WO2002091078B1 - Methods and apparatus employing an index matching medium - Google Patents

Methods and apparatus employing an index matching medium

Info

Publication number
WO2002091078B1
WO2002091078B1 PCT/US2002/014523 US0214523W WO02091078B1 WO 2002091078 B1 WO2002091078 B1 WO 2002091078B1 US 0214523 W US0214523 W US 0214523W WO 02091078 B1 WO02091078 B1 WO 02091078B1
Authority
WO
WIPO (PCT)
Prior art keywords
medium
light
optical surface
liquid
optical
Prior art date
Application number
PCT/US2002/014523
Other languages
French (fr)
Other versions
WO2002091078A1 (en
Inventor
Michael Switkes
Mordechai Rothschild
Original Assignee
Massachusetts Inst Technology
Michael Switkes
Mordechai Rothschild
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Inst Technology, Michael Switkes, Mordechai Rothschild filed Critical Massachusetts Inst Technology
Publication of WO2002091078A1 publication Critical patent/WO2002091078A1/en
Publication of WO2002091078B1 publication Critical patent/WO2002091078B1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2041Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/33Immersion oils, or microscope systems or objectives for use with immersion fluids

Abstract

A perfluoropolyether (PFPE) index matching medium (120). The medium (120) may be used with electromagnetic radiation (152) having a wavelength below 220nm. The medium (120) may be used between two optical surfaces (115 and 150) or between an optical surface (115) and an object (150). The medium (120) may be used as an immersion fluid in an immersion lithographic system (100).

Claims

AMENDED CLAIMS[received by the International Bureau on 2 December 2002 (02.12.02); original claims 1-16 replaced by amended claims 1-16 (2 pages)]
1. An optical system for transmitting light, comprising: an optical surface; and a liquid PFPE medium contacting at least a portion of the optical surface, the liquid PFPE medium configured to transmit at least a portion of the light.
2. The optical system of claim 1, further comprising a second optical surface, the liquid PFPE medium contacting at least a portion of the second optical surface.
3. The optical system of claim 1, wherein the optical system is a collection optical system.
4. The optical system of claim 1, wherein the optical system is a projection optical system.
5. An immersion lithographic system for projecting electromagnetic radiation onto a resist covering at least a portion of a substrate, comprising: an electromagnetic radiation source providing light having a wavelength less than 220 nanometers; an optical surface; and an index matching medium contacting the optical surface and configured and arranged to contact the resist, the optical surface and index matching medium configured and arranged to transmit at least a portion of the light to the resist.
6. The immersion lithographic system of claim 5, wherein the index matching medium is characterized by a transmission of the light, and the transmission remains substantially constant during an exposure of the resist.
7. The immersion lithographic system of claim 5, wherein the medium is substantially transparent to the light. 16
8. The immersion lithographic system of claim 5, wherein the medium is substantially transparent after a dose of approximately 10 J/cm2.
9. The immersion lithographic system of claim 5, wherein the medium is a liquid.
10. The immersion lithographic system of claim 9, wherein the liquid is a PFPE.
11. The immersion lithographic system of claim 10, wherein the liquid is Fomblin Y ®.
12. The immersion lithographic system of claim 10, wherein the liquid is Fomblin Z ®.
13. A method of transmitting light, comprising an act of: transmitting light through a liquid PFPE medium.
14. The method of claim 13, wherein the light has a wavelength less than 220 nm.
15. The method of claim 13, further comprising transmitting the light through at least a portion of a first optical surface, wherein the first optical surface is in contact with the liquid PFPE medium.
16. The method of claim 15, further comprising transmitting the light through at least a portion of a second optical surface, wherein the second optical surface is in contact with the liquid PFPE medium.
PCT/US2002/014523 2001-05-07 2002-05-07 Methods and apparatus employing an index matching medium WO2002091078A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US28921701P 2001-05-07 2001-05-07
US60/289,217 2001-05-07

Publications (2)

Publication Number Publication Date
WO2002091078A1 WO2002091078A1 (en) 2002-11-14
WO2002091078B1 true WO2002091078B1 (en) 2003-04-03

Family

ID=23110550

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/014523 WO2002091078A1 (en) 2001-05-07 2002-05-07 Methods and apparatus employing an index matching medium

Country Status (2)

Country Link
US (1) US20020163629A1 (en)
WO (1) WO2002091078A1 (en)

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