WO2004019128A3 - Projection optical system and method for photolithography and exposure apparatus and method using same - Google Patents
Projection optical system and method for photolithography and exposure apparatus and method using same Download PDFInfo
- Publication number
- WO2004019128A3 WO2004019128A3 PCT/JP2003/010665 JP0310665W WO2004019128A3 WO 2004019128 A3 WO2004019128 A3 WO 2004019128A3 JP 0310665 W JP0310665 W JP 0310665W WO 2004019128 A3 WO2004019128 A3 WO 2004019128A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photolithography
- projection system
- optical system
- same
- exposure apparatus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
Abstract
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03792812A EP1532489A2 (en) | 2002-08-23 | 2003-08-22 | Projection optical system and method for photolithography and exposure apparatus and method using same |
AU2003256081A AU2003256081A1 (en) | 2002-08-23 | 2003-08-22 | Projection optical system and method for photolithography and exposure apparatus and method using same |
JP2004530609A JP2005536775A (en) | 2002-08-23 | 2003-08-22 | Projection optical system, photolithography method and exposure apparatus, and method using exposure apparatus |
US10/525,372 US7362508B2 (en) | 2002-08-23 | 2003-08-22 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,679 US7551362B2 (en) | 2002-08-23 | 2007-10-16 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,801 US7688517B2 (en) | 2002-08-23 | 2007-10-17 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,797 US7701640B2 (en) | 2002-08-23 | 2007-10-17 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,908 US7580197B2 (en) | 2002-08-23 | 2007-10-18 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,907 US7609455B2 (en) | 2002-08-23 | 2007-10-18 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/976,028 US7619827B2 (en) | 2002-08-23 | 2007-10-19 | Projection optical system and method for photolithography and exposure apparatus and method using same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002242925 | 2002-08-23 | ||
JP2002-242925 | 2002-08-23 | ||
GB0311470.9 | 2003-05-19 | ||
GB0311470A GB0311470D0 (en) | 2003-05-19 | 2003-05-19 | Optical projection system for photolithography |
Related Child Applications (7)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10525372 A-371-Of-International | 2003-08-22 | ||
US11/907,679 Continuation US7551362B2 (en) | 2002-08-23 | 2007-10-16 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,801 Continuation US7688517B2 (en) | 2002-08-23 | 2007-10-17 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,797 Continuation US7701640B2 (en) | 2002-08-23 | 2007-10-17 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,907 Continuation US7609455B2 (en) | 2002-08-23 | 2007-10-18 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/907,908 Continuation US7580197B2 (en) | 2002-08-23 | 2007-10-18 | Projection optical system and method for photolithography and exposure apparatus and method using same |
US11/976,028 Continuation US7619827B2 (en) | 2002-08-23 | 2007-10-19 | Projection optical system and method for photolithography and exposure apparatus and method using same |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004019128A2 WO2004019128A2 (en) | 2004-03-04 |
WO2004019128A3 true WO2004019128A3 (en) | 2004-10-28 |
Family
ID=31948049
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2003/010665 WO2004019128A2 (en) | 2002-08-23 | 2003-08-22 | Projection optical system and method for photolithography and exposure apparatus and method using same |
Country Status (8)
Country | Link |
---|---|
US (7) | US7362508B2 (en) |
EP (1) | EP1532489A2 (en) |
JP (3) | JP2005536775A (en) |
KR (1) | KR20050035890A (en) |
CN (1) | CN100462844C (en) |
AU (1) | AU2003256081A1 (en) |
TW (2) | TWI242691B (en) |
WO (1) | WO2004019128A2 (en) |
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- 2003-08-22 AU AU2003256081A patent/AU2003256081A1/en not_active Abandoned
- 2003-08-22 EP EP03792812A patent/EP1532489A2/en not_active Withdrawn
- 2003-08-22 TW TW093118060A patent/TWI249082B/en not_active IP Right Cessation
- 2003-08-22 US US10/525,372 patent/US7362508B2/en not_active Expired - Lifetime
- 2003-08-22 CN CNB038172534A patent/CN100462844C/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
---|---|
US7619827B2 (en) | 2009-11-17 |
TW200426542A (en) | 2004-12-01 |
US7551362B2 (en) | 2009-06-23 |
EP1532489A2 (en) | 2005-05-25 |
US20080068573A1 (en) | 2008-03-20 |
AU2003256081A1 (en) | 2004-03-11 |
CN1668984A (en) | 2005-09-14 |
TWI242691B (en) | 2005-11-01 |
JP2005536775A (en) | 2005-12-02 |
WO2004019128A2 (en) | 2004-03-04 |
US7688517B2 (en) | 2010-03-30 |
US7362508B2 (en) | 2008-04-22 |
CN100462844C (en) | 2009-02-18 |
TWI249082B (en) | 2006-02-11 |
US20080049336A1 (en) | 2008-02-28 |
US7701640B2 (en) | 2010-04-20 |
TW200403547A (en) | 2004-03-01 |
US20080049306A1 (en) | 2008-02-28 |
KR20050035890A (en) | 2005-04-19 |
JP2010097221A (en) | 2010-04-30 |
US20080068576A1 (en) | 2008-03-20 |
US20080068724A1 (en) | 2008-03-20 |
AU2003256081A8 (en) | 2004-03-11 |
US20050248856A1 (en) | 2005-11-10 |
JP2010061159A (en) | 2010-03-18 |
US20080094696A1 (en) | 2008-04-24 |
US7609455B2 (en) | 2009-10-27 |
US7580197B2 (en) | 2009-08-25 |
JP4803301B2 (en) | 2011-10-26 |
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