, Inc. | Device having a conductive light absorbing mask and method for fabricating same |
US9110289B2 (en) | 1998-04-08 | 2015-08-18 | Qualcomm Mems Technologies, Inc. | Device for modulating light with multiple electrodes |
US9134527B2 (en) | 2011-04-04 | 2015-09-15 | Qualcomm Mems Technologies, Inc. | Pixel via and methods of forming the same |
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Citations (2)
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US5345328A (en) * | 1992-08-12 | 1994-09-06 | Sandia Corporation | Tandem resonator reflectance modulator |
US5561523A (en) * | 1994-02-17 | 1996-10-01 | Vaisala Oy | Electrically tunable fabry-perot interferometer produced by surface micromechanical techniques for use in optical material analysis |
-
1996
- 1996-10-03 FI FI963976A patent/FI108581B/en active
-
1997
- 1997-10-03 EP EP97942986A patent/EP0929830A1/en not_active Withdrawn
- 1997-10-03 JP JP51626898A patent/JP2001525075A/en active Pending
- 1997-10-03 AU AU44626/97A patent/AU4462697A/en not_active Abandoned
- 1997-10-03 WO PCT/FI1997/000600 patent/WO1998014804A1/en not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US5345328A (en) * | 1992-08-12 | 1994-09-06 | Sandia Corporation | Tandem resonator reflectance modulator |
US5561523A (en) * | 1994-02-17 | 1996-10-01 | Vaisala Oy | Electrically tunable fabry-perot interferometer produced by surface micromechanical techniques for use in optical material analysis |
Non-Patent Citations (1)
Title |
---|
TECHNICAL DISCLOSURE BULLETIN, Volume 14, No. 8, January 1972, D. GRISCHKOWSKY et al., "Double Fabry-Perot Filter". * |
Cited By (44)
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ES2119712A1 (en) * | 1996-12-17 | 1998-10-01 | Consejo Superior Investigacion | Procedure and microfabricated optical device for detecting absorption/emission bands in the infrared. |
US9110289B2 (en) | 1998-04-08 | 2015-08-18 | Qualcomm Mems Technologies, Inc. | Device for modulating light with multiple electrodes |
US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
WO1999067692A1 (en) * | 1998-06-24 | 1999-12-29 | Valtion Teknillinen Tutkimuskeskus | Method and system for electrically controlling the spacing between micromechanical electrodes |
US6630657B1 (en) | 1998-06-24 | 2003-10-07 | Valtion Teknillinen Tutkimuskeskus | Method and system for electrically controlling the spacing between micromechanical electrodes |
EP1364190B1 (en) * | 2001-02-05 | 2008-09-17 | Centre National De La Recherche Scientifique | Optoelectronic device with wavelength filtering by cavity coupling |
JP2002350751A (en) * | 2001-05-30 | 2002-12-04 | Sony Corp | Optical multi-layer structure and its manufacturing method, optical switching element, and image display device |
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US7227678B2 (en) | 2001-06-25 | 2007-06-05 | Massachusetts Institute Of Technology | Air gaps for optical applications |
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CN107240647B (en) * | 2017-06-05 | 2018-10-23 | 京东方科技集团股份有限公司 | A kind of organic light emitting diode device, lamps and lanterns |
Also Published As
Publication number | Publication date |
---|---|
AU4462697A (en) | 1998-04-24 |
FI963976A (en) | 1998-04-04 |
JP2001525075A (en) | 2001-12-04 |
FI963976A0 (en) | 1996-10-03 |
FI108581B (en) | 2002-02-15 |
EP0929830A1 (en) | 1999-07-21 |
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