Recherche Images Maps Play YouTube Actualités Gmail Drive Plus »
Connexion
Les utilisateurs de lecteurs d'écran peuvent cliquer sur ce lien pour activer le mode d'accessibilité. Celui-ci propose les mêmes fonctionnalités principales, mais il est optimisé pour votre lecteur d'écran.

Brevets

  1. Recherche avancée dans les brevets
Numéro de publicationWO2004053951 A1
Type de publicationDemande
Numéro de demandePCT/JP2003/015408
Date de publication24 juin 2004
Date de dépôt2 déc. 2003
Date de priorité10 déc. 2002
Numéro de publicationPCT/2003/15408, PCT/JP/2003/015408, PCT/JP/2003/15408, PCT/JP/3/015408, PCT/JP/3/15408, PCT/JP2003/015408, PCT/JP2003/15408, PCT/JP2003015408, PCT/JP200315408, PCT/JP3/015408, PCT/JP3/15408, PCT/JP3015408, PCT/JP315408, WO 2004/053951 A1, WO 2004053951 A1, WO 2004053951A1, WO-A1-2004053951, WO2004/053951A1, WO2004053951 A1, WO2004053951A1
InventeursNobutaka Magome, Masahiro Nei, Shigeru Hirukawa, Naoyuki Kobayashi, Soichi Owa
DéposantNikon Corporation
Exporter la citationBiBTeX, EndNote, RefMan
Liens externes:  Patentscope, Espacenet
Exposure method, exposure apparatus and method for manufacturing device
WO 2004053951 A1
Résumé
When a substrate (P) is exposed to light through a projection optical system, a liquid (50) is supplied between the projection optical system and the substrate (P). Accordingly, a pattern forming area (AR1) of the substrate (P) is exposed to light through a projection optical system (PL) and the liquid, and an edge area (AR2) of the substrate (P) is exposed to light through a projection optical system (PL2) but not through the liquid. Exposure with a large depth of focus can be realized while preventing the liquid from flowing out of the substrate.
Citations de brevets
Brevet cité Date de dépôt Date de publication Déposant Titre
WO1999049504A1 *16 mars 199930 sept. 1999Nikon CorporationProjection exposure method and system
JP5304072A * Titre non disponible
JP6124873A * Titre non disponible
JP6168866A * Titre non disponible
JP7220990A * Titre non disponible
JP8335545A * Titre non disponible
JP10255319A * Titre non disponible
JP10303114A * Titre non disponible
JP10340846A * Titre non disponible
JP62065326A * Titre non disponible
JP2000021882A * Titre non disponible
Référencé par
Brevet citant Date de dépôt Date de publication Déposant Titre
WO2005081291A1 *17 févr. 20051 sept. 2005Nikon CorporationExposure apparatus and method of producing device
WO2005081293A1 *17 févr. 20051 sept. 2005Nikon CorporationExposure apparatus and exposure method, and device producing method
EP2278402A226 août 200426 janv. 2011Nikon CorporationOptical element and exposure apparatus
EP2284615A226 août 200416 févr. 2011Nikon CorporationOptical element and exposure apparatus
US695225312 nov. 20034 oct. 2005Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US700968218 nov. 20037 mars 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US701267314 juin 200414 mars 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US70349171 avr. 200425 avr. 2006Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and device manufactured thereby
US703876023 juin 20042 mai 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US70501469 févr. 200423 mai 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US707561612 nov. 200311 juil. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US708194312 nov. 200325 juil. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US711008126 avr. 200419 sept. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US711008715 juin 200419 sept. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US711987423 juin 200410 oct. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US711987618 oct. 200410 oct. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US711988121 déc. 200510 oct. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US713311420 sept. 20047 nov. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US714563023 nov. 20045 déc. 2006Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US715821122 sept. 20042 janv. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US71616542 déc. 20049 janv. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US716166322 juil. 20049 janv. 2007Asml Netherlands B.V.Lithographic apparatus
US717596826 juil. 200413 févr. 2007Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and a substrate
US718412212 juil. 200427 févr. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US719323212 nov. 200320 mars 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method with substrate measurement not through liquid
US719368122 sept. 200420 mars 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US71967707 déc. 200427 mars 2007Asml Netherlands B.V.Prewetting of substrate before immersion exposure
US719985812 nov. 20033 avr. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US72092137 oct. 200424 avr. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US72139631 juin 20048 mai 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US722443122 févr. 200529 mai 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US722443615 mars 200629 mai 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US72276191 avr. 20045 juin 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US72483347 déc. 200424 juil. 2007Asml Netherlands B.V.Sensor shield
US725101312 nov. 200431 juil. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US72918508 avr. 20056 nov. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US72952832 avr. 200413 nov. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US730471513 août 20044 déc. 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US73175073 mai 20058 janv. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US73241854 mars 200529 janv. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US733023828 mars 200512 févr. 2008Asml Netherlands, B.V.Lithographic apparatus, immersion projection apparatus and device manufacturing method
US735243515 oct. 20041 avr. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US735567428 sept. 20048 avr. 2008Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and computer program product
US73590301 déc. 200315 avr. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US73658278 déc. 200429 avr. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US737802522 févr. 200527 mai 2008Asml Netherlands B.V.Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US73791593 mai 200427 mai 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US740326115 déc. 200422 juil. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US740580528 déc. 200429 juil. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US74116545 avr. 200512 août 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US741165717 nov. 200412 août 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US74116586 oct. 200512 août 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US741469912 nov. 200419 août 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US742019427 déc. 20052 sept. 2008Asml Netherlands B.V.Lithographic apparatus and substrate edge seal
US742372012 nov. 20049 sept. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US742803828 févr. 200523 sept. 2008Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US743301512 oct. 20047 oct. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US74330163 mai 20057 oct. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US74468503 déc. 20044 nov. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US746877928 juin 200523 déc. 2008Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US747437928 juin 20056 janv. 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US74826119 mars 200627 janv. 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US749166128 déc. 200417 févr. 2009Asml Netherlands B.V.Device manufacturing method, top coat material and substrate
US752226124 sept. 200421 avr. 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US752893120 déc. 20045 mai 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US753564412 août 200519 mai 2009Asml Netherlands B.V.Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US754548124 nov. 20039 juin 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US755790120 déc. 20067 juil. 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US758288126 sept. 20071 sept. 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US758335712 nov. 20041 sept. 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US758981823 déc. 200315 sept. 2009Asml Netherlands B.V.Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US763307323 nov. 200515 déc. 2009Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US764312723 févr. 20075 janv. 2010Asml Netherlands B.V.Prewetting of substrate before immersion exposure
US764961130 déc. 200519 janv. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US765274628 déc. 200526 janv. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US765275114 avr. 200826 janv. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US765650116 nov. 20052 févr. 2010Asml Netherlands B.V.Lithographic apparatus
US767073012 déc. 20052 mars 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US767196319 mai 20052 mars 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US76840084 juin 200423 mars 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US76840109 mars 200523 mars 2010Asml Netherlands B.V.Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US769711126 août 200413 avr. 2010Nikon CorporationOptical element and exposure apparatus
US770155019 août 200420 avr. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US770596212 janv. 200627 avr. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US771053719 juin 20084 mai 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US771054131 juil. 20074 mai 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US773345924 août 20048 juin 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US773807414 juil. 200415 juin 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US774644521 déc. 200629 juin 2010Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and a substrate
US775102716 juin 20066 juil. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US775103216 juin 20086 juil. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US776335510 nov. 200827 juil. 2010Asml Netherlands B.V.Device manufacturing method, top coat material and substrate
US776435626 sept. 200827 juil. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US777319529 nov. 200510 août 2010Asml Holding N.V.System and method to increase surface tension and contact angle in immersion lithography
US777978128 juil. 200424 août 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US77917097 déc. 20077 sept. 2010Asml Netherlands B.V.Substrate support and lithographic process
US779560319 déc. 200814 sept. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US780457425 mai 200428 sept. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method using acidic liquid
US780457517 août 200528 sept. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method having liquid evaporation control
US780457729 mars 200628 sept. 2010Asml Netherlands B.V.Lithographic apparatus
US780861116 févr. 20065 oct. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method using acidic liquid
US780861419 déc. 20085 oct. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US781292421 sept. 200612 oct. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US781724425 oct. 200619 oct. 2010Nikon CorporationExposure apparatus and method for producing device
US781724513 nov. 200719 oct. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US783497428 juin 200516 nov. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US78349767 juil. 200616 nov. 2010Nikon CorporationExposure apparatus and method for producing device
US783497729 févr. 200816 nov. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US783948328 déc. 200523 nov. 2010Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and a control system
US784135229 juin 200730 nov. 2010Asml Netherlands B.V.Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US784355126 nov. 200730 nov. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US785245720 juin 200814 déc. 2010Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US785577719 juil. 200721 déc. 2010Nikon CorporationExposure apparatus and method for manufacturing device
US785964417 déc. 200728 déc. 2010Asml Netherlands B.V.Lithographic apparatus, immersion projection apparatus and device manufacturing method
US786429214 avr. 20064 janv. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US786633011 avr. 200811 janv. 2011Asml Netherlands B.V.Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US786899830 juin 200811 janv. 2011Asml Netherlands B.V.Lithographic apparatus
US78764188 juin 200525 janv. 2011Nikon CorporationOptical element and projection exposure apparatus based on use of the optical element
US788086020 déc. 20041 févr. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US78940405 oct. 200422 févr. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US789864214 avr. 20041 mars 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US789864322 juil. 20051 mars 2011Asml Holding N.V.Immersion photolithography system and method using inverted wafer-projection optics interface
US790725316 juil. 200715 mars 2011Nikon CorporationExposure apparatus, exposure method, and method for producing device
US790725419 juil. 200715 mars 2011Nikon CorporationExposure apparatus, exposure method, and method for producing device
US790725524 août 200415 mars 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US791158318 juil. 200722 mars 2011Nikon CorporationExposure apparatus, exposure method, and method for producing device
US79146877 avr. 200829 mars 2011Asml Netherlands B.V.Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US792440312 janv. 200612 avr. 2011Asml Netherlands B.V.Lithographic apparatus and device and device manufacturing method
US792840722 nov. 200619 avr. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US792911217 nov. 200819 avr. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US79329913 mars 200626 avr. 2011Nikon CorporationExposure apparatus, exposure method, and method for producing device
US79329997 août 200626 avr. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US79364447 févr. 20083 mai 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US796129317 mars 200814 juin 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US796954822 mai 200628 juin 2011Asml Netherlands B.V.Lithographic apparatus and lithographic apparatus cleaning method
US79783063 juil. 200812 juil. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US798285015 mai 200819 juil. 2011Asml Netherlands B.V.Immersion lithographic apparatus and device manufacturing method with gas supply
US800396824 juil. 200823 août 2011Asml Netherlands B.V.Lithographic apparatus and substrate edge seal
US80046491 avr. 200823 août 2011Asml Holding N.V.Immersion photolithography system and method using microchannel nozzles
US80046522 avr. 200823 août 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US80046549 juil. 200823 août 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US801397820 juin 20086 sept. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US801857322 févr. 200513 sept. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US802702628 janv. 201127 sept. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US80313251 mars 20104 oct. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US80357987 juil. 200611 oct. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US804513413 mars 200625 oct. 2011Asml Netherlands B.V.Lithographic apparatus, control system and device manufacturing method
US804513522 nov. 200625 oct. 2011Asml Netherlands B.V.Lithographic apparatus with a fluid combining unit and related device manufacturing method
US804513714 mai 200825 oct. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US80544457 août 20068 nov. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US806821017 mars 200829 nov. 2011Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and computer program product
US80772919 oct. 200713 déc. 2011Asml Netherlands B.V.Substrate placement in immersion lithography
US810250210 avr. 200924 janv. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US810250411 août 200624 janv. 2012Nikon CorporationExposure apparatus, exposure method, and method for producing device
US810250727 janv. 201024 janv. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US810705326 août 200831 janv. 2012Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US811589923 janv. 200714 févr. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US811590319 juin 200814 févr. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US811590521 mars 200814 févr. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US81207493 déc. 200821 févr. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US81384866 nov. 200920 mars 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US814285214 juil. 201027 mars 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US81493812 mai 20063 avr. 2012Nikon CorporationOptical element and exposure apparatus
US81547087 juil. 200610 avr. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US816473419 déc. 200824 avr. 2012Asml Netherlands B.V.Vacuum system for immersion photolithography
US81746749 sept. 20088 mai 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US820369319 avr. 200619 juin 2012Asml Netherlands B.V.Liquid immersion lithography system comprising a tilted showerhead relative to a substrate
US82081209 avr. 200826 juin 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US820812327 août 200426 juin 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US820812429 sept. 200626 juin 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US821812519 déc. 200810 juil. 2012Asml Netherlands B.V.Immersion lithographic apparatus with a projection system having an isolated or movable part
US823254015 juil. 201131 juil. 2012Asml Netherlands B.V.Lithographic apparatus and substrate edge seal
US82331357 janv. 200931 juil. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US82331373 déc. 200831 juil. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US824683817 févr. 201121 août 2012Asml Netherlands B.V.Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US82485773 mai 200521 août 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US825928711 avr. 20084 sept. 2012Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US831993930 oct. 200827 nov. 2012Asml Netherlands B.V.Immersion lithographic apparatus and device manufacturing method detecting residual liquid
US83443419 août 20101 janv. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US835420920 déc. 201115 janv. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US83632084 févr. 201029 janv. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US83791873 oct. 200819 févr. 2013Nikon CorporationOptical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US83907781 févr. 20105 mars 2013Asml Netherlands B.V.Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US840061514 sept. 201019 mars 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US841638531 août 20109 avr. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US842199631 août 201016 avr. 2013Asml Netherlands B.V.Lithographic apparatus
US842762930 août 201023 avr. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US84416173 nov. 201114 mai 2013Asml Netherlands B.V.Substrate placement in immersion lithography
US844656314 août 200921 mai 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US84465688 juin 201021 mai 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US844657912 mars 201221 mai 2013Nikon CorporationInspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US845142714 août 200828 mai 2013Nikon CorporationIllumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US845661112 juil. 20104 juin 2013Asml Holding N.V.System and method to increase surface tension and contact angle in immersion lithography
US845662422 nov. 20104 juin 2013Nikon CorporationInspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US846231222 juil. 201111 juin 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US846231715 oct. 200811 juin 2013Nikon CorporationIllumination optical system, exposure apparatus, and device manufacturing method
US84720022 févr. 201025 juin 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US84720068 mai 200925 juin 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US84819788 avr. 20119 juil. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US84828452 févr. 20109 juil. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US850871730 mai 201213 août 2013Nikon CorporationIllumination optical system, exposure apparatus, and device manufacturing method
US851436927 oct. 201020 août 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US852029115 oct. 200827 août 2013Nikon CorporationIllumination optical system, exposure apparatus, and device manufacturing method
US85423434 août 201024 sept. 2013Asml Netherlands B.V.Lithographic apparatus
US854234431 oct. 201124 sept. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US854751926 mars 20091 oct. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US85532011 oct. 20088 oct. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US85589894 août 201015 oct. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US856476014 oct. 201022 oct. 2013Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and a control system
US857048613 avr. 201229 oct. 2013Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US862997123 avr. 201014 janv. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US863405330 nov. 200721 janv. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US863405620 juil. 201121 janv. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US863841525 sept. 200928 janv. 2014Asml Netherlands B.V.Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US863841822 déc. 201028 janv. 2014Asml Netherlands B.V.Lithographic apparatus
US86384197 janv. 201128 janv. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US86751739 mars 201118 mars 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US867517720 sept. 200718 mars 2014Nikon CorporationExposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US868716811 avr. 20111 avr. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US869297327 avr. 20078 avr. 2014Nikon CorporationExposure apparatus and method for producing device
US870499824 janv. 201122 avr. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a barrier to collect liquid
US870500927 sept. 201022 avr. 2014Asml Netherlands B.V.Heat pipe, lithographic apparatus and device manufacturing method
US87113237 juil. 200629 avr. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US87113306 mai 201129 avr. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US87113334 juin 200929 avr. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US87240837 avr. 201113 mai 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US872408422 juil. 201113 mai 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US873680915 oct. 201027 mai 2014Nikon CorporationExposure apparatus, exposure method, and method for producing device
US87433394 déc. 20093 juin 2014Asml NetherlandsLithographic apparatus and device manufacturing method
US874975428 déc. 200910 juin 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US87550276 sept. 201117 juin 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving fluid mixing and control of the physical property of a fluid
US87550281 sept. 201117 juin 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US875503322 sept. 201117 juin 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a barrier to collect liquid
US876717119 mars 20101 juil. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US876717315 déc. 20101 juil. 2014Nikon CorporationOptical element and projection exposure apparatus based on use of the optical element
US87868236 déc. 201022 juil. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US879750331 mai 20115 août 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure
US880409722 sept. 201112 août 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US881077112 déc. 201119 août 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US881723117 mars 201026 août 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US88239202 nov. 20112 sept. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US883044020 juil. 20119 sept. 2014Asml Netherlands B.V.Vacuum system for immersion photolithography
US88481659 févr. 201230 sept. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US88546019 sept. 20117 oct. 2014Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US88591886 févr. 200614 oct. 2014Asml Netherlands B.V.Immersion liquid, exposure apparatus, and exposure process
US886092223 janv. 201214 oct. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US886092322 sept. 201114 oct. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US886092420 août 201214 oct. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US886092622 sept. 201114 oct. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US88790439 nov. 20104 nov. 2014Nikon CorporationExposure apparatus and method for manufacturing device
US889680915 août 200725 nov. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US89024044 août 20112 déc. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US89132237 juin 201016 déc. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US891322522 juil. 201116 déc. 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US893408223 juin 201113 janv. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US89377043 nov. 201120 janv. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a resistivity sensor
US894181026 mai 201127 janv. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US894181123 sept. 201127 janv. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US894762911 avr. 20083 févr. 2015Asml Netherlands B.V.Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US894763126 mai 20113 févr. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US89476376 sept. 20113 févr. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US895314422 sept. 201110 févr. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US895805122 déc. 201117 févr. 2015Asml Netherlands B.V.Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US895805415 juil. 201117 févr. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US89641639 juil. 201224 févr. 2015Asml Netherlands B.V.Immersion lithographic apparatus and device manufacturing method with a projection system having a part movable relative to another part
US896416421 juil. 201124 févr. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US897633422 sept. 201110 mars 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US898865123 sept. 201124 mars 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US901367229 juin 200721 avr. 2015Asml Netherlands B.V.Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US902512723 sept. 20115 mai 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US904679628 févr. 20122 juin 2015Nikon CorporationOptical element and exposure apparatus
US905787717 avr. 201216 juin 2015Nikon CorporationOptical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US905796319 avr. 201316 juin 2015Nikon CorporationIllumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US905796730 juil. 200916 juin 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US908118922 oct. 200814 juil. 2015Nikon CorporationIllumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US90812991 août 201114 juil. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap
US908130023 sept. 201114 juil. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US909194020 déc. 201228 juil. 2015Asml Netherlands B.V.Lithographic apparatus and method involving a fluid inlet and a fluid outlet
US909798113 oct. 20084 août 2015Nikon CorporationIllumination optical apparatus, exposure apparatus, and device manufacturing method
US909799219 juil. 20114 août 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US909950111 oct. 20104 août 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US910411726 nov. 201211 août 2015Bob StreefkerkLithographic apparatus having a liquid detection system
US911038923 sept. 201118 août 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US911634622 oct. 200825 août 2015Nikon CorporationIllumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US911644321 juil. 201125 août 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US913462216 déc. 201315 sept. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US913462330 avr. 201415 sept. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US914099011 juil. 201122 sept. 2015Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US914099226 avr. 200622 sept. 2015Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US914099323 déc. 200822 sept. 2015Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US914099614 juil. 201422 sept. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US914647412 mars 200929 sept. 2015Nikon CorporationExposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
US91464769 mai 201329 sept. 2015Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US914647822 sept. 201129 sept. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US915205829 juil. 20116 oct. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a member and a fluid opening
US916420914 juil. 201120 oct. 2015Nikon CorporationIllumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
US91643911 oct. 201420 oct. 2015Asml Netherlands B.V.Immersion liquid, exposure apparatus, and exposure process
US916439320 sept. 200720 oct. 2015Nikon CorporationExposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
US91822228 nov. 201210 nov. 2015Asml Netherlands B.V.Substrate placement in immersion lithography
US91826791 oct. 201410 nov. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US91826842 mai 201410 nov. 2015Nikon CorporationExposure apparatus, exposure method, and method for producing device
US91888803 nov. 201117 nov. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a heater
US918888214 juin 201117 nov. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US91951533 déc. 201224 nov. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US92075438 mai 20148 déc. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a groove to collect liquid
US921324725 avr. 201415 déc. 2015Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US922933329 déc. 20085 janv. 2016Nikon CorporationExposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
US922933530 janv. 20125 janv. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US924435917 juil. 200926 janv. 2016Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US925613620 avr. 20119 févr. 2016Asml Netherlands B.V.Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply
US926179728 juil. 201416 févr. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US926823611 juin 201023 févr. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder
US926824226 août 201023 févr. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor
US928568524 avr. 201415 mars 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US928568630 déc. 201415 mars 2016Asml Netherlands B.V.Lithographic apparatus involving an immersion liquid supply system with an aperture
US931069615 sept. 201412 avr. 2016Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US931691929 déc. 201419 avr. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US932949429 sept. 20143 mai 2016Asml Netherlands B.V.Lithographic apparatus
US933091221 sept. 20113 mai 2016Asml Netherlands B.V.Lithographic apparatus, fluid combining unit and device manufacturing method
US934195420 mars 201517 mai 2016Nikon CorporationOptical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US934823923 mai 201424 mai 2016Nikon CorporationExposure apparatus, exposure method, and method for producing device
US936076315 sept. 20147 juin 2016Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US93607653 août 20157 juin 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US936697011 août 201414 juin 2016Nikon CorporationIllumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US936697230 avr. 201514 juin 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US938365513 nov. 20145 juil. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US941753518 mars 201516 août 2016Asml Netherlands B.V.Lithographic apparatus
US94236948 oct. 201323 août 2016Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US94236978 mai 201323 août 2016Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US942369815 mai 201523 août 2016Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US942984829 oct. 200830 août 2016Nikon CorporationPolarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US94298514 janv. 201330 août 2016Nikon CorporationProjection optical system, exposure apparatus, and exposure method
US942985320 mars 201530 août 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US943609630 déc. 20146 sept. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US943609730 déc. 20146 sept. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US944238811 août 201413 sept. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US94484946 juil. 201520 sept. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US945408816 oct. 201527 sept. 2016Asml Netherlands B.V.Immersion liquid, exposure apparatus, and exposure process
US946530123 juin 201411 oct. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US947715311 sept. 201425 oct. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US947715814 avr. 200625 oct. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US947715925 juil. 201325 oct. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US947716017 févr. 201525 oct. 2016Asml Netherland B.V.Lithographic apparatus and device manufacturing method
US94829629 sept. 20141 nov. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US948296613 sept. 20121 nov. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US948296721 sept. 20111 nov. 2016Asml Netherlands B.V.Lithographic apparatus, control system and device manufacturing method
US94889238 mai 20148 nov. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US950727026 août 201429 nov. 2016Asml Netherlands B.V.Vacuum system for immersion photolithography
US950727822 juil. 201529 nov. 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US954184329 nov. 201110 janv. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid
US95688401 déc. 201514 févr. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US956884124 mars 201614 févr. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US95819141 avr. 201528 févr. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US958191616 nov. 201528 févr. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US95884329 mai 20137 mars 2017Nikon CorporationIllumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US958844227 mai 20167 mars 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US959430813 nov. 201514 mars 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US960644828 mai 201328 mars 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US960644918 déc. 201528 mars 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US961885320 août 201511 avr. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US962343623 janv. 201418 avr. 2017Asml Netherlands B.V.Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets
US963242521 nov. 200725 avr. 2017Asml Holding N.V.Lithographic apparatus, a dryer and a method of removing liquid from a surface
US963900617 févr. 20152 mai 2017Asml Netherlands B.V.Lithographic projection apparatus and device manufacturing method
US964550613 déc. 20139 mai 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US964550712 janv. 20169 mai 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US967833220 mars 201513 juin 2017Nikon CorporationIllumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US96784378 mai 201313 juin 2017Nikon CorporationIllumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US96842506 oct. 201620 juin 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US969020522 août 201427 juin 2017Nikon CorporationExposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
US970321029 déc. 201411 juil. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US970989928 juil. 201418 juil. 2017Asml Holding N.V.Immersion photolithography system and method using microchannel nozzles
US971517830 avr. 201425 juil. 2017Asml Holding N.V.Immersion photolithography system and method using microchannel nozzles
US97335756 juin 201615 août 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US97401063 nov. 201522 août 2017Asml Netherlands B.V.Substrate placement in immersion lithography
US97401079 juin 201622 août 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US974678125 juin 201429 août 2017Nikon CorporationExposure apparatus and method for producing device
US974678813 oct. 201629 août 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US975338030 août 20165 sept. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US976001415 mai 201512 sept. 2017Nikon CorporationIllumination optical apparatus and projection exposure apparatus
US97665553 mai 201619 sept. 2017Nikon CorporationExposure apparatus, exposure method, and method for producing device
US976655615 sept. 201619 sept. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US977256529 août 201626 sept. 2017Asml Netherlands B.V.Immersion liquid, exposure apparatus, and exposure process
US979824616 juin 201624 oct. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US979824714 avr. 201724 oct. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method involving a liquid confinement structure
US98045097 mars 201731 oct. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US981732119 mai 201714 nov. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
US985164415 août 201626 déc. 2017Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
USRE4274111 mars 200827 sept. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
USRE4284922 mai 200818 oct. 2011Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
Classifications
Classification internationaleG03F7/20
Classification coopérativeG03F7/70341, G03F7/70466, G03F7/70991
Classification européenneG03F7/70J8, G03F7/70P16, G03F7/70F24
Événements juridiques
DateCodeÉvénementDescription
24 juin 2004AKDesignated states
Kind code of ref document: A1
Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW
24 juin 2004ALDesignated countries for regional patents
Kind code of ref document: A1
Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG
18 août 2004121Ep: the epo has been informed by wipo that ep was designated in this application
18 janv. 2006122Ep: pct app. not ent. europ. phase