WO2002003141A3 - Network-based photomask data entry interface and instruction generator for manufacturing photomasks - Google Patents
Network-based photomask data entry interface and instruction generator for manufacturing photomasks Download PDFInfo
- Publication number
- WO2002003141A3 WO2002003141A3 PCT/US2001/021020 US0121020W WO0203141A3 WO 2002003141 A3 WO2002003141 A3 WO 2002003141A3 US 0121020 W US0121020 W US 0121020W WO 0203141 A3 WO0203141 A3 WO 0203141A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- data
- customer
- network
- delivered
- photomask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q30/00—Commerce
- G06Q30/02—Marketing; Price estimation or determination; Fundraising
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q30/00—Commerce
- G06Q30/04—Billing or invoicing
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q30/00—Commerce
- G06Q30/06—Buying, selling or leasing transactions
- G06Q30/0601—Electronic shopping [e-shopping]
- G06Q30/0603—Catalogue ordering
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q50/00—Systems or methods specially adapted for specific business sectors, e.g. utilities or tourism
- G06Q50/04—Manufacturing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31761—Patterning strategy
- H01J2237/31762—Computer and memory organisation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/30—Computing systems specially adapted for manufacturing
Landscapes
- Business, Economics & Management (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Accounting & Taxation (AREA)
- Finance (AREA)
- Development Economics (AREA)
- Strategic Management (AREA)
- Marketing (AREA)
- General Business, Economics & Management (AREA)
- Economics (AREA)
- Theoretical Computer Science (AREA)
- Human Resources & Organizations (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Primary Health Care (AREA)
- Tourism & Hospitality (AREA)
- Entrepreneurship & Innovation (AREA)
- Game Theory and Decision Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2001273139A AU2001273139A1 (en) | 2000-07-05 | 2001-06-29 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
JP2002508144A JP4873678B2 (en) | 2000-07-05 | 2001-06-29 | Network-based photomask data input interface and photomask manufacturing instruction generation apparatus |
EP01952380A EP1297455A2 (en) | 2000-07-05 | 2001-06-29 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
HK04100853A HK1058090A1 (en) | 2000-07-05 | 2004-02-09 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/610,917 | 2000-07-05 | ||
US09/610,917 US6622295B1 (en) | 2000-07-05 | 2000-07-05 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2002003141A2 WO2002003141A2 (en) | 2002-01-10 |
WO2002003141A3 true WO2002003141A3 (en) | 2002-08-15 |
WO2002003141A8 WO2002003141A8 (en) | 2003-11-06 |
Family
ID=24446917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2001/021020 WO2002003141A2 (en) | 2000-07-05 | 2001-06-29 | Network-based photomask data entry interface and instruction generator for manufacturing photomasks |
Country Status (8)
Country | Link |
---|---|
US (3) | US6622295B1 (en) |
EP (1) | EP1297455A2 (en) |
JP (1) | JP4873678B2 (en) |
CN (1) | CN1251119C (en) |
AU (1) | AU2001273139A1 (en) |
HK (1) | HK1058090A1 (en) |
TW (1) | TWI226555B (en) |
WO (1) | WO2002003141A2 (en) |
Families Citing this family (31)
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US20020156639A1 (en) * | 2001-02-27 | 2002-10-24 | Akira Ishikawa | Business method for a digital photolithography system |
US8090617B1 (en) * | 2001-08-27 | 2012-01-03 | Renesas Electronics America Inc. | Determining if a potential customer is a desirable customer |
JP2003091645A (en) * | 2001-09-18 | 2003-03-28 | Mitsubishi Electric Corp | Sales method and sales management server for mask design data of photo mask |
JP2003099634A (en) * | 2001-09-21 | 2003-04-04 | Toshiba Corp | System and method for trading mask |
NL1019594C2 (en) * | 2001-12-18 | 2003-06-19 | Neopost Ind B V | Method, system and computer program for generating messages. |
JP2003216231A (en) * | 2002-01-18 | 2003-07-31 | Hitachi Ltd | Field monitoring and operating device |
US6760640B2 (en) * | 2002-03-14 | 2004-07-06 | Photronics, Inc. | Automated manufacturing system and method for processing photomasks |
US7669167B2 (en) * | 2002-07-30 | 2010-02-23 | Photronics, Inc. | Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system |
US7640529B2 (en) * | 2002-07-30 | 2009-12-29 | Photronics, Inc. | User-friendly rule-based system and method for automatically generating photomask orders |
US6842881B2 (en) * | 2002-07-30 | 2005-01-11 | Photronics, Inc. | Rule based system and method for automatically generating photomask orders in a specified order format |
US7356374B2 (en) | 2002-03-15 | 2008-04-08 | Photronics, Inc. | Comprehensive front end method and system for automatically generating and processing photomask orders |
JP2003295415A (en) * | 2002-04-01 | 2003-10-15 | Mitsubishi Electric Corp | System for supply photomask |
AU2003256326A1 (en) * | 2002-06-28 | 2004-01-19 | Dupont Photomasks, Inc. | Method and system for electronic order entry and automatic processing of photomask orders |
EA008878B1 (en) * | 2002-07-30 | 2007-08-31 | Фотроникс, Инк. | Rule based system and method for automatically generating photomask orders |
JP2004128227A (en) * | 2002-10-02 | 2004-04-22 | Sanyo Electric Co Ltd | Circuit device providing system and server computer |
US7069533B2 (en) * | 2003-03-14 | 2006-06-27 | Chatered Semiconductor Manufacturing, Ltd | System, apparatus and method for automated tapeout support |
US7363236B2 (en) * | 2003-03-14 | 2008-04-22 | Chartered Semiconductor Manufacturing Ltd. | System, apparatus and method for reticle grade and pricing management |
DE102004007678B3 (en) * | 2004-02-16 | 2005-09-15 | Infineon Technologies Ag | Mask manufacturing method for semiconductor component, involves enlarging slivers after breaking up of semiconductor layout data, and transmitting enlarged slivers to generator in form of control data after photographic exposure of mask |
US8135915B2 (en) * | 2004-03-22 | 2012-03-13 | International Business Machines Corporation | Method and apparatus for hardware assistance for prefetching a pointer to a data structure identified by a prefetch indicator |
JP2006011951A (en) * | 2004-06-28 | 2006-01-12 | Seiko Epson Corp | Semiconductor device order management support system and server for use therewith |
US20060026549A1 (en) * | 2004-07-27 | 2006-02-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and system for conducting an online transaction of multi-project wafer service |
US7419748B1 (en) | 2004-08-24 | 2008-09-02 | Integrated Device Technology, Inc. | Photomask with reduced electrostatic discharge defects |
US20060122724A1 (en) * | 2004-12-07 | 2006-06-08 | Photoronics, Inc. 15 Secor Road P.O. Box 5226 Brookfield, Connecticut 06804 | System and method for automatically generating a tooling specification using a logical operations utility that can be used to generate a photomask order |
CN100367484C (en) * | 2004-12-22 | 2008-02-06 | 盟图科技股份有限公司 | Method and system for measuring width of junction in graph of mask designed |
US7828929B2 (en) * | 2004-12-30 | 2010-11-09 | Research Electro-Optics, Inc. | Methods and devices for monitoring and controlling thin film processing |
JP2006301396A (en) * | 2005-04-22 | 2006-11-02 | Shinko Electric Ind Co Ltd | Charging device for direct drawing device |
US20060271443A1 (en) * | 2005-05-27 | 2006-11-30 | Cahalane Daniel J | System and method for automatically generating and/or processing a photomask order using a script profiler |
KR101407913B1 (en) * | 2005-09-26 | 2014-06-17 | 마이크로닉 마이데이터 아베 | Methods and systems for pattern generation based on multiple forms of design data |
US8826207B2 (en) * | 2007-09-17 | 2014-09-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of generating technology file for integrated circuit design tools |
US8849440B2 (en) * | 2012-05-31 | 2014-09-30 | International Business Machines Corporation | Manufacturing control based on a final design structure incorporating both layout and client-specific manufacturing information |
KR101930450B1 (en) | 2017-05-31 | 2018-12-18 | 포항공과대학교 산학협력단 | Mask manufacturing apparatus and, manufacturing method of mask and, mask for lithography |
Citations (3)
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US5933350A (en) * | 1996-09-03 | 1999-08-03 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device development information integrating system |
US5950201A (en) * | 1996-12-06 | 1999-09-07 | International Business Machines Corporation | Computerized design automation method using a single logical PFVL paradigm |
EP1003087A1 (en) * | 1998-11-17 | 2000-05-24 | Compagnie Industrielle D'applications Thermiques C.I.A.T. | Method to transfer data between a computer assisted design system and a computer assisted manufacturing system, applying such a method and interface between such systems |
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-
2000
- 2000-07-05 US US09/610,917 patent/US6622295B1/en not_active Expired - Fee Related
-
2001
- 2001-06-29 JP JP2002508144A patent/JP4873678B2/en not_active Expired - Fee Related
- 2001-06-29 AU AU2001273139A patent/AU2001273139A1/en not_active Abandoned
- 2001-06-29 EP EP01952380A patent/EP1297455A2/en not_active Withdrawn
- 2001-06-29 CN CNB018151701A patent/CN1251119C/en not_active Expired - Fee Related
- 2001-06-29 WO PCT/US2001/021020 patent/WO2002003141A2/en active Application Filing
- 2001-07-05 TW TW090116471A patent/TWI226555B/en not_active IP Right Cessation
-
2003
- 2003-09-08 US US10/657,648 patent/US6968530B2/en not_active Expired - Fee Related
-
2004
- 2004-02-09 HK HK04100853A patent/HK1058090A1/en not_active IP Right Cessation
-
2005
- 2005-11-18 US US11/283,569 patent/US7398509B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5933350A (en) * | 1996-09-03 | 1999-08-03 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device development information integrating system |
US5950201A (en) * | 1996-12-06 | 1999-09-07 | International Business Machines Corporation | Computerized design automation method using a single logical PFVL paradigm |
EP1003087A1 (en) * | 1998-11-17 | 2000-05-24 | Compagnie Industrielle D'applications Thermiques C.I.A.T. | Method to transfer data between a computer assisted design system and a computer assisted manufacturing system, applying such a method and interface between such systems |
Non-Patent Citations (2)
Title |
---|
LUO R C ET AL: "Desktop rapid prototyping system with supervisory control and monitoring through Internet", IEEE/ASME TRANSACTIONS ON MECHATRONICS, DEC. 2001, IEEE, USA, vol. 6, no. 4, pages 399 - 409, XP002199596, ISSN: 1083-4435 * |
PELTIER J ET AL: "Low cost, prototype ASIC and MCM fabrication and assembly from the MOSIS service", PROCEEDINGS. 1997 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC SYSTEMS EDUCATION, MSE'97. DOING MORE WITH LESS IN A RAPIDLY CHANGING ENVIRONMENT' (CAT. NO.97TB100127), PROCEEDINGS OF INTERNATIONAL CONFERENCE ON MICROELECTRONIC SYSTEMS EDUCATION,, 1997, Los Alamitos, CA, USA, IEEE Comput. Soc. Press, USA, pages 68 - 69, XP002199595, ISBN: 0-8186-7996-4 * |
Also Published As
Publication number | Publication date |
---|---|
US7398509B2 (en) | 2008-07-08 |
CN1251119C (en) | 2006-04-12 |
JP4873678B2 (en) | 2012-02-08 |
CN1452749A (en) | 2003-10-29 |
US20040054982A1 (en) | 2004-03-18 |
TWI226555B (en) | 2005-01-11 |
AU2001273139A1 (en) | 2002-01-14 |
EP1297455A2 (en) | 2003-04-02 |
HK1058090A1 (en) | 2004-04-30 |
US20060074510A1 (en) | 2006-04-06 |
JP2004502972A (en) | 2004-01-29 |
WO2002003141A8 (en) | 2003-11-06 |
US6968530B2 (en) | 2005-11-22 |
US6622295B1 (en) | 2003-09-16 |
WO2002003141A2 (en) | 2002-01-10 |
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Free format text: IN PCT GAZETTE 02/2002 DUE TO A TECHNICAL PROBLEM AT THE TIME OF INTERNATIONAL PUBLICATION, SOME INFORMATION WAS MISSING (81). THE MISSING INFORMATION NOW APPEARS IN THE CORRECTED VERSION. Free format text: IN PCT GAZETTE 02/2002 DUE TO A TECHNICAL PROBLEM AT THE TIME OF INTERNATIONAL PUBLICATION, SOME INFORMATION WAS MISSING (81). THE MISSING INFORMATION NOW APPEARS IN THE CORRECTED VERSION. |