WO2003054910A1 - Device for treating objects by plasma deposition - Google Patents
Device for treating objects by plasma deposition Download PDFInfo
- Publication number
- WO2003054910A1 WO2003054910A1 PCT/CH2002/000698 CH0200698W WO03054910A1 WO 2003054910 A1 WO2003054910 A1 WO 2003054910A1 CH 0200698 W CH0200698 W CH 0200698W WO 03054910 A1 WO03054910 A1 WO 03054910A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- treatment chamber
- transfer space
- walls
- objects
- passage
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32788—Means for moving the material to be treated for extracting the material from the process chamber
Definitions
- the present invention relates to a device for the treatment of objects by plasma deposition.
- the objects to be treated can for example be tube components such as skirts, shoulders or plugs.
- It relates more specifically to an assembly consisting of a treatment chamber and a transfer space connected to the treatment chamber.
- the object or objects to be treated passing through the transfer space prior to their introduction into the treatment chamber, the treatment being carried out under reduced pressure.
- the devices of the state of the art although they can be used in automated systems, are relatively complex to produce and the processing of the objects is characterized by a high number of steps, hence a relatively long duration for the processing of a given object.
- a device for the treatment of objects by plasma deposition comprising: - a sealed treatment chamber, under reduced pressure, provided on one of its walls a passage which can be closed, said passage making it possible to convey objects to be treated between the interior and the exterior of the treatment chamber,
- the invention is particularly characterized by the fact that the transfer space:
- - is delimited by discontinuous walls, - is movable relative to the treatment chamber so as to be able to cross the passage of the treatment chamber.
- the transfer space has a double function: that of support during the transfer of the objects to be treated and that of airlock when it is in a particular position.
- the device according to the invention is particularly well suited for automated use.
- the invention can be declined in a large number of variants.
- the transfer space can be moved by a drive system arranged outside the treatment chamber, near its passage.
- the drive system can also be designed to pass completely through the treatment chamber. According to a preferred embodiment, a part of the walls delimiting the transfer space is adapted to block the passage of the treatment chamber.
- the passage of the treatment chamber extends outside of it so as to form a hollow body, for example cylindrical, whose side walls are sealed.
- the walls delimiting the transfer space are chosen and dimensioned so that when the transfer space is moved in the hollow body, a mobile and temporary airlock is formed.
- the walls delimiting the transfer space can be fixed to each other, for example by means of a rod connecting them, the whole being made integral with a drive system such as a telescopic system.
- the walls delimiting the transfer space are fixed independently of each other to the drive system which consists for example of a frame adapted to slide in a direction parallel to the movement of the transfer space .
- the drive system which consists for example of a frame adapted to slide in a direction parallel to the movement of the transfer space .
- the walls delimiting the transfer space consist of two parallel discs, the transfer space corresponding to the volume which is located between the two discs.
- Each disc is fixed at its external face to a member forming part of the drive system.
- the invention is characterized in particular by the fact that the treatment chamber and the transfer space are movable relative to each other which means that one can have a configuration in which the room of treatment is fixed and the treatment space mobile or, conversely, the treatment chamber is mobile and the treatment space fixed.
- Figure 1 shows a front view of a first embodiment of the invention.
- Figure 2 shows a top view of the embodiment of Figure 1.
- Figure 3 shows a front view of a second embodiment of the invention.
- FIG. 4 shows a front view, in a first position, of a third embodiment of the invention.
- FIG. 5 shows a front view, in a second position, of the embodiment of FIG. 4.
- FIG. 6 shows a front view, in a third position, of the embodiment of FIG. 4.
- FIG. 7 shows a top view of the embodiment of FIGS. 4 to 6.
- the device illustrated in FIG. 1 comprises a sealed treatment chamber 1 which contains elements (not shown) making it possible to establish a vacuum therein and to treat one or more objects 3 by plasma deposition.
- the treatment chamber 1 is provided with a passage 2 connecting the interior of the chamber with the exterior.
- the treatment chamber 1 is circular, as is the section of its passage 2.
- the passage 2, which forms a hollow cylinder, extends towards the interior of the chamber treatment 1.
- a transfer space 5 delimited by two parallel circular walls 6,7 fixed in their centers to each other by means of a rod 11.
- the upper disc 6 being fixed to a telescopic axis 9 which can be actuated by a motor (not shown).
- the telescopic axis 9 is itself fixed to a frame 12 arranged above the device.
- the device illustrated in Figure 3 is identical to that of Figures 1 and 2 except that the telescopic axis and its motor are arranged below the device, the telescopic axis sealingly crossing the bottom wall of the treatment chamber.
- the device illustrated in Figures 4 to 7 also has several points in common with the devices of the previous figures. It differs, however, in that the disks 6, 7 delimiting the transfer space 5 are fixed independently of one another to a sliding frame 10 which extends on either side of the treatment chamber 1.
- the lower disc 7 actually forms the upper part of a cylinder 12 which is part of the sliding frame.
- the treatment chamber 1 is provided with an opening 13 whose section is substantially equal to the diameter of the disks 6,7.
- the length of the cylinder 12, which can be hollow or full, is such that during its movement, it permanently closes the opening 13 disposed in the bottom wall 14 of the treatment chamber 1.
- a first step, illustrated in FIG. 4 objects to be treated 3 are placed, for example using a robotic arm, on the face of the lower disc 7 which is located on the side of the transfer space 5
- the sliding frame 10 is then lowered to a position illustrated in FIG. 5.
- the transfer space 5 is completely delimited by the discs 6, 7 and the wall of the extension 8.
- transfer space 5 and the walls which delimit it form a sealed compartment exercising the function of an airlock.
- means 15 can be provided to achieve a vacuum, total or partial, in the airlock.
- the "lock" phase previously described can take place dynamically, that is to say without interrupting the movement of the sliding frame 10 downwards. It is also possible to momentarily interrupt the descent of the frame, sliding 10 when the airlock is formed, in particular if one wishes to establish a vacuum in the airlock.
- FIG. 6 illustrates the situation where the transfer space 5 is completely included in the treatment chamber 1. It should be noted that at this stage, the upper disc 6 is in intimate contact with the upper wall 4 of the treatment chamber. treatment 1 in order to ensure a perfect seal within the latter. At this time, the processing of objects 3 can be carried out. Means (not shown) arranged in the treatment chamber can generate a plasma so as to coat the surface of the objects 3 with a thin layer acting, for example, as an anti-diffusion layer.
- the section of the passage of the treatment chamber and its extension is not necessarily circular, a square section for example would achieve the same purpose.
- a closed transfer space over most of its periphery, with an opening of a size just sufficient to ensure the introduction and removal of the objects to be treated. It is therefore possible to design a transfer space included in a sliding cylinder, the latter being provided with a small opening on its side wall.
- the distance between the discs must allow an "airlock" phase to be obtained. Preferably, this distance is minimized in order to reduce the pressure variation resulting from the contacting of the transfer space with the space located inside the treatment chamber.
- the geometry of the lower disc can be produced so as to ensure a progressive (gradual) vacuum in the transfer space when the transfer space is brought into contact with the treatment chamber.
- One way to obtain this characteristic would be to use a disc whose upper face, on part of its periphery, is inclined downward.
Abstract
Description
Claims
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20020782609 EP1459352A1 (en) | 2001-12-20 | 2002-12-16 | Device for treating objects by plasma deposition |
AU2002347187A AU2002347187A1 (en) | 2001-12-20 | 2002-12-16 | Device for treating objects by plasma deposition |
CA002469863A CA2469863A1 (en) | 2001-12-20 | 2002-12-16 | Device for treating objects by plasma deposition |
MXPA04005881A MXPA04005881A (en) | 2001-12-20 | 2002-12-16 | Device for treating objects by plasma deposition. |
BR0215166-9A BR0215166A (en) | 2001-12-20 | 2002-12-16 | Plasma Deposition Object Handling Device |
US10/498,906 US20050028933A1 (en) | 2001-12-20 | 2002-12-16 | Device for treating objects by plasma deposition |
KR10-2004-7009529A KR20040070244A (en) | 2001-12-20 | 2002-12-16 | Device for treating objects by plasma deposition |
JP2003555540A JP2005513269A (en) | 2001-12-20 | 2002-12-16 | Apparatus for processing objects by plasma deposition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH2354/01 | 2001-12-20 | ||
CH23542001 | 2001-12-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003054910A1 true WO2003054910A1 (en) | 2003-07-03 |
Family
ID=4568748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/CH2002/000698 WO2003054910A1 (en) | 2001-12-20 | 2002-12-16 | Device for treating objects by plasma deposition |
Country Status (11)
Country | Link |
---|---|
US (1) | US20050028933A1 (en) |
EP (1) | EP1459352A1 (en) |
JP (1) | JP2005513269A (en) |
KR (1) | KR20040070244A (en) |
CN (1) | CN1606793A (en) |
AU (1) | AU2002347187A1 (en) |
BR (1) | BR0215166A (en) |
CA (1) | CA2469863A1 (en) |
MX (1) | MXPA04005881A (en) |
RU (1) | RU2004122095A (en) |
WO (1) | WO2003054910A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102203910B (en) * | 2008-11-07 | 2014-12-10 | Asm美国公司 | Reaction chamber |
CN109912228A (en) * | 2017-12-12 | 2019-06-21 | 湘潭宏大真空技术股份有限公司 | Transmission device for large-area glass magnetron sputtering film production line |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5121705A (en) * | 1991-04-05 | 1992-06-16 | Mbk Microtek Inc. | Loading lock for chemical vapor deposition apparatus |
WO1999053534A1 (en) * | 1998-04-09 | 1999-10-21 | Ohmi, Tadahiro | Process system |
JP2000277489A (en) * | 1999-03-24 | 2000-10-06 | Sharp Corp | Plasma processing device |
US6254721B1 (en) * | 1989-02-27 | 2001-07-03 | Hitachi, Ltd. | Method and apparatus for processing samples |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63204726A (en) * | 1987-02-20 | 1988-08-24 | Anelva Corp | Vacuum treatment device |
US4861563A (en) * | 1987-05-14 | 1989-08-29 | Spectrum Cvd, Inc. | Vacuum load lock |
US4910043A (en) * | 1987-07-16 | 1990-03-20 | Texas Instruments Incorporated | Processing apparatus and method |
US5094885A (en) * | 1990-10-12 | 1992-03-10 | Genus, Inc. | Differential pressure cvd chuck |
EP0946780B1 (en) * | 1996-12-23 | 2002-01-16 | Unaxis Balzers Aktiengesellschaft | Vacuum treatment equipment |
US6106634A (en) * | 1999-02-11 | 2000-08-22 | Applied Materials, Inc. | Methods and apparatus for reducing particle contamination during wafer transport |
DE19911729B4 (en) * | 1999-03-16 | 2007-01-11 | Aisa Automation Industrielle S.A. | Method and device for producing a two-chamber tube |
-
2002
- 2002-12-16 EP EP20020782609 patent/EP1459352A1/en not_active Withdrawn
- 2002-12-16 US US10/498,906 patent/US20050028933A1/en not_active Abandoned
- 2002-12-16 CN CNA028254562A patent/CN1606793A/en active Pending
- 2002-12-16 KR KR10-2004-7009529A patent/KR20040070244A/en not_active Application Discontinuation
- 2002-12-16 BR BR0215166-9A patent/BR0215166A/en not_active Application Discontinuation
- 2002-12-16 CA CA002469863A patent/CA2469863A1/en not_active Abandoned
- 2002-12-16 RU RU2004122095/28A patent/RU2004122095A/en not_active Application Discontinuation
- 2002-12-16 MX MXPA04005881A patent/MXPA04005881A/en unknown
- 2002-12-16 AU AU2002347187A patent/AU2002347187A1/en not_active Abandoned
- 2002-12-16 JP JP2003555540A patent/JP2005513269A/en active Pending
- 2002-12-16 WO PCT/CH2002/000698 patent/WO2003054910A1/en not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6254721B1 (en) * | 1989-02-27 | 2001-07-03 | Hitachi, Ltd. | Method and apparatus for processing samples |
US5121705A (en) * | 1991-04-05 | 1992-06-16 | Mbk Microtek Inc. | Loading lock for chemical vapor deposition apparatus |
WO1999053534A1 (en) * | 1998-04-09 | 1999-10-21 | Ohmi, Tadahiro | Process system |
JP2000277489A (en) * | 1999-03-24 | 2000-10-06 | Sharp Corp | Plasma processing device |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 13 5 February 2001 (2001-02-05) * |
Also Published As
Publication number | Publication date |
---|---|
KR20040070244A (en) | 2004-08-06 |
MXPA04005881A (en) | 2005-05-16 |
JP2005513269A (en) | 2005-05-12 |
AU2002347187A1 (en) | 2003-07-09 |
RU2004122095A (en) | 2005-03-27 |
CA2469863A1 (en) | 2003-07-03 |
CN1606793A (en) | 2005-04-13 |
EP1459352A1 (en) | 2004-09-22 |
US20050028933A1 (en) | 2005-02-10 |
BR0215166A (en) | 2004-10-19 |
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