WO2000067074A1 - Streamlined ic mask layout optical and process correction through correction reuse - Google Patents
Streamlined ic mask layout optical and process correction through correction reuse Download PDFInfo
- Publication number
- WO2000067074A1 WO2000067074A1 PCT/US2000/005658 US0005658W WO0067074A1 WO 2000067074 A1 WO2000067074 A1 WO 2000067074A1 US 0005658 W US0005658 W US 0005658W WO 0067074 A1 WO0067074 A1 WO 0067074A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- area
- opc
- computer system
- programming instructions
- model
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
- G03F7/70441—Optical proximity correction [OPC]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU37222/00A AU3722200A (en) | 1999-04-30 | 2000-03-03 | Streamlined ic mask layout optical and process correction through correction reuse |
EP00916058A EP1177479B1 (en) | 1999-04-30 | 2000-03-03 | Streamlined ic mask layout optical and process correction through correction reuse |
JP2000615853A JP3343246B1 (en) | 1999-04-30 | 2000-03-03 | Optical process correction of rational IC mask layout by reuse of correction |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/302,561 US6301697B1 (en) | 1999-04-30 | 1999-04-30 | Streamlined IC mask layout optical and process correction through correction reuse |
US09/302,561 | 1999-04-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2000067074A1 true WO2000067074A1 (en) | 2000-11-09 |
WO2000067074A9 WO2000067074A9 (en) | 2002-06-20 |
Family
ID=23168275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2000/005658 WO2000067074A1 (en) | 1999-04-30 | 2000-03-03 | Streamlined ic mask layout optical and process correction through correction reuse |
Country Status (5)
Country | Link |
---|---|
US (3) | US6301697B1 (en) |
EP (1) | EP1177479B1 (en) |
JP (1) | JP3343246B1 (en) |
AU (1) | AU3722200A (en) |
WO (1) | WO2000067074A1 (en) |
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US6370679B1 (en) | 1997-09-17 | 2002-04-09 | Numerical Technologies, Inc. | Data hierarchy layout correction and verification method and apparatus |
US6453457B1 (en) | 2000-09-29 | 2002-09-17 | Numerical Technologies, Inc. | Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout |
US6453452B1 (en) | 1997-12-12 | 2002-09-17 | Numerical Technologies, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
US6470489B1 (en) | 1997-09-17 | 2002-10-22 | Numerical Technologies, Inc. | Design rule checking system and method |
US6539521B1 (en) | 2000-09-29 | 2003-03-25 | Numerical Technologies, Inc. | Dissection of corners in a fabrication layout for correcting proximity effects |
US6560766B2 (en) | 2001-07-26 | 2003-05-06 | Numerical Technologies, Inc. | Method and apparatus for analyzing a layout using an instance-based representation |
US6578188B1 (en) | 1997-09-17 | 2003-06-10 | Numerical Technologies, Inc. | Method and apparatus for a network-based mask defect printability analysis system |
US6584609B1 (en) | 2000-02-28 | 2003-06-24 | Numerical Technologies, Inc. | Method and apparatus for mixed-mode optical proximity correction |
US6625801B1 (en) | 2000-09-29 | 2003-09-23 | Numerical Technologies, Inc. | Dissection of printed edges from a fabrication layout for correcting proximity effects |
US6665856B1 (en) | 2000-12-01 | 2003-12-16 | Numerical Technologies, Inc. | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
US6670082B2 (en) | 2001-10-09 | 2003-12-30 | Numerical Technologies, Inc. | System and method for correcting 3D effects in an alternating phase-shifting mask |
DE10230532A1 (en) * | 2002-07-05 | 2004-01-29 | Infineon Technologies Ag | Method for determining the structure of a mask for microstructuring semiconductor substrates by means of photolithography |
US6687895B2 (en) | 2002-07-03 | 2004-02-03 | Numerical Technologies Inc. | Method and apparatus for reducing optical proximity correction output file size |
US6753115B2 (en) | 2001-12-20 | 2004-06-22 | Numerical Technologies, Inc. | Facilitating minimum spacing and/or width control optical proximity correction |
JP2004177944A (en) * | 2002-11-27 | 2004-06-24 | Lsi Logic Corp | Primary approximation system for speeding up of optical proximity correction |
US6757645B2 (en) | 1997-09-17 | 2004-06-29 | Numerical Technologies, Inc. | Visual inspection and verification system |
US6763514B2 (en) | 2001-12-12 | 2004-07-13 | Numerical Technologies, Inc. | Method and apparatus for controlling rippling during optical proximity correction |
US6792590B1 (en) | 2000-09-29 | 2004-09-14 | Numerical Technologies, Inc. | Dissection of edges with projection points in a fabrication layout for correcting proximity effects |
US6792592B2 (en) | 2002-08-30 | 2004-09-14 | Numerical Technologies, Inc. | Considering mask writer properties during the optical proximity correction process |
US6794096B2 (en) | 2002-10-09 | 2004-09-21 | Numerical Technologies, Inc. | Phase shifting mask topography effect correction based on near-field image properties |
US6807663B2 (en) | 2002-09-23 | 2004-10-19 | Numerical Technologies, Inc. | Accelerated layout processing using OPC pre-processing |
US6873720B2 (en) | 2001-03-20 | 2005-03-29 | Synopsys, Inc. | System and method of providing mask defect printability analysis |
US6880135B2 (en) | 2001-11-07 | 2005-04-12 | Synopsys, Inc. | Method of incorporating lens aberration information into various process flows |
US6925202B2 (en) | 2001-03-20 | 2005-08-02 | Synopsys, Inc. | System and method of providing mask quality control |
US6928635B2 (en) | 2002-09-25 | 2005-08-09 | Numerical Technologies, Inc. | Selectively applying resolution enhancement techniques to improve performance and manufacturing cost of integrated circuits |
US7000208B2 (en) | 2002-07-29 | 2006-02-14 | Synopsys,Inc. | Repetition recognition using segments |
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US7024655B2 (en) | 1999-04-30 | 2006-04-04 | Cobb Nicolas B | Mixed-mode optical proximity correction |
US7093229B2 (en) | 1997-09-17 | 2006-08-15 | Synopsys, Inc. | System and method for providing defect printability analysis of photolithographic masks with job-based automation |
US7107571B2 (en) | 1997-09-17 | 2006-09-12 | Synopsys, Inc. | Visual analysis and verification system using advanced tools |
US7172838B2 (en) | 2002-09-27 | 2007-02-06 | Wilhelm Maurer | Chromeless phase mask layout generation |
EP1751683A2 (en) * | 2004-04-07 | 2007-02-14 | Aprio Technologies, Inc. | Intermediate layout for resolution enhancement in semiconductor fabrication |
US7328424B2 (en) | 2004-06-26 | 2008-02-05 | Infineon Technologies Ag | Method for determining a matrix of transmission cross coefficients in an optical proximity correction of mask layouts |
US7386433B2 (en) | 2002-03-15 | 2008-06-10 | Synopsys, Inc. | Using a suggested solution to speed up a process for simulating and correcting an integrated circuit layout |
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US8739075B2 (en) | 2008-03-21 | 2014-05-27 | Fujitsu Semiconductor Limited | Method of making pattern data, and medium for storing the program for making the pattern data |
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US6691297B1 (en) * | 1999-03-04 | 2004-02-10 | Matsushita Electric Industrial Co., Ltd. | Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI |
US6301697B1 (en) * | 1999-04-30 | 2001-10-09 | Nicolas B. Cobb | Streamlined IC mask layout optical and process correction through correction reuse |
US6834262B1 (en) * | 1999-07-02 | 2004-12-21 | Cypress Semiconductor Corporation | Scheme for improving the simulation accuracy of integrated circuit patterns by simulation of the mask |
US6704695B1 (en) * | 1999-07-16 | 2004-03-09 | International Business Machines Corporation | Interactive optical proximity correction design method |
US6643616B1 (en) * | 1999-12-07 | 2003-11-04 | Yuri Granik | Integrated device structure prediction based on model curvature |
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US7412676B2 (en) * | 2000-06-13 | 2008-08-12 | Nicolas B Cobb | Integrated OPC verification tool |
US6430737B1 (en) * | 2000-07-10 | 2002-08-06 | Mentor Graphics Corp. | Convergence technique for model-based optical and process correction |
US6505326B1 (en) * | 2000-09-29 | 2003-01-07 | General Electric Company | Analyzing thermal characteristics of geometries |
US6557162B1 (en) * | 2000-09-29 | 2003-04-29 | Numerical Technologies, Inc. | Method for high yield reticle formation |
US6526550B1 (en) * | 2000-09-29 | 2003-02-25 | General Electric Company | Analyzing characteristics of geometries |
US6574784B1 (en) * | 2001-06-14 | 2003-06-03 | George P. Lippincott | Short edge management in rule based OPC |
US7155698B1 (en) * | 2001-09-11 | 2006-12-26 | The Regents Of The University Of California | Method of locating areas in an image such as a photo mask layout that are sensitive to residual processing effects |
US7013439B2 (en) * | 2002-01-31 | 2006-03-14 | Juan Andres Torres Robles | Contrast based resolution enhancing technology |
US7293249B2 (en) * | 2002-01-31 | 2007-11-06 | Juan Andres Torres Robles | Contrast based resolution enhancement for photolithographic processing |
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US7302672B2 (en) * | 2002-07-12 | 2007-11-27 | Cadence Design Systems, Inc. | Method and system for context-specific mask writing |
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US7093228B2 (en) * | 2002-12-20 | 2006-08-15 | Lsi Logic Corporation | Method and system for classifying an integrated circuit for optical proximity correction |
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US7043712B2 (en) * | 2003-09-09 | 2006-05-09 | International Business Machines Corporation | Method for adaptive segment refinement in optical proximity correction |
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US7539954B2 (en) * | 2004-02-24 | 2009-05-26 | Konstantinos Adam | OPC simulation model using SOCS decomposition of edge fragments |
US7536660B2 (en) * | 2004-02-24 | 2009-05-19 | Konstantinos Adam | OPC simulation model using SOCS decomposition of edge fragments |
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US7263683B1 (en) | 2004-09-07 | 2007-08-28 | Advanced Micro Devices, Inc. | Simplified optical proximity correction based on 1-dimension versus 2-dimension pattern shape classification |
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US6370679B1 (en) | 1997-09-17 | 2002-04-09 | Numerical Technologies, Inc. | Data hierarchy layout correction and verification method and apparatus |
US7107571B2 (en) | 1997-09-17 | 2006-09-12 | Synopsys, Inc. | Visual analysis and verification system using advanced tools |
US6470489B1 (en) | 1997-09-17 | 2002-10-22 | Numerical Technologies, Inc. | Design rule checking system and method |
US7617474B2 (en) | 1997-09-17 | 2009-11-10 | Synopsys, Inc. | System and method for providing defect printability analysis of photolithographic masks with job-based automation |
US7356788B2 (en) | 1997-09-17 | 2008-04-08 | Synopsys, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
US6578188B1 (en) | 1997-09-17 | 2003-06-10 | Numerical Technologies, Inc. | Method and apparatus for a network-based mask defect printability analysis system |
US7003755B2 (en) | 1997-09-17 | 2006-02-21 | Synopsys Inc. | User interface for a networked-based mask defect printability analysis system |
US6757645B2 (en) | 1997-09-17 | 2004-06-29 | Numerical Technologies, Inc. | Visual inspection and verification system |
US6453452B1 (en) | 1997-12-12 | 2002-09-17 | Numerical Technologies, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
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Also Published As
Publication number | Publication date |
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JP2002543470A (en) | 2002-12-17 |
US6748578B2 (en) | 2004-06-08 |
EP1177479B1 (en) | 2011-07-27 |
US6301697B1 (en) | 2001-10-09 |
EP1177479A1 (en) | 2002-02-06 |
WO2000067074A9 (en) | 2002-06-20 |
US20050160388A1 (en) | 2005-07-21 |
AU3722200A (en) | 2000-11-17 |
US7155699B2 (en) | 2006-12-26 |
US20020026627A1 (en) | 2002-02-28 |
JP3343246B1 (en) | 2002-11-11 |
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