WO2003023832A1 - Exposure method and system, and device production method - Google Patents

Exposure method and system, and device production method Download PDF

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Publication number
WO2003023832A1
WO2003023832A1 PCT/JP2002/009102 JP0209102W WO03023832A1 WO 2003023832 A1 WO2003023832 A1 WO 2003023832A1 JP 0209102 W JP0209102 W JP 0209102W WO 03023832 A1 WO03023832 A1 WO 03023832A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure
transmittance
short
density filter
illumination
Prior art date
Application number
PCT/JP2002/009102
Other languages
French (fr)
Japanese (ja)
Inventor
Jun Ishikawa
Hisashi Nishinaga
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2003527780A priority Critical patent/JPWO2003023832A1/en
Publication of WO2003023832A1 publication Critical patent/WO2003023832A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Abstract

An exposure method and an exposure system capable of maintaining a high uniformity of an exposure amount distribution despite short-term variations in transmittance in an optical system. An exposure light from a fly eye lens (9) is used to illuminate an illumination area (35) on a reticle via a first lens system (12), a second lens system (13), a density filter plate (51) rotatable by driving, and a fixed blind (14A) to transfer a pattern image on a reticle onto a wafer via a projection optical system by a scanning exposure method. A one-dimensional transmittance distribution linearly symmetric with respect to a line passing an optical axis is formed on the density filter plate (51), and an rotation angle of the density filter (51) is so controlled as to make uniform the illumination distribution of the illumination area (35) in a non-scanning direction (X direction) when a center-symmetric, short-term illumination unevenness occurs to lower the illuminance in the vicinity of the optical axis in the illumination area (35) due to short-term variations in transmittance in the projection optical system.
PCT/JP2002/009102 2001-09-07 2002-09-06 Exposure method and system, and device production method WO2003023832A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003527780A JPWO2003023832A1 (en) 2001-09-07 2002-09-06 Exposure method and apparatus, and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001-272769 2001-09-07
JP2001272769 2001-09-07

Publications (1)

Publication Number Publication Date
WO2003023832A1 true WO2003023832A1 (en) 2003-03-20

Family

ID=19098083

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/009102 WO2003023832A1 (en) 2001-09-07 2002-09-06 Exposure method and system, and device production method

Country Status (2)

Country Link
JP (1) JPWO2003023832A1 (en)
WO (1) WO2003023832A1 (en)

Cited By (23)

* Cited by examiner, † Cited by third party
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WO2006018972A1 (en) * 2004-08-17 2006-02-23 Nikon Corporation Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method
JP2006324660A (en) * 2005-05-19 2006-11-30 Asml Holding Nv Device and method utilizing illumination-beam adjusting means
JP2007027240A (en) * 2005-07-13 2007-02-01 Nikon Corp Illumination optical device, exposure apparatus, and exposure method
JP2010517310A (en) * 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー Illumination system for microlithography projection exposure apparatus
WO2010073795A1 (en) * 2008-12-24 2010-07-01 株式会社 ニコン Illumination optical system, exposure apparatus, and device manufacturing method
JP2010157649A (en) * 2008-12-30 2010-07-15 Nikon Corp Correction unit, illumination optical system, aligner, and device manufacturing method
JP2010157650A (en) * 2008-12-30 2010-07-15 Nikon Corp Correction unit, illumination optical system, exposure apparatus, and method of manufacturing device
JP2010232688A (en) * 2010-07-08 2010-10-14 Nikon Corp Method of adjusting lighting optical device, exposure device, and exposure method
JP2011171776A (en) * 2004-06-04 2011-09-01 Canon Inc Illumination optical system and exposure apparatus
US8081295B2 (en) 2005-03-15 2011-12-20 Carl Zeiss Smt Gmbh Projection exposure method and projection exposure system therefor
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9097981B2 (en) 2007-10-12 2015-08-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
JP2019117417A (en) * 2019-04-24 2019-07-18 株式会社ニコン Exposure device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09190969A (en) * 1996-01-10 1997-07-22 Canon Inc Projecting exposure system and manufacture of device using it
WO1999036832A1 (en) * 1998-01-19 1999-07-22 Nikon Corporation Illuminating device and exposure apparatus
JP2001135564A (en) * 1999-11-05 2001-05-18 Canon Inc Projection aligner

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09190969A (en) * 1996-01-10 1997-07-22 Canon Inc Projecting exposure system and manufacture of device using it
WO1999036832A1 (en) * 1998-01-19 1999-07-22 Nikon Corporation Illuminating device and exposure apparatus
JP2001135564A (en) * 1999-11-05 2001-05-18 Canon Inc Projection aligner

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US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9146474B2 (en) 2003-04-09 2015-09-29 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9164393B2 (en) 2003-04-09 2015-10-20 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US9423697B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
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US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9429848B2 (en) 2004-02-06 2016-08-30 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9140990B2 (en) 2004-02-06 2015-09-22 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9423694B2 (en) 2004-02-06 2016-08-23 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2011171776A (en) * 2004-06-04 2011-09-01 Canon Inc Illumination optical system and exposure apparatus
US9235133B2 (en) 2004-08-17 2016-01-12 Nikon Corporation Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method
JP4599936B2 (en) * 2004-08-17 2010-12-15 株式会社ニコン Illumination optical apparatus, adjustment method of illumination optical apparatus, exposure apparatus, and exposure method
JP2006059834A (en) * 2004-08-17 2006-03-02 Nikon Corp Illumination optical device, regulating method of illumination optical device, exposure device and exposure method
WO2006018972A1 (en) * 2004-08-17 2006-02-23 Nikon Corporation Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method
US9110383B2 (en) 2005-03-15 2015-08-18 Carl Zeiss Smt Gmbh Projection exposure method and projection exposure system therefor
US8081295B2 (en) 2005-03-15 2011-12-20 Carl Zeiss Smt Gmbh Projection exposure method and projection exposure system therefor
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2006324660A (en) * 2005-05-19 2006-11-30 Asml Holding Nv Device and method utilizing illumination-beam adjusting means
JP2007027240A (en) * 2005-07-13 2007-02-01 Nikon Corp Illumination optical device, exposure apparatus, and exposure method
JP2010517310A (en) * 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー Illumination system for microlithography projection exposure apparatus
US9057963B2 (en) 2007-09-14 2015-06-16 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
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