WO2002101888A3 - Multi-beam micro-machining system and method - Google Patents
Multi-beam micro-machining system and method Download PDFInfo
- Publication number
- WO2002101888A3 WO2002101888A3 PCT/IL2002/000461 IL0200461W WO02101888A3 WO 2002101888 A3 WO2002101888 A3 WO 2002101888A3 IL 0200461 W IL0200461 W IL 0200461W WO 02101888 A3 WO02101888 A3 WO 02101888A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- machining system
- beams
- beam micro
- beam steering
- dynamically
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
- B23K26/0676—Dividing the beam into multiple beams, e.g. multifocusing into dependently operating sub-beams, e.g. an array of spots with fixed spatial relationship or for performing simultaneously identical operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/143—Beam splitting or combining systems operating by reflection only using macroscopically faceted or segmented reflective surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Abstract
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN028155564A CN1538893B (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
EP02738586A EP1451907A4 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
KR1020097018127A KR100990300B1 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
KR1020037016348A KR101012913B1 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
JP2003504516A JP4113495B2 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micromachining system and method |
IL15919902A IL159199A0 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
AU2002311597A AU2002311597A1 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
KR1020097018129A KR100938325B1 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
KR1020097018128A KR100992262B1 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
TW91113617A TW574082B (en) | 2001-06-13 | 2002-06-21 | Multiple beam micro-machining system and method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29745301P | 2001-06-13 | 2001-06-13 | |
US60/297,453 | 2001-06-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002101888A2 WO2002101888A2 (en) | 2002-12-19 |
WO2002101888A3 true WO2002101888A3 (en) | 2004-05-13 |
Family
ID=23146371
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IL2002/000461 WO2002101888A2 (en) | 2001-06-13 | 2002-06-13 | Multi-beam micro-machining system and method |
Country Status (9)
Country | Link |
---|---|
US (7) | US7642484B2 (en) |
EP (1) | EP1451907A4 (en) |
JP (2) | JP4113495B2 (en) |
KR (4) | KR100990300B1 (en) |
CN (1) | CN1538893B (en) |
AU (1) | AU2002311597A1 (en) |
IL (1) | IL159199A0 (en) |
TW (1) | TW574082B (en) |
WO (1) | WO2002101888A2 (en) |
Families Citing this family (92)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7838794B2 (en) * | 1999-12-28 | 2010-11-23 | Gsi Group Corporation | Laser-based method and system for removing one or more target link structures |
US7723642B2 (en) | 1999-12-28 | 2010-05-25 | Gsi Group Corporation | Laser-based system for memory link processing with picosecond lasers |
US7671295B2 (en) * | 2000-01-10 | 2010-03-02 | Electro Scientific Industries, Inc. | Processing a memory link with a set of at least two laser pulses |
US20030222324A1 (en) * | 2000-01-10 | 2003-12-04 | Yunlong Sun | Laser systems for passivation or link processing with a set of laser pulses |
US20060141681A1 (en) * | 2000-01-10 | 2006-06-29 | Yunlong Sun | Processing a memory link with a set of at least two laser pulses |
US20070173075A1 (en) * | 2001-03-29 | 2007-07-26 | Joohan Lee | Laser-based method and system for processing a multi-material device having conductive link structures |
US6639177B2 (en) * | 2001-03-29 | 2003-10-28 | Gsi Lumonics Corporation | Method and system for processing one or more microstructures of a multi-material device |
KR100990300B1 (en) * | 2001-06-13 | 2010-10-26 | 오르보테크 엘티디. | Multi-beam micro-machining system and method |
TW529172B (en) | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
EP1280007B1 (en) * | 2001-07-24 | 2008-06-18 | ASML Netherlands B.V. | Imaging apparatus |
AU2003228303A1 (en) * | 2002-03-19 | 2003-10-08 | Lightwave Electronics Corporation | Phase-locked loop control of passively q-switched lasers |
US6951995B2 (en) | 2002-03-27 | 2005-10-04 | Gsi Lumonics Corp. | Method and system for high-speed, precise micromachining an array of devices |
US7563695B2 (en) | 2002-03-27 | 2009-07-21 | Gsi Group Corporation | Method and system for high-speed precise laser trimming and scan lens for use therein |
KR20030095313A (en) * | 2002-06-07 | 2003-12-18 | 후지 샤신 필름 가부시기가이샤 | Laser annealer and laser thin-film forming apparatus |
AU2003274671A1 (en) * | 2002-10-28 | 2004-05-13 | Orbotech Ltd. | Selectable area laser assisted processing of substrates |
JP2004259153A (en) * | 2003-02-27 | 2004-09-16 | Canon Inc | Information processor, method of controlling the same, and control program |
US6784400B1 (en) * | 2003-03-03 | 2004-08-31 | Paul S. Banks | Method of short pulse hole drilling without a resultant pilot hole and backwall damage |
DE10317363B3 (en) * | 2003-04-15 | 2004-08-26 | Siemens Ag | Laser-powered hole boring machine for manufacture of substrates for electrical switching circuits has scanning system with oscillating mirrors and focusing lens |
US6873398B2 (en) * | 2003-05-21 | 2005-03-29 | Esko-Graphics A/S | Method and apparatus for multi-track imaging using single-mode beams and diffraction-limited optics |
DE10339472A1 (en) * | 2003-08-27 | 2005-03-24 | Ralph Schmid | Process and facility to label data media has mirror matrix deflecting the laser beam |
US7521651B2 (en) * | 2003-09-12 | 2009-04-21 | Orbotech Ltd | Multiple beam micro-machining system and method |
US7238913B2 (en) * | 2003-10-17 | 2007-07-03 | Gsi Group Corporation | Flexible scan field |
JP2005144487A (en) * | 2003-11-13 | 2005-06-09 | Seiko Epson Corp | Laser beam machining device and laser beam machining method |
DE10360640B4 (en) * | 2003-12-23 | 2016-02-18 | Jochen Strenkert | Device having a unit for actuating an adjustable drive unit of a motor vehicle |
US7885311B2 (en) * | 2007-03-27 | 2011-02-08 | Imra America, Inc. | Beam stabilized fiber laser |
US20060000811A1 (en) * | 2004-06-30 | 2006-01-05 | Matsushita Electric Industrial Co., Ltd. | Diffractive optical element changer for versatile use in laser manufacturing |
US7525654B2 (en) * | 2004-10-20 | 2009-04-28 | Duquesne University Of The Holy Spirit | Tunable laser-based chemical imaging system |
US20060191884A1 (en) * | 2005-01-21 | 2006-08-31 | Johnson Shepard D | High-speed, precise, laser-based material processing method and system |
US7391794B2 (en) * | 2005-05-25 | 2008-06-24 | Jds Uniphase Corporation | Injection seeding of frequency-converted Q-switched laser |
JP5030512B2 (en) * | 2005-09-30 | 2012-09-19 | 日立ビアメカニクス株式会社 | Laser processing method |
US7385768B2 (en) * | 2005-11-22 | 2008-06-10 | D + S Consulting, Inc. | System, method and device for rapid, high precision, large angle beam steering |
US7945087B2 (en) * | 2006-06-26 | 2011-05-17 | Orbotech Ltd. | Alignment of printed circuit board targets |
US8084706B2 (en) * | 2006-07-20 | 2011-12-27 | Gsi Group Corporation | System and method for laser processing at non-constant velocities |
JP4917382B2 (en) * | 2006-08-09 | 2012-04-18 | 株式会社ディスコ | Laser beam irradiation device and laser processing machine |
KR100791005B1 (en) * | 2006-12-01 | 2008-01-04 | 삼성전자주식회사 | Equipment and method for transmittance measurement of photomask under off axis illumination |
JP2008212999A (en) * | 2007-03-06 | 2008-09-18 | Disco Abrasive Syst Ltd | Laser beam machining apparatus |
US7897924B2 (en) * | 2007-04-12 | 2011-03-01 | Imra America, Inc. | Beam scanning imaging method and apparatus |
DE102007024700A1 (en) * | 2007-05-25 | 2008-12-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for processing materials with laser radiation and apparatus for carrying out the method |
JP4880561B2 (en) * | 2007-10-03 | 2012-02-22 | 新光電気工業株式会社 | Flip chip mounting device |
JP5259154B2 (en) * | 2007-10-24 | 2013-08-07 | オリンパス株式会社 | Scanning laser microscope |
US9123114B2 (en) * | 2007-12-06 | 2015-09-01 | The United States Of America As Represented By The Secretary Of The Army | System and processor implemented method for improved image quality and enhancement based on quantum properties |
JP5443390B2 (en) * | 2008-01-10 | 2014-03-19 | オルボテック リミテッド | Multi-mirror calibration system |
JP5274085B2 (en) * | 2008-04-09 | 2013-08-28 | 株式会社アルバック | Laser processing apparatus, laser beam pitch variable method, and laser processing method |
DE102008022014B3 (en) * | 2008-05-02 | 2009-11-26 | Trumpf Laser- Und Systemtechnik Gmbh | Dynamic beam deflection of a laser beam |
WO2009153792A2 (en) * | 2008-06-19 | 2009-12-23 | Utilight Ltd. | Light induced patterning |
US8723074B2 (en) * | 2008-10-10 | 2014-05-13 | Ipg Microsystems Llc | Laser machining systems and methods with vision correction and/or tracking |
US8652872B2 (en) * | 2008-10-12 | 2014-02-18 | Utilight Ltd. | Solar cells and method of manufacturing thereof |
US8680430B2 (en) * | 2008-12-08 | 2014-03-25 | Electro Scientific Industries, Inc. | Controlling dynamic and thermal loads on laser beam positioning system to achieve high-throughput laser processing of workpiece features |
WO2011016176A1 (en) * | 2009-08-03 | 2011-02-10 | 東芝機械株式会社 | Pulse laser machining apparatus and pulse laser machining method |
KR100958745B1 (en) * | 2009-11-30 | 2010-05-19 | 방형배 | Laser scribing apparatus, method, and laser scribing head |
WO2011100041A1 (en) * | 2009-12-30 | 2011-08-18 | Resonetics Llc | Laser machining system and method for machining three-dimensional objects from a plurality of directions |
US9035673B2 (en) | 2010-01-25 | 2015-05-19 | Palo Alto Research Center Incorporated | Method of in-process intralayer yield detection, interlayer shunt detection and correction |
US20120102907A1 (en) | 2010-10-28 | 2012-05-03 | Dole Fresh Vegetables, Inc. | Mechanical Produce Harvester |
EP2662177A1 (en) * | 2011-01-05 | 2013-11-13 | Kiyoyuki Kondo | Beam processing device |
US8312701B1 (en) | 2011-06-10 | 2012-11-20 | Dole Fresh Vegetables, Inc. | Decoring mechanism with mechanized harvester |
US9434025B2 (en) | 2011-07-19 | 2016-09-06 | Pratt & Whitney Canada Corp. | Laser drilling methods of shallow-angled holes |
US20130020291A1 (en) * | 2011-07-19 | 2013-01-24 | Pratt & Whitney Canada Corp. | Laser drilling methods of shallow-angled holes |
ES2544034T3 (en) | 2011-09-05 | 2015-08-27 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with at least one gas laser and one thermodisipator |
DK2565673T3 (en) | 2011-09-05 | 2014-01-06 | Alltec Angewandte Laserlicht Technologie Gmbh | Device and method for marking an object by means of a laser beam |
EP2564974B1 (en) * | 2011-09-05 | 2015-06-17 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of gas lasers with resonator tubes and individually adjustable deflection means |
EP2564973B1 (en) * | 2011-09-05 | 2014-12-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers and a combining deflection device |
DK2565994T3 (en) | 2011-09-05 | 2014-03-10 | Alltec Angewandte Laserlicht Technologie Gmbh | Laser device and method for marking an object |
EP2564972B1 (en) * | 2011-09-05 | 2015-08-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers, deflection means and telescopic means for each laser beam |
EP2564975B1 (en) * | 2011-09-05 | 2014-12-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Marking apparatus with a plurality of lasers and individually adjustable sets of deflection means |
EP2565996B1 (en) | 2011-09-05 | 2013-12-11 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Laser device with a laser unit, and a fluid container for a cooling means of said laser unit |
WO2013095556A1 (en) | 2011-12-22 | 2013-06-27 | Intel Corporation | Configuration of acousto-optic deflectors for laser beam scanning |
CN103379681B (en) * | 2012-04-28 | 2016-03-30 | 清华大学 | Heating resistance pad |
US9279722B2 (en) * | 2012-04-30 | 2016-03-08 | Agilent Technologies, Inc. | Optical emission system including dichroic beam combiner |
DE102013206363A1 (en) * | 2013-04-11 | 2014-10-16 | Tesa Scribos Gmbh | scanning device |
JP2015025901A (en) * | 2013-07-25 | 2015-02-05 | 船井電機株式会社 | Laser scanning apparatus |
US11536956B2 (en) | 2013-11-25 | 2022-12-27 | Preco, Llc | High density galvo housing for use with multiple laser beams |
US10239155B1 (en) * | 2014-04-30 | 2019-03-26 | The Boeing Company | Multiple laser beam processing |
US9269149B2 (en) | 2014-05-08 | 2016-02-23 | Orbotech Ltd. | Calibration of a direct-imaging system |
CA2917585C (en) | 2014-05-15 | 2016-09-27 | Mtt Innovation Incorporated | Optimizing drive schemes for multiple projector systems |
US20150343560A1 (en) * | 2014-06-02 | 2015-12-03 | Fracturelab, Llc | Apparatus and method for controlled laser heating |
WO2016023133A1 (en) * | 2014-08-14 | 2016-02-18 | Mtt Innovation Incorporated | Multiple-laser light source |
US10423017B2 (en) * | 2014-10-15 | 2019-09-24 | Inserm (Institut National De La Sante Et De La Recherche Medicale) | Method for determining the characteristics of a system for generating a spatial light modulation in phase and amplitude at high refresh rate |
US9855626B2 (en) * | 2015-01-29 | 2018-01-02 | Rohr, Inc. | Forming a pattern of apertures in an object with a plurality of laser beams |
KR101586219B1 (en) * | 2015-07-02 | 2016-01-19 | 대륭포장산업 주식회사 | Apparatus for producing a breathable film using a UV laser |
KR102406333B1 (en) * | 2016-11-18 | 2022-06-08 | 아이피지 포토닉스 코포레이션 | Materials Processing Laser Systems and Methods |
KR102618163B1 (en) * | 2016-12-05 | 2023-12-27 | 삼성디스플레이 주식회사 | Laser processing apparatus |
MX2020010479A (en) * | 2018-04-10 | 2021-01-20 | Talens Systems S L U | Apparatus and method for processing cardboard. |
TW202042946A (en) * | 2019-01-31 | 2020-12-01 | 美商伊雷克托科學工業股份有限公司 | Laser-processing apparatus, methods of operating the same, and methods of processing workpieces using the same |
WO2020178813A1 (en) * | 2019-03-06 | 2020-09-10 | Orbotech Ltd. | High-speed dynamic beam shaping |
KR20210144802A (en) | 2019-03-29 | 2021-11-30 | 마이크로닉 아베 | Long sweep length DUV microlithography beam scanning acousto-optic deflector and optical design |
DE102019115554A1 (en) * | 2019-06-07 | 2020-12-10 | Bystronic Laser Ag | Processing device for laser processing of a workpiece and method for laser processing of a workpiece |
DE102020102077B4 (en) | 2020-01-29 | 2022-03-31 | Pulsar Photonics Gmbh | Laser processing device and method for laser processing a workpiece |
BE1027700B1 (en) * | 2020-04-24 | 2021-05-18 | Laser Eng Applications | Device for a laser machining optical system |
DE102020134422A1 (en) * | 2020-12-21 | 2022-06-23 | Trumpf Laser Gmbh | Device for influencing the beam of a laser beam |
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5309178A (en) * | 1992-05-12 | 1994-05-03 | Optrotech Ltd. | Laser marking apparatus including an acoustic modulator |
US5475416A (en) * | 1992-06-03 | 1995-12-12 | Eastman Kodak Company | Printing system for printing an image with lasers emitting diverging laser beams |
Family Cites Families (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10A (en) * | 1836-08-10 | Gtttlslto andi | ||
US3594081A (en) | 1968-11-04 | 1971-07-20 | Werner Tschink | Adjustable illuminating device |
US4060322A (en) * | 1974-07-10 | 1977-11-29 | Canon Kabushiki Kaisha | Image information handling device |
US4038108A (en) * | 1976-05-10 | 1977-07-26 | Union Carbide Corporation | Method and apparatus for making an instantaneous thermochemical start |
US4279472A (en) * | 1977-12-05 | 1981-07-21 | Street Graham S B | Laser scanning apparatus with beam position correction |
JPS5581095A (en) * | 1978-12-12 | 1980-06-18 | Ricoh Co Ltd | Ultra-fine hole processing method |
US4258468A (en) | 1978-12-14 | 1981-03-31 | Western Electric Company, Inc. | Forming vias through multilayer circuit boards |
DE3138745A1 (en) | 1981-09-29 | 1983-04-07 | Siemens AG, 1000 Berlin und 8000 München | ACOUSTOOPTIC LIGHT DEFLECTOR WITH HIGH RESOLUTION |
GB2138584B (en) | 1983-04-23 | 1986-09-17 | Standard Telephones Cables Ltd | Acousto-optic deflector systems |
US4447291A (en) | 1983-08-31 | 1984-05-08 | Texas Instruments Incorporated | Method for via formation in HgCdTe |
US4950962A (en) * | 1985-05-20 | 1990-08-21 | Quantum Diagnostics, Ltd. | High voltage switch tube |
GB2187592B (en) | 1985-12-26 | 1989-10-18 | Yokogawa Electric Corp | Semiconductor laser wavelength stabilizer |
US4838631A (en) | 1986-12-22 | 1989-06-13 | General Electric Company | Laser beam directing system |
JPH01316415A (en) * | 1988-06-17 | 1989-12-21 | Nippon Steel Corp | Laser beam heat treating method using polygon mirror and apparatus thereof |
JP2663560B2 (en) * | 1988-10-12 | 1997-10-15 | 日本電気株式会社 | Laser processing equipment |
JPH082511B2 (en) | 1989-05-08 | 1996-01-17 | 松下電器産業株式会社 | Laser processing equipment |
JPH03142092A (en) | 1989-10-25 | 1991-06-17 | Matsushita Electric Ind Co Ltd | Laser optical system and laser beam processing method using this system |
US5302798A (en) | 1991-04-01 | 1994-04-12 | Canon Kabushiki Kaisha | Method of forming a hole with a laser and an apparatus for forming a hole with a laser |
US5408553A (en) | 1992-08-26 | 1995-04-18 | The United States Of America As Represented By The United States Department Of Energy | Optical power splitter for splitting high power light |
WO1994029069A1 (en) | 1993-06-04 | 1994-12-22 | Seiko Epson Corporation | Apparatus and method for laser machining, and liquid crystal panel |
US5404247A (en) | 1993-08-02 | 1995-04-04 | International Business Machines Corporation | Telecentric and achromatic f-theta scan lens system and method of use |
US5460921A (en) | 1993-09-08 | 1995-10-24 | International Business Machines Corporation | High density pattern template: materials and processes for the application of conductive pastes |
US6037968A (en) * | 1993-11-09 | 2000-03-14 | Markem Corporation | Scanned marking of workpieces |
US6480334B1 (en) * | 1994-01-18 | 2002-11-12 | Massachusetts Institute Of Technology | Agile beam steering using phased-array-like elements |
EP0683007B1 (en) | 1994-04-14 | 1998-05-20 | Carl Zeiss | Machining device |
DE19513354A1 (en) | 1994-04-14 | 1995-12-14 | Zeiss Carl | Surface processing equipment |
US5614114A (en) | 1994-07-18 | 1997-03-25 | Electro Scientific Industries, Inc. | Laser system and method for plating vias |
US5593606A (en) | 1994-07-18 | 1997-01-14 | Electro Scientific Industries, Inc. | Ultraviolet laser system and method for forming vias in multi-layered targets |
US5841099A (en) | 1994-07-18 | 1998-11-24 | Electro Scientific Industries, Inc. | Method employing UV laser pulses of varied energy density to form depthwise self-limiting blind vias in multilayered targets |
JPH08108289A (en) | 1994-10-07 | 1996-04-30 | Sumitomo Electric Ind Ltd | Optical device for laser beam machining |
US5674414A (en) * | 1994-11-11 | 1997-10-07 | Carl-Zeiss Stiftung | Method and apparatus of irradiating a surface of a workpiece with a plurality of beams |
JPH08243765A (en) * | 1995-03-07 | 1996-09-24 | Komatsu Ltd | Laser marking device |
US5585019A (en) | 1995-03-10 | 1996-12-17 | Lumonics Inc. | Laser machining of a workpiece through adjacent mask by optical elements creating parallel beams |
US6373026B1 (en) | 1996-07-31 | 2002-04-16 | Mitsubishi Denki Kabushiki Kaisha | Laser beam machining method for wiring board, laser beam machining apparatus for wiring board, and carbonic acid gas laser oscillator for machining wiring board |
KR100198832B1 (en) * | 1995-12-28 | 1999-06-15 | 김덕중 | Welder using laser beam |
DE19707834A1 (en) | 1996-04-09 | 1997-10-16 | Zeiss Carl Fa | Material irradiation unit used e.g. in production of circuit boards |
US5948288A (en) | 1996-05-28 | 1999-09-07 | Komag, Incorporated | Laser disk texturing apparatus |
US5837962A (en) | 1996-07-15 | 1998-11-17 | Overbeck; James W. | Faster laser marker employing acousto-optic deflection |
DE19734983A1 (en) | 1996-09-04 | 1998-03-05 | Zeiss Carl Fa | Optical arrangement of mirrors |
AT407312B (en) * | 1996-11-20 | 2001-02-26 | Sez Semiconduct Equip Zubehoer | ROTATABLE SUPPORT FOR CIRCULAR ROUND, DISC-SHAPED ITEMS, IN PARTICULAR SEMICONDUCTOR WAFERS OR SUBSTRATES |
US6233044B1 (en) | 1997-01-21 | 2001-05-15 | Steven R. J. Brueck | Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns |
US6040552A (en) | 1997-01-30 | 2000-03-21 | Jain; Kanti | High-speed drilling system for micro-via pattern formation, and resulting structure |
US5973290A (en) | 1997-02-26 | 1999-10-26 | W. L. Gore & Associates, Inc. | Laser apparatus having improved via processing rate |
US5948291A (en) | 1997-04-29 | 1999-09-07 | General Scanning, Inc. | Laser beam distributor and computer program for controlling the same |
KR100446052B1 (en) | 1997-05-15 | 2004-10-14 | 스미도모쥬기가이고교 가부시키가이샤 | Laser beam machining apparatus using a plurality of galvanoscanners |
US6172331B1 (en) * | 1997-09-17 | 2001-01-09 | General Electric Company | Method and apparatus for laser drilling |
US5933216A (en) | 1997-10-16 | 1999-08-03 | Anvik Corporation | Double-sided patterning system using dual-wavelength output of an excimer laser |
US5969877A (en) | 1997-11-26 | 1999-10-19 | Xerox Corporation | Dual wavelength F-theta scan lens |
DE19801364A1 (en) * | 1998-01-16 | 1999-07-22 | Zeiss Carl Fa | Workpiece irradiation apparatus, e.g. for printed circuit board processing |
JP3324982B2 (en) | 1998-03-26 | 2002-09-17 | 松下電工株式会社 | Circuit board manufacturing method |
US6037564A (en) * | 1998-03-31 | 2000-03-14 | Matsushita Electric Industrial Co., Ltd. | Method for scanning a beam and an apparatus therefor |
IL141487A (en) | 1998-08-20 | 2004-07-25 | Orbotech Ltd | Laser repetition rate multiplier |
US6313918B1 (en) | 1998-09-18 | 2001-11-06 | Zygo Corporation | Single-pass and multi-pass interferometery systems having a dynamic beam-steering assembly for measuring distance, angle, and dispersion |
US6252667B1 (en) | 1998-09-18 | 2001-06-26 | Zygo Corporation | Interferometer having a dynamic beam steering assembly |
JP3945951B2 (en) | 1999-01-14 | 2007-07-18 | 日立ビアメカニクス株式会社 | Laser processing method and laser processing machine |
EP1043110B1 (en) * | 1999-04-02 | 2006-08-23 | Murata Manufacturing Co., Ltd. | Laser method for machining through holes in a ceramic green sheet |
CA2370832A1 (en) | 1999-04-27 | 2000-11-02 | Gsi Lumonics Inc. | A system and method for material processing using multiple laser beams |
JP3346374B2 (en) | 1999-06-23 | 2002-11-18 | 住友電気工業株式会社 | Laser drilling machine |
US6295171B1 (en) | 1999-07-09 | 2001-09-25 | Advanced Optical Technologies, Inc. | Piezoelectric light beam deflector |
EP1072350A1 (en) | 1999-07-12 | 2001-01-31 | MDC Max Dätwyler AG Bleienbach | Method and device for distributing the intensity in a laser beam |
CN1376100A (en) | 1999-09-28 | 2002-10-23 | 住友重机械工业株式会社 | Laser drilling method and laser drilling device |
JP2001102886A (en) * | 1999-09-30 | 2001-04-13 | Seiko Epson Corp | Method and device for forming electrode for piezoelectric vibrator |
US6420675B1 (en) * | 1999-10-08 | 2002-07-16 | Nanovia, Lp | Control system for ablating high-density array of vias or indentation in surface of object |
US6310701B1 (en) * | 1999-10-08 | 2001-10-30 | Nanovia Lp | Method and apparatus for ablating high-density array of vias or indentation in surface of object |
US20010030176A1 (en) | 1999-12-07 | 2001-10-18 | Yunlong Sun | Switchable wavelength laser-based etched circuit board processing system |
US6423935B1 (en) | 2000-02-18 | 2002-07-23 | The Regents Of The University Of California | Identification marking by means of laser peening |
US6386992B1 (en) * | 2000-05-04 | 2002-05-14 | Acushnet Company | Golf ball compositions including microcellular materials and methods for making same |
US6696008B2 (en) | 2000-05-25 | 2004-02-24 | Westar Photonics Inc. | Maskless laser beam patterning ablation of multilayered structures with continuous monitoring of ablation |
US6605796B2 (en) | 2000-05-25 | 2003-08-12 | Westar Photonics | Laser beam shaping device and apparatus for material machining |
JP4228552B2 (en) * | 2000-07-04 | 2009-02-25 | 宇部興産株式会社 | Method for purifying 1,5,9-cyclododecatriene epoxidation reaction mixture |
US6329634B1 (en) | 2000-07-17 | 2001-12-11 | Carl-Zeiss-Stiftung | Workpiece irradiation system |
US6566627B2 (en) * | 2000-08-11 | 2003-05-20 | Westar Photonics, Inc. | Laser method for shaping of optical lenses |
US6491361B1 (en) * | 2000-11-09 | 2002-12-10 | Encad, Inc. | Digital media cutter |
US6515257B1 (en) * | 2001-03-26 | 2003-02-04 | Anvik Corporation | High-speed maskless via generation system |
US6639177B2 (en) | 2001-03-29 | 2003-10-28 | Gsi Lumonics Corporation | Method and system for processing one or more microstructures of a multi-material device |
KR100990300B1 (en) * | 2001-06-13 | 2010-10-26 | 오르보테크 엘티디. | Multi-beam micro-machining system and method |
US6674564B2 (en) | 2001-06-15 | 2004-01-06 | Maniabarco, Inc. | System, method and article of manufacture for a beam splitting acousto-optical modulator |
JP4777826B2 (en) * | 2006-05-25 | 2011-09-21 | 日本碍子株式会社 | Sheet processing machine |
-
2002
- 2002-06-13 KR KR1020097018127A patent/KR100990300B1/en active IP Right Grant
- 2002-06-13 KR KR1020097018129A patent/KR100938325B1/en active IP Right Grant
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- 2006-02-24 US US11/276,356 patent/US20060146395A1/en not_active Abandoned
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5309178A (en) * | 1992-05-12 | 1994-05-03 | Optrotech Ltd. | Laser marking apparatus including an acoustic modulator |
US5475416A (en) * | 1992-06-03 | 1995-12-12 | Eastman Kodak Company | Printing system for printing an image with lasers emitting diverging laser beams |
Also Published As
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KR20090108652A (en) | 2009-10-15 |
US20030047546A1 (en) | 2003-03-13 |
KR20090108653A (en) | 2009-10-15 |
US7633036B2 (en) | 2009-12-15 |
KR100990300B1 (en) | 2010-10-26 |
KR20040060853A (en) | 2004-07-06 |
KR20090108651A (en) | 2009-10-15 |
CN1538893A (en) | 2004-10-20 |
JP4113495B2 (en) | 2008-07-09 |
US20030048814A1 (en) | 2003-03-13 |
US20060146395A1 (en) | 2006-07-06 |
IL159199A0 (en) | 2004-06-01 |
CN1538893B (en) | 2012-01-04 |
KR100938325B1 (en) | 2010-01-22 |
US20040056009A1 (en) | 2004-03-25 |
US20030042230A1 (en) | 2003-03-06 |
JP2004533724A (en) | 2004-11-04 |
KR101012913B1 (en) | 2011-02-08 |
WO2002101888A2 (en) | 2002-12-19 |
US7642484B2 (en) | 2010-01-05 |
JP2008207247A (en) | 2008-09-11 |
US6809290B2 (en) | 2004-10-26 |
EP1451907A4 (en) | 2007-05-09 |
KR100992262B1 (en) | 2010-11-05 |
TW574082B (en) | 2004-02-01 |
JP5231039B2 (en) | 2013-07-10 |
EP1451907A2 (en) | 2004-09-01 |
AU2002311597A1 (en) | 2002-12-23 |
US7629555B2 (en) | 2009-12-08 |
US20030019854A1 (en) | 2003-01-30 |
US20030024912A1 (en) | 2003-02-06 |
US7176409B2 (en) | 2007-02-13 |
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