WO2001078093A3 - Distributed capacitor - Google Patents
Distributed capacitor Download PDFInfo
- Publication number
- WO2001078093A3 WO2001078093A3 PCT/CA2001/000484 CA0100484W WO0178093A3 WO 2001078093 A3 WO2001078093 A3 WO 2001078093A3 CA 0100484 W CA0100484 W CA 0100484W WO 0178093 A3 WO0178093 A3 WO 0178093A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layers
- electrode
- integrated circuit
- opening
- circuit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/642—Capacitive arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0805—Capacitors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15151—Shape the die mounting substrate comprising an aperture, e.g. for underfilling, outgassing, window type wire connections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15312—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a pin array, e.g. PGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE60132660T DE60132660T2 (en) | 2000-04-06 | 2001-04-06 | DISTRIBUTED CAPACITY |
CA002443551A CA2443551A1 (en) | 2000-04-06 | 2001-04-06 | Distributed capacitor |
EP01925235A EP1273017B1 (en) | 2000-04-06 | 2001-04-06 | Distributed capacitor |
AU2001252058A AU2001252058A1 (en) | 2000-04-06 | 2001-04-06 | Distributed capacitor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/544,550 | 2000-04-06 | ||
US09/544,550 US6411494B1 (en) | 2000-04-06 | 2000-04-06 | Distributed capacitor |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001078093A2 WO2001078093A2 (en) | 2001-10-18 |
WO2001078093A3 true WO2001078093A3 (en) | 2002-03-28 |
Family
ID=24172631
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CA2001/000484 WO2001078093A2 (en) | 2000-04-06 | 2001-04-06 | Distributed capacitor |
Country Status (7)
Country | Link |
---|---|
US (1) | US6411494B1 (en) |
EP (1) | EP1273017B1 (en) |
AT (1) | ATE385341T1 (en) |
AU (1) | AU2001252058A1 (en) |
CA (1) | CA2443551A1 (en) |
DE (1) | DE60132660T2 (en) |
WO (1) | WO2001078093A2 (en) |
Families Citing this family (37)
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GB2367428B (en) | 2001-12-19 | 2002-10-09 | Zarlink Semiconductor Ltd | Integrated circuit |
US6873185B2 (en) | 2002-06-19 | 2005-03-29 | Viasic, Inc. | Logic array devices having complex macro-cell architecture and methods facilitating use of same |
DE10260352A1 (en) | 2002-12-20 | 2004-07-15 | Infineon Technologies Ag | Method of manufacturing a capacitor arrangement and capacitor arrangement |
WO2004090981A1 (en) * | 2003-04-07 | 2004-10-21 | Philips Intellectual Property & Standards Gmbh | Electronic packaging structure with integrated distributed decoupling capacitors |
US8569142B2 (en) * | 2003-11-28 | 2013-10-29 | Blackberry Limited | Multi-level thin film capacitor on a ceramic substrate and method of manufacturing the same |
US7335966B2 (en) * | 2004-02-26 | 2008-02-26 | Triad Semiconductor, Inc. | Configurable integrated circuit capacitor array using via mask layers |
WO2005098954A1 (en) * | 2004-04-02 | 2005-10-20 | Triad Semiconductor, Inc. | Via configurable architecture for customization of analog circuitry in a semiconductor device |
US7334208B1 (en) | 2004-11-09 | 2008-02-19 | Viasic, Inc. | Customization of structured ASIC devices using pre-process extraction of routing information |
JP4928748B2 (en) * | 2005-06-27 | 2012-05-09 | ルネサスエレクトロニクス株式会社 | Semiconductor device and manufacturing method thereof |
US8201128B2 (en) * | 2006-06-16 | 2012-06-12 | Cadence Design Systems, Inc. | Method and apparatus for approximating diagonal lines in placement |
US7813107B1 (en) | 2007-03-15 | 2010-10-12 | Greatbatch Ltd. | Wet tantalum capacitor with multiple anode connections |
JP2008277546A (en) * | 2007-04-27 | 2008-11-13 | Rohm Co Ltd | Semiconductor device |
US7692309B2 (en) * | 2007-09-06 | 2010-04-06 | Viasic, Inc. | Configuring structured ASIC fabric using two non-adjacent via layers |
US20090230446A1 (en) * | 2008-03-17 | 2009-09-17 | Technology Alliance Group, Inc. | Semiconductor device and bypass capacitor module |
US8680649B2 (en) * | 2008-08-22 | 2014-03-25 | Stmicroelectronics (Tours) Sas | Multi-layer film capacitor with tapered film sidewalls |
JP5267268B2 (en) * | 2009-03-26 | 2013-08-21 | Tdk株式会社 | Thin film capacitor and manufacturing method thereof |
JP5407775B2 (en) * | 2009-03-31 | 2014-02-05 | Tdk株式会社 | Thin film capacitor manufacturing method and thin film capacitor |
DE102009059873A1 (en) * | 2009-12-21 | 2011-06-22 | Epcos Ag, 81669 | Varactor and method of making a varactor |
WO2014070763A1 (en) | 2012-10-30 | 2014-05-08 | Anayas360.Com, Llc | Compact and low-power millimeter-wave integrated vco-up/down- converter with gain-boosting |
WO2014089517A1 (en) * | 2012-12-07 | 2014-06-12 | Anayas360.Com, Llc | Adaptive tuning voltage buffer for millimeter-wave multi-channel frequency synthesizer example embodiments |
US9099861B2 (en) * | 2013-05-23 | 2015-08-04 | Inpaq Technology Co., Ltd. | Over-voltage protection device and method for preparing the same |
JP2015133392A (en) | 2014-01-10 | 2015-07-23 | 富士通セミコンダクター株式会社 | Semiconductor device and method of manufacturing the same |
KR102183713B1 (en) | 2014-02-13 | 2020-11-26 | 삼성전자주식회사 | Staircase Connection Structure Of Three-Dimensional Semiconductor Device And Method Of Forming The Same |
FR3022072B1 (en) * | 2014-06-10 | 2017-08-25 | Commissariat Energie Atomique | MULTILAYER ELECTRICAL DEVICE |
US20160181233A1 (en) * | 2014-12-23 | 2016-06-23 | Qualcomm Incorporated | Metal-insulator-metal (mim) capacitors arranged in a pattern to reduce inductance, and related methods |
JP2016162904A (en) * | 2015-03-03 | 2016-09-05 | ルネサスエレクトロニクス株式会社 | Semiconductor device manufacturing method |
US9998100B2 (en) | 2015-08-28 | 2018-06-12 | Ampere Computing Llc | Package programmable decoupling capacitor array |
US9767962B2 (en) * | 2016-01-22 | 2017-09-19 | Micron Technology, Inc. | Apparatuses, multi-chip modules and capacitive chips |
JP6737118B2 (en) | 2016-10-11 | 2020-08-05 | Tdk株式会社 | Thin film capacitors |
JP2018063989A (en) | 2016-10-11 | 2018-04-19 | Tdk株式会社 | Thin film capacitor |
JP6805702B2 (en) | 2016-10-11 | 2020-12-23 | Tdk株式会社 | Thin film capacitor |
US10886219B2 (en) * | 2017-01-18 | 2021-01-05 | Tdk Corporation | Electronic component mounting package |
US20210020587A1 (en) * | 2019-06-11 | 2021-01-21 | Skyworks Solutions, Inc. | Moisture barrier for metal insulator metal capacitors and integrated circuit having the same |
CN112652619B (en) * | 2020-12-22 | 2022-08-09 | 长江存储科技有限责任公司 | Gasket and manufacturing method thereof, and packaging structure and manufacturing method thereof |
US11754444B2 (en) | 2021-03-19 | 2023-09-12 | Rockwell Collins, Inc. | Distributed integrate and dump circuit |
CN113517401B (en) * | 2021-09-13 | 2021-12-17 | 广州粤芯半导体技术有限公司 | Metal capacitor structure and preparation method thereof |
US11869725B2 (en) * | 2021-11-30 | 2024-01-09 | Texas Instruments Incorporated | Multi-stacked capacitor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0262493A2 (en) * | 1986-09-30 | 1988-04-06 | International Business Machines Corporation | Electronic package with distributed decoupling capacitors |
US5177670A (en) * | 1991-02-08 | 1993-01-05 | Hitachi, Ltd. | Capacitor-carrying semiconductor module |
US5745335A (en) * | 1996-06-27 | 1998-04-28 | Gennum Corporation | Multi-layer film capacitor structures and method |
Family Cites Families (30)
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US3648132A (en) | 1970-04-20 | 1972-03-07 | Illinois Tool Works | Multilayer capacitor and process for adjusting the value thereof |
US4148003A (en) | 1977-07-08 | 1979-04-03 | Globe-Union Inc. | Series feed-through capacitor |
US4419713A (en) | 1981-07-06 | 1983-12-06 | Centre Engineering, Inc. | Multiple electrode series capacitor |
US4470099A (en) | 1982-09-17 | 1984-09-04 | Matsushita Electric Industrial Co., Ltd. | Laminated capacitor |
JPS6273653A (en) | 1985-09-26 | 1987-04-04 | Mitsubishi Electric Corp | Construction of capacitive circuit |
US4789840A (en) | 1986-04-16 | 1988-12-06 | Hewlett-Packard Company | Integrated capacitance structures in microwave finline devices |
US4969032A (en) | 1988-07-18 | 1990-11-06 | Motorola Inc. | Monolithic microwave integrated circuit having vertically stacked components |
US4914546A (en) | 1989-02-03 | 1990-04-03 | Micrel Incorporated | Stacked multi-polysilicon layer capacitor |
US4916576A (en) | 1989-02-27 | 1990-04-10 | Fmtt, Inc. | Matrix capacitor |
JPH031517A (en) | 1989-04-15 | 1991-01-08 | Murata Mfg Co Ltd | Through-type capacitor |
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US5206788A (en) * | 1991-12-12 | 1993-04-27 | Ramtron Corporation | Series ferroelectric capacitor structure for monolithic integrated circuits and method |
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US5530722A (en) | 1992-10-27 | 1996-06-25 | Ericsson Ge Mobile Communications Inc. | Quadrature modulator with integrated distributed RC filters |
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US5414588A (en) | 1993-09-20 | 1995-05-09 | The Regents Of The University Of California | High performance capacitors using nano-structure multilayer materials fabrication |
US5457598A (en) | 1994-04-08 | 1995-10-10 | Radford; Kenneth C. | High capacitance thin film capacitor |
JPH07326544A (en) | 1994-05-31 | 1995-12-12 | Matsushita Electric Ind Co Ltd | Variable capacitor formed on multilayer circuit board |
US5745333A (en) * | 1994-11-21 | 1998-04-28 | International Business Machines Corporation | Laminar stackable circuit board structure with capacitor |
US5583359A (en) | 1995-03-03 | 1996-12-10 | Northern Telecom Limited | Capacitor structure for an integrated circuit |
US5739576A (en) | 1995-10-06 | 1998-04-14 | Micron Technology, Inc. | Integrated chip multilayer decoupling capacitors |
US5786630A (en) | 1996-08-07 | 1998-07-28 | Intel Corporation | Multi-layer C4 flip-chip substrate |
US5789807A (en) * | 1996-10-15 | 1998-08-04 | International Business Machines Corporation | On-chip power distribution for improved decoupling |
US5905627A (en) | 1997-09-10 | 1999-05-18 | Maxwell Energy Products, Inc. | Internally grounded feedthrough filter capacitor |
-
2000
- 2000-04-06 US US09/544,550 patent/US6411494B1/en not_active Expired - Lifetime
-
2001
- 2001-04-06 DE DE60132660T patent/DE60132660T2/en not_active Expired - Fee Related
- 2001-04-06 CA CA002443551A patent/CA2443551A1/en not_active Abandoned
- 2001-04-06 AU AU2001252058A patent/AU2001252058A1/en not_active Abandoned
- 2001-04-06 EP EP01925235A patent/EP1273017B1/en not_active Expired - Lifetime
- 2001-04-06 WO PCT/CA2001/000484 patent/WO2001078093A2/en active IP Right Grant
- 2001-04-06 AT AT01925235T patent/ATE385341T1/en not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0262493A2 (en) * | 1986-09-30 | 1988-04-06 | International Business Machines Corporation | Electronic package with distributed decoupling capacitors |
US5177670A (en) * | 1991-02-08 | 1993-01-05 | Hitachi, Ltd. | Capacitor-carrying semiconductor module |
US5745335A (en) * | 1996-06-27 | 1998-04-28 | Gennum Corporation | Multi-layer film capacitor structures and method |
Non-Patent Citations (1)
Title |
---|
WATT M M ET AL: "Feasibility demonstration of a multi-level thin film BST capacitor technology", ISAF 1998. PROCEEDINGS OF THE ELEVENTH IEEE INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS (CAT. NO.98CH36245), ISAF 1998. PROCEEDINGS OF THE ELEVENTH IEEE INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS, MONTREUX, SWITZERLAND, 2, 1998, Piscataway, NJ, USA, IEEE, USA, pages 11 - 14, XP002182694, ISBN: 0-7803-4959-8 * |
Also Published As
Publication number | Publication date |
---|---|
US6411494B1 (en) | 2002-06-25 |
EP1273017A2 (en) | 2003-01-08 |
AU2001252058A1 (en) | 2001-10-23 |
WO2001078093A2 (en) | 2001-10-18 |
EP1273017B1 (en) | 2008-01-30 |
DE60132660T2 (en) | 2009-01-08 |
ATE385341T1 (en) | 2008-02-15 |
DE60132660D1 (en) | 2008-03-20 |
CA2443551A1 (en) | 2001-10-18 |
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