WO2001084590A3 - Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn - Google Patents

Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn Download PDF

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Publication number
WO2001084590A3
WO2001084590A3 PCT/US2001/012172 US0112172W WO0184590A3 WO 2001084590 A3 WO2001084590 A3 WO 2001084590A3 US 0112172 W US0112172 W US 0112172W WO 0184590 A3 WO0184590 A3 WO 0184590A3
Authority
WO
WIPO (PCT)
Prior art keywords
microcolumn
specimen
secondary electrons
target
indirect
Prior art date
Application number
PCT/US2001/012172
Other languages
French (fr)
Other versions
WO2001084590A2 (en
Inventor
Stuart L Friedman
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Priority to AU2001255373A priority Critical patent/AU2001255373A1/en
Publication of WO2001084590A2 publication Critical patent/WO2001084590A2/en
Publication of WO2001084590A3 publication Critical patent/WO2001084590A3/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2817—Pattern inspection

Abstract

In a scanning electron microscope microcolumn which may be used in inspection of articles, a target is used to convert secondary electrons emitted by the specimen into tertiary electrons. These tertiary electrons are then detected by a conventional electron detector. Because the shape and dimensions of the target are relatively unconstrained in comparison with the shape and dimensions of the electron detector, an effective detection of the secondaries passing close to the optical axis of the apparatus can be achieved. The shape and material of the target may be chosen to optimize the detection efficiency of the system.
PCT/US2001/012172 2000-05-04 2001-04-12 Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn WO2001084590A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2001255373A AU2001255373A1 (en) 2000-05-04 2001-04-12 Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56563500A 2000-05-04 2000-05-04
US09/565,635 2000-05-04

Publications (2)

Publication Number Publication Date
WO2001084590A2 WO2001084590A2 (en) 2001-11-08
WO2001084590A3 true WO2001084590A3 (en) 2002-03-28

Family

ID=24259488

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/012172 WO2001084590A2 (en) 2000-05-04 2001-04-12 Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn

Country Status (3)

Country Link
AU (1) AU2001255373A1 (en)
TW (1) TW508615B (en)
WO (1) WO2001084590A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8980045B2 (en) 2007-05-30 2015-03-17 Applied Materials, Inc. Substrate cleaning chamber and components
US9481608B2 (en) 2005-07-13 2016-11-01 Applied Materials, Inc. Surface annealing of components for substrate processing chambers

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1265887A1 (en) * 1985-03-20 1986-10-23 Институт проблем технологии микроэлектроники и особочистых материалов АН СССР Device for registering non-elastically reflected electrons in scanning electrone microscope
US5466940A (en) * 1994-06-20 1995-11-14 Opal Technologies Ltd. Electron detector with high backscattered electron acceptance for particle beam apparatus
JPH0883589A (en) * 1994-09-13 1996-03-26 Hitachi Ltd Scanning electron microscope
WO2000067290A2 (en) * 1999-05-05 2000-11-09 Etec Systems, Inc. Integrated microcolumn and scanning probe microscope arrays

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1265887A1 (en) * 1985-03-20 1986-10-23 Институт проблем технологии микроэлектроники и особочистых материалов АН СССР Device for registering non-elastically reflected electrons in scanning electrone microscope
US5466940A (en) * 1994-06-20 1995-11-14 Opal Technologies Ltd. Electron detector with high backscattered electron acceptance for particle beam apparatus
JPH0883589A (en) * 1994-09-13 1996-03-26 Hitachi Ltd Scanning electron microscope
WO2000067290A2 (en) * 1999-05-05 2000-11-09 Etec Systems, Inc. Integrated microcolumn and scanning probe microscope arrays

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section EI Week 198724, Derwent World Patents Index; Class S03, AN 1987-168691, XP002182623 *
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 07 31 July 1996 (1996-07-31) *
T ET AL: "Electron beam technology - SEM to microcolumn", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 32, no. 1, 1 September 1996 (1996-09-01), pages 113 - 130, XP004013428, ISSN: 0167-9317 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9481608B2 (en) 2005-07-13 2016-11-01 Applied Materials, Inc. Surface annealing of components for substrate processing chambers
US8980045B2 (en) 2007-05-30 2015-03-17 Applied Materials, Inc. Substrate cleaning chamber and components

Also Published As

Publication number Publication date
WO2001084590A2 (en) 2001-11-08
AU2001255373A1 (en) 2001-11-12
TW508615B (en) 2002-11-01

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