WO2004010151A3 - Method and system for electron density measurement - Google Patents

Method and system for electron density measurement Download PDF

Info

Publication number
WO2004010151A3
WO2004010151A3 PCT/US2003/019872 US0319872W WO2004010151A3 WO 2004010151 A3 WO2004010151 A3 WO 2004010151A3 US 0319872 W US0319872 W US 0319872W WO 2004010151 A3 WO2004010151 A3 WO 2004010151A3
Authority
WO
WIPO (PCT)
Prior art keywords
diagnostic system
control
controller
monitor
remote
Prior art date
Application number
PCT/US2003/019872
Other languages
French (fr)
Other versions
WO2004010151A2 (en
Inventor
Eric J. Strang
Richard Parsons
Jody Goldfield
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Priority to AU2003251605A priority Critical patent/AU2003251605A1/en
Priority to JP2004523019A priority patent/JP4777647B2/en
Priority to US10/521,118 priority patent/US7177781B2/en
Publication of WO2004010151A2 publication Critical patent/WO2004010151A2/en
Publication of WO2004010151A3 publication Critical patent/WO2004010151A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/3299—Feedback systems

Abstract

The present invention provides a diagnostic system for plasma processing (1), wherein the diagnostic system (1) comprises a multi¬ modal resonator (35), a power source (60), a detector (70), and a controller (80). The controller (80) is coupled ot hte power source (60) and the detector (70), and it is configured to provide a man-machine interface (82) for performing several monitoring and controlling functions associated with the diagnostic system (1) including: a Gunn diode voltage monitor, a Gunn diode current monit a varactor diode voltage monitor, a detector voltage monitor, a varactor voltage control, a varactor voltage sweep control, a resonanc lock-on control, a graphical user control, and an electron density monitor. The diagnostic system (1) can further provide a remote controller (84) coupled to the controller (80) and configured to provide a remote man-machine interface (86). The remote man-mach interface (86) can provide a graphical user interface in order to permint remote control of the diagnostic system (1) by an operator. I addition, the present invention provides several methods of controlling the diagnostic system (1) in order to perform both monitor an control functions.
PCT/US2003/019872 2002-07-23 2003-07-23 Method and system for electron density measurement WO2004010151A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2003251605A AU2003251605A1 (en) 2002-07-23 2003-07-23 Method and system for electron density measurement
JP2004523019A JP4777647B2 (en) 2002-07-23 2003-07-23 Plasma diagnostic system and control method thereof
US10/521,118 US7177781B2 (en) 2002-07-23 2003-07-23 Method and system for electron density measurement

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39766102P 2002-07-23 2002-07-23
US60/397,661 2002-07-23

Publications (2)

Publication Number Publication Date
WO2004010151A2 WO2004010151A2 (en) 2004-01-29
WO2004010151A3 true WO2004010151A3 (en) 2009-09-03

Family

ID=30771097

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/019872 WO2004010151A2 (en) 2002-07-23 2003-07-23 Method and system for electron density measurement

Country Status (4)

Country Link
US (1) US7177781B2 (en)
JP (1) JP4777647B2 (en)
AU (1) AU2003251605A1 (en)
WO (1) WO2004010151A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8145064B2 (en) * 2008-09-19 2012-03-27 Goodrich Corporation System and method for suppressing noise by frequency dither
CN104244554A (en) * 2013-06-21 2014-12-24 电子科技大学 Novel method for rapidly diagnosing plasma in real time through quasi-optical resonant cavity
EP3632189B1 (en) * 2017-05-25 2023-09-06 Oerlikon Metco (US) Inc. Plasma gun diagnostics apparatus and method

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03263828A (en) * 1990-03-14 1991-11-25 Hitachi Ltd Method and apparatus for plasma treatment
US5936481A (en) * 1997-09-10 1999-08-10 Adtec Corporation Limited System for impedance matching and power control for apparatus for high frequency plasma treatment
US6133795A (en) * 1994-06-24 2000-10-17 Williams; Roscoe Charles Oscillator circuit
WO2001006402A1 (en) * 1999-07-20 2001-01-25 Tokyo Electron Limited Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
WO2001006544A2 (en) * 1999-07-21 2001-01-25 Tokyo Electron Limited Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
WO2001037306A1 (en) * 1999-11-19 2001-05-25 Tokyo Electron Limited Stabilized oscillator circuit for plasma density measurement
US6766279B2 (en) * 2001-03-01 2004-07-20 Parkinelmer Instruments Llc System for remote monitoring and control of an instrument
US20040267547A1 (en) * 2002-01-31 2004-12-30 Strang Eric J Method and apparatus for monitoring and verifying equipment status

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2514862B2 (en) * 1991-02-08 1996-07-10 日本電信電話株式会社 Plasma measurement method
JP3269853B2 (en) * 1992-07-17 2002-04-02 株式会社ダイヘン Plasma processing equipment
JPH07169590A (en) * 1993-09-16 1995-07-04 Fujitsu Ltd Electron density measuring method and device thereof and electron density control device and plasma processing device
JPH07296987A (en) * 1994-04-21 1995-11-10 Fujitsu Ltd Method and device for measuring electron temperature, and method and device for controlling electron temperature
JP2002009059A (en) * 2000-06-23 2002-01-11 Hitachi Ltd Plasma etching method, manufacturing of electronic device, plasma etching device and plasma processor
JP2002170817A (en) * 2000-12-04 2002-06-14 Nisshin:Kk Plasma processing method and apparatus thereof
JP2002184705A (en) * 2000-12-18 2002-06-28 Toshiba Corp Method and device for correcting process data

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03263828A (en) * 1990-03-14 1991-11-25 Hitachi Ltd Method and apparatus for plasma treatment
US6133795A (en) * 1994-06-24 2000-10-17 Williams; Roscoe Charles Oscillator circuit
US5936481A (en) * 1997-09-10 1999-08-10 Adtec Corporation Limited System for impedance matching and power control for apparatus for high frequency plasma treatment
WO2001006402A1 (en) * 1999-07-20 2001-01-25 Tokyo Electron Limited Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma
WO2001006544A2 (en) * 1999-07-21 2001-01-25 Tokyo Electron Limited Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma
WO2001037306A1 (en) * 1999-11-19 2001-05-25 Tokyo Electron Limited Stabilized oscillator circuit for plasma density measurement
US6766279B2 (en) * 2001-03-01 2004-07-20 Parkinelmer Instruments Llc System for remote monitoring and control of an instrument
US20040267547A1 (en) * 2002-01-31 2004-12-30 Strang Eric J Method and apparatus for monitoring and verifying equipment status

Also Published As

Publication number Publication date
US20060032287A1 (en) 2006-02-16
AU2003251605A1 (en) 2004-02-09
JP4777647B2 (en) 2011-09-21
JP2006509329A (en) 2006-03-16
WO2004010151A2 (en) 2004-01-29
AU2003251605A8 (en) 2009-10-08
US7177781B2 (en) 2007-02-13

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