WO2003087940A3 - Printing elements and method for producing the same using digital imaging photopolymerization - Google Patents

Printing elements and method for producing the same using digital imaging photopolymerization Download PDF

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Publication number
WO2003087940A3
WO2003087940A3 PCT/US2003/002195 US0302195W WO03087940A3 WO 2003087940 A3 WO2003087940 A3 WO 2003087940A3 US 0302195 W US0302195 W US 0302195W WO 03087940 A3 WO03087940 A3 WO 03087940A3
Authority
WO
WIPO (PCT)
Prior art keywords
producing
transfer article
liquid transfer
same
digital imaging
Prior art date
Application number
PCT/US2003/002195
Other languages
French (fr)
Other versions
WO2003087940A2 (en
Inventor
Michael E Mclean
Brett Scherrman
Douglas C Neckers
Peter Serguievski
Original Assignee
Day Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Day Int Inc filed Critical Day Int Inc
Priority to AU2003214892A priority Critical patent/AU2003214892B2/en
Priority to EP03710735A priority patent/EP1495368A2/en
Publication of WO2003087940A2 publication Critical patent/WO2003087940A2/en
Publication of WO2003087940A3 publication Critical patent/WO2003087940A3/en
Priority to AU2008202784A priority patent/AU2008202784B2/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/24Curved surfaces
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device

Abstract

A liquid transfer article and method of making is provided. The liquid transfer article includes a support assembly and an imaged surface formed directly on the surface of the support assembly by digital photopolymerization. The support assembly is in the form of a polymeric base, and the liquid transfer article is formed by providing a liquid photopolymer on the surface of the base and then irradiating the polymer with a light source to form the image. The liquid transfer article is reimagable and may be used in gravure printing processes, as well as other printing applications.
PCT/US2003/002195 2002-04-09 2003-01-24 Printing elements and method for producing the same using digital imaging photopolymerization WO2003087940A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2003214892A AU2003214892B2 (en) 2002-04-09 2003-01-24 Printing elements and method for producing the same using digital imaging photopolymerization
EP03710735A EP1495368A2 (en) 2002-04-09 2003-01-24 Printing elements and method for producing the same using digital imaging photopolymerization
AU2008202784A AU2008202784B2 (en) 2002-04-09 2008-06-24 Printing elements and method for producing the same using digital imaging photopolymerization

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/119,061 US6855482B2 (en) 2002-04-09 2002-04-09 Liquid transfer articles and method for producing the same using digital imaging photopolymerization
US10/119,061 2002-04-09

Publications (2)

Publication Number Publication Date
WO2003087940A2 WO2003087940A2 (en) 2003-10-23
WO2003087940A3 true WO2003087940A3 (en) 2003-12-04

Family

ID=28674531

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/002195 WO2003087940A2 (en) 2002-04-09 2003-01-24 Printing elements and method for producing the same using digital imaging photopolymerization

Country Status (4)

Country Link
US (3) US6855482B2 (en)
EP (1) EP1495368A2 (en)
AU (2) AU2003214892B2 (en)
WO (1) WO2003087940A2 (en)

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JP5080009B2 (en) * 2005-03-22 2012-11-21 日立ビアメカニクス株式会社 Exposure method
US7758799B2 (en) * 2005-04-01 2010-07-20 3D Systems, Inc. Edge smoothness with low resolution projected images for use in solid imaging
US8058093B2 (en) * 2005-08-26 2011-11-15 Global Photonic Energy Corp. Method of forming an encapsulating electrode
US8252514B2 (en) 2006-03-14 2012-08-28 Day International, Inc. Flexographic printing plate assembly
DE102006019963B4 (en) * 2006-04-28 2023-12-07 Envisiontec Gmbh Device and method for producing a three-dimensional object by layer-by-layer solidifying a material that can be solidified under the influence of electromagnetic radiation using mask exposure
US9415544B2 (en) * 2006-08-29 2016-08-16 3D Systems, Inc. Wall smoothness, feature accuracy and resolution in projected images via exposure levels in solid imaging
US8520290B2 (en) * 2007-08-16 2013-08-27 Silicon Quest Kabushiki Kaisha Display system for higher grayscale with a varying light source
JP4925470B2 (en) * 2008-07-01 2012-04-25 雅幸 井爪 Plate making machine for printing press
US8034540B2 (en) * 2008-07-31 2011-10-11 Eastman Kodak Company System and method employing secondary back exposure of flexographic plate
US8048359B2 (en) 2008-10-20 2011-11-01 3D Systems, Inc. Compensation of actinic radiation intensity profiles for three-dimensional modelers
BRPI0923627A2 (en) 2008-12-22 2016-01-19 Nl Organisate Voor Toegepast Natuurwetenchappelijk Onderzoek Tno method and system for layered production of a tangible object
US8777602B2 (en) 2008-12-22 2014-07-15 Nederlandse Organisatie Voor Tobgepast-Natuurwetenschappelijk Onderzoek TNO Method and apparatus for layerwise production of a 3D object
US8678805B2 (en) 2008-12-22 2014-03-25 Dsm Ip Assets Bv System and method for layerwise production of a tangible object
US8466984B2 (en) 2010-06-09 2013-06-18 International Business Machines Corporation Calibrating color for an image
US8817128B2 (en) 2010-06-09 2014-08-26 International Business Machines Corporation Real-time adjustment of illumination color temperature for digital imaging applications
US8691476B2 (en) 2011-12-16 2014-04-08 Taiwan Semiconductor Manufacturing Company, Ltd. EUV mask and method for forming the same
US9046738B2 (en) 2012-06-28 2015-06-02 International Business Machines Corporation Digital image capture under conditions of varying light intensity
US10532556B2 (en) 2013-12-16 2020-01-14 General Electric Company Control of solidification in laser powder bed fusion additive manufacturing using a diode laser fiber array
US10328685B2 (en) 2013-12-16 2019-06-25 General Electric Company Diode laser fiber array for powder bed fabrication or repair
TWI586554B (en) * 2013-12-20 2017-06-11 阪本順 Blanket, printing device, printing method, and blanket manufacturing method
CN108289448B (en) 2015-12-02 2021-10-22 先正达参股股份有限公司 Microbicidal oxadiazole derivatives
US9875958B1 (en) * 2016-11-09 2018-01-23 International Business Machines Corporation Trace/via hybrid structure and method of manufacture
CN106997156B (en) * 2017-03-27 2018-11-06 深圳市优盛科技有限公司 The exposure method of high-precision line pattern is prepared on high radian 3 D stereo
WO2018219825A1 (en) 2017-06-02 2018-12-06 Syngenta Participations Ag Microbiocidal oxadiazole derivatives
US11919246B2 (en) 2017-07-11 2024-03-05 Daniel S. Clark 5D part growing machine with volumetric display technology
US10967578B2 (en) 2017-07-11 2021-04-06 Daniel S. Clark 5D part growing machine with volumetric display technology
CN110333648A (en) * 2019-07-16 2019-10-15 中山新诺科技股份有限公司 The exposure system and method for high-precision line pattern are prepared on three-dimensional polyhedron

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EP0556591A1 (en) * 1992-01-23 1993-08-25 Texas Instruments Incorporated Printer using an array of deformable mirror devices (DMD)
DE4232187A1 (en) * 1992-09-25 1994-03-31 Du Pont Deutschland Separation of photosensitive layer from carrier on printing plate and process appts. - uses PTFE coated band knife running it guides and supplied with lubricant.
US5331338A (en) * 1992-01-30 1994-07-19 Printware, Inc. Web steering for an image recorder
EP0845710A1 (en) * 1996-11-29 1998-06-03 Schablonentechnik Kufstein Aktiengesellschaft Process and device for making a stencil printing master
WO1998053370A1 (en) * 1997-05-19 1998-11-26 Day International, Inc. Printing plate and method of making using digital imaging photopolymerization
US5877848A (en) * 1997-04-02 1999-03-02 Macdermid Imaging Technology, Incorporated Continuous production of cross-linked resin relief images for printing plates
DE19944759A1 (en) * 1999-09-17 2001-03-22 Basys Print Gmbh Systeme Fuer Procedure for the synchronization of positioning and exposure processes

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EP0491368A2 (en) * 1990-12-18 1992-06-24 R.R. Donnelly & Sons Company Method and apparatus for making print imaging media
EP0556591A1 (en) * 1992-01-23 1993-08-25 Texas Instruments Incorporated Printer using an array of deformable mirror devices (DMD)
US5331338A (en) * 1992-01-30 1994-07-19 Printware, Inc. Web steering for an image recorder
DE4232187A1 (en) * 1992-09-25 1994-03-31 Du Pont Deutschland Separation of photosensitive layer from carrier on printing plate and process appts. - uses PTFE coated band knife running it guides and supplied with lubricant.
EP0845710A1 (en) * 1996-11-29 1998-06-03 Schablonentechnik Kufstein Aktiengesellschaft Process and device for making a stencil printing master
US5877848A (en) * 1997-04-02 1999-03-02 Macdermid Imaging Technology, Incorporated Continuous production of cross-linked resin relief images for printing plates
WO1998053370A1 (en) * 1997-05-19 1998-11-26 Day International, Inc. Printing plate and method of making using digital imaging photopolymerization
DE19944759A1 (en) * 1999-09-17 2001-03-22 Basys Print Gmbh Systeme Fuer Procedure for the synchronization of positioning and exposure processes

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Also Published As

Publication number Publication date
WO2003087940A2 (en) 2003-10-23
US7125649B2 (en) 2006-10-24
US7550251B2 (en) 2009-06-23
US20050118524A1 (en) 2005-06-02
AU2003214892A1 (en) 2003-10-27
AU2008202784A1 (en) 2008-07-17
EP1495368A2 (en) 2005-01-12
US20050186510A1 (en) 2005-08-25
US20030188652A1 (en) 2003-10-09
AU2008202784B2 (en) 2011-05-19
US6855482B2 (en) 2005-02-15
AU2003214892B2 (en) 2008-07-10

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