WO2002040938A3 - Height scanning interferometry method and apparatus including phase gap analysis - Google Patents

Height scanning interferometry method and apparatus including phase gap analysis Download PDF

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Publication number
WO2002040938A3
WO2002040938A3 PCT/US2001/051152 US0151152W WO0240938A3 WO 2002040938 A3 WO2002040938 A3 WO 2002040938A3 US 0151152 W US0151152 W US 0151152W WO 0240938 A3 WO0240938 A3 WO 0240938A3
Authority
WO
WIPO (PCT)
Prior art keywords
phase gap
profile
apparatus including
scanning interferometry
including phase
Prior art date
Application number
PCT/US2001/051152
Other languages
French (fr)
Other versions
WO2002040938A2 (en
Inventor
Groot Peter De
James W Kramer
Original Assignee
Zygo Corp
Groot Peter De
James W Kramer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp, Groot Peter De, James W Kramer filed Critical Zygo Corp
Priority to DE60141848T priority Critical patent/DE60141848D1/en
Priority to AT01988481T priority patent/ATE464534T1/en
Priority to JP2002542821A priority patent/JP4279550B2/en
Priority to AU2002241784A priority patent/AU2002241784A1/en
Priority to EP01988481A priority patent/EP1332332B1/en
Publication of WO2002040938A2 publication Critical patent/WO2002040938A2/en
Publication of WO2002040938A3 publication Critical patent/WO2002040938A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means

Abstract

An analysis method for analyzing height-scanning interferometry data from a test surface, the method including: calculating a coherence profile and a phase profile for the test surface based on the data; calculating an experimental phase gap map based on a difference between the phase profile and the coherence profile; filtering the experimental phase gap map to remove noise; and using the filtered phase gap map to improve an estimate for a height profile of the test surface.
PCT/US2001/051152 2000-11-02 2001-11-02 Height scanning interferometry method and apparatus including phase gap analysis WO2002040938A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE60141848T DE60141848D1 (en) 2000-11-02 2001-11-02 METHOD AND DEVICE FOR HEAVY-ABBEASTING INTERFEROMETRY WITH PHASE DIFFERENTIAL ANALYSIS
AT01988481T ATE464534T1 (en) 2000-11-02 2001-11-02 METHOD AND DEVICE FOR HEIGHT-SCANNING INTERFEROMETRY WITH PHASE DIFFERENCE ANALYSIS
JP2002542821A JP4279550B2 (en) 2000-11-02 2001-11-02 Method and apparatus for height scanning interference analysis including phase gap analysis
AU2002241784A AU2002241784A1 (en) 2000-11-02 2001-11-02 Height scanning interferometry method and apparatus including phase gap analysis
EP01988481A EP1332332B1 (en) 2000-11-02 2001-11-02 Height scanning interferometry method and apparatus including phase gap analysis

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US24544300P 2000-11-02 2000-11-02
US60/245,443 2000-11-02

Publications (2)

Publication Number Publication Date
WO2002040938A2 WO2002040938A2 (en) 2002-05-23
WO2002040938A3 true WO2002040938A3 (en) 2002-08-01

Family

ID=22926671

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/051152 WO2002040938A2 (en) 2000-11-02 2001-11-02 Height scanning interferometry method and apparatus including phase gap analysis

Country Status (7)

Country Link
US (1) US6775006B2 (en)
EP (1) EP1332332B1 (en)
JP (1) JP4279550B2 (en)
AT (1) ATE464534T1 (en)
AU (1) AU2002241784A1 (en)
DE (1) DE60141848D1 (en)
WO (1) WO2002040938A2 (en)

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US20030020902A1 (en) * 2001-07-18 2003-01-30 Yonathan Japha Method for inspection of optical elements
US7557929B2 (en) 2001-12-18 2009-07-07 Massachusetts Institute Of Technology Systems and methods for phase measurements
US7365858B2 (en) * 2001-12-18 2008-04-29 Massachusetts Institute Of Technology Systems and methods for phase measurements
KR100984809B1 (en) * 2002-05-02 2010-10-04 지고 코포레이션 Phase gap analysis for scanning interferometry
US7139081B2 (en) * 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7869057B2 (en) 2002-09-09 2011-01-11 Zygo Corporation Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
US7106454B2 (en) * 2003-03-06 2006-09-12 Zygo Corporation Profiling complex surface structures using scanning interferometry
US7271918B2 (en) * 2003-03-06 2007-09-18 Zygo Corporation Profiling complex surface structures using scanning interferometry
US7324214B2 (en) 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
WO2004079295A2 (en) 2003-03-06 2004-09-16 Zygo Corporation Profiling complex surface structures using scanning interferometry
DE10328412B4 (en) * 2003-06-19 2005-11-17 Medizinisches Laserzentrum Lübeck GmbH Method for the interferometric determination of optical plane distances with subnanometer accuracy
US7298494B2 (en) 2003-09-15 2007-11-20 Zygo Corporation Methods and systems for interferometric analysis of surfaces and related applications
TWI335417B (en) 2003-10-27 2011-01-01 Zygo Corp Method and apparatus for thin film measurement
US7884947B2 (en) 2005-01-20 2011-02-08 Zygo Corporation Interferometry for determining characteristics of an object surface, with spatially coherent illumination
WO2006078718A1 (en) 2005-01-20 2006-07-27 Zygo Corporation Interferometer for determining characteristics of an object surface
GB0502677D0 (en) * 2005-02-09 2005-03-16 Taylor Hobson Ltd Apparatus for and a method of determining a surface characteristic
EP1883781B1 (en) * 2005-05-19 2019-08-07 Zygo Corporation Analyzing low-coherence interferometry signals for thin film structures
US7595891B2 (en) * 2005-07-09 2009-09-29 Kla-Tencor Corporation Measurement of the top surface of an object with/without transparent thin films in white light interferometry
WO2007044786A2 (en) 2005-10-11 2007-04-19 Zygo Corporation Interferometry method and system including spectral decomposition
TWI428559B (en) 2006-07-21 2014-03-01 Zygo Corp Compensation of systematic effects in low coherence interferometry
US7924435B2 (en) 2006-12-22 2011-04-12 Zygo Corporation Apparatus and method for measuring characteristics of surface features
US7889355B2 (en) 2007-01-31 2011-02-15 Zygo Corporation Interferometry for lateral metrology
US8072611B2 (en) 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
JP5222954B2 (en) 2007-11-13 2013-06-26 ザイゴ コーポレーション Interferometer using polarization scan
WO2009079334A2 (en) 2007-12-14 2009-06-25 Zygo Corporation Analyzing surface structure using scanning interferometry
US8662962B2 (en) * 2008-06-30 2014-03-04 3M Innovative Properties Company Sandpaper with non-slip coating layer and method of using
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
EP2314982B1 (en) * 2009-10-20 2020-12-02 Mitutoyo Corporation Method and apparatus for determining the height of a number of spatial positions on a sample defining a profile of a surface through white light interferometry
JP5493152B2 (en) * 2010-08-06 2014-05-14 株式会社ミツトヨ Shape measuring device
US8780334B1 (en) * 2011-12-14 2014-07-15 Zygo Corporation Topographical profiling with coherence scanning interferometry
US9020293B2 (en) 2012-02-07 2015-04-28 National Cheung Kung University Integration of filters and phase unwrapping algorithms for removing noise in image reconstruction
EP2662661A1 (en) * 2012-05-07 2013-11-13 Leica Geosystems AG Measuring device with an interferometer and an absorption medium defining a thick line spectrum
LU92173B1 (en) * 2013-03-20 2014-09-22 Iee Sarl Distance determination method
KR101613829B1 (en) * 2014-05-08 2016-04-20 조춘식 Method and Apparatus for 3D Shape Measuring By Using Derivative Moire
US9632038B2 (en) * 2014-08-20 2017-04-25 Kla-Tencor Corporation Hybrid phase unwrapping systems and methods for patterned wafer measurement
US11513080B2 (en) * 2016-09-09 2022-11-29 Hamilton Sundstrand Corporation Inspection systems for additive manufacturing systems
CN108007397A (en) * 2018-01-09 2018-05-08 常州华达科捷光电仪器有限公司 A kind of Laser Measuring Barebone
US10996335B2 (en) * 2018-05-09 2021-05-04 Microsoft Technology Licensing, Llc Phase wrapping determination for time-of-flight camera
US20230168081A1 (en) * 2020-04-10 2023-06-01 The Research Foundation for The State Unviersity of New York System and method for 3d image scanning
CN115943286B (en) * 2020-07-30 2024-02-20 科磊股份有限公司 Adaptive focusing system for scanning metrology tools

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US5438413A (en) * 1993-03-03 1995-08-01 Kla Instruments Corporation Process for measuring overlay misregistration during semiconductor wafer fabrication

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US5402234A (en) * 1992-08-31 1995-03-28 Zygo Corporation Method and apparatus for the rapid acquisition of data in coherence scanning interferometry
US5438413A (en) * 1993-03-03 1995-08-01 Kla Instruments Corporation Process for measuring overlay misregistration during semiconductor wafer fabrication

Also Published As

Publication number Publication date
US6775006B2 (en) 2004-08-10
US20020135775A1 (en) 2002-09-26
JP2004514125A (en) 2004-05-13
JP4279550B2 (en) 2009-06-17
EP1332332A2 (en) 2003-08-06
DE60141848D1 (en) 2010-05-27
EP1332332B1 (en) 2010-04-14
WO2002040938A2 (en) 2002-05-23
AU2002241784A1 (en) 2002-05-27
ATE464534T1 (en) 2010-04-15

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