WO2003083160A3 - Evaluation of chamber components having textured coatings chamber components - Google Patents
Evaluation of chamber components having textured coatings chamber components Download PDFInfo
- Publication number
- WO2003083160A3 WO2003083160A3 PCT/US2003/009430 US0309430W WO03083160A3 WO 2003083160 A3 WO2003083160 A3 WO 2003083160A3 US 0309430 W US0309430 W US 0309430W WO 03083160 A3 WO03083160 A3 WO 03083160A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chamber components
- component
- evaluation
- electrons
- textured coatings
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title abstract 3
- 238000011156 evaluation Methods 0.000 title 1
- 239000011248 coating agent Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/203—Measuring back scattering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020037014429A KR101095330B1 (en) | 2002-03-27 | 2003-03-26 | Evaluation of chamber components having textured coatings |
EP03714431A EP1485515B1 (en) | 2002-03-27 | 2003-03-26 | Evaluation of chamber components having textured coatings |
JP2003580589A JP2005521868A (en) | 2002-03-27 | 2003-03-26 | Method for evaluating chamber elements with texture coating |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/113,847 US7026009B2 (en) | 2002-03-27 | 2002-03-27 | Evaluation of chamber components having textured coatings |
US10/113,847 | 2002-03-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003083160A2 WO2003083160A2 (en) | 2003-10-09 |
WO2003083160A3 true WO2003083160A3 (en) | 2004-02-05 |
Family
ID=28453691
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/009430 WO2003083160A2 (en) | 2002-03-27 | 2003-03-26 | Evaluation of chamber components having textured coatings chamber components |
Country Status (7)
Country | Link |
---|---|
US (1) | US7026009B2 (en) |
EP (1) | EP1485515B1 (en) |
JP (1) | JP2005521868A (en) |
KR (1) | KR101095330B1 (en) |
CN (1) | CN100390922C (en) |
TW (1) | TWI309431B (en) |
WO (1) | WO2003083160A2 (en) |
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2002
- 2002-03-27 US US10/113,847 patent/US7026009B2/en not_active Expired - Fee Related
-
2003
- 2003-02-12 TW TW092102932A patent/TWI309431B/en not_active IP Right Cessation
- 2003-03-26 JP JP2003580589A patent/JP2005521868A/en active Pending
- 2003-03-26 EP EP03714431A patent/EP1485515B1/en not_active Expired - Lifetime
- 2003-03-26 KR KR1020037014429A patent/KR101095330B1/en not_active IP Right Cessation
- 2003-03-26 CN CNB038007827A patent/CN100390922C/en not_active Expired - Fee Related
- 2003-03-26 WO PCT/US2003/009430 patent/WO2003083160A2/en active Application Filing
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Publication number | Priority date | Publication date | Assignee | Title |
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US9481608B2 (en) | 2005-07-13 | 2016-11-01 | Applied Materials, Inc. | Surface annealing of components for substrate processing chambers |
US8980045B2 (en) | 2007-05-30 | 2015-03-17 | Applied Materials, Inc. | Substrate cleaning chamber and components |
Also Published As
Publication number | Publication date |
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WO2003083160A2 (en) | 2003-10-09 |
JP2005521868A (en) | 2005-07-21 |
TWI309431B (en) | 2009-05-01 |
KR20040100837A (en) | 2004-12-02 |
KR101095330B1 (en) | 2011-12-16 |
TW200305189A (en) | 2003-10-16 |
CN100390922C (en) | 2008-05-28 |
EP1485515A2 (en) | 2004-12-15 |
US20030185965A1 (en) | 2003-10-02 |
US7026009B2 (en) | 2006-04-11 |
EP1485515B1 (en) | 2011-09-21 |
CN1672236A (en) | 2005-09-21 |
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