WO2003031955A1 - Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces - Google Patents
Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces Download PDFInfo
- Publication number
- WO2003031955A1 WO2003031955A1 PCT/EP2002/011011 EP0211011W WO03031955A1 WO 2003031955 A1 WO2003031955 A1 WO 2003031955A1 EP 0211011 W EP0211011 W EP 0211011W WO 03031955 A1 WO03031955 A1 WO 03031955A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mirror
- sensor
- image
- concave mirror
- mask
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 21
- 235000012431 wafers Nutrition 0.000 title claims abstract description 12
- 238000005259 measurement Methods 0.000 title claims abstract description 11
- 238000011835 investigation Methods 0.000 title claims abstract description 10
- 239000004065 semiconductor Substances 0.000 title claims abstract description 9
- 230000003287 optical effect Effects 0.000 claims description 12
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000010998 test method Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract 1
- 238000012876 topography Methods 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000011158 quantitative evaluation Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Biological Materials (AREA)
- Instruments For Viewing The Inside Of Hollow Bodies (AREA)
- Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
- Radio Relay Systems (AREA)
- Optical Measuring Cells (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02785145A EP1434981B1 (en) | 2001-10-02 | 2002-10-01 | Apparatus for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces |
DE60212987T DE60212987T2 (en) | 2001-10-02 | 2002-10-01 | Device for rapid, quantitative, contactless topographic examination of semiconductor wafers or mirror-like surfaces |
US10/814,252 US7133140B2 (en) | 2001-10-02 | 2004-04-01 | Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
HUP0104057 | 2001-10-02 | ||
HU0104057A HUP0104057A2 (en) | 2001-10-02 | 2001-10-02 | Measuring arrangement and method for the fast quantitative topographical examination of semi-conductor slices and other mirror-like surfaces |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/814,252 Continuation US7133140B2 (en) | 2001-10-02 | 2004-04-01 | Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003031955A1 true WO2003031955A1 (en) | 2003-04-17 |
Family
ID=89979741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/011011 WO2003031955A1 (en) | 2001-10-02 | 2002-10-01 | Apparatus and measurement procedure for the fast, quantitative, non-contact topographic investigation of semiconductor wafers and other mirror like surfaces |
Country Status (6)
Country | Link |
---|---|
US (1) | US7133140B2 (en) |
EP (1) | EP1434981B1 (en) |
AT (1) | ATE332498T1 (en) |
DE (1) | DE60212987T2 (en) |
HU (1) | HUP0104057A2 (en) |
WO (1) | WO2003031955A1 (en) |
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WO2000029835A1 (en) * | 1998-11-13 | 2000-05-25 | Isis Innovation Limited | Non-contact topographical analysis apparatus and method thereof |
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2001
- 2001-10-02 HU HU0104057A patent/HUP0104057A2/en unknown
-
2002
- 2002-10-01 AT AT02785145T patent/ATE332498T1/en active
- 2002-10-01 DE DE60212987T patent/DE60212987T2/en not_active Expired - Lifetime
- 2002-10-01 WO PCT/EP2002/011011 patent/WO2003031955A1/en active IP Right Grant
- 2002-10-01 EP EP02785145A patent/EP1434981B1/en not_active Expired - Lifetime
-
2004
- 2004-04-01 US US10/814,252 patent/US7133140B2/en not_active Expired - Fee Related
Patent Citations (1)
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WO2000029835A1 (en) * | 1998-11-13 | 2000-05-25 | Isis Innovation Limited | Non-contact topographical analysis apparatus and method thereof |
Non-Patent Citations (8)
Title |
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F. RIESZ: "Geometrical optical model of the image formation in Makyoh (magic-mirror) topography", J.PHYS.D: APPL.PHYS., vol. 33, 2000, UK, pages 3033 - 3040, XP002229672 * |
F. RIESZ: "Makyoh topography for the morphological study of compound semiconductor wafer and structures", MATERIALS SCIENCE & ENGINEERING, vol. B80, 2001, NL, pages 220 - 223, XP002229676 * |
F.RIESZ: "Camera length and field of view in Makyoh-topography instruments", R.S.I., vol. 72, no. 2, February 2001 (2001-02-01), America, pages 1591 - 1593, XP002229673 * |
J. SZABO', F. RIESZ, AND B. SZENTPÀLI: "Makyoh Topography: Curvature Measurements and Implications for the Image Formation", JPN. J. APPL. PHYS., vol. 35, 15 February 1996 (1996-02-15), pages L258 - L261, XP002229674 * |
KAYAALP A E ET AL: "USING SEM STEREO TO EXTRACT SEMICONDUCTOR WAFER PATTERN TOPOGRAPHY", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 775, 1987, pages 18 - 26, XP000918713 * |
KOEHLER R: "PLANE-WAVE X-RAY TOPOGRAPHY AND ITS APPLICATION TO SEMICONDUCTOR PROBLEMS", JOURNAL OF MATERIALS SCIENCE. MATERIALS IN ELECTRONICS, CHAPMAN AND HALL, LONDON, GB, vol. 10, no. 3, May 1999 (1999-05-01), pages 167 - 174, XP000912483, ISSN: 0957-4522 * |
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Also Published As
Publication number | Publication date |
---|---|
DE60212987T2 (en) | 2007-09-06 |
ATE332498T1 (en) | 2006-07-15 |
EP1434981B1 (en) | 2006-07-05 |
US7133140B2 (en) | 2006-11-07 |
DE60212987D1 (en) | 2006-08-17 |
HUP0104057A2 (en) | 2003-06-28 |
EP1434981A1 (en) | 2004-07-07 |
HU0104057D0 (en) | 2001-11-28 |
US20040263864A1 (en) | 2004-12-30 |
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