WO1999042902A3 - Reflective optical imaging systems with balanced distortion - Google Patents

Reflective optical imaging systems with balanced distortion Download PDF

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Publication number
WO1999042902A3
WO1999042902A3 PCT/US1999/003767 US9903767W WO9942902A3 WO 1999042902 A3 WO1999042902 A3 WO 1999042902A3 US 9903767 W US9903767 W US 9903767W WO 9942902 A3 WO9942902 A3 WO 9942902A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical systems
distortion
convex
optical imaging
imaging systems
Prior art date
Application number
PCT/US1999/003767
Other languages
French (fr)
Other versions
WO1999042902A2 (en
Inventor
Henry N Chapman
Russell M Hudyma
David R Shafer
Donald W Sweeney
Original Assignee
Univ California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/027,281 external-priority patent/US5973826A/en
Priority claimed from US09/094,420 external-priority patent/US6226346B1/en
Application filed by Univ California filed Critical Univ California
Priority to AU41803/99A priority Critical patent/AU4180399A/en
Publication of WO1999042902A2 publication Critical patent/WO1999042902A2/en
Publication of WO1999042902A3 publication Critical patent/WO1999042902A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Abstract

Optical systems compatible with extreme ultraviolet radiation (501) comprising four reflective elements (505, 509, 513, 517) for projecting a mask image onto a substrate are described. The four optical elements comprise, in order from object (503) to image (521), convex, concave, convex and concave mirrors. The optical systems are particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput, and allows higher semiconductor device density. The inventive optical systems are characterized be reduced dynamic distortion because the static distortion is balanced across the slit width.
PCT/US1999/003767 1998-02-20 1999-02-19 Reflective optical imaging systems with balanced distortion WO1999042902A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU41803/99A AU4180399A (en) 1998-02-20 1999-02-19 Reflective optical imaging systems with balanced distortion

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/027,281 1998-02-20
US09/027,281 US5973826A (en) 1998-02-20 1998-02-20 Reflective optical imaging system with balanced distortion
US09/094,420 1998-06-09
US09/094,420 US6226346B1 (en) 1998-06-09 1998-06-09 Reflective optical imaging systems with balanced distortion

Publications (2)

Publication Number Publication Date
WO1999042902A2 WO1999042902A2 (en) 1999-08-26
WO1999042902A3 true WO1999042902A3 (en) 1999-10-14

Family

ID=26702270

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/003767 WO1999042902A2 (en) 1998-02-20 1999-02-19 Reflective optical imaging systems with balanced distortion

Country Status (2)

Country Link
AU (1) AU4180399A (en)
WO (1) WO1999042902A2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1930771A1 (en) 2006-12-04 2008-06-11 Carl Zeiss SMT AG Projection objectives having mirror elements with reflective coatings
DE102009047179B8 (en) 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh projection lens
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
CN113050362A (en) * 2019-12-27 2021-06-29 中芯国际集成电路制造(上海)有限公司 Optical proximity correction method and mask

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5257139A (en) * 1991-05-09 1993-10-26 Nikon Corporation Reflection reduction projection optical system
US5315629A (en) * 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5353322A (en) * 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5315629A (en) * 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5257139A (en) * 1991-05-09 1993-10-26 Nikon Corporation Reflection reduction projection optical system
US5353322A (en) * 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature

Also Published As

Publication number Publication date
WO1999042902A2 (en) 1999-08-26
AU4180399A (en) 1999-09-06

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