WO2002003141A8 - Network-based photomask data entry interface and instruction generator for manufacturing photomasks - Google Patents

Network-based photomask data entry interface and instruction generator for manufacturing photomasks

Info

Publication number
WO2002003141A8
WO2002003141A8 PCT/US2001/021020 US0121020W WO0203141A8 WO 2002003141 A8 WO2002003141 A8 WO 2002003141A8 US 0121020 W US0121020 W US 0121020W WO 0203141 A8 WO0203141 A8 WO 0203141A8
Authority
WO
WIPO (PCT)
Prior art keywords
data
customer
network
delivered
photomask
Prior art date
Application number
PCT/US2001/021020
Other languages
French (fr)
Other versions
WO2002003141A2 (en
WO2002003141A3 (en
Inventor
Thomas T Cogdell
Jeffry S Schepp
Jan E Gentry
Original Assignee
Dupont Photomasks Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dupont Photomasks Inc filed Critical Dupont Photomasks Inc
Priority to EP01952380A priority Critical patent/EP1297455A2/en
Priority to JP2002508144A priority patent/JP4873678B2/en
Priority to AU2001273139A priority patent/AU2001273139A1/en
Publication of WO2002003141A2 publication Critical patent/WO2002003141A2/en
Publication of WO2002003141A3 publication Critical patent/WO2002003141A3/en
Publication of WO2002003141A8 publication Critical patent/WO2002003141A8/en
Priority to HK04100853A priority patent/HK1058090A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q30/00—Commerce
    • G06Q30/02—Marketing; Price estimation or determination; Fundraising
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q30/00—Commerce
    • G06Q30/04—Billing or invoicing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q30/00—Commerce
    • G06Q30/06—Buying, selling or leasing transactions
    • G06Q30/0601—Electronic shopping [e-shopping]
    • G06Q30/0603—Catalogue ordering
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00—Systems or methods specially adapted for specific business sectors, e.g. utilities or tourism
    • G06Q50/04—Manufacturing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy
    • H01J2237/31762—Computer and memory organisation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30—Computing systems specially adapted for manufacturing

Abstract

A computer network for generating instructions for photomask manufacturing equipment, based on photomask specification data input by a customer. A series of order entry screens are downloaded to a remote customer's computer, typically via an internet connection. The customer is prompted to enter photomask specification data, which is delivered to computing equipment on the manufacturer's local network. The manufacturer's computing equipment validates the photomask specification data, and uses this data to generate fracturing isntructions and equipment control instructions. The fracturing instructions, together with pattern design data from the customer, are delivered to a fracture engine, which provides fractured pattern data. The control instructions and the fractured pattern data may then be electronically delivered to the manufacturing equipment.
PCT/US2001/021020 2000-07-05 2001-06-29 Network-based photomask data entry interface and instruction generator for manufacturing photomasks WO2002003141A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP01952380A EP1297455A2 (en) 2000-07-05 2001-06-29 Network-based photomask data entry interface and instruction generator for manufacturing photomasks
JP2002508144A JP4873678B2 (en) 2000-07-05 2001-06-29 Network-based photomask data input interface and photomask manufacturing instruction generation apparatus
AU2001273139A AU2001273139A1 (en) 2000-07-05 2001-06-29 Network-based photomask data entry interface and instruction generator for manufacturing photomasks
HK04100853A HK1058090A1 (en) 2000-07-05 2004-02-09 Network-based photomask data entry interface and instruction generator for manufacturing photomasks

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/610,917 US6622295B1 (en) 2000-07-05 2000-07-05 Network-based photomask data entry interface and instruction generator for manufacturing photomasks
US09/610,917 2000-07-05

Publications (3)

Publication Number Publication Date
WO2002003141A2 WO2002003141A2 (en) 2002-01-10
WO2002003141A3 WO2002003141A3 (en) 2002-08-15
WO2002003141A8 true WO2002003141A8 (en) 2003-11-06

Family

ID=24446917

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/021020 WO2002003141A2 (en) 2000-07-05 2001-06-29 Network-based photomask data entry interface and instruction generator for manufacturing photomasks

Country Status (8)

Country Link
US (3) US6622295B1 (en)
EP (1) EP1297455A2 (en)
JP (1) JP4873678B2 (en)
CN (1) CN1251119C (en)
AU (1) AU2001273139A1 (en)
HK (1) HK1058090A1 (en)
TW (1) TWI226555B (en)
WO (1) WO2002003141A2 (en)

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Also Published As

Publication number Publication date
US6622295B1 (en) 2003-09-16
CN1251119C (en) 2006-04-12
US20040054982A1 (en) 2004-03-18
JP2004502972A (en) 2004-01-29
HK1058090A1 (en) 2004-04-30
WO2002003141A2 (en) 2002-01-10
EP1297455A2 (en) 2003-04-02
JP4873678B2 (en) 2012-02-08
WO2002003141A3 (en) 2002-08-15
TWI226555B (en) 2005-01-11
CN1452749A (en) 2003-10-29
US7398509B2 (en) 2008-07-08
US20060074510A1 (en) 2006-04-06
AU2001273139A1 (en) 2002-01-14
US6968530B2 (en) 2005-11-22

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Free format text: IN PCT GAZETTE 02/2002 DUE TO A TECHNICAL PROBLEM AT THE TIME OF INTERNATIONAL PUBLICATION, SOME INFORMATION WAS MISSING (81). THE MISSING INFORMATION NOW APPEARS IN THE CORRECTED VERSION.

Free format text: IN PCT GAZETTE 02/2002 DUE TO A TECHNICAL PROBLEM AT THE TIME OF INTERNATIONAL PUBLICATION, SOME INFORMATION WAS MISSING (81). THE MISSING INFORMATION NOW APPEARS IN THE CORRECTED VERSION.