WO2002082600A3 - Q-switched cavity dumped co2 laser for material processing - Google Patents
Q-switched cavity dumped co2 laser for material processing Download PDFInfo
- Publication number
- WO2002082600A3 WO2002082600A3 PCT/US2002/010766 US0210766W WO02082600A3 WO 2002082600 A3 WO2002082600 A3 WO 2002082600A3 US 0210766 W US0210766 W US 0210766W WO 02082600 A3 WO02082600 A3 WO 02082600A3
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- Prior art keywords
- switched
- laser
- cavity dumped
- eom
- electro
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09702—Details of the driver electronics and electric discharge circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1061—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a variable absorption device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
- H01S3/1075—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect for optical deflection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1103—Cavity dumping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/115—Q-switching using intracavity electro-optic devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2366—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media comprising a gas as the active medium
Abstract
This disclosure discusses techniques for obtaining wavelength selected simultaneously super pulsed Q-switched and cavity dumped laser pulses utilizing high optical damage threshold electro-optic modulators, maintaining a zero DC voltage bias on the CdTe electro-optic modulator (142) (EOM) so as to minimize polarization variations depending on the location of the laser beam (402) propagating through the CdSe EOM crystal (142), as well as the addition of one or more laser amplifiers in a compact package and the use of simultaneous gain switched, Q-switched and cavity dumped operation of CO2 lasers for generating shorter pulses and higher peak power for the hole drilling, engraving and perforation applications.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US28143101P | 2001-04-04 | 2001-04-04 | |
US60/281,431 | 2001-04-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002082600A2 WO2002082600A2 (en) | 2002-10-17 |
WO2002082600A3 true WO2002082600A3 (en) | 2003-05-30 |
Family
ID=23077262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/010766 WO2002082600A2 (en) | 2001-04-04 | 2002-04-04 | Q-switched cavity dumped co2 laser for material processing |
Country Status (2)
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US (2) | US6697408B2 (en) |
WO (1) | WO2002082600A2 (en) |
Families Citing this family (103)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002082596A2 (en) * | 2001-04-04 | 2002-10-17 | Coherent Deos | Q-switched co2 laser for material processing |
US6697408B2 (en) * | 2001-04-04 | 2004-02-24 | Coherent, Inc. | Q-switched cavity dumped CO2 laser for material processing |
US7439530B2 (en) * | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
DE10125779A1 (en) * | 2001-05-26 | 2003-01-02 | Deutsche Telekom Ag | Method and device for the intensity-dependent attenuation of light |
JP3838064B2 (en) * | 2001-09-28 | 2006-10-25 | 松下電器産業株式会社 | Laser control method |
JP3903761B2 (en) * | 2001-10-10 | 2007-04-11 | 株式会社日立製作所 | Laser annealing method and laser annealing apparatus |
US8148989B2 (en) * | 2002-03-11 | 2012-04-03 | Keith Kopp | Ferromagnetic detection enhancer compatible with magnetic resonance |
CN100335259C (en) * | 2002-03-12 | 2007-09-05 | 三星钻石工业股份有限公司 | Method and system for machining fragile material |
WO2004000098A2 (en) | 2002-06-19 | 2003-12-31 | Palomar Medical Technologies, Inc. | Method and apparatus for treatment of cutaneous and subcutaneous conditions |
US6969845B2 (en) * | 2002-12-20 | 2005-11-29 | Textron Systems Corporation | System and processes for causing the simultaneity of events including controlling a pulse repetition frequency of a pulsed laser for disabling a scanning imaging system |
US7039079B2 (en) * | 2003-03-14 | 2006-05-02 | Coherent, Inc. | Pulsed CO2 laser including an optical damage resistant electro-optical switching arrangement |
US7361171B2 (en) | 2003-05-20 | 2008-04-22 | Raydiance, Inc. | Man-portable optical ablation system |
US9022037B2 (en) | 2003-08-11 | 2015-05-05 | Raydiance, Inc. | Laser ablation method and apparatus having a feedback loop and control unit |
US8173929B1 (en) | 2003-08-11 | 2012-05-08 | Raydiance, Inc. | Methods and systems for trimming circuits |
US8921733B2 (en) | 2003-08-11 | 2014-12-30 | Raydiance, Inc. | Methods and systems for trimming circuits |
US20050087522A1 (en) * | 2003-10-24 | 2005-04-28 | Yunlong Sun | Laser processing of a locally heated target material |
US20050088510A1 (en) * | 2003-10-24 | 2005-04-28 | Shlomo Assa | Low angle optics and reversed optics |
WO2005058536A1 (en) * | 2003-12-18 | 2005-06-30 | Retainagroup Limited | Portable laser apparatus for marking an object |
US20050255406A1 (en) * | 2004-05-11 | 2005-11-17 | Shlomo Assa | Marking on a thin film |
US7590156B1 (en) * | 2004-05-17 | 2009-09-15 | University Of Central Florida Research Foundation, Inc. | High intensity MHz mode-locked laser |
US7433373B2 (en) * | 2004-06-15 | 2008-10-07 | National Tsing Hua University | Actively Q-switched laser system using quasi-phase-matched electro-optic Q-switch |
DE102004031740B4 (en) * | 2004-06-30 | 2008-07-31 | Raylase Ag | Method for controlling a laser for generating a gray scale image and laser system |
US7280569B2 (en) * | 2004-07-08 | 2007-10-09 | Coherent, Inc. | Electro-optical modulator module for CO2 laser Q-switching, mode-locking, and cavity dumping |
US7263116B2 (en) * | 2004-08-05 | 2007-08-28 | Coherent, Inc. | Dielectric coupled CO2 slab laser |
EP1778431A1 (en) * | 2004-08-19 | 2007-05-02 | Retainagroup Limited | Method and apparatus for marking a vehicle |
US7508850B2 (en) * | 2004-09-02 | 2009-03-24 | Coherent, Inc. | Apparatus for modifying CO2 slab laser pulses |
JP5242758B2 (en) * | 2004-10-07 | 2013-07-24 | ギガフォトン株式会社 | Driver laser for extreme ultraviolet light source device and LPP type extreme ultraviolet light source device |
JP5100990B2 (en) * | 2004-10-07 | 2012-12-19 | ギガフォトン株式会社 | Driver laser for extreme ultraviolet light source device and LPP type extreme ultraviolet light source device |
US20060189091A1 (en) * | 2004-11-11 | 2006-08-24 | Bo Gu | Method and system for laser hard marking |
US8506087B2 (en) | 2005-01-19 | 2013-08-13 | William R. Benner, Jr. | Laser projector having safety lens for audience scanning |
AU2006206400B2 (en) * | 2005-01-19 | 2010-10-28 | William R. Benner Jr. | Laser projector for audience scanning |
US7292616B2 (en) * | 2005-02-09 | 2007-11-06 | Ultratech, Inc. | CO2 laser stabilization systems and methods |
US7394479B2 (en) * | 2005-03-02 | 2008-07-01 | Marken Corporation | Pulsed laser printing |
US7856985B2 (en) | 2005-04-22 | 2010-12-28 | Cynosure, Inc. | Method of treatment body tissue using a non-uniform laser beam |
JP2006309861A (en) * | 2005-04-27 | 2006-11-09 | Sharp Corp | Optical integrated unit and optical pickup device |
EP1736272B9 (en) * | 2005-06-21 | 2009-08-12 | Fameccanica.Data S.p.A. | A method and device for laser cutting articles, in particular sanitary products and components thereof, with a laser spot diameter between 0.1 and 0.3 mm |
US8135050B1 (en) | 2005-07-19 | 2012-03-13 | Raydiance, Inc. | Automated polarization correction |
US20070031156A1 (en) * | 2005-07-29 | 2007-02-08 | Robotham W S Jr | Amplification of TTL RF oscillator signals with digital logic and power switching technology for CO2 laser RF power supplies |
US20070024011A1 (en) * | 2005-07-29 | 2007-02-01 | Raymond Michaud | Thermally stable vacuum enclosure seal design for CO2 lasers |
US20080002751A1 (en) * | 2005-08-10 | 2008-01-03 | Gongxue Hua | High damage threshold Q-switched CO2 laser |
US7453918B2 (en) * | 2005-08-11 | 2008-11-18 | Coherent, Inc. | Pulsed RF high pressure CO2 lasers |
US7327769B2 (en) | 2005-10-18 | 2008-02-05 | Coherent, Inc. | Injection locking Q-switched and Q-switched cavity dumped CO2 lasers for extreme UV generation |
DE102005061716A1 (en) * | 2005-12-22 | 2007-07-05 | BME Meßgeräte Entwicklung KG | Pockels cell drive circuit for rapid variation of the pulse amplitude of short or ultrashort laser pulses |
US9130344B2 (en) | 2006-01-23 | 2015-09-08 | Raydiance, Inc. | Automated laser tuning |
US8189971B1 (en) | 2006-01-23 | 2012-05-29 | Raydiance, Inc. | Dispersion compensation in a chirped pulse amplification system |
US7444049B1 (en) | 2006-01-23 | 2008-10-28 | Raydiance, Inc. | Pulse stretcher and compressor including a multi-pass Bragg grating |
US8232687B2 (en) * | 2006-04-26 | 2012-07-31 | Raydiance, Inc. | Intelligent laser interlock system |
DE102006006589B4 (en) * | 2006-02-13 | 2013-02-21 | Jenoptik Laser Gmbh | Laser and method for generating pulsed laser radiation |
US7822347B1 (en) | 2006-03-28 | 2010-10-26 | Raydiance, Inc. | Active tuning of temporal dispersion in an ultrashort pulse laser system |
US7929579B2 (en) * | 2006-08-02 | 2011-04-19 | Cynosure, Inc. | Picosecond laser apparatus and methods for its operation and use |
US7586957B2 (en) * | 2006-08-02 | 2009-09-08 | Cynosure, Inc | Picosecond laser apparatus and methods for its operation and use |
JP5086677B2 (en) * | 2006-08-29 | 2012-11-28 | ギガフォトン株式会社 | Driver laser for extreme ultraviolet light source device |
US7720141B2 (en) * | 2006-09-05 | 2010-05-18 | Advanced Micro Devices, Inc. | Decision feedback restore of DC signals in a receiver |
US9029731B2 (en) * | 2007-01-26 | 2015-05-12 | Electro Scientific Industries, Inc. | Methods and systems for laser processing continuously moving sheet material |
US7817685B2 (en) * | 2007-01-26 | 2010-10-19 | Electro Scientific Industries, Inc. | Methods and systems for generating pulse trains for material processing |
US7727796B2 (en) * | 2007-04-26 | 2010-06-01 | Oxford Instruments Analytical Oy | Method for patterning detector crystal using Q-switched laser |
US7903699B2 (en) * | 2007-05-24 | 2011-03-08 | Coherent, Inc. | Acousto-optically Q-switched CO2 laser |
US7903326B2 (en) | 2007-11-30 | 2011-03-08 | Radiance, Inc. | Static phase mask for high-order spectral phase control in a hybrid chirped pulse amplifier system |
US8332661B2 (en) * | 2008-09-11 | 2012-12-11 | Mostovych Andrew N | Method and apparatus for prevention of tampering, unauthorized use, and unauthorized extraction of information from microdevices |
US8498538B2 (en) | 2008-11-14 | 2013-07-30 | Raydiance, Inc. | Compact monolithic dispersion compensator |
JP5474576B2 (en) | 2009-01-14 | 2014-04-16 | ギガフォトン株式会社 | LASER OPTICAL AMPLIFIER AND LASER DEVICE USING THE SAME |
US10307862B2 (en) * | 2009-03-27 | 2019-06-04 | Electro Scientific Industries, Inc | Laser micromachining with tailored bursts of short laser pulses |
JP2010258198A (en) * | 2009-04-24 | 2010-11-11 | Fujifilm Corp | Mode-locked solid-state laser apparatus |
RU2589274C2 (en) * | 2010-03-26 | 2016-07-10 | ЛОРЕНС ЛИВЕРМОР НЭШНЛ СЕКЬЮРИТИ, ЭлЭлСи | Architecture of multipass amplifier for high-power laser systems |
FR2958817B1 (en) * | 2010-04-08 | 2012-12-07 | Univ Limoges | IMPULSIVE SUPERCONTINUUM SOURCE WITH VARIABLE PULSE DURATION |
WO2012021748A1 (en) | 2010-08-12 | 2012-02-16 | Raydiance, Inc. | Polymer tubing laser micromachining |
WO2012037465A1 (en) | 2010-09-16 | 2012-03-22 | Raydiance, Inc. | Laser based processing of layered materials |
KR101918789B1 (en) * | 2010-10-29 | 2018-11-14 | 로렌스 리버모어 내쇼날 시큐리티, 엘엘시 | Method and system for compact efficient laser architecture |
JP2012109417A (en) | 2010-11-17 | 2012-06-07 | Komatsu Ltd | Slab type amplification device, laser device, and extreme ultraviolet light source device |
WO2012066402A1 (en) | 2010-11-17 | 2012-05-24 | Gigaphoton Inc. | Slab amplification device, laser apparatus, and extreme ultraviolet light generation system |
DE102011075126A1 (en) * | 2011-05-03 | 2012-11-08 | Trumpf Laser Gmbh + Co. Kg | Cavity dumping laser resonator and method for generating laser pulses |
US10239160B2 (en) | 2011-09-21 | 2019-03-26 | Coherent, Inc. | Systems and processes that singulate materials |
DE102012002470A1 (en) | 2012-02-03 | 2013-08-08 | Iai Industrial Systems B.V. | CO2 laser with fast power control |
US8767291B2 (en) * | 2012-03-16 | 2014-07-01 | Kla-Tencor Corporation | Suppression of parasitic optical feedback in pulse laser systems |
JP2013229553A (en) * | 2012-03-30 | 2013-11-07 | Gigaphoton Inc | Laser device and extreme ultraviolet light generation device |
US8731015B2 (en) | 2012-03-30 | 2014-05-20 | Coherent, Inc. | Compact CO2 slab-laser |
KR102342629B1 (en) | 2012-04-18 | 2021-12-22 | 싸이노슈어, 엘엘씨 | Picosecond laser apparatus and methods for treating target tissues with same |
US10054676B2 (en) * | 2012-05-03 | 2018-08-21 | Los Alamos National Security, Llc | Acoustic camera |
WO2014022681A1 (en) | 2012-08-01 | 2014-02-06 | Gentex Corporation | Assembly with laser induced channel edge and method thereof |
WO2014080822A1 (en) * | 2012-11-20 | 2014-05-30 | 国立大学法人九州大学 | Laser machining apparatus and laser machining method |
TWI469462B (en) | 2012-11-30 | 2015-01-11 | Ind Tech Res Inst | The apparatus of ultra short pulse laser generation through spectrally sideband gain manipulation |
US10285757B2 (en) | 2013-03-15 | 2019-05-14 | Cynosure, Llc | Picosecond optical radiation systems and methods of use |
PL2800212T3 (en) * | 2013-05-03 | 2019-07-31 | Fotona D.O.O. | Method for operating a laser system |
DE102013212099B4 (en) * | 2013-06-25 | 2020-03-05 | Trumpf Laser Gmbh | High voltage modulation without following error |
RU2548592C2 (en) * | 2013-07-16 | 2015-04-20 | Открытое акционерное общество "Научно-производственное объединение "Карат" (ОАО "НПО КАРАТ") | Pulsed two-mode solid-state laser |
US8995052B1 (en) * | 2013-09-09 | 2015-03-31 | Coherent Kaiserslautern GmbH | Multi-stage MOPA with first-pulse suppression |
US9414498B2 (en) | 2013-09-20 | 2016-08-09 | Coherent, Inc. | Via-hole drilling in a printed circuit board using a carbon monoxide laser |
WO2015143423A1 (en) * | 2014-03-21 | 2015-09-24 | Lightwave International, Inc. | Laser projection system |
DE102014111774A1 (en) * | 2014-08-18 | 2016-02-18 | AMOtronics UG | Arrangement and method for modulating laser pulses |
US9925620B2 (en) | 2015-08-19 | 2018-03-27 | Coherent, Inc. | Carbon monoxide laser machining system |
US10641807B2 (en) * | 2015-10-16 | 2020-05-05 | Jx Nippon Mining & Metals Corporation | Optical modulator and electric field sensor |
US10274806B2 (en) | 2015-11-06 | 2019-04-30 | Coherent, Inc. | Pulse-dividing method and apparatus for a pulsed carbon monoxide laser |
US10423047B2 (en) | 2016-07-27 | 2019-09-24 | Coherent, Inc. | Laser machining method and apparatus |
KR101900413B1 (en) * | 2017-04-24 | 2018-09-20 | 한국과학기술연구원 | Single pulse laser apparatus |
DE102017208705A1 (en) * | 2017-05-23 | 2018-11-29 | Robert Bosch Gmbh | Transmitting unit for emitting radiation into the environment |
GB2552636B (en) * | 2017-11-22 | 2019-01-09 | Rofin Sinar Uk Ltd | Polarisation and mode selection technique for a laser |
KR102627248B1 (en) | 2018-02-26 | 2024-01-19 | 싸이노슈어, 엘엘씨 | Q-switched cavity dumping subnanosecond laser |
US10583668B2 (en) | 2018-08-07 | 2020-03-10 | Markem-Imaje Corporation | Symbol grouping and striping for wide field matrix laser marking |
US10855047B1 (en) | 2018-11-06 | 2020-12-01 | United States Of America As Represented By The Secretary Of The Air Force | Passively cavity-dumped laser apparatus, system and methods |
CN111864517B (en) * | 2020-07-29 | 2023-04-18 | 中国科学院长春光学精密机械与物理研究所 | Laser pulse waveform purification method and system |
RU206918U1 (en) * | 2021-04-26 | 2021-10-01 | Общество с ограниченной ответственностью "КрОМ" | Device for controlling the Q-factor of a laser resonator with the formation of a subnanosecond pulse front |
CN114512297B (en) * | 2022-01-17 | 2022-12-02 | 华中科技大学 | Magnetic gain switch and method based on flat-top pulse magnetic field |
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3820038A (en) * | 1973-02-09 | 1974-06-25 | Atomic Energy Commission | Method and apparatus for producing isolated laser pulses having a fast rise time |
US4174504A (en) * | 1978-01-25 | 1979-11-13 | United Technologies Corporation | Apparatus and method for cavity dumping a Q-switched laser |
US4176327A (en) * | 1978-01-25 | 1979-11-27 | United Technologies Corporation | Method for cavity dumping a Q-switched laser |
US4498179A (en) * | 1982-07-30 | 1985-02-05 | The Unites States Of America As Represented By The Secretary Of The Army | Modulated infrared laser with two coupled cavities |
US4499582A (en) * | 1980-04-05 | 1985-02-12 | Heinrich Karning | Laser system |
US5365532A (en) * | 1992-10-09 | 1994-11-15 | Hughes Aircraft Company | Cavity dump laser amplitude stabilization |
US6061377A (en) * | 1996-12-04 | 2000-05-09 | Thomson-Csf | Light amplifier device with two incident beams |
Family Cites Families (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3571744A (en) * | 1967-03-23 | 1971-03-23 | Trw Inc | Lasers incorporating time variable reflectivity |
US3577097A (en) * | 1967-11-28 | 1971-05-04 | Trw Inc | Laser with combined q-switch and synchronized cavity dump circuit |
US3581230A (en) * | 1969-01-27 | 1971-05-25 | United Aircraft Corp | Passive q-switch and modulator for co{hd 2 {l lasers |
US3676504A (en) * | 1970-09-10 | 1972-07-11 | Reynolds Tobacco Co R | Preparation of a terepene alcohol |
US3711791A (en) * | 1971-05-03 | 1973-01-16 | A Erickson | Frustrated total internal reflection laser q-switch |
US3772611A (en) | 1971-12-27 | 1973-11-13 | Bell Telephone Labor Inc | Waveguide gas laser devices |
US4030839A (en) | 1972-04-20 | 1977-06-21 | Glenn Edward Rickert | Frequency selective reflex sight |
US3790278A (en) * | 1972-04-26 | 1974-02-05 | United Aircraft Corp | Peaked power coherent pulsed laser transmitter/receiver system |
US3824717A (en) * | 1973-07-30 | 1974-07-23 | Hughes Aircraft Co | Enhanced field of view parametric image converter |
US4197513A (en) * | 1977-12-09 | 1980-04-08 | Quanta Ray Inc. | Active Q-switched high power single mode laser |
US4169251A (en) | 1978-01-16 | 1979-09-25 | Hughes Aircraft Company | Waveguide gas laser with high frequency transverse discharge excitation |
US4393517A (en) * | 1980-09-30 | 1983-07-12 | The United States Of America As Represented By The Secretary Of The Army | Pulse code modulation of laser pulse tail |
US4363126A (en) | 1980-12-10 | 1982-12-07 | United Technologies Corporation | Tuned-circuit RF-excited laser |
US4660204A (en) * | 1984-08-02 | 1987-04-21 | Hughes Aircraft Company | CO2 TEA laser utilizing an intra-cavity prism Q-switch |
US4675872A (en) * | 1985-09-30 | 1987-06-23 | Harris Corporation | Driver unit for a laser Q-switch |
US4719639B1 (en) | 1987-01-08 | 1994-06-28 | Boreal Laser Inc | Carbon dioxide slab laser |
US4815094A (en) | 1987-05-22 | 1989-03-21 | California Laboratories, Inc. | Multiply folded laser systems |
US4787090A (en) | 1988-03-28 | 1988-11-22 | United Technologies Corporation | Compact distributed inductance RF-excited waveguide gas laser arrangement |
US4891819A (en) | 1989-01-17 | 1990-01-02 | Sutter Jr Leroy V | RF excited laser with internally folded resonator |
JPH02211684A (en) | 1989-02-13 | 1990-08-22 | Toshiba Corp | Q-switch laser device |
IT1249208B (en) * | 1990-06-07 | 1995-02-20 | Ausimont Srl | PROCESS FOR THE PREPARATION OF HALOGENATED 1,3-DIOSSOLANS AND NEW PRODUCTS OBTAINED |
US5220576A (en) | 1990-09-26 | 1993-06-15 | Seimans Aktiengesellschaft | Slab or stripline laser |
DE4125443C2 (en) | 1991-08-01 | 1998-01-15 | Man Technologie Gmbh | Optically pumped far infrared laser |
US5177748A (en) | 1991-08-06 | 1993-01-05 | California Institute Of Technology | In phase coupled strip waveguide CO2 laser |
US5329539A (en) * | 1991-10-28 | 1994-07-12 | Lightwave Electronics | Efficient laser configuration |
WO1993010583A1 (en) * | 1991-11-22 | 1993-05-27 | Omnichrome Corporation | Liquid stabilized internal mirror lasers |
US5327442A (en) * | 1992-02-19 | 1994-07-05 | Coherent, Inc. | Solid state laser with dual cooling loops |
DE9217640U1 (en) | 1992-12-23 | 1994-09-29 | Rofin Sinar Laser Gmbh | Slab or stripline lasers |
EP0608458B1 (en) | 1993-01-29 | 2002-01-02 | Citizen Watch Co. Ltd. | A method of operating an optical modulator device |
US5972737A (en) * | 1993-04-14 | 1999-10-26 | Frank J. Polese | Heat-dissipating package for microcircuit devices and process for manufacture |
US5353297A (en) | 1993-07-12 | 1994-10-04 | Coherent, Inc. | Gas slab laser with folded resonator structure |
US5491579A (en) | 1994-05-31 | 1996-02-13 | The United States Of America As Represented By The Secretary Of The Navy | Broadband thermal optical limiter for the protection of eyes and sensors |
US5748663A (en) | 1994-06-08 | 1998-05-05 | Qsource, Inc. | Retangular discharge gas laser |
US5610936A (en) | 1995-09-28 | 1997-03-11 | Technology Development Corporation | Extended multiply folded optical paths |
US5982790A (en) * | 1997-01-16 | 1999-11-09 | Lightwave Electronics Corporation | System for reducing pulse-to-pulse energy variation in a pulsed laser |
US6192061B1 (en) * | 1997-03-14 | 2001-02-20 | Demaria Electrooptics Systems, Inc. | RF excited waveguide laser |
US5881087A (en) | 1997-04-30 | 1999-03-09 | Universal Laser Systems, Inc. | Gas laser tube design |
US6072815A (en) * | 1998-02-27 | 2000-06-06 | Litton Systems, Inc. | Microlaser submount assembly and associates packaging method |
US6252726B1 (en) * | 1999-09-02 | 2001-06-26 | Lightlogic, Inc. | Dual-enclosure optoelectronic packages |
KR100346836B1 (en) * | 2000-06-07 | 2002-08-03 | 삼성전자 주식회사 | Delay locked loop circuit having duty cycle correction function and delay locking method |
US6788722B1 (en) | 2000-07-10 | 2004-09-07 | Coherent, Inc. | High power waveguide laser |
US6697408B2 (en) * | 2001-04-04 | 2004-02-24 | Coherent, Inc. | Q-switched cavity dumped CO2 laser for material processing |
WO2002082596A2 (en) * | 2001-04-04 | 2002-10-17 | Coherent Deos | Q-switched co2 laser for material processing |
TW528636B (en) * | 2001-05-09 | 2003-04-21 | Electro Scient Ind Inc | Micromachining with high-energy, intra-cavity Q-switched CO2 laser pulses |
US6683893B2 (en) | 2001-10-25 | 2004-01-27 | Coherent, Inc. | Q-switching method for pulse train generation |
-
2002
- 2002-04-04 US US10/116,360 patent/US6697408B2/en not_active Expired - Fee Related
- 2002-04-04 WO PCT/US2002/010766 patent/WO2002082600A2/en not_active Application Discontinuation
-
2003
- 2003-12-19 US US10/742,563 patent/US7058093B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3820038A (en) * | 1973-02-09 | 1974-06-25 | Atomic Energy Commission | Method and apparatus for producing isolated laser pulses having a fast rise time |
US4174504A (en) * | 1978-01-25 | 1979-11-13 | United Technologies Corporation | Apparatus and method for cavity dumping a Q-switched laser |
US4176327A (en) * | 1978-01-25 | 1979-11-27 | United Technologies Corporation | Method for cavity dumping a Q-switched laser |
US4499582A (en) * | 1980-04-05 | 1985-02-12 | Heinrich Karning | Laser system |
US4498179A (en) * | 1982-07-30 | 1985-02-05 | The Unites States Of America As Represented By The Secretary Of The Army | Modulated infrared laser with two coupled cavities |
US5365532A (en) * | 1992-10-09 | 1994-11-15 | Hughes Aircraft Company | Cavity dump laser amplitude stabilization |
US6061377A (en) * | 1996-12-04 | 2000-05-09 | Thomson-Csf | Light amplifier device with two incident beams |
Also Published As
Publication number | Publication date |
---|---|
US20020167974A1 (en) | 2002-11-14 |
US7058093B2 (en) | 2006-06-06 |
US20040146075A1 (en) | 2004-07-29 |
WO2002082600A2 (en) | 2002-10-17 |
US6697408B2 (en) | 2004-02-24 |
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