WO2004005560A3 - Copper alloy containing cobalt, nickel, and silicon - Google Patents

Copper alloy containing cobalt, nickel, and silicon Download PDF

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Publication number
WO2004005560A3
WO2004005560A3 PCT/US2003/020664 US0320664W WO2004005560A3 WO 2004005560 A3 WO2004005560 A3 WO 2004005560A3 US 0320664 W US0320664 W US 0320664W WO 2004005560 A3 WO2004005560 A3 WO 2004005560A3
Authority
WO
WIPO (PCT)
Prior art keywords
alloy
copper
temperature
nickel
silicon
Prior art date
Application number
PCT/US2003/020664
Other languages
French (fr)
Other versions
WO2004005560A2 (en
Inventor
Frank N Mandigo
Peter W Robinson
Derek E Tyler
Andreas Boegel
Hans-Achim Kuhn
Frank M Keppeler
Joerg Seeger
Original Assignee
Olin Corp
Wieland Werke Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=30115641&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2004005560(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority to US10/610,433 priority Critical patent/US7182823B2/en
Application filed by Olin Corp, Wieland Werke Ag filed Critical Olin Corp
Priority to JP2004519717A priority patent/JP2005532477A/en
Priority to CA2490799A priority patent/CA2490799C/en
Priority to AU2003247661A priority patent/AU2003247661A1/en
Priority to EP03763072.0A priority patent/EP1520054B8/en
Priority to ES03763072.0T priority patent/ES2605354T3/en
Priority to MXPA05000148A priority patent/MXPA05000148A/en
Publication of WO2004005560A2 publication Critical patent/WO2004005560A2/en
Publication of WO2004005560A3 publication Critical patent/WO2004005560A3/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49579Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/03Contact members characterised by the material, e.g. plating, or coating materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Conductive Materials (AREA)

Abstract

A copper alloy having an improved combination of yield strength and electrical conductivity consists essentially of, by weight, from 1% to 2.5% of nickel, from 0.5% to 2.0% of cobalt, with a total nickel plus cobalt content of from 1.7% to 4.3%, from 0.5% to 1.5% of silicon with a ratio of (Ni+Co)/Si of between 3.5 and 6, and the balance copper and inevitable impurities wherein the wrought copper alloy has an electrical conductivity in excess of 40% IACS. A further increase in the combination of yield strength and electrical conductivity as well as enhanced resistance to stress relaxation is obtained by a further inclusion of up 1 % of silver. A process to manufacture the alloys of the invention as well as other copper-nickel-silicon alloys includes the sequential steps of (a). casting (10) the copper alloy; (b). hot working (12) the cast copper-base alloy to effect a first reduction in cross-sectional area; (c). solutionizing (14) the cast copper-base alloy at a temperature and for a time effective to substantially form a single phase alloy; (d). first age annealing (18) the alloy at a temperature and for a time effective to precipitate an amount of a second phase effective to form a multi-phase alloy having silicides; (e). cold working (20) the multi-phase alloy to effect a second reduction in cross-sectional area; and (f). second age annealing (22) the multiphase alloy at a temperature and for a time effective to precipitate additional silicides thereby raising conductivity, wherein the second age annealing temperature is less than the first age annealing temperature.
PCT/US2003/020664 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel, and silicon WO2004005560A2 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US10/610,433 US7182823B2 (en) 2002-07-05 2003-06-30 Copper alloy containing cobalt, nickel and silicon
JP2004519717A JP2005532477A (en) 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel and silicon
CA2490799A CA2490799C (en) 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel, and silicon
AU2003247661A AU2003247661A1 (en) 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel, and silicon
EP03763072.0A EP1520054B8 (en) 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel, and silicon
ES03763072.0T ES2605354T3 (en) 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel and silicon
MXPA05000148A MXPA05000148A (en) 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel, and silicon.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39376502P 2002-07-05 2002-07-05
US60/393,765 2002-07-05

Publications (2)

Publication Number Publication Date
WO2004005560A2 WO2004005560A2 (en) 2004-01-15
WO2004005560A3 true WO2004005560A3 (en) 2004-06-17

Family

ID=30115641

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/020664 WO2004005560A2 (en) 2002-07-05 2003-07-01 Copper alloy containing cobalt, nickel, and silicon

Country Status (11)

Country Link
US (4) US7182823B2 (en)
EP (1) EP1520054B8 (en)
JP (3) JP2005532477A (en)
KR (2) KR20080111170A (en)
CN (4) CN101792872B (en)
AU (1) AU2003247661A1 (en)
CA (1) CA2490799C (en)
ES (1) ES2605354T3 (en)
MX (1) MXPA05000148A (en)
TW (1) TWI327601B (en)
WO (1) WO2004005560A2 (en)

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