WO1998058731A3 - Apparatus for exposing substrates to gas-phase radicals - Google Patents
Apparatus for exposing substrates to gas-phase radicals Download PDFInfo
- Publication number
- WO1998058731A3 WO1998058731A3 PCT/US1998/012170 US9812170W WO9858731A3 WO 1998058731 A3 WO1998058731 A3 WO 1998058731A3 US 9812170 W US9812170 W US 9812170W WO 9858731 A3 WO9858731 A3 WO 9858731A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gas
- substrates
- flow
- phase radicals
- radicals
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 20
- 230000004888 barrier function Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- 238000007306 functionalization reaction Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0866—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
- B29C2035/0872—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using ion-radiation, e.g. alpha-rays
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU81412/98A AU8141298A (en) | 1997-06-20 | 1998-06-22 | Apparatus for exposing substrates to gas-phase radicals |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87940497A | 1997-06-20 | 1997-06-20 | |
US08/879,404 | 1997-06-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1998058731A2 WO1998058731A2 (en) | 1998-12-30 |
WO1998058731A3 true WO1998058731A3 (en) | 1999-05-27 |
Family
ID=25374089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1998/012170 WO1998058731A2 (en) | 1997-06-20 | 1998-06-22 | Apparatus for exposing substrates to gas-phase radicals |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU8141298A (en) |
WO (1) | WO1998058731A2 (en) |
Citations (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4192706A (en) * | 1975-01-22 | 1980-03-11 | Tokyo Shibaura Electric Co., Ltd. | Gas-etching device |
JPS56147832A (en) * | 1980-04-16 | 1981-11-17 | Toshiba Corp | Surface treating device |
JPS5712032A (en) * | 1980-06-26 | 1982-01-21 | Sekisui Chem Co Ltd | Apparatus for treatment with activated gas |
JPS5840833A (en) * | 1981-09-04 | 1983-03-09 | Toshiba Corp | Nitride film production device |
US4397885A (en) * | 1980-08-22 | 1983-08-09 | Tokyo Shibaura Denki Kabushiki Kaisha | Method and apparatus for treating fluorescent substance |
US4401054A (en) * | 1980-05-02 | 1983-08-30 | Nippon Telegraph & Telephone Public Corporation | Plasma deposition apparatus |
JPS58208326A (en) * | 1982-05-31 | 1983-12-05 | Hashimoto Forming Co Ltd | Plasma treatment |
US4451499A (en) * | 1979-07-24 | 1984-05-29 | Futaba Denshi Kogyo Kabushiki Kaisha | Method for producing a beryllium oxide film |
EP0117541A2 (en) * | 1983-02-25 | 1984-09-05 | Toyota Jidosha Kabushiki Kaisha | Apparatus for plasma treatment of resin material |
EP0127149A2 (en) * | 1983-05-31 | 1984-12-05 | Idemitsu Petrochemical Co. Ltd. | A method for the treatment of a thermoplastic resin |
JPS6115976A (en) * | 1984-07-03 | 1986-01-24 | Matsushita Electric Ind Co Ltd | Plasma reaction device and method for use thereof |
US4579618A (en) * | 1984-01-06 | 1986-04-01 | Tegal Corporation | Plasma reactor apparatus |
JPS61281132A (en) * | 1985-06-05 | 1986-12-11 | Mazda Motor Corp | Plasma treating apparatus |
US4738748A (en) * | 1983-09-30 | 1988-04-19 | Fujitsu Limited | Plasma processor and method for IC fabrication |
US4831963A (en) * | 1986-02-04 | 1989-05-23 | Hitachi, Ltd. | Plasma processing apparatus |
JPH01236938A (en) * | 1988-03-17 | 1989-09-21 | Nissin Electric Co Ltd | Plasma generator |
JPH01279747A (en) * | 1988-05-06 | 1989-11-10 | Tobi Co Ltd | Device for forming film by plasma beam |
EP0606014A1 (en) * | 1992-12-28 | 1994-07-13 | Bridgestone Corporation | Surface treating method |
US5369012A (en) * | 1992-03-26 | 1994-11-29 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of making a membrane having hydrophilic and hydrophobic surfaces for adhering cells or antibodies by using atomic oxygen or hydroxyl radicals |
EP0630087A2 (en) * | 1993-06-18 | 1994-12-21 | Fuji Photo Film Co., Ltd. | Apparatus for allowing web-like material to be subjected to vacuum glow-discharging treatment and method of conducting vacuum glow-discharging treatment |
US5614026A (en) * | 1996-03-29 | 1997-03-25 | Lam Research Corporation | Showerhead for uniform distribution of process gas |
-
1998
- 1998-06-22 WO PCT/US1998/012170 patent/WO1998058731A2/en active Application Filing
- 1998-06-22 AU AU81412/98A patent/AU8141298A/en not_active Abandoned
Patent Citations (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4192706A (en) * | 1975-01-22 | 1980-03-11 | Tokyo Shibaura Electric Co., Ltd. | Gas-etching device |
US4451499A (en) * | 1979-07-24 | 1984-05-29 | Futaba Denshi Kogyo Kabushiki Kaisha | Method for producing a beryllium oxide film |
JPS56147832A (en) * | 1980-04-16 | 1981-11-17 | Toshiba Corp | Surface treating device |
US4401054A (en) * | 1980-05-02 | 1983-08-30 | Nippon Telegraph & Telephone Public Corporation | Plasma deposition apparatus |
JPS5712032A (en) * | 1980-06-26 | 1982-01-21 | Sekisui Chem Co Ltd | Apparatus for treatment with activated gas |
US4397885A (en) * | 1980-08-22 | 1983-08-09 | Tokyo Shibaura Denki Kabushiki Kaisha | Method and apparatus for treating fluorescent substance |
JPS5840833A (en) * | 1981-09-04 | 1983-03-09 | Toshiba Corp | Nitride film production device |
JPS58208326A (en) * | 1982-05-31 | 1983-12-05 | Hashimoto Forming Co Ltd | Plasma treatment |
EP0117541A2 (en) * | 1983-02-25 | 1984-09-05 | Toyota Jidosha Kabushiki Kaisha | Apparatus for plasma treatment of resin material |
EP0127149A2 (en) * | 1983-05-31 | 1984-12-05 | Idemitsu Petrochemical Co. Ltd. | A method for the treatment of a thermoplastic resin |
US4738748A (en) * | 1983-09-30 | 1988-04-19 | Fujitsu Limited | Plasma processor and method for IC fabrication |
US4579618A (en) * | 1984-01-06 | 1986-04-01 | Tegal Corporation | Plasma reactor apparatus |
JPS6115976A (en) * | 1984-07-03 | 1986-01-24 | Matsushita Electric Ind Co Ltd | Plasma reaction device and method for use thereof |
JPS61281132A (en) * | 1985-06-05 | 1986-12-11 | Mazda Motor Corp | Plasma treating apparatus |
US4831963A (en) * | 1986-02-04 | 1989-05-23 | Hitachi, Ltd. | Plasma processing apparatus |
JPH01236938A (en) * | 1988-03-17 | 1989-09-21 | Nissin Electric Co Ltd | Plasma generator |
JPH01279747A (en) * | 1988-05-06 | 1989-11-10 | Tobi Co Ltd | Device for forming film by plasma beam |
US5369012A (en) * | 1992-03-26 | 1994-11-29 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of making a membrane having hydrophilic and hydrophobic surfaces for adhering cells or antibodies by using atomic oxygen or hydroxyl radicals |
EP0606014A1 (en) * | 1992-12-28 | 1994-07-13 | Bridgestone Corporation | Surface treating method |
EP0630087A2 (en) * | 1993-06-18 | 1994-12-21 | Fuji Photo Film Co., Ltd. | Apparatus for allowing web-like material to be subjected to vacuum glow-discharging treatment and method of conducting vacuum glow-discharging treatment |
US5614026A (en) * | 1996-03-29 | 1997-03-25 | Lam Research Corporation | Showerhead for uniform distribution of process gas |
Non-Patent Citations (8)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 006, no. 031 (C - 092) 24 February 1982 (1982-02-24) * |
PATENT ABSTRACTS OF JAPAN vol. 006, no. 073 (C - 101) 8 May 1982 (1982-05-08) * |
PATENT ABSTRACTS OF JAPAN vol. 007, no. 123 (E - 178) 27 May 1983 (1983-05-27) * |
PATENT ABSTRACTS OF JAPAN vol. 008, no. 052 (C - 213) 9 March 1984 (1984-03-09) * |
PATENT ABSTRACTS OF JAPAN vol. 010, no. 161 (C - 352) 10 June 1986 (1986-06-10) * |
PATENT ABSTRACTS OF JAPAN vol. 011, no. 141 (C - 421) 8 May 1987 (1987-05-08) * |
PATENT ABSTRACTS OF JAPAN vol. 013, no. 569 (C - 666) 15 December 1989 (1989-12-15) * |
PATENT ABSTRACTS OF JAPAN vol. 014, no. 047 (C - 0682) 29 January 1990 (1990-01-29) * |
Also Published As
Publication number | Publication date |
---|---|
AU8141298A (en) | 1999-01-04 |
WO1998058731A2 (en) | 1998-12-30 |
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