WO2003068913A3 - Synthesis of 2h- and 13c- substituted dithianes - Google Patents

Synthesis of 2h- and 13c- substituted dithianes Download PDF

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Publication number
WO2003068913A3
WO2003068913A3 PCT/US2003/003525 US0303525W WO03068913A3 WO 2003068913 A3 WO2003068913 A3 WO 2003068913A3 US 0303525 W US0303525 W US 0303525W WO 03068913 A3 WO03068913 A3 WO 03068913A3
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WIPO (PCT)
Prior art keywords
synthesis
atom
directed
present
directly bonded
Prior art date
Application number
PCT/US2003/003525
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French (fr)
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WO2003068913A2 (en
Inventor
Rodolfo A Martinez
Marc A Alvarez
Louis A Silks Iii
Clifford J Unkefer
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Univ California
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Application filed by Univ California filed Critical Univ California
Priority to AU2003225551A priority Critical patent/AU2003225551A1/en
Publication of WO2003068913A2 publication Critical patent/WO2003068913A2/en
Publication of WO2003068913A3 publication Critical patent/WO2003068913A3/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/53Immunoassay; Biospecific binding assay; Materials therefor
    • G01N33/543Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
    • G01N33/54366Apparatus specially adapted for solid-phase testing
    • G01N33/54373Apparatus specially adapted for solid-phase testing involving physiochemical end-point determination, e.g. wave-guides, FETS, gratings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/53Immunoassay; Biospecific binding assay; Materials therefor
    • G01N33/543Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
    • G01N33/54366Apparatus specially adapted for solid-phase testing
    • G01N33/54373Apparatus specially adapted for solid-phase testing involving physiochemical end-point determination, e.g. wave-guides, FETS, gratings
    • G01N33/5438Electrodes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/48Biological material, e.g. blood, urine; Haemocytometers
    • G01N33/50Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
    • G01N33/53Immunoassay; Biospecific binding assay; Materials therefor
    • G01N33/543Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
    • G01N33/54366Apparatus specially adapted for solid-phase testing
    • G01N33/54386Analytical elements
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B2200/00Indexing scheme relating to specific properties of organic compounds
    • C07B2200/05Isotopically modified compounds, e.g. labelled
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S435/00Chemistry: molecular biology and microbiology
    • Y10S435/808Optical sensing apparatus
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S435/00Chemistry: molecular biology and microbiology
    • Y10S435/966Chemistry: molecular biology and microbiology involving an enzyme system with high turnover rate or complement magnified assay, e.g. multi-enzyme systems
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S436/00Chemistry: analytical and immunological testing
    • Y10S436/805Optical property
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S436/00Chemistry: analytical and immunological testing
    • Y10S436/806Electrical property or magnetic property
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S436/00Chemistry: analytical and immunological testing
    • Y10S436/807Apparatus included in process claim, e.g. physical support structures
    • Y10S436/808Automated or kit
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S436/00Chemistry: analytical and immunological testing
    • Y10S436/823Immunogenic carrier or carrier per se
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S530/00Chemistry: natural resins or derivatives; peptides or proteins; lignins or reaction products thereof
    • Y10S530/81Carrier - bound or immobilized peptides or proteins and the preparation thereof, e.g. biological cell or cell fragment as carrier
    • Y10S530/811Peptides or proteins is immobilized on, or in, an inorganic carrier
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S530/00Chemistry: natural resins or derivatives; peptides or proteins; lignins or reaction products thereof
    • Y10S530/81Carrier - bound or immobilized peptides or proteins and the preparation thereof, e.g. biological cell or cell fragment as carrier
    • Y10S530/812Peptides or proteins is immobilized on, or in, an organic carrier

Abstract

The present invention is directed to labeled compounds, [2-13C]dithiane wherein the 13C atom is directly bonded to one or two deuterium atoms. The present invention is also directed to processes of preparing [2-13C]dithiane wherein the 13C atom is directly bonded to one or two deuterium atoms. The present invention is also directed to labeled compounds, e.g., [2H1-2, 13C]methanol (arylthio)-, acetates wherein the 13C atom is directly bonded to exactly one or two deuterium atoms.
PCT/US2003/003525 2002-02-13 2003-02-06 Synthesis of 2h- and 13c- substituted dithianes WO2003068913A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003225551A AU2003225551A1 (en) 2002-02-13 2003-02-06 Synthesis of 2h- and 13c- substituted dithianes

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/074,669 US6541671B1 (en) 2002-02-13 2002-02-13 Synthesis of 2H- and 13C-substituted dithanes
US10/074,669 2002-02-13

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WO2003068913A2 WO2003068913A2 (en) 2003-08-21
WO2003068913A3 true WO2003068913A3 (en) 2003-12-24

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AU (1) AU2003225551A1 (en)
WO (1) WO2003068913A2 (en)

Families Citing this family (174)

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Publication number Priority date Publication date Assignee Title
US6764673B2 (en) * 2002-02-13 2004-07-20 The Regents Of The University Of California Synthesis of [2H1, 13C], [2H2, 13C] and [2H3, 13C]methyl aryl sulfones and sulfoxides
US9371559B2 (en) 2002-06-20 2016-06-21 The Regents Of The University Of California Compositions for detection and analysis of polynucleotides using light harvesting multichromophores
US7144950B2 (en) 2003-09-17 2006-12-05 The Regents Of The University Of California Conformationally flexible cationic conjugated polymers
US10001475B2 (en) 2002-06-20 2018-06-19 The Regents Of The University Of California Light harvesting multichromophore compositions and methods of using the same
EA007653B1 (en) 2002-08-26 2006-12-29 Дзе Риджентс Оф Дзе Юниверсити Оф Калифорния Methods and compositions for detection and analysis of polynucleotides using light harvesting multichromophores
DK1599609T3 (en) * 2003-02-13 2010-03-29 Univ California Methods and Compositions for Detecting and Analyzing Interactions of Polynucleotide-Binding Proteins Using Light-Collecting Multichromophores
US20050230350A1 (en) * 2004-02-26 2005-10-20 Applied Materials, Inc. In-situ dry clean chamber for front end of line fabrication
US20080299598A1 (en) * 2004-10-25 2008-12-04 Raz Jelinek Detector Comprising a Membrane Perturbation - Detecting Polymer and Functional Membrane Fragments
EP1838752B1 (en) 2005-01-10 2017-10-04 The Regents of The University of California Cationic conjugated polymers suitable for strand-specific polynucleotide detection in homogeneous and solid state assays
US7811755B2 (en) * 2005-01-10 2010-10-12 The Regents Of The University Of California Methods and articles for strand-specific polynucleotide detection with cationic multichromophores
US7666594B2 (en) * 2005-01-31 2010-02-23 The Regents Of The University Of California Methods for assaying a sample for an aggregant
US7582801B2 (en) * 2005-02-07 2009-09-01 Los Alamos National Security, Llc Synthesis of [1-13C]pyruvic acid], [2-13C]pyruvic acid], [3-13C]pyruvic acid] and combinations thereof
US7321049B2 (en) * 2005-11-04 2008-01-22 Los Alamos National Security, Llc Synthesis of [13C] and [2H] substituted methacrylic acid, [13C] and [2H] substituted methyl methacrylate and/or related compounds
US7858366B2 (en) 2006-08-24 2010-12-28 Microfluidic Systems, Inc Integrated airborne substance collection and detection system
US7633606B2 (en) * 2006-08-24 2009-12-15 Microfluidic Systems, Inc. Integrated airborne substance collection and detection system
US7705739B2 (en) 2006-08-24 2010-04-27 Microfluidic Systems, Inc. Integrated airborne substance collection and detection system
US8038946B1 (en) 2006-12-04 2011-10-18 Namadics, Inc. Discreet passive explosive detection through 2-sided waveguided fluorescence
WO2008127898A1 (en) * 2007-04-11 2008-10-23 Martinez Rodolfo A Single carbon precursor synthons
US7977102B2 (en) * 2007-06-15 2011-07-12 Los Alamos National Security, Llc Isotopically labeled compositions and method
EP2197350A2 (en) * 2007-09-11 2010-06-23 Baxter International Inc. Infusion therapy sensor system
US8133451B2 (en) * 2008-08-28 2012-03-13 Microfluidic Systems, Inc. Sample preparation apparatus
US20100317886A1 (en) * 2009-06-11 2010-12-16 Martinez Rodolfo A Synthesis of isotopically-labeled functionalized dienes
US9324576B2 (en) 2010-05-27 2016-04-26 Applied Materials, Inc. Selective etch for silicon films
US10283321B2 (en) 2011-01-18 2019-05-07 Applied Materials, Inc. Semiconductor processing system and methods using capacitively coupled plasma
US8771539B2 (en) 2011-02-22 2014-07-08 Applied Materials, Inc. Remotely-excited fluorine and water vapor etch
US9064815B2 (en) 2011-03-14 2015-06-23 Applied Materials, Inc. Methods for etch of metal and metal-oxide films
US8999856B2 (en) 2011-03-14 2015-04-07 Applied Materials, Inc. Methods for etch of sin films
US8771536B2 (en) 2011-08-01 2014-07-08 Applied Materials, Inc. Dry-etch for silicon-and-carbon-containing films
US8679982B2 (en) 2011-08-26 2014-03-25 Applied Materials, Inc. Selective suppression of dry-etch rate of materials containing both silicon and oxygen
US8679983B2 (en) 2011-09-01 2014-03-25 Applied Materials, Inc. Selective suppression of dry-etch rate of materials containing both silicon and nitrogen
US8927390B2 (en) 2011-09-26 2015-01-06 Applied Materials, Inc. Intrench profile
US8808563B2 (en) 2011-10-07 2014-08-19 Applied Materials, Inc. Selective etch of silicon by way of metastable hydrogen termination
WO2013070436A1 (en) 2011-11-08 2013-05-16 Applied Materials, Inc. Methods of reducing substrate dislocation during gapfill processing
CN102516990B (en) * 2011-11-30 2013-12-18 东南大学 Application of polyphenylene vinylene (PPV) polymer serving as fluorescent indicator in oxygen sensor based on fluorescence quenching
US9267739B2 (en) 2012-07-18 2016-02-23 Applied Materials, Inc. Pedestal with multi-zone temperature control and multiple purge capabilities
US9373517B2 (en) 2012-08-02 2016-06-21 Applied Materials, Inc. Semiconductor processing with DC assisted RF power for improved control
US9034770B2 (en) 2012-09-17 2015-05-19 Applied Materials, Inc. Differential silicon oxide etch
US9023734B2 (en) 2012-09-18 2015-05-05 Applied Materials, Inc. Radical-component oxide etch
US9390937B2 (en) 2012-09-20 2016-07-12 Applied Materials, Inc. Silicon-carbon-nitride selective etch
US9132436B2 (en) 2012-09-21 2015-09-15 Applied Materials, Inc. Chemical control features in wafer process equipment
US8765574B2 (en) 2012-11-09 2014-07-01 Applied Materials, Inc. Dry etch process
US8969212B2 (en) 2012-11-20 2015-03-03 Applied Materials, Inc. Dry-etch selectivity
US8980763B2 (en) 2012-11-30 2015-03-17 Applied Materials, Inc. Dry-etch for selective tungsten removal
US9064816B2 (en) 2012-11-30 2015-06-23 Applied Materials, Inc. Dry-etch for selective oxidation removal
US9111877B2 (en) 2012-12-18 2015-08-18 Applied Materials, Inc. Non-local plasma oxide etch
US8921234B2 (en) 2012-12-21 2014-12-30 Applied Materials, Inc. Selective titanium nitride etching
US10256079B2 (en) 2013-02-08 2019-04-09 Applied Materials, Inc. Semiconductor processing systems having multiple plasma configurations
US9362130B2 (en) 2013-03-01 2016-06-07 Applied Materials, Inc. Enhanced etching processes using remote plasma sources
US9040422B2 (en) 2013-03-05 2015-05-26 Applied Materials, Inc. Selective titanium nitride removal
US8801952B1 (en) 2013-03-07 2014-08-12 Applied Materials, Inc. Conformal oxide dry etch
US10170282B2 (en) 2013-03-08 2019-01-01 Applied Materials, Inc. Insulated semiconductor faceplate designs
US20140271097A1 (en) 2013-03-15 2014-09-18 Applied Materials, Inc. Processing systems and methods for halide scavenging
US8895449B1 (en) 2013-05-16 2014-11-25 Applied Materials, Inc. Delicate dry clean
US9114438B2 (en) 2013-05-21 2015-08-25 Applied Materials, Inc. Copper residue chamber clean
US9493879B2 (en) 2013-07-12 2016-11-15 Applied Materials, Inc. Selective sputtering for pattern transfer
US9773648B2 (en) 2013-08-30 2017-09-26 Applied Materials, Inc. Dual discharge modes operation for remote plasma
US8956980B1 (en) 2013-09-16 2015-02-17 Applied Materials, Inc. Selective etch of silicon nitride
US8951429B1 (en) 2013-10-29 2015-02-10 Applied Materials, Inc. Tungsten oxide processing
US9576809B2 (en) 2013-11-04 2017-02-21 Applied Materials, Inc. Etch suppression with germanium
US9236265B2 (en) 2013-11-04 2016-01-12 Applied Materials, Inc. Silicon germanium processing
US9520303B2 (en) 2013-11-12 2016-12-13 Applied Materials, Inc. Aluminum selective etch
US9245762B2 (en) 2013-12-02 2016-01-26 Applied Materials, Inc. Procedure for etch rate consistency
US9117855B2 (en) 2013-12-04 2015-08-25 Applied Materials, Inc. Polarity control for remote plasma
US9263278B2 (en) 2013-12-17 2016-02-16 Applied Materials, Inc. Dopant etch selectivity control
US9287095B2 (en) 2013-12-17 2016-03-15 Applied Materials, Inc. Semiconductor system assemblies and methods of operation
US9190293B2 (en) 2013-12-18 2015-11-17 Applied Materials, Inc. Even tungsten etch for high aspect ratio trenches
US9287134B2 (en) 2014-01-17 2016-03-15 Applied Materials, Inc. Titanium oxide etch
US9293568B2 (en) 2014-01-27 2016-03-22 Applied Materials, Inc. Method of fin patterning
US9396989B2 (en) 2014-01-27 2016-07-19 Applied Materials, Inc. Air gaps between copper lines
US9385028B2 (en) 2014-02-03 2016-07-05 Applied Materials, Inc. Air gap process
US10324072B2 (en) 2014-02-21 2019-06-18 The Regents Of The University Of Michigan Polydiacetylene water sensors
US9499898B2 (en) 2014-03-03 2016-11-22 Applied Materials, Inc. Layered thin film heater and method of fabrication
US9299575B2 (en) 2014-03-17 2016-03-29 Applied Materials, Inc. Gas-phase tungsten etch
US9299538B2 (en) 2014-03-20 2016-03-29 Applied Materials, Inc. Radial waveguide systems and methods for post-match control of microwaves
US9299537B2 (en) 2014-03-20 2016-03-29 Applied Materials, Inc. Radial waveguide systems and methods for post-match control of microwaves
US9136273B1 (en) 2014-03-21 2015-09-15 Applied Materials, Inc. Flash gate air gap
US9903020B2 (en) 2014-03-31 2018-02-27 Applied Materials, Inc. Generation of compact alumina passivation layers on aluminum plasma equipment components
US9269590B2 (en) 2014-04-07 2016-02-23 Applied Materials, Inc. Spacer formation
US9309598B2 (en) 2014-05-28 2016-04-12 Applied Materials, Inc. Oxide and metal removal
US9847289B2 (en) 2014-05-30 2017-12-19 Applied Materials, Inc. Protective via cap for improved interconnect performance
US9378969B2 (en) 2014-06-19 2016-06-28 Applied Materials, Inc. Low temperature gas-phase carbon removal
US9406523B2 (en) 2014-06-19 2016-08-02 Applied Materials, Inc. Highly selective doped oxide removal method
US9425058B2 (en) 2014-07-24 2016-08-23 Applied Materials, Inc. Simplified litho-etch-litho-etch process
US9496167B2 (en) 2014-07-31 2016-11-15 Applied Materials, Inc. Integrated bit-line airgap formation and gate stack post clean
US9159606B1 (en) 2014-07-31 2015-10-13 Applied Materials, Inc. Metal air gap
US9378978B2 (en) 2014-07-31 2016-06-28 Applied Materials, Inc. Integrated oxide recess and floating gate fin trimming
US9165786B1 (en) 2014-08-05 2015-10-20 Applied Materials, Inc. Integrated oxide and nitride recess for better channel contact in 3D architectures
US9659753B2 (en) 2014-08-07 2017-05-23 Applied Materials, Inc. Grooved insulator to reduce leakage current
US9553102B2 (en) 2014-08-19 2017-01-24 Applied Materials, Inc. Tungsten separation
US9355856B2 (en) 2014-09-12 2016-05-31 Applied Materials, Inc. V trench dry etch
US9368364B2 (en) 2014-09-24 2016-06-14 Applied Materials, Inc. Silicon etch process with tunable selectivity to SiO2 and other materials
US9355862B2 (en) 2014-09-24 2016-05-31 Applied Materials, Inc. Fluorine-based hardmask removal
US9613822B2 (en) 2014-09-25 2017-04-04 Applied Materials, Inc. Oxide etch selectivity enhancement
US9966240B2 (en) 2014-10-14 2018-05-08 Applied Materials, Inc. Systems and methods for internal surface conditioning assessment in plasma processing equipment
US9355922B2 (en) 2014-10-14 2016-05-31 Applied Materials, Inc. Systems and methods for internal surface conditioning in plasma processing equipment
US11637002B2 (en) 2014-11-26 2023-04-25 Applied Materials, Inc. Methods and systems to enhance process uniformity
US9299583B1 (en) 2014-12-05 2016-03-29 Applied Materials, Inc. Aluminum oxide selective etch
US10573496B2 (en) 2014-12-09 2020-02-25 Applied Materials, Inc. Direct outlet toroidal plasma source
US10224210B2 (en) 2014-12-09 2019-03-05 Applied Materials, Inc. Plasma processing system with direct outlet toroidal plasma source
US9502258B2 (en) 2014-12-23 2016-11-22 Applied Materials, Inc. Anisotropic gap etch
US9343272B1 (en) 2015-01-08 2016-05-17 Applied Materials, Inc. Self-aligned process
US11257693B2 (en) 2015-01-09 2022-02-22 Applied Materials, Inc. Methods and systems to improve pedestal temperature control
US9373522B1 (en) 2015-01-22 2016-06-21 Applied Mateials, Inc. Titanium nitride removal
US9449846B2 (en) 2015-01-28 2016-09-20 Applied Materials, Inc. Vertical gate separation
US9728437B2 (en) 2015-02-03 2017-08-08 Applied Materials, Inc. High temperature chuck for plasma processing systems
US20160225652A1 (en) 2015-02-03 2016-08-04 Applied Materials, Inc. Low temperature chuck for plasma processing systems
US9881805B2 (en) 2015-03-02 2018-01-30 Applied Materials, Inc. Silicon selective removal
US9691645B2 (en) 2015-08-06 2017-06-27 Applied Materials, Inc. Bolted wafer chuck thermal management systems and methods for wafer processing systems
US9741593B2 (en) 2015-08-06 2017-08-22 Applied Materials, Inc. Thermal management systems and methods for wafer processing systems
US9349605B1 (en) 2015-08-07 2016-05-24 Applied Materials, Inc. Oxide etch selectivity systems and methods
US10504700B2 (en) 2015-08-27 2019-12-10 Applied Materials, Inc. Plasma etching systems and methods with secondary plasma injection
US10522371B2 (en) 2016-05-19 2019-12-31 Applied Materials, Inc. Systems and methods for improved semiconductor etching and component protection
US10504754B2 (en) 2016-05-19 2019-12-10 Applied Materials, Inc. Systems and methods for improved semiconductor etching and component protection
US9865484B1 (en) 2016-06-29 2018-01-09 Applied Materials, Inc. Selective etch using material modification and RF pulsing
US10629473B2 (en) 2016-09-09 2020-04-21 Applied Materials, Inc. Footing removal for nitride spacer
US10062575B2 (en) 2016-09-09 2018-08-28 Applied Materials, Inc. Poly directional etch by oxidation
US10062585B2 (en) 2016-10-04 2018-08-28 Applied Materials, Inc. Oxygen compatible plasma source
US9721789B1 (en) 2016-10-04 2017-08-01 Applied Materials, Inc. Saving ion-damaged spacers
US9934942B1 (en) 2016-10-04 2018-04-03 Applied Materials, Inc. Chamber with flow-through source
US10546729B2 (en) 2016-10-04 2020-01-28 Applied Materials, Inc. Dual-channel showerhead with improved profile
US10062579B2 (en) 2016-10-07 2018-08-28 Applied Materials, Inc. Selective SiN lateral recess
US9947549B1 (en) 2016-10-10 2018-04-17 Applied Materials, Inc. Cobalt-containing material removal
US9768034B1 (en) 2016-11-11 2017-09-19 Applied Materials, Inc. Removal methods for high aspect ratio structures
US10163696B2 (en) 2016-11-11 2018-12-25 Applied Materials, Inc. Selective cobalt removal for bottom up gapfill
US10026621B2 (en) 2016-11-14 2018-07-17 Applied Materials, Inc. SiN spacer profile patterning
US10242908B2 (en) 2016-11-14 2019-03-26 Applied Materials, Inc. Airgap formation with damage-free copper
US10566206B2 (en) 2016-12-27 2020-02-18 Applied Materials, Inc. Systems and methods for anisotropic material breakthrough
US10403507B2 (en) 2017-02-03 2019-09-03 Applied Materials, Inc. Shaped etch profile with oxidation
US10431429B2 (en) 2017-02-03 2019-10-01 Applied Materials, Inc. Systems and methods for radial and azimuthal control of plasma uniformity
US10043684B1 (en) 2017-02-06 2018-08-07 Applied Materials, Inc. Self-limiting atomic thermal etching systems and methods
US10319739B2 (en) 2017-02-08 2019-06-11 Applied Materials, Inc. Accommodating imperfectly aligned memory holes
US10943834B2 (en) 2017-03-13 2021-03-09 Applied Materials, Inc. Replacement contact process
US10319649B2 (en) 2017-04-11 2019-06-11 Applied Materials, Inc. Optical emission spectroscopy (OES) for remote plasma monitoring
US11276590B2 (en) 2017-05-17 2022-03-15 Applied Materials, Inc. Multi-zone semiconductor substrate supports
US11276559B2 (en) 2017-05-17 2022-03-15 Applied Materials, Inc. Semiconductor processing chamber for multiple precursor flow
US10497579B2 (en) 2017-05-31 2019-12-03 Applied Materials, Inc. Water-free etching methods
US10049891B1 (en) 2017-05-31 2018-08-14 Applied Materials, Inc. Selective in situ cobalt residue removal
US10920320B2 (en) 2017-06-16 2021-02-16 Applied Materials, Inc. Plasma health determination in semiconductor substrate processing reactors
US10541246B2 (en) 2017-06-26 2020-01-21 Applied Materials, Inc. 3D flash memory cells which discourage cross-cell electrical tunneling
US10727080B2 (en) 2017-07-07 2020-07-28 Applied Materials, Inc. Tantalum-containing material removal
US10541184B2 (en) 2017-07-11 2020-01-21 Applied Materials, Inc. Optical emission spectroscopic techniques for monitoring etching
US10354889B2 (en) 2017-07-17 2019-07-16 Applied Materials, Inc. Non-halogen etching of silicon-containing materials
US10170336B1 (en) 2017-08-04 2019-01-01 Applied Materials, Inc. Methods for anisotropic control of selective silicon removal
US10043674B1 (en) 2017-08-04 2018-08-07 Applied Materials, Inc. Germanium etching systems and methods
US10297458B2 (en) 2017-08-07 2019-05-21 Applied Materials, Inc. Process window widening using coated parts in plasma etch processes
US10283324B1 (en) 2017-10-24 2019-05-07 Applied Materials, Inc. Oxygen treatment for nitride etching
US10128086B1 (en) 2017-10-24 2018-11-13 Applied Materials, Inc. Silicon pretreatment for nitride removal
US10256112B1 (en) 2017-12-08 2019-04-09 Applied Materials, Inc. Selective tungsten removal
US10903054B2 (en) 2017-12-19 2021-01-26 Applied Materials, Inc. Multi-zone gas distribution systems and methods
US11328909B2 (en) 2017-12-22 2022-05-10 Applied Materials, Inc. Chamber conditioning and removal processes
US10854426B2 (en) 2018-01-08 2020-12-01 Applied Materials, Inc. Metal recess for semiconductor structures
US10964512B2 (en) 2018-02-15 2021-03-30 Applied Materials, Inc. Semiconductor processing chamber multistage mixing apparatus and methods
US10679870B2 (en) 2018-02-15 2020-06-09 Applied Materials, Inc. Semiconductor processing chamber multistage mixing apparatus
TWI716818B (en) 2018-02-28 2021-01-21 美商應用材料股份有限公司 Systems and methods to form airgaps
US10593560B2 (en) 2018-03-01 2020-03-17 Applied Materials, Inc. Magnetic induction plasma source for semiconductor processes and equipment
US10319600B1 (en) 2018-03-12 2019-06-11 Applied Materials, Inc. Thermal silicon etch
US10497573B2 (en) 2018-03-13 2019-12-03 Applied Materials, Inc. Selective atomic layer etching of semiconductor materials
US10573527B2 (en) 2018-04-06 2020-02-25 Applied Materials, Inc. Gas-phase selective etching systems and methods
US10490406B2 (en) 2018-04-10 2019-11-26 Appled Materials, Inc. Systems and methods for material breakthrough
US10699879B2 (en) 2018-04-17 2020-06-30 Applied Materials, Inc. Two piece electrode assembly with gap for plasma control
US10886137B2 (en) 2018-04-30 2021-01-05 Applied Materials, Inc. Selective nitride removal
EP3587482A1 (en) 2018-06-25 2020-01-01 INTA, Instituto Nacional de Technica Aeroespacial Isotopically labelled materials for degradation detection
US10872778B2 (en) 2018-07-06 2020-12-22 Applied Materials, Inc. Systems and methods utilizing solid-phase etchants
US10755941B2 (en) 2018-07-06 2020-08-25 Applied Materials, Inc. Self-limiting selective etching systems and methods
US10672642B2 (en) 2018-07-24 2020-06-02 Applied Materials, Inc. Systems and methods for pedestal configuration
US11049755B2 (en) 2018-09-14 2021-06-29 Applied Materials, Inc. Semiconductor substrate supports with embedded RF shield
US10892198B2 (en) 2018-09-14 2021-01-12 Applied Materials, Inc. Systems and methods for improved performance in semiconductor processing
US11062887B2 (en) 2018-09-17 2021-07-13 Applied Materials, Inc. High temperature RF heater pedestals
US11417534B2 (en) 2018-09-21 2022-08-16 Applied Materials, Inc. Selective material removal
US11682560B2 (en) 2018-10-11 2023-06-20 Applied Materials, Inc. Systems and methods for hafnium-containing film removal
US11121002B2 (en) 2018-10-24 2021-09-14 Applied Materials, Inc. Systems and methods for etching metals and metal derivatives
US11437242B2 (en) 2018-11-27 2022-09-06 Applied Materials, Inc. Selective removal of silicon-containing materials
US11721527B2 (en) 2019-01-07 2023-08-08 Applied Materials, Inc. Processing chamber mixing systems
US10920319B2 (en) 2019-01-11 2021-02-16 Applied Materials, Inc. Ceramic showerheads with conductive electrodes

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724202A (en) * 1983-12-12 1988-02-09 Molecular Diagnostics, Inc. Use of non-hybridizable nucleic acids for the detection of nucleic acid hybridization
US5200051A (en) * 1988-11-14 1993-04-06 I-Stat Corporation Wholly microfabricated biosensors and process for the manufacture and use thereof
US5280548A (en) * 1993-03-11 1994-01-18 Boc Health Care, Inc. Emission based fiber optic sensors for pH and carbon dioxide analysis
US5364797A (en) * 1993-05-20 1994-11-15 Mobil Oil Corp. Sensor device containing mesoporous crystalline material
EP0736103A4 (en) * 1993-12-17 1999-07-28 Roger S Cubicciotti Nucleotide-directed assembly of bimolecular and multimolecular drugs and devices
DE4434200C2 (en) 1994-09-24 2002-06-27 Degussa Process for the preparation of 3-acryloxypropylalkoxysilanes
DE4435390C2 (en) 1994-10-04 2001-07-26 Degussa Process for the preparation of aminopropylalkoxysilanes in the presence of shaped polymeric rhodium complex catalysts and their use
DE4438032C2 (en) 1994-10-25 2001-09-27 Degussa Process for the preparation of hydrogenalkoxysilanes
DE4443825A1 (en) 1994-12-09 1996-06-13 Huels Chemische Werke Ag Water-based organopolysiloxane-containing compositions, processes for their preparation and their use
DE4443824A1 (en) 1994-12-09 1996-06-13 Huels Chemische Werke Ag Organopolysiloxane-containing water-based compositions, processes for their preparation and their use
CA2262853A1 (en) * 1996-05-31 1997-12-04 The Regents Of The University Of California Stable, concentrated solutions of high molecular weight polyaniline and articles therefrom
DE19624032A1 (en) 1996-06-17 1997-12-18 Huels Chemische Werke Ag Oligomer mixture of condensed alkylalkoxysilanes
DE19639782A1 (en) 1996-09-27 1998-04-02 Huels Chemische Werke Ag Glycidether, acrylic and / or methacrylic functional organopolysiloxane-containing compositions based on water, processes for their preparation and their use
US5759767A (en) * 1996-10-11 1998-06-02 Joseph R. Lakowicz Two-photon and multi-photon measurement of analytes in animal and human tissues and fluids
DE19644561C2 (en) 1996-10-26 2003-10-16 Degussa Process for the preparation of fluoroalkyl group-bearing silicon-organic compounds
DE19649953A1 (en) 1996-12-03 1998-06-04 Huels Chemische Werke Ag Fluoroalkyl-functional organopolysiloxane-containing water-based compositions, processes for their preparation and their use
DE19649954A1 (en) 1996-12-03 1998-06-04 Huels Chemische Werke Ag Fluoroalkyl-functional organosiloxane-containing compositions based on alcohol, process for their preparation and their use
DE19649955A1 (en) 1996-12-03 1998-06-04 Huels Chemische Werke Ag Fluoroalkyl-functional organopolysiloxane-containing compositions based on water / alcohol, process for their preparation and their use
DE19818924A1 (en) 1998-04-28 1999-11-04 Degussa Surface-modified fillers, processes for their production and their use
DE19823390A1 (en) 1998-05-26 1999-12-16 Degussa Oligomerized organopolysiloxane cocondensate, its preparation and its use
DE19837010A1 (en) 1998-08-14 2000-02-17 Degussa Process for the preparation of acetoxysilanes
DE19848351A1 (en) 1998-10-21 2000-04-27 Degussa Camera with internal exposure function has controller that determines light output of light output device according to sensitivity of film determined by film sensitivity detector
DE19849196A1 (en) 1998-10-26 2000-04-27 Degussa Process for neutralizing and reducing residual halogen content in alkoxysilanes or alkoxysilane-based compositions
DE19849308A1 (en) 1998-10-27 2000-05-04 Degussa Aminopropyl functional siloxane oligomers
DE19904132C2 (en) 1999-02-03 2002-11-28 Degussa Composition of fluoroorganofunctional silanes and siloxanes, process for their preparation and their use
DE19908636A1 (en) 1999-02-27 2000-08-31 Degussa Water-based composition of amino-functional silicon compounds
DE19929021A1 (en) 1999-06-25 2000-12-28 Degussa Functional organylorganyloxysilanes on carriers in cable compounds
DE19964309C2 (en) 1999-11-15 2003-07-03 Degussa Triamino and fluoroalkyl functional organosiloxanes or mixtures thereof
DE19961972A1 (en) 1999-12-22 2001-06-28 Degussa Organosilane and / or organosiloxane-containing agent for filled polyamide
IL152711A0 (en) * 2000-05-08 2003-06-24 Qtl Biosystems Llc Improvements to the fluorescent polymer-qtl approach to biosensing
JP2004527746A (en) * 2001-03-16 2004-09-09 キューティエル・バイオシステムズ・リミテッド・ライアビリティ・カンパニー Bioassay based on fluorescent polymer superquenching

Non-Patent Citations (10)

* Cited by examiner, † Cited by third party
Title
DATABASE CAPLUS [online] ASHER ET AL.: "Carbon-13 NMR spectra of carbanions dewrived from 2-substituted 1,3-diathanes, 0-substituted fluorenes and biphenylylmethanes as related to structure and charge density", XP002967387, accession no. STN Database accession no. 1984-102632 *
DATABASE CAPLUS [online] BATTERSBY ET AL.: "Studies of enzyme-mediated reactions. Part 12. Stereochemical course of decarboxylation of (2-S)-tyrosine to tyramine by microbial, mammalian and plant systems", XP002967386, accession no. STN Database accession no. 1980-490890 *
DATABASE CAPLUS [online] FURAKAWA ET AL.: "Pummerer-type reaction of sulfilimines with acetic anhydride", XP002967388, accession no. STN Database accession no. 1978-528836 *
DATABASE CAPLUS [online] LAMBERT ET AL.: "Protonic and conformational equilibrums of 1,3-dithiaalkanes and their congeners in highly acidic media", XP002967385, accession no. STN Database accession no. 1980-21897 *
DATABASE CAPLUS [online] PAVLOVA ET AL.: "Synthesis and disproportionation of monothioacetals", XP002967389, accession no. STN Database accession no. 1983-594546 *
J. CHEM. SOC. PERKIN TRANS. 1: ORGANIC AND BIOORGANIC CHEMISTRY, no. 1, 1980, pages 31 - 42 *
JOURNAL OF ORGANIC CHEMISTRY, vol. 44, no. 25, 1979, pages 4689 - 4695 *
JOURNAL OF THE AMERICAN CHEM. SOC., vol. 106, no. 5, 1984, pages 1432 - 1440 *
PHOSPHORUS AND SULFUR AND THE RELATED ELEMENTS, vol. 3, no. 3, 1977, pages 277 - 280 *
SINT. METODY OSN. ELEMENTOORG. SOEDIN, 1982, pages 85 - 93 *

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