WO2001009904A3 - Multilayer optics with adjustable working wavelength - Google Patents

Multilayer optics with adjustable working wavelength Download PDF

Info

Publication number
WO2001009904A3
WO2001009904A3 PCT/US2000/021060 US0021060W WO0109904A3 WO 2001009904 A3 WO2001009904 A3 WO 2001009904A3 US 0021060 W US0021060 W US 0021060W WO 0109904 A3 WO0109904 A3 WO 0109904A3
Authority
WO
WIPO (PCT)
Prior art keywords
working wavelength
adjustable working
multilayer optics
multilayer
optics
Prior art date
Application number
PCT/US2000/021060
Other languages
French (fr)
Other versions
WO2001009904A2 (en
WO2001009904A9 (en
Inventor
Licai Jiang
Boris Verman
Original Assignee
Osmic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic Inc filed Critical Osmic Inc
Priority to AU65111/00A priority Critical patent/AU6511100A/en
Priority to JP2001514437A priority patent/JP2003506732A/en
Priority to CA002380922A priority patent/CA2380922C/en
Priority to EP00952405A priority patent/EP1200967B1/en
Priority to AT00952405T priority patent/ATE280993T1/en
Priority to DE60015346T priority patent/DE60015346T2/en
Publication of WO2001009904A2 publication Critical patent/WO2001009904A2/en
Publication of WO2001009904A3 publication Critical patent/WO2001009904A3/en
Publication of WO2001009904A9 publication Critical patent/WO2001009904A9/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0883—Mirrors with a refractive index gradient
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Abstract

An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
PCT/US2000/021060 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength WO2001009904A2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
AU65111/00A AU6511100A (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength
JP2001514437A JP2003506732A (en) 1999-08-02 2000-08-01 Multilayer optical element with tunable working wavelength
CA002380922A CA2380922C (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength
EP00952405A EP1200967B1 (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength
AT00952405T ATE280993T1 (en) 1999-08-02 2000-08-01 MULTI-LAYER OPTICS WITH TUNABLE OPERATING WAVELENGTHS
DE60015346T DE60015346T2 (en) 1999-08-02 2000-08-01 MULTILAYER OPTICS WITH TUNABLE OPERATING SHAFT LENGTHS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/366,028 US6421417B1 (en) 1999-08-02 1999-08-02 Multilayer optics with adjustable working wavelength
US09/366,028 1999-08-02

Publications (3)

Publication Number Publication Date
WO2001009904A2 WO2001009904A2 (en) 2001-02-08
WO2001009904A3 true WO2001009904A3 (en) 2001-09-27
WO2001009904A9 WO2001009904A9 (en) 2002-09-12

Family

ID=23441383

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/021060 WO2001009904A2 (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength

Country Status (9)

Country Link
US (1) US6421417B1 (en)
EP (1) EP1200967B1 (en)
JP (1) JP2003506732A (en)
AT (1) ATE280993T1 (en)
AU (1) AU6511100A (en)
CA (2) CA2642736A1 (en)
CZ (1) CZ301738B6 (en)
DE (1) DE60015346T2 (en)
WO (1) WO2001009904A2 (en)

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JP4657506B2 (en) * 2001-06-27 2011-03-23 株式会社リガク X-ray spectroscopy method and X-ray spectrometer
US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
JP2003255089A (en) * 2002-03-05 2003-09-10 Rigaku Industrial Co X-ray spectroscopy element and fluorescent x-ray analyzer
JP3629520B2 (en) * 2002-03-05 2005-03-16 理学電機工業株式会社 X-ray spectroscopic element and fluorescent X-ray analyzer using the same
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DE10254026C5 (en) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflector for X-radiation
EP1642304B1 (en) 2003-06-13 2008-03-19 Osmic, Inc. Beam conditioning system
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
US20060104596A1 (en) * 2004-07-02 2006-05-18 Charles Askins Deformable mirror apparatus
JP4432822B2 (en) * 2005-04-19 2010-03-17 船井電機株式会社 Variable shape mirror and optical pickup device having the same
US7425193B2 (en) * 2005-04-21 2008-09-16 Michigan State University Tomographic imaging system using a conformable mirror
DE102006015933B3 (en) * 2006-04-05 2007-10-31 Incoatec Gmbh Apparatus and method for adjusting an optical element
JP4278108B2 (en) * 2006-07-07 2009-06-10 株式会社リガク Ultra-small angle X-ray scattering measurement device
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US8130902B2 (en) * 2007-07-31 2012-03-06 Uchicago Argonne, Llc High-resolution, active-optic X-ray fluorescence analyzer
DE102007048743B4 (en) * 2007-10-08 2010-06-24 Ifg - Institute For Scientific Instruments Gmbh Method and device for determining the energetic composition of electromagnetic waves
KR101140200B1 (en) * 2008-01-30 2012-05-02 리플렉티브 엑스-레이 옵틱스 엘엘씨 Mirror mounting, alignment and scanning mechanism and scanning method for radiographic x-ray imaging, and x-ray imaging device having same
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US8126117B2 (en) * 2010-02-03 2012-02-28 Rigaku Innovative Technologies, Inc. Multi-beam X-ray system
JP4974391B2 (en) * 2010-02-21 2012-07-11 株式会社リガク X-ray spectroscopy method and X-ray spectrometer
US8406374B2 (en) 2010-06-25 2013-03-26 Rigaku Innovative Technologies, Inc. X-ray optical systems with adjustable convergence and focal spot size
US9008271B2 (en) 2010-08-19 2015-04-14 Convergent R.N.R. Ltd System for X-ray irradiation of target volume
CN102525492A (en) * 2010-12-31 2012-07-04 上海西门子医疗器械有限公司 Device for selecting X-ray energy spectrum
KR101332502B1 (en) * 2011-06-14 2013-11-26 전남대학교산학협력단 An X-ray Needle Module for Local Radiation Therapy
CN103137233A (en) * 2011-12-02 2013-06-05 佳能株式会社 X-ray waveguide and X-ray waveguide system
RU2623689C2 (en) * 2012-11-29 2017-06-28 Хельмут Фишер Гмбх Институт Фюр Электроник Унд Месстекник Method and device for carrying out x-ray fluorescence analysis
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6025211B2 (en) * 2013-11-28 2016-11-16 株式会社リガク X-ray topography equipment
EP3322340B1 (en) * 2015-07-14 2019-06-19 Koninklijke Philips N.V. Imaging with enhanced x-ray radiation
DE102017202802A1 (en) * 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Lens and optical system with such a lens
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
WO2020023408A1 (en) 2018-07-26 2020-01-30 Sigray, Inc. High brightness x-ray reflection source
EP3603516A1 (en) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH X-ray equipment and method for operating same
CN112638261A (en) 2018-09-04 2021-04-09 斯格瑞公司 System and method for utilizing filtered x-ray fluorescence
DE112019004478T5 (en) 2018-09-07 2021-07-08 Sigray, Inc. SYSTEM AND PROCEDURE FOR X-RAY ANALYSIS WITH SELECTABLE DEPTH
CN109799612B (en) * 2019-03-15 2020-03-31 重庆大学 Curved surface reflector manufacturing method and variable curvature radius point light source line focusing imaging system
WO2021162947A1 (en) 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles

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EP0534535A1 (en) * 1991-09-25 1993-03-31 Laboratoires D'electronique Philips Device including a mirror operating in the field of X-rays or neutrons
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Also Published As

Publication number Publication date
CZ2002791A3 (en) 2002-11-13
CA2380922A1 (en) 2001-02-08
US6421417B1 (en) 2002-07-16
CA2380922C (en) 2008-12-09
JP2003506732A (en) 2003-02-18
DE60015346T2 (en) 2005-11-10
WO2001009904A2 (en) 2001-02-08
AU6511100A (en) 2001-02-19
CZ301738B6 (en) 2010-06-09
ATE280993T1 (en) 2004-11-15
US20020080916A1 (en) 2002-06-27
DE60015346D1 (en) 2004-12-02
WO2001009904A9 (en) 2002-09-12
EP1200967A2 (en) 2002-05-02
EP1200967B1 (en) 2004-10-27
CA2642736A1 (en) 2001-02-08

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