WO2002049009A3 - Photolithographic method including measurement of the latent image - Google Patents

Photolithographic method including measurement of the latent image Download PDF

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Publication number
WO2002049009A3
WO2002049009A3 PCT/IL2001/001156 IL0101156W WO0249009A3 WO 2002049009 A3 WO2002049009 A3 WO 2002049009A3 IL 0101156 W IL0101156 W IL 0101156W WO 0249009 A3 WO0249009 A3 WO 0249009A3
Authority
WO
WIPO (PCT)
Prior art keywords
latent image
measurement
method including
photolithographic method
including measurement
Prior art date
Application number
PCT/IL2001/001156
Other languages
French (fr)
Other versions
WO2002049009A2 (en
Inventor
Eugene Levich
Sergei Magnitskii
Vladimir Kozenkov
Original Assignee
Consellation Trid Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consellation Trid Inc. filed Critical Consellation Trid Inc.
Priority to AU2002222484A priority Critical patent/AU2002222484A1/en
Priority to AU2002222484A priority patent/AU2002222484A8/en
Publication of WO2002049009A2 publication Critical patent/WO2002049009A2/en
Publication of WO2002049009A3 publication Critical patent/WO2002049009A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Abstract

The contactless nondestructive method for checking and correcting the exposure pattern based upon measurement of the latent image pattern formed in a resist prior to development (figure 1b). The process may be used with various photoresists to form patterns useful as stampers or molds for optical disks, optical cards, diffractive optics and other minute articles. The method includes illumination of the latent image with light which the photoresist is not sensitive to and measurement of the polarization of that light before and after interacting with exposed and unexposed areas of the photoresist.
PCT/IL2001/001156 2000-12-12 2001-12-12 Photolithographic method for fabricating micro-relief optical original discs, cards and other optical elements and micro-miniaturized devices WO2002049009A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2002222484A AU2002222484A1 (en) 2000-12-12 2001-12-12 Photolithographic method including measurement of the latent image
AU2002222484A AU2002222484A8 (en) 2000-12-12 2001-12-12 Photolithographic method including measurement of the latent image

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25453900P 2000-12-12 2000-12-12
US60/254,539 2000-12-12

Publications (2)

Publication Number Publication Date
WO2002049009A2 WO2002049009A2 (en) 2002-06-20
WO2002049009A3 true WO2002049009A3 (en) 2012-01-05

Family

ID=22964665

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2001/001156 WO2002049009A2 (en) 2000-12-12 2001-12-12 Photolithographic method for fabricating micro-relief optical original discs, cards and other optical elements and micro-miniaturized devices

Country Status (2)

Country Link
AU (2) AU2002222484A8 (en)
WO (1) WO2002049009A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101143795B1 (en) 2002-11-20 2012-06-14 소니 주식회사 Method for producing stamper used for producing optical disc and optical disc producing method
DE60336928D1 (en) * 2003-01-09 2011-06-09 Sony Corp MANUFACTURING PROCESS FOR AN ORIGINAL DATA CARRIER FOR THE PRODUCTION OF AN OPTICAL DATA SUPPORT UNGER
WO2006045332A1 (en) * 2004-10-27 2006-05-04 Singulus Mastering B.V. Mastering process with phase-change materials
EP1965383A1 (en) * 2007-03-02 2008-09-03 Singulus Mastering B.V. Diffraction order measurement
US9275671B2 (en) 2011-06-09 2016-03-01 Case Western Reserve University Optical information storage medium

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3920457A (en) * 1974-03-04 1975-11-18 Eastman Kodak Co Photographic leuco-dye compositions containing reductones as stabilizers
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US5283141A (en) * 1992-03-05 1994-02-01 National Semiconductor Photolithography control system and method using latent image measurements
US5376227A (en) * 1992-11-12 1994-12-27 Goldstar Electron Co., Ltd. Multilevel resist process
US5581531A (en) * 1989-08-02 1996-12-03 Hitachi, Ltd. Method of making optical disk master and an optical disk
US5674652A (en) * 1991-02-28 1997-10-07 University Of New Mexico Diffracted light from latent images in photoresist for exposure control
US5703692A (en) * 1995-08-03 1997-12-30 Bio-Rad Laboratories, Inc. Lens scatterometer system employing source light beam scanning means
US5968693A (en) * 1991-03-04 1999-10-19 Lucent Technologies Inc. Lithography tool adjustment utilizing latent imagery
US6025118A (en) * 1998-05-12 2000-02-15 Sony Corporation Glassmastering photoresist read after write method and system
US6051349A (en) * 1997-01-30 2000-04-18 Tokyo Electron Limited Apparatus for coating resist and developing the coated resist

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3920457A (en) * 1974-03-04 1975-11-18 Eastman Kodak Co Photographic leuco-dye compositions containing reductones as stabilizers
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US5581531A (en) * 1989-08-02 1996-12-03 Hitachi, Ltd. Method of making optical disk master and an optical disk
US5674652A (en) * 1991-02-28 1997-10-07 University Of New Mexico Diffracted light from latent images in photoresist for exposure control
US5968693A (en) * 1991-03-04 1999-10-19 Lucent Technologies Inc. Lithography tool adjustment utilizing latent imagery
US5283141A (en) * 1992-03-05 1994-02-01 National Semiconductor Photolithography control system and method using latent image measurements
US5376227A (en) * 1992-11-12 1994-12-27 Goldstar Electron Co., Ltd. Multilevel resist process
US5703692A (en) * 1995-08-03 1997-12-30 Bio-Rad Laboratories, Inc. Lens scatterometer system employing source light beam scanning means
US6051349A (en) * 1997-01-30 2000-04-18 Tokyo Electron Limited Apparatus for coating resist and developing the coated resist
US6025118A (en) * 1998-05-12 2000-02-15 Sony Corporation Glassmastering photoresist read after write method and system

Also Published As

Publication number Publication date
AU2002222484A8 (en) 2012-02-02
WO2002049009A2 (en) 2002-06-20
AU2002222484A1 (en) 2002-06-24

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