WO2003010831A1 - Semiconductor light emitting device comprising uneven substrate - Google Patents

Semiconductor light emitting device comprising uneven substrate Download PDF

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Publication number
WO2003010831A1
WO2003010831A1 PCT/JP2002/007460 JP0207460W WO03010831A1 WO 2003010831 A1 WO2003010831 A1 WO 2003010831A1 JP 0207460 W JP0207460 W JP 0207460W WO 03010831 A1 WO03010831 A1 WO 03010831A1
Authority
WO
WIPO (PCT)
Prior art keywords
light emitting
emitting device
semiconductor light
uneven substrate
substrate
Prior art date
Application number
PCT/JP2002/007460
Other languages
English (en)
French (fr)
Inventor
Isamu Niki
Motokazu Yamada
Masahiko Sano
Shuji Shioji
Original Assignee
Nichia Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27347215&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2003010831(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nichia Corporation filed Critical Nichia Corporation
Priority to KR1020117028310A priority Critical patent/KR101211203B1/ko
Priority to CNB028142691A priority patent/CN1315200C/zh
Priority to EP10190784.8A priority patent/EP2293352B2/en
Priority to EP19211858.6A priority patent/EP3654391A1/en
Priority to KR1020047000976A priority patent/KR100952552B1/ko
Priority to EP17158639.9A priority patent/EP3211677B1/en
Priority to EP02751652A priority patent/EP1416543B1/en
Priority to KR1020077017029A priority patent/KR101171135B1/ko
Publication of WO2003010831A1 publication Critical patent/WO2003010831A1/ja
Priority to HK05100642A priority patent/HK1067235A1/xx

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/16Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02373Group 14 semiconducting materials
    • H01L21/02378Silicon carbide
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02538Group 13/15 materials
    • H01L21/0254Nitrides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02636Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02647Lateral overgrowth
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0062Processes for devices with an active region comprising only III-V compounds
    • H01L33/0066Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
    • H01L33/007Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound comprising nitride compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • H01L33/22Roughened surfaces, e.g. at the interface between epitaxial layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of group III and group V of the periodic system
    • H01L33/32Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2933/00Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
    • H01L2933/0083Periodic patterns for optical field-shaping in or on the semiconductor body or semiconductor body package, e.g. photonic bandgap structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • H01L33/24Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
PCT/JP2002/007460 2001-07-24 2002-07-24 Semiconductor light emitting device comprising uneven substrate WO2003010831A1 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
KR1020117028310A KR101211203B1 (ko) 2001-07-24 2002-07-24 요철형성 기판을 갖춘 반도체 발광 다이오드
CNB028142691A CN1315200C (zh) 2001-07-24 2002-07-24 具有形成凹凸的基板的半导体发光元件
EP10190784.8A EP2293352B2 (en) 2001-07-24 2002-07-24 Semiconductor light emitting device comprising uneven substrate
EP19211858.6A EP3654391A1 (en) 2001-07-24 2002-07-24 Semiconductor light emitting device comprising uneven substrate
KR1020047000976A KR100952552B1 (ko) 2001-07-24 2002-07-24 요철형성 기판을 갖춘 반도체 발광 다이오드 및 그 제조방법
EP17158639.9A EP3211677B1 (en) 2001-07-24 2002-07-24 Semiconductor light emitting device comprising uneven substrate
EP02751652A EP1416543B1 (en) 2001-07-24 2002-07-24 Semiconductor light emitting device comprising uneven substrate
KR1020077017029A KR101171135B1 (ko) 2001-07-24 2002-07-24 요철형성 기판을 갖춘 반도체 발광 다이오드
HK05100642A HK1067235A1 (en) 2001-07-24 2005-01-25 Semiconductor light emitting device comprising uneven substrate

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001-223114 2001-07-24
JP2001223114 2001-07-24
JP2002041737 2002-02-19
JP2002-041737 2002-02-19
JP2002213490A JP4055503B2 (ja) 2001-07-24 2002-07-23 半導体発光素子
JP2002-213490 2002-07-23

Publications (1)

Publication Number Publication Date
WO2003010831A1 true WO2003010831A1 (en) 2003-02-06

Family

ID=27347215

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/007460 WO2003010831A1 (en) 2001-07-24 2002-07-24 Semiconductor light emitting device comprising uneven substrate

Country Status (10)

Country Link
US (15) US6870191B2 (ja)
EP (8) EP1416543B1 (ja)
JP (1) JP4055503B2 (ja)
KR (4) KR101171135B1 (ja)
CN (1) CN1315200C (ja)
DK (1) DK2256832T3 (ja)
HK (1) HK1067235A1 (ja)
MY (1) MY145322A (ja)
TW (1) TW561632B (ja)
WO (1) WO2003010831A1 (ja)

Cited By (10)

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WO2005015648A1 (en) * 2003-08-12 2005-02-17 Epivalley Co., Ltd. Method of forming grating on substrate and iii-nitride semiconductor light emitting device using the substrate
KR100819502B1 (ko) 2004-10-06 2008-04-04 주식회사 이츠웰 자립형 질화물계 반도체 기판 및 그 제조방법.
EP2020691A2 (en) 2007-07-31 2009-02-04 Epivalley Co., Ltd. III-Nitride semiconductor light emitting device
US7635875B2 (en) 2001-07-24 2009-12-22 Nichia Corporation Semiconductor light emitting device
JP2010177707A (ja) * 2003-10-21 2010-08-12 Samsung Electro-Mechanics Co Ltd 発光素子の製造方法
JP2011077562A (ja) * 2003-08-19 2011-04-14 Nichia Corp 半導体素子、発光素子及びその基板の製造方法
WO2012093601A1 (ja) * 2011-01-07 2012-07-12 三菱化学株式会社 エピタキシャル成長用基板およびGaN系LEDデバイス
WO2012120891A1 (ja) * 2011-03-10 2012-09-13 国立大学法人山口大学 多波長発光素子及びその製造方法
WO2012148039A1 (en) * 2011-04-28 2012-11-01 Seoul Opto Device Co., Ltd. Semiconductor substrate and method of fabricating the same
KR101321356B1 (ko) 2007-01-24 2013-10-22 엘지이노텍 주식회사 질화물 반도체 발광소자

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