WO2002005606A3 - Closed-grid bus architecture for wafer interconnect structure - Google Patents

Closed-grid bus architecture for wafer interconnect structure Download PDF

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Publication number
WO2002005606A3
WO2002005606A3 PCT/US2001/021196 US0121196W WO0205606A3 WO 2002005606 A3 WO2002005606 A3 WO 2002005606A3 US 0121196 W US0121196 W US 0121196W WO 0205606 A3 WO0205606 A3 WO 0205606A3
Authority
WO
WIPO (PCT)
Prior art keywords
separate
bus
circuit board
pads
closed
Prior art date
Application number
PCT/US2001/021196
Other languages
French (fr)
Other versions
WO2002005606A2 (en
Inventor
Charles A Miller
John M Long
Original Assignee
Formfactor Inc
Charles A Miller
John M Long
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Formfactor Inc, Charles A Miller, John M Long filed Critical Formfactor Inc
Priority to AU2002218807A priority Critical patent/AU2002218807A1/en
Publication of WO2002005606A2 publication Critical patent/WO2002005606A2/en
Publication of WO2002005606A3 publication Critical patent/WO2002005606A3/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/317Testing of digital circuits
    • G01R31/3181Functional testing
    • G01R31/319Tester hardware, i.e. output processing circuits
    • G01R31/31917Stimuli generation or application of test patterns to the device under test [DUT]
    • G01R31/31926Routing signals to or from the device under test [DUT], e.g. switch matrix, pin multiplexing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/07364Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card with provisions for altering position, number or connection of probe tips; Adapting to differences in pitch
    • G01R1/07378Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card with provisions for altering position, number or connection of probe tips; Adapting to differences in pitch using an intermediate adapter, e.g. space transformers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/56External testing equipment for static stores, e.g. automatic test equipment [ATE]; Interfaces therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/317Testing of digital circuits
    • G01R31/3181Functional testing
    • G01R31/3185Reconfiguring for testing, e.g. LSSD, partitioning
    • G01R31/318505Test of Modular systems, e.g. Wafers, MCM's
    • G01R31/318511Wafer Test
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/04Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
    • G11C29/08Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
    • G11C29/12Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
    • G11C29/18Address generation devices; Devices for accessing memories, e.g. details of addressing circuits
    • G11C29/26Accessing multiple arrays
    • G11C2029/2602Concurrent test
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/023Reduction of cross-talk, noise or electromagnetic interference using auxiliary mounted passive components or auxiliary substances
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0286Programmable, customizable or modifiable circuits
    • H05K1/0287Programmable, customizable or modifiable circuits having an universal lay-out, e.g. pad or land grid patterns or mesh patterns
    • H05K1/0289Programmable, customizable or modifiable circuits having an universal lay-out, e.g. pad or land grid patterns or mesh patterns having a matrix lay-out, i.e. having selectively interconnectable sets of X-conductors and Y-conductors in different planes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/09218Conductive traces
    • H05K2201/09254Branched layout
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing

Abstract

An interconnect structure employs a closed-grid bus to link an integrated circuit tester channel to an array of input/output (I/O) pads on a semiconductor wafer so that the tester channel can concurrently communicate with all of the I/O pads. The interconnect structure includes a circuit board implementing an array of bus nodes, each corresponding to a separate one of the I/O pads. The circuit board includes at least two layers. Traces mounted on a first layer form a set of first daisy-chain buses, each linking all bus nodes of a separate row of the bus node array. Traces mounted on a second circuit board layer form a set of second daisy-chain buses, each linking all bus nodes of a separate column of the bus node array. Vias and other circuit board interconnect ends of the first and second daisy-chain buses so that they form the closed-grid bus. Each bus node is connected though a separate iso lated resistor to a separate contact pad mounted on a surface of the circuit board. A set of spring contacts or probes link each contact pad to a separate one of the I/O pads on the water.
PCT/US2001/021196 2000-07-10 2001-07-02 Closed-grid bus architecture for wafer interconnect structure WO2002005606A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002218807A AU2002218807A1 (en) 2000-07-10 2001-07-02 Closed-grid bus architecture for wafer interconnect structure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/613,531 2000-07-10
US09/613,531 US6603323B1 (en) 2000-07-10 2000-07-10 Closed-grid bus architecture for wafer interconnect structure

Publications (2)

Publication Number Publication Date
WO2002005606A2 WO2002005606A2 (en) 2002-01-17
WO2002005606A3 true WO2002005606A3 (en) 2002-04-18

Family

ID=24457670

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/021196 WO2002005606A2 (en) 2000-07-10 2001-07-02 Closed-grid bus architecture for wafer interconnect structure

Country Status (3)

Country Link
US (6) US6603323B1 (en)
TW (1) TW546865B (en)
WO (1) WO2002005606A2 (en)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5914613A (en) 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
US6256882B1 (en) 1998-07-14 2001-07-10 Cascade Microtech, Inc. Membrane probing system
US6603323B1 (en) * 2000-07-10 2003-08-05 Formfactor, Inc. Closed-grid bus architecture for wafer interconnect structure
DE10143173A1 (en) 2000-12-04 2002-06-06 Cascade Microtech Inc Wafer probe has contact finger array with impedance matching network suitable for wide band
US6856150B2 (en) * 2001-04-10 2005-02-15 Formfactor, Inc. Probe card with coplanar daughter card
US6910089B2 (en) * 2001-06-01 2005-06-21 Hewlett-Packard Development Company, L.P. Fault tolerant bus for highly available storage enclosure
WO2003052435A1 (en) 2001-08-21 2003-06-26 Cascade Microtech, Inc. Membrane probing system
US6798225B2 (en) * 2002-05-08 2004-09-28 Formfactor, Inc. Tester channel to multiple IC terminals
US6784674B2 (en) * 2002-05-08 2004-08-31 Formfactor, Inc. Test signal distribution system for IC tester
US6965244B2 (en) * 2002-05-08 2005-11-15 Formfactor, Inc. High performance probe system
WO2003100445A2 (en) * 2002-05-23 2003-12-04 Cascade Microtech, Inc. Probe for testing a device under test
US6887791B2 (en) * 2002-06-06 2005-05-03 Cadence Design Systems, Inc. Optimization methods for on-chip interconnect geometries suitable for ultra deep sub-micron processes
US6724205B1 (en) * 2002-11-13 2004-04-20 Cascade Microtech, Inc. Probe for combined signals
US7057404B2 (en) * 2003-05-23 2006-06-06 Sharp Laboratories Of America, Inc. Shielded probe for testing a device under test
US6987397B2 (en) * 2003-10-09 2006-01-17 International Business Machines Corporation Method and probe structure for implementing a single probe location for multiple signals
US7154259B2 (en) * 2003-10-23 2006-12-26 Formfactor, Inc. Isolation buffers with controlled equal time delays
US6894524B1 (en) * 2003-10-23 2005-05-17 Lsi Logic Corporation Daisy chain gang testing
KR100960496B1 (en) * 2003-10-31 2010-06-01 엘지디스플레이 주식회사 Rubbing method of liquid crystal display device
JP2007517231A (en) 2003-12-24 2007-06-28 カスケード マイクロテック インコーポレイテッド Active wafer probe
US8581610B2 (en) * 2004-04-21 2013-11-12 Charles A Miller Method of designing an application specific probe card test system
US7307433B2 (en) * 2004-04-21 2007-12-11 Formfactor, Inc. Intelligent probe card architecture
US7453258B2 (en) 2004-09-09 2008-11-18 Formfactor, Inc. Method and apparatus for remotely buffering test channels
WO2006031646A2 (en) 2004-09-13 2006-03-23 Cascade Microtech, Inc. Double sided probing structures
US7157923B2 (en) * 2004-11-18 2007-01-02 Infineon Technologies Ag Method for full wafer contact probing, wafer design and probe card device with reduced probe contacts
US7262624B2 (en) * 2004-12-21 2007-08-28 Formfactor, Inc. Bi-directional buffer for interfacing test system channel
US7414418B2 (en) * 2005-01-07 2008-08-19 Formfactor, Inc. Method and apparatus for increasing operating frequency of a system for testing electronic devices
US7535247B2 (en) 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
US7245134B2 (en) * 2005-01-31 2007-07-17 Formfactor, Inc. Probe card assembly including a programmable device to selectively route signals from channels of a test system controller to probes
US7656172B2 (en) 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
DE102005007103A1 (en) * 2005-02-16 2006-08-24 Infineon Technologies Ag Method for testing a circuit unit to be tested with extraction of verification signals and test device for carrying out the method
JP4800007B2 (en) * 2005-11-11 2011-10-26 ルネサスエレクトロニクス株式会社 Manufacturing method of semiconductor integrated circuit device and probe card
US7489154B2 (en) * 2005-12-16 2009-02-10 Lsi Corporation Testing high frequency signals on a trace
US7764072B2 (en) 2006-06-12 2010-07-27 Cascade Microtech, Inc. Differential signal probing system
US7403028B2 (en) 2006-06-12 2008-07-22 Cascade Microtech, Inc. Test structure and probe for differential signals
US7723999B2 (en) 2006-06-12 2010-05-25 Cascade Microtech, Inc. Calibration structures for differential signal probing
WO2008050916A1 (en) * 2006-10-24 2008-05-02 Sk Chemicals Co., Ltd. Oleanane triterpene saponin compounds which are effective on treatment of dementia and mild cognitive impairment(mci), and improvement of cognitive function
JP5068086B2 (en) * 2007-02-16 2012-11-07 株式会社日立製作所 Storage controller
US20080278182A1 (en) * 2007-05-10 2008-11-13 Agarwal Kanak B Test Structure for Statistical Characterization of Metal and Contact/Via Resistances
TWI335194B (en) * 2007-06-11 2010-12-21 Au Optronics Corp Display and circuit device thereof
US7876114B2 (en) 2007-08-08 2011-01-25 Cascade Microtech, Inc. Differential waveguide probe
KR100891537B1 (en) * 2007-12-13 2009-04-03 주식회사 하이닉스반도체 Substrate for semiconductor package and semiconductor package having the same
US7924035B2 (en) * 2008-07-15 2011-04-12 Formfactor, Inc. Probe card assembly for electronic device testing with DC test resource sharing
US7888957B2 (en) 2008-10-06 2011-02-15 Cascade Microtech, Inc. Probing apparatus with impedance optimized interface
WO2010059247A2 (en) 2008-11-21 2010-05-27 Cascade Microtech, Inc. Replaceable coupon for a probing apparatus
US20100175911A1 (en) * 2009-01-15 2010-07-15 Ralph Morrison High-Speed Two-Layer and Multilayer Circuit Boards
EP2404181B1 (en) * 2009-04-09 2015-08-19 Teradyne, Inc. Automated test equipment employing test signal transmission channel with embedded series isolation resistors
US8907694B2 (en) * 2009-12-17 2014-12-09 Xcerra Corporation Wiring board for testing loaded printed circuit board
US9759772B2 (en) 2011-10-28 2017-09-12 Teradyne, Inc. Programmable test instrument
US10776233B2 (en) * 2011-10-28 2020-09-15 Teradyne, Inc. Programmable test instrument
KR101212253B1 (en) * 2012-08-16 2012-12-13 주식회사 유니테스트 A dut(device under test) tester using redriver
US8810269B2 (en) * 2012-09-28 2014-08-19 Xilinx, Inc. Method of testing a semiconductor structure
US11139217B2 (en) * 2019-09-09 2021-10-05 Bae Systems Information And Electronic Systems Integration Inc. Post-production substrate modification with FIB deposition
TWI824774B (en) * 2022-10-14 2023-12-01 欣興電子股份有限公司 Transmission device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3637502A1 (en) * 1986-11-04 1988-05-11 Messerschmitt Boelkow Blohm Micromechanical test device
US4994735A (en) * 1988-05-16 1991-02-19 Leedy Glenn J Flexible tester surface for testing integrated circuits
US5086271A (en) * 1990-01-12 1992-02-04 Reliability Incorporated Driver system and distributed transmission line network for driving devices under test
US5592632A (en) * 1991-11-05 1997-01-07 Monolithic System Technology, Inc. Defect tolerant integrated circuit subsystem for communication between a module and a bus controller in a wafer-scale integrated circuit system
US6047469A (en) * 1997-11-12 2000-04-11 Luna Family Trust Method of connecting a unit under test in a wireless test fixture

Family Cites Families (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3068403A (en) * 1960-01-27 1962-12-11 Western Electric Co Test probe
US3458807A (en) * 1966-11-14 1969-07-29 Bunker Ramo Test apparatus for determining resistance and overload capability of thin film resistors carried on a substrate
IT1003048B (en) 1972-03-17 1976-06-10 Honeywell Inf Systems DEVICE FOR VERIFYING THE CORRECT BEHAVIOR OF SUCH SEQUENTIAL INTEGRATED CIRCUIT UNITS
US4290015A (en) * 1979-10-18 1981-09-15 Fairchild Camera & Instrument Corp. Electrical validator for a printed circuit board test fixture and a method of validation thereof
US4281449A (en) * 1979-12-21 1981-08-04 Harris Corporation Method for qualifying biased burn-in integrated circuits on a wafer level
JPS6199876A (en) 1984-10-22 1986-05-17 Nec Corp Ic tester
US4862077A (en) * 1987-04-29 1989-08-29 International Business Machines Corporation Probe card apparatus and method of providing same with reconfigurable probe card circuitry
US4894612A (en) * 1987-08-13 1990-01-16 Hypres, Incorporated Soft probe for providing high speed on-wafer connections to a circuit
US4791363A (en) * 1987-09-28 1988-12-13 Logan John K Ceramic microstrip probe blade
CA1278106C (en) * 1988-11-02 1990-12-18 Gordon Glen Rabjohn Tunable microwave wafer probe
JP2585799B2 (en) * 1989-06-30 1997-02-26 株式会社東芝 Semiconductor memory device and burn-in method thereof
US4968931A (en) * 1989-11-03 1990-11-06 Motorola, Inc. Apparatus and method for burning in integrated circuit wafers
US5012187A (en) * 1989-11-03 1991-04-30 Motorola, Inc. Method for parallel testing of semiconductor devices
JPH07123133B2 (en) * 1990-08-13 1995-12-25 株式会社東芝 Film carrier structure
US5219765A (en) * 1990-09-12 1993-06-15 Hitachi, Ltd. Method for manufacturing a semiconductor device including wafer aging, probe inspection, and feeding back the results of the inspection to the device fabrication process
US5148103A (en) * 1990-10-31 1992-09-15 Hughes Aircraft Company Apparatus for testing integrated circuits
EP0494782B1 (en) * 1991-01-11 1997-04-23 Texas Instruments Incorporated Wafer burn-in and test system and method of making the same
US5541524A (en) * 1991-08-23 1996-07-30 Nchip, Inc. Burn-in technologies for unpackaged integrated circuits
JPH06510122A (en) * 1991-08-23 1994-11-10 エヌチップ インコーポレイテッド Burn-in techniques for unpackaged integrated circuits
US5457400A (en) * 1992-04-10 1995-10-10 Micron Technology, Inc. Semiconductor array having built-in test circuit for wafer level testing
US5241266A (en) * 1992-04-10 1993-08-31 Micron Technology, Inc. Built-in test circuit connection for wafer level burnin and testing of individual dies
US5442282A (en) 1992-07-02 1995-08-15 Lsi Logic Corporation Testing and exercising individual, unsingulated dies on a wafer
JPH0627195A (en) 1992-07-08 1994-02-04 Mitsubishi Electric Corp Lsi test device
KR970010656B1 (en) 1992-09-01 1997-06-30 마쯔시다 덴기 산교 가부시끼가이샤 Semiconductor test device, semiconductor test circuit chip and probe card
DE9314259U1 (en) * 1992-09-29 1994-02-10 Tektronix Inc Probe adapter for electronic components
FR2700063B1 (en) * 1992-12-31 1995-02-10 Sgs Thomson Microelectronics Integrated circuit chip testing method and corresponding integrated device.
EP0629867B1 (en) * 1993-06-16 1999-01-27 Nitto Denko Corporation Probe structure
US5654588A (en) * 1993-07-23 1997-08-05 Motorola Inc. Apparatus for performing wafer-level testing of integrated circuits where the wafer uses a segmented conductive top-layer bus structure
US5399505A (en) * 1993-07-23 1995-03-21 Motorola, Inc. Method and apparatus for performing wafer level testing of integrated circuit dice
US5594273A (en) * 1993-07-23 1997-01-14 Motorola Inc. Apparatus for performing wafer-level testing of integrated circuits where test pads lie within integrated circuit die but overly no active circuitry for improved yield
US5453992A (en) * 1993-08-02 1995-09-26 Texas Instruments Incorporated Method and apparatus for selectable parallel execution of test operations
US6064213A (en) 1993-11-16 2000-05-16 Formfactor, Inc. Wafer-level burn-in and test
US6577148B1 (en) 1994-08-31 2003-06-10 Motorola, Inc. Apparatus, method, and wafer used for testing integrated circuits formed on a product wafer
EP0707214A3 (en) * 1994-10-14 1997-04-16 Hughes Aircraft Co Multiport membrane probe for full-wafer testing
US5625299A (en) * 1995-02-03 1997-04-29 Uhling; Thomas F. Multiple lead analog voltage probe with high signal integrity over a wide band width
DE19506325C1 (en) * 1995-02-23 1996-08-14 Siemens Ag Test circuit and test method for functional testing of electronic circuits
US5682472A (en) 1995-03-17 1997-10-28 Aehr Test Systems Method and system for testing memory programming devices
US5608337A (en) 1995-06-07 1997-03-04 Altera Corporation Method and apparatus of testing an integrated circuit device
US5952838A (en) * 1995-06-21 1999-09-14 Sony Corporation Reconfigurable array of test structures and method for testing an array of test structures
US5600257A (en) 1995-08-09 1997-02-04 International Business Machines Corporation Semiconductor wafer test and burn-in
US5736850A (en) 1995-09-11 1998-04-07 Teradyne, Inc. Configurable probe card for automatic test equipment
GB2311175A (en) * 1996-03-15 1997-09-17 Everett Charles Tech PCB / test circuitry connection interface with short circuiting means
US5689515A (en) 1996-04-26 1997-11-18 Teradyne, Inc. High speed serial data pin for automatic test equipment
US5852581A (en) * 1996-06-13 1998-12-22 Micron Technology, Inc. Method of stress testing memory integrated circuits
US5995915A (en) 1997-01-29 1999-11-30 Advanced Micro Devices, Inc. Method and apparatus for the functional verification of digital electronic systems
US5917329A (en) * 1997-04-17 1999-06-29 International Business Machines Corporation Substrate tester having shorting pad actuator method and apparatus
US5894484A (en) * 1997-04-28 1999-04-13 Credence Systems Corporation Integrated circuit tester with distributed instruction processing
US6078187A (en) * 1997-05-23 2000-06-20 Credence Systems Corporation Hemispherical test head for integrated circuit tester employing radially distributed circuit cards
US5794175A (en) 1997-09-09 1998-08-11 Teradyne, Inc. Low cost, highly parallel memory tester
US6107818A (en) * 1998-04-15 2000-08-22 Teradyne, Inc. High speed, real-time, state interconnect for automatic test equipment
US6275962B1 (en) 1998-10-23 2001-08-14 Teradyne, Inc. Remote test module for automatic test equipment
JP4234244B2 (en) * 1998-12-28 2009-03-04 富士通マイクロエレクトロニクス株式会社 Wafer level package and semiconductor device manufacturing method using wafer level package
JP3754616B2 (en) 1998-12-31 2006-03-15 フォームファクター,インコーポレイテッド Semiconductor product die test method and assembly including test die for the test
US6499121B1 (en) 1999-03-01 2002-12-24 Formfactor, Inc. Distributed interface for parallel testing of multiple devices using a single tester channel
US6452411B1 (en) 1999-03-01 2002-09-17 Formfactor, Inc. Efficient parallel testing of integrated circuit devices using a known good device to generate expected responses
US6603854B1 (en) * 2000-02-25 2003-08-05 Teltronics, Inc. System and method for evaluating agents in call center
US6622103B1 (en) * 2000-06-20 2003-09-16 Formfactor, Inc. System for calibrating timing of an integrated circuit wafer tester
US6603323B1 (en) 2000-07-10 2003-08-05 Formfactor, Inc. Closed-grid bus architecture for wafer interconnect structure
JP2003107135A (en) * 2001-09-28 2003-04-09 Mitsubishi Electric Corp Burn-in device
DE10152086B4 (en) * 2001-10-23 2007-03-22 Infineon Technologies Ag A method of testing a plurality of devices on a wafer with a common data line and a common supply line
US6784674B2 (en) * 2002-05-08 2004-08-31 Formfactor, Inc. Test signal distribution system for IC tester
US6812691B2 (en) * 2002-07-12 2004-11-02 Formfactor, Inc. Compensation for test signal degradation due to DUT fault

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3637502A1 (en) * 1986-11-04 1988-05-11 Messerschmitt Boelkow Blohm Micromechanical test device
US4994735A (en) * 1988-05-16 1991-02-19 Leedy Glenn J Flexible tester surface for testing integrated circuits
US5086271A (en) * 1990-01-12 1992-02-04 Reliability Incorporated Driver system and distributed transmission line network for driving devices under test
US5592632A (en) * 1991-11-05 1997-01-07 Monolithic System Technology, Inc. Defect tolerant integrated circuit subsystem for communication between a module and a bus controller in a wafer-scale integrated circuit system
US6047469A (en) * 1997-11-12 2000-04-11 Luna Family Trust Method of connecting a unit under test in a wireless test fixture

Also Published As

Publication number Publication date
US6784677B2 (en) 2004-08-31
US7508227B2 (en) 2009-03-24
US20080024143A1 (en) 2008-01-31
US6603323B1 (en) 2003-08-05
US20090179659A1 (en) 2009-07-16
TW546865B (en) 2003-08-11
US20100264947A1 (en) 2010-10-21
US7960990B2 (en) 2011-06-14
WO2002005606A2 (en) 2002-01-17
US20030169061A1 (en) 2003-09-11
US20050001638A1 (en) 2005-01-06
US7276922B2 (en) 2007-10-02

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