WO1998034092A3 - Object inspection and/or modification system and method - Google Patents

Object inspection and/or modification system and method Download PDF

Info

Publication number
WO1998034092A3
WO1998034092A3 PCT/US1998/001528 US9801528W WO9834092A3 WO 1998034092 A3 WO1998034092 A3 WO 1998034092A3 US 9801528 W US9801528 W US 9801528W WO 9834092 A3 WO9834092 A3 WO 9834092A3
Authority
WO
WIPO (PCT)
Prior art keywords
modifications
spm probe
spm
positioning
lithography
Prior art date
Application number
PCT/US1998/001528
Other languages
French (fr)
Other versions
WO1998034092A2 (en
Inventor
Victor B Kley
Original Assignee
Rave L L C
Victor B Kley
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US09/355,072 priority Critical patent/US6337479B1/en
Priority to EP98904705A priority patent/EP1012584A4/en
Priority to AU62508/98A priority patent/AU6250898A/en
Application filed by Rave L L C, Victor B Kley filed Critical Rave L L C
Publication of WO1998034092A2 publication Critical patent/WO1998034092A2/en
Publication of WO1998034092A3 publication Critical patent/WO1998034092A3/en
Priority to US10/616,453 priority patent/US7045780B2/en
Priority to US11/411,985 priority patent/US7485856B2/en
Priority to US11/894,592 priority patent/US20080202221A1/en
Priority to US11/841,698 priority patent/US8499621B2/en
Priority to US12/214,573 priority patent/US20080315092A1/en
Priority to US12/779,879 priority patent/US20110126328A1/en
Priority to US13/912,169 priority patent/US20140051333A1/en
Priority to US14/446,365 priority patent/US20150168445A1/en
Priority to US14/918,307 priority patent/US10610995B2/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/16—Probe manufacture
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/08—Means for establishing or regulating a desired environmental condition within a sample chamber
    • G01Q30/16—Vacuum environment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q40/00—Calibration, e.g. of probes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q40/00—Calibration, e.g. of probes
    • G01Q40/02—Calibration standards and methods of fabrication thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/02—Multiple-type SPM, i.e. involving more than one SPM techniques
    • G01Q60/06—SNOM [Scanning Near-field Optical Microscopy] combined with AFM [Atomic Force Microscopy]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/02—Probe holders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/06—Probe tip arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2049—Exposure; Apparatus therefor using a cantilever
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00—Applications, other than SPM, of scanning-probe techniques
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23—Gap features
    • G11B5/232—Manufacture of gap
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed

Abstract

A system for the measurement, analysis, removal, addition or imaging of material uses nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Such nanostructures and techniques are combined in a system that can modify bulk or large area objects such as silicone waffers and masks for lithography. An SPM system (100) for making modifications to an object (102) comprises an SPM probe for making the modifications to the object, a positioning system (103) for positioning the SPM probe with respect to the object, and a controller for controlling the positioning system such that the modifications of the object are made with the SPM probe particulate matter is removed from the object by the modifications, and the SPM probe makes sweeping motions over the object to sweep away the removed particulate material.g these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography.
PCT/US1998/001528 1994-07-28 1998-01-21 Object inspection and/or modification system and method WO1998034092A2 (en)

Priority Applications (12)

Application Number Priority Date Filing Date Title
US09/355,072 US6337479B1 (en) 1994-07-28 1998-01-21 Object inspection and/or modification system and method
EP98904705A EP1012584A4 (en) 1997-01-21 1998-01-21 Object inspection and/or modification system and method
AU62508/98A AU6250898A (en) 1997-01-21 1998-01-21 Object inspection and/or modification system and method
US10/616,453 US7045780B2 (en) 1994-07-28 2003-07-08 Scanning probe microscopy inspection and modification system
US11/411,985 US7485856B2 (en) 1994-07-28 2006-04-25 Scanning probe microscopy inspection and modification system
US11/894,592 US20080202221A1 (en) 1994-07-28 2007-08-20 Methods and apparatus for nanolapping
US11/841,698 US8499621B2 (en) 1994-07-28 2007-08-20 Scanning probe microscopy inspection and modification system
US12/214,573 US20080315092A1 (en) 1994-07-28 2008-06-19 Scanning probe microscopy inspection and modification system
US12/779,879 US20110126328A1 (en) 1994-07-28 2010-05-13 Methods and Apparatus for Nanolapping
US13/912,169 US20140051333A1 (en) 1998-01-21 2013-06-06 Methods and apparatus for nanolapping
US14/446,365 US20150168445A1 (en) 1994-07-28 2014-07-30 Scanning probe microscopy inspection and modification system
US14/918,307 US10610995B2 (en) 1998-01-21 2015-10-20 Method and apparatus for nanolapping

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US78662397A 1997-01-21 1997-01-21
US08/786,623 1997-01-21
US82795397A 1997-04-06 1997-04-06
US08/827,953 1997-04-06

Related Parent Applications (10)

Application Number Title Priority Date Filing Date
US08/506,516 Continuation-In-Part US5751683A (en) 1994-07-28 1995-07-24 Nanometer scale data storage device and associated positioning system
US08776361 Continuation-In-Part 1995-07-28
US08/776,361 Continuation-In-Part US6339217B1 (en) 1994-07-28 1995-07-28 Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements
PCT/US1995/009553 Continuation-In-Part WO1996003641A1 (en) 1994-07-28 1995-07-28 Scanning probe microscope assembly
US08/613,982 Continuation-In-Part US5756997A (en) 1994-07-28 1996-03-04 Scanning probe/optical microscope with modular objective/probe and drive/detector units
PCT/US1996/012255 Continuation-In-Part WO1997004449A1 (en) 1994-07-28 1996-07-24 Nanometer scale data storage device and associated positioning system
US08/906,602 Continuation-In-Part US6265711B1 (en) 1994-07-28 1996-12-10 Scanning probe microscope assembly and method for making spectrophotometric near-field optical and scanning measurements
US78662397A Continuation-In-Part 1994-07-28 1997-01-21
US82795397A Continuation-In-Part 1994-07-28 1997-04-06
US08/885,014 Continuation-In-Part US6144028A (en) 1994-07-28 1997-07-01 Scanning probe microscope assembly and method for making confocal, spectrophotometric, Near-Field, and Scanning probe measurements and associated images

Related Child Applications (4)

Application Number Title Priority Date Filing Date
US09/355,072 A-371-Of-International US6337479B1 (en) 1994-07-28 1998-01-21 Object inspection and/or modification system and method
US09355072 A-371-Of-International 1998-01-21
US09/441,033 Continuation US6353219B1 (en) 1994-07-28 1999-11-16 Object inspection and/or modification system and method
US09/919,780 Continuation US6861648B2 (en) 1994-07-28 2001-07-31 Scanning probe microscopy inspection and modification system

Publications (2)

Publication Number Publication Date
WO1998034092A2 WO1998034092A2 (en) 1998-08-06
WO1998034092A3 true WO1998034092A3 (en) 1998-11-05

Family

ID=27120558

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1998/001528 WO1998034092A2 (en) 1994-07-28 1998-01-21 Object inspection and/or modification system and method

Country Status (3)

Country Link
EP (1) EP1012584A4 (en)
AU (1) AU6250898A (en)
WO (1) WO1998034092A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080202221A1 (en) * 1994-07-28 2008-08-28 General Nanotechnology Llc Methods and apparatus for nanolapping
US6337479B1 (en) 1994-07-28 2002-01-08 Victor B. Kley Object inspection and/or modification system and method
US6787768B1 (en) 2001-03-08 2004-09-07 General Nanotechnology Llc Method and apparatus for tool and tip design for nanomachining and measurement
US6802646B1 (en) 2001-04-30 2004-10-12 General Nanotechnology Llc Low-friction moving interfaces in micromachines and nanomachines
US7196328B1 (en) 2001-03-08 2007-03-27 General Nanotechnology Llc Nanomachining method and apparatus
US6752008B1 (en) 2001-03-08 2004-06-22 General Nanotechnology Llc Method and apparatus for scanning in scanning probe microscopy and presenting results
US7170842B2 (en) 2001-02-15 2007-01-30 Hewlett-Packard Development Company, L.P. Methods for conducting current between a scanned-probe and storage medium
JP2005538855A (en) * 2002-09-09 2005-12-22 ジェネラル ナノテクノロジー エルエルシー Fluid delivery of a scanning probe microscope
CN1726431A (en) 2002-10-21 2006-01-25 纳米墨水公司 Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications
US7198961B2 (en) 2004-03-30 2007-04-03 Matsushita Electric Industrial Co., Ltd. Method for modifying existing micro-and nano-structures using a near-field scanning optical microscope
US8310682B2 (en) 2008-03-20 2012-11-13 University Of Utah Research Foundation Apparatus, system and methods for analyzing pressure-sensitive devices
RU2617542C1 (en) * 2016-02-20 2017-04-25 Общество с ограниченной ответственностью "СНОТРА" Scanning device for local exposure
CN109187595B (en) * 2018-09-27 2021-05-11 南京宁智高新材料研究院有限公司 Device for measuring local equivalent pressure caused by micro gas beams in transmission electron microscope

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JP3054900B2 (en) * 1993-03-10 2000-06-19 セイコーインスツルメンツ株式会社 Micro processing equipment
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US4907195A (en) * 1984-09-14 1990-03-06 Xerox Corporation Method of and system for atomic scale recording of information
US5414690A (en) * 1991-01-29 1995-05-09 Canon Kabushiki Kaisha Moving apparatus, a moving method and an information detection and/or input apparatus using the same
US5472881A (en) * 1992-11-12 1995-12-05 University Of Utah Research Foundation Thiol labeling of DNA for attachment to gold surfaces

Non-Patent Citations (1)

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Title
See also references of EP1012584A4 *

Also Published As

Publication number Publication date
WO1998034092A2 (en) 1998-08-06
EP1012584A4 (en) 2006-10-04
AU6250898A (en) 1998-08-25
EP1012584A2 (en) 2000-06-28

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