WO2002080225A3 - Method and apparatus for growing submicron group iii nitride structures utilizing hvpe techniques - Google Patents

Method and apparatus for growing submicron group iii nitride structures utilizing hvpe techniques Download PDF

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Publication number
WO2002080225A3
WO2002080225A3 PCT/US2002/010158 US0210158W WO02080225A3 WO 2002080225 A3 WO2002080225 A3 WO 2002080225A3 US 0210158 W US0210158 W US 0210158W WO 02080225 A3 WO02080225 A3 WO 02080225A3
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group iii
iii nitride
gallium source
layers
reactor
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PCT/US2002/010158
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French (fr)
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WO2002080225A2 (en
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Denis V Tsvetkov
Andrey E Nikolaev
Vladimir A Dmitriev
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Technologies And Devices Inter
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Priority to JP2002578542A priority Critical patent/JP2004525518A/en
Priority to EP02721646A priority patent/EP1381718A4/en
Priority to AU2002252566A priority patent/AU2002252566A1/en
Publication of WO2002080225A2 publication Critical patent/WO2002080225A2/en
Publication of WO2002080225A3 publication Critical patent/WO2002080225A3/en

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    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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Abstract

A method and apparatus for fabricating thin Group III nitride layers as well as Group III nitride layers that exhibit sharp layer-to-layer interfacesa are provided. According to one aspect, an HVPC reactor (103) includes one or more gas inlet tubes adjacent to the growth zone, thus allowing fine control of the delivery of reactive gases to the substrate surface. According to another aspect, an HVPE reactor (103) includes both a growth zone (305) and a growth interruption aone (205). According to another aspect, an HVPE reactor (1030) includes a slow growth rate gallium source (813) in conjunction with a conventional gallium source (813) allows a device structure to be fabricated during a single furnace run that includes both thick layers (i.e., utilizing the conventional gallium source (813)) and thin layers (i.e., utilizing the slow growth rate gallium source (813)).
PCT/US2002/010158 2001-03-30 2002-03-28 Method and apparatus for growing submicron group iii nitride structures utilizing hvpe techniques WO2002080225A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002578542A JP2004525518A (en) 2001-03-30 2002-03-28 Method and apparatus for growing submicron group III nitride structures using HVPE technology
EP02721646A EP1381718A4 (en) 2001-03-30 2002-03-28 Method and apparatus for growing submicron group iii nitride structures utilizing hvpe techniques
AU2002252566A AU2002252566A1 (en) 2001-03-30 2002-03-28 Method and apparatus for growing submicron group iii nitride structures utilizing hvpe techniques

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US28060401P 2001-03-30 2001-03-30
US60/280,604 2001-03-30
US28374301P 2001-04-13 2001-04-13
US60/283,743 2001-04-13

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WO2002080225A2 WO2002080225A2 (en) 2002-10-10
WO2002080225A3 true WO2002080225A3 (en) 2003-02-27

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US (6) US6656272B2 (en)
EP (2) EP2400046A1 (en)
JP (1) JP2004525518A (en)
AU (1) AU2002252566A1 (en)
WO (1) WO2002080225A2 (en)

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